Silicon oxynitride powder or oxidized silicon nitride powder having the general chemical formula Si(X)O(Y)N(Z), method for preparing the same and use thereof in antipathogen products

Abstract

The present invention is in the field of ceramic materials for biomedical applications. The present invention relates to silicon oxynitride powder or oxidized silicon nitride powder having the general chemical formula Si x O y N z The powder comprises 0.1-50 wt % oxygen, or 7-12 wt % oxygen, or 10-12 wt % oxygen. The silicon oxynitride powder according to the invention is suitable for antipathogen applications.

Description

Technical Field

[0001] The present invention relates to methods for producing oxidized nitrides for anti-pathogen applications and nitriding silicon oxide ceramics. Specifically, the present invention provides methods for providing controlled oxygen content in nitride ceramics such as silicon nitride and titanium nitride and nitriding silicon oxide. The present invention also includes materials made using the method, and more particularly, to oxynitride ceramics and nitriding silicon oxide compositions. Background of the Invention

[0003] Surfaces, including our hands, play an important role in the spread of viruses. Viral transmission can occur through close person-to-person contact or through contact with contaminated surfaces. Materials that possess anti-pathogen properties can play a key role in preventing the spread of viruses. Such materials can be used in medical devices and equipment and in the manufacture, modification or disinfection of surfaces in an attempt to inactivate viruses or prevent them from attaching and proliferating thereon. In addition, such materials can be used in solutions as disinfectants for daily use.

[0004] Similarly, bacterial infections have become a major cause of concern in the medical industry. With the increasing use of orthopedic or dental implants to improve the quality of life of millions of patients worldwide, the impact of potential bacterial infections and post-operative complications on society is enormous. Implants produced partially or completely with pathogen-resistant materials may be a solution to minimize the risk of bacterial infections and ensure safer surgery for patients.

[0005] Due to the need for reliable measures to protect against viral and bacterial infections, materials have been increasingly used to try to inactivate or reduce the spread of pathogens. Metals are typical materials that have been used for antiviral applications. In recent years, the use of metal nanomaterials to form self-disinfecting surfaces has become increasingly popular because viruses can persist on contaminated surfaces for a long time. However, metal particles are toxic in the body, causing very serious side effects. The National Institutes of Health (NIH) and the U.S. Food and Drug Administration (FDA) guidelines on silver (Ag) particles and colloidal silver indicate that they can cause serious side effects. Gold (Au) and copper (Cu) nanoparticles and ions can still show cytotoxicity at virus inhibition concentrations. Therefore, the use of these metals or metal nanoparticles should be very careful about, for example, dosage / composition and ion release / leakage. Some ceramics such as silicon nitride have been reported to have an effect on virus inactivation. Compared with metals, oxide and nitride ceramics are generally more inert, so they are safer in this case. Silicon oxynitride (Si2O2N) is a non-toxic ceramic material used in various applications due to its excellent behavior in harsh environments. As part of the nitride material class, it also has the potential to significantly and reliably reduce the activity of various pathogens.

[0006] Therefore, there is a great social need for ways to protect humans from exposure to potentially dangerous pathogens and can be met by using materials with significant and durable antiviral and / or antibacterial behavior. Using such materials in a variety of ways can prove to be a very important step in minimizing the negative impact of current and future health crises.

[0007] US2020 / 0079651 A1 discloses a composition, device and method for inactivating viruses, bacteria and fungi. The composition, method and device include a coating and a slurry containing silicon nitride powder.

[0008] EP 0227324 A2 discloses a method for preparing a fusible one-component silicon nitride powder having a purity equal to or greater than 99.98% and having a fine particle size, and a method for preparing a silicon oxynitride reagent having a purity equal to or greater than 99.98%.

[0009] There is a need in the art for antipathogenic materials suitable for biomaterial applications, and for methods of making such materials. Summary of the invention

[0010] The object of the present invention is to provide an antipathogen material and a method for preparing the same which overcomes the disadvantages of the prior art.

[0011] This is achieved by means of a powder and a method as defined in the above technical solution.

[0012] In a first aspect of the present invention, there is a silicon oxynitride powder or a silicon nitride oxide powder having the general chemical formula Si x O y N z .

[0013] In one embodiment of the invention, the powder comprises 0.1-50 wt% oxygen and 1-60 wt% nitrogen, or 12-17 wt% nitrogen and 38-42 wt% oxygen, or about 15 wt% nitrogen and about 38 wt% oxygen.

[0014] In one embodiment of the invention, the powder comprises 0.1-50 wt% oxygen, or 7-12 wt% oxygen, or 10-12 wt% oxygen.

[0015] In one embodiment of the invention, the powder is X-ray amorphous. In one embodiment of the invention, the powder is crystalline.

[0016] In one embodiment of the invention, the powder comprises hydroxyl surface groups when in contact with water.

[0017] In one embodiment of the invention, the grain size is <500 μm, or 0.1-2 μm, or 150-900 nm.

[0018] In a second aspect of the invention, there is a method of forming silicon oxynitride powder or oxidized silicon nitride powder, the powder comprising 0.1-50 wt % oxygen and 1-60 wt % nitrogen, or 12-17 wt % nitrogen and 38-42 wt % oxygen, or about 15 wt % nitrogen and about 38 wt % oxygen. The method comprises heat treating the silicon nitride powder at 900-1100° C. for 0.5-10 hours or 4-7 hours, and wherein the heat treatment is carried out in air or an oxygen atmosphere.

[0019] In one embodiment of the present invention, the heat treatment is performed for about 4 hours.

[0020] The heat treatment was carried out for about 7 hours.

[0021] In one embodiment of the invention, the powder is placed in an air oven at 20-25°C and then heated to 900-1100°C using a ramp time of 1-15°C / min or 10-15°C / min.

[0022] In a third aspect of the invention, there is an antipathogenic product comprising a silicon oxynitride powder comprising 10.1-50 wt % oxygen and 1-60 wt % nitrogen, or 12-17 wt % nitrogen and 38-42 wt % oxygen, or about 15 wt % nitrogen and about 38 wt % oxygen.

[0023] In one embodiment of the invention, the antipathogenic product comprises 0.25-100 wt%, or 0.25-40 wt%, or about 0.5 wt% silicon oxynitride or oxidized silicon nitride.

[0024] In one embodiment of the present invention, silicon oxynitride or oxidized silicon nitride is deposited on the surface of the anti-pathogen product.

[0025] In one embodiment of the invention, the antipathogenic product is a solution and the silicon oxynitride is included in the solution. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 a) and b) are SEM images of one embodiment of the present invention;

[0027] Figure 2 is a diagram according to an embodiment of the present invention;

[0028] Figure 3 is an illustration of an example according to the present invention;

[0029] Figure 4 is a diagram according to an embodiment of the present invention;

[0030] Figure 5a) is a SEM image according to an embodiment of the present invention, b) is a SEM image according to a comparative example, c) is an X-ray diffraction pattern according to an embodiment of the present invention, and d) is an X-ray diffraction pattern according to a comparative example;

[0031] Figure 6 is a diagram according to an embodiment of the present invention; and

[0032] Figure 7 a) and b) are data according to one embodiment of the present invention.

[0033] describe

[0034] The term "grain size" is used herein to refer to "particle size," such as the average or median particle size as determined by, for example, scanning electron microscopy (SEM), particle size distribution measurements based on laser diffraction, and the like.

[0035] "Silicon oxynitride" is a ceramic material having the general chemical formula SixOyNz, which may be crystalline or amorphous.

[0036] The terms "material" and "powder" are used interchangeably in this specification and refer to a solid material in the form of small particles or powder.

[0037] The terms "weight percent" and "weight %" herein both refer to percentages by weight, ie, the weight fraction of a component relative to the total weight of the composition including the component, expressed as a percentage.

[0038] The term "antipathogen" includes antiviral and antibacterial, ie, something that inhibits or prevents the reproduction and / or growth of bacteria or viruses.

[0039] Details

[0040] Described herein are surfaces, bodies, solutions, slurries or emulsions containing oxidized silicon nitride (including silicon oxynitride) and nitrided silicon oxide powders that will come into contact with a surface, device or person in order to inactivate or prevent the attachment of pathogens such as viruses and bacteria. The aforementioned solutions should contain silicon oxynitride powders at a concentration high enough to inactivate pathogens. The powders in the device can be mixed with distilled water or other solvents such as ethanol and / or hydrogen peroxide, etc.

[0041] In addition, devices containing oxidized silicon nitride, silicon oxynitride, and nitrided silicon oxide are described herein. Such devices can be produced using oxidized silicon nitride, silicon oxynitride, or silicon nitrided oxide powders as the primary or partial raw material that will then be thermally processed into the final device. In other cases, such devices can be produced by deposition methods of silicon oxynitride on other ceramics, metal polymers, or fibers.

[0042] Also described herein is a method for inactivating pathogens by contacting them with the above devices. Due to the non-toxic properties of the material, the method can be applied to the disinfection of other surfaces and devices as well as human skin. Also described herein is a method for obtaining oxidized silicon nitride, silicon oxynitride and / or nitrided silicon oxide powders from starting powders, i.e., silicon nitride, silicon oxide. This method is a way to control the oxygen content of the powder. The powder produced can be used as a raw material for the production of surfaces, fillers, solutions, other devices and instruments, for depositing silicon oxynitride and silicon nitride oxide layers on existing devices or for inclusion in solutions, slurries or emulsions.

[0043] Provided herein are devices, instruments or coatings that will utilize silicon oxynitride and / or nitrided silicon oxide powders to inactivate pathogens such as viruses and bacteria. These instruments can be used in a variety of applications ranging from the synthesis of bulk ceramics with anti-pathogen behavior and the addition of such properties to other materials through coatings and composites to disinfecting solutions, sprays or gels that can be used on surfaces and people, etc. These materials can be medical devices and equipment or everyday items and clothing.

[0044] In one embodiment, the silicon oxynitride powder can be dispersed in a liquid containing oil, an emulsion, a gel, distilled water, ethanol, or hydrogen peroxide, or a mixture thereof, for contact with a surface or a person to inactivate pathogens. In such an embodiment, the silicon oxynitride can be added to the liquid at a concentration of 0.25-40% w / v sufficient to inactivate pathogens. A stabilizer can also be added to the mixture to produce a device with a specific consistency. The grain size of the powder is less than 500 microns.

[0045] In other embodiments, the oxynitride powder can be used as a raw material for the manufacture of medical devices and equipment. These devices can be prepared by thermal methods or such combinations. Such embodiments can be fully dense, porous, or a combination thereof. In these devices, silicon oxynitride can be used as the only raw material, or partially combined with other ceramics, polymers or metals. Examples of such embodiments can be orthopedic or dental implants with anti-pathogen behavior, etc. The grain size of the starting powder is less than 500 microns.

[0046] In another embodiment, the silicon oxynitride powder can be deposited or used as a coating material on other devices or parts thereof. In such an embodiment, the silicon oxynitride can be on the external surface of these devices, exposed to pathogens that can come into contact with it and be inactivated. The substrates used for these deposits or coatings can be ceramics, polymers, metals, or fibers.

[0047] In yet another embodiment, a silicon oxynitride coating on the device may be formed by nitriding a SiO2 or Si surface coating.

[0048] Also provided herein is a method by which inactivation of various pathogens such as viruses and bacteria can be achieved. In the method, silicon oxynitride is contacted with the pathogen to cause inactivation of the pathogen. In such a method, silicon oxynitride can be contacted with the pathogen in powder form, in solution, as a coating or a dense material.

[0049] In one embodiment, the devices or apparatus provided herein can be used to inactivate human adenovirus (HAdV).

[0050] Silicon oxynitride has a surface chemistry such that when in contact with water, ammonia and ammonium ions can be eluted and / or formed in the material or particle surface. Such compounds have been shown to play a key role in inactivating pathogens such as bacteria and viruses. The unique coexistence of oxides and nitrides in silicon oxynitride contributes to its antipathogen properties, as oxidation can enhance hydrolysis and release of reactive nitrogen species.

[0051] In a first aspect of the present invention, there is a silicon oxynitride powder or a silicon nitride oxide powder having the general chemical formula Si x O y N z .

[0052] In one embodiment of the invention, the powder comprises 0.1-50 atomic % oxygen and 1-60 atomic % nitrogen, or 12-17 atomic % nitrogen and 38-42 atomic % oxygen, or about 15 atomic % nitrogen and about 38 atomic % oxygen. In one embodiment of the invention, the powder comprises 0.1-50 weight % oxygen and 1-60 weight % nitrogen, or 12-17 weight % nitrogen and 38-42 weight % oxygen, or about 15 weight % nitrogen and about 38 weight % oxygen. The composition ratio can be expressed in weight % and / or atomic %. Such composition can be determined, for example, using X-ray photoelectron spectroscopy (XPS) or any other suitable characterization technique. XPS is a surface sensitive technique that typically displays the surface composition of a material including several atomic layers below the surface.

[0053] In one embodiment of the invention, the powder contains 0.1-50 wt% oxygen, or 7-12 wt% oxygen, or 10-12 wt% oxygen. The oxygen content is considered as a normal oxygen content and can be measured, for example, by energy dispersive spectroscopy (EDS) or any other suitable characterization technique. Figure 2 An example of a typical oxygen content of a material according to the invention can be seen in EDS to examine the (bulk) composition of the material.

[0054] Such materials may be crystalline or X-ray amorphous, or a mixture of crystalline and X-ray amorphous.

[0055] Silicon oxynitride materials or silicon nitride oxide materials generally contain silanol or other -OH groups and reactive nitrogen species.

[0056] When in contact with water or moisture, the material according to the present invention may form hydroxyl (-OH) surface groups. The hydroxyl groups may be in the form of silanol groups (Si-OH) located on the surface of the material. The material or powder according to the present invention may be hydrophilic due to the presence of silanol or hydroxyl surface groups. Hydrophilic materials may be advantageous in terms of antipathogen or antiviral properties.

[0057] exist Figure 1 a and b and Figure 5 An example of a SEM image of a material according to the invention is shown in a. As can be seen, the silicon oxynitride material is in the form of small particles, <500 μm, or 0.1-2 μm, or 150-900 nm, forming soft agglomerates.

[0058] Materials according to the invention, such as oxidic silicon nitride powder, can form and possibly release reactive nitrogen species when in contact with water and / or moisture. This can be seen, for example, by ammonia release tests.

[0059] In one aspect of the invention, there is an antipathogenic product comprising a silicon oxynitride powder comprising 10.1-50 wt % oxygen and 1-60 wt % nitrogen, or 12-17 wt % nitrogen and 38-42 wt % oxygen, or about 15 wt % nitrogen and about 38 wt % oxygen. The antipathogenic product may comprise 0.25-100 wt %, or 0.25-40 wt %, or about 0.5 wt % silicon oxynitride or oxidized silicon nitride.

[0060] Silicon oxynitride or oxidized silicon nitride according to the present invention can be deposited on the surface of a product to form an antipathogen product. In other embodiments of the antipathogen product, it can be in the form of a solution in which silicon oxynitride or oxidized silicon nitride according to the present invention is included in the solution, such as in the form of a slurry, cream, paste, etc.

[0061] An advantage of using the present invention is that silicon oxynitride or oxidized silicon nitride can inactivate viruses and bacteria while being non-toxic or non-harmful to human cells.

[0062] In one aspect of the invention, there is a method of forming an oxynitride silicon powder or an oxidized silicon nitride powder comprising 0.1-50 wt % oxygen and 1-60 wt % nitrogen, or 12-17 wt % nitrogen and 38-42 wt % oxygen, or about 15 wt % nitrogen and about 38 wt % oxygen. The method comprises heat treating the silicon nitride powder at 900-1100° C. for 0.5-10 hours or 4-7 hours, and wherein the heat treatment is carried out in an air or oxygen atmosphere. In one embodiment of the method, the heat treatment is carried out for about 4 hours. In one embodiment of the method, the heat treatment is carried out for about 7 hours.

[0063] Increasing the heat treatment time can lead to a higher average oxygen content, as can be seen in Figure 2 It can be seen in. Figure 2 The average oxygen content in wt % is shown for different heat treatment time periods. The optimal heat treatment may depend on factors such as particle size, furnace size, powder amount, etc. A skilled person can determine the appropriate heat treatment time period based on such factors.

[0064] In one embodiment of the invention, the powder is placed in an air oven at 20-25°C and then heated to 900-1100°C using a ramp time of 1-15°C / min or 10-15°C / min.

[0065] Heat treating silicon nitride powder in an oxygen atmosphere can lead to oxidation of the powder and the formation of silanol (Si-OH) groups on the surface of the powder. The silanol groups can increase the hydrophilicity of the material, which is beneficial in terms of anti-pathogen properties.

[0066] Figure 4 Shown with different dilutions according to the powder of the present invention (ie different concentrations of powder) after treatment with the total number of viruses reduced. As can be seen in the figure, a concentration of 0.25% by weight of powder in the solution or a 1:4 dilution leads to a substantial reduction in the total number of viruses.

[0067] Unless expressly stated otherwise, all aspects, variations and embodiments described herein can be combined. Example

[0068] Example 1: Controlled oxidation of silicon nitride

[0069] To control the amount of oxide formation, heat treatments of varying durations were used to oxidize the as-received silicon nitride powder and the oxygen content was correlated to the residence time. A uniform thin layer of powder was deposited on an alumina surface placed in an air furnace. The powder was heated from room temperature to 1070°C at a heating rate of 12°C / min. Three different residence times at 1070°C were selected: 2, 4, and 7 hours. The powder was then cooled in the furnace to room temperature and the oxygen content of the different particles was examined using electron dispersive spectroscopy (EDS). The results can be seen in Figure 2. Figure 2 The effect of residence time during oxidation can be seen in Figure 2 Shown are the average oxygen contents of powders heat treated for different periods of time. Figure 1 a and b show SEM images of the formed powders.

[0070] Example 2: Nitriding silicon oxide

[0071] To prepare nitrated silicon oxide powder, a thin layer of silicon oxide powder is spread evenly on the aluminum oxide surface. Thereafter the powder is thermally annealed in a nitriding atmosphere at a temperature between 800-1200° C. Some examples of such atmospheres are NO, N2O and NH3.

[0072] Example 3: Inactivation of human adenovirus by silicon oxynitride powder

[0073] To show the effect of silicon oxynitride powder on adenovirus activity, the virus was exposed to a 0.5% w / v concentration of silicon oxynitride slurry. 5 mg of the powder was added to 1 mL of the virus-containing solution and the mixture was incubated at 37°C for 1 h. Similarly, 1 mL of the virus solution was incubated for 1 h as a control. Both mixtures / solutions were slightly shaken during the incubation period. After the incubation time had elapsed, both mixtures were centrifuged at 12000 rpm for 5 minutes to extract the viral supernatant. It was then used to infect epithelial cells of the A549 line that were cultured for 24 h. After the incubation, the dual luciferase reporter (DLR) assay was used to quantify the total number of viruses. This method is Figure 3 The estimated total number of viruses exposed to silicon oxynitride powder is shown as Figure 4 The percentage of the total number of controls.

[0074] Example 4: Preparation of silicon oxynitride

[0075] To prepare the oxynitride powders, silicon nitride powder was oxidized at 1070°C in air for 7 hours. This method has been shown to produce highly oxidized silicon nitride surfaces that retain nitrogen at less than 10% atomic ratio. The morphology and crystal structure of both powders were analyzed by scanning electron microscopy (SEM) and powder X-ray diffraction (XRD). To demonstrate the hydrophilicity of silicon oxynitride, the hydrophilicity was evaluated using the sessile drop method on bulk silicon nitride samples oxidized using the same method. Finally, to ensure that nitrogen was still present on the powder, an ammonia release kit was used.

[0076] Antiviral testing: To evaluate the antiviral properties of silicon oxynitride, a solution of SARS-CoV-2 (PM5, Swedish isolate) was prepared at a titer of 104PFU / ml. The virus solution was contacted with silicon oxynitride powder and copper powder at a final concentration of 10% w / v. Copper was used as a positive control due to its known antiviral activity, while a virus solution that was not in contact with any material was used as a negative control. The samples were contacted with the virus for 1 minute, 10 minutes and 1 hour, after which the vials were centrifuged at 4000 rpm for 10 minutes so that the powder could be separated from the supernatant. Both the powder and the supernatant were then subjected to RNA extraction using the Direct zolTM 96-plate extraction kit followed by SARS-CoV-2E gene RT-qPCR. The infectivity of the virus in the supernatant was then evaluated by plaque assay on Vero E6 cell monolayers. The above procedures were performed at 25 and 37°C.

[0077] Result Example 4

[0078] Figure 5 a shows the SEM image of silicon oxynitride powder and Figure 5b shows an SEM image of the copper powder. By examining the morphology by SEM, it is clear that there are differences between the silicon oxynitride and copper powders. Although they both exhibit soft agglomerations, the particles of the silicon oxynitride powder are significantly smaller, explaining the higher apparent density of the material. XRD confirms that the silicon oxynitride powder is crystalline Si2 O2 N (see Figure 5 c) and the copper powder is crystalline copper (Cu) (see Figure 5 d). It can also be seen from the XRD record that the silicon oxynitride powder contains smaller particles than the copper powder due to the less obvious peaks in the diffraction pattern ( Figure 5 c).

[0079] exist Figure 6 X-ray photoelectron spectroscopy (XPS) analysis of the resulting silicon oxynitride powder is shown in . As can be seen, the powder consists of oxygen, carbon, nitrogen and silicon. Table 1 below shows the composition in atomic % from the XPS analysis.

[0080] Table 1 Composition of silicon oxynitride powder from XPS analysis (atomic %)

[0081] Si N 0 C Others (Al and Na) 15.16 2.09 38.25 40 3.71

[0082] Figure 7 a shows the results from wetting angle measurements (oxidized silicon nitride on the left hand side, silicon nitride on the right hand side). The wetting angle measurement results confirm that the oxidized silicon nitride material is highly hydrophilic. Oxidation of the powder results in the formation of silanol groups (Si-OH) on the surface of the material, as shown by the increased hydrophilicity of the material.

[0083] Ammonia release tests showed that although the powder was highly oxidized, the remaining nitrogen in the material still formed and released reactive nitrogen species.

[0084] Figure 7 b shows the results of the plaque forming unit assay. The cytopathic (or cytopathic, i.e. structural changes in cells caused by the virus) effects on the cells as a result of infection are highlighted by the drawn circles at 25°C: D (Cu V 1 min), G (V 1 min), H (V 10 min), I (V, 60 min). As a reference, at Figure 7 G, H, and I in the last row of b show cells infected with the virus solution not treated with any substances.

[0085] The infectivity of the virus after contact with the test material and the control was evaluated using a plaque forming unit assay. At 25°C, silicon oxynitride rendered the virus non-infectious after the full contact time (see Figure 7 b: A, B, C 25°C). The results show that the material has superior antiviral behavior than copper, as it inactivates the virus after only one minute of contact, while copper does not (see Figure 7 b: D, E, F 25°C). In addition, cells treated with supernatant from silicon oxynitride showed normal morphology, again confirming the biocompatible nature of the material. At 37°C, both the test material and the positive control (copper) effectively inactivated the virus at all contact times, indicating that the virus is less stable at higher temperatures (see Figure 7 b: AF 37°C).

[0086] The viral genomic RNA from the powder and supernatant was examined by using reverse transcription quantitative PCR (RT-qPCR). A critical CT value of 35 (the number of cycles required in PCR for the virus to be detected) was selected. Based on this criterion, all CT values ​​of all virus control groups were found to be lower than 35. All silicon oxynitride test groups had CT values ​​above 35, except for the group treated at 37°C for only one minute. The supernatant from the Cu test group had a lower CT value compared to the silicon oxynitride group, indicating a higher antiviral activity of silicon oxynitride compared to Cu.

Claims

1. An anti-pathogen product comprising silicon oxynitride powder having the general chemical formula Si x O y N z , and wherein the grain size is 0.1-2 µm; the silicon oxynitride powder contains 0.1-50 wt % oxygen and 1-60 wt % nitrogen; The method of forming silicon oxynitride powder includes heat-treating silicon nitride powder at 900-1100° C. for 0.5-10 hours, and wherein the heat treatment is performed in air or oxygen atmosphere.

2. The antipathogen product according to claim 1, wherein The silicon oxynitride powder contains 12-17 wt % nitrogen and 38-42 wt % oxygen.

3. The antipathogen product according to claim 2, wherein: The silicon oxynitride powder contained 15% by weight of nitrogen and 38% by weight of oxygen.

4. The antipathogen product according to claim 3, wherein The silicon oxynitride powder contains 7-12 wt % oxygen.

5. The antipathogen product according to claim 4, wherein The silicon oxynitride powder contains 10-12 wt % oxygen.

6. The antipathogen product according to any one of the preceding claims 1 to 5, wherein the silicon oxynitride powder is crystalline.

7. The antipathogen product according to any one of the preceding claims 1 to 5, wherein the silicon oxynitride powder comprises hydroxyl surface groups when in contact with water.

8. The antipathogenic product of claim 1, wherein the heat treatment is performed for 4-7 hours.

9. The antipathogenic product according to claim 8, wherein the heat treatment is performed for 4 hours.

10. The antipathogenic product of claim 6, wherein the powder is placed in an air oven at 20-25°C and then heated to 900-1100°C using a ramp time of 1-15°C / min.

11. The antipathogenic product of claim 10, wherein the powder is placed in an air oven at 20-25°C and then heated to 900-1100°C using a ramp time of 10-15°C / min.

12. The antipathogenic product of claim 1, wherein the crystallite size is 150-900 nm.

13. The antipathogenic product of claim 1, wherein the antipathogenic product comprises 0.25-100 wt% of silicon oxynitride powder.

14. The antipathogenic product of claim 13, wherein the antipathogenic product comprises 0.25-40 wt% silicon oxynitride powder.

15. The antipathogenic product of claim 14, wherein the antipathogenic product comprises 0.5 wt% silicon oxynitride powder.

16. The antipathogen product according to any one of claims 13 to 15, wherein silicon oxynitride powder is deposited on the surface of the product.

17. The antipathogenic product of claim 16, wherein the antipathogenic product is a solution and the silicon oxynitride powder is included in the solution.

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