Carbon ion generating device
By using two laser beams to carbonize the thin film and generate carbon ions in a carbon ion generation device, the problem of impurity ion generation is solved, the purity of carbon ions and acceleration energy are improved, and the amount of carbon ions generated is increased.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NAT INST FOR QUANTUM & RADIOLOGICAL SCI & TECH
- Filing Date
- 2021-10-29
- Publication Date
- 2026-04-24
AI Technical Summary
In existing laser-driven ion acceleration carbon ion generation devices, the generation of carbon ions is accompanied by the generation of impurity ions (such as oxygen ions), mainly due to the adsorption of impurity molecules such as water molecules on the surface of the thin film to form an impurity layer.
A carbonized region is formed by irradiating a portion of an organic compound thin film with a first laser beam, and carbon ions are generated by irradiating at least a portion of the carbonized region with a second laser beam. Impurity ion suppression is achieved by coordinating the two laser beams.
It effectively suppressed the generation of impurity ions, improved the purity and acceleration energy of carbon ions, and enhanced the amount of carbon ions produced.
Smart Images

Figure CN116235256B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to a carbon ion generating device. Background Technology
[0002] In heavy ion beam cancer therapy, linear accelerators and synchrotrons are used to accelerate carbon ions generated in a carbon ion generating device to a specified energy, and then the accelerated carbon ions are used to irradiate the tumor.
[0003] Non-Patent Document 1 describes a carbon ion generating device that generates carbon ions by irradiating a carbon thin film with a high-power laser. This method is called laser-driven ion acceleration. When a high-power laser is irradiated on one surface of the thin film (hereinafter referred to as the front side), a large number of high-speed electrons are ejected from the other surface of the thin film (hereinafter referred to as the back side). As a result, a strong polarized electric field on the order of TV / m is generated near the back side, and carbon ions are accelerated by this polarized electric field and ejected from the thin film. Therefore, a carbon ion generating device using laser-driven ion acceleration can generate accelerated carbon ions.
[0004] Existing technical documents
[0005] Non-patent literature
[0006] Non-patent literature 1: L. Torrisi et al., Physical Review Accelerators Beams., 23, 011304 (2020). Summary of the Invention
[0007] The problem the invention aims to solve
[0008] However, existing laser-driven ion acceleration carbon ion generation devices suffer from the problem of generating impurity ions (such as oxygen ions) along with carbon ions. This is because impurity molecules, such as water molecules, adsorb onto the surface of the thin film, forming an impurity layer.
[0009] One aspect of the present invention was made in view of the above-mentioned problems, and its purpose is to suppress the generation of impurity ions in a carbon ion generation device using a laser-driven ion acceleration method.
[0010] means for solving problems
[0011] To solve the above problems, a carbon ion generating apparatus according to the present invention includes: a first laser beam irradiation mechanism that carbonizes a portion of a thin film made of an organic compound by irradiating it with a first laser beam and generating a carbonized region; and a second laser beam irradiation mechanism that generates carbon ions from the carbonized region by irradiating at least a portion of the aforementioned carbonized region with a second laser beam.
[0012] The effects of the invention
[0013] According to one aspect of the present invention, the generation of impurity ions can be suppressed in a carbon ion generating device using a laser-driven ion acceleration method. Attached Figure Description
[0014] [ Figure 1 (a) is a schematic diagram of a carbon ion generating apparatus according to a first embodiment of the present invention. (b) is an enlarged cross-sectional view of the carbonization region of the thin film used in the carbon ion generating apparatus shown in (a).
[0015] [ Figure 2 (a) and (b) are images showing the energy distribution of ions generated using the first comparative example and the first embodiment of the present invention, respectively.
[0016] [ Figure 3 [A graph showing the energy spectrum of carbon ions produced using the first comparative example and the first embodiment of the present invention.]
[0017] [ Figure 4 This image illustrates the energy distribution of ions generated when the irradiation interval between the first laser beam and the second laser beam is varied to 1 second, 5 seconds, 15 seconds, and 60 seconds in the first embodiment and the second embodiment of the present invention.
[0018] [ Figure 5 (a) and (b) are graphs showing the depth dependence of the composition ratio of the films used in the second comparative example and the third embodiment of the present invention, respectively.
[0019] [ Figure 6 (a) and (c) are images showing the energy distribution of ions generated using the second comparative example and the third embodiment, respectively. (b) and (d) are graphs showing the energy spectra of ions generated using the second comparative example and the third embodiment, respectively.
[0020] [ Figure 7 (a) is a side view of the continuous thin film conveying device included in the carbon ion generating apparatus according to the second embodiment of the present invention. (b) is a plan view of the head surface in the modified example with a head shown in (a).
[0021] [ Figure 8 (a) is a plan view of the continuous film conveying device included in the carbon ion generating apparatus according to the third embodiment of the present invention. (b) is a cross-sectional view of the rotary table included in the continuous film conveying device shown in (a).
[0022] [ Figure 9(a) is a side view of the continuous film conveying device included in the carbon ion generating apparatus according to the fourth embodiment of the present invention. (b) is a plan view of the head surface of the belt shown in (a).
[0023] [ Figure 10 (a) is a side view of the continuous film conveying device included in the carbon ion generating apparatus according to the fifth embodiment of the present invention. (b) is a plan view of the head surface of the belt shown in (a).
[0024] [ Figure 11 [This is a side view of the continuous thin film conveying device included in the carbon ion generating apparatus according to the sixth embodiment of the present invention.]
[0025] <Explanation of Figure Markers>
[0026] 10, 10A, 10B: Carbon ion generating device
[0027] 12: Laser beam source (first laser beam source)
[0028] L1: Laser beam (first laser beam)
[0029] 15: Laser beam source (second laser beam source)
[0030] L2: Laser beam (second laser beam)
[0031] 21, 21A, 21B: Thin Films
[0032] 22, 22A, 22B: Carbonization regions
[0033] P1: Beam point (the area illuminated by the first laser beam)
[0034] P2: Beam point (the area illuminated by the second laser beam)
[0035] P3: Ion generation region
[0036] 30, 40: Continuous film conveying device
[0037] 311, 312: Rollers (first roller, second roller, part of the moving part)
[0038] 35: Leading the way
[0039] 351: Head and Face
[0040] 361, 362: Electric motor (part of the moving part)
[0041] 41: Rotary moving platform
[0042] 411: Platform (part of the Mobile Division)
[0043] 4111: Platform Body
[0044] 4112: Backplate
[0045] 412: Cross roller ring (part of the moving part)
[0046] 413: Fasteners
[0047] 414: Substrate
[0048] 4141:Substrate body
[0049] 4142: Backplate
[0050] 415: Electric motor (part of the moving part)
[0051] 416: Roller (part of the moving part)
[0052] 417: Conveyor belt (part of the moving section)
[0053] 42: Horizontal moving platform (part of the moving section)
[0054] 421: Substrate
[0055] 422: Platform Detailed Implementation
[0056] [First Implementation]
[0057] See Figure 1 The carbon ion generating apparatus 10 according to the first embodiment of the present invention is described. Figure 1 (a) is a schematic diagram of the carbon ion generating device 10. Figure 1 (b) is a cross-sectional view of the carbonized region of the thin film used for carbon ion generation in the amplified carbon ion generating device 10. The carbon ion generating device 10 can generate carbon ions (C4+). The generated carbon ions can be used, for example, as carbon ions to irradiate tumors in heavy ion beam cancer therapy.
[0058] <Carbon ion generating device>
[0059] like Figure 1 As shown in (a), the carbon ion generating device 10 includes: a chamber 11, a laser beam source 12, a lens 13, a reflector 14, a laser beam source 15, and a focusing lens 16.
[0060] (cavity)
[0061] Chamber 11 is made of metal (stainless steel in this embodiment) and is a cylindrical container. Furthermore, in Figure 1 In (a), the shape of chamber 11 is simply illustrated using a solid line. However, the actual chamber 11 has a properly set thickness.
[0062] Chamber 11 is configured to seal its internal space. (Vacuum pump) Figure 1 (A) (illustration omitted) is connected to chamber 11. A vacuum pump maintains the pressure inside chamber 11 below atmospheric pressure by evacuating the internal space. In this embodiment, the pressure inside chamber 11 is approximately 1 × 10⁻⁶. -2 Pa. However, the pressure is not limited to this and can be set appropriately.
[0063] like Figure 1 As shown in (a), two ports 111 and 112 are provided in chamber 11. Ports 111 and 112 are for any optical input / output, and are plate-shaped glass members that are transparent to the laser beams L1 and L2 described later, and are constructed of quartz glass. Furthermore, as described later, laser beam L1 has a center wavelength of 532 nm, and laser beam L2 has a center wavelength of 810 nm. However, the materials constituting ports 111 and 112 are not limited to quartz glass, and can be materials that are transparent in the visible light to infrared region. Also, in the following description, the center wavelengths of laser beams L1 and L2 are also simply referred to as the wavelengths of laser beams L1 and L2.
[0064] (First laser beam source)
[0065] Laser source 12 emits a laser beam L1. The laser beam L1, with its determined wavelength and output, irradiates a thin film 21 made of organic compounds, causing the organic compounds constituting the thin film 21 to carbonize, thereby generating a carbonized region 22. Furthermore, in Figure 1 (b) only shows the carbonized region 22 in the thin film 21.
[0066] In this embodiment, the laser beam source 12 is a semiconductor laser with an emission wavelength of 532 nm. Furthermore, in this embodiment, the laser beam source 12 is configured such that the output of the laser beam L1 at the beam point P1 (described later) is approximately 520 mW. However, the wavelength and power of the laser beam L1 can be appropriately selected within a range that carbonizes the organic compound constituting the thin film 21.
[0067] Laser beam source 12 and laser beam L1 are examples of a first laser beam source and a first laser beam, respectively. Laser beam source 12 is configured to cause laser beam L1 to enter the internal space of cavity 11 from port 111.
[0068] Also, although in Figure 1 Not shown in (a), but a collimating lens is provided at the rear end of the laser beam source 12. Therefore, this collimating lens will transform the scattered laser beam L1 emitted from the laser beam source 12 into collimated light.
[0069] A lens 13 and a reflector 14 are arranged on the optical axis of the laser beam L1 inside the cavity 11. The lens 13 transforms the collimated laser beam L1 into a focused beam. The reflector 14 reflects the laser beam L1, directing the focused laser beam L1 toward one of the principal surfaces of the thin film 21 (on...). Figure 1 A portion of the principal surface (on the positive z-axis side) in (a) is irradiated. Thus, the laser beam L1 incident from port 111 into the interior space of chamber 11 irradiates a portion of a principal surface of thin film 21 through lens 13 and mirror 14. Furthermore, the laser beam source 12, lens 13, and mirror 14 are an example of a first laser beam irradiation mechanism that carbonizes a portion of thin film 21 irradiated by laser beam L1. Moreover, the beam point P1 is an example of the area irradiated by laser beam L1 on a principal surface of thin film 21. In this embodiment, the diameter of beam point P1 is approximately 300 μm, and its area is approximately 0.09 mm². Furthermore, when the laser beam L1 has a sufficiently high output to carbonize the organic compounds contained in beam point P1, lens 13 can be omitted.
[0070] The optical axis of the laser beam L1 is from a direction parallel to the normal of the thin film 21. Figure 1 The laser beam L1 is tilted (in the z-axis direction shown). In this embodiment, the first tilt angle between the optical axis of the laser beam L1 and the normal of the thin film 21 is approximately 30°. However, the first tilt angle is not limited to this and can be set appropriately. The first tilt angle can be 0° (i.e., the optical axis of the laser beam L1 is parallel to the normal of the thin film 21).
[0071] Preferably, the wavelength, output, and area of the laser beam L1 are determined so that the temperature of the thin film 21 in the beam spot P1 is heated to 600°C or higher. For example, it is preferable that the laser beam L1 has a wavelength of 532 nm and the area of the beam spot P1 is 0.09 mm², resulting in an output of 360 mW or higher in the beam spot P1. With this configuration, the temperature of the thin film 21 in the beam spot P1 can be heated to 600°C or higher.
[0072] (Second laser beam source)
[0073] Laser source 15 emits laser beam L2. Laser beam L2 irradiates thin film 21, causing carbon ions (C4+) to be generated from carbonized region 22. In this embodiment, the laser source 15 is a Ti:sapphire laser emitting laser beam L2 with a center wavelength of 810 nm and a pulse width of 80 fsec. Furthermore, in this embodiment, the optical axes of laser source 15 and laser beam L2 are set such that the energy of each pulse of laser beam L2 is approximately 500 mJ, and the diameter of beam spot P2 (described later) is 2 μm to 3 μm. Therefore, in this embodiment, the diameter of beam spot P2 is less than 1 / 100th of the diameter of beam spot P1. However, the wavelength of laser beam L2 and the energy of each pulse can be appropriately selected within the range that causes carbon ions to be generated from carbonized region 22.
[0074] In this embodiment, a carbonized region 22 is formed by irradiating a beam point P1 with a laser beam L1. Then, while the carbonized region 22 is being irradiated with the laser beam L1, the beam point P2 is simultaneously irradiated with the laser beam L2. That is, the laser beam L1 and the laser beam L2 are simultaneously irradiated onto the carbonized region 22. With this configuration, sufficient time can be ensured for the carbonization of the polyimide resin contained in the beam point P1. However, the laser beams L1 and L2 can be configured not to irradiate simultaneously, but rather with the laser beam L1 irradiated first, followed by the laser beam L2. In this case, the irradiation interval from the irradiation of the laser beam L1 to the irradiation of the laser beam L2 is preferably as short as possible, and the pressure inside the chamber 11 is approximately 1 × 10⁻⁶. -2 At Pa, a time of 5 seconds or less is preferred. As the irradiation interval increases, the effectiveness of the irradiation laser beam L1 (i.e., the removal of the impurity layer) decreases. Therefore, as the irradiation interval increases, the number and maximum energy of generated carbon ions decrease, while the number and maximum energy of generated hydrogen ions (H+) increase. See also... Figure 4 The irradiation interval will be described later.
[0075] Also, such as Figure 1 As shown in (a), the optical axis of the laser beam L2 is set such that beam point P2 is contained within beam point P1, and more preferably, the center of beam point P2 is approximately aligned with the center of beam point P1. That is, the laser beam source 15 is configured to illuminate at least a portion of the central beam point P1 illuminated by the laser beam L1. Furthermore, the adjustment of the optical axis of the laser beam L2 can be performed simultaneously with observing beam point P1 using a high-magnification camera.
[0076] Each of the laser beam source 15 and the laser beam L2 is an example of a second laser beam source and a second laser beam, respectively. The laser beam source 15 is configured such that the laser beam L2 will be incident from port 112 into the internal space of cavity 11.
[0077] again, Figure 1Although not illustrated in (a), a collimating lens is provided in the rear section of the laser beam source 15. Therefore, this collimating lens will transform the scattered laser beam L2 emitted from the laser beam source 15 into collimated light.
[0078] Inside chamber 11, a focusing lens 16 is positioned on the optical axis of the laser beam L2. The focusing lens 16 transforms the collimated laser beam L2 into a focused beam, and simultaneously reflects the focused laser beam L2 onto the other principal surface of the thin film 21. Figure 1 The laser beam L2 incident from port 112 into the interior space of chamber 11 will pass through the focusing lens 16 and irradiate a portion of the main surface of thin film 21 at a beam point P2 that is part of another main surface of thin film 21. Furthermore, the laser beam source 15 and the focusing lens 16 are examples of a second laser beam irradiation mechanism that generates carbon ions from carbonized region 22 by irradiating at least a portion of carbonized region 22 with the laser beam L2. Moreover, the beam point P2 is an example of a region in carbonized region 22 that is irradiated with the laser beam L2.
[0079] In this embodiment, the optical axis of the laser beam L2 will be parallel to the normal of the thin film 21. Figure 1 The z-axis direction shown is tilted. In this embodiment, the second tilt angle, which is the angle between the optical axis of the laser beam L2 and the normal of the thin film 21, is approximately 43°. However, the second tilt angle is not limited to this and can be set appropriately. The second tilt angle can be 0° (i.e., the optical axis of the laser beam L2 is parallel to the normal of the thin film 21).
[0080] (film)
[0081] The portions of the thin film 21 containing beam points P1 and P2 are held in a planar shape by the holding portion. The mechanism for holding the thin film 21 by the holding portion is not limited and can be appropriately selected. Furthermore, in Figure 1 The diagram omits the holding part.
[0082] In this embodiment, a square polyimide resin film is used as film 21 for irradiating laser beams L1 and L2. Film 21 is larger than beam points P1 and P2. In this embodiment, the thickness of film 21 is 5 μm. However, the shape of film 21 is not limited to square and can be appropriately selected.
[0083] Polyimide resin is an example of an organic compound. Furthermore, the materials constituting film 21 are not limited to polyimide resin. Other organic compounds constituting film 21 include polyester resin and polypropylene resin.
[0084] Furthermore, the thickness of the thin film 21 is not limited to 5 μm, but is preferably 100 nm or more and 12.5 μm or less. Moreover, the thickness of the thin film 21 is more preferably 1 μm or more and 5 μm or less.
[0085] The thinner the film 21, the higher the acceleration energy of the carbon ions generated from the film 21. Moreover, by having a film 21 thickness of 100 nm or more, more preferably 1 μm or more, damage that may occur in the carbonized region 22 can be suppressed, and an interaction can be reliably generated between the laser beam L2 and the carbonized region 22.
[0086] Furthermore, a reinforcing layer made of an organic compound can be laminated or coated onto one main surface of the thin film 21. As the reinforcing layer, a thin film made of a material with higher intensity when irradiated by the laser beam L1 is suitable compared to an organic compound. Examples of such materials include metals with high surface chemical stability (e.g., nickel, gold, etc.).
[0087] (The principle of carbon ion generation)
[0088] When the thin film 21 is irradiated with a laser beam L1, the polyimide resin contained in the beam point P1 turns black, and a carbonized region 22 is formed in the area containing the beam point P1. Figure 1 In (b), a cross-section of the carbonized region 22 of the thin film 21 is shown, and the cross-section including the beam spot P2 irradiated by the laser beam L2 is magnified. Furthermore, as described above, the diameter of the beam spot P1 is approximately 100 times larger than the diameter of the beam spot P2. Therefore, in Figure 1 In (b), the beam point P1 is not shown. Also, in Figure 1 In (b), 0° is used as the second tilt angle between the optical axis of laser beam L2 and the normal of thin film 21. Furthermore, in Figure 1 In (b), the beam point P2 and the ion generation region P3 are represented by thick solid lines.
[0089] Hereinafter, of the pair of main surfaces constituting the carbonization region 22, the main surface on the side irradiated by the laser beam L2 is referred to as the front surface 221, and the main surface on the opposite side of the front surface (in this embodiment, the main surface on the side irradiated by the laser beam L1) is referred to as the back surface 222.
[0090] like Figure 1 As shown in (b), when the laser beam L2 irradiates the beam point P2 contained in the front side 221 of the carbonized region 22, the electrons present near the beam point P2 in the carbonized region 22 will vibrate violently due to the interaction between them and the laser beam L2, and move from the front side 221 towards the back side 222 (in the direction of...). Figure 1In (b), the electrons are accelerated (in the positive z-axis direction) and ejected from the ion-generating region P3 on the back side 222 towards the outside of the carbonized region 22. At this time, a polarization electric field is generated between the electrons ejected from the back side 222 towards the outside of the carbonized region 22 and the carbon ions remaining in the carbonized region 22. Furthermore, in... Figure 1 In (b), the extent of the region where the laser beam L2 propagates is schematically represented by an imaginary line (two-dot dashed line) inside the carbonized region 22.
[0091] The carbon ions remaining in the carbonized region 22 are accelerated by this polarized electric field and ejected from the back surface 222 towards the outside of the carbonized region 22. The energy distribution of the carbon ions ejected from the carbonized region 22 can be determined, for example, using a Thomson parabolic ion analyzer. Furthermore, in Figure 1 In (b), the shape of the region in the space located on the back side 222 of the carbonized region 22 is schematically represented by an imaginary line (two-dot dashed line).
[0092] As described above, carbon ions ejected from the back surface 222 of the main surface opposite to the front surface 221 irradiated by the laser beam L2 are called forward-accelerated ions. Furthermore, as described in Phys. Rev. Lett. 99, 185002 (2007), it is known that when a laser beam L2 with a small ratio of background light (prepulse) to main pulse is used to irradiate the front surface 221, carbon ions will be ejected from the front surface 221. Thus, carbon ions ejected from the front surface 221 are called rear-accelerated ions. Either forward-accelerated ions or rear-accelerated ions can be used as carbon ions for irradiating tumors in heavy ion beam cancer therapy.
[0093] Furthermore, as described above, when a film with a reinforcing layer laminated or coated on one main surface is used as film 21, the main surface of the reinforcing layer can be determined according to whether either the front-accelerating ions or the rear-accelerating ions are used for treatment. For example, using... Figure 1 When the forward-accelerating ions shown in (b) are used for treatment, the ions are ejected from the back side 222, thus allowing the enhancement layer to be disposed on the front side 221. Similarly, when the rear-accelerating ions are used for treatment, the ions are ejected from the front side 221, allowing the enhancement layer to be disposed on the back side 222. Furthermore, regardless of whether either the front side 221 or the back side 222 is irradiated, the laser beam L1 carbonizes the thin film 21 near the beam point P1 and removes the impurity layers formed on both the front side 221 and the back side 222. Therefore, the laser beam L2 can irradiate either the front side 221 or the back side 222 when either the forward-accelerating ions or the rear-accelerating ions are used for treatment.
[0094] (First and Second Embodiments)
[0095] In the carbon ion generating apparatus 10 described above, an irradiation interval of 0 seconds from the irradiation of laser beam L1 to the irradiation of laser beam L2 is used as the first embodiment of the present invention. Furthermore, in the carbon ion generating apparatus 10 described above, irradiation intervals of 1 second, 5 seconds, 15 seconds, and 60 seconds are used as the second embodiment group of the present invention. Moreover, in the carbon ion generating apparatus 10 described above, irradiation of laser beam L1 is omitted, and only laser beam L2 irradiates beam point P2, as a comparative example relative to the first embodiment and the second embodiment group. Hereinafter, this comparative example will be referred to as the first comparative example. Furthermore, the parameters other than the irradiation interval are as described above.
[0096] Figure 2 Images (a) and (b) respectively show the energy distribution of ions generated using the first comparative example and the first embodiment of the present invention. Furthermore, in Figure 2 In (a) and (b), the horizontal axis shows an index corresponding to the energy of the generated ions, and the luminescence intensity represents the amount of ions generated. Furthermore, the horizontal axis indicates that the closer to 0 mm, the greater the energy of the generated ions.
[0097] Figure 3 A graph showing the energy spectrum of carbon ions produced using the first comparative example and the first embodiment of the present invention.
[0098] If you see Figure 2 (a) and (b) and Figure 3 By simultaneously irradiating with laser beams L1 and L2, compared to irradiating with only laser beam L2, the maximum energy of carbon ions increases by 3.4 times, from 2.5 MeV to 8.5 MeV. Furthermore, by simultaneously irradiating with laser beams L1 and L2, the amount of carbon ions produced increases by approximately 20 times. Moreover, the amount of carbon ions produced can be increased by... Figure 3 The dI / dE ratio in the graph shown is obtained by integrating. Furthermore, it can be seen that by simultaneously irradiating with laser beams L1 and L2, the amount of carbon ions produced can be increased while suppressing the production of hydrogen ions, which are impurity ions.
[0099] Figure 4 The images are images showing the ion energy distribution resulting when the irradiation interval is varied to 1 second, 5 seconds, 15 seconds, and 60 seconds in the first embodiment and the second embodiment of the present invention. Figure 4 The horizontal and vertical axes are respectively with Figure 2 The horizontal and vertical axes of (a) and (b) are the same.
[0100] If you see Figure 4 It can be seen that the ions generated by each of the second embodiment groups are similar to those generated by the first comparative example (see Figure 2Compared to (a), it contains more carbon ions, which can suppress the generation of hydrogen ions as impurity ions. However, it was found that as the irradiation interval increases, the emission intensity of carbon ions decreases while the carbon ion spectrum shifts to the lower energy side. Moreover, it was found that as the irradiation interval increases, the luminescence intensity of hydrogen ions increases, and the hydrogen ion spectrum shifts to the higher energy side. Figure 4 The results showed that if the irradiation interval was less than 5 seconds, the result would not be significantly different from that of the first embodiment. That is, the irradiation interval is preferably less than 5 seconds.
[0101] (Third Embodiment)
[0102] In the carbon ion generating apparatus 10 described above, an irradiation interval of 0 seconds is used as the time from irradiating laser beam L1 to irradiating laser beam L2, which is presented as the third embodiment of the present invention. Furthermore, in the carbon ion generating apparatus 10 described above, the irradiation of laser beam L1 is omitted, and only laser beam L2 irradiates beam point P2, which is presented as a comparative example relative to the third embodiment. Hereinafter, this comparative example will be referred to as the second comparative example. Moreover, compared with the first embodiment, the third embodiment differs in that the pulse width is 45 fsec, the energy of each pulse of laser beam L2 is approximately 8 J, and the beam point diameter of beam point P2 is approximately 1.5 μm.
[0103] Figure 5 Each of (a) and (b) shows a graph illustrating the depth dependence of the composition ratio of the films used in the second comparative example and the third embodiment, respectively. In the second comparative example, since the irradiation of the laser beam L1 is omitted, the material constituting the film is still polyimide. On the other hand, in the third embodiment, the carbonized region 22 is formed by irradiating the laser beam L1. Figure 5 (b) shows the results of determining the depth dependence of the composition ratio of carbonized region 22. The composition ratio was determined using X-ray photoelectron spectroscopy (XPS). Furthermore, the depth dependence of the composition ratio was obtained by sputtering the thin film surface using a gas cluster ion beam in a chamber, grinding the surface, and measuring the XPS each time. Argon clusters were used as the sputtering particles. The grinding apparatus used in this embodiment has the capability to grind the workpiece at a grinding rate of 1.7 nm / min when the workpiece is quartz glass.
[0104] If you see Figure 5 As can be seen from (a) and (b), in the third embodiment, the polyimide is carbonized by irradiating the laser beam L1. Specifically, the carbon composition ratio inside the film 21 increases to about 95% in the third embodiment, compared to about 80% in the second comparative example.
[0105] Furthermore, it is known that in each of the second comparative example and the third embodiment, oxygen as an impurity is present near the surface of the film. This oxygen is believed to originate from residual water vapor (H2O) in the chamber. Also, since hydrogen cannot be detected by XPS, it is not present in... Figure 5 The proportion of hydrogen is omitted.
[0106] Thus, it can be seen that polyimide can be carbonized by irradiating with laser beam L1, and the carbon composition ratio in the carbonized region 22 can be increased. On the other hand, it is known that even when the carbonized region 22 is formed using laser beam L1 as in the third embodiment, impurity gases (mainly water vapor) are present on its surface. Therefore, it is known that in order to improve the purity of the generated carbon ions, it is preferable to adopt a configuration in which impurity gases can be removed while forming the carbonized region 22A, as described in the fourth embodiment and thereafter.
[0107] Figure 6 Each of (a) and (c) is an image showing the energy distribution of ions generated using the second comparative example and the third embodiment, respectively. Figure 6 The horizontal and vertical axes of (a) and (c) are each 70 mm and 65 mm in scale, respectively. In the second comparative example, since the amount of carbon ions produced is small, the measurement results of irradiating the laser beam L2 20 times are accumulated and illustrated. Figure 6 Each of (b) and (d) is a graph showing the energy spectrum of ions produced using the second comparative example and the third embodiment, respectively.
[0108] If you see Figure 6 In (a) to (d), by irradiating laser beam L2 during the irradiation of laser beam L1, compared with irradiation of laser beam L2 alone, the maximum energy of carbon ions increased by about 3 times from about 4 MeV to about 10.7 MeV. Furthermore, it was found that by irradiating with laser beam L1 and laser beam L2 simultaneously, the amount of carbon ions produced was increased while the production of hydrogen ions, which are impurity ions, was suppressed.
[0109] [Second Implementation]
[0110] See Figure 7 The continuous thin film conveying device 30 of the carbon ion generating apparatus 10A according to the second embodiment of the present invention will be described. Figure 7 (a) is a side view of the continuous film conveying device 30. Figure 7 (b) is a plan view of the head surface 351 in a modified example of the head 35 of the continuous film conveying device 30. Furthermore, for ease of explanation, components that have the same function as those described in the first embodiment are labeled with the same symbols, and their descriptions are not repeated.
[0111] The carbon ion generating apparatus 10 according to the first embodiment is configured to hold a square thin film 21 in a planar shape using a holding part.
[0112] On the other hand, the carbon ion generating apparatus 10A replaces the thin film 21 and the holding part of the carbon ion generating apparatus 10 and includes a thin film 21A for forming into a strip shape and a continuous film conveying device 30 for continuously conveying the thin film 21A along its length direction. Furthermore, the carbon ion generating apparatus 10A further includes a control unit C. In this embodiment, the thin film 21A, the continuous film conveying device 30, and the control unit C will be described.
[0113] <Film>
[0114] Thin film 21A is formed into a strip. One end of thin film 21A is fixed to a core that is a hollow cylinder. Then, thin film 21A is wound around the core. The width of thin film 21A is greater than the first region irradiated by laser beam L1 and the second region irradiated by laser beam L2.
[0115] Apart from this, film 21A is constructed in the same manner as film 21. That is, film 21A is made of polyimide resin with a thickness of 5 μm. Furthermore, the material constituting film 21A is not limited to polyimide resin, and the thickness is not limited to 5 μm.
[0116] <Continuous Film Conveying Device>
[0117] The continuous film conveying device 30 is disposed inside the chamber 11 to replace the holding part of the carbon ion generating device 10. However, as will be described later, the continuous film conveying device 30 includes both a holding part and a moving part.
[0118] like Figure 7 As shown in (a), the continuous film conveying device 30 includes rollers 311, 312, 321, 322, 331, 332, 341, 342, and a belt head 35, motors 361, 362, and a substrate 37.
[0119] (Substrate)
[0120] The substrate 37 is made of metal (stainless steel in this embodiment) and consists of a pair of rectangular plate-shaped members. On one main surface of the substrate 37, rollers 311, 312, 321, 322, 331, 332, 341, 342, a headband 35, and motors 361, 362 are provided. Furthermore, although in Figure 7 Although not shown in the figure, a platform capable of translating the position of the substrate 37 may be provided on the lower layer of the substrate 37, at least along the z-axis direction.
[0121] (Roller)
[0122] The roller 311 has a rotating shaft that is configured to rotate freely. A core (hereinafter referred to as the first core) wound around one end of the film 21A is fixed to this rotating shaft. Therefore, the first core can rotate as an integral part of the roller 311.
[0123] In this embodiment, the other end of the film 21A is fixed to the second core, which is a hollow cylinder.
[0124] Similar to roller 311, roller 312 has a rotating shaft that is configured to rotate freely. A second core for winding the other end of film 21A is fixed to this rotating shaft. Therefore, the core can rotate as an integral part of roller 312.
[0125] Each of rollers 321, 322, 331, 332, 341, and 342 is disposed between roller 311 and roller 312, defining the path of the film 21A from roller 311 to roller 312 (see [reference]). Figure 7 (a) Each of rollers 321, 322, 331, 332, 341, and 342, like rollers 311 and 312, has a rotating shaft that can rotate freely.
[0126] In this embodiment, rollers 311, 321, 331, 341 and rollers 312, 322, 332, 342 are used to... Figure 7 The plane parallel to the zx plane shown in (a) is set as a mirror symmetry plane.
[0127] The rollers 311, 312, 321, 322, 331, 332, 341, and 342 configured in this way can continuously transport the film 21A from roller 311 to roller 312 along arrow A. Therefore, roller 311 is an example of a first roller for transporting the film 21A, and roller 312 is an example of a second roller for winding the film 21A.
[0128] (take the lead)
[0129] The head 35 is a block-shaped component made of metal (stainless steel in this embodiment). When viewed from the normal direction of the main surface of the substrate 37, the head 35 is formed into a decagon by combining two hexagons of different sizes (see...). Figure 7 (a)). In the head 35, a pair of faces that are substantially parallel to the main face of the substrate 37 and are shaped into a decagon as described above are called a pair of main faces, and the face that forms the outline of the pair of main faces is called the outer face.
[0130] When viewed along the path of film 21A, the head 35 is located between rollers 311 and 312. More specifically, the head 35 is the smaller of the two hexagons mentioned above, located between rollers 341 and 342, with a portion of this smaller hexagon positioned so that it protrudes from the outer surface of its contact with rollers 341 and 342 towards the negative z-axis. Therefore, the head surface 351 of the outer surface of the head 35, at least the end face on the negative z-axis side, will contact film 21A when film 21A is pushed out from its outer surface on the negative z-axis side in the negative z-axis direction.
[0131] Furthermore, the position of the tape head 35 can be adjusted in the direction of arrow B, which is parallel to the z-axis. Therefore, the amount by which the tape head 351 protrudes from the outer circumference surface on the negative z-axis side can be arbitrarily adjusted. In other words, the tape head 35 can use the head surface 351 to determine the normal direction relative to the main surface of the film 21A. Figure 7 (a) indicates the position along the z-axis. Therefore, the head face 351 is an example of a holding portion that holds the thin film 21A in a planar shape at beam points P1 and P2.
[0132] On one of the two main faces of the head 35, the main face away from the substrate 37 (the main face on the negative x-axis direction) has a groove 352 formed. When viewed from the normal direction of the main face of the substrate 37, the groove 352 is trapezoidal. Each of the two base edges of the groove 352 is an end edge on the positive z-axis direction and an end edge on the negative z-axis direction of the contour of the head 35, respectively. That is, each of the end face on the positive z-axis direction and the head face 351 on the outer surface of the head 35 has a cut, and the groove 352 connects these cuts to each other.
[0133] The groove 352 extends from the end face of the outer surface of the head 35 in the positive z-axis direction to the head face 351. The laser beam L1 is configured such that its optical axis penetrates the interior of the groove 352. Therefore, the laser beam L1 penetrating the interior of the groove 352 is irradiated on a portion of the thin film 21A in the head face 351.
[0134] Furthermore, in the carbon ion generating apparatus 10A, similarly to the carbon ion generating apparatus 10, during the period of irradiation by the laser beam L1, at least a portion of the carbonized region 22A is irradiated by the laser beam L2 (see [reference]). Figure 7 (a)
[0135] In this embodiment, both the first tilt angle and the second tilt angle are 0°. However, each of the first tilt angle and the second tilt angle is not limited to 0° and can be appropriately set. Moreover, in the carbon ion generating device 10A, similarly to the carbon ion generating device 10, either the forward accelerating ions or the rear accelerating ions can be used to irradiate the tumor with carbon ions in heavy ion beam cancer therapy.
[0136] (Electric motor)
[0137] In this embodiment, motors 361 and 362 are stepper motors. Motor 361 has a rotatable shaft. The shaft of motor 361 is mechanically connected to the shaft of roller 311. Motor 362 has the same configuration as motor 361, and the shaft of motor 362 is mechanically connected to the shaft of roller 312. Therefore, each of rollers 311 and 312 is driven by rotating the shaft of each of motors 361 and 362.
[0138] In this embodiment, the electric motors 361 and 362 are controlled by the control unit C of the carbon ion generating device 10A (see...). Figure 7 (a) Control. The control unit C drives the rollers 311 and 312 by controlling the motors 361 and 362 to transport the film 21A from roller 311 to roller 312. The motors 361 and 362 and the rollers 311 and 312 are examples of moving parts.
[0139] (Timing of the beam of light)
[0140] In this embodiment, after the control unit C stops the conveying of the film 21A (i.e., stops the motors 361 and 362), a carbonized region 22A is formed by irradiating a portion of the film 21A with a laser beam L1. Then, while irradiating the carbonized region 22A with the laser beam L1, a portion of the carbonized region 22A is also irradiated with a laser beam L2. That is, the laser beam L1 and laser beam L2 are simultaneously irradiated onto the carbonized region 22A. With this configuration, sufficient time can be ensured for carbonizing the polyimide resin contained in the area of the film 21A irradiated by the laser beam L1. However, it is possible to configure the laser beam L1 and laser beam L2 to be irradiated separately, with the laser beam L1 irradiated first and then the laser beam L2 irradiated. In this respect, the carbon ion generating device 10A is the same as the carbon ion generating device 10.
[0141] Furthermore, when the output of the laser beam L1 is sufficiently high and the polyimide resin constituting the thin film 21A can be rapidly carbonized, the control unit C can be configured to irradiate the thin film 21A with the laser beam L1 and the laser beam L2 while conveying the thin film 21A (i.e., using the motors 361 and 362 to simultaneously drive the rollers 311 and 312).
[0142] At this time, the leader of 35, like Figure 7 In the modified example shown in (b), the length of the head surface 351 (the length along the direction of arrow A) is preferably along the direction of arrow A of the conveying film 21A. Figure 7 (b) is elongated along the y-axis direction. Based on this configuration, within the plane of the head face 351, the beam point P1 (in...) can be elongated. Figure 7(b) the area illuminated by laser beam L1 and the beam point P2 (in Figure 7 The positions of the areas irradiated by laser beam L2 in (b) are different. Subsequently, motors 361 and 362 and rollers 311 and 312 continue to move the thin film 21A along the direction of arrow A, causing the carbonized region 22A in beam point P1 to overlap with the position of beam point P2. As a result, the carbon ion generating device 10A can generate carbon ions while transporting the thin film 21A.
[0143] <Control Department>
[0144] As described above, the control unit C controls motors 361 and 362. Furthermore, the control unit C controls the laser beam source 12 that emits laser beam L1 and the laser beam source 15 that emits laser beam L2.
[0145] The functions of the control unit C can be implemented by a program that enables the computer, which functions as the control unit C, to perform its functions. In this case, the control unit C is equipped with a computer having at least one control device (e.g., a processor) and at least one storage device (e.g., a memory) as hardware for executing the aforementioned program. By executing the program using this control device and storage device, control of the motors 361 and 362, the laser beam source 12, and the laser beam source 15 of the control unit C can be achieved.
[0146] [Third Implementation Method]
[0147] See Figure 8 The continuous thin film conveying device 40 of the carbon ion generating apparatus 10B according to the third embodiment of the present invention will be described. Figure 8 (a) is a plan view of the continuous film conveying device 40. Figure 8 (b) is a cross-sectional view of the rotary table 41 provided in the continuous film conveying device 40. Furthermore, for ease of explanation, components having the same function as those described in the first and second embodiments are marked with the same symbols, and their descriptions are not repeated.
[0148] The continuous film conveying device 30 of the carbon ion generating device 10A according to the second embodiment is configured to continuously convey the film 21A formed into a strip along its length direction.
[0149] On the other hand, the continuous thin film conveying device 40 of the carbon ion generating device 10B is configured, for example, to use a circularly shaped thin film 21B instead of a thin film 21A, by making the thin film 21B in-plane (within the main surface of the thin film 21B) Figure 8 The film 21B is continuously conveyed by rotating and moving within a plane parallel to the xy plane in (a). In this embodiment, the film 21B and the continuous film conveying device 40 will be described.
[0150] <Film>
[0151] In this embodiment, the film 21B is formed into a circle. However, the shape of the film 21B is not limited to a circle and can be appropriately determined. The film 21B can be, for example, a polygon. In this embodiment, the diameter of the film 21B is approximately the same as the outer diameter of the inner region of the platform body 4111 of the rotary stage 41 described later, and is larger than the first region irradiated by the laser beam L1 and the second region irradiated by the laser beam L2.
[0152] Apart from this, film 21B is constructed in the same manner as film 21. That is, film 21B is made of polyimide resin with a thickness of 5 μm. Furthermore, the material constituting film 21B is not limited to polyimide resin, and the thickness is not limited to 5 μm.
[0153] <Continuous Film Conveying Device>
[0154] The continuous film conveying device 40 is disposed inside the chamber 11 to replace the continuous film conveying device 30 in the carbon ion generating device 10A.
[0155] like Figure 8 As shown in (a), the continuous film conveying device 40 includes a rotary table 41 and a horizontal moving platform 42.
[0156] (Rotating moving platform)
[0157] like Figure 8 As shown in (a) and (b), the rotary moving table 41 includes a platform 411, a cross roller ring 412, a fastener 413, a base material 414, a motor 415, rollers 416, and a conveyor belt 417.
[0158] Platform 411 includes a platform body 4111 made of metal (stainless steel in this embodiment) and a back plate 4112. The platform body 4111 is a cylindrical member having a pair of bottom surfaces each having a circular opening, and side surfaces sandwiched between the pair of bottom surfaces. Therefore, a through hole is formed in the platform body 4111 in the region including the central axis AC (see...). Figure 8 (b)
[0159] In the platform body 4111, one of the two bottom surfaces ( Figure 8 Near the bottom surface on the negative z-axis side shown in (a) and (b), and another bottom surface ( Figure 8 Comparing the area near the bottom surface on the positive z-axis side shown in (a) and (b), a thick flange is formed on the side surface. A groove 4113 is provided on the outer periphery of the flange. The conveyor belt 417, described later, hangs in the groove 4113. Furthermore, in Figure 8 In (b), the illustration of conveyor belt 417 is omitted.
[0160] Furthermore, on one bottom surface of the platform body 4111, the annular inner region located further inside than the trench 4113 is deeper than other regions of that bottom surface. That is, in one bottom surface, a step is provided at the boundary between the inner region and other regions. A thin film 21B, shaped into a circle with an outer diameter approximately equal to that of the inner region, is fixed to the inner region using fasteners 413, described later.
[0161] The back plate 4112 is an annular plate-shaped component fixed to the other bottom surface of the platform body 4111. The inner ring of the cross roller ring 412 is fitted into the vicinity of the other bottom surface of the platform body 4111. The back plate 4112, together with the platform body 4111, clamps the cross roller ring 412, thus fixing the inner ring of the cross roller ring 412 to the other bottom surface.
[0162] Fastener 413 is made of metal (stainless steel in this embodiment) and is a ring-shaped plate member. Fastener 413 is configured such that its outer diameter is slightly smaller than the outer diameter of the aforementioned inner region of the platform body 4111, and its inner diameter is approximately the same as the diameter of the through hole of the platform 411. Fastener 413 falls into the aforementioned inner region.
[0163] like Figure 8 As shown in (b), the film 21B is clamped together with the platform body 4111 by the fastener 413, thereby fixing the film 21B to the aforementioned inner region. Although in Figure 8 Not shown in (a) and (b), fastener 413 is fixed to platform 411 using mechanical fastening means. Several bolts can be listed as examples of mechanical fastening means. However, mechanical fastening means are not limited to these and can be appropriately selected.
[0164] The substrate 414 comprises a metal (in this embodiment, stainless steel) substrate body 4141 and a back plate 4142 (see [reference]). Figure 8 (b)). The substrate body 4141 is a pair of plate-like members with a main surface shape that is a combination of a rectangle and a circle (see [reference]). Figure 8 (a)). When the main surface of the substrate body 4141 is viewed from the negative z-axis side plane, a circular outline and concentric circular openings are provided in the circular area. The diameter of this opening exceeds the outer diameter of the other bottom surface of the platform body 4111 and is slightly lower than the outer diameter (outer ring diameter) of the cross roller ring 412. The portion of the platform body 4111 that includes the other bottom surface is fixed to this opening via the cross roller ring 412.
[0165] The back plate 4142 is an annular plate-shaped member fixed to the aforementioned circular region of the substrate body 4141. The outer ring of the cross roller ring 412 is embedded into the opening of the substrate body 4141. The cross roller ring 412 is fixed to the opening of the substrate body 4141 by clamping the cross roller ring 412 together with the substrate body 4141.
[0166] The cross roller ring 412 is a type of roller ring, consisting of an inner ring and an outer ring that are able to rotate freely relative to each other. In the continuous film conveying device 40, the outer ring is fixed to the substrate body 4141, and the inner ring is fixed to the platform body 4111. Furthermore, the film 21B is fixed to the inner region of the platform body 4111, such that the main surface of the film 21B is parallel to a pair of bottom surfaces of the platform body 4111. Therefore, the continuous film conveying device 40 ensures that the film 21B is in-plane (within the plane of the main surface of the film 21B) Figure 8 (In the plane parallel to the xy plane shown in (a),) it rotates about the central axis AC as the rotation axis. Moreover, the platform body 4111 and the fastener 413 are examples of holding portions that hold the film 21B in a planar shape at the beam points P1 and P2. The platform body 4111 and the fastener 413 hold multiple positions in the outer edge of the film 21B by clamping the outer edge of the film 21B.
[0167] A roller 416 is provided on the main surface of the substrate body 4141 in the negative z-axis direction within the rectangular region of the substrate body 4141. The roller 416 has a freely rotatable axis of rotation. The axis of rotation of the roller 416 is supported by the substrate body 4141.
[0168] Within the rectangular region of the substrate body 4141, the motor 415 is fixed to the main surface on the positive z-axis side. In this embodiment, the motor 415 is a stepper motor. The motor 415 has a freely rotatable rotation shaft. The rotation shaft of the motor 415 is mechanically connected to the rotation shaft of the roller 416. Therefore, the roller 416 rotates as the rotation shaft of the motor 415 rotates.
[0169] The conveyor belt 417 is a resilient, annular component made of resin (rubber in this embodiment). The conveyor belt 417 is attached to the outer edge of the roller 416 and the groove 4113 of the platform 411. Furthermore, the length of the conveyor belt 417 is specified such that appropriate tension is applied when it is attached to the outer edge and groove 4113. The conveyor belt 417 transmits the driving force of the motor 415 to the platform 411. Therefore, as the roller 416 rotates and the conveyor belt 417 is conveyed in the direction of arrow A, the platform 411 rotates in the direction of arrow B (see...). Figure 8 (a)
[0170] Furthermore, on the main surface of the substrate body 4141 in the negative z-axis direction, a roller may be further provided between the roller 416 and the platform 411. In this case, the further provided roller is positioned at a slightly tortuous point in the path of the conveyor belt 417. Moreover, the further provided roller is configured to adjust the tortuosity of the conveyor belt 417. In the continuous film conveying device 40, by adjusting the aforementioned tortuosity using the further provided roller, the tension of the conveyor belt 417 can be adjusted, resulting in an adjustment of the degree of friction generated between each of the conveyor belt 417, the roller 416, and the platform 411.
[0171] In this embodiment, the motor 415 is controlled by the control unit C of the carbon ion generating device 10B (see [link]). Figure 8 (a)) Control. The control unit C controls the platform 411 of the rotary table 41 to rotate via the rollers 416 and the conveyor belt 417 by controlling the motor 415. In other words, the control unit C controls the plane of the film 21B in the main surface of the film 21B (within the plane). Figure 8 The device rotates in the direction of the plane parallel to the xy plane shown in (a). Therefore, the platform 411, cross roller ring 412, motor 415, roller 416, and conveyor belt 417 of the rotary moving stage 41 are examples of moving parts. Furthermore, since the control unit C of the carbon ion generating device 10B can be constructed in the same way as the control unit C of the carbon ion generating device 10A, its description is omitted in this embodiment.
[0172] In the carbon ion generating device 10 (see Figure 1 In the process, each of laser beams L1 and L2 irradiates the thin film 21 from a different main surface side. Regarding this point, the carbon ion generating device 10A (… Figure 7 (See also) It is the same as the carbon ion generating device 10.
[0173] On the other hand, in the carbon ion generating device 10B, each of the laser beams L1 and L2 originates from the same principal surface side of the thin film 21B (in... Figure 8 (a) is the negative z-axis direction of the film 21B being irradiated.
[0174] Thus, in one embodiment of the present invention, each of the laser beams L1 and L2 can irradiate the thin film from different main surfaces or from the same main surface.
[0175] Furthermore, in the carbon ion generating apparatus 10B, similarly to the carbon ion generating apparatuses 10 and 10A, during the irradiation period of the laser beam L1, the laser beam L2 is irradiated onto at least a portion of the carbonized region 22B (see [link to apparatus 10B]). Figure 8 (a)
[0176] Furthermore, in the carbon ion generating device 10B, each of the first tilt angle and the second tilt angle can be appropriately set. Also, similarly to the carbon ion generating device 10, the carbon ion generating device 10B can use either forward-accelerated ions or backward-accelerated ions as carbon ions for irradiating tumors in heavy ion beam cancer therapy. In the continuous thin-film delivery device 40, since a through-hole is formed in the platform 411, both backward-accelerated ions and forward-accelerated ions can be used.
[0177] (Timing of the beam of light)
[0178] In this embodiment, after the control unit C stops the transport of the film 21B (i.e., stops the motor 415), it forms a carbonized region 22B by irradiating a portion of the film 21B with a laser beam L1. Then, while irradiating the carbonized region 22B with the laser beam L1, it also irradiates at least a portion of the carbonized region 22B with a laser beam L2. That is, the carbonized region 22B is simultaneously irradiated with both the laser beam L1 and the laser beam L2. With this configuration, sufficient time can be ensured for carbonizing the polyimide resin contained in the area of the film 21B irradiated by the laser beam L1. However, it is also possible to configure the laser beam L1 and the laser beam L2 not to be irradiated simultaneously, but rather to irradiate the laser beam L1 first and then the laser beam L2.
[0179] Furthermore, when the output of the laser beam L1 is sufficiently high and the polyimide resin constituting the thin film 21B can be rapidly carbonized, the control unit C can be configured to irradiate the thin film 21B with both the laser beam L1 and the laser beam L2 while transporting the thin film 21B (i.e., while rotating the rotary table 41 using the motor 415). In this case, the areas irradiated by the laser beam L1 and the areas irradiated by the laser beam L2 on the main surface of the platform 411 where the thin film 21B is fixed can be at different positions.
[0180] Regarding these points, the carbon ion generating device 10B is the same as that of the carbon ion generating devices 10 and 10A.
[0181] (Horizontal moving platform)
[0182] like Figure 8 As shown in (a), the horizontal moving platform 42 includes a substrate 421 and a platform 422. The horizontal moving platform 42 allows the platform 422, which is vertically erected relative to the substrate 421, to be positioned within the plane of the main surface of the substrate 421 (and...). Figure 8The horizontal moving platform 42 can move in parallel within a plane parallel to the zx plane shown in (a). That is, the horizontal moving platform 422 can move its position along the x-axis and z-axis directions, respectively. As the horizontal moving platform 42, a precision platform used in assembling the optical system can be used, and it is a precision platform that can move the platform in parallel within a plane.
[0183] In this embodiment, the position of platform 422 is controlled by the control unit C of carbon ion generating device 10B. The control unit C causes the rotary moving stage 41, which is fixed on platform 422, to move in parallel within a plane. Therefore, the horizontal moving platform 42 is an example of a moving part.
[0184] As described above, the horizontal moving platform 42 allows the carbon ion generating device 10B to non-scanningly irradiate each of the laser beams L1 and L2 by moving the rotating moving stage 41 in parallel, thereby arbitrarily changing the radius R of the distance between the area irradiating the laser beams L1 and L2 and the central axis AC of the platform body 4111.
[0185] like Figure 8 As shown in (a), in this embodiment, with the horizontal moving platform 42 fixed (i.e., the radius R remains constant), the steps of generating carbon ions and rotating the platform 411 of the rotating moving stage 41 at a predetermined angle are performed alternately. As a result, multiple carbonized regions 22B are discontinuously formed on the circumference of the thin film 21B.
[0186] However, as described above, when the output of the laser beam L1 is sufficiently high and the polyimide resin constituting the thin film 21B can be rapidly carbonized, by rotating the platform 411, the step of generating carbon ions can be performed simultaneously with transporting the thin film 21B. At this time, annular carbonized regions 22B will be formed on the thin film 21B. Furthermore, by moving the platform 422 in parallel along the x-axis while rotating the platform 411, the step of generating carbon ions can be performed simultaneously with transporting the thin film 21B. At this time, vortex-shaped carbonized regions 22B will be formed on the thin film 21B.
[0187] [Fourth Implementation Method]
[0188] For the continuous thin film conveying device 30C and the laser beam L1 used in the carbon ion generating apparatus 10C according to the fourth embodiment of the present invention, see [link to documentation]. Figure 9 Please provide an explanation. Figure 9 (a) is a side view of the continuous film conveying device 30C. Figure 9 (b) is a plan view of the head surface 351C in the belt head 35C of the continuous film conveying device 30C. The carbon ion generating device 10C can also be described as... Figure 2A modified example of the carbon ion generating device 10A shown in (a) and (b). Furthermore, for ease of explanation, components having the same function as those described in the first and second embodiments are marked with the same symbols, and their descriptions are not repeated.
[0189] The carbon ion generating apparatus 10A according to the second embodiment is configured to heat the thin film 21A by using a single laser beam L1, thereby generating a carbonized region 22A on a portion of the thin film 21A.
[0190] On the other hand, the carbon ion generating device 10C consists of a laser beam L1 composed of three sub-laser beams L11, L12, and L13. The beam points P11, P12, and P13 of each sub-laser beam L11, L12, and L13 in the irradiation area of the thin film 21C are along the output direction of the thin film 21C. Figure 9 The direction of arrow A shown in (b) is set. Therefore, the first laser beam irradiation mechanism of the carbon ion generating device 10C is equipped with three laser beam sources that emit sub-laser beams L11, L12, and L13 respectively. Each of these three laser beam sources is associated with... Figure 1 (a) and Figure 7 The laser beam source 12 illustrated in (a) is similarly constructed. Furthermore, in the headband 35C, in order to arrange each of the beam points P11, P12, and P13 along the delivery direction of the thin film 21C, the width of the groove 352C in the delivery direction of the headband 35C is wider than that of the laser beam source 12. Figure 7 The groove 352 with the head 35 shown in (a) is wider.
[0191] In the carbon ion generating device 10C, the power density of each sub-laser beam L11, L12, L13 in each of the beam points P11, P12, P13 is along the delivery direction of the thin film 21C (i.e., Figure 9 When viewing the direction of arrow A shown in (b), it is determined to be from the front to the back, increasing in height.
[0192] Based on this configuration, the temperature of the carbonized region 22C in each of the beam points P11, P12, and P13 can be increased in stages from the front to the back. For example, the power of the sub-laser beam L11 and the spot diameter of the beam point P11 can be set to make the temperature of the carbonized region 22C in the beam point P11 600°C, the power of the sub-laser beam L12 and the spot diameter of the beam point P12 can be set to make the temperature of the carbonized region 22C in the beam point P12 800°C, and the power of the sub-laser beam L13 and the spot diameter of the beam point P13 can be set to make the temperature of the carbonized region 22C in the beam point P13 1000°C.
[0193] However, the temperature of the carbonized region 22C in each of the beam points P11, P12, and P13 is not limited to 600°C, 800°C, and 1000°C. The temperature of the carbonized region 22C in beam point P11 can be set to a temperature at which at least a portion of the thin film 21C is carbonized (e.g., above 500°C). Furthermore, the temperature of the carbonized region 22C in beam point P12 can be set to a temperature range higher than that of the carbonized region 22C in beam point P11 but lower than the melting point of carbon (e.g., approximately 4000 K when the carbon is graphite). Similarly, the temperature of the carbonized region 22C in beam point P13 can be set to a temperature range higher than that of the carbonized region 22C in beam point P12 but lower than the melting point of carbon (e.g., approximately 4000 K when the carbon is graphite).
[0194] Furthermore, in the carbon ion generating device 10C, the power density of each sub-laser beam L11, L12, L13 in each of the beam points P11, P12, P13 can be set to be equal.
[0195] Furthermore, in this embodiment, the beam point P2, which is the irradiation area of the laser beam L2 in the thin film 21C, can be configured to be included in the beam point P13 (see [reference]). Figure 9 (b) According to this configuration, during the period when the laser beam L13 irradiates the carbonized region 22C, the laser beam L2 can be irradiated at the beam point P13 of the laser beam L13. However, the beam point P2 can be set to a position further back than the beam point P13. In this case, in order to suppress impurity gas from adhering to the carbonized region 22C after irradiation by the laser beam L13, it is preferable to keep the interval from the beam point P13 to the beam point P2 as short as possible.
[0196] [Fifth Implementation Method]
[0197] For the continuous thin film conveying device 30C and the laser beam L1 used in the carbon ion generating apparatus 10D according to the fifth embodiment of the present invention, see [link to documentation]. Figure 10 Please provide an explanation. Figure 10 (a) is a side view of the continuous film conveying device 30C. Figure 10 (b) is a plan view of the head surface 351C of the conveyor head 35C in the continuous film conveying device 30C. The carbon ion generating device 10D can also be called... Figure 2 A modified example of the carbon ion generating apparatus 10A shown in (a) and (b). Furthermore, for ease of explanation, components having the same function as those described in the first and second embodiments are marked with the same symbols, and their descriptions are not repeated.
[0198] The carbon ion generating apparatus 10A according to the second embodiment is configured with a first laser irradiation mechanism, so that the shape of the beam spot P1 in the irradiation area of the thin film 21A, which is the laser beam L1, is circular.
[0199] On the other hand, the carbon ion generating device 10D is equipped with a first laser irradiation mechanism, such that the shape of the beam point P1D in the irradiation area of the thin film 21C, which is the laser beam L1, is an ellipse whose major axis is parallel to the delivery direction of the thin film 21C and whose minor axis is parallel to the width direction of the thin film 21C (see...). Figure 10 (a) and (b)). That is, in the carbon ion generating device 10D, the beam point P1D is configured as a thin film 21C with a length in the delivery direction that is longer than the direction orthogonal to the delivery direction.
[0200] Furthermore, in this embodiment, the beam spot P2, which is the irradiation area of the laser beam L2 in the thin film 21C, is set to be contained within the elliptical beam spot P1D (see [reference]). Figure 10 (b)). According to this configuration, during the period when the laser beam L1 is irradiated to the carbonized region 22C, the laser beam L2 can be irradiated to the beam point P1D of the laser beam L1. Moreover, at this time, the beam point P2 is preferably located as far back as possible (on the negative y-axis side) within the range of the beam point P1D. According to this configuration, the laser beam L2 can be irradiated to the carbonized region 22C after the irradiated laser beam L1 for a long time.
[0201] However, the beam point P2 can be set to be located further back than the beam point P1D. In this case, in order to suppress impurity gas from adhering to the carbonized region 22C after laser beam L1 irradiation, it is preferable that the shortest distance between the beam point P1D and the beam point P2 be as short as possible.
[0202] [Sixth Implementation Method]
[0203] For the continuous thin-film conveying device 30C and galvanometer mirror 14D included in the carbon ion generating apparatus 10E according to the sixth embodiment of the present invention, and the laser beam L1 used in the carbon ion generating apparatus 10E, see [link to documentation]. Figure 11 Please provide an explanation. Figure 11 This is a side view of the continuous film conveying device 30C. The carbon ion generating device 10E can also be called... Figure 9 A modified example of the carbon ion generating apparatus 10C shown in (a) and (b). Furthermore, for ease of explanation, components having the same function as those described in the first and second embodiments are marked with the same symbols, and their descriptions are not repeated.
[0204] The continuous film conveying device 30C included in the carbon ion generating apparatus 10E is configured identically to the continuous film conveying device 30C included in the carbon ion generating apparatus 10E. Therefore, in the carbon ion generating apparatus 10E, the width of the groove 352C of the belt head 35C in the delivery direction is wider than that of the belt head 35C. Figure 7 The groove 352 with the head 35 shown in (a) is wider.
[0205] In the carbon ion generating device 10E, a galvanometer mirror 14D, which constitutes part of the first laser irradiation mechanism, is installed instead of... Figure 1 The carbon ion generating device 10 shown has a reflector 14. The galvanometer mirror 14D is an example of a scanning mirror, also known as a galvanometer scanner. The galvanometer mirror 14D slightly vibrates its reflective surface about a rotation axis, causing the laser beam L1 incident on the reflective surface to travel along the output direction of the thin film 21C. Figure 11 The laser beam L1, irradiated periodically (as shown by arrow A), is used for scanning illumination. In this embodiment, the irradiation area of the laser beam L1, which is scanned using the galvanometer lens 14D, is set to be aligned with... Figure 10 The beam point P1D shown in (b) is the same.
[0206] Here, when the laser beam L1, which is irradiated by the galvanometer lens 14D, scans in the same direction as the delivery direction of the thin film 21C, it is preferably synchronized with the delivery speed of the thin film 21C. Figure 11 The control unit C shown controls the vibration frequency and rotation angle of the reflective surface of the galvanometer mirror 14D, so that when the laser beam L1 scans in the same direction as the delivery direction of the thin film 21C, it is synchronized with the delivery speed of the thin film 21C.
[0207] According to this configuration, when the laser beam L1 scans in the same direction as the delivery direction of the thin film 21C, the laser beam L1 moves synchronously with the thin film 21C. Therefore, compared with non-scanning irradiation of a single laser beam L1 (e.g., Figure 7 Compared to the carbon ion generating apparatus 10A shown, even without stopping the transport of the thin film 21C, the laser beam L1 can irradiate the carbonized region 22C for a long time. Therefore, even without stopping the transport of the thin film 21C, sufficient time can be ensured to carbonize the polyimide resin contained in the area of the thin film 21C irradiated by the laser beam L1.
[0208] Furthermore, in the carbon ion generating apparatus 10E, the power density of the laser beam L1 in the irradiation area formed by the thin film 21C is preferably such that when viewed along the delivery direction of the thin film 21C, it continuously increases from the front to the rear. In this embodiment, the control unit C controls the laser beam source 12 to (1) set the power of the laser beam L1 to make the temperature of the irradiation area 600°C when the aforementioned irradiation area is at the frontmost position, (2) set the power of the laser beam L1 to make the temperature of the irradiation area 1000°C when the aforementioned irradiation area is at the rearmost position, and (3) control the laser beam source 12 to continuously increase the power of the laser beam L1 from the front to the rear.
[0209] However, in the carbon ion generating device 10E, the power density of the laser beam L1 in the irradiation area formed by the thin film 21C, when viewed along the emission direction of the thin film 21C, can also be determined to increase progressively from the front to the rear. Furthermore, the number of stages for increasing the power density is not limited and can be appropriately determined. For example, it can be 2 stages, 3 stages, or 8 stages.
[0210] Furthermore, in this embodiment, the beam spot in the thin film 21C that is the irradiation area of the laser beam L2 is set to be consistent with... Figure 10 The laser beam point P2 in the diagram (b) is at the same position. When the laser beam L1, which is scanning and irradiating in sync with the transport speed of the thin film 21C, reaches the end of the scanning range located on the negative y-axis side, the control unit C controls the laser beam source 15 to irradiate the thin film 21C with the laser beam L2. Therefore, when the laser beam L2 irradiates the thin film 21C, the irradiation area of the laser beam L2 is included within the irradiation area of the laser beam L1 (see...). Figure 11 The laser beam L1 shown in the diagram is the one closest to the negative y-axis direction among the three laser beams L1. With this configuration, while laser beam L1 irradiates the carbonized region 22C, laser beam L2 can irradiate the irradiation area of laser beam L1. However, the irradiation area of laser beam L2 can be set to be further downstream than the irradiation area of the scanning irradiation laser beam L1. In this case, to suppress impurity gases from adhering to the carbonized region 22C after irradiation by laser beam L1, the shortest distance between the irradiation areas of laser beam L1 and laser beam L2 is preferably as short as possible.
[0211] 〔Summarize〕
[0212] The carbon ion generating apparatus according to the first embodiment of the present invention comprises: a first laser beam irradiation mechanism that irradiates a portion of a thin film made of an organic compound with a first laser beam to carbonize the portion, thereby generating a carbonized region; and a second laser beam irradiation mechanism that irradiates at least a portion of the aforementioned carbonized region with a second laser beam to generate carbon ions in the carbonized region.
[0213] According to the above scheme, when a portion of the thin film is irradiated with a first laser beam to generate a carbonized region, the impurity layers on the front and back sides near the carbonized region are removed. Therefore, according to the first state, the generation of impurity ions in a laser-driven ion acceleration carbon ion generation device can be suppressed.
[0214] Furthermore, the carbon ion generating apparatus of the second state of the present invention, based on the carbon ion generating apparatus of the first state described above, also employs the following configuration: the wavelength and power of the aforementioned first laser beam, and the area of the region in the aforementioned thin film irradiated by the aforementioned first laser beam, are set such that the temperature of the thin film in that region is heated to 600°C or higher.
[0215] According to the above scheme, by irradiating a portion of the thin film with a first laser beam, a carbonized region can be generated while simultaneously removing the impurity layer on the front and back sides near the carbonized region. Therefore, according to the second state sample, the generation of impurity ions can be reliably suppressed, and the purity of the generated carbon ions can be improved.
[0216] Furthermore, the carbon ion generating apparatus relating to the third state of the present invention, based on the carbon ion generating apparatus relating to the first or second state described above, also employs the following configuration: It includes: a holding portion that holds the thin film in such a manner that at least the area irradiated by the first laser beam and the area irradiated by the second laser beam are planar; and a moving portion that moves the thin film, wherein the thin film is larger than the area irradiated by the first laser beam and the area irradiated by the second laser beam.
[0217] According to the above scheme, by relatively moving the respective positions of the regions irradiated by the first laser beam and the regions irradiated by the second laser beam in the thin film, carbon ions can be generated continuously multiple times using a single thin film. Therefore, according to the third state sample, the exchange cycle of the thin film can be extended.
[0218] Furthermore, the carbon ion generating apparatus of the fourth state of the present invention, based on the carbon ion generating apparatus of the third state described above, also adopts the following configuration: the aforementioned film is formed into a strip, the aforementioned moving part includes a first roller for discharging the aforementioned film and a second roller for winding the aforementioned film, the aforementioned holding part is disposed between the aforementioned first roller and the aforementioned second roller and has a belt head, the belt head determining its position relative to the main surface of the aforementioned film in the normal direction of the main surface.
[0219] According to the above scheme, the moving part can move the position of the thin film along a predetermined direction. Therefore, according to the fourth state sample, carbon ions can be generated continuously multiple times by moving the thin film, but the areas irradiated by the first laser beam and the areas irradiated by the second laser beam will not be moved.
[0220] Furthermore, the carbon ion generating apparatus of the fifth state of the present invention, based on the carbon ion generating apparatus of the fourth state described above, further comprises the following configuration: the aforementioned first laser irradiation mechanism further comprises a plurality of laser beam sources that emit each of the plurality of sub-laser beams constituting the aforementioned first laser beam, and the respective irradiation regions of each sub-laser beam in the aforementioned thin film are arranged along the conveying direction of the aforementioned thin film.
[0221] According to the above scheme, since irradiation areas can be set at multiple locations on the delivered film, the cumulative time for irradiating the carbonized region with the first laser beam can be extended without stopping the conveyor belt. Therefore, since impurity gases adhering to the surface of the carbonized region can be removed, the generation of impurity ions can be reliably suppressed, and the purity of the generated carbon ions can be improved.
[0222] Furthermore, the carbon ion generating apparatus of the sixth state according to the present invention adopts the following configuration based on the carbon ion generating apparatus of the fifth state described above. That is, the power density of the aforementioned sub-laser beam in each of the aforementioned irradiation areas is set such that, when viewed along the aforementioned delivery direction, the power density increases from the front section to the rear section.
[0223] Increasing the power density of the first laser beam raises the temperature of the carbonized region, thus further removing impurity gases adhering to its surface. However, when a high-power-density first laser beam, sufficient to remove impurity gases, is suddenly irradiated onto the film, the organic compounds may rapidly transform into carbon, potentially damaging the carbonized region. According to the above scheme, by setting multiple irradiation zones, the power density of the sub-laser beams in each irradiation zone can be increased in stages, thereby reducing the possibility of carbonized region damage while improving the purity of the generated carbon ions.
[0224] Furthermore, the carbon ion generating apparatus of the seventh state of the present invention, based on the carbon ion generating apparatus of the fourth state described above, further employs the following configuration: regarding the irradiation area of the aforementioned first laser beam in the aforementioned thin film, the length of this irradiation area in the delivery direction of the aforementioned thin film is longer than its length in the direction orthogonal to the aforementioned delivery direction.
[0225] According to the above scheme, the cumulative time for irradiating the carbonized region with the first laser beam can be extended without stopping the belt conveyor. Therefore, since impurity gases adhering to the surface of the carbonized region can be removed, the generation of impurity ions can be reliably suppressed, and the purity of the generated carbon ions can be improved.
[0226] The carbon ion generating apparatus of the eighth state of the present invention, based on the carbon ion generating apparatus of the fourth state described above, further comprises the following configuration: The aforementioned first laser beam irradiation mechanism further includes a scanning mirror that scans and irradiates the aforementioned first laser beam synchronously with the conveying speed of the aforementioned thin film along the delivery direction of the aforementioned thin film.
[0227] According to the above scheme, the cumulative time for irradiating the carbonized region with the first laser beam can be extended without stopping the belt conveyor. Therefore, since impurity gases adhering to the surface of the carbonized region can be removed, the generation of impurity ions can be reliably suppressed, and the purity of the generated carbon ions can be improved.
[0228] The carbon ion generating apparatus of the ninth state of the present invention, based on the carbon ion generating apparatus of the eighth state described above, further employs the following configuration: The power density of the first laser beam in the irradiation area formed on the thin film is set such that, when viewed along the aforementioned delivery direction, the power density increases stepwise or continuously from the front section to the rear section.
[0229] According to the above scheme, the first laser beam can scan and irradiate synchronously with the delivery direction and conveying speed of the thin film, and the power density of the first laser beam can be increased in stages or continuously. Therefore, while reducing the possibility of carbonization region damage, the purity of the generated carbon ions can be improved.
[0230] Furthermore, the carbon ion generating apparatus according to the tenth state of the present invention, based on the carbon ion generating apparatus according to the third state described above, also adopts the following configuration: the aforementioned thin film is formed into a circle or a polygon, the aforementioned holding part holds multiple portions of the outer edge of the aforementioned thin film, and the aforementioned moving part moves the aforementioned holding part along the in-plane direction of the main surface of the aforementioned thin film.
[0231] According to the above scheme, the moving part can move the position of the thin film along the in-plane direction of the thin film. Therefore, according to the tenth state, carbon ions can be continuously generated multiple times by moving the thin film, but the areas irradiated by the first laser beam and the areas irradiated by the second laser beam will not be moved.
[0232] Furthermore, the carbon ion generating apparatus relating to the eleventh state of the present invention, based on the carbon ion generating apparatus relating to any of the first to tenth states, also employs the following configuration: the aforementioned second laser beam irradiation mechanism irradiates the aforementioned second laser beam during the period when the aforementioned first laser beam irradiation mechanism irradiates the aforementioned first laser beam.
[0233] According to the above scheme, the re-formation of impurity layers on the front and back sides near the carbonized region after irradiation with the first laser beam can be prevented. Therefore, according to the eleventh state sample, the generation of impurity ions can be further suppressed, and the purity of the generated carbon ions can be further improved.
[0234] Furthermore, the carbon ion generating apparatus relating to the twelfth state of the present invention, based on the carbon ion generating apparatus of any of the third to tenth states, further employs the following configuration: in the aforementioned thin film, the area irradiated by the aforementioned first laser beam and the area irradiated by the aforementioned second laser beam are at different positions, and the aforementioned moving part moves the aforementioned thin film in such a way that the aforementioned carbonized area generated by irradiating the aforementioned first laser beam overlaps with the area irradiated by the aforementioned second laser beam.
[0235] According to the above scheme, the carbonized region generated in the area irradiated by the first laser beam is sequentially moved to the area irradiated by the second laser beam, and then carbon ions are generated. Therefore, since the generation of the carbonized region and the generation of carbon ions from the carbonized region can be carried out in parallel, the repetition frequency of carbon ion generation can be increased according to the twelfth state sample.
[0236] Furthermore, the carbon ion generating apparatus relating to the thirteenth state of the present invention, based on the carbon ion generating apparatus relating to any of the first to twelfth states described above, also adopts the following configuration: the thickness of the aforementioned thin film is 12.5 μm or less.
[0237] When a second laser beam is irradiated onto one surface of the thin film (e.g., the front side), electrons excited by the second laser beam diffuse within the film while simultaneously advancing towards another surface (e.g., the back side). Therefore, the thicker the thin film, the larger the region where a polarization field is formed on the back side (i.e., the region where carbon ions are generated). A larger polarization field formation region means a lower electron density in that region, resulting in a lower polarization field strength. Since there is a positive correlation between the intensity of the polarization field and the acceleration energy of the generated carbon ions, a high polarization field strength is preferred to generate carbon ions with high acceleration energy. According to the above scheme, carbon ions with a maximum acceleration energy of 8.5 MeV can be generated.
[0238] Furthermore, in order to control the carbon ions in the subsequent stage of carbon ion generation, it is preferable to make the carbon ion generation region small. According to the above scheme, it is possible to prevent the carbon ion generation region from becoming too large, thereby making subsequent carbon ion control easier.
[0239] Furthermore, the carbon ion generating apparatus relating to the fourteenth state of the present invention, based on the carbon ion generating apparatus relating to any of the first to thirteenth states described above, also employs the following configuration: the aforementioned film is made of polyimide resin.
[0240] Polyimide resin films are readily available and possess sufficiently high mechanical strength. Therefore, polyimide resin is suitable as a material for constructing films. Furthermore, polyimide resin films are available in a wide variety of thicknesses on the market, with even products as thin as approximately 5 μm being consistently produced. In this respect, polyimide resin is also suitable as a material for constructing films.
[0241] [Notes]
[0242] This invention is not limited to the embodiments described above. Various modifications can be made within the scope of the specification. Embodiments obtained by appropriately combining the techniques disclosed in different embodiments are also included in the scope of this invention.
Claims
1. A carbon ion generating device, characterized in that, have: The first laser beam irradiation mechanism irradiates a portion of a thin film made of organic compound with a first laser beam to carbonize that portion, thereby generating a carbonized region; and The second laser beam irradiation mechanism irradiates at least a portion of the aforementioned carbonized region with a second laser beam, thereby generating carbon ions in the carbonized region. The wavelength and power of the aforementioned first laser beam, as well as the area of the region in the aforementioned thin film irradiated by the aforementioned first laser beam, were set so that the temperature of the thin film in that region was heated to above 600°C.
2. The carbon ion generating device according to claim 1, characterized in that, It further possesses: The holding portion holds the aforementioned thin film in such a manner that at least the area irradiated by the first laser beam and the area irradiated by the second laser beam become planar; and A moving part that moves the aforementioned film; The aforementioned thin film is larger than the area irradiated by the aforementioned first laser beam and the area irradiated by the aforementioned second laser beam.
3. The carbon ion generating device according to claim 2, characterized in that, The aforementioned film is formed into a strip shape. The aforementioned moving part includes a first roller for dispensing the aforementioned film and a second roller for winding the aforementioned film. The aforementioned retaining part is disposed between the aforementioned first roller and the aforementioned second roller and has a belt head, which determines its position relative to the main surface of the aforementioned film in the normal direction of the main surface.
4. The carbon ion generating device according to claim 3, characterized in that, The aforementioned first laser beam irradiation mechanism further comprises multiple laser beam sources that emit each of the multiple sub-laser beams constituting the aforementioned first laser beam. Each sub-laser beam is positioned in its respective irradiation region within the aforementioned thin film along the delivery direction of the aforementioned thin film.
5. The carbon ion generating device according to claim 4, characterized in that, The power density of the aforementioned sub-laser beam in each of the aforementioned irradiation areas is set such that, when viewed along the aforementioned delivery direction, the power density increases from the front section to the rear section.
6. The carbon ion generating device according to claim 3, characterized in that, Regarding the irradiation area of the aforementioned first laser beam in the aforementioned thin film, the length of this irradiation area in the delivery direction of the aforementioned thin film is longer than its length in the direction orthogonal to the aforementioned delivery direction.
7. The carbon ion generating device according to claim 3, characterized in that, The aforementioned first laser beam irradiation mechanism further comprises: A scanning mirror, which scans the first laser beam synchronously with the conveying speed of the aforementioned thin film along the delivery direction of the aforementioned thin film.
8. The carbon ion generating device according to claim 7, characterized in that, The power density of the first laser beam in the irradiation area formed on the aforementioned thin film is set such that, when viewed along the aforementioned delivery direction, the power density increases in stages or continuously as it moves from the front section to the rear section.
9. The carbon ion generating device according to claim 2, characterized in that, The aforementioned film is formed into a circle or a polygon. The aforementioned retaining portion holds multiple portions of the outer edge of the aforementioned film. The aforementioned moving part causes the aforementioned holding part to move in the in-plane direction along the main surface of the aforementioned film.
10. The carbon ion generating apparatus according to any one of claims 1 to 9, characterized in that, The aforementioned second laser beam irradiation mechanism irradiates the aforementioned second laser beam during the period when the aforementioned first laser beam irradiation mechanism irradiates the aforementioned first laser beam.
11. The carbon ion generating apparatus according to any one of claims 2 to 9, characterized in that, In the aforementioned thin film, the area irradiated by the first laser beam and the area irradiated by the second laser beam are at different locations. The aforementioned moving part moves the aforementioned thin film in such a way that the aforementioned carbonized region generated by irradiating the aforementioned first laser beam overlaps with the region irradiated by the aforementioned second laser beam.
12. The carbon ion generating apparatus according to any one of claims 1 to 9, characterized in that, The thickness of the aforementioned film is less than 12.5 μm.
13. The carbon ion generating apparatus according to any one of claims 1 to 9, characterized in that, The aforementioned film is made of polyimide resin.