A mobile exposure device for ultralong micrometer-scale structures

Abstract

The application discloses a mobile photoetching device for ultra-long microstructure exposure, which comprises an x-axis screw guide rail movement module, a y-axis synchronous belt movement module, a z-axis precision adjustment module, a light source focusing module, a control mechanism and a supporting mechanism, wherein the supporting mechanism comprises a table top, a stand, a beam and an L-shaped connecting plate, the stand is vertically arranged on the table top, and the stand is fixedly connected with the beam; the x-axis screw guide rail movement module is fixedly arranged on the table top, the y-axis synchronous belt movement module is fixed on the beam and connected with one end of the L-shaped connecting plate; the other end of the L-shaped connecting plate is fixedly connected with the z-axis precision adjustment module, and the z-axis precision adjustment module is slidingly connected with the light source focusing module in the vertical direction; and the x-axis screw guide rail movement module and the y-axis synchronous belt movement module are electrically connected with the control mechanism. The device realizes accurate photoetching of cross-scale microstructure, improves processing efficiency, and is low in cost and easy to realize.

Description

Technical Field

[0001] This invention relates to the field of microfabrication, and in particular to mobile exposure for ultra-long microstructures. Background Technology

[0002] Microfabrication technology is a branch of precision machining technology. Electro-machining, laser micro-hole machining, and waterjet micro-cutting technologies, all geared towards microfabrication, are of great significance to the development of the national economy. By photolithographically etching different structures onto the surface of parts, different properties can be achieved, such as pits, cylinders, and squares, which are widely used in electrolysis and electrodeposition. Micrometer-sized metal structures possess unique optical properties in the visible to infrared range. Surface-enhanced Raman scattering and surface-enhanced infrared absorption, utilizing these optical properties, greatly expand the application range of Raman and infrared spectroscopy. Existing chemical synthesis methods are simple and efficient, but the resulting metal structures exhibit significant randomness in morphology, size, and spatial distribution. Powerful electron beam lithography can achieve a high degree of control over the morphology of metal structures, but expensive equipment and extremely low productivity limit its application. Deep ultraviolet lithography, as a traditional photolithography method, is simple and efficient. However, under normal conditions, deep ultraviolet lithography is difficult to effectively process micrometer-sized metal structures over large areas.

[0003] Photolithography is a fine-machining technology that uses photoresist to undergo chemical changes under specific wavelengths of light or electron beams. Through processes such as exposure, development, and etching, patterns designed on a mask are transferred to a substrate. It is understood that it was initially applied to the microfabrication of integrated circuits and discrete semiconductor devices. Photolithography is fundamental to the modern semiconductor, microelectronics, and information industries, directly determining the development level of these technologies. Existing photolithography machines are mainly used for the exposure of nanoscale structures, primarily in the manufacture of integrated circuits and chips; the distribution scale of these microstructures is generally within 200 mm, and the structural scale is mostly nanometer-scale. For the microelectromechanical systems (MEMS) field, for micrometer-scale structures with a distribution scale greater than 300 mm, using photolithography machines is too costly, and often requires step-by-step exposure, making it difficult to guarantee structural continuity. Therefore, an exposure platform for micrometer-scale structures with a distribution scale greater than 300 mm needs to be designed. Summary of the Invention

[0004] Purpose of the invention: The technical problem to be solved by the present invention is to provide a mobile exposure device for ultra-long micron-scale structures, addressing the shortcomings of the prior art.

[0005] To address the aforementioned technical problems, this invention discloses a mobile exposure device for ultra-long micrometer-scale structures, comprising an x-axis lead screw guide motion module, a y-axis synchronous belt motion module, a z-axis precision adjustment module, a light source focusing module, a control mechanism, and a support mechanism. The support mechanism includes a table, a column, a beam, and an L-shaped connecting plate. The column is vertically mounted on the table and fixedly connected to the beam, which is parallel to the table. The x-axis lead screw guide motion module is fixedly mounted on the table. The y-axis synchronous belt motion module is fixed to the beam and connected to one end of the L-shaped connecting plate. The length direction of the block and the length direction of the x-axis lead screw guide motion module are perpendicular to each other on the horizontal plane; the other end of the L-shaped connecting plate is fixedly connected to the z-axis precision adjustment module, and the z-axis precision adjustment module is slidably connected to the light source focusing module in the vertical direction; the x-axis lead screw guide motion module and the y-axis synchronous belt motion module are both electrically connected to the control mechanism, which can control the x-axis lead screw guide motion module to move along the length direction of the x-axis lead screw guide motion module, and control the y-axis synchronous belt motion module to drive the z-axis precision adjustment module and the light source focusing module to move along the length direction of the y-axis synchronous belt motion module.

[0006] Furthermore, the x-axis lead screw guide motion module includes a first motor, a lead screw guide pair, an air bearing support, an exposure platform, a film plate, and a processing part. The first motor and the lead screw guide pair are connected and fixedly mounted on the table. The first motor is electrically connected to the control mechanism. The air bearing support is mounted on the lead screw guide pair, and the exposure platform is mounted on the air bearing support. The processing part and the film plate are placed sequentially from bottom to top on the exposure platform. The first motor can drive the lead screw guide pair to move, thereby causing the processing part and the film plate to move along the guide direction of the lead screw guide pair. The air bearing support can prevent the processing part from vibrating during the exposure process.

[0007] Furthermore, the Y-axis synchronous belt motion module includes a second motor, a synchronous belt, and a first connecting plate. The first connecting plate is fixedly connected to the beam, and the synchronous belt is located on the lower side of the first connecting plate and connected to one end of the L-shaped connecting plate. The second motor is located at one end of the synchronous belt and is electrically connected to the control mechanism. The second motor can drive the synchronous belt to move, thereby driving the Z-axis precision adjustment module and the light source focusing module to move.

[0008] Furthermore, the z-axis precision adjustment module includes a knob, a scale, and a connector. Both the knob and the scale are connected to the other end of the L-shaped connecting plate. The connector is movably mounted on the scale and is fixedly connected to the light source focusing module. By rotating the knob, the connector can be moved on the scale, thereby moving the light source focusing module in the vertical direction.

[0009] Furthermore, the exposure platform is provided with a slider, and the slider is provided with a spring clip, which is used to fix the processing part and the film plate.

[0010] Furthermore, the support mechanism also includes a bracket and a bottom plate. One end of the bracket is fixedly connected to the table surface, and the other end of the bracket is fixedly connected to the bottom plate. The control mechanism includes a chassis and a display connected to the chassis. The chassis is located on the bottom plate and is electrically connected to the first motor, the second motor, and the light source focusing module. The light source focusing module has a microscope and a light source inside. The display can be used to observe whether the light source is focused. The control mechanism can control the opening and closing of the light source. The display can show the exposure process in real time.

[0011] Furthermore, the chassis contains a data acquisition card, a processor, and a PLC controller. The PLC controller can control the position of the lead screw guide pair and the timing belt by acquiring the rotation angle of the first motor and the second motor, respectively.

[0012] Furthermore, a displacement sensor is installed on the lead screw guide pair. This displacement sensor is connected to the control mechanism and can collect displacement information of the exposure platform, sending it to the control mechanism. The displacement sensor has a simple structure, a large output signal, is easy to use, and is inexpensive.

[0013] Furthermore, the synchronous belt is equipped with a limit block, which can prevent the movement of the processed parts from exceeding the position of the limit block, and prevent damage to the Z-axis precision adjustment module when the machine malfunctions.

[0014] Furthermore, a connecting aid plate is provided at the right angle of the L-shaped connecting plate, which can fix the L-shaped connecting plate and make it more stable. Foot pads are provided at the bottom of the bracket to reduce vibration and noise generated during device operation.

[0015] Beneficial effects:

[0016] (1) The present invention realizes the movement of the light source on the y-axis by the reciprocating motion of the conveyor belt.

[0017] (2) The present invention can achieve ultra-long distance photolithography by moving the lead screw guide along the x-axis.

[0018] (3) This invention achieves large-area photolithography of multiple micro-parts through a large-area exposure platform, thereby improving processing efficiency. Furthermore, the mobile exposure device is low-cost and easy to implement. Attached Figure Description

[0019] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments, and the advantages of the present invention in the above and / or other aspects will become clearer.

[0020] Figure 1 This is a three-dimensional schematic diagram of a mobile exposure apparatus with an ultra-long micron-scale structure according to an embodiment of the present invention;

[0021] Figure 2 This is a schematic diagram of the x-axis motion module of a mobile exposure device with an ultra-long micron-scale structure according to an embodiment of the present invention;

[0022] Figure 3 This is a schematic diagram of the y-axis and z-axis motion modules of a mobile exposure device with an ultra-long micron-scale structure according to an embodiment of the present invention;

[0023] Figure 4 This is a perspective view of the x-axis lead screw guide motion module of a mobile exposure device with an ultra-long micron-scale structure according to an embodiment of the present invention.

[0024] The attached diagram is numbered as follows: 1. Foot pad, 2. Bottom plate, 3. Chassis, 4. Bracket, 5. Tabletop, 6. X-axis lead screw guide motion module, 7. Monitor, 8. Column, 9. Beam, 10. Y-axis synchronous belt motion module, 11. Z-axis precision adjustment module, 12. Light source focusing module, 6-1. First motor, 6-2. Lead screw guide pair, 6-3. Air bearing support, 6-4. Exposure platform, 6-5. Slider, 6-6. Spring clip, 6-7. Film plate, 6-8. Machining parts, 10-1. Second motor, 10-2. Synchronous belt, 10-3. Limit block, 10-4. First connecting plate, 11-1. L-shaped connecting plate, 11-2. Connecting aid plate, 11-3. Knob, 11-4. Ruler, 11-5. Connector; 12-1. Microscope, 12-2. Light source. Detailed Implementation

[0025] The embodiments of the present invention will now be described with reference to the accompanying drawings.

[0026] This application provides a mobile exposure device for ultra-long micron-scale structures, which can be applied to scenarios where the parts to be exposed are irregular, have varying heights, or are long.

[0027] This application discloses a mobile exposure device for ultra-long micrometer-scale structures, such as... Figure 1 and Figure 3As shown, the system includes an x-axis lead screw guide motion module 6, a y-axis synchronous belt motion module 10, a z-axis precision adjustment module 11, a light source focusing module 12, a control mechanism 200, and a support mechanism 100. The support mechanism 100 includes a platform 5, a column 8, a beam 9, and an L-shaped connecting plate 11-1. The column 8 is vertically mounted on the platform 5 and is fixedly connected to the beam 9. In practice, the column 8 and platform 5 can be connected using four M24 bolts, and the beam 9 and column 8 can be connected using eight M16 bolts. The beam 9 is parallel to the platform 5. The x-axis lead screw guide motion module 6 is fixedly mounted on the platform 5, and the y-axis synchronous belt motion module 10 is fixed to the beam 9 and connected to one end of the L-shaped connecting plate 11-1. The length direction (y-axis) of the y-axis synchronous belt motion module 10 and the length direction (x-axis) of the x-axis lead screw guide motion module 6 are perpendicular to each other on the horizontal plane; the other end of the L-shaped connecting plate 11-1 is fixedly connected to the z-axis precision adjustment module 11, and the z-axis precision adjustment module 11 is slidably connected to the light source focusing module 12 in the vertical direction (z-axis); both the x-axis lead screw guide motion module 6 and the y-axis synchronous belt motion module 10 are electrically connected to the control mechanism 200, which can control the x-axis lead screw guide motion module 6 to move along the length direction of the x-axis lead screw guide motion module 6, and control the y-axis synchronous belt motion module 10 to drive the z-axis precision adjustment module 11 and the light source focusing module 12 to move along the length direction of the y-axis synchronous belt motion module 10.

[0028] In another embodiment, a connecting aid plate 11-3 is provided at the right angle of the L-shaped connecting plate 11-1.

[0029] In this embodiment, as Figure 2 As shown, the x-axis lead screw guide motion module 6 includes a first motor 6-1, a lead screw guide pair 6-2, an air bearing support 6-3, an exposure platform 6-4, a film plate 6-7, and a processing part 6-8. The first motor 6-1 and the lead screw guide pair 6-2 are connected and fixedly mounted on the table 5. The first motor 6-1 is electrically connected to the control mechanism 200. The air bearing support 6-3 is mounted on the lead screw guide pair 6-2 to prevent vibration of the processing part 6-8 during exposure. The exposure platform 6-4 is mounted on the air bearing support 6-3, and the processing part 6-8 and the film plate 6-7 are placed on the exposure platform 6-4 from bottom to top. The first motor 6-1 can drive the lead screw guide pair 6-2 to move, thereby moving the processing part 6-8 and the film plate 6-7 along the guide direction of the lead screw guide pair 6-2. In the specific implementation process, the first motor 6-1 can be a servo motor, such as Mitsubishi HG-KN23J-S100; the length of the lead screw guide pair 6-2 can be set to 1000mm, thereby realizing the ultra-long movement of the exposure platform 6-4.

[0030] In another embodiment, a displacement sensor is provided on the lead screw guide pair 6-2. The displacement sensor is connected to the control mechanism 200 and can collect the displacement information of the exposure platform 6-4 and send it to the control mechanism 200.

[0031] In another embodiment, such as Figure 4 As shown, a slider 6-5 is provided on the exposure platform 6-4, and a spring clip 6-6 is provided on the slider 6-5. The spring clip 6-6 is used to fix the processing part 6-8 and the film plate 6-7.

[0032] In this embodiment, as Figure 3 As shown, the Y-axis synchronous belt motion module 10 includes a second motor 10-1, a synchronous belt 10-2, and a first connecting plate 10-4. The first connecting plate 10-4 is fixedly connected to the beam 9. The synchronous belt 10-2 is located on the lower side of the first connecting plate 10-4 and connected to one end of the L-shaped connecting plate 11-1. The second motor 10-1 is located at one end of the synchronous belt 10-2 and is electrically connected to the control mechanism 200. The second motor 10-1 can drive the synchronous belt 10-2 to move, thereby driving the Z-axis precision adjustment module 11 and the light source focusing module 12 to move. In the specific implementation, the synchronous belt 10-2 can be a 100mm synchronous belt, such as the Scott PBC170 synchronous belt, which can drive the light source focusing module 12 to move 100mm on the Y-axis. The second motor 10-1 can be a servo motor, such as the Delta ECMA-C20807SS.

[0033] In another embodiment, a limiting block 10-3 is provided on the synchronous belt 10-2.

[0034] In this embodiment, as Figure 3 As shown, the z-axis precision adjustment module 11 includes a knob 11-3, a scale 11-4, and a connector 11-5. Both the knob 11-3 and the scale 11-4 are connected to the other end of the L-shaped connecting plate 11-1. The connector 11-5 is movably mounted on the scale 11-4 and is fixedly connected to the light source focusing module 12. By rotating the knob 11-3, the connector 11-5 can be moved on the scale 11-4, thereby moving the light source focusing module 12 in the vertical direction.

[0035] In this embodiment, the support mechanism 100 further includes a bracket 4 and a bottom plate 2. One end of the bracket 4 is fixedly connected to the table surface 5, and the other end of the bracket 4 is fixedly connected to the bottom plate 2. The control mechanism 200 includes a chassis 3 and a display 7 connected to the chassis 3. The chassis 3 is located on the bottom plate 2 and is electrically connected to the first motor 6-1, the second motor 10-1, and the light source focusing module 12. The light source focusing module 12 has a microscope 12-1 and a light source 12-2 inside. The light source 12-2 has a switch, which is turned on when exposure is required and turned off after exposure. The display 7 can be used to observe whether the light source 12-2 is focused, and the control mechanism 200 can control the opening and closing of the light source 12-2. The display 7 can display the exposure process in real time. In the specific implementation, the light source 12-2 can use a DC165WSHP-165 type Japanese MEJIRO GENOSSEN UV curing machine.

[0036] In this embodiment, the chassis 3 contains a data acquisition card, a processor, and a PLC controller. The PLC controller can control the position of the lead screw guide pair 6-2 and the synchronous belt 10-2 by acquiring the rotation angle of the first motor 6-1 and the second motor 10-1, respectively. In the specific implementation, the PLC controller can be a Siemens S7-1200 programmable controller.

[0037] The specific installation and implementation steps for this device are as follows:

[0038] 1. The tabletop 5 is located on the support 4. The support 4 has foot pads 1 and a bottom plate 2. The machine box 3 is installed on the bottom plate 2, which constitutes the lower part of the device.

[0039] 2. The x-axis lead screw guide motion module 6 is located on the table 5 and consists of the first motor 6-1, lead screw guide pair 6-2, air bearing support 6-3, exposure platform 6-4, slider 6-5, spring clamp 6-6, film plate 6-7, and processing parts 6-8.

[0040] 3. The column 8 is located on the platform 5 and connected to the beam 9. The lower side of the beam 9 has a first connecting plate 10-4, which is used to connect the synchronous belt 10-2.

[0041] 4. The Z-axis precision adjustment module 11 is connected to the synchronous belt 10-2 in the Y-axis synchronous belt motion module via an L-shaped connecting plate 11-1. The L-shaped connecting plate 11-1 is fixed by the connecting auxiliary plate 11-2. One side of the L-shaped connecting plate 11-1 is connected to the knob 11-3 and the scale 11-4. The scale 11-4 is connected to the light source focusing module 12 via a connector 11-5. The light source focusing module 12 has a microscope 12-1 and a light source 12-2 inside.

[0042] 5. The chassis 3 is located on the bottom plate 2 and is connected to the display 7 located on the tabletop 5 via a USB cable. Turn on the power, input the desired exposure position on the display 7, the exposure platform 6-4 moves on the x-axis, and then the light source focusing module 12 moves on the y-axis.

[0043] 6. Once the light source focusing module 12 reaches the desired position, rotate knob 11-3 and observe the scale markings on ruler 11-4 for connector 11-5. When connector 11-5 reaches the specified mark, stop rotating knob 11-3, turn on light source 12-2, and observe and adjust the light source 12-2 to focus via display 7. Display 7 displays the exposure progress of the processed part 6-8 in real time. After exposure, turn off light source 12-2.

[0044] Steps 5 and 6 above complete the exposure of the first exposure area. After completion, the x-axis lead screw guide motion module 6 moves the processed part 6-8 to the second exposure area. If the heights are the same, exposure is performed directly; if the heights are different, knob 11-3 is adjusted to focus the light source 12-2 before exposure. Other parts are exposed in the same way. Since the length of the lead screw guide pair 6-2 can be set to 1000mm, continuous ultra-long (over 300mm) exposure of the processed part 6-8 can be achieved.

[0045] This invention provides a mobile exposure device for ultra-long micrometer-scale structures. Many methods and approaches exist for implementing this technical solution; the above description is merely a specific embodiment of this invention. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of this invention, and these improvements and modifications should also be considered within the scope of protection of this invention. All components not explicitly stated in this embodiment can be implemented using existing technologies.

Claims

1. A mobile exposure device for ultra-long micrometer-scale structures, characterized in that, The system includes an x-axis lead screw guide motion module (6), a y-axis synchronous belt motion module (10), a z-axis precision adjustment module (11), a light source focusing module (12), a control mechanism (200), and a support mechanism (100). The support mechanism (100) includes a table (5), a column (8), a beam (9), and an L-shaped connecting plate (11-1). The column (8) is vertically mounted on the table (5) and fixedly connected to the beam (9). The beam (9) is parallel to the table (5). The x-axis lead screw guide motion module (6) is fixedly mounted on the table (5). The y-axis synchronous belt motion module (10) is fixed on the beam (9) and connected to one end of the L-shaped connecting plate (11-1). The length direction of the y-axis synchronous belt motion module (10) and the length direction of the x-axis lead screw guide motion module (6) are perpendicular to each other on the horizontal plane. The L-shaped connecting plate... The other end of the plate (11-1) is fixedly connected to the z-axis precision adjustment module (11). A connecting aid plate (11-2) is provided at the right angle of the L-shaped connecting plate (11-1). The z-axis precision adjustment module (11) and the light source focusing module (12) are slidably connected in the vertical direction. The x-axis lead screw guide motion module (6) and the y-axis synchronous belt motion module (10) are both electrically connected to the control mechanism (200). The control mechanism (200) can control the x-axis lead screw guide motion module (6) to move along the length direction of the x-axis lead screw guide motion module (6), and control the y-axis synchronous belt motion module (10) to drive the z-axis precision adjustment module (11) and the light source focusing module (12) to move along the length direction of the y-axis synchronous belt motion module (10). The inner side of the light source focusing module (12) is provided with a microscope (12-1) and a light source (12-2). The x-axis lead screw guide motion module (6) includes a first motor (6-1), a lead screw guide pair (6-2), an air bearing support (6-3), an exposure platform (6-4), a film plate (6-7), and a processing part (6-8). The first motor (6-1) and the lead screw guide pair (6-2) are connected and fixedly mounted on the table (5). The first motor (6-1) is electrically connected to the control mechanism (200). The air bearing support (6-3) is mounted on the lead screw guide pair (6-2), and the exposure platform (6-4) is mounted on the air bearing support (6-3). The processing part (6-8) and the film plate (6-7) are placed on the exposure platform (6-4) from bottom to top. The first motor (6-1) can drive the lead screw guide pair (6-2) to move, thereby driving the processing part (6-8) and the film plate (6-7) to move along the guide direction of the lead screw guide pair (6-2). The y-axis synchronous belt motion module (10) includes a second motor (10-1), a synchronous belt (10-2), and a first connecting plate (10-4). The first connecting plate (10-4) is fixedly connected to the beam (9). The synchronous belt (10-2) is located on the lower side of the first connecting plate (10-4) and connected to one end of the L-shaped connecting plate (11-1). The second motor (10-1) is located at one end of the synchronous belt (10-2) and is electrically connected to the control mechanism (200). The second motor (10-1) can drive the synchronous belt (10-2) to move, thereby driving the z-axis precision adjustment module (11) and the light source focusing module (12) to move. The length of the lead screw guide pair (6-2) is set to 1000mm, and the timing belt (10-2) is a 100mm timing belt, so as to realize continuous long-distance exposure of the processed part (6-8), and the continuous long distance is more than 300mm; The z-axis precision adjustment module (11) includes a knob (11-3), a scale (11-4), and a connector (11-5). The knob (11-3) and the scale (11-4) are both connected to the other end of the L-shaped connecting plate (11-1). The connector (11-5) is movably mounted on the scale (11-4). The connector (11-5) is fixedly connected to the light source focusing module (12). By rotating the knob (11-3), the connector (11-5) can be moved on the scale (11-4), thereby moving the light source focusing module (12) in the vertical direction.

2. The mobile exposure device for ultra-long micrometer-scale structures according to claim 1, characterized in that, The exposure platform (6-4) is provided with a slider (6-5), and the slider (6-5) is provided with a spring clip (6-6). The spring clip (6-6) is used to fix the processing part (6-8) and the film plate (6-7).

3. A mobile exposure device for ultra-long micrometer-scale structures according to claim 2, characterized in that, The support mechanism (100) also includes a bottom plate (2) and multiple brackets (4). One end of the multiple brackets (4) is fixedly connected to the table (5), and the other end is fixedly connected to the bottom plate (2). The control mechanism (200) includes a chassis (3) and a display (7) connected to the chassis (3). The chassis (3) is located on the bottom plate (2). The chassis (3) is electrically connected to the first motor (6-1), the second motor (10-1), and the light source focusing module (12) respectively. The display (7) can observe whether the light source (12-2) under the microscope (12-1) is focused. The control mechanism (200) can control the opening and closing of the light source (12-2). The display (7) can display the exposure process in real time.

4. A mobile exposure device for ultra-long micrometer-scale structures according to claim 3, characterized in that, The chassis (3) contains a data acquisition card, a processor and a PLC controller. The PLC controller can control the position of the lead screw guide pair (6-2) and the synchronous belt (10-2) by acquiring the rotation angle of the first motor (6-1) and the second motor (10-1).

5. A mobile exposure device for ultra-long micrometer-scale structures according to claim 4, characterized in that, A displacement sensor is provided on the lead screw guide pair (6-2). The displacement sensor is connected to the control mechanism (200) and can collect the displacement information of the exposure platform (6-4) and send it to the control mechanism (200).

6. A mobile exposure apparatus for ultra-long micrometer-scale structures according to claim 5, characterized in that, The synchronous belt (10-2) is provided with a limit block (10-3).

7. A mobile exposure apparatus for ultra-long micrometer-scale structures according to claim 6, characterized in that, The bottom of the bracket (4) is provided with foot pads (1).

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