Ion beam current stabilizer and arc ion plating apparatus

Abstract

The application discloses an ion beam steady flow device, which comprises an arc power supply, a cathode assembly and a trigger assembly, wherein the positive pole of the arc power supply is grounded; the cathode assembly comprises a cathode target material and a target material seat, and a permanent magnet is arranged at the target material seat; the trigger assembly comprises a trigger electrode, a trigger pin and an auxiliary anode plate. The arc power supply applies voltage to the target material seat and the trigger electrode, so that the trigger pin is in contact with the cathode target material to form a short circuit, an electric arc is formed instantaneously, a plasma is formed in the electric arc, and the electric arc spot moves on the surface of the cathode target material; the auxiliary anode plate is grounded, and when the electric arc spot moves to the edge of the cathode target material, the electric arc spot returns to the center of the cathode target material due to the fact that the potential of the auxiliary anode plate is higher than that of the cathode target material, so that the electric arc spot is prevented from falling on the side surface of the cathode target material and causing arc extinction. The application further provides an arc ion plating device comprising the ion beam steady flow device, so that the ion beam stability is improved, and the arc ion plating quality is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of ion source equipment and its peripheral facilities, in particular to an ion beam steady flow device and an arc ion plating equipment. BACKGROUND

[0002] Physical vapor deposition technology means that under vacuum conditions, using physical methods, material sources-solid or liquid surface gasification into gaseous atoms, molecules or partially ionized into ions, and through low pressure gas or plasma, a thin film with certain special function is deposited on the substrate surface. The main methods of physical vapor deposition are vacuum evaporation, sputtering coating, arc plasma coating, ion coating, and molecular beam epitaxy, etc. At present, physical vapor deposition technology can not only deposit metal film, alloy film, but also deposit compound, ceramic, semiconductor, polymer film, etc. The physical vapor deposition technology process is simple, environment-friendly, non-polluting, material-saving, uniform and dense film, and strong adhesion to the substrate.

[0003] In the prior art, in the arc ion plating equipment, the ion beam adopts arc discharge, and when the ion source is generated, the arc discharge arc technology has poor starting stability, is easy to cause external arc starting and poor target material consumption, and affects the stability of the ion beam. In the arc ion plating equipment, the stability of the ion beam current is very important, which directly affects the film quality.

[0004] Therefore, how to change the poor ion beam working stability of the arc ion plating equipment in the prior art has become a problem to be solved by the person skilled in the art. SUMMARY

[0005] The purpose of the present application is to provide an ion beam steady flow device and an arc ion plating equipment to solve the problems existing in the prior art, improve the stability of the ion beam, and further improve the quality of the arc ion plating.

[0006] To achieve the above purpose, the present application provides the following scheme: the present application provides an ion beam steady flow device, which comprises:

[0007] An arc power supply, a positive electrode of the arc power supply is grounded;

[0008] A cathode assembly, the cathode assembly comprises a cathode target and a target seat, the cathode target is arranged on the target seat, and the target seat is connected with a negative electrode of the arc power supply; a permanent magnet is further arranged at the target seat;

[0009] A trigger assembly comprises a trigger electrode, a trigger pin and an auxiliary anode plate, the trigger electrode is connected with a positive pole of the arc power source, the trigger pin and the auxiliary anode plate are both connected with the trigger electrode, the trigger pin is movably connected with the trigger electrode so that the trigger pin can contact with the cathode target, and the auxiliary anode plate is sleeved outside the cathode target with a gap between the auxiliary anode plate and the cathode target.

[0010] Preferably, a variable resistance element is arranged between the trigger electrode and the arc power source, and the variable resistance element is connected with the arc power source by using an automatic coordination controller.

[0011] Preferably, the cathode assembly further comprises a cooling circulation pipe, the cooling circulation pipe is connected with an external cooling medium source, and the cooling circulation pipe extends into the target seat.

[0012] Preferably, the trigger assembly further comprises a trigger rod, the trigger pin is connected with the trigger electrode by using the trigger rod, and the trigger rod is a telescopic rod.

[0013] Preferably, the trigger rod is a pneumatic telescopic rod, the trigger rod is provided with a driving medium inlet and a driving medium outlet, and the trigger rod is connected with an external driving source.

[0014] Preferably, the trigger assembly further comprises a support rod, the auxiliary anode plate is connected with the trigger electrode by using the support rod.

[0015] One end of the support rod is connected with the trigger electrode, and the other end of the support rod passes through the auxiliary anode plate and is fixed by using a fastening element.

[0016] Preferably, the auxiliary anode plate is an annular plate, the number of the support rods is multiple, and the support rods are evenly distributed in a circumferential direction around an axis of the auxiliary anode plate.

[0017] Preferably, the target seat and the trigger electrode are both connected with a terminal post, and the terminal post is connected with the arc power source by using a wire.

[0018] Preferably, the cathode assembly further comprises a shielding ring, and the shielding ring is sleeved outside the cathode target and the target seat.

[0019] The application further provides an arc ion plating device comprising the ion beam current stabilizing device.

[0020] The ion beam current stabilizing device of the present application has the following technical effects: the ion beam current stabilizing device of the present application comprises an arc power supply, a cathode assembly and a triggering assembly, wherein the positive electrode of the arc power supply is grounded; the cathode assembly comprises a cathode target and a target seat, the cathode target is arranged on the target seat, and the target seat is connected with the negative electrode of the arc power supply; a permanent magnet is arranged at the target seat; the triggering assembly comprises a triggering electrode, a triggering pin and an auxiliary anode plate, the triggering electrode is connected with the positive electrode of the arc power supply, the triggering pin and the auxiliary anode plate are both connected with the triggering electrode, the triggering pin is movably connected with the triggering electrode so that the triggering pin can contact with the cathode target, and the auxiliary anode plate is sleeved outside the cathode target and has a gap between the auxiliary anode plate and the cathode target.

[0021] The ion beam current stabilizing device of the present application has the following technical effects: the ion beam current stabilizing device of the present application comprises an arc power supply, a cathode assembly and a triggering assembly, wherein the positive electrode of the arc power supply is grounded; the cathode assembly comprises a cathode target and a target seat, the cathode target is arranged on the target seat, and the target seat is connected with the negative electrode of the arc power supply; a permanent magnet is arranged at the target seat; the triggering assembly comprises a triggering electrode, a triggering pin and an auxiliary anode plate, the triggering electrode is connected with the positive electrode of the arc power supply, the triggering pin and the auxiliary anode plate are both connected with the triggering electrode, the triggering pin is movably connected with the triggering electrode so that the triggering pin can contact with the cathode target, and the auxiliary anode plate is sleeved outside the cathode target and has a gap between the auxiliary anode plate and the cathode target.

[0022] The ion beam current stabilizing device of the present application has the following technical effects: the ion beam current stabilizing device of the present application comprises an arc power supply, a cathode assembly and a triggering assembly, wherein the positive electrode of the arc power supply is grounded; the cathode assembly comprises a cathode target and a target seat, the cathode target is arranged on the target seat, and the target seat is connected with the negative electrode of the arc power supply; a permanent magnet is arranged at the target seat; the triggering assembly comprises a triggering electrode, a triggering pin and an auxiliary anode plate, the triggering electrode is connected with the positive electrode of the arc power supply, the triggering pin and the auxiliary anode plate are both connected with the triggering electrode, the triggering pin is movably connected with the triggering electrode so that the triggering pin can contact with the cathode target, and the auxiliary anode plate is sleeved outside the cathode target and has a gap between the auxiliary anode plate and the cathode target. BRIEF DESCRIPTION OF DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments. Obviously, the drawings described below only show some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without any creative effort based on these drawings.

[0024] Figure 1 The structure schematic diagram of the ion beam current stabilizing device disclosed by the embodiments of the present application;

[0025] Figure 2 The structure schematic diagram of the auxiliary anode plate of the ion beam current stabilizing device disclosed by the embodiments of the present application;

[0026] Figure 3 The physical picture of the surface consumption of the cathode target in the first embodiment of the present application;

[0027] Figure 4 The physical picture of the surface consumption of the cathode target in the second embodiment of the present application;

[0028] Figure 5 The surface consumption of the cathode target material in the third embodiment of the present application is shown in the figure;

[0029] Figure 6 The surface consumption of the cathode target material in the fourth embodiment of the present application is shown in the figure;

[0030] Figure 7 The radial ablation speed curve of the cathode target material in the first and second embodiments of the present application is shown in the figure;

[0031] Figure 8 The radial ablation speed curve of the cathode target material in the third and fourth embodiments of the present application is shown in the figure.

[0032] Wherein, 1 is an arc power supply, 2 is a cathode target material, 3 is a target material seat, 4 is a permanent magnet, 5 is a trigger electrode, 6 is a trigger pin, 7 is an auxiliary anode plate, 8 is a variable resistance element, 9 is an automatic coordination controller, 10 is a cooling circulation pipe, 11 is a trigger rod, 12 is a driving medium inlet, 13 is a driving medium outlet, 14 is a support rod, 15 is a fastening element, 16 is a terminal post, and 17 is a shielding ring. DETAILED DESCRIPTION

[0033] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative efforts belong to the protection scope of the present application.

[0034] The purpose of the present application is to provide an ion beam current stabilizing device and an arc ion plating equipment to solve the problems existing in the prior art, improve the stability of the ion beam, and further improve the quality of arc ion plating.

[0035] In order to make the above-mentioned purposes, characteristics and advantages of the present application more obvious and easy to understand, the present application will be further described in detail below with reference to the drawings and specific embodiments.

[0036] The present application provides an ion beam current stabilizing device, which comprises an arc power supply 1, a cathode assembly and a trigger assembly, wherein the positive electrode of the arc power supply 1 is grounded; the cathode assembly comprises a cathode target material 2 and a target material seat 3, the cathode target material 2 is arranged on the target material seat 3, and the target material seat 3 is connected with the negative electrode of the arc power supply 1; a permanent magnet 4 is further arranged at the target material seat 3; the trigger assembly comprises a trigger electrode 5, a trigger pin 6 and an auxiliary anode plate 7, the trigger electrode 5 is connected with the positive electrode of the arc power supply 1, the trigger pin 6 and the auxiliary anode plate 7 are both connected with the trigger electrode 5, the trigger pin 6 is movably connected with the trigger electrode 5 so that the trigger pin 6 can contact the cathode target material 2, and the auxiliary anode plate 7 is sleeved outside the cathode target material 2 and has a gap therebetween.

[0037] The ion beam steady flow device of the present application, the arc power supply 1 applies voltage to the target seat 3 and the trigger electrode 5, the trigger pin 6 contacts the cathode target 2 to form a short circuit, an arc is formed instantaneously, a plasma is formed in the arc, under the action of the magnetic field formed by the permanent magnet 4 on the surface of the cathode target 2, the arc spot moves on the surface of the cathode target 2; the present application sets an auxiliary anode plate 7 outside the cathode target 2, the auxiliary anode plate 7 is grounded, when the arc spot moves to the edge of the cathode target 2, the arc spot returns to the center of the cathode target 2 because the potential of the auxiliary anode plate 7 is higher than that of the cathode target 2, thereby avoiding the arc spot falling on the side of the cathode target 2 to cause arc extinction. The present application uses the auxiliary anode plate 7 to stabilize the arc, ensures that the arc starting point is near the center of the cathode target 2, thereby realizing stable and reliable operation of the arc spot.

[0038] It also needs to be emphasized that a variable resistance element 8 is arranged between the trigger electrode 5 and the arc power supply 1, and the variable resistance element 8 is connected with the arc power supply 1 by using an automatic coordination controller 9. The auxiliary anode plate 7 changes with the arc voltage of the arc power supply 1, and the resistance of the variable resistance element 8 is adjusted by the automatic coordination controller 9; when the arc voltage is high (generally, the arc power supply 1 is set to be more than 40V, which is considered to be arc extinction and to restart the arc), the automatic coordination controller 9 adjusts the variable resistance element 8, and the movable pin of the variable resistance element 8 slides to the low ground resistance direction; when the arc voltage is lower than 10V, the automatic coordination controller 9 adjusts the variable resistance element 8, and the movable pin of the variable resistance element 8 slides to the high ground resistance direction, which ensures that the arc starting point is near the center of the cathode target 2 and further ensures the stable and reliable operation of the arc spot.

[0039] At the same time, the cathode assembly further comprises a cooling circulation pipe 10, which can be connected with an external cooling medium source in communication, and the cooling circulation pipe 10 extends into the target seat 3. The arc light generates heat, and the cooling medium transported by the external cooling medium source circulates in the cooling circulation pipe 10 to cool the cathode target 2 and the target seat 3, thereby ensuring the smooth operation of the device. It needs to be explained here that the cooling medium can be cooling water or other cooling fluid to meet different working conditions.

[0040] Specifically, the trigger assembly further comprises a trigger rod 11, the trigger pin 6 is connected with the trigger electrode 5 by using the trigger rod 11, the trigger rod 11 is a telescopic rod, the length change of the trigger rod 11 can drive the trigger pin 6 to move, so that the trigger pin 6 can contact the cathode target 2 and also can be separated from the cathode target 2.

[0041] In the specific embodiment, the trigger rod 11 is a pneumatic telescopic rod, the trigger rod 11 is provided with a driving medium inlet 12 and a driving medium outlet 13, the trigger rod 11 is connected with an external driving source, the external driving source uses the driving medium inlet 12 to introduce the driving medium into the trigger rod 11, under the pressure of the driving medium, the movable end of the trigger rod 11 is pushed to elongate, and then drives the trigger pin 6 to move, so that the trigger pin 6 is separated from the cathode target material 2; correspondingly, when the external driving source uses the driving medium outlet 13 to extract the driving medium in the trigger rod 11, the movable end of the trigger rod 11 is retracted, drives the trigger pin 6 to move towards the cathode target material 2, and the trigger pin 6 is in contact with the cathode target material 2.

[0042] In order to improve the structural stability of the auxiliary anode plate 7, the trigger assembly further comprises a support rod 14, the auxiliary anode plate 7 is connected with the trigger electrode 5 by the support rod 14; in the specific embodiment, one end of the support rod 14 is connected with the trigger electrode 5, the other end of the support rod 14 passes through the auxiliary anode plate 7 and is fixed by a fastening element 15, the support rod 14 is threadedly connected with the fastening element 15, the connection is convenient for fastening, dismounting and adjusting the axial position of the auxiliary anode plate 7 by the support rod 14, improves the flexible adaptability of the device, and ensures the normal work of the device.

[0043] In the specific embodiment, the inner ring diameter of the auxiliary anode plate 7 is larger than the outer diameter of the cathode target material 2 by 1mm-3mm, so as to ensure that the voltage of the arc power supply 1 is 20-30V, if the inner ring diameter of the auxiliary anode plate 7 is too small, the cathode and the auxiliary anode plate 7 will form a short circuit in a short time, if the inner ring diameter of the auxiliary anode plate 7 is too large, the arc voltage will be too high, and the side of the cathode target material 2 is prone to arc ablation, which greatly increases the short circuit probability of the cathode assembly, the present application improves the working reliability of the device by reasonably setting the spacing between the auxiliary anode plate 7 and the cathode target material 2.

[0044] In other specific embodiments of the present application, the target seat 3 and the trigger electrode 5 are both connected with a terminal post 16, the terminal post 16 is connected with the arc power supply 1 by a wire, which facilitates the connection of the cathode target material 2 and the trigger electrode 5 with the arc power supply 1.

[0045] More specifically, the cathode assembly further comprises a shielding ring 17, which is sleeved on the outside of the cathode target 2 and the target seat 3. The shielding ring 17 can avoid the influence of other components on the surface magnetic field strength of the cathode target 2. In the specific embodiment, the shielding ring 17 is made of polytetrafluoroethylene, and has a metal plating layer, so that the target seat 3 is short-circuited with the cathode target 2. When external arcing occurs, the automatic coordination controller 9 monitors the sudden increase of the current of the target seat 3 grounded through the variable resistance element 8, and the arc power supply 1 is automatically turned off, thereby improving the safety factor of the device.

[0046] Further, the present application also provides an arc ion plating device comprising the ion beam current stabilizing device, which improves the stability of the ion beam and further improves the quality of arc ion plating.

[0047] The ion beam current stabilizing device of the present application is further explained and described below through specific embodiments.

[0048] Embodiment one

[0049] In the embodiment, the distance between the trigger pin 6 and the surface of the cathode target 2 is 3 cm; the diameter of the cathode target 2 is 100 mm; the inner diameter of the insulating ring is 101 mm-151 mm, the thickness is 2 mm, and the height is 20 mm; the diameter of the trigger electrode 5 is 230 mm; the outer diameter of the auxiliary anode plate 7 is 130 mm, and the inner diameter is 1.5 mm larger than the diameter of the cathode target 2; the magnetic field strength of the permanent magnet 4 on the surface of the cathode target 2 (non-magnetic) is 5 mT; the variable resistance range of the variable resistance element 8 is 1 Ω-100 Ω; the voltage range of the arc power supply 1 is 0 V-200 V; the arc current is 60 A; and the cathode target 2 (arcing metal) is made of nickel-chromium alloy. Figure 3 .

[0050] Embodiment two

[0051] In the embodiment, the distance between the trigger pin 6 and the surface of the cathode target 2 is 3 cm; the diameter of the cathode target 2 is 100 mm; the inner diameter of the insulating ring is 101 mm-151 mm, the thickness is 2 mm, and the height is 20 mm; the diameter of the trigger electrode 5 is 230 mm; the outer diameter of the auxiliary anode plate 7 is 130 mm, and the inner diameter is 2 mm larger than the diameter of the cathode target 2; the magnetic field strength of the permanent magnet 4 on the surface of the cathode target 2 (non-magnetic) is 5 mT; the variable resistance range of the variable resistance element 8 is 1 Ω-100 Ω; the voltage range of the arc power supply 1 is 0 V-200 V; the arc current is 60 A; and the cathode target 2 (arcing metal) is made of nickel-chromium alloy.

[0052] After arcing for 15 hours, the surface consumption of the cathode target 2 is shown in the following figure: Figure 4 .

[0053] Example 3

[0054] In this example, the distance between the trigger pin 6 and the surface of the cathode target 2 is 3 cm; the diameter of the cathode target 2 is 100 mm; the inner diameter of the insulating ring is 101-151 mm, the thickness is 2 mm, and the length is 20 mm; the diameter of the trigger electrode 5 is 230 mm; the outer diameter of the auxiliary anode plate 7 is 130 mm, and the inner diameter is 1.5 mm larger than the diameter of the cathode target 2; the magnetic field of the permanent magnet 4 on the surface of the cathode target 2 (non-magnetic conductor) is 5 mT; the resistance of the variable resistance element 8 ranges from 1 Ω to 100 Ω; the voltage of the arc power supply 1 ranges from 0 to 200 V; the arc current is 60 A; and the cathode target 2 (arcing metal) is made of titanium-aluminum alloy.

[0055] After arcing for 15 hours, the physical diagram of the surface consumption of the cathode target 2 is shown in Figure 5 .

[0056] Example 4

[0057] In this example, the distance between the trigger pin 6 and the surface of the cathode target 2 is 3 cm; the diameter of the cathode target 2 is 100 mm; the inner diameter of the insulating ring is 101-151 mm, the thickness is 2 mm, and the length is 20 mm; the diameter of the trigger electrode 5 is 230 mm; the outer diameter of the auxiliary anode plate 7 is 130 mm, and the inner diameter is 2 mm larger than the diameter of the cathode target 2; the magnetic field of the permanent magnet 4 on the surface of the cathode target 2 (non-magnetic conductor) is 5 mT; the resistance of the variable resistance element 8 ranges from 1 Ω to 100 Ω; the voltage of the arc power supply 1 ranges from 0 to 200 V; the arc current is 60 A; and the cathode target 2 (arcing metal) is made of titanium-aluminum alloy.

[0058] After arcing for 15 hours, the physical diagram of the surface consumption of the cathode target 2 is shown in Figure 6 .

[0059] By observing the physical diagram of the surface consumption of the cathode target 2 after 15 hours of continuous work at a current of 60 A, it can be clearly seen that the surface consumption of both the nickel-chromium alloy and the titanium-aluminum alloy is good, greatly improving the utilization rate of the cathode target 2 itself. At the same time, there is no trace of external arcing at the edges of the four cathode targets 2, and there is no eccentric erosion at the edges of the cathode target 2, thus greatly improving the stability, reliability of the overall work of the target, and the safety of the equipment by introducing the automatic coordination controller 9 and the variable resistance element 8.

[0060] Please refer to Figure 7 and Figure 8The longitudinal erosion rate of the nickel-chromium alloy target material in the area of 39 mm radius is between 0.60 mm / h and 0.65 mm / h, then the erosion rate rises to 0.75 mm / h at a small section of the etching track, then the erosion rate begins to decrease, the longitudinal erosion rate decreases from 0.60 mm / h to 0.20 mm / h between 40 mm and 46 mm radius, then the rate rapidly decreases to 0, and the etching range occupies more than 90% of the target surface. The longitudinal erosion rate of the titanium-aluminum alloy target material in the area of 46 mm radius is about 1.0 mm / h, the erosion rate rises to 1.2 mm / h at the etching track, then the erosion rate rapidly decreases to 0, which is a very ideal ablation condition, the cathode target 2 is uniformly concave, and the overall etching range occupies more than 92% of the target surface, and the ablation rate in the ablated area does not fluctuate greatly, and the ablation of the target material is very sufficient.

[0061] The principles and implementation manners of the present application are described by using specific examples in the present application, and the above examples are only used to help understand the method of the present application and its core idea; meanwhile, for the general skilled in the art, the specific implementation manners and application ranges will be changed according to the idea of the present application. In conclusion, the content of the present specification should not be understood as the limitation of the present application.

Claims

1. An ion beam current stabilizer, characterized by comprising: The application relates to an arc power supply, a cathode assembly and a trigger assembly. The arc power supply has a positive electrode connected to ground. The cathode assembly comprises a cathode target and a target seat, the cathode target is arranged on the target seat, and the target seat is connected to the negative electrode of the arc power supply; a permanent magnet is arranged on the target seat. The trigger assembly comprises a trigger electrode, a trigger pin and an auxiliary anode plate, the trigger electrode is connected to the positive electrode of the arc power supply, the trigger pin and the auxiliary anode plate are connected to the trigger electrode, the trigger pin is movably connected to the trigger electrode so that the trigger pin can contact the cathode target, and the auxiliary anode plate is sleeved outside the cathode target with a gap between the auxiliary anode plate and the cathode target. A variable resistance element is arranged between the trigger electrode and the arc power supply, and the variable resistance element is connected to the arc power supply by using an automatic coordination controller. The trigger assembly further comprises a trigger rod and a support rod, the trigger pin is connected to the trigger electrode by using the trigger rod, the trigger rod is a telescopic rod, the auxiliary anode plate is connected to the trigger electrode by using the support rod, one end of the support rod is connected to the trigger electrode, and the other end of the support rod passes through the auxiliary anode plate and is fixed by using a fastening element.

2. The ion beam current stabilizer of claim 1, wherein: The cathode assembly further comprises a cooling circulation pipe which can be connected to an external cooling medium source and extends into the target seat.

3. The ion beam current stabilizer of claim 1, wherein: The trigger rod is a pneumatic telescopic rod, the trigger rod is provided with a driving medium inlet and a driving medium outlet, and the trigger rod is connected to an external driving source.

4. The ion beam current stabilizer of claim 1, wherein: The auxiliary anode plate is a ring-shaped plate, the support rod is in the form of a plurality of rods, and the support rods are evenly distributed around the axis of the auxiliary anode plate.

5. The ion beam current stabilizer of claim 1, wherein: The target seat and the trigger electrode are both connected to a terminal post, and the terminal post is connected to the arc power supply by using a wire.

6. The ion beam current stabilizer of claim 1, wherein: The cathode assembly further comprises a shielding ring which is sleeved outside the cathode target and the target seat.

7. An arc ion plating apparatus characterized by comprising: The application further relates to an ion beam current stabilizing device. The application further relates to a method for stabilizing the current of an ion beam.

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