A microstructure array-based cut-off filter and a method of manufacturing the same

By employing a two-dimensional grating array structure and etching technology to fabricate a microstructure array filter, the problems of channel crosstalk and shadowing effect in filter fabrication have been solved, realizing a highly integrated and high-precision optical device suitable for surveying and mapping remote sensing, environmental monitoring, and clinical image analysis.

CN116520468BActive Publication Date: 2026-06-16HANGZHOU INST FOR ADVANCED STUDY UCAS +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HANGZHOU INST FOR ADVANCED STUDY UCAS
Filing Date
2023-03-31
Publication Date
2026-06-16

AI Technical Summary

⚠Technical Problem

Existing filter manufacturing processes suffer from channel crosstalk and coating shadow effects, making it difficult to meet the requirements of miniaturization and high integration.

⚗Method used

A cutoff filter based on a microstructure array is used, employing a two-dimensional grating array structure combined with a low-refractive-index dielectric thin film layer. It is fabricated using photolithography and etching techniques to eliminate the coating shadow effect and improve the space utilization and detection and imaging accuracy of optical devices.

🎯Benefits of technology

It achieves highly integrated and high-precision filter fabrication, improving the sensitivity and accuracy of spectral imaging and detection, and is applicable to fields such as surveying and mapping remote sensing, environmental monitoring, and clinical image analysis.

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Abstract

The application discloses a cut-off filter based on a microstructure array, which comprises a substrate, a dielectric film and a two-dimensional grating array structure arranged on the substrate in sequence; the substrate material is a high-refractive-index material; the dielectric film material is a low-refractive-index material; and the two-dimensional grating material is a high-refractive-index material. The application further provides a preparation method of the cut-off filter based on the microstructure array. The preparation method of the cut-off filter based on the microstructure array is simple in preparation, low in cost and convenient for large-scale and batch production. Therefore, the application can be widely applied in the fields of surveying and mapping remote sensing, environmental monitoring, sensing detection and clinical image analysis.
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