Shear thickening polishing device

Abstract

The shear thickening polishing device disclosed by the embodiment of the present application comprises a rack provided with a first accommodating cavity, an upper surface of the rack is provided with a first opening, the first opening is communicated with the first accommodating cavity, a bottom of the first accommodating cavity is provided with a first through hole; a polishing container is arranged in the first accommodating cavity, the polishing container is used for accommodating shear thickening polishing liquid; a power transmission assembly is arranged at a lower part of the first accommodating cavity, the power transmission assembly passes through the first through hole and is connected with the polishing container, the polishing container can rotate under the driving of the power transmission assembly; a sealing cover assembly is detachably connected with the rack, the sealing cover assembly covers and seals the first opening; a mounting clamp for connecting a workpiece to be polished is arranged on a side of the sealing cover assembly adjacent to the power transmission assembly; a second through hole is further arranged on the sealing cover assembly, the second through hole is used for connecting a gas supply device to control the pressure of the polishing container when the shear thickening polishing liquid is used to polish the workpiece to be polished.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of precision and ultra-precision machining, and particularly relates to a shear thickening polishing device. BACKGROUND

[0002] With the rapid development of science and technology, more and more hardware parts are manufactured and processed, especially the hardware parts with complex surfaces, such as faucet housings, are most loved by people. These hardware parts have good performance and exquisite appearance, which greatly meet the requirements of people. However, the processing of such exquisite hardware parts often needs many complex processes, and the yield is not high. In the complex processing processes, polishing is the most important. After polishing, the surface is smooth and uniform, which can make the plating layer more delicate, so as to improve the adhesion and brightness of the plating layer and improve the corrosion resistance of the plating layer. The pre-plating treatment of metal products is an important link to obtain high-quality plating layer.

[0003] Because the surface of parts such as faucets is very complex and has various shapes, and most of the faucets are cast into shape, so the surface oxide layer is thick, and the roughness treatment of the surface is very large, which makes it always difficult to polish the faucet. At present, the polishing and polishing processing of the faucet of most enterprises basically adopts the traditional method of workers holding the faucet on the polishing grinding wheel and cloth wheel for processing. Manual processing has many problems, such as poor working environment, serious dust pollution, which seriously affects the health and safety of workers, and the labor intensity of workers is large, the efficiency is low, and the processing consistency is poor. Although the special grinding machine polishing has good efficiency, but due to the huge investment in the early stage, it greatly increases the polishing cost, and the demand for labor is large, and its expandability is poor, which is not suitable for various types of faucet parts with variable shapes. Although the application of robots has made some breakthroughs in recent years, the precision is far inferior to manual and special grinding machine, and the programming of general robots consumes a lot of time, and the technical threshold for workers is high; and the polishing cost is high, the replacement frequency is high, and the late investment is large. And some polishing defects such as surface deformation, polishing, burning, and rough polishing are prone to occur during product polishing. Compared with traditional polishing, some new types of super-precision polishing methods based on complex curved surfaces, such as magnetorheological polishing, electrorheological polishing, chemical polishing, abrasive flow polishing, and shear thickening polishing, have certain advantages in specific workpieces. However, they have obvious shortcomings in processing large and complex curved surfaces such as faucets. Magnetorheological polishing has limitations in processing small, steep and concave surfaces. In addition, it also brings some challenges to the economic benefits of the factory, and the expensive slurry needs to be replaced regularly. Electrorheological polishing is suitable for polishing small and complex conductor workpieces, but its efficiency is not high for large and complex curved surfaces such as faucets. Chemical polishing has low polishing precision, and chemical polishing can cause serious environmental pollution and even harm to workers. The abrasive flow polishing device is expensive and complex, and the material removal rate is not high because it needs to be recycled multiple times to achieve surface finishing during processing, so the processing efficiency is relatively low. It is also difficult for ordinary shear thickening polishing to process workpieces with thick oxide layers such as faucets, and the shear thickening base fluid in the normal pressure shear thickening liquid does not have enough holding force for the polishing abrasive, and it is easy to produce cluster accumulation when processing small, steep and concave complex surfaces. SUMMARY

[0004] In view of at least some of the deficiencies and defects in the prior art, the embodiments of the present application provide a shear thickening polishing device that can improve polishing efficiency and polishing effect.

[0005] Specifically, the shear thickening polishing device provided by the embodiment of the present application comprises: a rack provided with a first accommodating cavity, wherein an upper surface of the rack is provided with a first opening, the first opening is communicated with the first accommodating cavity, and a bottom of the first accommodating cavity is provided with a first through hole; a polishing container arranged in the first accommodating cavity, the polishing container is used for accommodating shear thickening polishing liquid; a power transmission assembly arranged at a lower part of the first accommodating cavity, the power transmission assembly passes through the first through hole and is connected with the polishing container, and the polishing container can rotate under the driving of the power transmission assembly; a sealing cover assembly detachably connected with the rack, the sealing cover assembly covers and seals the first opening; the sealing cover assembly is provided, at a side adjacent to the power transmission assembly, with a mounting clamp used for connecting a workpiece to be polished; and the sealing cover assembly is further provided with a second through hole used for connecting a gas supply device to control the pressure of the polishing container when the shear thickening polishing liquid is used to polish the workpiece to be polished.

[0006] In an embodiment of the present application, the sealing cover assembly comprises: a sealing cover main body; and a workpiece connecting frame connected to a side of the sealing cover main body adjacent to the power transmission assembly, wherein the mounting clamp is connected to the workpiece connecting frame.

[0007] In an embodiment of the present application, the sealing cover main body comprises: a cover body; and a connecting column arranged inside the cover body and connected to the cover body at one end, wherein a connecting buckle is arranged at an end of the connecting seat away from the cover body; the workpiece connecting frame is provided with a connecting column through hole, and a connecting groove is arranged at an edge position of the connecting column through hole on a side of the workpiece connecting frame away from the cover body; the connecting column is arranged in the connecting column through hole, and the connecting buckle is arranged in the connecting groove.

[0008] In an embodiment of the present application, the workpiece connecting frame comprises: an inner connecting ring, wherein the connecting column through hole is arranged on the inner connecting ring, and the connecting groove is arranged on a side of the inner connecting ring away from the cover body, the connecting column is arranged in the connecting column through hole of the inner connecting ring, and the connecting buckle is arranged in the connecting groove of the inner connecting ring; an outer connecting ring arranged outside the inner connecting ring; a spoke guide rail connected between the inner connecting ring and the outer connecting ring; a sliding block connected to the spoke guide rail and movable relative to the spoke guide rail, wherein the mounting clamp is connected to the sliding block; and an extension part of the spoke guide rail connected to the outer connecting ring is arranged to extend out of the outer connecting ring, a limiting groove is arranged at the first opening on the upper surface, and the extension part is arranged in the limiting groove.

[0009] In one embodiment of the present application, the shear thickening polishing device further comprises a sealing member arranged between the sealing cover assembly and the rack to seal the first accommodating cavity.

[0010] In one embodiment of the present application, the rack is further provided with a second accommodating cavity; the upper surface of the rack is further provided with a second opening communicating with the second accommodating cavity, the second opening is arranged on the upper surface in parallel with and spaced from the first opening; the shear thickening polishing device further comprises a cleaning assembly, the cleaning assembly comprises a cleaning container arranged in the second accommodating cavity and an ultrasonic vibration mechanism arranged at the lower part of the cleaning container.

[0011] In one embodiment of the present application, the shear thickening polishing device further comprises a transfer assembly, the transfer assembly comprises a plurality of support rods, each of which is arranged on the upper surface of the rack; a transverse power transmission mechanism connected to the other end of each of the plurality of support rods; a crossbar connected to the transverse transfer mechanism; a longitudinal power transmission mechanism arranged on the crossbar and connected to the sealing cover assembly; wherein, under the drive of the longitudinal power transmission mechanism, the sealing cover assembly can drive the workpiece to be polished to move up and down relative to the rack, and under the drive of the transverse power transmission mechanism, the sealing cover assembly can drive the workpiece to be polished to reciprocate relative to the rack between the first accommodating cavity and the second accommodating cavity.

[0012] In one embodiment of the present application, the shear thickening polishing device further comprises a temperature control assembly and a main control circuit, the temperature control assembly comprises a temperature control box arranged below the rack and surrounding the first accommodating cavity; a heating element arranged in the temperature control box and electrically connected to the main control circuit; and a temperature sensing element arranged at the bottom of the polishing container and electrically connected to the main control circuit.

[0013] In one embodiment of the present application, the raw materials of the shear thickening polishing liquid comprise abrasive, shear thickening base fluid, oxidizing agent and corrosion inhibitor, wherein the mass percentage of the abrasive is 0.5-5%; the oxidizing agent is at least one of hydrogen peroxide, potassium permanganate, peroxyacetic acid and sodium persulfate, the mass percentage of the oxidizing agent is 0.5-5%; the corrosion inhibitor is at least one of polyvinylpyrrolidone and benzotriazine, the mass percentage of the corrosion inhibitor is 0.5-2%.

[0014] In one embodiment of the present application, the raw materials of the shear thickening polishing liquid further comprise a thickening agent, an anti-settling agent, a surfactant and a complexing agent, wherein the thickening agent is at least one of xanthan gum and guar gum, the mass percentage of the thickening agent is 0.5-1.5%, the anti-settling agent is polydimethylsiloxane, the mass percentage of the anti-settling agent is 5-20%, the surfactant is one of a non-ionic surfactant, a cationic surfactant and an anionic surfactant, the mass percentage of the surfactant is 1-5%, and the complexing agent can be ethylenediaminetetraacetic acid, the mass percentage of the complexing agent is 1-5%.

[0015] The shear thickening polishing device provided by the embodiments of the present application has at least the following advantages and beneficial effects: the polishing container is closed by the sealing cover assembly to introduce gas and control the pressure inside the polishing container. With the increase of the gas pressure, the viscosity of the fluid is also enhanced, that is, the internal pressure of the polishing container is increased by pressurization, the holding force of the shear thickening base fluid in the shear thickening liquid on the polishing abrasive particles and the performance of the shear thickening polishing liquid are improved, the hydrostatic pressure is increased, the pressure of the abrasive particles on the workpiece is increased, the material removal rate is improved, and the polishing effect is improved. In addition, the workpiece polishing and workpiece cleaning can be completed at one time by arranging the cleaning assembly on the rack, and the work efficiency is improved. Furthermore, the workpiece can be automatically transported by arranging the transfer assembly, the labor amount is reduced, and the work efficiency is further improved. In addition, the temperature of the shear thickening polishing liquid is controlled by arranging the temperature control assembly and adjusting the temperature by water bath, so as to improve the performance of the shear thickening polishing. Finally, the polishing effect can be improved by adding at least one of an oxidizing agent, a corrosion inhibitor, a thickening agent, an anti-settling agent, a surfactant, a complexing agent and a polishing liquid pH adjuster in the shear thickening polishing liquid. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced as follows. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0017] Figure 1 A perspective structural schematic diagram of the shear thickening polishing device provided by the embodiments of the present application is shown.

[0018] Figure 2 A perspective structural schematic diagram of the shear thickening polishing device provided by the embodiments of the present application is shown. Figure 1 A perspective structural schematic diagram of the shear thickening polishing device provided by the embodiments of the present application is shown.

[0019] Figure 3 A perspective structural schematic diagram of the shear thickening polishing device provided by the embodiments of the present application is shown. Figure 2The diagram shows a cross-sectional view of the shearing, thickening, and polishing apparatus.

[0020] Figure 4 for Figure 1 The diagram shows a three-dimensional structure of the platform.

[0021] Figure 5 for Figure 1 The diagram shows a three-dimensional structure of the sealing cap assembly.

[0022] Figure 6 for Figure 5 The diagram shows a cross-sectional view of the sealing cap assembly.

[0023] Figure 7 for Figure 5 The diagram shows a three-dimensional structural representation of the sealing cap body.

[0024] Figure 8 for Figure 5 The diagram shows a three-dimensional structure of the workpiece connecting frame.

[0025] Figure 9 This is a three-dimensional structural schematic diagram of another shearing, thickening, and polishing device provided in an embodiment of the present invention.

[0026] Figure 10 This is a schematic diagram showing the connection relationship between the main control circuit and other components of the shearing, thickening, and polishing device according to an embodiment of the present invention. Detailed Implementation

[0027] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0028] like Figure 1 and Figure 2 As shown, this embodiment of the invention provides a shear thickening polishing apparatus 10. Specifically, the shear thickening polishing apparatus 10 can be used to polish workpieces such as faucets or other parts with complex curved surfaces. The shear thickening polishing apparatus 10 includes, for example, a stand 100, a polishing container 200, a power transmission assembly 300, and a sealing cover assembly 400.

[0029] Among them, such as Figures 4 to 8As shown, the stand 100 is, for example, a box or support component, providing support and mounting positions for other components of the shear-thickening polishing device 10. A first receiving cavity 120 is provided on the stand 100. The first receiving cavity 120 is, for example, a circular cavity. A first opening 130 is provided on the upper surface 110 of the stand 100, and the first opening 130 is, for example, a circular opening. The first opening 130 connects to the first receiving cavity 120, and a first through hole 140 is provided at the bottom of the first receiving cavity 120. The first through hole 140 is, for example, for the power transmission assembly 300 to pass through and connect to the polishing container 200. The polishing container 200 is, for example, a cavity-like component with an opening at the upper end, used to contain the shear-thickening polishing fluid. The polishing container 200 is disposed within the first receiving cavity 120. The power transmission assembly 300 is disposed at the lower part of the first receiving cavity 120. The power transmission assembly 300 passes through the first through hole 140 and is connected to the bottom of the polishing container 200, which can rotate under the drive of the power transmission assembly 300. The power transmission assembly 300 is, for example, a device and mechanism that provides power and transmits the power to the polishing container 200, such as a drive motor, reducer, etc., for driving the polishing container 200 to rotate, with a speed range of, for example, 200-5000 r / min. A sealing cap assembly 400 is detachably connected to the stand 100, covering and sealing the first opening 130; a mounting clamp 430 for connecting the workpiece to be polished is provided on the side of the sealing cap assembly 400 adjacent to the power transmission assembly 300. The sealing cap assembly 400 also has a second through hole 4111 for connecting an air supply device to control the pressure of the polishing container 200 when polishing the workpiece using the shear-thickening polishing fluid. The air supply device may be, for example, an air pump. The pressure inside the polishing container 200 is, for example, 0.5 kPa-10 kPa.

[0030] In this way, the shear thickening polishing apparatus provided in this embodiment of the invention seals the polishing container with a sealing cap assembly to allow gas to pass through and controls the internal pressure of the polishing container. As the gas pressure increases, the fluid viscosity also increases. That is, by increasing the internal pressure of the polishing container, the holding force of the shear thickening base fluid on the polishing abrasive grains and the performance of the shear thickening polishing fluid can be improved. This can also increase the hydrostatic pressure and the pressure of the abrasive grains on the workpiece, thereby improving the material removal rate and enhancing the polishing effect.

[0031] Furthermore, such as Figures 5 to 8As shown, the sealing cap assembly 400 includes, for example, a sealing cap body 410 and a workpiece connecting bracket 420. The workpiece connecting bracket 420 is connected to the side of the sealing cap body 410 adjacent to the power transmission assembly 300, and the mounting clamp 430 is connected to the workpiece connecting bracket 420. The sealing cap body 410 includes a cap body 411 and a connecting post 412. The connecting post 412 is located inside the cap body 411, i.e., on the side of the cap body 411 adjacent to the power transmission assembly 300, and one end of the connecting post 412 is connected to the cap body 411. A connecting buckle 4121 is provided at the end of the connecting post 412 away from the cap body 411.

[0032] Correspondingly, the workpiece connecting frame 420 is provided with a connecting post through hole 4211, and a connecting groove 4212 is provided at the edge of the connecting post through hole 4211 on the side of the workpiece connecting frame 420 away from the cover body 411; the connecting post 412 passes through the connecting post through hole 4211, and the connecting buckle 4121 is embedded in the connecting groove 4212. In this way, the workpiece connecting frame 420 and the sealing cover body 410 can be detachably connected, and the relative rotation between the workpiece connecting frame 420 and the sealing cover body 410 is avoided.

[0033] Furthermore, such as Figure 8As shown, the workpiece connecting frame 420 includes: an inner connecting ring 421, an outer connecting ring 422, a spoke guide rail 423, and a slider 424. The inner connecting ring 421 is, for example, a circular ring component. A connecting post through hole 4211 is located in the middle of the inner connecting ring 421. A connecting groove 4212 is located on the side of the inner connecting ring 421 away from the cover body 411. The connecting post 412 passes through the connecting post through hole 4211 of the inner connecting ring 421, and a connecting buckle 4121 is embedded in the connecting groove 4212 of the inner connecting ring 421. The outer connecting ring 422 is located outside the inner connecting ring 421. The outer connecting ring 422 is, for example, a circular ring component, and the inner connecting ring 421 and the outer connecting ring 422 are concentrically arranged. The spoke guide rail 423 is, for example, a linear guide rail, which connects the inner connecting ring 421 and the outer connecting ring 422. For example, the spoke guide rail 423 is connected between the inner connecting ring 421 and the outer connecting ring 422 along the diametrical direction of the inner connecting ring 421 and the outer connecting ring 422. A slider 424 is connected to the spoke guide rail 423; specifically, the slider 424 is sleeved on the spoke guide rail 423 and located between the inner connecting ring 421 and the outer connecting ring 422. The slider 424 can move relative to the spoke guide rail 423, and the mounting fixture 430 is connected to the slider 424. This allows for convenient adjustment of the position of the workpiece to be polished mounted on the mounting fixture 430. Furthermore, there can be multiple spoke guide rails 423, multiple sliders 424, and multiple mounting fixtures 430. Multiple sliders 424 are connected one-to-one to multiple spoke guide rails 423, and multiple mounting fixtures 430 can also be connected to multiple sliders 424 respectively. This allows for simultaneous polishing of multiple workpieces, improving polishing efficiency.

[0034] In addition, such as Figure 4 and Figure 8 As shown, one end of the spoke guide rail 423 connected to the outer connecting ring 422 is provided with an extension portion 4231 extending out of the outer connecting ring 422. A limiting groove 150 is provided at the first opening 130 on the upper surface 110, and the extension portion 4231 is embedded in the limiting groove 150. This restricts the relative rotation of the workpiece connecting frame 420 with respect to the first receiving cavity 120.

[0035] In addition, such as Figure 3 , Figure 4 and Figure 7As shown, the shearing thickening polishing apparatus further includes a sealing element 500, which is disposed between the sealing cap assembly 400 and the platform 100 to seal the first receiving cavity 120. Specifically, a first sealing groove 4112 is provided on the side of the cap body 411 adjacent to the polishing container 200, and a second sealing groove 160 is provided on the upper surface 110 of the platform 100. The second sealing groove 160 surrounds the first opening 130 and corresponds to the first sealing groove 4112. The number of sealing elements 500 can be, for example, two, and the two sealing elements can be embedded in the first sealing groove 4112 and the second sealing groove 160, respectively. Of course, the number of sealing elements 500 can also be one, with only one of the first sealing groove 4112 and the second sealing groove 160 provided.

[0036] Furthermore, see Figure 1 , Figure 2 and Figure 4 The platform 100 is further provided with a second receiving cavity 170; a second opening 180 is also provided on the upper surface 110 of the platform 100, the second opening 180 communicating with the second receiving cavity 170, the second opening 180 being spaced apart from and side-by-side with the first opening 130 on the upper surface 110. The shearing thickening polishing device also includes a cleaning assembly 600. The cleaning assembly 600 is used to clean the polished workpiece. Specifically, the cleaning assembly 600 is, for example, an ultrasonic cleaning assembly, specifically including: a cleaning container 610 and an ultrasonic vibration mechanism 620. The cleaning container 610 is disposed in the second receiving cavity 170 and is used to hold cleaning fluid for cleaning the polished workpiece. The cleaning container 610 is provided with a cleaning fluid inlet and a cleaning fluid outlet, for adding clean cleaning fluid and discharging unclean cleaning fluid, respectively. The ultrasonic vibration mechanism 620 is disposed in the lower part of the cleaning container 610, more specifically, in the lower part of the second receiving cavity 170. After the workpiece is polished in the polishing container 120, the polished workpiece is taken out and placed in the cleaning container 610, so that the sealing cover assembly 400 covers and seals the second opening 180. The ultrasonic vibration mechanism 620 is activated to emit ultrasonic waves to achieve ultrasonic cleaning of the polished workpiece.

[0037] Furthermore, such as Figure 3 and Figure 9 As shown, the shearing thickening polishing apparatus further includes a transfer assembly 700 for transferring the workpiece to be polished and the polished workpiece. The transfer assembly 700 includes: multiple support rods 710, a transverse power transmission mechanism 720, a crossbar 730, and a longitudinal power transmission mechanism 740. Specifically, one end of each of the multiple support rods 710 is erected on the upper surface 110 of the platform 100. Figure 9As shown, there are, for example, six support rods 710, evenly distributed and erected on the upper surface 110 of the platform. A transverse power transmission mechanism 720 is connected to the other end of each of the support rods 710, i.e., connected to the upper end of the support rods 710. A crossbar 730 is connected to the transverse power transmission mechanism 720. A longitudinal power transmission mechanism 740 is disposed on the crossbar 730 and connected to the sealing cover assembly 400. Specifically, the transverse power transmission mechanism 720 and the longitudinal power transmission mechanism 740 can be distributed as mechanisms and devices that provide power to achieve linear motion, such as a combination of a motor and a rack and pinion transmission mechanism, a combination of a motor and a ball screw transmission mechanism, a combination of a motor and a gantry linear guide slide, a combination of a hydraulic pump and a hydraulic cylinder, a combination of an air pump and an air cylinder, or other mechanisms; the present invention is not limited thereto. Driven by the longitudinal power transmission mechanism 740, the sealing cap assembly 400 can move the workpiece to be polished up and down relative to the stand 100, for example, immersing the workpiece in a shear-thickening polishing fluid, removing the polished workpiece from the shear-thickening polishing fluid, immersing the polished workpiece in a cleaning fluid, and removing the cleaned workpiece from the cleaning fluid. Driven by the transverse power transmission mechanism 720, the sealing cap assembly 400 can move the workpiece to be polished back and forth between the first receiving cavity 120 and the second receiving cavity 170 relative to the stand 100. In this way, fully automatic operation of the workpiece can be achieved, reducing the workload.

[0038] See also Figure 9 The shear thickening polishing apparatus 10 may further include a temperature control component 800. Specifically, the temperature control component 800 includes a temperature control chamber 810, a heating element 820, and a temperature sensing element 830. The temperature control chamber 810 is, for example, a hollow box-like component, disposed under the platform 100 and surrounding the first accommodating cavity 120. The temperature control chamber 810 can contain water. The heating element 820 is, for example, an electric heating element, disposed within the temperature control chamber 810, for heating the water within the temperature control chamber 810. The temperature sensing element 830 is, for example, a temperature sensor, disposed within the bottom of the polishing container 120, for sensing the temperature of the shear thickening polishing fluid within the polishing container 120. By arranging a temperature control chamber around the polishing container 120 and controlling the temperature of the shear thickening polishing fluid through a water bath, the performance of shear thickening polishing is improved.

[0039] Furthermore, the shearing thickening and polishing apparatus 10 may also include a main control circuit 900. The main control circuit 900 includes, for example, electrical components such as a PLC, a microcontroller, and control switches, used to control other components of the shearing thickening and polishing apparatus 10. Specifically, such as... Figure 10As shown, the main control circuit 900 is electrically connected to, for example, the power transmission assembly 300, the ultrasonic vibration mechanism 620, the longitudinal power transmission mechanism 740, the transverse power transmission mechanism 720, the heating element 820, and the temperature sensing element 830. Specifically, the main control circuit 900 is connected to the power transmission assembly 300 to control the rotation of the polishing container 120. The main control circuit 900 is connected to the ultrasonic vibration mechanism 620 to control the ultrasonic vibration mechanism 620 to clean the polished workpiece. The main control circuit 900 is connected to the longitudinal power transmission mechanism 740 and the transverse power transmission mechanism 720 to control the lifting and lowering of the workpiece to be polished and the cleaning and transfer of the polished workpiece. The main control circuit 900 is connected to the heating element 820 to control the temperature of the shear-thickening polishing fluid by controlling the heating of the heating element 820. The main control circuit 900 is connected to the temperature sensor 830, receiving the sensing data sent by the temperature sensor 830 and controlling the heating element 820 based on the sensing data, ultimately achieving better automatic temperature control of the shear-thickening polishing fluid. In this way, the temperature of the shear-thickening polishing fluid can be dynamically controlled between 23-35°C.

[0040] Furthermore, a pressure regulating valve, such as a constant pressure reducing valve, can be connected to the second through hole 4111 to regulate the pressure inside the polishing container 120. Additionally, a pressure detector can be connected to the sealing cap assembly 400 to detect the pressure inside the polishing container 120 and transmit the detection data to the main control circuit 900. The main control circuit 900 then issues a control command based on the detection data to control the pressure regulating valve to adjust the pressure inside the polishing container 120, thereby achieving automatic pressure regulation within the polishing container 120.

[0041] On the other hand, embodiments of the present invention relate to a shear-thickening polishing fluid. This shear-thickening polishing fluid utilizes the properties of a non-Newtonian fluid to achieve polishing of workpieces. Specifically, the raw materials of the shear-thickening polishing fluid include, for example, abrasives, a shear-thickening base fluid, an oxidant, and a corrosion inhibitor.

[0042] The abrasive is, for example, a mixture of silica sol and one or more of silicon dioxide, aluminum oxide, cerium oxide, boron carbide, and silicon carbide, and the mass percentage of the abrasive in the shear-thickening polishing fluid is 8-35%.

[0043] Shear thickening base liquids include, for example, a mixture of at least one of corn starch, tapioca starch, and sweet potato starch with deionized water, such as a mixture of (corn starch + tapioca starch) and water.

[0044] The oxidant is at least one selected from hydrogen peroxide, potassium permanganate, peracetic acid, and sodium persulfate, and the oxidant accounts for 0.5-5% of the mass of the shear-thickening polishing fluid. Preferably, the oxidant is hydrogen peroxide. Oxidants play an important role in metal polishing. Under the action of the oxidant, an oxidation reaction occurs, accelerating the softening of the metal surface and forming an oxide film, which is then removed by the mechanical grinding action of the abrasive. Taking a copper alloy faucet as an example, when hydrogen peroxide is used to polish a copper alloy faucet in a chemically compounded shear-thickening polishing fluid, the hydrogen peroxide decomposes into oxygen and water. The workpiece surface is oxidized to form a relatively soft oxide layer containing Cu2O, CuO, Cu(OH)2, and ZnO, Zn(OH)2, thus changing the relatively high hardness of the copper mold. Simultaneously, the pressure-assisted shear thickening polishing fluid generates relative shear with the workpiece, and the abrasive particles wrapped in particle clusters mechanically rub the workpiece to remove the soft oxide layer on the surface. Furthermore, hydrogen peroxide can effectively inhibit the process of chemical reaction, allowing the metal on the workpiece surface to corrode evenly. This cycle repeats, and when the mechanical removal effect of the abrasive particles wrapped in particle clusters and the chemical corrosion effect of the polishing fluid on the workpiece are in dynamic equilibrium, the efficiency and quality of shear thickening polishing are further greatly improved.

[0045] The corrosion inhibitor is at least one of polyvinylpyrrolidone and benzotriazine (BTA), and the corrosion inhibitor accounts for 0.5-2% by mass in the shear-thickening polishing fluid. The addition of the corrosion inhibitor can passivate the surface of metal or alloy materials and delay the corrosion reaction.

[0046] In addition, the raw materials of the shear-thickening polishing fluid may also include at least one of the following: thickener, anti-settling agent, surfactant, complexing agent and polishing fluid pH adjuster.

[0047] When a thickener is added to the shear-thickening polishing fluid, the thickener is at least one of xanthan gum and guar gum. The thickener has a significant "synergistic thickening effect." For example, when xanthan gum and guar gum are mixed, the ratio of xanthan gum to guar gum is 0.2:0.8. The mass percentage of the thickener in the shear-thickening polishing fluid is 0.5-1.5%.

[0048] When an anti-settling agent is added to the shear-thickening polishing fluid, the anti-settling agent is polydimethylsiloxane (PDMS), which has strong shear resistance and is also a brightener that can improve precision. Utilizing the thixotropic properties of PDMS, when the polishing medium is in a static state, the viscosity of the polishing medium is high, which can effectively slow down the settling of abrasive particles and atmospheric silica. The mass percentage of the anti-settling agent in the shear-thickening polishing fluid is 5-20%.

[0049] When a surfactant is added to a shear-thickening polishing slurry, the surfactant can be one of a nonionic surfactant, a cationic surfactant, or anionic surfactant. The surfactant accounts for 1-5% of the mass of the shear-thickening polishing slurry. Examples of nonionic surfactants include diethanolamine. Examples of cationic surfactants include hexadecyltrimethylammonium chloride (quaternary ammonium salt type); and examples of anionic surfactants include sodium dodecyl sulfate, or a mixture of one or more of these. The addition of surfactants can stabilize the slurry. Adding a suitable surfactant can improve the stability of the polishing slurry, increase the steric hindrance between abrasive particles, and ensure the long-term stability of the colloidal abrasive particles. Furthermore, surfactants can improve the cleaning effect after polishing. The addition of surfactants allows them to preferentially adsorb onto the wafer surface, forming easily cleanable physical adsorption, and coating polishing particles or other particles, making them difficult to adsorb onto the surface. It can also effectively remove weakly adsorbed particles. In addition, surfactants can improve the selectivity for polishing unevenness, improve the smoothness of the polished surface, and achieve self-stopping.

[0050] When a complexing agent is added to a shear-thickening polishing fluid, the complexing agent can be ethylenediaminetetraacetic acid (EDTA), and the mass percentage of the complexing agent in the shear-thickening polishing fluid is 1-5%. The complexing agent is a substance that can chelate with metals to form stable chemicals. It chelates metal ions generated in the shear-thickening polishing fluid and during the polishing process, causing a reaction with the metal ions to form compounds, thereby accelerating the polishing rate of the workpiece.

[0051] When a shear-thickening polishing slurry is mixed with a pH adjuster, the pH adjuster may be, for example, KOH or citric acid. pH adjusters are categorized as either acidic or alkaline for polishing slurries. The pH adjuster allows for the adjustment of the pH value of the polishing slurry.

[0052] Furthermore, embodiments of the present invention also provide a shear thickening polishing method. This method is applicable to the shear thickening polishing apparatus provided by the present invention. Specifically, the shear thickening polishing method includes, for example:

[0053] S100: Workpiece clamping. Clamp the workpiece to be polished onto the mounting fixture on the sealing cover assembly. Use simulation software to calculate the appropriate polishing angle based on the workpiece clamping angle, and adjust the mounting fixture to the angle of the workpiece to be polished. Then, fasten the sealing cover assembly with the workpiece to be polished onto the first receiving cavity on the stand and seal it.

[0054] S200: Polishing environment conditioning. The shear-thickened polishing slurry is introduced into the polishing container, and the temperature of the slurry is maintained at 23-33℃ using a temperature control component.

[0055] S300: Polishing process. The air supply device is activated to introduce gas into the first chamber and reach the preset pressure. The power transmission assembly is then activated to rotate the polishing container and begin polishing the workpiece.

[0056] S400: Workpiece cleaning. Control the air pressure in the first accommodating chamber to atmospheric pressure, open the sealing cover assembly and remove the polished workpiece from the first accommodating chamber; control the transfer assembly to transport the sealing cover assembly to the second accommodating chamber and close the second accommodating chamber, so that the polished workpiece is submerged in water, and start the ultrasonic vibration mechanism to clean the shear-thickening polishing fluid on the surface of the workpiece.

[0057] In summary, the shear thickening polishing apparatus provided in this embodiment of the invention seals the polishing container with a sealing cap assembly to allow gas to pass through and controls the internal pressure of the polishing container. As the gas pressure increases, the fluid viscosity also increases. That is, by increasing the internal pressure of the polishing container through pressurization, the holding force of the shear thickening base fluid on the polishing abrasive grains and the performance of the shear thickening polishing fluid can be improved. This increases the hydrostatic pressure and the pressure of the abrasive grains on the workpiece, thereby increasing the material removal rate and improving the polishing effect. Furthermore, by setting a cleaning assembly on the stand, workpiece polishing and cleaning can be completed in one operation, improving work efficiency. Moreover, by setting a transfer assembly, fully automatic operation of the workpiece can be achieved, reducing labor and further improving work efficiency. Additionally, by setting a temperature control assembly and controlling the temperature of the shear thickening polishing fluid through a water bath, the performance of shear thickening polishing can be improved. Finally, by adding at least one of an oxidant, corrosion inhibitor, thickener, anti-settling agent, surfactant, complexing agent, and polishing fluid pH adjuster to the shear thickening polishing fluid, the polishing effect can be improved.

[0058] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A shearing thickening and polishing apparatus, characterized in that, include: A stand is provided with a first receiving cavity, and a first opening is provided on the upper surface of the stand, the first opening communicating with the first receiving cavity, and a first through hole is provided at the bottom of the first receiving cavity; A polishing container is disposed within the first accommodating cavity, and the polishing container is used to contain a shear-thickening polishing liquid. A power transmission assembly is disposed in the lower part of the first accommodating cavity. The power transmission assembly passes through the first through hole and is connected to the polishing container. The polishing container can rotate under the drive of the power transmission assembly. A sealing cap assembly is detachably connected to the stand, the sealing cap assembly covering and sealing the first opening; a mounting clamp for connecting the workpiece to be polished is provided on the side of the sealing cap assembly adjacent to the power transmission assembly; the sealing cap assembly is also provided with a second through hole, the second through hole for connecting an air supply device to control the pressure of the polishing container when polishing the workpiece to be polished using the shear-thickening polishing fluid; The raw materials of the shear-thickening polishing fluid include: abrasive, shear-thickening base fluid, oxidant, and corrosion inhibitor. The abrasive comprises 0.5-5% by mass. The oxidant is at least one selected from hydrogen peroxide, potassium permanganate, peracetic acid, and sodium persulfate, and comprises 0.5-5% by mass. The corrosion inhibitor is at least one selected from polyvinylpyrrolidone and benzotriazine, and comprises 0.5-2% by mass. The raw materials of the shear-thickening polishing fluid further include: a thickener, an anti-settling agent, a surfactant, and a complexing agent. The thickener is at least one of xanthan gum and guar gum, and the mass percentage of the thickener is 0.5-1.5%. The anti-settling agent is polydimethylsiloxane, and the mass percentage of the anti-settling agent is 5-20%. The surfactant is one of a nonionic surfactant, a cationic surfactant, and an anionic surfactant, and the mass percentage of the surfactant is 1-5%. The complexing agent is ethylenediaminetetraacetic acid, and the mass percentage of the complexing agent is 1-5%. The shear thickening base liquid includes at least one of corn starch, tapioca starch, and sweet potato starch mixed with deionized water. Specifically, the second through hole is used to connect the air supply device so that when polishing the workpiece to be polished using the shear-thickening polishing fluid, the holding force of the shear-thickening base liquid on the abrasive particles and the performance of the shear-thickening polishing fluid are controlled by controlling the internal pressure of the polishing container, thereby controlling the pressure of the abrasive particles on the workpiece to be polished, improving the material removal rate of the workpiece to be polished, and improving the polishing effect.

2. The shearing thickening and polishing apparatus according to claim 1, characterized in that, The sealing cap assembly includes: Sealing cap body; A workpiece connecting frame is connected to the side of the sealing cover body adjacent to the power transmission assembly, and the mounting fixture is connected to the workpiece connecting frame.

3. The shearing thickening and polishing apparatus according to claim 2, characterized in that, The sealing cap body includes: Cover the body; A connecting post is located inside the cover body and one end is connected to the cover body. A connecting buckle is provided at the end of the connecting post away from the cover body. The workpiece connecting frame is provided with a connecting post through hole, and a connecting groove is provided at the edge of the connecting post through hole on the side of the workpiece connecting frame away from the cover body; the connecting post passes through the connecting post through hole, and the connecting buckle is embedded in the connecting groove.

4. The shearing thickening and polishing apparatus according to claim 3, characterized in that, The workpiece connecting frame includes: An inner connecting ring, wherein the connecting post through hole is disposed on the inner connecting ring, the connecting groove is located on the side of the inner connecting ring away from the cover body, the connecting post passes through the connecting post through hole of the inner connecting ring, and the connecting buckle is embedded in the connecting groove of the inner connecting ring; The outer connecting ring is located outside the inner connecting ring; A spoke guide rail is connected between the inner connecting ring and the outer connecting ring; A slider is connected to the spoke guide and is movable relative to the spoke guide, and the mounting fixture is connected to the slider; The spoke guide rail has an extension portion extending out of the outer connecting ring at one end, and a limiting groove is provided at the first opening on the upper surface, with the extension portion embedded in the limiting groove.

5. The shearing thickening and polishing apparatus according to claim 3, characterized in that, The shearing thickening and polishing apparatus further includes a seal disposed between the sealing cap assembly and the stand to seal the first receiving cavity.

6. The shearing thickening and polishing apparatus according to claim 1, characterized in that, The platform is also provided with a second receiving cavity; a second opening is also provided on the upper surface of the platform, the second opening communicates with the second receiving cavity, and the second opening is spaced apart from the first opening and arranged side by side on the upper surface; The shear-thickening and polishing apparatus further includes a cleaning component, which comprises: A cleaning container is disposed within the second receiving cavity; and An ultrasonic vibration mechanism is located at the bottom of the cleaning container.

7. The shearing thickening and polishing apparatus according to claim 6, characterized in that, The shearing thickening and polishing apparatus further includes a transfer component, which comprises: Multiple support rods, each with one end erected on the upper surface of the platform; A lateral power transmission mechanism is connected to the other end of each of the plurality of support rods; A crossbar is connected to the transverse power transmission mechanism; A longitudinal power transmission mechanism is mounted on the crossbar and connected to the sealing cover assembly; Driven by the longitudinal power transmission mechanism, the sealing cover assembly can move the workpiece to be polished up and down relative to the platform. Driven by the transverse power transmission mechanism, the sealing cover assembly can move the workpiece to be polished back and forth between the first accommodating cavity and the second accommodating cavity relative to the platform.

8. The shearing thickening and polishing apparatus according to claim 1, characterized in that, The shearing thickening and polishing device further includes a temperature control component and a main control circuit, wherein the temperature control component includes: A temperature control box is disposed under the platform and surrounds the first accommodating cavity; A heating element is disposed inside the temperature control box and electrically connected to the main control circuit; and A temperature sensing element is disposed at the bottom of the polishing container and electrically connected to the main control circuit.

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