A coating assembly, an evaporation machine and an evaporation method

Abstract

The application discloses a coating assembly, an evaporation machine and an evaporation method, and relates to the technical field of display. The coating assembly comprises a mechanical fork for moving a substrate, a connecting rod and a plurality of parallel support rods for supporting the substrate; and a mask plate for defining an evaporation area of the substrate, which is provided with a support groove for accommodating the support rods. The coating assembly provided by the application can avoid the bending and deformation of the substrate, and can make the alignment more convenient, fast and accurate by arranging the mechanical fork with a plurality of support rods, which can support the substrate from a plurality of positions at the bottom of the substrate. The mask plate with the support groove can accommodate the support rods, so that the substrate can be closer to the mask plate during alignment, thereby facilitating the alignment. The evaporation machine with the coating assembly has a faster alignment speed and greatly improves the production efficiency.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, in particular to a coating assembly, an evaporation machine and an evaporation method. BACKGROUND

[0002] OLED display has good color reproduction, short response time, good low temperature characteristics, thin thickness, light weight, good flexibility, and its application range is more and more wide. In the production of OLED display, an evaporation machine is used to evaporate RGB light-emitting layer organic material to the RGB pixel points of the substrate. The evaporation machine is provided with a light-emitting layer evaporation chamber, an external mechanical fork for moving the substrate into the evaporation chamber, an internal mechanical hook in the evaporation chamber for receiving the substrate, and a precision mask plate (FMM) for shielding other pixels during evaporation. During evaporation, the external mechanical fork moves the substrate into the evaporation chamber, and the internal mechanical hook in the evaporation chamber receives the substrate. Since the middle part of the substrate needs to be coated, in order not to block the coating of the substrate, the internal mechanical hook is usually arranged at the two side edges of the substrate receiving direction to support the substrate. However, since the middle part of the substrate is not supported, the middle part of the substrate will sag under the influence of its own gravity, as shown in Figure 12 At the same time, the substrate needs to be aligned with the FMM before evaporation. The alignment marks are usually arranged at the four corners of the substrate and the FMM. Due to the sagging of the middle part of the substrate, a distance is generated between the alignment marks of the substrate and the FMM, which causes the alignment of the substrate and the FMM to be difficult, reduces the success rate of alignment, lengthens the alignment time, and reduces the production efficiency. In addition, the support structure supporting the substrate through the two side edges of the substrate is easy to cause the substrate to break, affecting the production yield, especially when the substrate size is large, these problems will be more prominent.

[0003] It can be seen that the prior art still needs to be improved and improved. SUMMARY

[0004] In view of the shortcomings of the prior art, the purpose of the present application is to provide a coating assembly, an evaporation machine and an evaporation method, which aims to solve the defects that the substrate is easy to bend under gravity by moving the substrate from both sides of the substrate by the mechanical hook, causing slow alignment speed and low production efficiency.

[0005] In order to achieve the above purpose, the present application adopts the following technical scheme:

[0006] A coating assembly, characterized in that it comprises:

[0007] A mechanical fork for moving the substrate, comprising a connecting rod and a plurality of parallel support rods for supporting the substrate.

[0008] A mask plate for defining the evaporation area of the substrate, which is provided with a support groove for accommodating the support rod.

[0009] The connecting rod is movably connected with one end of the supporting rod.

[0010] The supporting rod is provided with a plug-in part corresponding to the end of the connecting rod, and the connecting rod is provided with a plug-in slot corresponding to the position of the plug-in part, and the plug-in slot is matched with the plug-in part.

[0011] The mask plate comprises:

[0012] One or more mask pieces are provided with pixel opening parts for defining the evaporation area of the substrate.

[0013] A mask frame is used to support the mask pieces, and the supporting slots are arranged on the mask frame.

[0014] The cross section of the supporting rod is in the shape of an inverted trapezoid, and the supporting slot is in the structure of an inverted trapezoid matched with the supporting rod.

[0015] The supporting slot is further provided with an adjusting mechanism for moving the supporting rod in the upward, downward, left, right, front and rear directions.

[0016] The mask plate comprises a first mask plate and a second mask plate, and the pixel opening parts in the first mask plate are complementary to the pixel opening parts of the second mask plate.

[0017] The mechanical fork comprises a first mechanical fork and a second mechanical fork, the supporting rod of the first mechanical fork corresponds to the supporting slot in the first mask plate, and the supporting rod of the second mechanical fork corresponds to the supporting slot in the second mask plate.

[0018] An evaporation machine comprises the film coating assembly as described above.

[0019] An evaporation method is performed by using the evaporation machine as described above, and the method comprises the following steps:

[0020] Step S1. The mechanical fork receives the substrate sent into the evaporation chamber by the external mechanical hand.

[0021] Step S2. The mechanical fork moves the substrate to the mask plate, and the connecting rod is separated from the supporting rod.

[0022] Step S3. The position camera and the distance sensor acquire the position information of the substrate and transmit it to the control mechanism.

[0023] Step S4. The control mechanism starts the work of the adjusting mechanism according to the position information of the position substrate to adjust the position state of the substrate.

[0024] Step S5. The position camera and the distance sensor check the position state of the substrate, and transmit the position information of the substrate to the control mechanism;

[0025] Step S6. The control mechanism judges whether the substrate is accurately aligned with the mask plate, when judging that the substrate is accurately aligned with the mask plate, the alignment is completed, then the evaporation is started, and the evaporation is carried out; when the control mechanism judges that the substrate is not accurately aligned with the mask plate, then steps S4 and S5 are repeated until the substrate is accurately aligned with the mask plate.

[0026] Beneficial effects:

[0027] The present application provides a coating assembly, an evaporation machine and an evaporation method, the coating assembly is provided with a mechanical fork with a plurality of supporting rods, the plurality of supporting rods can support the substrate upwards from a plurality of positions at the bottom of the substrate, so that the substrate can be prevented from being bent and deformed, and the alignment can be more convenient, fast and accurate; the mask plate is provided with a supporting groove, and the supporting groove can accommodate the supporting rod, so that the substrate can be closer to the mask plate during alignment, and the alignment is facilitated. The evaporation machine using the coating assembly has a faster alignment speed, and greatly improves the production efficiency.

[0028] The evaporation method can quickly align and improve the production efficiency of evaporation by acquiring the position information of the substrate through the position camera and the distance sensor, and adjusting the substrate according to the position information through the adjusting mechanism. BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 The structure diagram of the coating assembly provided by the present application Figure 1 .

[0030] Figure 2 The cross-sectional view of A in the above figure Figure 1 .

[0031] Figure 3 The structure diagram of the evaporation machine

[0032] Figure 4 The structure diagram of the supporting rod and the connecting rod

[0033] Figure 5 The structure diagram of the coating assembly Figure 2 .

[0034] Figure 6 The cross-sectional view of B in the above figure Figure 5 .

[0035] Figure 7 The structure diagram of the first mask plate and the second mask plate in one embodiment

[0036] Figure 8 The structure diagram of the first mask plate and the second mask plate in another embodiment

[0037] Figure 9 is a schematic view of the structure of the substrate after evaporation (Fig. a is a schematic view of the substrate after evaporation by the mask plate shown in Fig. b is a schematic view of the substrate after evaporation by the mask plate of the prior art). Figure 7 and Figure 8 is a schematic view of the structure of the substrate after evaporation by the mask plate shown in Fig. b is a schematic view of the substrate after evaporation by the mask plate of the prior art).

[0038] Figure 10 is a schematic view of the control mechanism and the alignment camera, the distance sensor, and the adjusting mechanism.

[0039] Figure 11 is a flowchart of the evaporation method.

[0040] Figure 12 is a schematic view of the structure of the mechanical hook, the substrate, and the mask plate of the prior art.

[0041] In the drawings, 1 is a mechanical fork, 2 is a mask plate, 3 is a support rod, 4 is a support groove, 5 is a connecting rod, 6 is a plug-in part, 7 is a plug-in groove, 8 is a mask piece, 9 is a mask frame, 10 is a V-shaped guide inlet, 11 is an adjusting mechanism, 12 is a first mask plate, 13 is a second mask plate, 14 is a first mechanical fork, 15 is a second mechanical fork, 16 is a pixel opening part, 17 is a first driving mechanism, 18 is a second driving mechanism, 19 is an alignment camera, 20 is a distance sensor, 21 is a control mechanism, 22 is a mechanical hook, and 23 is a substrate. DETAILED DESCRIPTION

[0042] The present application provides a coating assembly, an evaporation machine, and an evaporation method. To make the purpose, technical solutions, and effects of the present application clearer and more explicit, the present application is further described in detail below by way of examples. It should be understood that the specific examples described herein are only used to explain the present application and do not limit the present application.

[0043] Based on the prior art mechanical hook 22 arranged in the evaporation chamber as described in the background section, as shown in Fig. 1, the mechanical hook 22 supports and moves the substrate 23 from both sides of the substrate 23, which makes the substrate 23 prone to sagging or bending in the middle due to gravity, causing alignment difficulties, slow alignment speed, and low production efficiency. Figure 12 To address this problem, the present application provides a coating assembly for the evaporation process of the substrate 23. As shown in Fig. 2, the coating assembly comprises a first mask plate 12 and a second mask plate 13, a first mechanical fork 14 and a second mechanical fork 15, a first driving mechanism 17 and a second driving mechanism 18, an alignment camera 19, a distance sensor 20, and a control mechanism 21. Figure 1As shown, the coating assembly includes a mechanical fork 1 and a mask plate 2. The mechanical fork 1 functions similarly to a mechanical hook 22 in the prior art, but with a fork-shaped structure. Multiple support rods 3 are provided at the portion supporting the substrate 23. The number of support rods 3 can be more than two, such as three, four, five, or more, depending on the size of the substrate 23. When the substrate 23 is large, more support rods can be used to better support the substrate 23 from multiple positions on its bottom. When the substrate 23 is small, fewer support rods can be used, with the specific number determined by achieving effective support for the substrate 23. The multiple support rods 3 are arranged in parallel, with their upper surfaces on the same horizontal plane, to keep the supported substrate 23 flat and prevent any depressions.

[0044] When the substrate 23 is aligned with the mask 2, the smaller the distance between the substrate 23 and the mask 2, the more accurate the alignment camera 19's acquisition of the substrate 23's position information, and the faster the alignment speed. However, because the support rod 3 occupies the bottom space of the substrate 23, the substrate 23 cannot get close to the mask 2, thus affecting the alignment speed. Therefore, in this embodiment, as... Figure 2 As shown, the mask plate 2 has downwardly recessed support grooves 4 at the positions corresponding to each support rod 3. The number of support grooves 4 is the same as the number of support rods 3, and their extension direction is also the same as the extension direction of the support rods 3. Therefore, the support grooves 4 can form a space to accommodate the support rods 3. When the substrate 23 is aligned with the mask plate 2, the support rods 3 can be embedded in the support grooves 4. On the one hand, this shortens the distance between the substrate 23 and the mask plate 2, enabling rapid alignment. On the other hand, the support rods 3 do not need to be removed during vapor deposition, as they will not be deposited onto the substrate due to the shielding effect of the support grooves 4. Furthermore, since the support rods 3 do not need to be removed, they can support the substrate 23 upwards during vapor deposition, while also reducing process steps and accelerating production speed.

[0045] In this embodiment, the coating assembly, through a mechanical fork 1 equipped with multiple support rods 3, can not only move the substrate 23, but also lift the substrate 23 upwards from multiple positions on its bottom, avoiding alignment difficulties caused by the central depression of the substrate 23, greatly improving alignment speed and accuracy, and increasing production efficiency. Simultaneously, by providing support grooves 4 at positions corresponding to the support rods 3 on the mask plate 2, the support rods 3 are accommodated, allowing the substrate 23 to be as close as possible to the mask plate 2 during alignment, improving alignment speed. Furthermore, the support rods 3 do not need to be withdrawn from below the substrate 23 during vapor deposition, making the operation of the mechanical fork 1 more convenient.

[0046] In a preferred embodiment, such as Figure 3As shown, the mechanical fork 1 specifically comprises a connecting rod 5, a support rod 3 arranged at one side of the connecting rod 5, and a first driving mechanism 17 for driving the connecting rod 5 to move. One end of the support rod 3 is movably connected with the connecting rod 5. When the connecting rod 5 and the support rod 3 are in the connected state, they form a fork structure and can move up and down, left and right, and forward and backward in the evaporation chamber under the action of the first driving mechanism 17, and through the movement, the substrate 23 is placed on the mask plate 2. When the substrate 23 is on the mask plate 2, the connecting rod 5 can be separated from the support rod 3, that is, the support rod 3 is located in the support groove 4 and does not move with the connecting rod 5. At this time, the support rod 3 and the substrate 23 can move with the mask plate 2, and the connecting rod 5 moves to a hidden position under the action of the first driving mechanism 17 to avoid evaporation to the organic film.

[0047] It should be noted that in the present embodiment, the first driving mechanism 17 is a prior art, which will not be described in detail. Any device that can achieve the up-and-down, left-and-right, and forward-and-backward movement of the connecting rod 5 and the support rod 3 can be used.

[0048] In order to facilitate the connection or separation of the support rod 3 and the connecting rod 5, in a preferred embodiment, as shown in Figure 4 The end of the support rod 3 corresponding to the connecting rod 5 is provided with a plug-in part 6 extending downward. The cross section of the plug-in part 6 can be rectangular or inverted trapezoidal structure, preferably inverted trapezoidal structure. The connecting rod 5 is provided with an upwardly open plug-in slot 7 at a position corresponding to the plug-in part 6. The cross-sectional shape of the plug-in slot 7 is adapted to the shape of the plug-in part 6, so as to facilitate the plug-in part 6 to enter and exit the plug-in slot 7. In addition, in order to facilitate the plug-in of the plug-in part 6, the plug-in slot 7 is a plug-in slot 7 extending along the length direction thereof, so that the plug-in part 6 can be inserted into any position of the plug-in slot 7. When the plug-in part 6 is plugged into the plug-in slot 7, a stable connection structure can be formed. When the connecting rod 5 is driven to move by the first driving mechanism 17, the support rod 3 can move with it, and then the substrate 23 is moved. When the substrate 23 has been placed on the mask plate 2, the connecting rod 5 is driven to move downward by the first driving mechanism 17, so that the plug-in part 6 is moved out of the plug-in slot 7, and the support rod 3 is separated from the connecting rod 5, which facilitates the subsequent movement of the support rod 3 and the substrate 23 through the mask plate 2.

[0049] In a preferred embodiment, as shown in Figure 1 The mask plate 2 further comprises a mask frame 9 and a mask sheet 8. The number of mask sheets 8 can be one or more, preferably multiple. The mask sheet 8 is provided with one or more pixel opening parts 16 for defining the evaporation area of the substrate 23, so as to form a set evaporation pattern on the substrate 23; the mask frame 9 is used to support the mask sheet 8, and the support groove 4 is arranged at a position of the mask frame 9 corresponding to the support rod 3, as shown in Figure 2As shown, the mask sheet 8 is arranged between two adjacent support grooves 4; the mask frame 9 is further in transmission connection with the arranged second driving mechanism 18, which can drive the mask frame 9 to move up and down, left and right, and front and back, so as to make the mask sheet 8 align and adhere to the substrate 23.

[0050] In addition, the mask frame 9 provided with the support grooves 4 has multiple mask sheets 8, and the size of each mask sheet 8 is small, so that the deformation of the mask sheet 8 can be prevented, and the alignment can be more accurate.

[0051] Since the support rod 3 needs to enter and exit the support groove 4, the shape of the support rod 3 and the support groove 4 will affect the entering and exiting and the alignment speed of the substrate 23 and the mask plate 2. For this purpose, in a preferred embodiment, as shown in Figure 2 The cross section of the support rod 3 is inverted trapezoidal, and the support groove 4 is an inverted trapezoidal structure matched with the support rod 3. Since the lower end of the support rod 3 and the support groove 4 is small and the upper end is large, the support rod 3 can easily enter the support groove 4 during alignment. Since the upper end of the support rod 3 is large, it can better support the substrate 23 and keep the substrate 23 horizontal. In addition, since the support groove 4 is an inverted trapezoidal structure, the outer groove walls of two adjacent support grooves 4 can form a V-shaped entrance 10 with a small upper end opening and a large lower end opening. The top of the V-shaped entrance 10 corresponds to the pixel opening part 16 of the mask sheet 8. Therefore, when evaporation is performed, the V-shaped entrance 10 can make the vapor distribution more uniform, so that the formed organic film is more uniform, and has better evaporation effect.

[0052] However, when the substrate 23 is aligned with the mask plate 2 only by the mechanical fork 1, it is difficult to accurately align, especially when the substrate 23 is placed on the mask plate 2, it is difficult to fine-tune by the first driving mechanism 17. For this purpose, in a preferred embodiment, as shown in Figure 5 , Figure 6 The support groove 4 is further provided with an adjustment mechanism 11, which can move the support rod 3 from up and down, left and right, and front and back, that is, the support rod 3 can be adjusted from three dimensions, in other words, the substrate 23 can be adjusted from three dimensions. This not only makes the substrate 23 and the mask plate 2 accurately aligned, but also ensures the flatness of the surface of the substrate 23.

[0053] As a specific embodiment, two adjusting mechanisms 11 are arranged in each support groove 4, which can be arranged at the two ends of the support groove 4 or at any position opposite to the two ends of the support groove 4. The support rod 3 is arranged on the adjusting mechanism 11, and the position of the support rod 3 is supported and adjusted by the adjusting mechanism 11, for example, the support rod 3 is moved left and right or forward and backward in the horizontal direction by the adjusting mechanism 11, that is, the substrate 23 is adjusted in the X-axis and Y-axis directions, so that the substrate 23 and the mask plate 2 can be overlapped and positioned on the projection surface, or the substrate 23 is adjusted in the direction perpendicular to the horizontal direction by the adjusting mechanism 11, that is, the substrate 23 is adjusted in the Z-axis direction, so that the surface of the substrate 23 is kept flat to avoid the phenomenon of concave.

[0054] It should be noted that the adjusting mechanism 11 can include a plurality of driving mechanisms, guide grooves and sliding seats, for example, it includes an X-axis guide groove that can extend in the X-axis direction, an X-axis sliding seat that is slidingly connected to the X-axis guide groove, and an X-axis driving mechanism that drives the sliding seat to reciprocate, and the X-axis sliding seat is provided with a Y-axis sliding seat, a Y-axis guide groove and a Y-axis driving mechanism that can reciprocate in the Y-axis direction, and a Z-axis sliding seat, a Z-axis guide groove and a Z-axis driving mechanism arranged on the Y-axis sliding seat. Through the above structure, the support rod 3 can be adjusted in the up, down, left, right, front and back directions, that is, the three-dimensional position of the substrate 23 can be adjusted.

[0055] Of course, the adjusting mechanism 11 is not limited to the foregoing structure, and any structure that can move the support rod 3 up, down, left, right, front and back can be used.

[0056] The foregoing mask plate 2 occupies a large area due to the support groove 4, so that the area occupied by the mask plate 8 is limited, and the area occupied by the pixel opening portion 16 is also limited, resulting in that the evaporation area formed on the substrate 23 by one-time evaporation is also limited, and finally the utilization rate of the substrate 23 is not high. For this purpose, in a preferred embodiment, as shown in Figure 7 , Figure 8 The mask plate 2 includes a first mask plate 12 and a second mask plate 13, and the position of the support groove 4 on the first mask plate 12 corresponds to the position of the mask plate 8 on the second mask plate 13, so that the position occupied by the support groove 4 in the first mask plate 12 can also form an evaporation area by two-time evaporation, thereby improving the utilization rate of the substrate 23.

[0057] In order to adapt to the foregoing first mask plate 12 and second mask plate 13, as shown in Figure 7 , Figure 8As shown, the mechanical fork 1 includes a first mechanical fork 14 and a second mechanical fork 15; wherein, the first mechanical fork 14 is adapted to the first mask plate 12, and its support rod 3 corresponds to the support groove 4 on the first mask plate 12; the second mechanical fork 15 is adapted to the second mask plate 13, and its support rod 3 corresponds to the support groove 4 on the second mask plate 13. During vapor deposition, the substrate 23 can first undergo a first vapor deposition using the shielding effect of the first mask plate 12, and then undergo a second vapor deposition using the shielding effect of the second mask plate 13. After the two vapor depositions are completed, a complete vapor deposition area can be formed on the surface of the substrate 23, such as... Figure 9 As shown in Figure a.

[0058] Therefore, by setting a first mask 12 and a second mask 13, a first mechanical fork 14 adapted to the first mask 12 and a second mechanical fork 15 adapted to the second mask 13, the vapor deposition area can be maximized, thereby improving the utilization rate of the substrate 23.

[0059] As an example, such as Figure 8 As shown, both the first mask 12 and the second mask 13 are provided with n support grooves 4 and n mask sheets 8, where n is a natural number greater than or equal to 2. The support grooves 4 of the first mask 12 and the second mask 13 are staggered, and the pixel openings 16 on the mask sheets 8 of the first mask 12 and the second mask 13 can form a complete vapor deposition pattern. After two vapor depositions, the formed vapor deposition area can comprehensively cover the substrate 23, such as... Figure 9 As shown in Figure a.

[0060] However, in the aforementioned example, the support grooves 4 cannot be symmetrically distributed on the mask plate 2, and correspondingly, the mechanical fork 1 cannot symmetrically support the substrate 23, thus increasing the difficulty of alignment, reducing the alignment speed, and affecting production efficiency. Therefore, as a preferred embodiment, such as... Figure 9 As shown, the first mask 12 has n support grooves 4, and the second mask 13 has n+1 support grooves 4, or the first mask 12 has n+1 support grooves 4, and the second mask 13 has n support grooves, where n is a natural number greater than or equal to 2. Furthermore, the support grooves 4 on the first mask 12 and the second mask are symmetrically distributed. Therefore, the support rods 3 in the corresponding mechanical fork 1 are also symmetrically distributed, providing more balanced support for the substrate 23, making alignment more convenient and precise. Moreover, the pixel openings 16 of the mask sheets 8 in the first mask 12 and the second mask 13 are only half of the vapor deposition pattern and are complementary. After one vapor deposition through the first mask 12 and a second vapor deposition through the second mask 13, a complete vapor deposition pattern can be formed on the substrate 23. Furthermore, the vapor deposition area formed on the substrate 23 after the two vapor depositions can comprehensively cover the substrate 23, resulting in a high utilization rate of the substrate 23.

[0061] Therefore, by setting the first mask plate 12 and the second mask plate 13, and the first mechanical fork 14 and the second mechanical fork 15, a larger evaporation area can be obtained on the surface of the substrate 23 by twice evaporation, and the utilization rate of the substrate 23 is improved.

[0062] The second aspect of the present application also discloses a kind of evaporation machine, the evaporation machine includes evaporation chamber, evaporation source is arranged in the evaporation chamber and includes the film coating assembly as described above, such as Figure 3 As shown, through the film coating assembly, the substrate 23 can be moved and aligned, which facilitates obtaining accurate evaporation patterns, and when the substrate 23 is aligned with the mask plate 2, it can be more accurate and fast, improving production efficiency.

[0063] Specifically, the evaporation machine further comprises an alignment camera 19, a distance sensor 20 and a control mechanism 21, as shown in Figure 10 The alignment camera 19 and the distance sensor 20 are both signal connected with the control mechanism 21, wherein the three-dimensional state of the substrate 23 can be obtained by the alignment camera 19 and the distance sensor 20 and transmitted to the control mechanism 21, the control mechanism 21 can determine the position state of the substrate 23 and the alignment condition with the mask plate 2 according to the obtained information, and issue an instruction to adjust the three-dimensional state of the substrate 23 according to the alignment condition, so that the substrate 23 and the mask plate 2 are accurately aligned.

[0064] In the evaporation machine, the control mechanism 21 is also electrically connected with the first driving mechanism 17, the second driving mechanism 18 and the adjusting mechanism 11. The control mechanism 21 can control the switching of the first driving mechanism 17, the second driving mechanism 18 and the adjusting mechanism 11.

[0065] The third aspect of the present application also provides an evaporation method, which uses the evaporation machine as described above for evaporation, as shown in Figure 11 The method comprises the following steps:

[0066] Step S1. The mechanical fork 1 receives the substrate 23 sent into the evaporation chamber by the external mechanical hand;

[0067] Step S2. The mechanical fork 1 moves the substrate 23 to the mask plate 2, and the connecting rod 5 is separated from the supporting rod 3;

[0068] Step S3. The alignment camera 19 and the distance sensor 20 obtain the position information of the substrate 23 and transmit it to the control mechanism 21;

[0069] Step S4. The control mechanism 21 starts the adjusting mechanism 11 according to the position information of the substrate 23 to adjust the position state of the substrate 23;

[0070] Step S5. The position state of the substrate 23 is checked by the position camera 19 and the distance sensor 20, and the position information of the substrate 23 is transmitted to the control mechanism 21.

[0071] Step S6. The control mechanism 21 judges whether the substrate 23 is accurately aligned with the mask plate 2, and when the substrate 23 is accurately aligned with the mask plate 2, the alignment is completed, and the evaporation is started to perform the evaporation; when the control mechanism 21 judges that the substrate 23 is not accurately aligned with the mask plate 2, steps S4 and S5 are repeated until the substrate 23 is accurately aligned with the mask plate 2.

[0072] By the above evaporation method, the substrate 23 can be accurately aligned with the mask plate 2, and the alignment speed is fast, which can greatly improve the product quality.

[0073] The above evaporation method is a one-time evaporation method, and when two-time evaporation is needed, the evaporation machine can be provided with two sets of film evaporation assemblies in the evaporation chamber, or two evaporation chambers, or multiple evaporation chambers, and any one set of evaporation chambers includes two evaporation chambers, which are respectively used for one-time evaporation with the evaporation pattern of the first mask plate 12 as the target and two-time evaporation with the evaporation pattern of the second mask plate 13 as the target. When two-time evaporation is performed, the above evaporation method is respectively run, so that the substrate 23 with the target evaporation pattern can be obtained, and the utilization rate of the substrate 23 is improved.

[0074] It should be noted that in step S2, after the mechanical fork 1 places the substrate 23 on the mask plate 2, the first driving mechanism 17 moves the connecting rod 5 downward to separate the supporting rod 3 from the connecting rod 5, and then moves the connecting rod 5 to a position away from the substrate 23 in the evaporation chamber to avoid that the connecting rod 5 is evaporated with the organic film during evaporation.

[0075] It should be further noted that when the adjusting mechanism 11 adjusts the position of the substrate 23, only fine adjustment is performed to accurately align the substrate 23 with the mask plate 2.

[0076] In the description of the embodiments of the present application, it should be noted that the terms "inner", "outer", "upper", "lower", "left", "right" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly used when the product of the present application is used, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second" and the like are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0077] In the description of the embodiments of the present application, it also needs to be explained that, unless explicitly specified and limited, the terms "set", "connected" should be understood broadly, for example, can be fixedly connected, can be detachably connected, or integrally connected; can be mechanically connected, can be directly connected, or indirectly connected through an intermediate medium, can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0078] It can be understood that, for those skilled in the art, equivalent replacements or changes can be made according to the technical solutions and inventive concepts of the present application, and all these changes or replacements shall belong to the protection scope of the claims attached to the present application.

Claims

1. A coating assembly, characterized by, The mechanical fork is used to move the substrate, and comprises a connecting rod and a plurality of parallel arranged support rods, and the plurality of support rods are used to support the substrate. The mask plate is used to define the evaporation area of the substrate, and is provided with a support groove for accommodating the support rod. The connecting rod is movably connected with one end of the support rod.

2. The coating assembly of claim 1, wherein, The support rod is provided with a plug-in part corresponding to the end of the connecting rod, and the connecting rod is provided with a plug-in groove corresponding to the position of the plug-in part, and the plug-in groove is matched with the plug-in part.

3. The coating assembly of claim 2, wherein, The mask plate comprises:

4. The coating assembly of claim 1, wherein, one or more mask pieces provided with pixel opening parts for defining the evaporation area of the substrate; a mask frame for supporting the mask pieces, and the support groove is arranged on the mask frame. The cross section of the support rod is in the shape of an inverted trapezoid, and the support groove is in the shape of an inverted trapezoid matched with the support rod.

5. The coating assembly of claim 4, wherein, The support groove is further provided with an adjusting mechanism for moving the support rod in the up, down, left, right, front and rear directions.

6. The coating assembly of claim 4, wherein, The mask plate comprises a first mask plate and a second mask plate, and the pixel opening parts in the first mask plate are complementary to the pixel opening parts of the second mask plate.

7. The coating assembly of claim 6, wherein, The mechanical fork comprises a first mechanical fork and a second mechanical fork, and the support rods of the first mechanical fork correspond to the support grooves in the first mask plate; the support rods of the second mechanical fork correspond to the support grooves in the second mask plate.

8. The coating assembly of claim 7, wherein, The coating assembly comprises the mask plate according to any one of claims 1-8.

9. An evaporation machine, characterized by The method for evaporation by using the evaporation machine according to claim 9 comprises the following steps:

10. An evaporation method, characterized by, Step S1. The mechanical fork receives the substrate sent into the evaporation chamber by the external mechanical arm; Step S2. The mechanical fork moves the substrate to the mask plate, and the connecting rod is separated from the support rod; Step S3. The position camera and the distance sensor acquire the position information of the substrate and transmit the position information to the control mechanism; Step S4. The control mechanism starts the work of the adjusting mechanism according to the position information of the substrate, and adjusts the position state of the substrate; Step S5. The position camera and the distance sensor check the position state of the substrate, and transmit the position information of the substrate to the control mechanism; Step S6. The control mechanism judges whether the substrate is accurately aligned with the mask plate, and when it is judged that the substrate is accurately aligned with the mask plate, the alignment is completed, and then the evaporation is started to perform the evaporation; when it is judged that the substrate is not accurately aligned with the mask plate, steps S4 and S5 are repeated until the substrate is accurately aligned with the mask plate. ​

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