A gas tube integrated type hole-shaped crucible for electron beam evaporation

Abstract

The present application relates to electron beam evaporation coating equipment technical field, especially disclose a kind of gas pipe integrated hole-shaped crucible for electron beam evaporation, including crucible, reaction chamber is equipped in crucible, the outside of reaction chamber is annularly provided with first through-hole around its axis, the bottom of the crucible is provided with uniform gas cover plate, compared with conventional technology, the technical scheme is by setting annular distribution first through-hole in the four around each reaction chamber, and the mode that uniform gas cover plate and shunt device are attached connection, realizes that the reaction gas in first chamber and the inert gas of second chamber can be evenly passed into reaction chamber, ensures that reaction chamber temperature is uniform and material oxidation is sufficient, and reduce the pollution of external air to material when equipment breaks empty.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of electron beam evaporation coating equipment, and particularly relates to a gas pipe integrated hole-shaped crucible for electron beam evaporation. BACKGROUND

[0002] At present, in the field of optical coating, electron beam evaporation is a very important evaporation method. The equipment container for electron beam evaporation is mostly a crucible with a hole-shaped reaction chamber and a ring-shaped crucible. In order to generate target oxides, a gas pipe is usually arranged around the crucible to introduce reaction gas into the reaction chamber to react with the material in the reaction chamber. However, the gas pipe is generally used for single-sided aeration, and the single-sided aeration may cause uneven aeration, resulting in uneven temperature in the reaction chamber and insufficient oxidation of the material.

[0003] In addition, when the equipment is opened, that is, when the equipment is broken, the material in the reaction chamber will be polluted by moisture and impurities in the external air. The processing method is to first pass inert gas through the gas pipe, then open the equipment, and use the diffusion of the inert gas to form an isolation protection layer to isolate the reaction chamber from the outside world. However, this measure has too many uncontrollable factors. The gas pipe is used for single-sided aeration, and this aeration method cannot ensure that the inert gas uniformly fills around the crucible, so the isolation effect of the isolation protection layer is poor. In most cases, the working experimenters still mainly shorten the opening time of the equipment and control the opening size of the equipment in this way to reduce the pollution of external factors to the material.

[0004] Therefore, it is necessary to provide a gas pipe integrated hole-shaped crucible for electron beam evaporation to ensure uniform temperature in the reaction chamber, sufficient oxidation of the material, and reduce the pollution of external air to the material when the equipment is broken. SUMMARY

[0005] The present application aims to solve the problems of uneven temperature in the reaction chamber, insufficient oxidation of the material, and easy pollution of the internal material by external air when the equipment is broken in the existing crucible equipment. The present application provides a gas pipe integrated hole-shaped crucible for electron beam evaporation.

[0006] The technical scheme of the present application is:

[0007] The application discloses an integrated hole-shaped crucible for electron beam evaporation, which comprises a crucible, a reaction chamber arranged in the crucible, a first through hole arranged annularly on the outer side of the reaction chamber around the axis of the reaction chamber, a uniform gas cover plate arranged at the bottom of the crucible, a second through hole corresponding to the position of the first through hole arranged on the uniform gas cover plate, the second through hole and the first through hole being communicated through a gas pipe, a shunt device arranged at the bottom of the uniform gas cover plate, the shunt device, the uniform gas cover plate and the crucible being coaxially arranged, the uniform gas cover plate and the crucible being rotatable relative to the shunt device, a first chamber and a second chamber being arranged in the shunt device and being independent of each other, and the uniform gas cover plate being attached to the shunt device so as to make the second through hole communicated with the first chamber and the second chamber.

[0008] Further, the application further comprises a rotating shaft, the rotating shaft is fixedly connected with the bottom of the crucible after penetrating through the shunt device and the uniform gas cover plate, the shunt device is rotatably connected with the rotating shaft, the uniform gas cover plate is fixedly connected with the rotating shaft, and the rotating shaft drives the crucible and the uniform gas cover plate to rotate relative to the shunt device.

[0009] Further, the shunt device comprises a baffle and a bottom plate, the top surface of the bottom plate is inwardly recessed to form a first recess, the baffle is arranged in the first recess, and the top surface and the bottom surface of the baffle are inwardly recessed to form a second recess.

[0010] Further, the third through hole and the fourth through hole are annularly arranged around the shaft hole, the third through hole and the fourth through hole are arranged on the side wall of the second recess, and the third through hole and the fourth through hole are arranged on the outer wall of the second recess.

[0011] The first recess is provided with a counterbore, and the counterbore is provided with a gas supply hole.

[0012] The end of the third through hole extends to both ends along the axis of the third through hole, so that one end of the side wall of the third through hole is attached to the uniform gas cover plate, and the other end is attached to the edge of the counterbore.

[0013] Further, the second recess is provided with a sealing ring on the side wall of the second recess, the third through hole is provided with a sealing ring on the outer wall of the third through hole, and the first shaft hole is provided with a sealing ring on the outer wall of the first shaft hole.

[0014] The first recess is provided with a second shaft hole for accommodating the rotating shaft, the second shaft hole is provided with a sealing ring on the outer wall of the second shaft hole, and the first recess is provided with a sealing ring on the inner wall of the first recess.

[0015] Further, the end of the first shaft hole extends to both ends along the axis of the first shaft hole, so that one end of the end of the first shaft hole is attached to the uniform gas cover plate, and the other end is attached to the bottom plate.

[0016] The end of the second recess, the bottom plate, the uniform gas cover plate, the end of the third through hole and the end of the first shaft hole surround the first chamber.

[0017] The counterbore, the third through hole and the uniform gas cover plate surround the second chamber.

[0018] Further, eight reaction chambers are arranged in the crucible, eight second through holes are arranged annularly around each of the reaction chambers, two second through holes are shared by two adjacent reaction chambers, and a third through hole and three fourth through holes are arranged in the second groove.

[0019] Further, a spring is arranged between the baffle and the bottom plate, one end of the spring is fixedly connected with the baffle, and the other end is fixedly connected with the bottom plate.

[0020] Further, a lifting device is arranged at the bottom of the bottom plate, and the lifting device drives the bottom plate to move axially along the rotating shaft.

[0021] Further, a cooling device is fixedly connected to the bottom of the crucible, the cooling device is located between the crucible and the uniform gas cover plate, a connecting piece is arranged between the cooling device and the uniform gas cover plate, and the connecting piece is fixedly connected with the cooling device and the uniform gas cover plate, respectively.

[0022] The gas pipe integrated hole-shaped crucible for electron beam evaporation, reaction gas is passed through the first chamber, inert gas is passed through the second chamber, the uniform gas cover plate is attached to the shunt device, so that the second through hole can be communicated with the first chamber and the second chamber, since the second through hole and the first through hole are one-to-one corresponding and communicated, therefore the first through hole can be communicated with the first chamber and the second chamber, by rotating the uniform gas cover plate and the crucible relative to the shunt device, it can be controlled that the first through hole outside the single reaction chamber is communicated with the first chamber or the second chamber, since there are multiple reaction chambers on the crucible, there is a set of annular first through holes outside each reaction chamber, and each first through hole is communicated with a second through hole, and the second through hole is communicated with the first chamber and the second chamber, therefore when the reaction chamber needs to pass inert gas, rotate the uniform gas cover plate and the crucible, so that the corresponding second through hole is communicated with the second chamber, and the first through hole outside the remaining reaction chambers is communicated with the first chamber and passes reaction gas, since the first through hole is annularly distributed around the reaction chamber, even if the bottom first chamber and the second chamber belong to one-side aeration, but the gas finally input into the reaction chamber is shunted through multiple first through holes around the reaction chamber, and the uniform input of the reaction gas in the reaction chamber is realized, and the inert gas is also input into the first through hole through the second through hole, and then enters the reaction chamber from the outside of the reaction chamber in the form of an annular, and the uniform input of the inert gas is realized, and a relatively uniform inert gas isolation protection layer is formed, compared with the traditional technology, by arranging the annularly distributed first through holes around each reaction chamber and attaching the uniform gas cover plate and the shunt device in a connected mode, the reaction gas in the first chamber and the inert gas in the second chamber can be uniformly input into the reaction chamber, the temperature uniformity in the reaction chamber is ensured, the material oxidation is sufficient, and the pollution of external air to the material during the equipment breaking is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 A sectional view of the present application;

[0024] Figure 2 A structure diagram of the crucible of the present application;

[0025] Figure 3 A structure diagram of the gas distribution cover plate of the present application;

[0026] Figure 4 A structure diagram of the baffle of the present application;

[0027] Figure 5 A structure diagram of the base plate of the present application;

[0028] Figure 6 A structure diagram of the present application Figure 1 A partial enlarged view at A in the present application;

[0029] Figure 7 A partial enlarged view at B in the present application Figure 1

[0030] Reference signs: 1, crucible; 2, reaction chamber; 3, first through hole; 4, gas distribution cover plate; 5, second through hole; 6, flow distribution device; 7, first cavity; 8, second cavity; 9, rotating shaft; 10, baffle; 11, base plate; 12, first groove; 13, second groove; 14, third through hole; 15, fourth through hole; 16, first shaft hole; 17, counterbore; 18, gas supply hole; 19, sealing ring; 20, second shaft hole; 21, lifting device; 22, cooling device; 23, connecting piece; 24, first gas pipe; 25, second gas pipe. DETAILED DESCRIPTION

[0031] In order to make the technical means, technical features, invention purposes and technical effects of the present application easy to understand, the present application is further described below in combination with specific drawings.

[0032] Example 1:

[0033] As shown in Figure 1 and Figure 2 , a gas pipe integrated type hole-shaped crucible for electron beam evaporation includes a crucible 1, a reaction chamber 2 is arranged in the crucible 1, a first through hole 3 is annularly arranged on the outer side of the reaction chamber 2 around its axis, as shown in Figure 1 and Figure 3 , a gas distribution cover plate 4 is arranged at the bottom of the crucible 1, a second through hole 5 corresponding to the position of the first through hole 3 is arranged on the gas distribution cover plate 4, the second through hole 5 and the first through hole 3 are communicated through a gas pipe, a flow distribution device 6 is arranged at the bottom of the gas distribution cover plate 4, the flow distribution device 6, the gas distribution cover plate 4 and the crucible 1 are coaxially installed, and the gas distribution cover plate 4 and the crucible 1 can rotate relative to the flow distribution device 6, as shown in Figure 6 and Figure 7 ​As shown, the shunt device 6 is provided with a first chamber 7 and a second chamber 8 which are independent of each other, and the uniform gas cover plate 4 is attached to the shunt device 6 so that the second through hole 5 is in communication with the first chamber 7 and the second chamber 8.

[0034] Preferably, a rotating shaft 9 is further included, which penetrates the shunt device 6 and the uniform gas cover plate 4 and is screw-connected to the bottom of the crucible 1, the shunt device 6 is rotatably connected to the rotating shaft 9 through a bearing, the uniform gas cover plate 4 is screw-connected to the rotating shaft 9, the rotating shaft 9 drives the crucible 1 and the uniform gas cover plate 4 to rotate relative to the shunt device 6, and the rotating shaft 9 is driven to rotate by a motor.

[0035] As shown in Figure 4 and Figure 5 Preferably, the shunt device 6 includes a baffle 10 and a bottom plate 11, the top surface of the bottom plate 11 is inwardly recessed to form a first recess 12, the baffle 10 is located in the first recess 12, the top surface and the bottom surface of the baffle 10 are both inwardly recessed to form a second recess 13, and the baffle 10 and the bottom plate 11 are both circular.

[0036] Preferably, the second recess 13 is provided with a third through hole 14 and a fourth through hole 15, the second recess 13 is provided with a first shaft hole 16 at the axis thereof for accommodating the rotating shaft 9, the third through hole 14 and the fourth through hole 15 are both annularly arranged around the shaft hole, the diameter of the third through hole 14 is larger than that of the fourth through hole 15, the first recess 12 is provided with a counterbore 17, the counterbore 17 is provided with a gas supply hole 18, the end of the third through hole 14 extends along the axis thereof to both ends, thereby making one end of the side wall of the third through hole 14 abut against the uniform gas cover plate 4 and the other end abut against the edge of the counterbore 17, the first through hole 3, the second through hole 5, the third through hole 14 and the fourth through hole 15 are circular, and the counterbore 17 and the gas supply hole 18 are both circular.

[0037] Preferably, a sealing ring 19 is mounted on the side wall of the second recess 13, a sealing ring 19 is mounted on the outer wall of the third through hole 14, a sealing ring 19 is mounted on the outer wall of the first shaft hole 16, the first recess 12 is provided with a second shaft hole 20 for accommodating the rotating shaft 9, a sealing ring 19 is mounted on the outer wall of the second shaft hole 20, and a sealing ring 19 is mounted on the inner wall of the first recess 12, which can be used to prevent the first chamber 7 and the second chamber 8 from leaking and improve the air tightness.

[0038] Preferably, the end of the first shaft hole 16 extends along the axis thereof to both ends, making one end of the end of the first shaft hole 16 abut against the uniform gas cover plate 4 and the other end abut against the bottom plate 11, the second recess 13, the bottom plate 11, the uniform gas cover plate 4, the end of the third through hole 14 and the end of the first shaft hole 16 enclose the first chamber 7, and the counterbore 17, the third through hole 14 and the uniform gas cover plate 4 enclose the second chamber 8.

[0039] Preferably, the crucible 1 is provided with eight reaction chambers 2, and eight second through holes 5 are annularly arranged around each of the reaction chambers 2, and two second through holes 5 are shared by two adjacent reaction chambers 2, and a third through hole 14 and three fourth through holes 15 are arranged in the second groove 13.

[0040] Preferably, the bottom of the bottom plate 11 is provided with a lifting device 21, the lifting device 21 drives the bottom plate 11 to move axially along the rotating shaft 9, a spring is arranged between the baffle 10 and the bottom plate 11, one end of the spring is fixedly connected with the baffle 10, and the other end of the spring is fixedly connected with the bottom plate 11, and the spring can ensure that the baffle 10 and the bottom plate 11 can be separated by bouncing when the lifting device 21 is lowered.

[0041] Preferably, the bottom of the crucible 1 is fixedly connected with a cooling device 22, the cooling device 22 is located between the crucible 1 and the air distribution cover plate 4, a connecting piece 23 is arranged between the cooling device 22 and the air distribution cover plate 4, the connecting piece 23 is screw-connected with the cooling device 22 and the air distribution cover plate 4 respectively, and the connecting piece 23 can ensure that the cooling device 22, the crucible 1 and the air distribution cover plate 4 rotate synchronously, and preferably, the cooling device 22 is water-cooled.

[0042] Preferably, the first chamber 7 is communicated with a first gas conveying pipe 24 at the bottom, and the second chamber 8 is communicated with a second gas conveying pipe 25 at the bottom.

[0043] In use, the eight reaction chambers 2 are each filled with reaction material, and initially each reaction chamber 2 is closed, the lifting device 21 at the bottom lifts the base plate 11 and the baffle 10 to be in close contact with the uniform gas cover plate 4, forming the first chamber 7 and the second chamber 8, the first gas inlet pipe 24 and the second gas inlet pipe 25 start to input reaction gas, and then the first through hole 3 around each reaction chamber 2 starts to output reaction gas, since the first through hole 3 is multiple and evenly distributed around each reaction chamber 2, it can ensure that the temperature in the reaction chamber 2 is uniform and the material is fully oxidized, when it is necessary to open the crucible 1, the input of reaction gas in the second gas inlet pipe 25 is stopped, and inert gas is started to be input, and the first gas inlet pipe 24 continues to input reaction gas, so that the first through hole 3 around the reaction chamber 2 to be opened outputs inert gas, forming an isolation protection layer, reducing the pollution of the material by external air when the equipment is broken, while other reaction chambers 2 continue to input reaction gas, when it is necessary to continue to open other reaction chambers 2, the lifting device 21 first drives the base plate 11 and the baffle 10 to descend away from the uniform gas cover plate 4, then the rotating shaft 9 drives the uniform gas cover plate 4 and the crucible 1 to rotate relative to the base plate 11 and the baffle 10, aligning the second chamber 8 and the fourth through hole 15 connected with the second chamber 8 with another group of reaction chambers 2, and then the lifting device drives the base plate 11 and the baffle 10 to rise, so that the baffle 10 is again in close contact with the uniform gas cover plate 4, so that the inert gas can enter the first through hole 3 and finally input into the reaction chamber 2 along the second through hole 5, forming an isolation protection layer, repeating this step can ensure that the unopened reaction chambers 2 can always input reaction gas to react with the material, and the opened reaction chambers 2 can be protected by inert gas, and finally the opening and closing of all reaction chambers 2 on the crucible 1 can be completed in sequence without being affected by the surrounding environment.

[0044] The reaction gas is passed through the first chamber 7, the inert gas is passed through the second chamber 8, the uniform gas cover plate 4 is attached to the shunt device 6, so that the second through hole 5 can be communicated with the first chamber 7 and the second chamber 8, since the second through hole 5 and the first through hole 3 are one-to-one corresponding and communicated, therefore the first through hole 3 can be communicated with the first chamber 7 and the second chamber 8, by rotating the uniform gas cover plate 4 and the crucible 1 relative to the shunt device 6, the first through hole 3 outside the single reaction chamber 2 can be communicated with the first chamber 7 or the second chamber 8, since there are a plurality of reaction chambers 2 on the crucible 1, there is a set of annular first through holes 3 outside each reaction chamber 2, and each first through hole 3 is communicated with a second through hole 5, and the second through hole 5 is communicated with the first chamber 7 and the second chamber 8, therefore when the inert gas needs to be passed through the reaction chamber 2, the corresponding second through hole 5 is communicated with the second chamber 8 by rotating the uniform gas cover plate 4 and the crucible 1, and the first through hole 3 outside the remaining reaction chambers 2 is communicated with the first chamber 7, and the reaction gas is passed through, since the first through hole 3 is annularly distributed around the reaction chamber 2, even if the first chamber 7 and the second chamber 8 are single-sidedly passed through, but the gas finally input into the reaction chamber 2 is shunted through the surrounding plurality of first through holes 3, and the uniform input of the reaction gas in the reaction chamber 2 is realized, and the inert gas is also input into the first through hole 3 through the second through hole 5, and then enters the reaction chamber 2 from the outside of the reaction chamber 2 in an annular manner, and the uniform input of the inert gas is realized, and a relatively uniform inert gas isolation protection layer is formed, the technical scheme sets the annularly distributed first through holes 3 around each reaction chamber 2, and the uniform gas cover plate 4 is attached to the shunt device 6, so that the reaction gas in the first chamber 7 and the inert gas in the second chamber 8 can be uniformly input into the reaction chamber 2, the temperature uniformity in the reaction chamber 2 and the sufficient oxidation of the material are ensured, and the pollution of the material by the external air when the equipment is broken is reduced.

[0045] To sum up, the above-mentioned preferred embodiments of the present application are not intended to limit the scope of the present application. Any equivalent changes and modifications made in accordance with the content of the present application are within the technical scope of the present application.

Claims

1. A cavity crucible with integrated gas tubes for electron beam evaporation, comprising a crucible (1) having multiple reaction chambers (2) inside, characterized in that: Each reaction chamber (2) has a first through hole (3) arranged in a ring around its axis on the outside. The crucible (1) has a gas equalization cover plate (4) at the bottom. The gas equalization cover plate (4) has a second through hole (5) that corresponds to the position of the first through hole (3). The second through hole (5) and the first through hole (3) are connected by a gas pipe. The gas equalization cover plate (4) has a flow divider (6) at the bottom. The flow divider (6), the gas equalization cover plate (4) and the crucible (1) are coaxially installed. The gas equalization cover plate (4) and the crucible (1) can rotate relative to the flow divider (6). The flow divider (6) has a first chamber (7) and a second chamber (8) that are independent of each other. The gas equalization cover plate (4) is attached to the flow divider (6) so that the second through hole (5) is connected to the first chamber (7) and the second chamber (8). The diversion device (6) includes a baffle (10) and a chassis (11). The top surface of the chassis (11) is recessed inward to form a first groove (12). The baffle (10) is located in the first groove (12). The top and bottom surfaces of the baffle (10) are both recessed inward to form a second groove (13). By rotating the gas distribution cover (4) and the crucible (1) relative to the flow distribution device (6), the first through hole (3) on the outside of a single reaction chamber (2) can be controlled to connect with the first chamber (7) or with the second chamber (8).

2. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 1, characterized in that: It also includes a rotating shaft (9), which passes through the diversion device (6) and the gas equalization cover plate (4) and is fixedly connected to the bottom of the crucible (1). The diversion device (6) is rotatably connected to the rotating shaft (9), and the gas equalization cover plate (4) is fixedly connected to the rotating shaft (9). The rotating shaft (9) drives the crucible (1) and the gas equalization cover plate (4) to rotate relative to the diversion device (6).

3. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 1, characterized in that: The second groove (13) is provided with a third through hole (14) and a fourth through hole (15). The second groove (13) is provided with a first shaft hole (16) at its axis to accommodate the rotating shaft (9). The third through hole (14) and the fourth through hole (15) are both arranged in a ring around the shaft hole. A countersunk hole (17) is provided in the first groove (12), and an air supply hole (18) is provided in the countersunk hole (17). The end of the third through hole (14) extends along its axis to both ends, so that one end of the sidewall of the third through hole (14) fits against the gas equalization cover plate (4), and the other end fits against the edge of the countersunk hole (17).

4. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 3, characterized in that: A sealing ring (19) is installed on the side wall of the second groove (13), a sealing ring (19) is installed on the outer wall of the third through hole (14), and a sealing ring (19) is installed on the outer wall of the first shaft hole (16). The first groove (12) has a second shaft hole (20) for accommodating the rotating shaft (9). A sealing ring (19) is installed on the outer wall of the second shaft hole (20), and a sealing ring (19) is installed on the inner wall of the first groove (12).

5. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 3, characterized in that: The end of the first shaft hole (16) extends to both ends along its axis, so that one end of the first shaft hole (16) is in contact with the air distribution cover plate (4) and the other end is in contact with the chassis (11); The end of the second groove (13), the base plate (11), the air distribution cover plate (4), the end of the third through hole (14) and the end of the first shaft hole (16) form the first chamber (7). The countersunk hole (17), the third through hole (14), and the gas equalization cover plate (4) form the second chamber (8).

6. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 3, characterized in that: The crucible (1) is provided with eight reaction chambers (2). Each reaction chamber (2) is provided with eight second through holes (5) in a ring around its perimeter. Two adjacent reaction chambers (2) share two second through holes (5). The second groove (13) is provided with a third through hole (14) and three fourth through holes (15).

7. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 1, characterized in that: A spring is installed between the baffle (10) and the chassis (11). One end of the spring is fixedly connected to the baffle (10), and the other end is fixedly connected to the chassis (11).

8. The cavity crucible with integrated gas tube for electron beam evaporation according to claim 1, characterized in that: The bottom of the chassis (11) is equipped with a lifting device (21), which drives the chassis (11) to move axially along the rotating shaft (9).

9. A cavity crucible with integrated gas tubes for electron beam evaporation according to claim 1, characterized in that: A cooling device (22) is fixedly connected to the bottom of the crucible (1). The cooling device (22) is located between the crucible (1) and the gas equalization cover plate (4). A connecting piece (23) is provided between the cooling device (22) and the gas equalization cover plate (4). The connecting piece (23) is fixedly connected to the cooling device (22) and the gas equalization cover plate (4) respectively.

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