A silicon component cleaning device and cleaning process
By designing silicon component cleaning equipment and processes, using the combination of airbags and wipe cloth, precise polishing of silicon boat groove teeth and rapid cleaning of polycrystalline silicon plating are achieved, which solves the problems of low cleaning efficiency and cracking in the prior art and improves the service life of silicon boats.
Patent Information
- Application Number
- CN202211498196.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-11-28
- Publication Date
- 2025-07-08
- Estimated Expiration
- 2042-11-28
AI Technical Summary
In the prior art, the polysilicon plating on the surface of the silicon boat is low in cleaning efficiency and is prone to cracking of the silicon boat, making it difficult to achieve efficient cleaning while reducing stress.
Design a silicon component cleaning equipment, using the airbag and wipe cloth to match the air pump and drive components, and by adjusting the air pressure and movement of the wipe cloth in the airbag, the silicon boat groove teeth are accurately polished, avoiding local repeated polishing, and combining alkaline washing, sandblasting and ultrasonic cleaning steps, the polycrystalline silicon plating layer is gradually removed.
The cleaning efficiency of silicon boats is improved, the cracking of silicon boats is avoided, and the rapid cleaning of polycrystalline silicon coating is achieved, stress concentration is reduced, and cleaning effect is improved.
Smart Images

Figure CN115609488B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of silicon boats, and in particular, to a silicon component cleaning device and a cleaning process. Background Art
[0002] A silicon boat is a carrier during the ultra-high temperature processing of large-scale integrated circuits and plays a very important role in the production process of semiconductor wafers. The silicon boat has the characteristics of being non-deformable and durable when used at high temperatures. Since polysilicon needs to be deposited on the surface of silicon wafers during the use of the silicon boat, a polysilicon coating will also be deposited on the surface of the silicon boat after being used for a period of time.
[0003] After the polysilicon coating on the surface of the silicon boat reaches a certain thickness, it needs to be cleaned. Otherwise, the interval between the groove teeth of the groove bars of the silicon boat will be reduced, resulting in the inability to place the silicon wafer between the groove teeth, and further leading to the inability to use the silicon boat. Therefore, it is necessary to regularly clean the polysilicon coating on the surface of the silicon boat. In the prior art, the cleaning of the silicon boat mainly uses one or more of pickling, alkali washing, sandblasting, and polishing to remove the coating. Removing the coating by pickling or alkali washing will cause stress concentration inside the polysilicon coating, resulting in cracking of the silicon boat body, while polishing can disperse the stress in the coating and avoid cracking of the silicon body. Therefore, a polishing step must be added during the cleaning process of the silicon boat to eliminate stress. Since the interval between the groove teeth of the groove bars of the silicon boat is relatively small, it is difficult to clean the coating between the silicon teeth when using polishing to clean the coating on the surface of the silicon teeth. When using a profiling device to clean the coating on the surface of the silicon teeth
[0004] It usually requires manual cleaning by an operator, and the cleaning efficiency is relatively low. Therefore, how to design a silicon component cleaning device and combine a corresponding cleaning process to complete the cleaning of silicon teeth under different pressure conditions while reducing the stress during the cleaning process of the silicon boat has become an urgent technical problem to be solved. Summary of the Invention
[0005] In view of this, the purpose of the present invention is to overcome the deficiencies of the prior art and provide a silicon component cleaning device and a cleaning process, which can complete the cleaning of silicon teeth under different pressure conditions while reducing the stress during the cleaning process of the silicon boat.
[0006] To solve the above technical problems, the technical solution of the present invention is as follows:
[0007] A silicon component cleaning device for cleaning the groove bars of a silicon boat, including a frame. An airbag for supporting a wiping cloth is provided on the frame. The airbag is connected to an air pump for inflating the airbag. A wiping cloth is provided on the airbag. A plurality of airbags are arranged in an array along the arrangement direction of the groove teeth of the groove bars. A pull rope is provided between two airbags. The pull rope is located above the wiping cloth and presses the wiping cloth to make the wiping cloth fit with the airbag. The wiping cloth is connected to a driving component for driving the wiping cloth to move along the array direction of the airbags.
[0008] Compared with the prior art, the advantages of the present invention are as follows:
[0009] When the present invention is in use and the silicon boat needs to be cleaned, a plurality of air bags with wiping cloths abutted on the outside are clamped between the groove teeth of the groove rod. An air pump is used to inflate the air bags. When the air bags expand to support the wiping cloth, the wiping cloth fits with the groove teeth of the groove rod. By adjusting the internal air pressure of the air bags, the pressure between the wiping cloth and the groove teeth is adjusted. The groove rod is controlled to move along the length direction of the air bags, so as to use the wiping cloth between the air bags and the groove teeth to polish the polysilicon coating on the groove teeth.
[0010] After the groove teeth are polished for a period of time, the gas inside the air bags is released. The wiping cloth is driven to move by a driving component to change the fitting position between the wiping cloth and the air bags. The air bags are inflated again. Under the action of the air bags, the wiping cloth fits with the surface of the groove teeth again. At this time, the fitting position between the wiping cloth and the silicon teeth changes, avoiding the weakening of the polishing effect caused by the repeated polishing of the local part of the wiping cloth and the groove teeth. The above steps are repeated to polish the groove teeth.
[0011] Since the polysilicon coating is usually thin, through the above structural settings, the polishing pressure on the groove teeth is adjusted by adjusting the air pressure of the air bags, avoiding the damage to the groove teeth and the silicon body. The movement of the wiping cloth is controlled by the driving component to change the position of the wiping cloth for polishing the groove teeth, thereby improving the polishing efficiency of the groove teeth.
[0012] Preferably, a common rail cavity for weakening the change of the internal pressure of the air bags is provided between the air bags and the air pump. The air outlets of all the air bags and the air pump are communicated with the common rail cavity.
[0013] Preferably, a support bar is fixedly arranged on the frame. The support bar penetrates through the air bags to support the air bags.
[0014] Preferably, a through groove and a baffle are formed on the frame. The baffle is slidably connected with the through groove. The baffle is fixedly connected with a pull rope. The baffle abuts against the wiping cloth. An abrasive groove for placing abrasive is formed by enclosing the baffle and the wiping cloth.
[0015] Preferably, a slider and a spring are further arranged on the frame. The slider is slidably connected with the frame. A plurality of the pull ropes are fixedly connected with the slider. The spring is used to drive the slider to drive the pull ropes to tighten the wiping cloth.
[0016] Preferably, an electromagnet for driving the slider to move is further arranged on the frame. The driving force direction of the electromagnet on the slider is opposite to the driving force direction of the spring on the slider.
[0017] Preferably, an installation seat for installing a groove rod and a linear motor for driving the installation seat to move along the length direction of the airbag are provided on the frame, and the linear motor is fixedly connected to the frame.
[0018] Preferably, the driving assembly includes a winding roller around which the wiping cloth is wound and a driving shaft for driving the winding roller to rotate, and at least one of the winding roller and the driving shaft is connected with a brake for locking the rotation of the winding roller.
[0019] A silicon component cleaning process, characterized in that the silicon component cleaning process includes the following steps:
[0020] a. Immerse the silicon boat in a potassium hydroxide solution to clean the polysilicon coating;
[0021] b. Take out the silicon boat, dry it, perform sandblasting cleaning on the silicon boat, and perform grinding cleaning on the groove rod of the silicon boat to eliminate the stress caused by potassium hydroxide etching, wherein grinding is used to clean the silicon teeth with one of the above-mentioned silicon component cleaning devices;
[0022] c. Perform ultrasonic cleaning on the silicon boat to remove the particles attached to the surface of the silicon boat during the sandblasting and grinding processes;
[0023] d. Repeat steps a, b, and c;
[0024] e. After cleaning the polysilicon coating on the surface of the silicon boat, immerse the silicon boat in a hydrofluoric acid solution until the interface layer falls off from the silicon boat or the surface layer of the silicon boat falls off;
[0025] f. Wash the silicon boat to complete the cleaning of the silicon boat.
[0026] Compared with the prior art, the advantages of the present invention are as follows:
[0027] When the present invention is in use, alkali washing the silicon boat can quickly clean the polysilicon coating. During the process of grinding and cleaning the polysilicon coating on the surface of the silicon boat, due to the uncertainty of the friction force direction during the grinding process, the stress in the polysilicon coating can be eliminated, avoiding the cracking of the silicon body caused by the release of stress concentration. The two methods are alternately carried out, which not only effectively avoids the cracking of the silicon body, but also improves the cleaning efficiency of the silicon boat as much as possible.
[0028] Preferably, the soaking time of the silicon boat and the grinding time of the silicon boat in step a are determined by the deposition time of the polysilicon coating on the silicon boat. Brief Description of the Drawings
[0029] Figure 1 It is a schematic structural diagram of the present invention;
[0030] Figure 2Schematic side sectional view when cleaning the groove rod of the present invention;
[0031] Figure 3 Schematic side sectional view of the present invention;
[0032] Figure 4 is Figure 3 Enlarged schematic view of part A of;
[0033] Figure 5 Enlarged partial schematic view when the baffle is opened;
[0034] Figure 6 Front sectional view of the present invention;
[0035] Figure 7 Side view of the present invention.
[0036] Reference numerals: 10, frame; 11, linear motor; 12, mounting seat; 13, mounting groove; 14, limiting plate; 15, winding roller; 16, drive shaft; 17, brake; 20, wiping cloth; 21, airbag; 22, support bar; 24, common rail cavity; 25, pull rope; 26, baffle; 27, through groove; 30, slider; 31, spring; 32, electromagnet; 40, groove rod. Detailed description of the specific implementation
[0037] The following further details the specific implementation of the present invention in conjunction with the drawings, so that the technical solution of the present invention is easier to understand and master.
[0038] Referring to Figures 1 to 7 As shown, this embodiment provides a silicon component cleaning device and cleaning process, which can complete the cleaning of silicon teeth under different pressures while reducing the stress during the cleaning of the silicon boat.
[0039] Embodiment 1:
[0040] Combined with Figure 1 , Figure 2 and Figure 6As shown in the figure, a silicon component cleaning device for cleaning the groove rods 40 of a silicon boat includes a frame 10. An airbag 21 for supporting a wiping cloth 20 is provided on the frame 10. The wiping cloth 20 is provided on the airbag 21. A plurality of airbags 21 are arranged in an array along the arrangement direction of the groove teeth of the groove rod 40. The airbag 21 is connected to an air pump for inflating the airbag 21. A common rail chamber 24 for weakening the internal pressure change of the airbag 21 is provided between the airbag 21 and the air pump. The air outlets of all the airbags 21 and the air pump are connected to the common rail chamber 24. A support bar 22 is fixedly provided on the frame 10. The support bar 22 penetrates through the airbag 21 to support the airbag 21. A pull rope 25 is provided between two airbags 21. The pull rope 25 is located above the wiping cloth 20 and presses against the wiping cloth 20 to make the wiping cloth 20 fit with the airbag 21. The wiping cloth 20 is connected to a driving component for driving the wiping cloth 20 to move along the array direction of the airbags 21. The driving component includes a winding roller 15 for winding the wiping cloth 20 and a driving shaft 16 for driving the winding roller 15 to rotate. At least one of the winding roller 15 and the driving shaft 16 is connected to a brake 17 for locking the rotation of the winding roller 15;
[0041] An installation seat 12 for installing the groove rod 40 and a linear motor 11 for driving the installation seat 12 to move along the length direction of the airbag 21 are provided on the frame 10. The linear motor 11 is fixedly connected to the frame 10. An installation groove 13 for placing the groove rod 40 is provided on the installation seat 12. A limiting plate 14 for locking the groove rod 40 is further provided on the installation seat 12. The limiting plate 14 is rotatably connected to the installation seat 12. The limiting plate 14 is divided into an unlocking state and a locking state. In the locking state, the limiting plate 14 and the inner wall of the installation groove 13 enclose and lock the groove rod 40. As the limiting plate 14 rotates, the limiting plate 14 is separated from contact with the groove rod 40, and the limiting plate 14 switches to the unlocking state. (Refer to Figure 1 and Figure 2 the groove rod 40 in. A plurality of groove teeth for supporting silicon wafers are linearly arranged on the groove rod 40.)
[0042] During use: When the silicon boat needs to be cleaned, the groove rod 40 is installed inside the installation groove 13, and the groove rod 40 is locked by rotating the limit plate 14, so that a plurality of air bags 21 with a wiping cloth 20 abutted on the outside are clamped between the groove teeth of the groove rod 40. An air pump is used to inflate the air bags 21. When the air bags 21 expand to support the wiping cloth 20, the wiping cloth 20 fits with the groove teeth of the groove rod 40. By adjusting the internal air pressure of the air bags 21, the pressure between the wiping cloth 20 and the groove teeth is adjusted. The linear motor controls the movement of the mounting seat 12 to drive the groove rod 40 to move along the length direction of the air bag 21, so as to use the wiping cloth 20 between the air bag 21 and the groove teeth to polish the polysilicon coating on the groove teeth;
[0043] After the groove teeth are polished for a period of time, the gas inside the air bag 21 is released. The winding roller 15 is controlled to rotate by the driving shaft 16. During the rotation of the winding roller 15, the wiping cloth 20 is driven to move to change the fitting position of the wiping cloth 20 and the air bag 21. After the movement of the wiping cloth 20 is completed, the rotation of the winding roller 15 is locked by the brake 17, and the air bag 21 is inflated again. The wiping cloth 20 fits with the surface of the groove teeth again under the action of the air bag 21. At this time, the fitting position of the wiping cloth 20 and the silicon teeth changes, avoiding the weakening of the polishing effect caused by the repeated polishing of the local part of the wiping cloth 20 and the groove teeth. Repeat the above steps to polish the groove teeth.
[0044] Embodiment 2:
[0045] The difference between this embodiment and Embodiment 1 lies in the material of the wiping cloth 20 and the connection method between the pull rope 25 and the frame 10.
[0046] Combined with Figure 4 、 Figure 5 and Figure 7 As shown, in order to facilitate the adjustment of the position of the wiping cloth 20 for polishing the groove teeth, the wiping cloth 20 penetrates through the frame 10. The frame 10 is provided with a through groove 27 for the wiping cloth 20 to pass through and a baffle 26 for closing the through groove 27. The baffle 26 is slidably connected to the frame 10. The baffle 26 is fixedly connected to the pull rope 25. The baffle 26 and the wiping cloth 20 enclose an abrasive groove for placing abrasives. The frame 10 is also provided with a slider 30 and a spring 31. The slider 30 is slidably connected to the frame 10. A plurality of the pull ropes 25 are fixedly connected to the slider 30. The spring 31 is used to drive the slider 30 to drive the pull rope 25 to tighten the wiping cloth 20. The frame 10 is also provided with an electromagnet 32 for driving the slider 30 to move. An iron block is embedded in the slider 30. The driving force direction of the electromagnet 32 on the slider 30 is opposite to the driving force direction of the spring 31 on the slider 30.
[0047] During use: The wiping cloth 20 is made of lint-free cloth, and abrasives are added inside the abrasive groove. When it is necessary to replace the position of the wiping cloth 20 for grinding the groove teeth or add abrasives to the part of the wiping cloth 20 for grinding the groove teeth, the electromagnet 32 attracts the slider 30 to drive the pull rope 25 and the baffle 26 to move upward. The pull rope 25 no longer presses against the wiping cloth 20, and the spring 31 is compressed. The winding roller 15 is controlled to rotate by the drive shaft 16 to drive the movement of the wiping cloth 20. Since the pull rope 25 no longer presses against the wiping cloth 20, the bending degree of the wiping cloth 20 is weakened, and the resistance to controlling the movement of the wiping cloth 20 by the winding roller 15 is weakened, facilitating the control of the movement of the wiping cloth 20.
[0048] A silicon component cleaning process, characterized in that the silicon component cleaning process comprises the following steps:
[0049] a. Immerse the silicon boat in a potassium hydroxide solution to clean the polysilicon coating;
[0050] b. Take out the silicon boat and blow it dry, perform sandblasting cleaning on the silicon boat, and grind and clean the groove rods 40 of the silicon boat to eliminate the stress caused by potassium hydroxide etching. Among them, grinding is carried out using a silicon component cleaning device provided in Embodiment 1 to clean the silicon teeth;
[0051] c. Perform ultrasonic cleaning on the silicon boat to remove the particles attached to the surface of the silicon boat during the sandblasting and grinding processes;
[0052] d. Repeat steps a, b, and c;
[0053] e. After cleaning the polysilicon coating on the surface of the silicon boat, immerse the silicon boat in a hydrofluoric acid solution until the interface layer falls off from the silicon boat or the surface layer of the silicon boat falls off;
[0054] f. Wash the silicon boat to complete the cleaning of the silicon boat.
[0055] (It should be noted that: The surface coating of the silicon component is cleaned until the interface layer between the coating and the silicon component. The interface layer can be any one of silicon and silicon oxide, silicon and silicon nitride, or silicon and silicon oxynitride. The reason for the change of the interface layer of the silicon component is related to the processing technology of the silicon component.)
[0056] Since any one of the interface layer of silicon and silicon oxide, silicon and silicon nitride, or silicon and silicon oxynitride reacts with hydrofluoric acid, only different interface layers require hydrofluoric acid under different conditions. For example, silicon oxide reacts with dilute hydrofluoric acid at room temperature, and silicon nitride reacts with heated hydrofluoric acid, etc. Immerse the silicon component with only the interface layer in a hydrofluoric acid solution until the interface layer falls off from the body of the silicon component. Wash the silicon component to complete the silicon component cleaning process.)
[0057] The soaking time and polishing time of the quartz boat in step a are determined by the time for depositing the polysilicon coating on the quartz boat.
[0058] During use:
[0059] 1. Soak the quartz boat in a potassium hydroxide solution with a mass fraction of 45% and a temperature of 60°C for 30 minutes;
[0060] 2. Take out the quartz boat, dry it, and perform sandblasting on the surface to eliminate the stress caused by potassium hydroxide etching;
[0061] 3. Ultrasonically clean the quartz boat to remove the particles attached to the surface of the quartz boat during sandblasting;
[0062] 4. Soak the quartz boat in a potassium hydroxide solution with a mass fraction of 20% and a temperature of 60°C for 30 minutes again;
[0063] 5. Take out the quartz boat, dry it, and perform sandblasting on the surface to eliminate the stress caused by potassium hydroxide etching;
[0064] 6. Ultrasonically clean the quartz boat to remove the particles attached to the surface of the quartz boat during sandblasting;
[0065] 7. Take out the quartz boat, dry it, sandblast and clean the surface again, and repeat this process until the polysilicon coating on the surface of the quartz boat is cleaned;
[0066] 8. Soak the quartz boat in a hydrofluoric acid solution with a temperature of 35°C and a mass fraction of 10% until the interface layer falls off the quartz boat or the surface layer of the quartz boat falls off;
[0067] 9. Wash the quartz boat to complete the cleaning of the quartz boat.
[0068] The above are only typical examples of the present invention. In addition, the present invention can also have many other specific implementation manners. Any technical solutions formed by equivalent replacement or equivalent transformation fall within the scope of protection required by the present invention.
Claims
1. A silicon component cleaning device for cleaning the groove rods (40) of a silicon boat, comprising a frame (10), characterized in that, An airbag (21) for supporting a wiping cloth (20) is provided on the frame (10). The airbag (21) is connected to an air pump for inflating the airbag (21). A wiping cloth (20) is provided on the airbag (21). A plurality of airbags (21) are arranged in an array along the arrangement direction of the groove teeth of the groove rod (40). A pull rope (25) is provided between two airbags (21). The pull rope (25) is located above the wiping cloth (20) and presses against the wiping cloth (20) so that the wiping cloth (20) fits with the airbag (21). The wiping cloth (20) is connected to a driving assembly for driving the wiping cloth (20) to move along the array direction of the airbags (21).
2. The silicon component cleaning device according to claim 1, characterized in that: A common rail chamber (24) for weakening the internal pressure change of the airbag (21) is provided between the airbag (21) and the air pump. The air outlets of all the airbags (21) and the air pump are connected to the common rail chamber (24).
3. A silicon component cleaning device according to claim 1, characterized in that: A support bar (22) is fixedly provided on the frame (10). The support bar (22) penetrates through the airbag (21) for supporting the airbag (21).
4. A silicon component cleaning device according to claim 1, characterized in that: A through groove (27) and a baffle (26) are formed on the frame (10). The baffle (26) is slidably connected to the through groove (27). The baffle (26) is fixedly connected to the pull rope (25). The baffle (26) presses against the wiping cloth (20). The baffle (26) and the wiping cloth (20) enclose an abrasive groove for placing abrasives.
5. A silicon component cleaning device according to claim 4, characterized in that: A slider (30) and a spring (31) are further provided on the frame (10). The slider (30) is slidably connected to the frame (10). A plurality of pull ropes (25) are fixedly connected to the slider (30). The spring (31) is used to drive the slider (30) to drive the pull rope (25) to tighten the wiping cloth (20).
6. The silicon component cleaning device according to claim 5, wherein: An electromagnet (32) for driving the slider (30) to move is further provided on the frame (10). The driving force direction of the electromagnet (32) on the slider (30) is opposite to the driving force direction of the spring (31) on the slider (30).
7. A silicon component cleaning device according to claim 1, characterized in that, A mounting seat (12) for mounting the groove rod 40 and a linear motor (11) for driving the mounting seat (12) to move along the length direction of the airbag (21) are provided on the frame (10). The linear motor (11) is fixedly connected to the frame (10).
8. A silicon component cleaning device according to claim 1, characterized in that, The driving assembly includes a winding roller (15) for winding the wiping cloth (20) and a driving shaft (16) for driving the winding roller (15) to rotate. At least one of the winding roller (15) and the driving shaft (16) is connected to a brake (17) for locking the rotation of the winding roller (15).
9. A silicon component cleaning process, characterized in that, The silicon component cleaning process includes the following steps: a. Immerse the silicon boat in a potassium hydroxide solution to clean the polysilicon coating; b. Take out the quartz boat and dry it, grind and clean the groove rods (40) of the quartz boat to eliminate the stress caused by potassium hydroxide etching, and the grinding is carried out by using a silicon component cleaning device as described in any one of claims 1 to 8 to clean the silicon teeth; c. Ultrasonically clean the quartz boat to remove the particles adhering to the surface of the quartz boat during the grinding process; d. Repeat steps a, b and c; e. After cleaning the polysilicon coating on the surface of the quartz boat, immerse the quartz boat in the interior of the hydrofluoric acid solution until the interface layer falls off from the quartz boat or the surface layer of the quartz boat falls off; f. Wash the quartz boat to complete the cleaning of the quartz boat.
10. A silicon component cleaning process according to claim 9, characterized in that: The soaking time of the quartz boat and the grinding time of the quartz boat in step a are determined by the time for depositing the polysilicon coating on the quartz boat.
Citation Information
Patent Citations
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