A large area plasma generation device

Abstract

The application discloses a large-area plasma generating device, which comprises a shell (4) provided with an air inlet at one end and an air outlet at the other end, an insulating medium pipe (2) arranged in the cavity and provided with a plurality of multistage micro-porous structures (3) and high-voltage electrode rings (1) on the wall surface in a spaced manner, and a grounding electrode pipe (5) made of metal and attached to the insulating medium pipe (2) in an inner manner and provided with a plurality of multistage mesh holes corresponding to the multistage micro-porous structures (3), wherein the insulating medium pipe (2) divides the cavity into a first sub-cavity and a second sub-cavity, the first sub-cavity is communicated with the air inlet, the second sub-cavity is communicated with the air outlet, and the first sub-cavity is communicated with the second sub-cavity based on the multistage micro-porous structures (3); the air outlet is formed based on the grounding electrode pipe (5), and the specification of the air outlet meets the requirement that a to-be-processed object can be inserted into the air outlet. According to the application, the air passage is designed, the electric field is formed between the high-voltage electrode rings and the grounding electrode pipe, the low-temperature plasma is generated, three-dimensional objects with a length close to the length of the grounding electrode pipe can be processed, the processing area is large, and the processing efficiency is high.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of ionized jet, in particular to a large-area plasma generating device. BACKGROUND

[0002] Most of the conventional dielectric barrier discharge devices use air as working gas, and the required breakdown voltage is usually high, and the temperature of the generated plasma is also relatively high. Whether dielectric barrier discharge or jet array is used, although a large-area plasma can be generated, it is difficult to process three-dimensional objects with large surface area and long length. SUMMARY

[0003] The embodiments of the present application provide a large-area plasma generating device to generate a large-area low-temperature plasma, effectively processing three-dimensional objects with large surface area and long length.

[0004] The embodiments of the present application provide a large-area plasma generating device, comprising:

[0005] A shell 4 has a cavity inside, and has opposite two ends, one end of which is provided with an air inlet to access working gas, and the other end is provided with an air outlet for exhaust;

[0006] An insulating medium tube 2 is arranged in the cavity, and a plurality of micro-pore structures 3 and high-voltage electrode rings 1 are arranged on the wall surface of the insulating medium tube 2 in intervals, the insulating medium tube 2 separates the cavity into a first sub-cavity and a second sub-cavity, wherein the first sub-cavity is communicated with the air inlet, the second sub-cavity is communicated with the air outlet, and the first sub-cavity and the second sub-cavity are communicated based on the plurality of micro-pore structures 3;

[0007] A grounding electrode tube 5 is made of metal and is attached to the insulating medium tube 2, and a plurality of mesh holes are arranged corresponding to the plurality of micro-pore structures 3, the air outlet is formed based on the grounding electrode tube 5, and the size of the air outlet meets the requirement that the object to be processed can be inserted.

[0008] Optionally, the air inlet end of the cavity is further provided with a buffer cavity, a plurality of air holes 7 are arranged between the buffer cavity and the first sub-cavity, and the plurality of air holes 7 are arranged in an array.

[0009] Optionally, the buffer cavity is not communicated with the insulating medium tube 2, and the other end of the shell 4 is closed except for the air outlet.

[0010] Optionally, the pore diameter of the plurality of micro-pore structures 3 gradually increases with the distance from the air inlet.

[0011] Optionally, the pore diameter of the mesh hole of any level is slightly larger than the pore diameter of the micro-pore structure 3 of the same level.

[0012] Optionally, the shell 4 is in a cylindrical shape as a whole, and the first sub-cavity separated by the insulating medium tube 2 is an annular cavity.

[0013] The embodiment of the present application generates low-temperature plasma by airway design and electric field formed between high-voltage electrode ring and ground electrode tube, can process three-dimensional objects with length close to the length of ground electrode tube, and has large processing area and high processing efficiency.

[0014] The above description is only a summary of the technical solutions of the present application, in order to more clearly understand the technical means of the present application, and can be implemented according to the content of the specification, and in order to make the above and other purposes, features and advantages of the present application more obvious and easy to understand, the following specific embodiments of the present application are described. BRIEF DESCRIPTION OF DRAWINGS

[0015] Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The accompanying drawings are intended to depict only preferred embodiments of the application, and therefore should not be considered to narrow the scope of the present application in any way. Instead, they are included to provide illustration of the preferred embodiments of the present application. In the drawings:

[0016] Figure 1 A cross-sectional view of a plasma generation device according to an embodiment of the present application;

[0017] Figure 2 An external view of a plasma generation device according to an embodiment of the present application. DETAILED DESCRIPTION

[0018] Exemplary embodiments of the present disclosure will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the present disclosure are shown. This present disclosure may, however, be embodied in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and fully convey the scope of the present disclosure to those skilled in the art.

[0019] Plasma is the fourth state of matter, the other three are solid, liquid and gas. Plasma accounts for more than 99% of the visible matter in the universe, which is a mixture of a large number of charged particles and neutral particles, and the whole is electrically neutral. Plasma can be generated by discharge or collision. According to the relationship between the electron temperature and the ion temperature in the plasma, the plasma can be divided into high-temperature plasma and low-temperature plasma, the latter is also called non-equilibrium plasma, and the ion temperature is much lower than the electron temperature, so the plasma temperature is close to room temperature. In the past few decades, people have been committed to the research of low-temperature plasma generated at atmospheric pressure, in order to avoid the expensive and complex vacuum system. This includes dielectric barrier discharge and plasma jet, the former can directly ionize air without gas supply device, and can generate large area plasma. Because the temperature of non-equilibrium plasma jet is close to room temperature, and the active substances generated can effectively kill bacteria and disinfect, improve biological compatibility, it is very suitable for material surface modification and large area wound healing.

[0020] The embodiment of the present application provides a large-area plasma generating device, as shown in Figure 1 、 Figure 2 , comprising:

[0021] The shell 4 has a cavity, and has opposite two ends, one end of which is provided with an air inlet for connecting the working gas, and the other end is provided with an air outlet for exhausting air.

[0022] The insulating medium pipe 2 is arranged in the cavity, and a plurality of micro-pore structures 3 and high-voltage electrode rings 1 are arranged on the wall surface of the insulating medium pipe 2 in a spaced manner. In the example, the plurality of micro-pore structures 3 are arranged at a distance, and the plurality of high-voltage electrode rings 1 are arranged at a distance, and the high-voltage electrode rings 1 and the micro-pore structures 3 can not be in a one-to-one relationship, which can be arranged according to actual needs. The high-voltage electrode ring 1 is connected with a pulse or alternating high-voltage power supply.

[0023] The insulating medium pipe 2 divides the cavity into a first sub-cavity and a second sub-cavity, the first sub-cavity is formed based on the outer wall of the insulating medium pipe 2, and the second sub-cavity is formed based on the inner wall of the insulating medium pipe 2. The first sub-cavity is communicated with the air inlet, the second sub-cavity is communicated with the air outlet, and the first sub-cavity and the second sub-cavity are communicated only based on the plurality of micro-pore structures 3, thereby forming a required working gas channel.

[0024] The grounding electrode pipe 5 is metal and is arranged in the insulating medium pipe 2. The inner wall of the grounding electrode pipe 5 forms the second sub-cavity, which can meet the extension of the object to be processed. The grounding electrode pipe 5 is provided with a plurality of mesh holes corresponding to the plurality of micro-pore structures 3, the air outlet is formed based on the grounding electrode pipe 5, and the size of the air outlet meets the extension of the object to be processed.

[0025] As an alternative example, the working gas is predominantly (≥95%) inert gas, with the remainder being reactive gases such as oxygen and nitrogen. By applying voltage through a pulsed or AC high-voltage power supply, and with the working gas introduced, a plasma combining surface discharge and jet discharge is generated in the mesh gap under the influence of the electric field formed by the high-voltage electrode ring and the grounding electrode tube, thereby processing the object placed in the second sub-cavity. This application uses a mixture of inert gas and reactive gases such as oxygen and nitrogen for dielectric barrier discharge, which can both generate reactive particles and reduce the working voltage.

[0026] In some embodiments, such as Figure 1 As shown, within the cavity, a buffer chamber is further provided at one end of the air inlet. Multiple vent holes 7 are provided between the buffer chamber and the first sub-cavity, and these vent holes 7 are arranged in an array. In some embodiments, the buffer chamber is not connected to the insulating medium tube 2, and the other end of the housing 4 is closed except for the exhaust port. The design of the buffer chamber and the arrayed vent holes 7 allows for a more uniform flow of working gas into the first sub-cavity.

[0027] In some embodiments, the pore size of the multi-level microporous structure 3 gradually increases with increasing distance from the air inlet. This design further improves the uniformity of the generated plasma.

[0028] In some embodiments, the pore size of any level of mesh is slightly larger than the pore size of the microporous structure 3 of the same level. The specific pore size of the mesh can be set according to actual needs; for example, in some examples, all mesh pores can have the same pore size.

[0029] In some embodiments, the housing 4 is cylindrical in shape, and the first sub-cavity divided by the insulating dielectric tube 2 is an annular cavity. Designing the insulating dielectric tube 2 as cylindrical ensures the uniformity of the electric field, and the annular shape of the first sub-cavity improves the uniformity of the plasma.

[0030] The embodiments of this application generate low-temperature plasma through the gas channel design and the electric field formed between the high-voltage electrode ring and the grounding electrode tube. It can process three-dimensional objects with a length close to that of the grounding electrode tube, especially slender three-dimensional objects, for surface modification or sterilization. The plasma generating device of this application has a large processing area and high processing efficiency.

[0031] It should be noted that in the embodiments of the present application, the terms "comprising", "including", or any other variant thereof are intended to cover a non-exclusive inclusion, such that processes, methods, articles, or apparatuses that comprise a series of elements are not only limited to those elements, but also include other elements not explicitly listed, or further include elements inherent in such processes, methods, articles, or apparatuses. Without more limitations, the element defined by the statement "comprising a" does not exclude the presence of additional identical elements in the process, method, article, or apparatus that includes the element.

[0032] The above-mentioned sequence numbers of the embodiments of the present application are only for description, and do not represent the advantages and disadvantages of the embodiments.

[0033] The embodiments of the present application are described above in combination with the drawings, but the present application is not limited to the above-mentioned specific embodiments, and the above-mentioned specific embodiments are only illustrative, but not restrictive. Those skilled in the art can make many forms under the inspiration of the present application without departing from the scope of the present application and the scope protected by the claims.

Claims

1. A large-area plasma generation device, characterized in that, include: The housing (4) has a cavity inside and has two opposite ends. One end is provided with an air inlet to receive the working gas, and the other end is provided with an exhaust port for exhausting the gas. An insulating dielectric tube (2) is disposed in the cavity, and a multi-level microporous structure (3) and a high-voltage electrode ring (1) are spaced apart on its wall surface. The insulating dielectric tube (2) divides the cavity into a first sub-cavity and a second sub-cavity, wherein the first sub-cavity is connected to the air inlet and the second sub-cavity is connected to the exhaust port. The first sub-cavity and the second sub-cavity are connected based on the multi-level microporous structure (3). The pore size of the multi-level microporous structure (3) gradually increases with the distance from the air inlet. The grounding electrode tube (5) is made of metal and is attached to the insulating dielectric tube (2). It has multiple levels of mesh holes corresponding to the multi-level microporous structure (3). The exhaust port is formed based on the grounding electrode tube (5), and the specifications of the exhaust port meet the requirements that the object to be processed can be inserted.

2. The large-area plasma generating device as described in claim 1, characterized in that, Inside the cavity, a buffer cavity is also provided at one end of the air inlet. A plurality of vent holes (7) are provided between the buffer cavity and the first sub-cavity, and the plurality of vent holes (7) are arranged in an array.

3. The large-area plasma generating device as described in claim 2, characterized in that, The buffer cavity is not connected to the insulating medium tube (2), and the other end of the housing (4) is closed except for the exhaust port.

4. The large-area plasma generating device as described in claim 1, characterized in that, The pore size of any level of mesh is slightly larger than that of the same level of microporous structure (3).

5. The large-area plasma generating device as described in claim 1, characterized in that, The housing (4) is cylindrical in shape, and the insulating medium tube (2) divides the cavity into a first sub-cavity, which is an annular cavity.

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