A metal substrate cleaning method and system device

Abstract

The present invention provides a cleaning method and system device for a metal substrate, wherein the cleaning method for the metal substrate comprises: sequentially performing degreasing cleaning, rust removal, at least two thinning treatments, pickling and neutralization treatments on the metal substrate to complete the cleaning of the metal substrate, and then drying the cleaned metal substrate. The present invention adopts a customized cleaning module, drying module and a matching liquid concentration management device to achieve safe, intelligent and automatic processing of integrated cleaning and drying.

Description

Technical Field

[0001] The invention belongs to the technical field of fine metal mask manufacturing, relates to the cleaning of metal materials, and in particular to a cleaning method and system device for a metal substrate. Background Art

[0002] Fine Metal Mask (FMM) is a core component in the OLED (Organic Electroluminescence Display) evaporation process, and is mainly used to deposit organic substances and form pixels during the OLED production process. As active-matrix organic light-emitting diode displays gradually replace LCDs (Liquid Crystal Displays) in smartphones, panel manufacturers are rapidly adding new production capacity, accelerating the demand for fine metal masks. The upstream materials of FMM are Invar metal (Invar alloy), etching solution, resin and other raw materials. FMM materials can be obtained through etching, electroforming and multi-material (metal + resin material) composite. In the manufacturing process of FMM materials, the cleaning of upstream materials is involved. In order to avoid the formation of multiple pores, scratches, and poor roughness of FMM materials, higher requirements are placed on the cleaning process.

[0003] CN112893213A discloses an automatic double-sided cleaning device for cleaning a formed substrate, including a control system, a sensor system, a metal substrate flipping system and a cleaning system. The cleaning system includes a horizontal guide rail, a gantry frame, a transmission mechanism and a cleaning device, and the cleaning device is a high-efficiency cleaning head for dry and wet composite cleaning, which is used to scrub and clean various surfaces of the metal substrate.

[0004] CN112410797A discloses a cleaning device for cleaning a substrate, comprising: a first cleaning device, the first cleaning device comprising a first cleaning liquid; and a second cleaning device, the second cleaning device comprising a second cleaning liquid; a transport device, the transport device being used to transport the substrate to the first cleaning device and the second cleaning device; wherein the first cleaning liquid comprises water, an alkaline substance, a co-solvent and a first surfactant; and the second cleaning liquid comprises water, an acidic substance, a chelating agent and a second surfactant.

[0005] CN107022766A discloses a method for cleaning a metal surface, comprising immersing a metal substrate in a cleaning agent, wherein the cleaning agent is an aqueous solution containing a surfactant, an emulsifier, a chelating agent, a nitrate, a carbonate and a ferrate; the metal substrate is at least one of aluminum, an aluminum alloy, a magnesium alloy and a magnesium-aluminum alloy; and the pH value of the cleaning agent is 8 to 10.

[0006] There are certain technical barriers in existing cleaning equipment, and there are problems with conventional flexible substrate cleaning methods. Therefore, how to provide safe and intelligent operating equipment that can achieve integrated cleaning and drying while improving cleaning efficiency is a technical problem that needs to be solved urgently. Summary of the invention

[0007] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a cleaning method and system device for a metal substrate, which adopts a customized cleaning module, drying module and a matching liquid concentration management device according to the characteristics of the treatment object, thereby realizing safe, intelligent and automatic processing of integrated cleaning and drying.

[0008] To achieve this object, the present invention adopts the following technical solutions:

[0009] In a first aspect, the present invention provides a method for cleaning a metal substrate, the method comprising:

[0010] The metal substrate is sequentially subjected to degreasing cleaning, rust removal treatment, at least two thinning treatments, pickling and neutralization treatments to complete the cleaning of the metal substrate, and then the cleaned metal substrate is dried.

[0011] The metal substrate cleaning method provided by the present invention performs modular treatment on the metal substrate in sequence, and the surface of the treated metal substrate is smooth without dents or scratches, thereby preventing corrosion or softening of the metal substrate, enhancing the cleaning effect and reducing the process cost.

[0012] As a preferred technical solution of the present invention, the cleaning method of the metal substrate further comprises:

[0013] After the degreasing cleaning, the metal substrate is subjected to a hot water wash.

[0014] After the rust removal treatment, the metal substrate is subjected to a second-stage hot water wash.

[0015] After the thinning treatment, the metal substrate is subjected to three-stage hot water washing.

[0016] After the neutralization treatment, the metal substrate is subjected to four-stage hot water washing.

[0017] In the one-stage hot water washing, two-stage hot water washing, three-stage hot water washing and four-stage hot water washing processes, cleaning liquid is used to spray and clean the metal surface.

[0018] The cleaning liquids used in the one-stage hot water washing, the two-stage hot water washing, the three-stage hot water washing and the four-stage hot water washing are RO water respectively.

[0019] As a preferred technical solution of the present invention, the degreasing treatment includes: immersing the metal substrate in a degreasing solution.

[0020] The temperature of the degreasing solution is 40-62°C, for example, it can be 40.0°C, 40.5°C, 42.0°C, 45.0°C, 45.5°C, 48.0°C, 49.5°C, 50.0°C, 50.5°C, 52.0°C, 53.0°C, 54.5°C, 55.0°C, 58.5°C, 60.0°C, 61.5°C or 62°C, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0021] Between two adjacent thinning treatments, the metal substrate is further subjected to water washing.

[0022] The rust removal treatment includes: spraying and cleaning the metal substrate with a rust removal solution.

[0023] The temperature of the rust removing solution is 40-50°C, for example, it can be 40.0°C, 40.5°C, 41.0°C, 41.5°C, 42.0°C, 42.5°C, 44.0°C, 44.5°C, 44.8°C, 45.0°C, 45.2°C, 45.5°C, 46.0°C, 47.0°C, 48.0°C, 49.5°C or 50.0°C, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0024] As a preferred technical solution of the present invention, the thinning treatment includes: spraying and cleaning the metal substrate with an acidic solution.

[0025] The temperature of the acidic liquid is 42-60°C, for example, 42.0°C, 42.5°C, 44.0°C, 44.5°C, 44.8°C, 45.0°C, 45.2°C, 45.5°C, 46.0°C, 47.0°C, 47.5°C, 48.0°C, 50.0°C, 50.5°C, 51.0°C, 51.5°C, 52.0°C, 52.5°C, 54.0°C, 54.5°C, 54.8°C, 55.0°C, 55.2°C, 55.5°C, 56.0°C, 57.0°C, 58.0°C, 59.5°C or 60.0°C, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0026] It should be noted that in the present invention, an acidic agent is used for at least two thinning treatments to remove the metal oxide layer on the surface of the metal substrate. Those skilled in the art can adjust the temperature of the acidic agent during the thinning treatment according to the specific situation, control the agent temperature of the first thinning treatment between 42 and 48°C, and gradually increase the temperature of the subsequent thinning treatments and control it at 50 to 60°C.

[0027] As a preferred technical solution of the present invention, the drying treatment includes purging, dehydrating and drying the metal substrate in sequence.

[0028] The drying temperature is 180-260°C, for example, it can be 180°C, 185°C, 190°C, 195°C, 200°C, 210°C, 220°C, 230°C, 240°C, 245°C, 250°C, 255°C or 260°C, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0029] As a preferred technical solution of the present invention, the cleaning method of the metal substrate also includes: during the cleaning process, the concentration, temperature and recycling of the liquid produced by degreasing cleaning, rust removal treatment, thinning treatment, pickling and neutralization treatment are adjusted.

[0030] The cleaning method of the metal substrate further comprises: after the drying process is completed, performing a destaticizing process on the metal substrate.

[0031] As a preferred technical solution of the present invention, the cleaning method of the metal substrate specifically comprises the following steps:

[0032] (I) using a conveying unit to convey the metal substrate into a cleaning unit, and sequentially performing degreasing cleaning, a first stage hot water washing, rust removal treatment, a second stage hot water washing, at least two secondary thinning treatments, a third stage hot water washing, pickling, neutralization treatment, and a fourth stage hot water washing treatment to complete the cleaning of the metal substrate;

[0033] (II) purging and dehydrating the metal substrate cleaned in step (I) in sequence, and then drying at 180 to 260° C.;

[0034] (III) The metal substrate after drying in step (II) is subjected to static electricity removal treatment.

[0035] In a second aspect, the present invention provides a cleaning system device for a metal substrate, wherein the cleaning system device for a metal substrate is used in the cleaning method for a metal substrate described in the first aspect;

[0036] The cleaning system device for the metal substrate includes a cleaning module and a drying module connected in sequence. The cleaning module includes a degreasing cleaning chamber, a rust removal chamber, at least two thinning chambers, a pickling chamber and a neutralization chamber arranged in sequence. The drying module is used to dry the cleaned metal substrate.

[0037] In the metal substrate cleaning system device provided by the present invention, customized cleaning modules, drying modules and matching liquid treatment devices are used according to the characteristics of the processing object, thereby realizing safe, intelligent and automatic processing of integrated cleaning and drying, and is compatible with raw material thinning processing, thereby enhancing the cleaning effect, achieving technological breakthroughs and reducing costs.

[0038] It should be noted that the metal substrate cleaning system device provided by the present invention has high working efficiency and a wide range of applications, and is particularly suitable for cleaning flexible metal substrates.

[0039] As a preferred technical solution of the present invention, the cleaning module further includes a first-stage hot water washing chamber, a second-stage hot water washing chamber, a third-stage hot water washing chamber and a fourth-stage hot water washing chamber.

[0040] The hot water washing chamber is located between the degreasing cleaning chamber and the rust removal chamber.

[0041] The two-stage hot water washing chamber is located between the rust removal chamber and the thinning chamber.

[0042] The three-stage hot water washing chamber is located between the acid washing chamber and the neutralization chamber.

[0043] The four-stage hot water washing chamber is located between the neutralization chamber and the drying module.

[0044] In the cleaning module, a transition section is respectively arranged between two adjacent chambers.

[0045] The transition section comprises at least two groups of liquid retaining components, and an air curtain is arranged between two adjacent groups of liquid retaining components for purging.

[0046] It should be noted that a transition section is used between two adjacent processing chambers to block the drug liquid and moisture to avoid crosstalk between the drug liquid and reduce the processing effect, and to prevent moisture from causing drug liquid loss. Two sets of professional liquid blocking components (upper and lower liquid blocking rollers) are used to effectively remove the liquid during the transmission of the metal substrate. At the same time, an air curtain is set between the two sets of liquid blocking components to enhance the barrier effect.

[0047] A water washing chamber is also arranged between two adjacent thinning chambers.

[0048] That is, the cleaning module in the present invention includes a degreasing cleaning chamber, a transition section, a first hot water washing chamber, a transition section, a rust removal chamber, a transition section, a second hot water washing chamber, a transition section, a first thinning chamber, a transition section, a second thinning chamber, a transition section, a water washing chamber, a transition section, a pickling chamber, a transition section, a third hot water washing chamber, a transition section, a neutralization chamber, a transition section and a fourth hot water washing chamber, which are arranged in sequence.

[0049] The degreasing cleaning chamber is provided with a soaking tank and an ultrasonic cleaning device, the soaking tank is filled with degreasing liquid, the metal substrate is placed in the soaking tank, and the ultrasonic cleaning device is used to remove attachments on the surface of the metal substrate.

[0050] The first spraying device is independently arranged in the first-stage hot water washing chamber, the second-stage hot water washing chamber, the third-stage hot water washing chamber and the fourth-stage hot water washing chamber.

[0051] The thinning chamber is provided with a second spraying device, the rust removal chamber is provided with a third spraying device, the pickling chamber is provided with a fourth spraying device, and the neutralization chamber is provided with a fifth spraying device.

[0052] It should be noted that the third spray device / fourth spray device / fifth spray device are respectively used in the rust removal chamber / pickling chamber / neutralization chamber, which mainly sprays liquid with a certain pressure and flow rate through the nozzle to remove the metal oxide layer on the surface of the metal substrate to achieve micro-etching.

[0053] The drying module comprises a FR chamber, a dewatering chamber and a drying chamber which are arranged in sequence.

[0054] The FR chamber is provided with a purge device and a liquid storage tank.

[0055] It should be noted that the purge device in the FR chamber of the present invention uses a fan-shaped nozzle, which takes advantage of its strong striking force and adopts a reasonable distribution spacing to clean the glass surface. The liquid storage tank in the FR chamber adopts a step-by-step overflow mode to improve the use efficiency of pure water.

[0056] The dewatering chamber is provided with a wind knife demisting device, and the wind knife demisting device comprises at least two exhaust components.

[0057] It should be noted that the dewatering chamber uses a wind knife defogger to dry the surface of the metal substrate. The wind knife defogger is equipped with two upper / lower sets of exhaust to extract water vapor. A partition is provided above the wind knife to separate the front and back of the wind knife for dry / wet zoning. The overall airflow simulation in the wind knife defogger ensures that the generated water vapor will not contaminate the metal substrate.

[0058] The drying chamber is provided with a suspension drying device.

[0059] It should be noted that the drying chamber uses a suspended oven for full drying, and the metal substrate is truly suspended in the drying tunnel without contact, eliminating scratches and marks. The stability of the metal substrate can be guaranteed under different wind speeds and tensions, and the sine wave curve operation can effectively solve the wrinkling or warping phenomenon.

[0060] As a preferred technical solution of the present invention, the cleaning system device for the metal substrate further includes a transmission unit, and the transmission unit is used to drive the metal substrate to pass through the cleaning module and move into the drying module.

[0061] The transmission unit includes a transmission component, and the transmission component includes a support plate and a driving device. The support plate is used to fix the metal substrate, and the driving device is used to drive the support plate to move and drive the metal substrate to enter the cleaning module, the drying module and the discharging unit in sequence.

[0062] The cleaning system device for the metal substrate also includes a control unit and a liquid treatment unit. The liquid treatment unit is used to respectively adjust the liquid in the degreasing cleaning chamber, the rust removal chamber, at least two thinning chambers, the pickling chamber and the neutralization chamber. The control unit is electrically connected to the liquid treatment unit and the cleaning module respectively.

[0063] The liquid treatment unit includes a degreasing recovery tank, a degreasing storage tank and a degreasing modulation tank. The degreasing recovery tank is used to recover the degreasing liquid in the degreasing cleaning chamber, the degreasing storage tank is used to store the degreasing liquid, and the degreasing modulation tank is used to adjust the concentration of the degreasing liquid.

[0064] The liquid treatment unit includes at least two acid recovery tanks, at least two acid storage tanks, at least two acid modulation tanks, an acid-base concentration management device and an etching storage tank. The acid recovery tank is used to recover the acidic liquid in the thinning chamber, the acid storage tank is used to store the acidic liquid, the acid modulation tank is used to adjust the concentration of the acidic liquid, and the acid-base concentration management device is used to detect the acid recovery tank, the acid storage tank, the acid modulation tank, the acid-base concentration management device and the etching storage tank. The acid concentration management device is used to detect the acidity and alkalinity of the liquid in the acid recovery tank, the acid storage tank, the acid modulation tank, the acid-base concentration management device and the etching storage tank.

[0065] The liquid treatment unit comprises a rust removal recovery tank, a rust removal storage tank and a rust removal modulation tank. The rust removal recovery tank is used to recover the rust removal liquid in the rust removal chamber, the rust removal storage tank is used to store the rust removal liquid, and the rust removal modulation tank is used to adjust the concentration of the rust removal liquid.

[0066] The cleaning system device for the metal substrate also includes a discharging unit, in which a first static electricity removal device and a second static electricity removal device are arranged. The first static electricity removal device and the second static electricity removal device are respectively located at the upper end and the lower end of the metal substrate.

[0067] It should be noted that the discharging unit in the present invention is used for discharging metal substrates, and the upper and lower parts are respectively provided with a first static electricity removal device and a second static electricity removal device to effectively remove the high static electricity state during baking.

[0068] The system refers to an equipment system, a device system or a production device.

[0069] Compared with the prior art, the present invention has the following beneficial effects:

[0070] The present invention provides a metal substrate cleaning method and system device, which adopts a customized cleaning module, a drying module and a matching liquid medicine concentration management device according to the characteristics of the processing object, to realize modular cleaning and drying of the metal substrate in sequence, which is safe, intelligent and automatic, and is compatible with raw material thinning processing. The surface of the treated metal substrate is smooth without dents or scratches, which avoids corrosion or softening of the metal substrate, enhances the cleaning effect and reduces the process cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0071] Figure 1 A schematic structural diagram of a cleaning system for a metal substrate provided in Example 1 of the present invention;

[0072] Figure 2 This is a flow chart of a method for cleaning a metal substrate provided in Example 2 of the present invention.

[0073] Among them, 1-degreasing cleaning chamber; 2-one-stage hot water washing chamber; 3-rust removal chamber; 4-two-stage hot water washing chamber; 5-one-thinning chamber; 6-water washing chamber; 7-two-thinning chamber; 8-pickling chamber; 9-three-stage hot water washing chamber; 10-neutralization chamber; 11-four-stage hot water washing chamber; 12-FR chamber; 13-water removal chamber; 14-drying chamber; 15-first static electricity removal device; 16-second static electricity removal device; 17-metal substrate. DETAILED DESCRIPTION

[0074] It should be understood that, in the description of the present invention, the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0075] It should be noted that in the description of the present invention, unless otherwise clearly specified and limited, the terms "disposed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

[0076] Those skilled in the art should understand that the present invention necessarily includes necessary pipelines, conventional valves and general pump equipment for realizing a complete process, but the above content does not belong to the main inventive point of the present invention. Those skilled in the art can add layouts on their own based on the process flow and equipment structure selection, and the present invention does not make special requirements and specific limitations on this.

[0077] The technical solution of the present invention is further described below with reference to the accompanying drawings and through specific implementation methods.

[0078] In a specific embodiment, the present invention provides a method for cleaning a metal substrate, and the method for cleaning a metal substrate specifically comprises the following steps:

[0079] (1) The metal substrate 17 is sent into the cleaning unit by a conveying unit, and degreasing cleaning, a first stage hot water washing, rust removal treatment, a second stage hot water washing, at least two thinning treatments, a third stage hot water washing, pickling, neutralization treatment and a fourth stage hot water washing treatment are sequentially performed to complete the cleaning of the metal substrate 17;

[0080] (2) sequentially purging, dehydrating and drying the metal substrate 17 cleaned in step (1);

[0081] (3) The metal substrate 17 after drying in step (2) is subjected to static electricity removal treatment.

[0082] In some embodiments, in step (1), between two adjacent thinning treatments, the metal substrate 17 is further subjected to water washing.

[0083] In some embodiments, during the one-stage hot water washing, the two-stage hot water washing, the three-stage hot water washing and the four-stage hot water washing, a cleaning liquid is used to spray clean the metal surface.

[0084] In some embodiments, the degreasing treatment includes: immersing the metal substrate 17 in a degreasing solution, and the temperature of the degreasing solution is 40-62°C.

[0085] In some embodiments, the rust removal treatment includes: spraying and cleaning the metal substrate 17 with a rust removal solution, wherein the temperature of the rust removal solution is 40-50°C.

[0086] In some embodiments, the thinning treatment includes: spraying and cleaning the metal substrate 17 with an acidic solution, wherein the temperature of the acidic solution is 42-60°C.

[0087] In some embodiments, the drying process includes purging, dehydrating and drying the metal substrate 17 in sequence.

[0088] In some embodiments, the drying temperature is 180-260°C.

[0089] In some embodiments, the metal substrate cleaning method further comprises: during the cleaning process, respectively adjusting the concentration, adjusting the temperature and recycling the liquid generated by the degreasing cleaning, rust removal treatment, thinning treatment, pickling and neutralization treatment.

[0090] In some embodiments, the metal substrate cleaning method further comprises: after the drying process is completed, performing a destaticizing process on the metal substrate 17 .

[0091] In another specific embodiment, the present invention provides a cleaning system device for a metal substrate, wherein the cleaning system device for a metal substrate is used in a cleaning method for a metal substrate described in a specific embodiment:

[0092] The cleaning system device for the metal substrate includes a cleaning module and a drying module connected in sequence. The cleaning module includes a degreasing cleaning chamber 1, a rust removal chamber 3, at least two thinning chambers, a pickling chamber 8 and a neutralization chamber 10 arranged in sequence. The drying module is used to dry the cleaned metal substrate 17.

[0093] The transmission unit is used to drive the metal substrate 17 to pass through the cleaning module and move to the drying module.

[0094] A control unit and a liquid treatment unit, wherein the liquid treatment unit is used to respectively adjust the liquid in the degreasing cleaning chamber 1, the rust removal chamber 3, at least two thinning chambers, the pickling chamber 8 and the neutralization chamber 10, and the control unit is electrically connected to the liquid treatment unit and the cleaning module respectively.

[0095] In some embodiments, the cleaning module further comprises a first-stage hot water washing chamber 2, a second-stage hot water washing chamber 4, a third-stage hot water washing chamber 9 and a fourth-stage hot water washing chamber 11. The first-stage hot water washing chamber 2 is located between the degreasing cleaning chamber 1 and the rust removal chamber 3. The second-stage hot water washing chamber 4 is located between the rust removal chamber 3 and the thinning chamber. The third-stage hot water washing chamber 9 is located between the pickling chamber 8 and the neutralization chamber 10. The fourth-stage hot water washing chamber 11 is located between the neutralization chamber 10 and the drying module.

[0096] In some embodiments, the first-stage hot water washing chamber 2, the second-stage hot water washing chamber 4, the third-stage hot water washing chamber 9 and the fourth-stage hot water washing chamber 11 independently include a first spraying device, a storage tank, a driving component and a filtering component, and the first spraying device sprays cleaning liquid onto the surface of the metal substrate 17.

[0097] In some embodiments, the storage tank is provided with an acid-base adjustment component, a first heating component and a first temperature sensing component, and the control unit is electrically connected to the acid-base adjustment component, the first heating component and the first temperature sensing component respectively.

[0098] In the first stage hot water washing chamber 2, the second stage hot water washing chamber 4, the third stage hot water washing chamber 9 and the fourth stage hot water washing chamber 11 of the present invention, the nozzle of the first spraying device is used to spray a cleaning liquid with a certain pressure and flow rate, and the residual liquid on the surface of the metal substrate 17 is replaced and removed to ensure the stability of the surface of the metal substrate 17 in the next process stage. Through the four-stage hot water washing, each section is provided with a storage tank, a driving component (pump), and a filtering component (filter), which are independently supplied, and different pressure and flow adjustments can be achieved. A first heating component and a first temperature sensing component are provided in each storage tank to detect the temperature of the cleaning liquid. Compared with the replacement of normal temperature water, it is more effective to use hot water replacement to remove the residual liquid. At the same time, an acid-base adjustment component is provided in the storage tank to detect the replacement effect of the liquid. The last row of nozzles in the four-stage hot water washing chamber 11 is supplied directly after the factory service is directly supplied in the heating tank, so that the water replacement rate in the tank can be increased to ensure the cleanliness of the water.

[0099] In some embodiments, in the cleaning module, a transition section is provided between two adjacent chambers, and the transition section includes at least two groups of liquid blocking components, and an air curtain is provided between two adjacent groups of liquid blocking components for purging.

[0100] A transition section is used between two adjacent processing chambers to block the drug liquid and moisture, so as to avoid crosstalk between the drug liquid and reduce the processing effect, and to prevent the loss of drug liquid caused by moisture. Two sets of professional liquid blocking components (upper and lower liquid blocking rollers) are used to effectively remove the liquid during the transmission of the metal substrate 17. At the same time, an air curtain is set between the two sets of liquid blocking components to enhance the barrier effect.

[0101] That is, the cleaning module in the present invention includes a degreasing cleaning chamber 1, a transition section, a first-stage hot water washing chamber 2, a transition section, a rust removal chamber 3, a transition section, a second-stage hot water washing chamber 4, a transition section, a first thinning chamber 5, a transition section, a second thinning chamber 7, a transition section, a pickling chamber 8, a transition section, a third-stage hot water washing chamber 9, a transition section, a neutralization chamber 10, a transition section and a fourth-stage hot water washing chamber 11, which are arranged in sequence.

[0102] In some embodiments, the drying module includes a FR chamber 12, a dewatering chamber 13, and a drying chamber 14 which are arranged in sequence.

[0103] In some embodiments, a purge device and a liquid storage tank are provided in the FR chamber 12. The purge device provided in the FR chamber 12 of the present invention uses a fan-shaped nozzle, which takes advantage of its strong striking force and adopts a reasonable distribution spacing to clean the glass surface. The liquid storage tank in the FR chamber 12 adopts a step-by-step overflow mode to improve the use efficiency of pure water.

[0104] In some embodiments, a wind knife demisting device is provided in the dewatering chamber 13, and the wind knife demisting device includes at least two exhaust components. The dewatering chamber 13 uses a wind knife demisting device to dry the surface of the metal substrate 17, wherein the wind knife demisting device is provided with upper / lower two sets of exhaust to extract water vapor, and a partition is provided above the wind knife to separate the front and back of the wind knife to perform dry / wet partitioning, and the overall airflow simulation in the wind knife demisting device ensures that the generated water vapor will not contaminate the metal substrate 17.

[0105] In some embodiments, a suspension drying device is provided in the drying chamber 14. A suspension oven is used in the drying chamber 14 for full drying, and the metal substrate 17 is truly suspended in the drying tunnel without contact, eliminating scratches and marks. The stability of the metal substrate 17 can be guaranteed under different wind speeds and tensions, and the sinusoidal curve operation can effectively solve the wrinkling or warping phenomenon.

[0106] In some embodiments, the degreasing cleaning chamber 1 is provided with a soaking tank and an ultrasonic cleaning device, the soaking tank is filled with degreasing solution, the metal substrate 17 is placed in the soaking tank, and the ultrasonic cleaning device is used to remove attachments on the surface of the metal substrate 17.

[0107] In some embodiments, the liquid treatment unit includes a degreasing recovery tank, a degreasing storage tank and a degreasing modulation tank. The degreasing recovery tank is used to recover the degreasing liquid in the degreasing cleaning chamber 1, the degreasing storage tank is used to store the degreasing liquid, and the degreasing modulation tank is used to adjust the concentration of the degreasing liquid.

[0108] The degreasing recovery tank, the degreasing storage tank and the degreasing modulation tank are independently provided with a second heating component, a first circulation component and a second temperature sensing component which are electrically connected to the control unit respectively.

[0109] The number of degreasing recovery tanks in the liquid treatment unit is one, and the bath is initially prepared to a specified concentration, and the degreasing liquid in the degreasing cleaning chamber 1 is recycled and reused during the treatment process. A second heating component, a first circulation component and a second temperature sensing component are arranged in the tank. The second heating component heats the degreasing liquid. After the second temperature sensing component detects that the temperature of the degreasing liquid reaches the set value, it outputs a signal to the control unit, and the control unit controls the second heating component to stop working. At the same time, the first circulation component stirs the tank to improve the temperature uniformity of the degreasing liquid, and the impurities in the degreasing liquid can be filtered during the circulation process. A concentration management device is arranged in the tank, which is mainly controlled by the conductivity index. A degreasing liquid of a certain concentration has a specific conductivity value, and it can be automatically controlled after the calibration curve is established. Exemplarily, the degreasing liquid can be any one of sodium carbonate, sodium silicate, sodium tripolyphosphate, copper sulfate or octylphenol polyoxyethylene ether, or a combination of at least two.

[0110] The degreasing storage tank is used to keep the degreasing liquid that has been prepared in the bath ratio warm. During the treatment process, a high-precision supply pump is used to quantitatively supply the degreasing recovery tank to ensure the concentration index of the degreasing liquid in the degreasing recovery tank. The degreasing storage tank is equipped with a second heating component, a first circulation component and a second temperature sensing component. The second heating component heats the liquid. After the second temperature sensing component detects that the temperature of the liquid reaches the set value, it outputs a signal to the control unit, and the control unit controls the second heating component to stop working. At the same time, the first circulation component stirs the tank to improve the temperature uniformity of the degreasing liquid, and impurities in the degreasing liquid can be filtered during the circulation process.

[0111] The degreasing modulation tank is used to dilute the liquid medicine and build a bath ratio to a specified concentration. The tank is equipped with a second heating component, a first circulation component and a second temperature sensing component. The second heating component heats the liquid medicine. After the second temperature sensing component detects that the temperature of the liquid medicine reaches the set value, it outputs a signal to the control unit, and the control unit controls the second heating component to stop working. At the same time, the first circulation component stirs the tank to improve the temperature uniformity of the degreasing liquid medicine, and impurities in the degreasing liquid medicine can be filtered during the circulation process. In addition, a concentration management device is also set in the tank, which is mainly controlled by the conductivity index. A degreasing liquid of a certain concentration has a specific conductivity value, which can be automatically controlled after the calibration curve is established.

[0112] The liquid medicine disposal unit also includes a first medicine gas leakage prevention device, which uses a double-layer slot cover, double-layer sealing, and compressed air is introduced at the same time to make it in a positive pressure state. The edge of the slot cover is pressed tightly with a long pressure strip plate, and a cover opening induction sensor is configured. Key electrical components including pumps, motors, etc. are equipped with protective covers, and compressed air is introduced to keep the inside of the protective cover in a positive pressure state to prevent erosion by liquid medicine vapor.

[0113] In some embodiments, a second spraying device is provided in the thinning chamber, a third spraying device is provided in the rust removal chamber 3, a fourth spraying device is provided in the pickling chamber 8, and a fifth spraying device is provided in the neutralization chamber 10.

[0114] The second spraying device is used to spray an acid solution onto the surface of the metal substrate 17, and the third spraying device is used to spray a rust removal solution onto the surface of the metal substrate 17. The fourth spraying device is used to spray a pickling solution onto the surface of the metal substrate 17. The fifth spraying device is used to spray a neutralizing solution onto the surface of the metal substrate 17.

[0115] In some embodiments, two adjacent thinning chambers are further provided with a water washing chamber 6, and a transition section is respectively provided between the water washing chamber 6 and the adjacent thinning chamber.

[0116] When two thinning chambers are used, they are respectively recorded as a primary thinning chamber 5 and a secondary thinning chamber 7 .

[0117] The second spraying device in the primary thinning chamber 5 mainly sprays an acidic liquid with a certain pressure and flow rate through a nozzle to remove the metal oxide layer on the surface of the metal substrate 17 to achieve pre-thinning. The metal substrate 17 enters the primary thinning chamber 5 at a certain speed for micro-etching. Among them, the second spraying device adopts a single-fan nozzle, which takes advantage of its uniform distribution of spray flow and arranges it reasonably to improve the uniformity of rust removal; the nozzle adopts a multi-zone separate control method, and each nozzle is provided with a separate pressure gauge and regulating valve, which can be adjusted separately to ensure the uniformity of the spray flow. In addition, an overflow liquid knife is arranged at the lower part of the outlet of the primary thinning chamber 5 to improve uniformity. For example, the acidic liquid can be any one of nitric acid solution, phosphoric acid solution or dilute sulfuric acid solution, or a combination of at least two.

[0118] The second spraying device in the secondary thinning chamber 7 sprays a strong oxidizing and acidic liquid with a certain pressure and flow rate through a nozzle to remove the metal oxide layer on the surface of the metal substrate 17 to achieve secondary thinning. The metal substrate 17 enters the secondary thinning chamber 7 at a certain speed for thinning. Among them, the second spraying device adopts a single circular nozzle, taking advantage of its uniform distribution of spray flow, and arranges it reasonably. The upper and lower nozzles can be shaken relative to each other, and the shaking distance is 1 / 2 or 3 / 2 of the pipeline height to improve the uniformity of rust removal; the nozzle adopts a multi-zone separate control mode, each nozzle is equipped with a separate pressure gauge and regulating valve, and each spray zone is supplied by an independent pump, which can be adjusted separately to ensure the uniformity of the spray flow. Compensation nozzles are set above and below the outlet of the secondary thinning chamber 7, which can be compensated in a targeted manner, and an overflow liquid knife is set at the bottom to improve uniformity. For example, the acidic liquid may be any one of nitric acid solution, phosphoric acid solution or dilute sulfuric acid solution or a combination of at least two thereof, and the strong oxidizing agent may be any one of HF, NH4F or H2O2.

[0119] In some embodiments, the liquid treatment unit includes a primary acid liquid recovery tank, a primary acid liquid storage tank, a primary acid liquid modulation tank, an acid-base concentration management device and a first etching liquid storage tank, the primary acid liquid recovery tank is used to recover the acidic liquid in the primary thinning chamber 5, the primary acid liquid storage tank is used to store the acidic liquid, the primary acid liquid modulation tank is used to adjust the concentration of the acidic liquid, and the acid-base concentration management device is used to detect the pH of the liquid in the primary acid liquid recovery tank, the primary acid liquid storage tank, the primary acid liquid modulation tank, the acid-base concentration management device and the first etching liquid storage tank.

[0120] The primary acid solution recovery tank, the primary acid solution storage tank, the primary acid solution modulation tank and the first etching solution storage tank are independently provided with a third heating component, a second circulation component and a third temperature sensing component, and the third heating component, the second circulation component and the third temperature sensing component are respectively electrically connected to the control unit.

[0121] In some embodiments, the liquid treatment unit includes a secondary acid liquid recovery tank, a secondary acid liquid storage tank, a secondary acid liquid modulation tank, an acid-base concentration management device and a second etching liquid storage tank, the secondary acid liquid recovery tank is used to recover the strong oxidizing liquid in the secondary thinning chamber 7, the secondary acid liquid storage tank is used to store the strong oxidizing liquid, the secondary acid liquid modulation tank is used to adjust the concentration of the strong oxidizing liquid, and the acid-base concentration management device is used to detect the acidity and alkalinity of the liquid in the secondary acid liquid recovery tank, the secondary acid liquid storage tank, the secondary acid liquid modulation tank, the acid-base concentration management device and the second etching liquid storage tank.

[0122] The secondary acid solution recovery tank, the secondary acid solution storage tank, the secondary acid solution modulation tank and the second etching solution storage tank are independently provided with a third heating component, a second circulation component and a third temperature sensing component, and the third heating component, the second circulation component and the third temperature sensing component are respectively electrically connected to the control unit.

[0123] The number of the primary acid liquid recovery tank and the secondary acid liquid recovery tank is one, and the bath is initially built to a specified concentration, and the liquid in the primary thinning chamber 5 or the secondary thinning chamber 7 is recycled and reused. The primary acid liquid recovery tank and the secondary acid liquid recovery tank are respectively provided with a third heating component, a second circulation component and a third temperature sensing component. The third heating component heats the liquid medicine, and after the temperature sensing component detects that the liquid medicine temperature reaches the set value, it outputs a signal to the control unit, and the control unit controls the third heating component to stop working. At the same time, the cooling system starts to work, and the liquid medicine temperature is lowered by cooling water. When it is lower than the set value, the temperature sensing component outputs a signal to the control unit, and the control unit controls the cooling system to stop working, and the third heating component starts to work at the same time, and the cycle is repeated, and the deviation between the actual temperature of the liquid medicine and the set temperature is controlled to be no more than ±0.5°C. The circulation component stirs the tank to improve the temperature uniformity of the liquid medicine, and impurities in the liquid medicine can be filtered during the circulation process. For the acidic liquid in the tank, an acid-base concentration management device is used to sample the solution in the tank. Different acids have different ionization degrees, and the consumed alkaline liquid is different, so the mixed acid concentration data is determined, and the process can be automatically controlled.

[0124] The primary acid storage tank and the secondary acid storage tank are used to keep the liquid medicine that has been prepared and proportioned. During the treatment process, a high-precision supply pump is used to quantitatively supply the primary acid recovery tank or the secondary acid storage tank to ensure the concentration index of the liquid medicine. The primary acid storage tank and the secondary acid storage tank are respectively provided with a third heating component, a second circulation component and a third temperature sensing component. The heating component heats the liquid medicine. After the temperature sensing component detects that the temperature of the liquid medicine reaches the set value, it outputs a signal to the control unit. The control unit controls the heating component to stop working. At the same time, the circulation component stirs the tank to improve the temperature uniformity of the liquid medicine. Impurities in the liquid medicine can be filtered during the circulation process.

[0125] The primary acid solution modulation tank and the secondary acid solution modulation tank are used to dilute the liquid medicine respectively and build a bath ratio to a specified concentration. The tank is provided with a third heating component, a second circulation component and a third temperature sensing component. The heating component heats the liquid medicine. After the temperature sensing component detects that the liquid medicine temperature reaches the set value, it outputs a signal to the control unit. The control unit controls the heating component to stop working. At the same time, the circulation component stirs the tank to improve the temperature uniformity of the liquid medicine. Impurities in the liquid medicine can be filtered during the circulation process. For the mixed acid solution in the tank, an acid-base concentration management device is used. Sampling is mainly carried out through the solution in the tank. Different acids have different ionization degrees, and the consumption of alkaline liquid medicine is different, so the liquid medicine concentration data is determined to achieve automated control.

[0126] Two first etching liquid reservoirs and two second etching liquid reservoirs can be provided, one of which is for standby. A third heating component, a second circulation component and a third temperature sensing component are respectively provided in the first etching liquid reservoir and the second etching liquid reservoir. The heating component heats the liquid medicine, and after the temperature sensing component detects that the liquid medicine temperature reaches the set value, it outputs a signal to the control unit, and the control unit controls the heating component to stop working. At the same time, the cooling system starts working to lower the liquid medicine temperature through cooling water. When it is lower than the set value, the temperature sensing component outputs a signal to the control unit, and the control unit controls the cooling system to stop working, and the heating component starts working, and this cycle is repeated, and the deviation between the actual temperature of the liquid medicine and the set temperature is controlled to be no more than ±0.5°C.

[0127] In some embodiments, the liquid medicine disposal unit further includes two second medicine gas leakage prevention devices, one for the primary thinning chamber 5 and the other for the secondary thinning chamber 7, wherein the upper groove of the second medicine gas leakage prevention device adopts a double-layer groove cover, double-layer sealing, and compressed air is introduced at the same time to make it in a positive pressure state to prevent the erosion of liquid medicine vapor. The edge of the groove cover is pressed tightly with a long pressure strip plate, and a cover opening induction sensor is configured. The entrance / exit of the liquid medicine tank is provided with a movable protective window. When there is no metal substrate 17 entering or exiting, the interactive protective window is closed to reduce the leakage of acid gas.

[0128] In some embodiments, the rust removal chamber 3 / pickling chamber 8 / neutralization chamber 10 respectively use a third spraying device / a fourth spraying device / a fifth spraying device, which mainly sprays a certain pressure and flow of liquid through a nozzle to remove the metal oxide layer on the surface of the metal substrate 17 to achieve micro-etching. The metal substrate 17 enters the rust removal chamber 3 / pickling chamber 8 / neutralization chamber 10 at a certain speed for micro-etching. Exemplarily, the rust removal liquid can be any one of hydrochloric acid, oxalic acid, ammonium molybdate, sodium dodecyl sulfate or sodium dodecyl sulfonate or a combination of at least two; the pickling liquid can be any one of nitric acid solution, phosphoric acid solution or dilute sulfuric acid solution or a combination of at least two; the neutralization liquid can be any one of sodium hydroxide, sodium carbonate, sodium bicarbonate, ammonium carbonate or ammonium bicarbonate or a combination of at least two.

[0129] In some embodiments, the liquid treatment unit includes a rust removal recovery tank, a rust removal storage tank and a rust removal modulation tank. The rust removal recovery tank is used to recover the rust removal liquid in the rust removal chamber 3, the rust removal storage tank is used to store the rust removal liquid, and the rust removal modulation tank is used to adjust the concentration of the rust removal liquid.

[0130] Among them, the third spraying device in the rust removal chamber 3 adopts a single fan nozzle, which takes advantage of its even distribution of spray flow and arranges it reasonably to improve the uniformity of rust removal. The spray pipe adopts a multi-zone separate control method. Each spray pipe is equipped with a separate pressure gauge and regulating valve, which can be adjusted separately to ensure the uniformity of spray flow. An overflow liquid knife is set at the lower part of the outlet of the rust removal chamber 3 to improve uniformity.

[0131] The number of rust removal recovery tanks in the liquid medicine disposal unit is one. Initially, the bath is prepared to the specified concentration, and the liquid medicine in the rust removal chamber 3 is recycled and reused. The tank is provided with a fourth heating component, a third circulation component, a fourth temperature sensing component and a cooling system. The fourth heating component heats the liquid medicine. After the fourth temperature sensing component detects that the liquid medicine temperature reaches the set value, it outputs a signal to the control unit. The control unit controls the heating component to stop working, and the cooling system starts working at the same time, and the liquid medicine temperature is lowered by cooling water. When it is lower than the set value, the fourth temperature sensing component outputs a signal to the control unit, and the control unit controls the cooling system to stop working, and the fourth heating component starts working at the same time. This cycle is repeated, and the deviation between the actual temperature of the liquid medicine and the set temperature is controlled to be no more than ±1°C. The third circulation component stirs the tank to improve the temperature uniformity of the liquid medicine, and at the same time, the impurities in the liquid medicine can be filtered during the circulation process. A concentration management device is set in the tank, which is mainly controlled by the pH index. A liquid medicine of a certain concentration has a characteristic pH value, which can be automatically controlled after the calibration curve is established.

[0132] Rust removal storage tank: Keep the liquid medicine that has been prepared in the bath ratio warm, and use a high-precision supply pump to quantitatively supply it to the rust removal recovery tank to ensure the concentration index of the liquid medicine in the rust removal recovery tank. The tank is equipped with a fourth heating component, a third circulation component, a fourth temperature sensing component and a cooling system. The fourth heating component heats the liquid medicine, and when the fourth temperature sensing component detects that the temperature of the liquid medicine reaches the set value, it outputs a signal to the control unit, and the control unit controls the fourth heating component to stop working. At the same time, the third circulation component stirs the tank to improve the temperature uniformity of the liquid medicine, and the impurities in the liquid medicine can be filtered during the circulation process.

[0133] Rust removal modulation tank: dilute the liquid medicine, build a bath ratio to the specified concentration, and set up a fourth heating component, a third circulation component, a fourth temperature sensor component and a cooling system in the tank. The fourth heating component heats the liquid medicine. After the fourth temperature sensor component detects that the temperature of the liquid medicine reaches the set value, it outputs a signal to the control unit. The control unit controls the fourth heating component to stop working. At the same time, the third circulation component stirs the tank to improve the temperature uniformity of the liquid medicine. Impurities in the liquid medicine can be filtered during the circulation process. A concentration management device is set in the tank, which mainly notifies the conductivity index for control. Alkaline liquid medicine of a certain concentration has a characteristic conductivity value, which can be automatically controlled after calibration and establishment of the curve.

[0134] In some embodiments, the liquid treatment unit includes a pickling recovery tank, a pickling storage tank and a pickling modulation tank. The pickling recovery tank is used to recover the pickling liquid in the pickling chamber 8, the pickling storage tank is used to store the pickling liquid, and the pickling modulation tank is used to adjust the concentration of the rust removal liquid.

[0135] In some embodiments, the liquid medicine disposal unit includes a neutralization recovery tank, a neutralization storage tank and a neutralization modulation tank. The neutralization recovery tank is used to recover the neutralization liquid medicine in the neutralization chamber 10, the neutralization storage tank is used to store the neutralization liquid medicine, and the neutralization modulation tank is used to adjust the concentration of the neutralization liquid medicine.

[0136] In some embodiments, the drug liquid disposal unit also includes a third drug gas leakage prevention device, which is aimed at the rust removal chamber 3. The third drug gas leakage prevention device adopts a double-layer slot cover and a double-layer seal. Compressed air is introduced at the same time to make it in a positive pressure state to prevent erosion by drug liquid vapor. The edge of the slot cover is pressed tightly with a long pressure strip plate and is equipped with a cover opening sensing sensor.

[0137] In some embodiments, the cleaning system for metal substrates further comprises a discharging unit, and the discharging unit is connected to the drying module. The discharging unit is provided with a first static electricity removal device 15 and a second static electricity removal device 16, and the first static electricity removal device 15 and the second static electricity removal device 16 are respectively located at the upper end and the lower end of the metal substrate 17.

[0138] In some embodiments, the transmission unit includes a conveying component, and the conveying component includes a support plate and a driving device. The support plate is used to fix the metal substrate 17, and the driving device is used to drive the support plate to move and drive the metal substrate 17 to enter the cleaning module, the drying module and the discharging unit in sequence.

[0139] In some embodiments, the discharging unit of the present invention is used to discharge the metal substrate 17, and the upper and lower parts are respectively provided with a first static electricity removal device 15 and a second static electricity removal device 16 to effectively remove the high static electricity state during baking.

[0140] The working principles of the first static electricity removal device 15 and the second static electricity removal device 16 are as follows:

[0141] (1) Cavitation: Cavitation is the process of ultrasonic waves being transmitted to liquids in a high-frequency conversion mode of interactive compression and decompression at more than 20,000 times per second. When decompression occurs, vacuum nucleus bubbles are generated in the liquid. When compression occurs, the vacuum nucleus bubbles are crushed by pressure and generate a strong impact force, thereby stripping away dirt on the surface of the object being cleaned, thereby achieving the purpose of precise cleaning. At the same time, the cavitation effect of the frequency-hopping acoustic wave matrix cleaning device is enhanced in hot water containing dissolved H2, thereby enhancing its cleaning ability.

[0142] (2) Straight flow: The phenomenon that ultrasonic waves generate flow in the liquid along the direction of sound propagation is called straight flow. 2 The naked eye can see the straight flow, which flows perpendicular to the vibration surface with a flow rate of about 10cm / s. The micro-oil dirt on the surface of the object being cleaned is stirred by this straight flow, and the cleaning liquid on the surface of the dirt also produces convection. The dissolving liquid that dissolves the dirt mixes with the new liquid, which speeds up the dissolution rate and plays a great role in the transportation of dirt.

[0143] Example 1

[0144] This embodiment provides a cleaning system device for a metal substrate, such as Figure 1 As shown, it includes a cleaning module and a drying module connected in sequence, and the cleaning module includes a degreasing cleaning chamber 1, a transition section, a first hot water washing chamber 2, a transition section, a rust removal chamber 3, a transition section, a second hot water washing chamber 4, a transition section, a first thinning chamber 5, a transition section, a water washing chamber 6, a transition section, a second thinning chamber 7, a transition section, a pickling chamber 8, a transition section, a third hot water washing chamber 9, a transition section, a neutralization chamber 10, a transition section and a fourth hot water washing chamber 11. The transition section is two groups of liquid retaining rollers, and an air curtain is arranged between two adjacent groups of liquid retaining rollers for purging.

[0145] The first-stage hot water washing chamber 2, the second-stage hot water washing chamber 4, the third-stage hot water washing chamber 9 and the fourth-stage hot water washing chamber 11 independently include a first spraying device, a storage tank, a driving component and a filtering component. The first spraying device is used to spray cleaning liquid onto the surface of the metal substrate 17. The liquid storage tank is provided with an acid-base adjustment component, a first heating component and a first temperature sensing component.

[0146] The degreasing cleaning chamber 1 is provided with a soaking tank and an ultrasonic cleaning device, and the soaking tank is filled with degreasing liquid. The soaking tank is also connected to the degreasing recovery tank, the degreasing storage tank and the degreasing modulation tank, and the degreasing recovery tank, the degreasing storage tank and the degreasing modulation tank are independently provided with a second heating component, a first circulation component and a second temperature sensing component, and a first drug gas leakage prevention device.

[0147] A second spraying device is respectively provided in the primary thinning chamber 5 and the secondary thinning chamber 7. The second spraying device in the primary thinning chamber 5 mainly sprays acidic liquid with a certain pressure and flow rate through a nozzle, and the second spraying device in the secondary thinning chamber 7 sprays strong oxidizing and acidic liquid with a certain pressure and flow rate through a nozzle.

[0148] The second spray device in the primary thinning chamber 5 is also equipped with a primary acid recovery tank, a primary acid storage tank, a primary acid modulation tank, an acid-base concentration management device, a first etching liquid storage tank and a second drug gas leakage prevention device. The primary acid recovery tank, the primary acid storage tank, the primary acid modulation tank and the first etching liquid storage tank are independently provided with a third heating component, a second circulation component, a third temperature sensing component and a cooling system.

[0149] The second spray device in the secondary thinning chamber 7 is also equipped with a secondary acid recovery tank, a secondary acid storage tank, a secondary acid modulation tank, an acid-base concentration management device, a second etching liquid storage tank and a second drug gas leakage prevention device. The secondary acid recovery tank, the secondary acid storage tank, the secondary acid modulation tank and the second etching liquid storage tank are independently provided with a third heating component, a second circulation component, a third temperature sensing component and a cooling system.

[0150] The rust removal chamber 3 is provided with a third spraying device, the pickling chamber 8 is provided with a fourth spraying device, and the neutralization chamber 10 is provided with a fifth spraying device. The third spraying device is also equipped with a rust removal recovery tank, a rust removal storage tank, a rust removal modulation tank and a third drug gas leakage prevention device. The rust removal recovery tank, the rust removal storage tank and the rust removal modulation tank are provided with a fourth heating component, a third circulation component, a fourth temperature sensing component and a cooling system. The pickling chamber 8 is provided with a pickling recovery tank, a pickling storage tank and a pickling modulation tank. The neutralization chamber 10 is provided with a neutralization recovery tank, a neutralization storage tank and a neutralization modulation tank.

[0151] The drying module is sequentially provided with a FR chamber 12, a dewatering chamber 13 and a drying chamber 14, which are used to dry the cleaned metal substrate 17. The FR chamber 12 is connected to the four-stage hot water washing chamber 11, and the metal substrate 17 after the cleaning module is dried. A purge device and a liquid storage tank are provided in the FR chamber 12. The dewatering chamber 13 is provided with an air knife demisting device, and the air knife demisting device has two exhaust components. The drying chamber 14 is provided with an air flotation drying device for drying.

[0152] The cleaning system for metal substrates also includes a discharging unit for discharging metal substrates 17, and a first static electricity removal device 15 and a second static electricity removal device 16 are respectively provided at the upper and lower parts to effectively remove the high static electricity state caused by baking.

[0153] The cleaning system device for the metal substrate also includes a transmission unit, which includes a transmission component. The transmission component includes a support plate and a drive device. The support plate is used to fix the metal substrate 17, and the drive device is used to drive the support plate to move and drive the metal substrate 17 to enter the cleaning module, drying module and discharge unit in turn.

[0154] Example 2

[0155] This embodiment provides a method for cleaning a metal substrate. Figure 2 As shown, the specific steps include:

[0156] (1) The conveying unit conveys the metal substrate 17 into the cleaning unit through the guide plate. The metal substrate 17 is first immersed in a degreasing liquid for degreasing treatment. The temperature of the degreasing liquid used is 55° C. Then, RO water is sprayed on the surface of the metal substrate 17 for a hot water washing treatment;

[0157] (2) spraying a rust removal solution onto the surface of the metal substrate 17 after the first hot water wash in step (1) to remove rust, wherein the temperature of the rust removal solution is 45° C., and then spraying RO water onto the surface of the metal substrate 17 to perform a second hot water wash;

[0158] (3) spraying an acidic liquid onto the surface of the metal substrate 17 after the second hot water wash in step (2) to perform a thinning treatment, wherein the temperature of the acidic liquid is 45° C.;

[0159] (4) washing the metal substrate 17 after the primary thinning treatment in step (3), and then spraying an acid solution on the surface of the metal substrate 17 for secondary thinning treatment, wherein the temperature of the acid solution is 55° C.;

[0160] (5) spraying an acid cleaning solution onto the surface of the metal substrate 17 after the secondary thinning treatment in step (4) to remove rust, and then spraying RO water onto the surface of the metal substrate 17 to perform a three-stage hot water washing treatment;

[0161] (6) spraying a neutralizing solution onto the surface of the metal substrate 17 after the pickling treatment in step (5) for neutralization treatment, and then spraying RO water onto the surface of the metal substrate 17 for four-stage hot water washing treatment;

[0162] (7) The metal substrate 17 is then purged in sequence, and then a wind knife demisting device is used to dry the surface of the metal substrate 17, and finally, the metal substrate 17 is dried at 240° C. to complete the drying of the metal substrate 17;

[0163] (8) The dried metal substrate 17 is transferred to the discharging unit, and static electricity is removed by the first static electricity removal device 15 and the second static electricity removal device 16 respectively arranged at the upper and lower parts, thereby completing the cleaning of the metal substrate 17.

[0164] After cleaning, the surface of the metal substrate 17 is smooth without dents or scratches, the edge of the substrate does not curl, the contact angle is 15°, and the partial thickness deviation is ±0.2 μm.

[0165] Example 3

[0166] This embodiment provides a method for cleaning a metal substrate, which specifically includes the following steps:

[0167] (1) The conveying unit conveys the metal substrate 17 into the cleaning unit through a guide plate, and firstly immerses the metal substrate 17 in a degreasing solution for degreasing treatment. The temperature of the degreasing solution used is 54° C. Then, RO water is sprayed on the surface of the metal substrate 17 for a hot water washing treatment;

[0168] (2) spraying a rust removal solution onto the surface of the metal substrate 17 after the first hot water wash in step (1) for rust removal, wherein the temperature of the rust removal solution is 43° C., and then spraying RO water onto the surface of the metal substrate 17 for a second hot water wash;

[0169] (3) spraying an acidic liquid onto the surface of the metal substrate 17 after the second hot water wash in step (2) to perform a thinning treatment, wherein the temperature of the acidic liquid is 42° C.;

[0170] (4) washing the metal substrate 17 after the primary thinning treatment in step (3), and then spraying an acid solution on the surface of the metal substrate 17 for secondary thinning treatment, wherein the temperature of the acid solution is 56° C.;

[0171] (5) spraying an acid cleaning solution onto the surface of the metal substrate 17 after the secondary thinning treatment in step (4) to remove rust, and then spraying RO water onto the surface of the metal substrate 17 to perform a three-stage hot water washing treatment;

[0172] (6) spraying a neutralizing solution onto the surface of the metal substrate 17 after the pickling treatment in step (5) for neutralization treatment, and then spraying RO water onto the surface of the metal substrate 17 for four-stage hot water washing treatment;

[0173] (7) The metal substrate 17 is then purged in sequence, and then a wind knife demisting device is used to dry the surface of the metal substrate 17, and finally, the metal substrate 17 is dried at 200° C. to complete the drying of the metal substrate 17;

[0174] (8) The dried metal substrate 17 is transferred to the discharging unit, and static electricity is removed by the first static electricity removal device 15 and the second static electricity removal device 16 respectively arranged at the upper and lower parts, thereby completing the cleaning of the metal substrate 17.

[0175] After cleaning, the surface of the metal substrate 17 is smooth without dents or scratches, the edge of the substrate does not curl, the contact angle is 18°, and the partial thickness deviation is ±0.2 μm.

[0176] Example 4

[0177] This embodiment provides a method for cleaning a metal substrate, which specifically includes the following steps:

[0178] (1) The conveying unit conveys the metal substrate 17 into the cleaning unit through a guide plate. The metal substrate 17 is first immersed in a degreasing liquid for degreasing treatment. The temperature of the degreasing liquid used is 60° C. Then, RO water is sprayed on the surface of the metal substrate 17 for a hot water washing treatment;

[0179] (2) spraying a rust removal solution onto the surface of the metal substrate 17 after the first hot water wash in step (1) for rust removal, wherein the temperature of the rust removal solution is 50° C., and then spraying RO water onto the surface of the metal substrate 17 for a second hot water wash;

[0180] (3) spraying an acid solution on the surface of the metal substrate 17 after the second hot water wash in step (2) to perform a thinning treatment, wherein the temperature of the acid solution is 48° C.;

[0181] (4) washing the metal substrate 17 after the primary thinning treatment in step (3), and then spraying an acidic solution on the surface of the metal substrate 17 for secondary thinning treatment, wherein the temperature of the acidic solution is 52° C.;

[0182] (5) spraying an acid cleaning solution onto the surface of the metal substrate 17 after the secondary thinning treatment in step (4) to remove rust, and then spraying RO water onto the surface of the metal substrate 17 to perform a three-stage hot water washing treatment;

[0183] (6) spraying a neutralizing solution onto the surface of the metal substrate 17 after the pickling treatment in step (5) for neutralization treatment, and then spraying RO water onto the surface of the metal substrate 17 for four-stage hot water washing treatment;

[0184] (7) The metal substrate 17 is then purged in sequence, and then a wind knife demisting device is used to dry the surface of the metal substrate 17, and finally, the metal substrate 17 is dried at 180° C. to complete the drying of the metal substrate 17;

[0185] (8) The dried metal substrate 17 is transferred to the discharging unit, and static electricity is removed by the first static electricity removal device 15 and the second static electricity removal device 16 respectively arranged at the upper and lower parts, thereby completing the cleaning of the metal substrate 17.

[0186] After cleaning, the surface of the metal substrate 17 is smooth without dents or scratches, the edge of the substrate does not curl, the contact angle is 20°, and the partial thickness deviation is ±0.2 μm.

[0187] Comparative Example 1

[0188] This comparative example provides a method for cleaning a metal substrate, which differs from Example 2 in that the primary thinning treatment in step (3) and the secondary thinning treatment in step (4) are not performed, and the remaining operating conditions and process parameters are exactly the same as those in Example 1.

[0189] After cleaning, the surface of the metal substrate 17 is smooth with dents, the edge of the substrate does not curl, the contact angle is 35°, and the partial thickness deviation is ±0.5 μm.

[0190] It can be seen from Examples 1 to 3 that by using the cleaning method provided by the present invention, the metal substrate 17 is modularly treated in sequence. The surface of the treated metal substrate 17 is smooth without dents or scratches. The metal substrate 17 is corroded or softened, the contact angle is ≤20°, and the thickness deviation of the metal substrate 17 is ±0.2μm, which enhances the cleaning effect and reduces the process cost.

[0191] It can be seen from Example 1 and Comparative Example 1 that the contact angle of the metal substrate 17 after cleaning in Comparative Example 1 is increased, and the thickness deviation is greater than that in Example 1. This is mainly because in Example 1, a primary thinning treatment is used for pre-thinning, and then a secondary thinning treatment is performed, which can effectively remove the metal oxide layer, reduce the contact angle of the metal substrate 17, and improve the uniformity of rust removal.

[0192] In the metal substrate cleaning system device provided by the present invention, customized cleaning modules, drying modules and matching liquid concentration management devices are used according to the characteristics of the processing object, so that the metal substrate 17 can be sequentially subjected to modular cleaning and drying in an integrated, safe, intelligent and automatic manner, and is compatible with raw material thinning processing. The surface of the treated metal substrate 17 is smooth without dents or scratches, thereby preventing the metal substrate 17 from corrosion or softening and enhancing the cleaning effect.

[0193] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A method for cleaning a metal substrate, characterized in that: The cleaning method of the metal substrate comprises: The metal substrate is sequentially subjected to degreasing cleaning, a first-stage hot water washing, rust removal treatment, a second-stage hot water washing, at least two thinning treatments, a third-stage hot water washing, pickling, neutralization treatment and a fourth-stage hot water washing to complete the cleaning of the metal substrate, and then the cleaned metal substrate is dried; The degreasing cleaning comprises: immersing the metal substrate in a degreasing liquid; the temperature of the degreasing liquid is 50-55°C; The rust removal treatment comprises: spraying and cleaning the metal substrate with a rust removal solution; the temperature of the rust removal solution is 42.5-45°C; The thinning treatment includes: spraying and cleaning the metal substrate with an acidic liquid, controlling the temperature of the agent for the first thinning treatment to be between 42 and 48° C., gradually increasing the temperature of the subsequent thinning treatment and controlling it to be between 55 and 60° C.; The acidic liquid for the first thinning treatment includes any one of a nitric acid solution, a phosphoric acid solution or a dilute sulfuric acid solution or a combination of at least two thereof; The acidic liquid for the subsequent thinning treatment includes any one of nitric acid solution, phosphoric acid solution or dilute sulfuric acid solution or a combination of at least two thereof and any one of HF, NH4F or H2O2; The pickling comprises: spraying a pickling solution onto the surface of the metal substrate; the pickling solution comprises any one of a nitric acid solution, a phosphoric acid solution or a dilute sulfuric acid solution or a combination of at least two thereof; The cleaning liquids used in the one-stage hot water washing, the two-stage hot water washing, the three-stage hot water washing and the four-stage hot water washing are RO water respectively.

2. The method for cleaning a metal substrate according to claim 1, characterized in that: In the one-stage hot water washing, two-stage hot water washing, three-stage hot water washing and four-stage hot water washing processes, cleaning liquid is used to spray and clean the metal surface.

3. The method for cleaning a metal substrate according to claim 1, characterized in that: The temperature of the acidic liquid is 42-60°C; Between two adjacent thinning treatments, the metal substrate is further subjected to water washing.

4. The method for cleaning a metal substrate according to claim 1, characterized in that: The drying process includes purging, dehydrating and drying the metal substrate in sequence; The drying temperature is 180-260°C.

5. The method for cleaning a metal substrate according to claim 1, characterized in that: The cleaning method of the metal substrate further comprises: in the cleaning process, respectively adjusting the concentration, adjusting the temperature and recycling the liquid produced by degreasing cleaning, rust removal treatment, thinning treatment, pickling and neutralization treatment; The cleaning method of the metal substrate further comprises: after the drying process is completed, performing a destaticizing process on the metal substrate.

6. The method for cleaning a metal substrate according to claim 1, characterized in that: The cleaning method of the metal substrate specifically comprises the following steps: (I) using a conveying unit to convey the metal substrate into a cleaning unit, and sequentially performing degreasing cleaning, a first stage hot water washing, rust removal treatment, a second stage hot water washing, at least two secondary thinning treatments, a third stage hot water washing, pickling, neutralization treatment, and a fourth stage hot water washing treatment to complete the cleaning of the metal substrate; (II) purging and dehydrating the metal substrate cleaned in step (I) in sequence, and then drying at 180 to 260° C.; (III) The metal substrate after drying in step (II) is subjected to static electricity removal treatment.

7. A cleaning system for a metal substrate, characterized in that: The metal substrate cleaning system device is used in the metal substrate cleaning method according to any one of claims 1 to 6; The cleaning system device for the metal substrate includes a cleaning module and a drying module connected in sequence. The cleaning module includes a degreasing cleaning chamber, a first-stage hot water washing chamber, a rust removal chamber, a second-stage hot water washing chamber, at least two thinning chambers, a third-stage hot water washing chamber, a pickling chamber, a neutralization chamber and a fourth-stage hot water washing chamber arranged in sequence. The drying module is used to dry the cleaned metal substrate.

8. The cleaning system for metal substrate according to claim 7, characterized in that: In the cleaning module, a transition section is provided between two adjacent chambers; the transition section includes at least two groups of liquid blocking components, and an air curtain is provided between the two adjacent groups of liquid blocking components for purging; A water washing chamber is also provided between two adjacent thinning chambers; The degreasing cleaning chamber is provided with a soaking tank and an ultrasonic cleaning device, the soaking tank is filled with a degreasing solution, the metal substrate is placed in the soaking tank, and the ultrasonic cleaning device is used to remove attachments on the surface of the metal substrate; The first stage hot water washing chamber, the second stage hot water washing chamber, the third stage hot water washing chamber and the fourth stage hot water washing chamber are independently provided with a first spraying device; The thinning chamber is provided with a second spraying device, the rust removal chamber is provided with a third spraying device, the pickling chamber is provided with a fourth spraying device, and the neutralization chamber is provided with a fifth spraying device; The drying module comprises a FR chamber, a water removal chamber and a drying chamber arranged in sequence; The FR chamber is provided with a purge device and a liquid storage tank; The dewatering chamber is provided with an air knife demisting device, and the air knife demisting device comprises at least two air extraction components; The drying chamber is provided with a suspension drying device.

9. The cleaning system for metal substrates according to claim 7, characterized in that: The cleaning system device for the metal substrate further comprises a transmission unit, and the transmission unit is used to drive the metal substrate to pass through the cleaning module and move to the drying module; The cleaning system device for the metal substrate further includes a control unit and a liquid treatment unit, wherein the liquid treatment unit is used to respectively adjust the liquid in the degreasing cleaning chamber, the rust removal chamber, at least two thinning chambers, the pickling chamber and the neutralization chamber, and the control unit is electrically connected to the liquid treatment unit and the cleaning module respectively; The cleaning system device for the metal substrate also includes a discharging unit, in which a first static electricity removal device and a second static electricity removal device are arranged. The first static electricity removal device and the second static electricity removal device are respectively located at the upper end and the lower end of the metal substrate.

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