Magnetic field detection method and magnetic field detection system
The method and system enable non-invasive magnetic field detection in Faraday cups by using a separator and drive mechanism to measure ion beam position and current, ensuring accurate measurements without disassembly.
Patent Information
- Application Number
- CN202211502794.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2022-11-28
- Publication Date
- 2025-07-15
- Estimated Expiration
- 2042-11-28
AI Technical Summary
The prior art requires disassembly of the Faraday device to measure the magnetic field, which affects its accuracy and is inconvenient for frequent operation.
By applying a magnetic field to the Faraday cup, the movement of the isolator and the Faraday cup is controlled using the drive module, the ion beam incident position is recorded, the deflection radius is calculated, and the magnetic field is calculated in combination with the element mass, velocity and charge number of the ion beam.
The magnetic field can be accurately measured without disassembling the Faraday device, ensuring that its operating accuracy is not affected.
Smart Images

Figure CN115728679B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of measurement technologies, and particularly to a magnetic field detection method and a magnetic field detection system. Background Art
[0002] In an ion implanter, a Faraday device is often used to monitor the intensity of an ion beam. Among them, for the Faraday device, the magnetic flux of the magnetic field where the Faraday device is located is often an important indicator; too large or too small magnetic flux will affect the detection of the ion beam by the Faraday device, and further affect the amount of implanted ions in the wafer.
[0003] When measuring the magnetic flux inside the Faraday device, the Faraday device needs to be disassembled from the ion implanter, and a fluxmeter is used to measure the magnetic flux of the magnetic field inside the Faraday device. However, the Faraday device is a precision component and cannot be disassembled frequently to measure the magnetic flux; moreover, if the Faraday device is disassembled carelessly, it will affect the measurement accuracy of the Faraday device. Summary of the Invention
[0004] According to the foregoing, this application provides a magnetic field detection method and a magnetic field detection system, which solve the problem of needing to disassemble the Faraday device to measure the magnetic field, can normally obtain the value of the magnetic field, and do not affect the operation of the Faraday device.
[0005] Based on the above object, this application provides a magnetic field detection method, including: applying a magnetic field to a Faraday cup; controlling a driving module to drive an isolator close to the Faraday cup and allowing an ion beam to pass through the through hole of the isolator and enter the Faraday cup; controlling the driving module to drive the Faraday cup to move to receive the ion beam, and recording the incident position where the ion beam enters the Faraday cup; obtaining a deflection radius according to the incident position; calculating the magnetic field according to the deflection radius, the elemental mass of the ion beam, the velocity of the ion beam, and the charge number of the ion beam.
[0006] In an embodiment of this application, the magnetic field detection method of this application further includes: detecting a first ion beam current corresponding to the ion beam; generating a first curve graph according to the incident position and the first ion beam current; finding the maximum value of the first ion beam current from the first curve graph; finding a corresponding first position from the incident position according to the maximum value of the first ion beam current; calculating a first difference between the first position and a reference position, where the reference position is the position corresponding to the maximum ion beam current when leaving the factory; and determining whether the first difference is within a preset range.
[0007] In an embodiment of the present application, the incident position is the first incident position, and the magnetic field detection method of the present application further includes: when the first difference is within a preset range, controlling the driving module to drive the baffle of the isolator to block the ion beam from passing through the perforation, and initializing the Faraday cup; when the first difference is not within the preset range, re-acquiring the second ion beam current corresponding to the ion beam from the Faraday cup and re-acquiring the second incident position corresponding to the ion beam from the driving module; generating a second curve graph based on the second ion beam current and the second incident position; finding the maximum value of the second ion beam current from the second curve graph; finding the corresponding second position from the second incident position according to the maximum value of the second ion beam current; calculating a second difference between the second position and the reference position; and determining whether the second difference is within the preset range.
[0008] In an embodiment of the present application, the magnetic field detection method of the present application further includes: when the second difference is within a preset range, controlling the driving module to drive the baffle of the isolator to block the ion beam from passing through the perforation, and initializing the Faraday cup; and when the second difference is not within the preset range, sending a warning message.
[0009] In an embodiment of the present application, the first difference and the second difference are proportional to the change in magnetic flux.
[0010] Based on the above object, the present application provides a magnetic field detection system, including a Faraday cup, a first magnet, a second magnet, an isolator, a driving module, and a processor. The Faraday cup is used to receive an ion beam. The first magnet is disposed on one side of the Faraday cup. The second magnet is disposed on the other side of the Faraday cup and provides a magnetic field to the Faraday cup together with the first magnet. The isolator is disposed on the path of the ion beam traveling to the Faraday cup and has a perforation and a baffle. The driving module is connected to the isolator and the Faraday cup, and drives the isolator close to the Faraday cup and allows the ion beam to pass through the perforation and enter the Faraday cup or drives the baffle to block the ion beam from passing through the perforation, and records the incident position of the ion beam entering the Faraday cup. The processor is connected to the Faraday cup and the driving module, obtains the deflection radius according to the incident position, and calculates the magnetic field according to the deflection radius, the element mass of the ion beam, the velocity of the ion beam, and the charge number of the ion beam.
[0011] In an embodiment of the present application, the Faraday cup detects and transmits the first ion beam current corresponding to the ion beam to the processor. The processor generates a first curve graph based on the incident position and the first ion beam current, finds the maximum value of the first ion beam current from the first curve graph, finds the corresponding first position from the incident position according to the maximum value of the first ion beam current, and calculates a first difference between the first position and the reference position to determine whether the first difference is within the preset range, where the reference position is the position corresponding to the maximum ion beam current at the time of factory shipment.
[0012] In an embodiment of the present application, the incident position is the first incident position. When the first difference is within a preset range, the processor controls the driving module to drive the baffle to block the ion beam from passing through the perforation and initializes the Faraday cup; when the first difference is not within the preset range, the processor re-gets the second ion beam current corresponding to the ion beam from the Faraday cup and re-gets the second incident position corresponding to the ion beam from the driving module, generates a second curve graph based on the second ion beam current and the second incident position, finds the maximum value of the second ion beam current from the second curve graph, and finds the corresponding second position from the second incident position according to the maximum value of the second ion beam current, and further calculates the second difference between the second position and the reference position to determine whether the second difference is within the preset range.
[0013] In an embodiment of the present application, when the second difference is within the preset range, the processor controls the driving module to drive the baffle to block the ion beam from passing through the perforation and initializes the Faraday cup; when the second difference is not within the preset range, the processor issues a warning message.
[0014] In an embodiment of the present application, the first difference and the second difference are proportional to the change in magnetic flux.
[0015] In an embodiment of the present application, the driving module includes a first driving module and a second driving module. The first driving module is connected to the isolator and drives the isolator to approach the Faraday cup. The second driving module is connected to and drives the Faraday cup and records the incident position where the ion beam enters the Faraday cup.
[0016] In an embodiment of the present application, the first driving module includes a first motor, a first encoder, and a first rotating group. The first encoder is disposed adjacent to the first motor. The first motor and the isolator are respectively disposed on opposite sides of the first rotating group. The first motor drives the first rotating group to move the isolator, and the first encoder records the position of the isolator.
[0017] In an embodiment of the present application, the second driving module includes a second motor, a second encoder, and a second rotating group. The second encoder is disposed adjacent to the second motor. The second motor and the Faraday cup are respectively disposed on opposite sides of the second rotating group. The second motor drives the second rotating group to move the Faraday cup, and the second encoder records the incident position where the ion beam enters the Faraday cup.
[0018] In summary, for the magnetic field detection method and magnetic field detection system of the present application, through the configuration of the isolator, the driving module, and the processor, the incident position where the ion beam enters the Faraday cup can be successfully obtained, the deflection radius can be obtained according to the incident position, and then the magnetic field can be obtained according to the deflection radius, without affecting the operation of the Faraday cup and the measurement accuracy.
[0019] The above description is only an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention and be implemented in accordance with the content of the specification, the present invention will be described in detail below with reference to the preferred embodiments of the present invention and the accompanying drawings. Description of the Drawings
[0020] Figure 1 FIG. is a configuration diagram of a magnetic field detection system according to an embodiment of the present application.
[0021] Figure 2 FIG. is a configuration diagram of a second driving module according to an embodiment of the present application.
[0022] Figure 3 FIG. is a block diagram of a processor, a driving module, a Faraday cup, and an isolator according to an embodiment of the present application.
[0023] Figure 4A And Figure 4B FIG. is an operation schematic diagram of a magnetic field detection system according to an embodiment of the present application.
[0024] Figure 5 FIG. is a flowchart of a magnetic field detection method according to an embodiment of the present application.
[0025] Figure 6A And Figure 6B FIG. is a flowchart of a magnetic field detection method according to another embodiment of the present application.
[0026] Figure 7 FIG. is a flowchart of a magnetic field detection method according to still another embodiment of the present application.
[0027] Figure 8 FIG. is a graph of ion beam current versus magnetic field according to an embodiment of the present application.
[0028] Description of the Reference Numerals:
[0029] 10: Body
[0030] 11: Top Plate
[0031] 12: First Side Plate
[0032] 13: Second Side Plate
[0033] 14: Third Side Plate
[0034] 15: Bottom Plate
[0035] 20: Faraday Cup
[0036] 30: First Magnet
[0037] 40: Second Magnet
[0038] 50: Isolator
[0039] 51: Perforation
[0040] 52: Baffle
[0041] 60: Driving module
[0042] 60A: First driving module
[0043] 60B: Second driving module
[0044] 61A: First motor
[0045] 62B: Second motor
[0046] 62A: First encoder
[0047] 62B: Second encoder
[0048] 63A: First rotating group
[0049] 63B: Second rotating group
[0050] A0: Reference position
[0051] A1: Position
[0052] B1: Ion beam
[0053] H1: Opening
[0054] S11~S30, S41~S52: Steps Detailed implementation manners
[0055] The following specific embodiments illustrate the implementation manners of the present application. Those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in this specification.
[0056] It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the drawings and in combination with the embodiments. In order to make those skilled in the art better understand the solution of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present application without creative efforts shall fall within the protection scope of the present application.
[0057] It should be noted that in the description, claims and the above-mentioned drawings of this application, terms such as "first", "second", etc. are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units does not necessarily limit to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.
[0058] Please refer to Figure 1 , which is a configuration diagram of a magnetic field detection system shown according to an embodiment of this application. As Figure 1 shown, the magnetic field detection system of this application includes a main body 10, a Faraday cup 20, a first magnet 30, a second magnet 40, an isolator 50, a driving module 60, and a processor 70.
[0059] The main body 10 has a transmission space to allow the ion beam B1 to travel. Specifically, the main body 10 includes a top plate 11, a first side plate 12, a second side plate 13, a third side plate 14, and a fifth side plate 15. The shapes of the top plate 11, the first side plate 12, the second side plate 13, the third side plate 14, and the fifth side plate 15 can be, for example, rectangular. The first side plate 12 and the second side plate 13 are disposed on two long sides of the top plate 11 and are opposite to each other. The first side plate 12 and the second side plate 13 are also located on two long sides of the bottom plate 15. The third side plate 14 is disposed on a short side of the top plate 11 and has a slit SL1. The third side plate 14 is also located on a short side of the bottom plate 15. The first side plate 12, the second side plate 13, and the third side plate 14 are adjacent to each other in pairs. The top plate 11, the first side plate 12, the second side plate 13, the third side plate 14, and the fifth side plate 15 define a transmission space to allow the ion beam B1 to travel; in other words, the ion beam B1 travels within the transmission space.
[0060] The Faraday cup 20 is disposed on the second side plate 13 within the main body 10 and has an opening H1 to receive the ion beam B1. The first magnet 30 is disposed on one side of the Faraday cup 20. The second magnet 40 is disposed on the other side of the Faraday cup 20 and provides a magnetic field to the Faraday cup 20 together with the first magnet 30. In other words, the first magnet 30 and the second magnet 40 are disposed in the height direction of the Faraday cup 20 (i.e., the short side direction of the second side plate 13), and are respectively located above and below the Faraday cup 20 to apply a magnetic field in a direction perpendicular to the traveling direction of the ion beam B1.
[0061] In one embodiment, the first magnet 30 and the second magnet 40 are permanent magnets. In another embodiment, the first magnet 30 and the second magnet 40 are electromagnets.
[0062] The isolator 50 is disposed on the first side plate 12 within the body 10 and is located on the path of the ion beam B1 traveling to the Faraday cup 20. The isolator 50 has a perforation 51 and a baffle 52. Since the first side plate 12 and the second side plate 13 are located on opposite sides of the top plate 10, the isolator 50 and the Faraday cup 20 are disposed on opposite side surfaces within the body 10 and are correspondingly arranged.
[0063] The drive module 60 is disposed outside the body 10 and is connected to the isolator 50 and the Faraday cup 20. The drive module 60 drives the isolator 50 to approach the Faraday cup 20 and allows the ion beam B1 to pass through the perforation 51 and enter the Faraday cup 20, or drives the baffle 52 to block the ion beam B1 from passing through the perforation 51, and also records the incident position of the ion beam B1 entering the Faraday cup 20.
[0064] Please refer to Figure 2 , which is a configuration diagram of the second drive module illustrated according to an embodiment of the present application. As Figure 2 shown, and referring to Figure 1 , the drive module 60 includes a first drive module 60A and a second drive module 60B. The first drive module 60A is connected to the isolator 50 and drives the isolator 50 to approach the Faraday cup 20, and includes a first motor 61A, a first encoder 62A, and a first rotating group 63A. The second drive module 60B is connected to and drives the Faraday cup 20 and records the incident position of the ion beam B1 entering the Faraday cup 20, and includes a second motor 61B, a second encoder 62B, and a second rotating group 63B.
[0065] Regarding the configuration of the first drive module 60A, one side of the first rotating group 63A is axially connected to the rotating shaft of the first motor 61A, and the other side of the first rotating group 63A is provided with the isolator 50. The first motor 61A drives the first rotating group 63A to move the isolator 50 so that the isolator 50 moves within the transmission space defined by the body 10. In other words, the first motor 61A is disposed on one side of the first rotating group 63A, the isolator 50 is disposed on the other side of the first rotating group 63A, and the first motor 61A drives the first rotating group 63A to rotate to drive the isolator 50 to move. Among them, the first rotating group 63A can be, for example, a gear structure or a ball screw. Of course, the first rotating group 63A can also be other better rotating structures that can be driven by the first motor 61A, and is not limited to the scope listed in the present application.
[0066] The first encoder 62A is disposed adjacent to the first motor 61A and records the rotational position of the first motor 61A, and the position of the isolator 50 can be obtained from the rotational position of the first motor 61A; in other words, the first encoder 62A records the position of the isolator 50. In one embodiment, the first encoder 62A is an optical encoder and includes a disk, a light source, and a photosensor. The perforation of the disk is fixedly sleeved on the rotating shaft of the first motor 61A, and the disk will rotate synchronously with the rotating shaft of the first motor 61A. The light source and the photosensor are disposed adjacent to the disk. The light source emits incident light to the disk and reflects the reflected light to the photosensor. The rotational position of the first motor 61A can be obtained from the reflected light received by the photosensor, and the position of the isolator 50 can be further obtained based on the rotational position of the first motor 61A. In another embodiment, the first encoder 62A is a Hall encoder and includes a disk and a Hall sensor. The disk has a plurality of different magnetic poles and is fixedly sleeved on the rotating shaft of the first motor 61A through the perforation. The disk will rotate synchronously with the rotating shaft of the first motor 61A. The Hall sensor senses the magnetic field change of the disk. The rotational position of the first motor 61A can be obtained from the magnetic field change of the disk, and the position of the isolator 50 can be further obtained based on the rotational position of the first motor 61A.
[0067] Regarding the configuration of the second driving module 60B, one side of the second rotating group 63B is axially connected to the rotating shaft of the second motor 61B, and a Faraday cup 20 is disposed on the other side of the second rotating group 63B. The second motor 61B drives the second rotating group 63B to move the Faraday cup 20 so that the Faraday cup 21 moves in the transmission space defined by the body 10. In other words, the second motor 61B is disposed on one side of the second rotating group 63B, the Faraday cup 20 is disposed on the other side of the second rotating group 63B, and the second motor 61B drives the second rotating group 63B to rotate to drive the Faraday cup 20 to move. Although Figure 1 the second rotating group 63B shown is a screw structure, the second rotating group 63B is not limited to the screw structure and can be a gear structure. Of course, the second rotating group 63B can also be other better rotating structures that can be driven by the second motor 61B, and is not limited to the scope listed in this application.
[0068] The second encoder 62B is disposed adjacent to the second motor 61B and records the rotational position of the second motor 61B. The incident position of the ion beam B1 entering the Faraday cup 20 can be determined from the rotational position of the second motor 61B; in other words, the second encoder 62B records the incident position of the ion beam B1 entering the Faraday cup 20. In one embodiment, the second encoder 62B is an optical encoder and includes a disk, a light source, and a light sensor. The perforation of the disk is fixedly sleeved on the rotating shaft of the second motor 61B. The disk will rotate synchronously with the rotating shaft of the second motor 61B. The light source and the light sensor are disposed adjacent to the disk. The light source emits incident light to the disk and the reflected light is reflected to the light sensor. The rotational position of the second motor 61B can be determined from the reflected light received by the light sensor, and the incident position of the ion beam B1 entering the Faraday cup 20 can be further determined based on the rotational position of the second motor 61B. In another embodiment, the second encoder 62B is a Hall encoder and includes a disk and a Hall sensor. The disk has a plurality of different magnetic poles and is fixedly sleeved on the rotating shaft of the second motor 61B through the perforation. The disk will rotate synchronously with the rotating shaft of the second motor 61B. The Hall sensor senses the magnetic field change of the disk. The rotational position of the second motor 61B can be determined from the magnetic field change of the disk, and the incident position of the ion beam B1 entering the Faraday cup 20 can be further determined based on the rotational position of the second motor 61B.
[0069] Please refer to Figure 3 , which is a block diagram showing a processor, a driving module, a Faraday cup, and an isolator according to an embodiment of the present application. As Figure 3 shown, the processor 70 is connected to the driving module 60 and the Faraday cup 20. Further, the processor 70 is electrically connected to the first motor 61A and the first encoder 62A of the first driving module 60A and the second motor 61B and the second encoder 62B of the second driving module 60B through wires; alternatively, the processor 70 is wirelessly connected to the wireless transceiver of the first driving module 60A and the wireless transceiver of the second driving module 60B. The wireless transceiver of the first driving module 60A is connected to the first motor 61A and the first encoder 62A of the first driving module 60A, and the wireless transceiver of the second driving module 60B is connected to the second motor 61B and the second encoder 62B of the second driving module 60B. The processor 70 can be a central processing unit, a graphics processing unit, or other types of processors. The foregoing are only examples and are not limited to the scope listed in the present invention. Specifically, the processor 70 can be a processor of a computer or a processor of a super computer.
[0070] The processor 70 issues a first control signal and a second control signal to the first motor 61A and the second motor 61B. The first motor 61A moves the isolator 50 according to the first control signal, and the second motor 61B moves the Faraday cup 20 according to the second control signal. The processor 70 obtains the position of the isolator 50 and the incident position of the ion beam B1 entering the Faraday cup 20 from the first encoder 62A and the second encoder 62B, and obtains the ion beam current corresponding to the ion beam B1 from the Faraday cup 20. The details of the magnetic field applied to the Faraday cup 20 calculated by the processor 70 will be described in the paragraph of the magnetic field detection method.
[0071] Please refer to Figure 4A and Figure 4B , which is a schematic diagram showing the operation of the magnetic field detection system according to an embodiment of the present application. As Figure 4A shown, and referring to Figure 3 , the first motor 61A drives the first rotating group 63A according to the first control signal. The first rotating group 63A drives the isolator 50 to move from the first side plate 12 to the second side plate 13, so that the isolator 50 approaches the Faraday cup 20 and is located in front of the Faraday cup 20. The ion beam B1 passes through the perforation 51 and enters the Faraday cup 20. The second motor 62A drives the second rotating group 63A according to the second control signal. The second rotating group 63A drives the Faraday cup 20 to move (the moving direction of the Faraday cup 20 is perpendicular to the moving direction of the isolator 50). The second encoder 62B records the incident position of the ion beam B1 entering the Faraday cup 20 and transmits the incident position to the processor 70. As Figure 4B shown, the first motor 61A drives the first rotating group 63A according to the first control signal. The first rotating group 63A drives the baffle 52 to move to block the perforation 51 to block the ion beam B1 from passing through the perforation 51. The first encoder 62A records the position of the isolator 50 and transmits the position of the isolator 50 to the processor 70.
[0072] Please refer to Figure 5 , which is a flowchart showing the magnetic field detection method according to an embodiment of the present application. As Figure 5 shown, the magnetic field detection method of the present application includes steps S11 to S15. Figure 5 The magnetic field detection method shown can be applied to Figures 1 to 3 the magnetic field detection system shown, but not limited thereto. The following will exemplarily illustrate steps S11 to S15 with the Figures 1 to 3 magnetic field detection system shown.
[0073] Step S11: Apply a magnetic field to the Faraday cup 20. In one embodiment, a magnetic field is applied to the Faraday cup 20 through the first magnet 30 and the second magnet 40 which are permanent magnets. In another embodiment, the first magnet 30 and the second magnet 40 are electromagnets, and the processor 70 transmits a trigger signal to the current sources corresponding to the first magnet 30 and the second magnet 40. The current sources transmit current to the first magnet 30 and the second magnet 40 according to the trigger signal, and the first magnet 30 and the second magnet 40 apply a magnetic field to the Faraday cup 20.
[0074] Step S12: Control the driving module 60 to drive the isolator 50 to approach the Faraday cup 20 and allow the ion beam B1 to pass through the perforation 51 and enter the Faraday cup 20. As described above, the processor 70 issues a first control signal to the first motor 61A of the first driving module 60A. The first motor 61A drives the first rotating group 63A to drive the isolator 50 to move towards the direction of the second side plate 13, so that the isolator 50 approaches the Faraday cup 20. The opening H1 of the Faraday cup 20 is communicated with the transmission space, and the ion beam B1 passes through the perforation 51 and enters the Faraday cup 20. The first encoder 62A records and transmits the position of the isolator 50 to the processor 70.
[0075] Step S13: Control the driving module 60 to drive the Faraday cup 20 to move to receive the ion beam B1 and record the incident position where the ion beam B1 enters the Faraday cup 20. As described above, the ion beam B1 enters the opening H1 of the Faraday cup 20. The processor 70 issues a second control signal to the second motor 61B of the second driving module 60B. The second motor 61B drives the Faraday cup 20 to reciprocate in the transmission space in the direction parallel to the long side of the second side plate 13. The second encoder 62B records and transmits multiple incident positions where the ion beam B1 enters the Faraday cup 20 at multiple moving time points of the Faraday cup 20 to the processor 70.
[0076] Step S14: Obtain the deflection radius according to the incident position. In one embodiment, the processor 70 calculates multiple distances between multiple incident positions and the center point of the ion beam B1, and averages the multiple distances to obtain the average distance as the deflection radius. In another embodiment, the processor 70 calculates multiple distances between multiple incident positions and the center point of the ion beam B1, and takes the mode of the multiple distances as the deflection radius.
[0077] Step S15: Calculate the magnetic field according to the deflection radius, the elemental mass of the ion beam B1, the velocity of the ion beam B1, and the charge number of the ion beam B1. Specifically, the processor 70 obtains the elemental mass, the velocity, and the charge number of the ion beam B1 from the ion implanter that emits the ion beam B1, and obtains the magnetic field according to the following operation formula:
[0078] B = mv / Rq
[0079] Among them, B is the magnetic field, m is the element mass of the ion beam B1, v is the velocity of the ion beam B1, R is the deflection radius, and q is the charge number of the ion beam B1.
[0080] Please refer to Figure 6A and Figure 6B , which is a flowchart showing a magnetic field detection method according to another embodiment of the present application. As Figure 6A and Figure 6B shown, the magnetic field detection method of the present application includes steps S11 to S30. Steps S11 to S15 are the same as steps S11 to S15 shown in Figure 1 , and will not be repeated here. Steps S16 to S30 are steps for determining whether the incident position and the reference position corresponding to the maximum ion beam intensity are within a preset range. Figure 6A and Figure 6B shown, the steps for determining whether the incident position and the reference position corresponding to the maximum ion beam intensity are within a preset range can be applied to the magnetic field detection system shown in Figures 1 to 3 , but not limited thereto. The following illustrates steps S16 to S30 by taking the magnetic field detection system shown in Figures 1 to 3 as an example.
[0081] Step S16: Detect the first ion beam current corresponding to the ion beam B1. Specifically, the Faraday cup 20 receives multiple ion beams B1 at multiple moving time points to generate multiple first ion beam currents corresponding to the multiple ion beams B1, and transmits the multiple first ion beam currents to the processor 70.
[0082] Step S17: Generate a first curve graph according to the first incident position and the first ion beam current. Specifically, the multiple incident positions received by the processor 70 in step S13 shown in Figure 1 are multiple first incident positions, and one first incident position corresponds to one first ion beam current, that is, the relationship between the first incident position and the first ion beam current is a one-to-one relationship. Then, the processor 70 generates a first curve graph according to the multiple first incident positions and the multiple first ion beam currents.
[0083] Step S18: Find the maximum value of the first ion beam current from the first curve graph. Specifically, the processor 70 selects the maximum value of the first ion beam current from the multiple first ion beam currents of the first curve graph.
[0084] In one embodiment, the processor 70 compares the values of multiple first ion beam currents pairwise, and then obtains the maximum value of the first ion beam current. In another embodiment, the processor 70 has a reference current value and compares the value of each first ion beam current with the reference current value. If the value of the first ion beam current is greater than the value of the reference current value, the processor 70 marks the first ion beam current with a value greater than the value of the reference current value as the first category; if the value of the first ion beam current is less than the value of the reference current value, the processor 70 marks the first ion beam current with a value less than the value of the reference current value as the second category. Therefore, some of the multiple first ion beam currents belong to the first category, and some of the multiple first ion beam currents belong to the second category. Then, the processor 70 selects the maximum value of the first ion beam current from the multiple first ion beam currents belonging to the first category.
[0085] Step S19: Find the corresponding first position from the first incident positions according to the maximum value of the first ion beam current. Specifically, the processor 70 finds the first position corresponding to the maximum value of the first ion beam current from multiple first incident positions according to the maximum value of the first ion beam current and the first curve graph.
[0086] Step S20: Calculate the first difference between the first position and the reference position. Specifically, the processor 70 has a reference position and calculates the first difference between the first position and the reference position. The reference position is the position corresponding to the maximum ion beam current when leaving the factory. The R & D personnel can set the reference position in the processor 70 according to the actual conditions of the ion beam or pre-store the reference position in the memory of the processor 70.
[0087] Step S21: Determine whether the first difference is within the preset range. Specifically, the processor 70 determines whether the first difference is within the preset range or not. The R & D personnel set the preset range in the processor 70 or pre-store the preset range in the memory of the processor 70. The preset range can be, for example, 0% to 1%, and the preset range can be changed according to the actual conditions of the ion beam. The value of the preset range is not limited here.
[0088] When the first difference is within the preset range, the processor 70 continues to execute step S22; when the first difference is not within the preset range, the processor 70 continues to execute step S23.
[0089] Step S22: Control the driving module 60 to drive the baffle 52 to block the ion beam B1 from passing through the perforation 51, and initialize the Faraday cup 20. Specifically, the processor 70 sends a first control signal to the first motor 61A of the first driving module 60A. The first motor 61A drives the first rotating group 63A, and the first rotating group 63A drives the baffle 52 to move to block the perforation 51, so as to block the ion beam B1 from passing through the perforation 51 and further block the ion beam B1 from entering the Faraday cup 20. When the isolator 50 blocks the ion beam B1 from entering the Faraday cup 20, the processor 70 executes an initialization program on the Faraday cup 20 to initialize the Faraday cup 20. After initialization, there is no data residue of any first ion beam current in the Faraday cup 20.
[0090] In addition, since the first difference is proportional to the change in the magnetic field, that is, the first difference is proportional to the change in magnetic flux, the processor 70 can judge whether the change in magnetic flux is drastic according to the value of the first difference.
[0091] Step S23: Re-obtain the second ion beam current corresponding to the ion beam B1 from the Faraday cup 20 and re-obtain the second incident position corresponding to the ion beam B1 from the driving module 60. Specifically, the processor 70 executes an initialization program on the Faraday cup 20 to initialize the Faraday cup 20. After initialization, there is no data residue of any first ion beam current in the Faraday cup 20. Then, the processor 70 sends a second control signal to the second motor 61B of the second driving module 60B. The second motor 61B drives the Faraday cup 20 to reciprocate in the transmission space in the direction parallel to the long side of the second side plate 13, so that the Faraday cup 20 re-receives the ion beam B1 and generates a second ion beam current corresponding to the ion beam B1. The second encoder 62B of the second driving module 60B records multiple second incident positions where the ion beam B1 enters the Faraday cup 20. The processor 70 re-obtains the second ion beam current and the second incident position corresponding to the ion beam B1 from the Faraday cup 20 and the second encoder 62B.
[0092] Step S24: Generate a second curve graph according to the second incident position and the second ion beam current. Among them, the relationship between the second incident position and the second ion beam current is the same as the relationship between the first incident position and the first ion beam current, that is, the relationship between the second incident position and the second ion beam current is a one-to-one relationship. The processor 70 generates a second curve graph according to multiple second incident positions and multiple channels of second ion beam current.
[0093] Step S25: Find the maximum value of the second ion beam current from the second curve graph. Specifically, the processor 70 selects the maximum value of the second ion beam current from multiple second ion beam currents in the second curve graph.
[0094] In one embodiment, the processor 70 pairwise compares multiple values of the multi-channel second ion beam current, and then obtains the maximum value of the second ion beam current. In another embodiment, the processor 70 compares the value of each second ion beam current with a reference current value. If the value of the second ion beam current is greater than the value of the reference current value, the processor 70 marks the second ion beam current with a value greater than the value of the reference current value as the first category; if the value of the second ion beam current is less than the value of the reference current value, the processor 70 marks the second ion beam current with a value less than the value of the reference current value as the second category. Therefore, some of the multiple second ion beam currents belong to the first category, and some of the multiple second ion beam currents belong to the second category. Then, the processor 70 selects the maximum value of the second ion beam current from the multiple second ion beam currents belonging to the first category.
[0095] Step S26: According to the maximum value of the second ion beam current, find the corresponding second position from the second incident positions. Specifically, the processor 70 finds the second position corresponding to the maximum value of the second ion beam current from the multiple second incident positions according to the maximum value of the second ion beam current and the second curve graph.
[0096] Step S27: Calculate the second difference between the second position and the reference position. Specifically, the processor 70 calculates the second difference between the second position and the reference position.
[0097] Step S28: Determine whether the second difference is within a preset range. Specifically, the processor 70 determines whether the second difference is within the preset range or not. When the second difference is within the preset range, the processor 70 continues to execute step S29; when the second difference is not within the preset range, the processor 70 continues to execute step S30.
[0098] Step S29: Control the drive module 60 to drive the baffle 52 to block the ion beam B1 from passing through the through hole 51, and initialize the Faraday cup 20. Specifically, the actuation mechanism for controlling the drive module 60 to drive the baffle 52 to block the ion beam B1 from passing through the through hole 51 in step S29 is the same as the actuation mechanism for controlling the drive module 60 to drive the baffle 52 to block the ion beam B1 from passing through the through hole 51 in step S22, and will not be repeated here. When the isolator 50 blocks the ion beam B1 from entering the Faraday cup 20, the processor 70 executes an initialization program on the Faraday cup 20 to initialize the Faraday cup 20, and after initialization, there is no data residue of any second ion beam current in the Faraday cup 20.
[0099] Similarly, the second difference is proportional to the change in the magnetic field, that is, the second difference is proportional to the change in magnetic flux, and the processor 70 can judge whether the change in magnetic flux is drastic according to the value of the second difference.
[0100] Step S30: Send out a warning message. Specifically, the processor 70 sends and transmits a warning message to the display connected to the processor 70, and the display shows the warning message to the R & D personnel, from which the R & D personnel learn that the second difference is too large and the magnetic flux changes violently.
[0101] Please refer to Figure 7 , which is a flowchart showing a magnetic field detection method according to another embodiment of the present application. As Figure 7 shown, the magnetic field detection method of the present application includes steps S41 to S52. Figure 7 The magnetic field detection method shown can be applied to Figures 1 to 3 the magnetic field detection system shown, but is not limited thereto. Hereinafter, the steps S41 to S52 will be described by taking the magnetic field detection system shown in Figures 1 to 3 as an example.
[0102] Step S41: The computer sends out a control command. Specifically, the processor 70 of the computer receives the parameters set by the R & D personnel for the ion beam B1 from an input device such as a keyboard, and generates and transmits a control command to the dose controller for controlling the energy of the ion beam B1 according to the parameters set by the R & D personnel for the ion beam B1.
[0103] Step S42: The dose controller controls the energy and dose of the ion beam B1 according to the control command. Specifically, the dose controller drives the ion implanter to generate the ion beam B1 according to the control command to control the energy and dose of the ion beam B1.
[0104] Step S43: Prepare the ion beam. Specifically, the ion implanter prepares to emit the ion beam to the Faraday cup 20.
[0105] Step S44: The isolator 50 approaches the Faraday cup 20. Specifically, the processor 70 of the computer sends a first control signal to the first motor 61A of the first driving module 60A, and the first motor 61A drives the first rotating group 63A, thereby driving the isolator 50 to approach the Faraday cup 20. The opening H1 of the Faraday cup 20 is communicated with the transmission space, and the first encoder 62A of the first driving module 60A records and transmits the position of the isolator 50 to the processor 70. At this time, the baffle 52 blocks the perforation 51 and blocks the ion beam B1 from passing through the perforation 51.
[0106] Step S45: Apply a magnetic field. Specifically, a magnetic field is applied to the Faraday cup 20 through the first magnet 30 and the second magnet 40.
[0107] Step S46: Compare the position A1 with the reference position A0.
[0108] Specifically, the first motor 61A drives the first rotating group 63A to move the baffle 52 away from the perforation 51, allowing the ion beam B1 to pass through the perforation 51. The second motor 61B drives the Faraday cup 20 to reciprocate within the transmission space. The Faraday cup 20 receives the ion beam B1 at multiple moving time points and generates multiple ion beam currents corresponding to the ion beam B1. The second encoder 62B records multiple incident positions where the ion beam B1 enters the Faraday cup 20 at multiple moving time points. The processor 70 generates a curve graph as shown in Figure 8 according to the multiple ion beam currents and the multiple incident positions.
[0109] Then, the processor 70 searches for the maximum value of the ion beam current and the position A0 corresponding to the maximum value of the ion beam current from the Figure 8 curve graph, and calculates the difference between the position A1 and the reference position A0. This step S46 is the first comparison between the position A1 and the reference position A0, and the measurement times N is equal to 1.
[0110] When the difference between the position A1 and the reference position A0 is greater than 1%, the processor 70 continues to execute step S51; when the difference between the position A1 and the reference position A0 is less than or equal to 1%, the processor 70 continues to execute step S47.
[0111] Step S47: Drive the baffle 52. Specifically, the processor 70 of the computer sends a first control signal to the first motor 61A of the first driving module 60A. The first motor 61A drives the first rotating group 63A, and then drives the baffle 52 to move to block the perforation 51 to prevent the ion beam B1 from entering the Faraday cup 20.
[0112] Step S48: Initialize. Specifically, the processor 70 executes an initialization program on the Faraday cup 20 to initialize the Faraday cup 20. After initialization, there is no data residue of any ion beam current in the Faraday cup 20.
[0113] Step S49: Normal ion implantation. Specifically, the processor 70 determines that the ion beam B1 is performing normal ion implantation.
[0114] Step S50: N = 0. Specifically, the processor 70 sets the value of the measurement times N to zero.
[0115] Step S51: N = N + 1. Specifically, the processor 70 performs an addition program on the measurement times N and 1. When the measurement times N is greater than 2 after executing the addition program, the processor 70 continues to execute step S52; when the measurement times N is less than or equal to 2 after executing the addition program, the processor 70 continues to execute step S45.
[0116] Step S52: Warning message. Specifically, the processor 70 issues and transmits a warning message to the display connected to the processor 70, and the display shows the warning message to the R & D personnel. The R & D personnel learn from the warning message that the difference is too large and the magnetic flux changes violently.
[0117] In summary, for the magnetic field detection method and magnetic field detection system of the present application, through the configuration of the isolator, the drive module, and the processor, the incident position of the ion beam incident on the Faraday cup can be successfully obtained, the deflection radius can be obtained based on the incident position, and then the magnetic field can be obtained based on the deflection radius without affecting the operation of the Faraday cup and the measurement accuracy.
Claims
1. A magnetic field detection method, characterized in that, Comprising: Applying a magnetic field to the Faraday cup (20); Controlling the driving module (60) to drive the isolator (50) close to the Faraday cup (20) and allowing the ion beam (B1) to pass through the perforation (51) of the isolator (50) and enter the Faraday cup (20); Controlling the driving module (60) to drive the Faraday cup (20) to move to receive the ion beam (B1), and recording the incident position where the ion beam (B1) enters the Faraday cup (20); Obtaining a deflection radius according to the incident position; and Calculating a magnetic field according to the deflection radius, the elemental mass of the ion beam (B1), the velocity of the ion beam (B1), and the charge number of the ion beam (B1); Detecting a first ion beam current corresponding to the ion beam (B1); Generating a first curve graph according to the incident position and the first ion beam current; Finding the maximum value of the first ion beam current from the first curve graph; Finding a corresponding first position from the incident position according to the maximum value of the first ion beam current; Calculating a first difference between the first position and a reference position, where the reference position is the position corresponding to the maximum ion beam current at the time of factory pre - setting; And Judging whether the first difference is within a preset range.
2. The magnetic field detection method according to claim 1, wherein the incident position is a first incident position, further comprising: When the first difference is within the preset range, controlling the driving module (60) to drive the baffle (52) of the isolator (50) to block the ion beam (B1) from passing through the perforation (51), and initializing the Faraday cup (20); When the first difference is not within the preset range, re - obtaining a second ion beam current corresponding to the ion beam (B1) from the Faraday cup (20) and re - obtaining a second incident position corresponding to the ion beam from the driving module (60); Generating a second curve graph according to the second ion beam current and the second incident position; Finding the maximum value of the second ion beam current from the second curve graph; Finding a corresponding second position from the second incident position according to the maximum value of the second ion beam current; Calculating a second difference between the second position and the reference position; And Judging whether the second difference is within a preset range.
3. The magnetic field detection method according to claim 2, further comprising: When the second difference is within the preset range, controlling the driving module (60) to drive the baffle (52) of the isolator (50) to block the ion beam (B1) from passing through the perforation (51), and initializing the Faraday cup (20); and When the second difference is not within the preset range, sending a warning message.
4. The magnetic field detection method according to claim 2, wherein the first difference and the second difference are proportional to the change in magnetic flux.
5. A magnetic field detection system, characterized in that, Comprising: A Faraday cup (20) for receiving an ion beam (B1); A first magnet (30) disposed on one side of the Faraday cup (20); A second magnet (40) is disposed on the other side of the Faraday cup (20) and provides a magnetic field to the Faraday cup (20) together with the first magnet (30). An isolator (50) is disposed on the path of the ion beam (B1) traveling to the Faraday cup (20) and has a perforation (51) and a baffle (52). A driving module (60) is connected to the isolator (50) and the Faraday cup (20), and drives the isolator (50) close to the Faraday cup (20) and allows the ion beam (B1) to pass through the perforation (51) and enter the Faraday cup (20), or drives the baffle (52) to block the ion beam (B1) from passing through the perforation (51), and records the incident position of the ion beam (B1) entering the Faraday cup (20); and A processor (70) is connected to the Faraday cup (20) and the driving module (60), obtains a deflection radius according to the incident position, and calculates a magnetic field according to the deflection radius, the elemental mass of the ion beam, the velocity of the ion beam, and the charge number of the ion beam; wherein the Faraday cup (20) detects and transmits a first ion beam current corresponding to the ion beam to the processor (70), the processor (70) generates a first curve graph according to the incident position and the first ion beam current, finds the maximum value of the first ion beam current from the first curve graph, and finds a corresponding first position from the incident position according to the maximum value of the first ion beam current, and calculates a first difference between the first position and a reference position to determine whether the first difference is within a preset range, wherein the reference position is the position corresponding to the maximum ion beam current when leaving the factory.
6. The magnetic field detection system according to claim 5, wherein the incident position is a first incident position. When the first difference is within the preset range, the processor (70) controls the driving module (60) to drive the baffle (52) to block the ion beam (B1) from passing through the perforation (51), and initializes the Faraday cup (20); when the first difference is not within the preset range, the processor (70) re-obtains a second ion beam current corresponding to the ion beam (B1) from the Faraday cup (20) and a second incident position corresponding to the ion beam (B1) from the driving module (60), generates a second curve graph according to the second ion beam current and the second incident position, finds the maximum value of the second ion beam current from the second curve graph, and finds a corresponding second position from the second incident position according to the maximum value of the second ion beam current, and calculates a second difference between the second position and the reference position to determine whether the second difference is within a preset range.
7. The magnetic field detection system according to claim 6, wherein, When the second difference is within the preset range, the processor (70) controls the driving module (60) to drive the baffle (52) to block the ion beam (B1) from passing through the perforation (51), and initializes the Faraday cup (20); when the second difference is not within the preset range, the processor (70) issues a warning message.
8. The magnetic field detection system according to claim 6, wherein the first difference and the second difference are proportional to the change in magnetic flux.
9. The magnetic field detection system according to claim 5, wherein the driving module (60) includes a first driving module (60A) and a second driving module (60B). The first driving module (60A) is connected to the isolator (50) and drives the isolator (50) to approach the Faraday cup (20). The second driving module (60B) is connected to and drives the Faraday cup (20) and records the incident position of the ion beam (B1) entering the Faraday cup (20).
10. The magnetic field detection system according to claim 9, wherein the first driving module (60A) includes a first motor (61A), a first encoder (62A), and a first rotating group (63A). The first encoder (62A) is disposed adjacent to the first motor (61A). The first motor (61A) and the isolator (50) are respectively disposed on opposite sides of the first rotating group (63A). The first motor (61A) drives the first rotating group (63A) to move the isolator (50), and the first encoder (62A) records the position of the isolator (50).
11. The magnetic field detection system according to claim 9, wherein the second driving module (60B) includes a second motor (61B), a second encoder (62B), and a second rotating group (63B). The second encoder (62B) is disposed adjacent to the second motor (61B). The second motor (61B) and the Faraday cup (20) are respectively disposed on opposite sides of the second rotating group (63B). The second motor (61B) drives the second rotating group (63B) to move the Faraday cup (20), and the second encoder (62B) records the incident position of the ion beam (B1) entering the Faraday cup (20).
Citation Information
Patent Citations
Magnetic monitoring of a faraday cup for an ion implanter
US20080135776A1