A method for carving crystal glass
By adjusting the laser marking parameters and coating layer, the problems of unclear patterns and insufficient three-dimensionality in crystal glass engraving are solved, and efficient and fine pattern engraving effect is achieved.
Patent Information
- Application Number
- CN202210714389.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-06-22
- Publication Date
- 2025-08-01
- Estimated Expiration
- 2042-06-22
AI Technical Summary
The prior art has the problem that the pattern does not have 3D three-dimensionality and unclear outline when engraving patterns on crystal glass, especially when using laser marking technology, the pattern is prone to falling off, scratches and diffusion.
By setting the laser wavelength range to infrared light, the marking speed is 500mm/s to 800mm/s, and the marking depth is 0.02mm to 0.08mm, combining the filling direction, filling spacing and angle, position and distance determination are performed, and laser engraving is used for crystal glass with coating layers such as silver, chromium, aluminum, gold, copper, and platinum layers.
The 3D three-dimensional effect of the pattern is achieved and the outline is clear, which avoids pattern edge collapse defects and thermal deformation, and improves the engraving efficiency and yield.
Smart Images

Figure CN115156722B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of glass processing, in particular to a crystal glass engraving method. Background Art
[0002] Decorative items made of crystal glass are widely used in daily life, such as colorful crystal wine glasses and crystal glass murals that appear in the sunlight. They are widely loved for their high transparency, texture, and clarity. However, due to the scarcity and difficulty of mining natural crystal, which cannot meet people's demand, artificial crystal glass has become an indispensable part of daily decoration.
[0003] In recent years, there has been an increasing demand for engraving text or designs on crystal glass. For example, car start buttons and rotary knobs often use crystal glass as the base, with designs and text printed on the surface using ink. However, ink can easily fall off or be scratched during use, damaging the design. Furthermore, when ink is printed directly on the crystal glass surface, the printed edges may spread.
[0004] Laser marking uses lasers to create patterns or text on surfaces. Compared to ordinary light sources, lasers offer the following advantages: First, their directional illumination is tens of millions of times stronger than ordinary light sources; second, their energy is highly concentrated, allowing them to act on a tiny point. Absorption by the material generates instantaneous high pressure and high temperatures, reaching temperatures ranging from tens of thousands to millions of degrees Celsius; third, their wavelength is limited to a spectrum of less than one ten-thousandth of a nanometer, resulting in excellent monochromatic properties; and fourth, their coherence minimizes interference between light of different frequencies. Leveraging these excellent properties, lasers absorb the energy of the light waves at the illuminated surface of the material, converting it into heat and generating instantaneous high pressure and high temperature, ablating the material and etching the mark. However, when using laser marking technology to engrave patterns on crystal glass, problems can arise, such as a lack of 3D depth and unclear outlines. Summary of the Invention
[0005] The purpose of the embodiments of the present invention is to provide a crystal glass engraving method, which can solve the problems of lack of 3D stereoscopic effect and unclear outline of patterns or text when engraving patterns using laser marking technology.
[0006] To achieve the above-mentioned object, an embodiment of the present invention provides a crystal glass engraving method, the method comprising:
[0007] Importing an image into the system, obtaining the outline of the image, and determining areas of the image that need to be filled and areas that do not need to be filled;
[0008] Set the filling method and fill the area that needs to be filled;
[0009] Setting marking parameters, including laser wavelength range, marking speed, and marking depth. The laser wavelength range is the wavelength range of infrared light, the marking speed is 500 mm / s to 800 mm / s, and the marking depth is 0.02 mm to 0.08 mm.
[0010] After the position and distance of the crystal glass are determined and aligned, the crystal glass is marked according to the filling method and marking parameters to form the image on the crystal glass.
[0011] Optionally, the marking speed is 600 mm / s to 700 mm / s, and the marking depth is 0.04 mm to 0.06 mm.
[0012] Optionally, before the position and distance determination and alignment of the crystal glass, the crystal glass is placed on a corresponding jig of a marking machine and onto a working platform in a corresponding marking area.
[0013] Optionally, the filling method includes: filling direction, filling spacing and filling angle.
[0014] Optionally, the filling direction is bidirectional filling, and the filling line is first filled in one direction and then filled in the opposite direction, and the process is repeated.
[0015] Optionally, the filling spacing is 0.08 to 0.15 mm; the filling angle is selected according to the shape of the image, preferably 0 degrees, 15 degrees, 30 degrees, 45 degrees, 60 degrees or 90 degrees.
[0016] Optionally, the image is in DXF format.
[0017] Optionally, the method further includes: before marking the crystal glass according to the filling method and marking machine parameters, coating the surface of the crystal glass.
[0018] Optionally, the coating layer is one or more of a silver layer, a chromium layer, an aluminum layer, a gold layer, a copper layer, a platinum layer and a stainless steel layer.
[0019] Optionally, the color of the coating layer includes at least one of red, yellow, blue, white and black.
[0020] The above technical solution not only improves marking efficiency but also ensures that the image engraving process does not suffer from edge chipping and other defects. The engraved image has a clear outline and a distinct 3D effect. The use of infrared light for character engraving has an extremely small focused spot and a small heat-affected zone, eliminating thermal effects and glass ablation. This effectively avoids thermal deformation caused by processing glass, further enabling the engraving of ultra-fine character patterns.
[0021] Other features and advantages of the embodiments of the present invention will be described in detail in the following detailed implementation section. Description of the Drawings
[0022] The drawings are used to provide a further understanding of the embodiments of the present invention, and constitute a part of the specification. Together with the following detailed implementation, they are used to explain the embodiments of the present invention, but do not constitute a limitation to the embodiments of the present invention. In the drawings:
[0023] Figure 1 is a flowchart of the crystal glass engraving method provided by the embodiments of the present invention;
[0024] Figure 2 is an image to be engraved provided by the embodiments of the present invention;
[0025] Figure 3 is the contour of the image to be engraved provided by the embodiments of the present invention;
[0026] Figure 4 is the area to be filled of the image to be engraved provided by the embodiments of the present invention;
[0027] Figure 5 is the filling direction diagram of the image to be engraved provided by the embodiments of the present invention;
[0028] Figure 6 is an image engraved on a flat crystal glass with a marking depth of 50 μm, a marking speed of 650 mm / s, and an infrared light wavelength provided by the embodiments of the present invention;
[0029] Figure 7 is an image engraved on a curved crystal glass with a marking depth of 50 μm, a marking speed of 650 mm / s, and an infrared light wavelength provided by the embodiments of the present invention;
[0030] Figure 8 is an image engraved on a coated crystal glass with a marking depth of 50 μm, a marking speed of 650 mm / s, and an infrared light wavelength provided by the embodiments of the present invention. Detailed Implementation
[0031] The following will describe in detail the specific implementation of the embodiments of the present invention with reference to the drawings. It should be understood that the specific implementation described here is only used to illustrate and explain the embodiments of the present invention, and is not used to limit the embodiments of the present invention.
[0032] The inventors of the present invention have found that when printing patterns on crystal glass using ink, phenomena such as pattern peeling off or scratching and peeling off often occur. When using the existing laser marking technology to engrave patterns on the surface of an object, problems such as the pattern lacking 3D stereoscopic effect and unclear contours are likely to occur. Based on this, in an embodiment of the present invention provided by the inventors, when engraving crystal glass, an image is imported into the system, the contour of the image is obtained, the areas of the image that need to be filled and the areas that do not need to be filled are determined, the filling method is set, the areas that need to be filled are filled, marking parameters such as the laser wavelength range, marking speed, and marking depth are set. After determining the position and distance of the crystal glass for alignment, the crystal glass is marked according to the filling method and marking parameters, and the image is formed on the crystal glass. The method provided by this embodiment adjusts the marking parameters during the laser marking process, thereby overcoming the problems in the prior art such as the engraved pattern lacking 3D stereoscopic effect and unclear contours.
[0033] See Figure 1 , in an embodiment of the present invention, a method for engraving crystal glass includes the following steps:
[0034] Step 101: Import the image into the system, obtain the contour of the image, and determine the areas of the image that need to be filled and the areas that do not need to be filled.
[0035] The image is a graphic that needs to be engraved on the crystal glass, including but not limited to text, lines, or patterns, etc. For example, a volume pattern, a power-on logo key, or a power-off logo key. The format of the image can be PLT, DXF, AI, or other image formats. Preferably, the image is in DXF format, which is beneficial to improving the accuracy of marking. The image is imported into the software system, and the software system includes but not limited to Beijing Golden Orange, Shenzhen Kelingfeng, or other laser marking operation software systems.
[0036] In step 101, obtaining the contour of the image and determining the areas of the image that need to be filled and the areas that do not need to be filled can prepare for laser marking, determine the range of laser marking, and improve the efficiency of marking. For example, the image to be marked is an arrow pointing to the right (as Figure 2 shown), obtaining the contour of the image (as Figure 3 shown), then the shaded area shown is the area that needs to be filled (as Figure 4 shown), that is, the area that needs to be laser marked.
[0037] Step 102: Set the filling method and fill the areas that need to be filled;
[0038] The filling method is the traveling path and mode of the laser during laser engraving. Preferably, the filling method includes a filling direction, a filling pitch, and a filling angle. The filling direction includes unidirectional filling, bidirectional filling, circular filling, or other direction filling. Preferably, the filling direction is bidirectional filling, where the filling lines are first filled in one direction and then in the opposite direction, repeating in a cycle. Taking the horizontal direction on the surface of the crystal glass as the X-axis direction, in a specific embodiment, as Figure 5 shown, first fill along the X-axis direction and then perform reverse filling along the opposite direction of the X-axis.
[0039] The filling angle is the angle between the filling line and the positive direction of the X-axis. It can be selected according to the shape of the image, preferably 0 degrees, 15 degrees, 30 degrees, 45 degrees, 60 degrees, or 90 degrees. For example, first fill at 0 degrees along the X-axis direction once, then fill at 15 degrees along the X-axis direction once, and then fill at 30 degrees, 45 degrees, 60 degrees, or 90 degrees along the X-axis in sequence, repeating 6 times. Through multiple engraving operations, the engraving accuracy can be improved and the finished product rate can be guaranteed, avoiding problems such as unclear line contours.
[0040] The filling pitch is the distance between filling lines. Preferably, the filling pitch is 0.08 to 0.15 mm.
[0041] Step 103: Set the marking parameters. The marking parameters include the laser wavelength range, the marking speed, and the marking depth. The laser wavelength range is the wavelength range of infrared light. The marking speed is 500 mm / s to 800 mm / s, and the marking depth is 0.02 mm to 0.08 mm.
[0042] The marking parameters are the specific parameters during the operation of the marking machine, including but not limited to the laser wavelength range, the marking speed, and the marking depth.
[0043] The laser wavelength is the wavelength of the laser beam output by the marking machine. The wavelengths of the laser beam include: argon fluoride laser (ultraviolet light) 193 nm, krypton fluoride laser (ultraviolet light) 248 nm, xenon chloride laser (ultraviolet light) 308 nm, nitrogen laser (ultraviolet light) 337 nm, argon laser (blue light) 488 nm, argon laser (green light) 514 nm, helium-neon laser (green light) 543 nm, helium-neon laser (red light) 633 nm, rhodamine 6G dye (tunable light) 570 to 650 nm, ruby (CrAlO3) (red light) 694 nm, neodymium-yttrium aluminum garnet (near-infrared light) 1064 nm. Among them, different wavelengths have different energies. The larger the wavelength, the lower the frequency and the lower the energy. Different types of materials are suitable for different laser wavelengths. The different laser wavelengths correspond to different marking machines, such as ultraviolet laser marking machines, fiber laser marking machines, etc. Preferably, the marking machine uses an infrared picosecond optical machine marking machine. Because crystal glass has a good absorption of infrared light, ultra-fine marking can be achieved, the thermal influence area is extremely small, no thermal effect will be generated, no material burning problem will occur, and fine marking can be realized.
[0044] The marking speed is the moving speed of the laser generator. If the marking speed is set too fast, problems such as incomplete engraving and blurred engraving will occur in the engraved image. If the marking speed is set too slow, problems such as edge damage and missing edges of crystal glass will occur in the engraved image, and at the same time, the marking efficiency will also be affected. Preferably, the marking speed for crystal glass is 500 mm / s to 800 mm / s. More preferably, the marking speed is 600 mm / s to 700 mm / s, which can improve the marking accuracy and the quality of the marked image while taking into account the marking efficiency.
[0045] The marking depth is the depth of the image during the marking process. If the marking depth is set too deep, the surface of the crystal glass will appear uneven and bumpy patterns. If the marking depth is set too shallow, the image effect on the surface of the crystal glass will not be obvious. Preferably, the marking depth of the crystal glass is 0.02 mm to 0.08 mm. More preferably, the marking depth of 0.02 mm to 0.08 mm can ensure the 3D stereo effect of the marked image.
[0046] Among them, the laser wavelength, marking speed, and marking depth are mutually related parameters. The quality of laser marking is overall related to the laser wavelength, marking speed, and marking depth. When the laser wavelength is too short, the energy is very high and it is easy to have the situation of the marked image being scorched. At this time, the marking speed can be increased to avoid the image being scorched. However, if the marking speed is too fast, the engraved image will not be in place, and the marking depth cannot be guaranteed either. When the marking speed is too slow, the edge of the marked image will be damaged. At this time, the marking depth can be reduced to avoid this phenomenon. However, if the depth of marking is reduced, the 3D stereoscopic effect of the image will be damaged, and its marking efficiency is low. Therefore, it is necessary to adjust the three parameters simultaneously to obtain the optimal marking effect.
[0047] In a specific embodiment, crystal glass is marked respectively using different marking depths, marking speeds, and wavelength ranges. The marked image is a triangular symbol representing vehicle faults. Five different marking depths, marking speeds, and wavelength ranges are set, as shown in Table 1.
[0048]
[0049] Marking parameter 1: The marking depth is from 0.02 mm to 0.08 mm, the marking speed is from 500 mm / s to 800 mm / s, and the wavelength is non-infrared light. The marked image is relatively blurred and the image is scorched.
[0050] Marking parameter 2: The marking depth is from 0.02 mm to 0.08 mm, the marking speed is not within the range of 500 mm / s to 800 mm / s, and the wavelength is infrared light. The marking duration is the longest, and there are edge damages and edge missing.
[0051] Marking parameter 3: The marking depth is not within the range of 0.02 mm to 0.08 mm, the marking speed is from 500 mm / s to 800 mm / s, and the wavelength is infrared light. The concave-convex display effect on the front of the glass is not good, and the 3D stereoscopic effect is not obvious.
[0052] Marking parameter 4: The marking depth is not within the range of 0.02 mm to 0.08 mm, the marking speed is not within the range of 500 mm / s to 800 mm / s, and the wavelength is non-infrared light. The contour is not clear and the scorching effect is serious.
[0053] Marking parameter 5: The marking depth is from 0.02 mm to 0.08 mm, the marking speed is from 500 mm / s to 800 mm / s, and the wavelength is infrared light. The effect is the best, the contour is clear and complete, and the 3D stereoscopic effect is obvious.
[0054] By coordinating the three marking parameters, it is possible to improve the marking efficiency and ensure that there will be no edge collapse defects during the image engraving process, thereby improving the accuracy and yield of the image engraving. When using infrared light to engrave characters and patterns, the focused spot is extremely small, and the heat-affected zone during processing is small, which will not produce thermal effects and glass material ablation problems. It can effectively avoid thermal deformation caused by processing glass materials, and further realize the engraving of ultra-fine characters and patterns. Figure 6 On flat crystal glass, Figure 7 The pattern is engraved on curved crystal glass using infrared light with a marking depth of 50μm and a marking speed of 650mm / s.
[0055] Step 104: After the position and distance of the crystal glass are determined and aligned, the crystal glass is marked according to the filling method and marking parameters to form the image on the crystal glass.
[0056] Preferably, the position and distance determination and alignment of the crystal glass includes: automatically aligning the position and distance by taking a snapshot with a high-definition camera of the marking machine, so that the crystal glass is at a position where an image needs to be engraved.
[0057] Before proceeding to step 104, the crystal glass must be placed on the corresponding jig of the marking machine and on the work platform within the marking area below the marking machine. Preferably, after the crystal glass is placed on the corresponding jig of the marking machine, it can be automatically or manually moved to the work platform within the corresponding marking area, which is equivalent to the area below the laser and high-definition camera of the marking machine, for processing. These steps are performed in any order consistent with steps 101, 102, and 103 above.
[0058] In a specific embodiment, before marking the crystal glass, PVD coating is performed on the surface of the crystal glass. The thickness of the coating layer is 0.1um to 2um, and the coating layer is a silver layer, a chromium layer, an aluminum layer, a gold layer, a copper layer, a platinum layer or a stainless steel layer. The color of the coating layer includes at least one of red, yellow, blue, white and black. By coating a thin film with special properties on the surface of the crystal glass, the glass surface can have advantages such as conductivity and wear resistance that are superior to the material itself. For example, on the surface of a crystal glass with engraved start characters, the glass surface can be made conductive and luminous by coating, and the characters on the pattern can be clearly identified even in dark places. Moreover, after the crystal glass surface is coated and then engraved, the engraved pattern is more three-dimensional and has a 3D effect, such as Figure 8 shown.
[0059] Those skilled in the art should understand that the embodiments of the present application can be provided as a method, a system, or a computer program product. Therefore, the present application can take the form of an all-hardware embodiment, an all-software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present application can take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) that contain computer-usable program code.
[0060] The present application is described with reference to the flowcharts and / or block diagrams of methods, apparatuses (systems), and computer program products according to the embodiments of the present application. It should be understood that each flow and / or block in the flowchart and / or block diagram, as well as the combination of flows and / or blocks in the flowchart and / or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing devices to generate a machine, such that the instructions executed by the processor of the computer or other programmable data processing devices generate means for implementing the functions specified in Figure 1 one or more flows and / or blocks Figure 1 one or more blocks.
[0061] These computer program instructions can also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to work in a specific manner, such that the instructions stored in the computer-readable memory generate a manufactured article including instruction means that implement the functions specified in Figure 1 one or more flows and / or blocks Figure 1 one or more blocks.
[0062] These computer program instructions can also be loaded onto a computer or other programmable data processing device, such that a series of operation steps are executed on the computer or other programmable device to generate a computer-implemented process, so that the instructions executed on the computer or other programmable device provide steps for implementing the functions specified in Figure 1 one or more flows and / or blocks Figure 1 one or more blocks.
[0063] In a typical configuration, a computing device includes one or more processors (CPUs), an input / output interface, a network interface, and memory.
[0064] The memory may include non-permanent memory in the form of computer-readable media, random access memory (RAM), and / or non-volatile memory such as read-only memory (ROM) or flash memory (flash RAM). The memory is an example of computer-readable media.
[0065] Computer-readable media include permanent and non-permanent, removable and non-removable media that can be implemented by any method or technology to store information. The information can be computer-readable instructions, data structures, program modules or other data. Examples of computer storage media include, but are not limited to, phase change memory (PRAM), static random access memory (SRAM), dynamic random access memory (DRAM), other types of random access memory (RAM), read-only memory (ROM), electrically erasable programmable read-only memory (EEPROM), flash memory or other memory technology, compact disc read-only memory (CD-ROM), digital versatile disc (DVD) or other optical storage, magnetic cassettes, magnetic tape, magnetic disk storage or other magnetic storage devices or any other non-transmission media that can be used to store information that can be accessed by a computing device. As defined herein, computer-readable media does not include transitory computer-readable media (transitory media), such as modulated data signals and carrier waves.
[0066] It should also be noted that the terms "comprises," "includes," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, commodity, or apparatus that includes a series of elements includes not only those elements but also other elements not explicitly listed, or includes elements inherent to such process, method, commodity, or apparatus. In the absence of further limitations, an element defined by the phrase "comprises a ..." does not exclude the presence of other identical elements in the process, method, commodity, or apparatus that includes the element.
[0067] The above are merely embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various changes and variations. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present application should all be included within the scope of the claims of the present application.
Claims
1. A method for carving crystal glass, characterized in that, The method includes: Import the image into the system, obtain the contour of the image, and determine the area to be filled and the area not to be filled of the image; Set the filling method and fill the area to be filled; Set the marking parameters, where the marking parameters include the laser wavelength range, marking speed, and marking depth. The laser wavelength range is the wavelength range of infrared light, the marking speed is from 600 mm / s to 800 mm / s, and the marking depth is from 0.02 mm to 0.08 mm; After judging and aligning the position and distance of the crystal glass, perform marking on the crystal glass according to the filling method and marking parameters to form the image on the crystal glass; The filling method includes: filling direction, filling spacing, and filling angle; The filling spacing is from 0.08 to 0.15 mm; the filling angle is selected according to the shape of the image.
2. The crystal glass engraving method according to claim 1, characterized in that The marking speed is from 600 mm / s to 700 mm / s, and the marking depth is from 0.04 mm to 0.06 mm.
3. The crystal glass engraving method according to claim 1, characterized in that, Before judging and aligning the position and distance of the crystal glass, place the crystal glass on the corresponding fixture of the marking machine and enter the working platform of the corresponding marking area.
4. The method for engraving crystal glass according to claim 1, characterized in that, The filling direction is bidirectional filling. The filling lines are first filled in one direction and then in the opposite direction, and this cycle is repeated.
5. The method for carving crystal glass according to claim 1, wherein The filling angle is 0 degrees, 15 degrees, 30 degrees, 45 degrees, 60 degrees, or 90 degrees.
6. The crystal glass engraving method according to claim 1, wherein The image is in DXF format.
7. The crystal glass engraving method according to claim 1, wherein, The method further includes: coating the surface of the crystal glass before performing marking on the crystal glass according to the filling method and marking machine parameters.
8. The crystal glass engraving method according to claim 7, characterized in that, The coating layer is one or more of a silver layer, a chromium layer, an aluminum layer, a gold layer, a copper layer, a platinum layer, and a stainless steel layer.
9. The method for carving crystal glass according to claim 8, wherein The color of the coating layer includes at least one of red, yellow, blue, white, and black.
Citation Information
Patent Citations
Fiber laser engraving equipment and technological method for organic glass
CN104708207A