A composition for purifying aldehydes and removing odors and its preparation method

Abstract

The present invention discloses a composition for purifying aldehydes and removing odors, which comprises a variety of functional components and modified nano-silicon wafers; wherein, the modified nano-silicon wafers are nano-silicon wafers grafted with long alkyl chains, so that the compatibility with chitosan, a polymer carbohydrate, and inorganic substances such as nano-silicon wafers can be increased simultaneously, and the interaction between components can be increased. Together with the surfactant, it further plays the effect of dispersing small solid particles, thereby preventing undesirable behaviors such as caking and sedimentation of functional substances after the composition is stored for a long time, and extending the service life and efficacy of the composition.

Description

Technical Field

[0001] The present invention belongs to the field of environmental protection technologies and relates to a composition for removing formaldehyde and odor and a preparation method thereof. Background Art

[0002] Formaldehyde is a colorless and pungent gas that is highly dangerous to the human body. It can be inhaled by the human body through the respiratory tract and cause a series of discomfort reactions and potential diseases in the human body, such as respiratory, bone marrow, and blood diseases or cancer. Clinical experiments have shown that formaldehyde can cause lesions in multiple organs of species and result in malignant diseases such as tumors. Therefore, removing the residual formaldehyde gas in indoor furniture and walls is a matter of great concern to manufacturers and consumers.

[0003] However, as a basic industrial raw material, formaldehyde has a very wide range of application fields and is directly used in fields such as disinfection, synthesis, coatings, rubber, adhesives, pesticides, etc. Therefore, it is inevitably left on related products and objects of action, such as the surfaces or interiors of leather, furniture, carpets, coatings, etc. Among many products for removing formaldehyde, using substances with high-efficiency formaldehyde adsorption as the main body or embedding them as functional parts into other products (such as boards, films) is a relatively good solution. How to use limited substances to adsorb more formaldehyde molecules as much as possible is the goal that people constantly pursue.

[0004] In the prior art, many patents have disclosed compositions for removing formaldehyde, such as patents CN110327579A, CN113521982A, CN111569951A, CN111248222A, CN110327770A, etc., all of which involve related technical solutions and their effects. However, none of the above patents have studied issues such as the service life and stability of the composition.

[0005] Therefore, the present invention provides a composition for efficiently removing formaldehyde molecules in the room. Summary of the Invention

[0006] The present invention aims to provide a composition for removing formaldehyde and odor. It contains functional components such as chitosan, activated carbon, and silicon wafers, and has a high-efficiency adsorption and treatment effect on formaldehyde. It is worth mentioning that the present invention also chemically modifies some nano-silicon wafers, thereby further improving the service life and shelf life of the composition, and can still retain excellent formaldehyde removal function for a long time.

[0007] One object of the present invention is to disclose a composition for removing formaldehyde and odor, which comprises the following components by mass fraction:

[0008] Anionic surfactant 1 - 2 parts

[0009] Activated carbon 4 - 6 parts

[0010] 10 - 15 parts of organic solvent

[0011] 4 - 8 parts of modified nano - silicon wafers

[0012] 4 - 8 parts of nano - silicon wafers

[0013] 3 - 5 parts of chitosan

[0014] 0.1 - 1 part of defoamer

[0015] 0.1 - 1 part of thickener

[0016] Fragrance

[0017] Water;

[0018] Among them, the modified nano - silicon wafers are the products after coupling nano - silicon wafers with lauric acid.

[0019] Further, the anionic surfactant is selected from one or more of LAS, MES, AES, and AOS.

[0020] Further, the organic solvent is alcohol, and the alcohol is selected from one or more of ethanol, propanol, butanol, hexanol, and glycerol.

[0021] Further, the particle size of the nano - silicon wafers is 200 - 2000 nm.

[0022] Further, the defoamer is selected from one or more of silicone defoamers and polyether - type defoamers.

[0023] Another object of the present invention is to disclose a preparation method of the above - mentioned formaldehyde - removing and odor - removing composition, which comprises the following steps:

[0024] S1. Preparation of modified nano - silicon wafers: Blend hydroxylated nano - silicon wafers with lauric acid, perform ultrasonic treatment and heating reaction, then centrifuge, wash, and dry to obtain the product;

[0025] S2. Blend the modified nano - silicon wafers with other components to obtain the formaldehyde - removing and odor - removing composition.

[0026] Further, the mass ratio of the hydroxylated nano - silicon wafers to the lauric acid is 1:10 - 50.

[0027] Further, the heating temperature is 80 - 90 °C.

[0028] Compared with the prior art, the formaldehyde - removing and odor - removing composition provided by the present invention has the following beneficial effects:

[0029] The formaldehyde-removing and odor-removing composition of the present invention contains a variety of functional substances, such as nano-silicon wafers, chitosan, activated carbon, etc., which have a high efficiency in removing formaldehyde and odors. In particular, the composition itself also contains partially modified nano-silicon wafers, which are nano-silicon wafers grafted with long alkyl chains, so as to increase the compatibility with high-polymer sugars such as chitosan and inorganic substances such as nano-silicon wafers at the same time, and increase the interaction force between components. Together with the surfactant, it further plays the effect of dispersing solid small particles, thus preventing the occurrence of undesirable behaviors such as caking and sedimentation of functional substances after the composition is placed for a long time, and prolonging the service life and efficacy of the composition. Embodiment

[0030] To more clearly illustrate the technical solution of the present invention, the following examples are given, but the present invention is not limited thereto.

[0031] Unless otherwise specified, the experimental methods used in the following examples are all conventional methods; the reagents, materials, etc. used in the following examples can be obtained from commercial channels unless otherwise specified.

[0032] The activated carbon in the examples of the present invention has a particle size of 400 mesh;

[0033] The nano-silicon wafers in the examples of the present invention are purchased from Fuliou Biotechnology Co., Ltd. and have a particle size of 1000 nm.

[0034] The chitosan in the examples of the present invention is purchased from Shaanxi Lvlaibio Technology Co., Ltd.

[0035] The defoamer in the examples of the present invention is F-523.

[0036] The essence in the examples of the present invention is a water-soluble lemon fragrance essence.

[0037] The water used in the examples of the present invention is deionized water.

[0038] The preparation method of the modified nano-silicon wafers in the examples of the present invention includes the following steps:

[0039] S0. Immerse the nano-silicon wafers in a mixed solution of concentrated sulfuric acid and hydrogen peroxide (1:1, v / v), heat at 90 °C for 30 min, then heat in 1 M NaOH at 90 °C for 30 min, wash and dry to obtain hydroxylated nano-silicon wafers. Example

[0040] A formaldehyde-removing and odor-removing composition, which comprises the following components in parts by mass:

[0041] Anionic surfactant AES 1 part

[0042] Activated carbon 4 parts

[0043] 10 parts of glycerol

[0044] 4 parts of modified nano-silicon wafers

[0045] 4 parts of nano-silicon wafers

[0046] 3 parts of chitosan

[0047] 0.1 part of defoamer

[0048] 0.1 part of carboxymethyl cellulose

[0049] 0.1 part of essence

[0050] 100 parts of water.

[0051] S1. Immerse the hydroxylated nano-silicon wafers in lauric acid, ultrasonicate for 30 min, react at 80 °C for 1 h, centrifuge and wash, then dry at room temperature to obtain modified nano-silicon wafers;

[0052] S2. According to the above mass parts, mix the modified nano-silicon wafers and other components by heating (at 50 °C) to obtain the product. Example

[0053] A composition for removing formaldehyde and odor, which comprises components in the following mass parts:

[0054] 2 parts of anionic surfactant AOS

[0055] 6 parts of activated carbon

[0056] 15 parts of glycerol

[0057] 8 parts of modified nano-silicon wafers

[0058] 8 parts of nano-silicon wafers

[0059] 5 parts of chitosan

[0060] 0.2 part of defoamer

[0061] 0.1 part of carboxymethyl cellulose

[0062] 0.1 part of essence

[0063] 130 parts of water.

[0064] S1. Immerse the hydroxylated nano-silicon wafers in lauric acid, ultrasonicate for 40 min, react at 80 °C for 1.5 h, centrifuge and wash, then dry at room temperature to obtain modified nano-silicon wafers;

[0065] S2. According to the above mass parts, mix the modified nano-silicon wafers and other components by heating (at 50 °C) to obtain the product. Example

[0066] A composition for removing formaldehyde and odor, which comprises components in the following parts by mass:

[0067] Anionic surfactant AOS: 1 part

[0068] Activated carbon: 5 parts

[0069] Glycerol: 12 parts

[0070] Modified nano-silicon wafers: 6 parts

[0071] Nano-silicon wafers: 6 parts

[0072] Chitosan: 4 parts

[0073] Defoamer: 0.2 part

[0074] Carboxymethyl cellulose: 0.1 part

[0075] Fragrance: 0.1 part

[0076] Water: 120 parts

[0077] S1. Immerse the hydroxylated nano-silicon wafers in lauric acid, react for 1.5 h at 85 °C after ultrasonic treatment for 40 min, centrifuge, wash, and then dry at room temperature to obtain modified nano-silicon wafers;

[0078] S2. Mix the modified nano-silicon wafers and other components by heating (at 50 °C) according to the above parts by mass to obtain the product. Example

[0079] A composition for removing formaldehyde and odor, which comprises components in the following parts by mass:

[0080] Anionic surfactant MES: 1.5 parts

[0081] Activated carbon: 5.5 parts

[0082] Glycerol: 13 parts

[0083] Modified nano-silicon wafers: 7 parts

[0084] Nano-silicon wafers: 6 parts

[0085] Chitosan: 4 parts

[0086] Defoamer: 0.2 part

[0087] Carboxymethyl cellulose: 0.1 part

[0088] Fragrance: 0.1 part

[0089] Water: 110 parts

[0090] S1. Immerse the hydroxylated nano-silicon wafers in lauric acid, sonicate for 40 min, react at 82 °C for 2 h, centrifuge, wash, and then dry at room temperature to obtain modified nano-silicon wafers;

[0091] S2. According to the above mass fractions, mix the modified nano-silicon wafers and other components by heating (at 50 °C) to obtain the product. Example

[0092] A composition for removing formaldehyde and odor, which comprises components in the following mass fractions:

[0093] Anionic surfactant MES 2 parts

[0094] Activated carbon 4.5 parts

[0095] Glycerol 13 parts

[0096] Modified nano-silicon wafers 7 parts

[0097] Nano-silicon wafers 7 parts

[0098] Chitosan 4 parts

[0099] Defoamer 0.2 part

[0100] Carboxymethyl cellulose 0.1 part

[0101] Fragrance 0.2 part

[0102] Water 130 parts.

[0103] S1. Immerse the hydroxylated nano-silicon wafers in lauric acid, sonicate for 30 min, react at 82 °C for 2.5 h, centrifuge, wash, and then dry at room temperature to obtain modified nano-silicon wafers;

[0104] S2. According to the above mass fractions, mix the modified nano-silicon wafers and other components by heating (at 50 °C) to obtain the product.

[0105] Comparative Example 1

[0106] Comparative Example 1 is the same as Example 1 of the present invention in terms of the components used, the mass fractions of the components, and the preparation method. The only difference is that in Comparative Example 1, the modified nano-silicon wafers are replaced with nano-silicon wafers of equal mass fractions.

[0107] Comparative Example 2

[0108] Comparative Example 1 is the same as Example 1 of the present invention in terms of the components used, the mass fractions of the components, and the preparation method. The only difference is that in Comparative Example 2, the glycerol is replaced with deionized water of equal mass.

[0109] Test Example

[0110] Performance tests were conducted on the newly prepared formaldehyde-removing and odor-removing compositions prepared in Example 1 and Comparative Examples 1-2. Then, the above samples were placed in an environment at 50 °C for 24 h, and then taken out and placed in an environment at 0 °C for 24 h. This was repeated 3 times (freeze-thaw cycle), and the same performance tests were carried out again.

[0111] Test method:

[0112] According to the high performance liquid chromatography determination method for low-concentration formaldehyde in air, the formaldehyde removal performance test was carried out.

[0113] The test results are shown in Table 1.

[0114] Table 1 Performance test results of Example 1 and Comparative Examples 1-2

[0115] Sample Formaldehyde removal rate after 3 h (%) Formaldehyde removal rate after 24 h (%) Formaldehyde removal rate after 3 h after freeze-thaw cycles (%) Formaldehyde removal rate after 24 h after freeze-thaw cycles (%) Example 1 60.7 93.1 57.4 91.0 Comparative Example 1 58.2 91.8 52.3 85.9 Comparative Example 2 55.6 90.6 48.1 83.6

[0116] It can be concluded from Table 1 that for the formaldehyde-removing and odor-removing composition prepared in Example 1 of the present invention, the newly prepared sample has slightly better formaldehyde removal effect than Comparative Examples 1-2; however, after the freeze-thaw cycle, the tolerance and stability of the composition of the present invention under extreme climates are much better than those of Comparative Examples 1-2. This may be because the compatibility between the solid and liquid components of the present invention has been greatly improved. Compared with the newly prepared sample, the decline trend of its removal rate is not obvious; while for the samples of Comparative Examples 1-2, after the freeze-thaw cycle, the performance has a relatively obvious decline trend.

[0117] For those skilled in the art, it is obvious that the present invention is not limited to the details of the above exemplary embodiments, and the present invention can be implemented in other specific forms without departing from the spirit or basic characteristics of the present invention. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting. The scope of the present invention is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be encompassed within the present invention.

[0118] In addition, it should be understood that although this specification is described according to embodiments, not every embodiment only contains an independent technical solution. This narrative way of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A composition for purifying aldehydes and removing odors, characterized in that, The composition for purifying aldehydes and removing odors comprises components in the following parts by mass: Anionic surfactant AES: 1 part Activated carbon: 4 parts Glycerol: 10 parts Modified nano-silicon wafers: 4 parts Nano-silicon wafers: 4 parts Chitosan: 3 parts Defoamer: 0.1 part Carboxymethyl cellulose: 0.1 part Fragrance: 0.1 part Water: 100 parts; Or Anionic surfactant AOS: 2 parts Activated carbon: 6 parts Glycerol: 15 parts Modified nano-silicon wafers: 8 parts Nano-silicon wafers: 8 parts Chitosan: 5 parts Defoamer: 0.2 part Carboxymethyl cellulose: 0.1 part Fragrance: 0.1 part Water: 130 parts; Or Anionic surfactant AOS: 1 part Activated carbon: 5 parts Glycerol: 12 parts Modified nano-silicon wafers: 6 parts Nano-silicon wafers: 6 parts Chitosan: 4 parts Defoamer: 0.2 part Carboxymethyl cellulose: 0.1 part Fragrance: 0.1 part Water: 120 parts; Among them, the modified nano-silicon wafers are the product after coupling hydroxyl nano-silicon wafers with lauric acid.

2. The composition for purifying aldehydes and removing odors according to claim 1, wherein The particle size of the nano-silicon wafers is 200 - 2000 nm.

3. The composition for purifying aldehydes and removing odors according to claim 1, wherein, The defoamer is selected from one or more of silicone defoamers and polyether defoamers.

4. The preparation method of the composition for purifying aldehydes and removing odors according to any one of claims 1-3, characterized in that, The preparation method of the composition for purifying aldehydes and removing odors comprises the following steps: S1. Preparation of modified nano-silicon wafers: Mix hydroxyl nano-silicon wafers with lauric acid, perform ultrasonic treatment and heat reaction, then centrifuge, wash, and dry to obtain the product; S2. Mix the modified nano-silicon wafers with other components to obtain the composition for purifying aldehydes and removing odors.

5. The preparation method of the composition for purifying aldehydes and removing odors according to claim 4, wherein The mass ratio of the hydroxyl nano-silicon wafers to the lauric acid is 1:10 - 50.

6. The preparation method of the formaldehyde-removing and odor-removing composition according to claim 4, characterized in that, The heating temperature is 80 - 90 °C.