Optical path adjustment monitoring system and method

Abstract

The present invention discloses an optical path adjustment monitoring system and method, which relates to the field of optical path adjustment monitoring. The system includes: a first reflector, a second reflector, a third reflector, a fourth reflector, a reflector group, a first CCD camera, a second CCD camera, an adjustment monitoring light source, and a Hartmann sensor. The first reflector is arranged on the emission light path of the high-energy light source, the second reflector is arranged on the reflection light path of the first reflector, the reflector group is arranged on the reflection light path of the second reflector, the third reflector is arranged on the reflection light path of the reflector group, and the fourth reflector is arranged on the reflection light path of the third reflector. The present invention can ensure the accuracy of optical path pointing by adjusting the monitoring light source, the first CCD camera, and the second CCD camera. When the optical path pointing changes, the first CCD camera and the second CCD camera can provide an early warning. The adjustment monitoring light source and the Hartmann sensor can measure the wavefront of the reflector in real time, thereby ensuring the quality of the light beam.

Description

Technical Field

[0001] The present invention relates to the field of optical path installation and adjustment monitoring, and in particular to an optical path installation and adjustment monitoring system and method. Background Art

[0002] To ensure that the high-energy laser emitted by a high-energy laser weapon can accurately track and hit the target while maintaining high beam quality to destroy the target, it is usually necessary to maintain the stable pointing of the optical components in the optical path and to ensure the surface shape of the optical components along the entire transmission optical path to ensure the laser weapon can perform normally. Therefore, it is very necessary to design an optical path alignment monitoring system that can simultaneously ensure the accurate pointing of the optical path and the quality of the beam. Summary of the Invention

[0003] The purpose of the present invention is to provide an optical path adjustment monitoring system and method for providing a high-energy laser with accurate optical path pointing and guaranteed beam quality.

[0004] To achieve the above object, the present invention provides the following solutions:

[0005] An optical path adjustment monitoring system includes: a first reflector, a second reflector, a third reflector, a fourth reflector, a reflector group, a first CCD camera, a second CCD camera, an adjustment monitoring light source, and a Hartmann sensor;

[0006] The first reflector is arranged on the emission light path of the high-energy light source, the second reflector is arranged on the reflection light path of the first reflector, the reflector group is arranged on the reflection light path of the second reflector, the third reflector is arranged on the reflection light path of the reflector group, and the fourth reflector is arranged on the reflection light path of the third reflector;

[0007] The first CCD camera is arranged on the transmission light path of the second reflector, and the second CCD camera is arranged on the transmission light path of the third reflector;

[0008] The adjustment monitoring light source is arranged on the reverse extension line of the transmission light path of the second reflector; the adjustment monitoring light source, the first CCD camera and the second CCD camera cooperate with each other to adjust the light path direction of the high-energy light source;

[0009] The Hartmann sensor is arranged on the transmission light path of the fourth reflector; the Hartmann sensor is used to measure the wavefront of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group in real time.

[0010] Optionally, the reflector group includes: a fifth reflector, a sixth reflector, a seventh reflector and an eighth reflector; the reflective light path of the eighth reflector is the reflective light path of the reflector group;

[0011] The fifth reflector is arranged on the reflected light path of the second reflector, the sixth reflector is arranged on the reflected light path of the fifth reflector, the seventh reflector is arranged on the reflected light path of the sixth reflector, and the eighth reflector is arranged on the reflected light path of the seventh reflector.

[0012] Optionally, the transmission light path of the second reflector is parallel to the reflection light path of the first reflector; the transmission light path of the third reflector is parallel to the reflection light path of the reflector group; and the transmission light path of the fourth reflector is parallel to the reflection light path of the third reflector.

[0013] Optionally, the light-facing surfaces of the first reflector, the second reflector, the seventh reflector and the eighth reflector are parallel and have an angle of 45° with the incident light path; the light-facing surfaces of the third reflector, the fourth reflector, the fifth reflector and the sixth reflector are parallel and have an angle of 45° with the outgoing light path.

[0014] Optionally, the laser wavelength of the high-energy light source is 1064 nm, and the laser wavelength of the adjustment monitoring light source is 533 nm.

[0015] Optionally, the reflectivity of the surface film layers of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group for the laser wavelength of the high-energy light source is 99.9%.

[0016] Optionally, the reflectivity of the surface film layer of the first reflector and the reflector group is 50% for the laser wavelength of the adjustment monitoring light source.

[0017] Optionally, the mirror surfaces of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group are in a low-stress state, and flexible rubber strips are used to support the mirror surfaces.

[0018] A method for monitoring optical path adjustment, which is applied to the optical path adjustment monitoring system described above, comprises:

[0019] Preliminarily fixing the positions of the first reflector, the second reflector, the third reflector, the fourth reflector, the fifth reflector, the sixth reflector, the seventh reflector, and the eighth reflector;

[0020] establishing a laser tracker measurement coordinate system using the first reflector;

[0021] Adjusting the posture and position of the first CCD camera and the second CCD camera according to the laser tracker measurement coordinate system so that the center positions of the first CCD camera and the second CCD camera coincide with the theoretical output position of the high-energy light source;

[0022] Adjusting the position of the installation and adjustment monitoring light source so that the laser light emitted by the installation and adjustment monitoring light source is incident on the center position of the first CCD camera;

[0023] Maintaining the initial positions of the first reflector, the third reflector, and the fourth reflector, and adjusting the yaw and pitch angles of the second reflector, the fifth reflector, the sixth reflector, the seventh reflector, and the eighth reflector so that the laser light emitted by the adjustment monitoring light source can be incident on the center position of the second CCD camera;

[0024] A Hartmann sensor is arranged on the transmission light path of the fourth reflector; the Hartmann sensor is used to measure the wavefront of the reflector in real time.

[0025] Optionally, establishing a laser tracker measurement coordinate system using the first reflector specifically includes:

[0026] Taking a vertex of the first reflector as a coordinate origin, and establishing an initial coordinate system with three edges connected to the coordinate origin;

[0027] The initial coordinate system is matched with the overall optical path and structural design through coordinate transformation to obtain the laser tracker measurement coordinate system.

[0028] According to the specific embodiments provided by the present invention, the present invention discloses the following technical effects:

[0029] The present invention provides an optical path adjustment monitoring system and method, which organically combines the optical path adjustment system with the monitoring system. By adjusting the monitoring light source, a first CCD camera, and a second CCD camera, the optical path pointing accuracy can be ensured. When the optical path pointing changes, the first CCD camera and the second CCD camera can provide an early warning. By adjusting the monitoring light source and the Hartmann sensor, the wavefront of the reflector can be measured in real time, thereby ensuring the quality of the light beam. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0031] Figure 1This is a structural diagram of the optical path adjustment monitoring system provided in Example 1 of the present invention. DETAILED DESCRIPTION

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0033] The purpose of the present invention is to provide an optical path adjustment monitoring system and method, which can ensure the accurate pointing of the optical path through the mutual cooperation of the adjustment monitoring light source and a CCD camera (charge-coupled device), and ensure the beam quality through the mutual cooperation of the adjustment monitoring light source and a Hartmann sensor.

[0034] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the present invention is further described in detail below with reference to the accompanying drawings and specific embodiments.

[0035] Example 1

[0036] like Figure 1 As shown, the optical path adjustment monitoring system provided by the present invention includes: a first reflector 1, a second reflector 2, a third reflector 3, a fourth reflector 4, a reflector group 5, a first CCD camera 6, a second CCD camera 7, an adjustment monitoring light source 8 and a Hartmann sensor 9.

[0037] The first reflector 1 is arranged on the emission light path of the high-energy light source 14, the second reflector 2 is arranged on the reflection light path of the first reflector 1, the reflector group 5 is arranged on the reflection light path of the second reflector 2, the third reflector 3 is arranged on the reflection light path of the reflector group 5, and the fourth reflector 4 is arranged on the reflection light path of the third reflector 3.

[0038] The first CCD camera 6 is arranged on the transmission light path of the second reflecting mirror 2 , and the second CCD camera 7 is arranged on the transmission light path of the third reflecting mirror 3 .

[0039] The adjustment monitoring light source 8 is arranged on the reverse extension line of the transmission light path of the second reflector 2. The adjustment monitoring light source 8, the first CCD camera 6 and the second CCD camera 7 cooperate with each other to adjust the light path direction of the high-energy light source 14.

[0040] The Hartmann sensor 9 is disposed on the transmission light path of the fourth reflector 4. The Hartmann sensor 9 is used to measure the wavefronts of the first reflector 1, the second reflector 2, the third reflector 3, the fourth reflector 4 and the reflector group 5 in real time.

[0041] Furthermore, the mirror surface of each reflector in the present invention is in a low-stress state, and a flexible rubber strip is used to support the mirror surface, and a sealant is added for bonding to achieve a flexible low-stress state.

[0042] Furthermore, the transmission light path of the second reflector 2 is parallel to the reflection light path of the first reflector 1 ; the transmission light path of the third reflector 3 is parallel to the reflection light path of the reflector group 5 ; the transmission light path of the fourth reflector 4 is parallel to the reflection light path of the third reflector 3 .

[0043] Furthermore, the reflector group 5 includes a fifth reflector 10 , a sixth reflector 11 , a seventh reflector 12 and an eighth reflector 13 . The reflective light path of the eighth reflector 13 is the reflective light path of the reflector group 5 .

[0044] The fifth reflector 10 is arranged on the reflection light path of the second reflector 2 , the sixth reflector 11 is arranged on the reflection light path of the fifth reflector 10 , the seventh reflector 12 is arranged on the reflection light path of the sixth reflector 11 , and the eighth reflector 13 is arranged on the reflection light path of the seventh reflector 12 .

[0045] The light-facing surfaces of the first reflector 1, the second reflector 2, the seventh reflector 12 and the eighth reflector 13 are parallel and have an angle of 45° with the incident light path; the light-facing surfaces of the third reflector 3, the fourth reflector 4, the fifth reflector 10 and the sixth reflector 11 are parallel and have an angle of 45° with the outgoing light path.

[0046] Furthermore, the laser wavelength of the high-energy light source 14 is 1064 nm, and the laser wavelength of the adjustment and monitoring light source is 533 nm. The surface coatings of the first reflector 1, the second reflector 2, the third reflector 3, the fourth reflector 4, and the reflector group 5 have a reflectivity of 99.9% for the laser wavelength of the high-energy light source 14. The surface coatings of the first reflector 1 and the reflector group 5 have a reflectivity of 50% for the laser wavelength of the adjustment and monitoring light source.

[0047] Example 2

[0048] With respect to the optical path adjustment monitoring system provided in the first embodiment, this embodiment provides an optical path adjustment monitoring method.

[0049] The method comprises:

[0050] Step 101 : Preliminarily fix the positions of the first reflector 1 , the second reflector 2 , the third reflector 3 , the fourth reflector 4 , the fifth reflector 10 , the sixth reflector 11 , the seventh reflector 12 and the eighth reflector 13 .

[0051] Step 102 : Establishing a laser tracker measurement coordinate system using the first reflector 1 .

[0052] Step 103 : Adjust the posture and position of the first CCD camera 6 and the second CCD camera 7 according to the laser tracker measurement coordinate system so that the center positions of the first CCD camera 6 and the second CCD camera 7 coincide with the theoretical output position of the high-energy light source 1414 .

[0053] Step 104: After the monitoring light source 8 is preliminarily installed, the first CCD camera 6 is turned on and the position of the monitoring light source 8 is adjusted so that the laser light emitted by the monitoring light source 8 is incident on the center of the first CCD camera 6. At this point, the monitoring light source 8 is in place and is a weak laser.

[0054] Step 105: Keep the initial positions of the first reflector 1, the third reflector 3 and the fourth reflector 4 unchanged, adjust the yaw and pitch angles of the second reflector 2, the fifth reflector 10, the sixth reflector 11, the seventh reflector 12 and the eighth reflector 13, so that the laser emitted by the adjustment monitoring light source 8 can be incident on the center position of the second CCD camera 7, and the adjustment of the reflectors is completed.

[0055] Step 106 : placing a Hartmann sensor 9 on the transmission light path of the fourth reflector 4 ; the Hartmann sensor 9 is used to measure the wavefront of the reflector in real time.

[0056] Furthermore, step 102 specifically includes:

[0057] Step 1021: The shape of the reflector is a cuboid. An initial coordinate system is established with a vertex of the first reflector 1 as the coordinate origin and three edges connected to the coordinate origin.

[0058] Step 1022: The initial coordinate system is matched to the overall optical path and structural design through coordinate transformation to obtain a laser tracker measurement coordinate system.

[0059] The optical path adjustment monitoring system and method provided by the present invention adopts an integrated adjustment and monitoring method to ensure long-term stable operation. During the use of a high-energy laser source to emit laser light, the adjustment monitoring light source is still enabled for adjustment, and the first CCD camera and the second CCD camera are also in an on state, playing the role of monitoring the overall optical path direction; at the same time, the laser emitted by the adjustment monitoring light source passes through the reflector and reaches the Hartmann sensor, and the Hartmann wavefront sensor is turned on to measure the wavefront of the reflector in real time, playing the role of monitoring the overall beam quality.

[0060] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0061] This document uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only intended to help understand the system and method of the present invention and its core concept. At the same time, those skilled in the art will find that the specific implementation methods and application scopes may vary based on the concept of the present invention. In summary, the contents of this specification should not be construed as limiting the present invention.

Claims

1. An optical path adjustment monitoring system, characterized in that: include: a first reflector, a second reflector, a third reflector, a fourth reflector, a reflector group, a first CCD camera, a second CCD camera, an adjustment monitoring light source, and a Hartmann sensor; The first reflector is arranged on the emission light path of the high-energy light source, the second reflector is arranged on the reflection light path of the first reflector, the reflector group is arranged on the reflection light path of the second reflector, the third reflector is arranged on the reflection light path of the reflector group, and the fourth reflector is arranged on the reflection light path of the third reflector; The transmission light path of the second reflector is parallel to the reflection light path of the first reflector; the transmission light path of the third reflector is parallel to the reflection light path of the reflector group; The transmission light path of the fourth reflector is parallel to the reflection light path of the third reflector; The reflector group includes: a fifth reflector, a sixth reflector, a seventh reflector and an eighth reflector; the reflective light path of the eighth reflector is the reflective light path of the reflector group; The fifth reflecting mirror is arranged on the reflecting light path of the second reflecting mirror, the sixth reflecting mirror is arranged on the reflecting light path of the fifth reflecting mirror, the seventh reflecting mirror is arranged on the reflecting light path of the sixth reflecting mirror, and the eighth reflecting mirror is arranged on the reflecting light path of the seventh reflecting mirror; The light-facing surfaces of the first reflector, the second reflector, the seventh reflector, and the eighth reflector are parallel and have an angle of 45° with the incident light path; the light-facing surfaces of the third reflector, the fourth reflector, the fifth reflector, and the sixth reflector are parallel and have an angle of 45° with the outgoing light path; The first CCD camera is arranged on the transmission light path of the second reflector, and the second CCD camera is arranged on the transmission light path of the third reflector; The adjustment monitoring light source is arranged on the reverse extension line of the transmission light path of the second reflector; the adjustment monitoring light source, the first CCD camera and the second CCD camera cooperate with each other to adjust the light path direction of the high-energy light source; The Hartmann sensor is arranged on the transmission light path of the fourth reflector; the Hartmann sensor is used to measure the wavefront of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group in real time.

2. The optical path adjustment monitoring system according to claim 1, characterized in that: The laser wavelength of the high-energy light source is 1064 nm, and the laser wavelength of the adjustment monitoring light source is 533 nm.

3. The optical path adjustment monitoring system according to claim 2, characterized in that: The reflectivity of the surface film layers of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group for the laser wavelength of the high-energy light source is 99.9%.

4. The optical path adjustment monitoring system according to claim 2, characterized in that: The reflectivity of the surface film layers of the first reflector and the reflector group is 50% for the laser wavelength of the adjustment monitoring light source.

5. The optical path adjustment monitoring system according to claim 1, characterized in that: The mirror surfaces of the first reflector, the second reflector, the third reflector, the fourth reflector and the reflector group are in a low stress state, and flexible rubber strips are used to support the mirror surfaces.

6. A method for monitoring optical path adjustment, characterized in that: The method is applied to the optical path adjustment monitoring system according to any one of claims 1 to 5, and the method comprises: Preliminarily fixing the positions of the first reflector, the second reflector, the third reflector, the fourth reflector, the fifth reflector, the sixth reflector, the seventh reflector, and the eighth reflector; establishing a laser tracker measurement coordinate system using the first reflector; Adjusting the posture and position of the first CCD camera and the second CCD camera according to the laser tracker measurement coordinate system so that the center positions of the first CCD camera and the second CCD camera coincide with the theoretical output position of the high-energy light source; Adjusting the position of the installation and adjustment monitoring light source so that the laser light emitted by the installation and adjustment monitoring light source is incident on the center position of the first CCD camera; Maintaining the initial positions of the first reflector, the third reflector, and the fourth reflector, and adjusting the yaw and pitch angles of the second reflector, the fifth reflector, the sixth reflector, the seventh reflector, and the eighth reflector so that the laser light emitted by the adjustment monitoring light source can be incident on the center position of the second CCD camera; A Hartmann sensor is arranged on the transmission light path of the fourth reflector; the Hartmann sensor is used to measure the wavefront of the reflector in real time.

7. The optical path adjustment monitoring method according to claim 6, characterized in that: The step of establishing a laser tracker measurement coordinate system using the first reflector specifically includes: Taking a vertex of the first reflector as a coordinate origin, and establishing an initial coordinate system with three edges connected to the coordinate origin; The initial coordinate system is matched with the overall optical path and structural design through coordinate transformation to obtain the laser tracker measurement coordinate system.

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