mass spectrometer
The detachable sampling unit and second base section solve the problem of corrosion and deposition of ammonium phosphate gas on the exhaust path components of the quality analysis device, enabling convenient maintenance of the components and stable operation of the device.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHIMADZU SEISAKUSHO LTD
- Filing Date
- 2022-03-04
- Publication Date
- 2026-06-23
AI Technical Summary
In existing mass analysis devices, when ammonium phosphate is used as the mobile phase, the gas from ammonium phosphate is corrosive and can easily degrade the exhaust path components. It may also liquefy into viscous liquid deposits, leading to component corrosion and blockage.
A quality analysis device is designed, in which the sampling unit and the second base are detachably installed. By disassembling the sampling unit and the second base, the components in the exhaust path, including the sealing member and the shielding plate, can be easily cleaned or replaced. The device uses silicone rubber material to improve corrosion resistance.
It enables convenient maintenance of the exhaust path components, prevents corrosion and deposits, and ensures long-term stable operation of the device.
Smart Images

Figure CN117355922B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to a mass spectrometer. BACKGROUND
[0002] Generally, in a mass spectrometer, a sample is introduced into a plasma of an ion source to be ionized, and the ionized sample is introduced into a mass analysis section through a sampling section. On the other hand, argon gas used for plasma formation, or gas from a sample that is not introduced into the mass analysis section is discharged from the sampling section to a rotary pump as a backing pump through an exhaust path.
[0003] As a conventional mass spectrometer, Japanese Patent Laid-Open No. 2004-127709 (Patent Document 1) discloses a mass spectrometer combined with a liquid chromatograph to analyze a liquid sample.
[0004] PRIOR ART DOCUMENTS
[0005] PATENT DOCUMENTS
[0006] Patent Document 1: Japanese Patent Laid-Open No. 2004-127709 SUMMARY
[0007] [PROBLEMS TO BE SOLVED BY THE INVENTION]
[0008] In a case where a liquid sample is analyzed in combination with a liquid chromatograph as disclosed in Patent Document 1, there is a case where ammonium phosphate is used as a mobile phase (solvent). Gas from ammonium phosphate is corrosive, and there is a risk that components constituting an exhaust path will be deteriorated. Furthermore, there is a concern that the gas will be liquefied, and deposited as a liquid substance having viscosity on components of the exhaust path leading to the mass analysis section, and the surrounding structure.
[0009] The present application has been achieved in view of the problems as described above, and an object of the present application is to provide a mass spectrometer in which maintenance can be easily performed on components of a path from a sampling section to a housing in which a mass analysis section is provided, among components constituting an exhaust path for discharging gas from the sampling section.
[0010] [MEANS OF SOLVING THE PROBLEMS]
[0011] A mass spectrometer according to the present disclosure includes a housing portion having a wall portion, the housing portion provided with a mass analyzing portion; a base portion provided to the wall portion; a sampling unit configured to guide an ionized sample toward the mass analyzing portion, the sampling unit detachably mounted to the base portion; and an exhaust path for exhausting gas from the sample that is not introduced into the mass analyzing portion from the sampling unit. The exhaust path includes a first path provided to the sampling unit; a second path communicated with the first path, provided to the base portion; and a third path communicated with the second path, provided to the housing portion. The base portion includes a first base portion fixed to the wall portion; and a second base portion provided with the second path, the second base portion detachably fixed to the first base portion.
[0012] According to the configuration, by detaching the sampling unit from the base portion, and further detaching the second base portion from the first base portion, maintenance of the components of the first path and the second path from the sampling unit to the housing provided with the mass analyzing portion in the exhaust path can be easily performed.
[0013] [Effects of the Invention]
[0014] According to the present disclosure, a mass spectrometer in which maintenance of the components of the path from the sampling unit to the housing provided with the mass analyzing portion in the exhaust path for exhausting gas from the sampling unit can be easily performed can be provided. BRIEF DESCRIPTION OF DRAWINGS
[0015] Figure 1 is a schematic view of a mass spectrometer according to an embodiment.
[0016] Figure 2 is a view showing the configuration of the periphery of a sampling unit of a mass spectrometer according to an embodiment.
[0017] Figure 3 is a perspective view showing a base portion and a sampling unit according to an embodiment.
[0018] Figure 4 is an exploded perspective view of a sampling unit according to an embodiment.
[0019] Figure 5 is a perspective view of a base portion according to an embodiment.
[0020] Figure 6 is a cross-sectional view taken along the line VI-VI shown in Figure 2 .
[0021] Figure 7 is a view showing an open state of a baffle mechanism provided to a mass spectrometer according to an embodiment.
[0022] Figure 8 FIG. 5 is a view showing a closed state of a baffle mechanism provided in a mass spectrometer according to an embodiment.
[0023] Figure 9 FIG. 6 is a view showing a case where a gas from a sample flows in an exhaust path according to the embodiment.
[0024] Figure 10 FIG. 7 is a perspective view showing a state where a sampling unit according to the embodiment is detached.
[0025] Figure 11 FIG. 8 is a perspective view showing a case where the second base portion is detached from the base portion according to the embodiment.
[0026] Figure 12 FIG. 9 is a perspective view showing a state where the second base portion is detached from the base portion according to the embodiment.
[0027] [Explanation of Symbols]
[0028] 1: Mass spectrometer
[0029] 10: Plasma torch
[0030] 11: Cooling gas tube
[0031] 12: High-frequency induction coil
[0032] 20: Sampling unit
[0033] 21: First plate-shaped body
[0034] 22: Second plate-shaped body
[0035] 22g: Fastening member
[0036] 30: Mass analysis portion
[0037] 31: First chamber
[0038] 32: Second chamber
[0039] 33: Housing portion
[0040] 33a: Wall portion
[0041] 33cl: First recessed portion
[0042] 33c2: Second recessed portion
[0043] 33hl, 33h2: Opening portion
[0044] 34: Ion lens portion
[0045] 35: Housing portion
[0046] 36: Mass separation portion
[0047] 37: Detector
[0048] 38: Vacuum pump
[0049] 38b: Exhaust path for high vacuum
[0050] 39: Vacuum pump
[0051] 39b: Exhaust path for high vacuum
[0052] 41: Refrigerant Supply Department
[0053] 42: Power supply
[0054] 43: Gas supply source
[0055] 51: Sampling cone
[0056] 51a: Opening
[0057] 51b: Fastening components
[0058] 52: Cutting the cone
[0059] 52a: Opening
[0060] 53: Lead-out electrode
[0061] 53a: Cylindrical section
[0062] 60: Baffle mechanism
[0063] 61: First baffle section
[0064] 62: Second baffle section
[0065] 63: Maintaining Department
[0066] 64: Drive mechanism
[0067] 65: Control Department
[0068] 70: Base section
[0069] 71: First base section
[0070] 71a: Main face
[0071] 71c: Concave
[0072] 71e1: First Holding Section
[0073] 71e2: Second retaining part
[0074] 71h1, 71h2: Openings
[0075] 71i: Step difference part
[0076] 72: Second base section
[0077] 72g: Fastening component
[0078] 72f: Positioning section
[0079] 72h: Opening
[0080] 73: Flange portion
[0081] 80: Exhaust path
[0082] 81: First Path
[0083] 82: Second Path
[0084] 83: The Third Path
[0085] 85: Vacuum pump
[0086] 91, 92, 94, 95: Sealing components
[0087] 611: First shielding plate
[0088] 612: First Installed Part
[0089] 613: Fastening components
[0090] 621: Second shielding plate
[0091] 622: Second Installed Part
[0092] 623: Fastening components Detailed Implementation
[0093] Hereinafter, embodiments of the present invention will be described in detail with reference to the figures. Furthermore, in the embodiments shown below, the same or common parts are labeled with the same symbols as in the figures, and their descriptions will not be repeated.
[0094] Figure 1 This is a schematic diagram of the quality analysis device implemented in this way. Figure 2 This is a diagram showing the structure of the periphery of the sampling section of the quality analysis apparatus according to an embodiment. (Refer to...) Figure 1 and Figure 2 The quality analysis device 1 of the embodiment will be described.
[0095] like Figure 1 As shown, the mass analysis apparatus 1 of Embodiment 1 includes: a plasma torch 10 as a plasma ion source, a sampling unit 20, a mass analysis unit 30, a baffle mechanism 60, a base 70, an exhaust path 80, a vacuum pump 38 and a vacuum pump 39, a refrigerant supply unit 41, a power supply 42, and a gas supply source 43.
[0096] like Figure 1 andFigure 2 As shown, the plasma torch 10 includes: a sample gas tube (not shown), a plasma gas tube (not shown), a cooling gas tube 11, a high-frequency induction coil 12, and a gas inlet (not shown).
[0097] The sample gas tube is cylindrical and made of glass. A plasma gas tube covers the outer periphery of the sample gas tube with a gap. The plasma gas tube is cylindrical and made of glass. A cooling gas tube 11 covers the outer periphery of the plasma gas tube with a gap. The cooling gas tube 11 is cylindrical and made of glass. A high-frequency induction coil 12 is wound around the front end portion of the outer periphery of the cooling gas tube 11. A gas inlet is connected to a gas supply source 43 and is supplied with argon or the like.
[0098] The sampling unit 20 is arranged facing the plasma torch 10. The sampling unit 20 is detachably mounted on the base 70. A refrigerant flow path is formed in the sampling unit 20 for flowing refrigerant such as cooling water. Refrigerant is supplied from the refrigerant supply unit 41 to the refrigerant flow path.
[0099] The sampling unit 20 includes a first plate-shaped body 21 and a second plate-shaped body 22 constituting the housing of the unit. Furthermore, the sampling unit 20 includes a sampling cone 51, a snipping cone 52, and a lead-out electrode 53. These sampling cones 51, snipping cones 52, and lead-out electrodes 53 are arranged sequentially in the direction from the plasma torch 10 toward the mass analysis unit 30. Additionally, the following uses... Figure 3 and Figure 4 The sampling cone 51, the cutting cone 52, and the lead-out electrode 53 are described in detail.
[0100] The base portion 70 is disposed on the wall portion 33a of the housing portion 33, as described below. The base portion 70 is the part for mounting the sampling unit 20. The base portion 70 has a generally plate-like shape. Furthermore, it will be referred to below as... Figure 5 The base portion 70 will be described in detail.
[0101] The mass analysis unit 30 includes a first chamber 31 and a second chamber 32. The first chamber 31 includes a housing portion 33 and an ion lens portion 34. The housing portion 33 is formed of a metallic material such as aluminum. The housing portion 33 includes a wall portion 33a facing the plasma torch 10. Furthermore, the ion lens portion 34, such as a focusing lens, is housed inside the housing portion 33.
[0102] The second chamber 32 is disposed adjacent to the first chamber 31. The second chamber 32 is located on the ion travel direction side relative to the first chamber 31. Furthermore, the ion travel direction is parallel to the direction in which the plasma torch 10 and the sampling unit 20 are arranged in sequence.
[0103] The second chamber 32 includes a housing 35, a mass separation unit 36, and a detector 37. The housing 35 is disposed continuously with the housing 33. The housing 35 is formed of a metallic material such as aluminum. Inside the housing 35, the mass separation unit 36 and the detector 37 are arranged sequentially along the ion travel direction. The mass separation unit 36 includes, for example, a quadrupole structure. The detector 37 includes an electron multiplier, etc.
[0104] The housing 33 is connected to a vacuum pump 38 via a high-vacuum exhaust path 38b. The vacuum pump 38 is, for example, a turbomolecular pump. By driving the vacuum pump 38, a high vacuum state can be achieved inside the housing 33. The vacuum level inside the housing 33 can be, for example, set to 0.1 Pa.
[0105] The housing 35 is connected to a vacuum pump 39 via a high-vacuum exhaust path 39b. The vacuum pump 39 is, for example, a turbomolecular pump. By driving the vacuum pump 39, a high-vacuum state can be achieved within the housing 35. The housing 35 can, for example, be configured with a vacuum level of 10... -4 Pa.
[0106] The baffle mechanism 60 includes a first baffle portion 61 and a second baffle portion 62. The first baffle portion 61 is configured to block the path from the opening 71h1 provided in the base portion 70 to the interior of the housing portion 33. The first baffle portion 61 can switch between a state where the opening 71h1 is connected to the interior of the housing portion 33 and a state where they are not connected. The second baffle portion 62 is configured to switch between a state where the second path 82 and the third path 83 of the exhaust path 80 described below are connected to the exhaust path 80 and a state where they are not connected. Furthermore, the following uses... Figure 7 and Figure 8 The baffle mechanism 60 is described in detail.
[0107] In the mass analysis apparatus 1, plasma is generated by flowing a high-frequency current through the high-frequency induction coil 12 of the plasma torch 10, and the sample is ionized by the high heat of the plasma. The ionized sample (ions) and plasma pass through the opening 51a of the sampling cone 51 and are introduced into the sampling unit 20. The ions introduced into the sampling unit 20 pass through the opening 52a of the cutting cone 52 and the cylindrical portion 53a of the lead-out electrode 53 and are introduced into the housing portion 33.
[0108] Ions introduced into the housing 33 converge toward the second chamber 32 located at the rear of the travel direction via the ion lens 34. A voltage, formed by superimposing a DC voltage and a high-frequency voltage, is applied to the mass separation section 36, causing only ions with a mass number (mass m / charge z) corresponding to the applied voltage to selectively pass through the mass separation section 36. As described above, by operating the applied voltage, the ion intensity signal of ions with a specified mass number can be detected using the detector 37.
[0109] Exhaust path 80 is a flow path used to discharge gases from the sample that have not been introduced into the mass analysis unit 30 from the sampling section (sampling unit 20). Exhaust path 80 is connected to vacuum pump 85. Vacuum pump 85 is, for example, a rotary pump. By driving vacuum pump 85, a low vacuum state of about 100 to 150 Pa can be achieved inside sampling unit 20.
[0110] The exhaust path 80 includes a first path 81, a second path 82, and a third path 83. These first paths 81, second paths 82, and third paths 83 are connected sequentially.
[0111] The first path 81 is disposed in the sampling unit 20. The second path 82 is disposed in the base portion 70. The second path 82 is connected to the first path 81. The third path 83 is disposed in the housing portion 33. One end of the third path 83 is connected to the second path 82, and the other end is connected to the vacuum pump 85.
[0112] The gas generated from the sample during sample ionization is discharged through exhaust path 80 by driving the vacuum pump 85.
[0113] Figure 3 This is a perspective view showing the base and sampling unit of the embodiment. Figure 4 This is an exploded perspective view of the sampling unit in the implementation method. Figure 5 This is a perspective view of the base portion according to the embodiment. (Refer to...) Figure 3 to Figure 5 The sampling unit 20 and the base 70 will be described.
[0114] like Figure 3 and Figure 4 As shown, the sampling unit 20, as described above, includes: a first plate-shaped body 21, a second plate-shaped body 22, a sampling cone 51, a cutting cone 52, and an output electrode 53. The first plate-shaped body 21 is fixed to the second plate-shaped body 22 by fastening members such as screws (not shown).
[0115] The sampling cone 51 is a metal body, comprising a circular plate portion and a conical portion formed at the center of the circular plate portion. An opening 51a is formed at the center of the conical portion. The diameter of the opening 51a gradually increases in the direction of ion travel. The sampling cone 51 is detachably fixed to the first plate-shaped body 21, for example, by a fastening member 51b such as a screw.
[0116] The sampling cone 52 is a metallic body comprising a circular plate portion and a conical portion formed at the center of the circular plate portion. The circular plate portion of the sampling cone is smaller than the circular plate portion of the sampling cone 51. A circular opening 52a is formed at the center of the circular plate portion. The diameter of the opening 52a gradually increases in the direction of ion travel. The sampling cone 52 is detachably fixed to the surface side of the second plate-shaped body 22, for example, by fastening members such as screws (not shown). Furthermore, the surface of the second plate-shaped body 22 is the main surface located on the side of the first plate-shaped body 21, facing the plasma torch 10.
[0117] The lead-out electrode 53 is a metallic body, comprising a circular plate portion and a cylindrical portion 53a formed in the center of the circular plate portion. The lead-out electrode 53 is connected to the power supply 42 (see reference). Figure 1 A voltage of approximately 0V to 700V is applied to the plate. The lead-out electrode 53 is detachably fixed to the back side of the second plate 22 by fastening members such as screws (not shown). Furthermore, the back side of the second plate 22 is the main surface opposite to the side where the first plate 21 is located, and it faces the wall portion 33a of the housing portion 33.
[0118] like Figure 3 and Figure 5 As shown, the base portion 70 includes a first base portion 71 and a second base portion 72.
[0119] The first base portion 71 and the second base portion 72 are arranged along a first direction (DR1 direction) when viewed from a direction perpendicular to the wall portion 33a (arrow AR3 direction). Furthermore, the direction perpendicular to the wall portion 33a is parallel to the direction in which the plasma torch 10 is opposite to the sampling unit 20.
[0120] The first base portion 71 has a generally plate-like shape. The first base portion 71 is provided with an opening 71h1, a first retaining portion 71e1, a second retaining portion 71e2, and a recess 71c. The opening 71h1 is located approximately at the center of the first base portion 71. The recess 71c is located on one side in a first direction. The recess 71c has an opening 71h2 extending through the thickness direction (AR3 direction). The second base portion 72 is detachably mounted to the recess 71c.
[0121] The first holding portion 71e1 and the second holding portion 71e2 are mainly used to hold the sampling unit 20. Furthermore, the first holding portion 71e1 and the second holding portion 71e2 function to guide the sampling unit 20 when it is installed on the base portion 70 or when it is disassembled. Moreover, the first holding portion 71e1 and the second holding portion 71e2 also function as positioning portions for positioning the sampling unit 20 in the second direction.
[0122] The first retaining portion 71e1 and the second retaining portion 71e2 are provided to extend along a first direction. The first retaining portion 71e1 and the second retaining portion 71e2 are arranged along a second direction orthogonal to the first direction. Furthermore, the second direction is, for example, a direction parallel to the up-down direction (vertical direction).
[0123] The first holding part 71e1 is disposed at one end of the first base part 71 in the second direction. The first holding part 71e1 is disposed at one end (lower end) of the sampling unit 20 in the second direction in a snap-fit manner.
[0124] The first retaining portion 71e1 is provided such that it extends to the side of the second base portion 72 when viewed from the AR3 direction. The first retaining portion 71e1 is provided such that it includes a portion overlapping the second base portion 72 when viewed from the AR3 direction. The first retaining portion 71e1 is provided such that it can retain one end of the second base portion 72 in the second direction. Specifically, the first retaining portion 71e1 retains one end (lower end) of the second base portion 72 by pushing the second base portion 72 towards the wall portion 33a.
[0125] The second holding part 71e2 is disposed on the other end side of the first base part 71 in the second direction. The second holding part 71e2 is disposed on the other end (upper end) side of the sampling unit 20 in the second direction in a snap-fit manner. The second holding part 71e2 is disposed in a manner that does not overlap with the second base part 72 when viewed from the AR3 direction.
[0126] The second base portion 72 has a generally plate-like shape. The second base portion 72 is located on one side of the first direction when viewed from the AR3 direction. The second base portion 72 is arranged in such a way that, when viewed from the AR3 direction, it is on the same plane as the main surface 71a of the first base portion 71 exposed from the second base portion 72.
[0127] The second base portion 72 includes a first portion R1 and a second portion R2. The first portion R1 is embedded in the opening 71h2 of the first base portion 71. The first portion R1 has an opening 72h that extends through the thickness direction (AR3 direction). The opening 72h forms the second path 82.
[0128] A positioning part 72f is provided in the first part R1. The end of the sampling unit 20, located on one side in the first direction, abuts against the positioning part 72f. Thus, the positioning part 72f determines the position of the sampling unit 20 in the first direction. The positioning part 72f is provided in a manner that protrudes from the surface of the second base part 72 in a direction perpendicular to the surface. The positioning part 72f is formed by screws or the like, which are mounted on the surface of the second base part 72.
[0129] The second part R2 is arranged, for example, around the first part R1. The second part R2 overlaps the first base part 71 along the AR3 direction. The second part R2 functions as an overlapping portion that partially overlaps the first base part 71.
[0130] The second part R2 is detachably fixed to the first base part 71 by one or more fastening members (first fastening members) 72g. In this embodiment, by setting the number of fastening members 72g to one, the installation or removal of the second base part 72 relative to the first base part 71 becomes simple.
[0131] Specifically, when the second base portion 72 is installed on the first base portion 71, the lower end of the second base portion 72 is inserted into the gap between the first retaining portion 71e1 and the recess 71c of the first base portion 71, and the second portion R2 is embedded in the opening 71h2. Then, the upper end of the second base portion 72 is fixed to the recess 71c using the fastening member 22g.
[0132] When fixing the sampling unit 20 to the base portion 70, one end of the sampling unit 20 located on one side of the first direction is inserted between the first holding portion 71e1 and the second holding portion 71e2, facing one side of the first direction. Then, the lower and upper ends of the sampling unit 20 are slid to the first holding portion 71e1 and the second holding portion 71e2, and one end of the sampling unit 20 located on one side of the first direction is abutted against the positioning portion 72f. This positions the sampling unit 20, and the first holding portion 71e1 and the second holding portion 71e2 hold the sampling unit 20. Next, the second plate-shaped body 22 of the sampling unit 20 is detachably fixed to the first base portion 71 using the fastening member 22g.
[0133] Figure 6 It is along Figure 2 The cross-sectional view of line VI-VI is shown. Figure 6 As shown, a first recess 33c1 and a second recess 33c2 are provided in the wall portion 33a of the housing portion 33.
[0134] A first recess 33c1 is provided in the wall portion 33a facing the lead-out electrode 53. The first recess 33c1 is recessed along the thickness direction (AR3 direction) of the wall portion 33a. An opening 33h1 for communicating with the interior of the housing portion 33 is provided in the first recess 33c1. A groove is provided in the portion of the first recess 33c1 surrounding the opening 33h1. A sealing member 91 such as an O-ring is disposed in the groove.
[0135] A first recess 33c1 is provided, and a gap S1 is provided between the wall portion 33a and the first base portion 71. A first shielding plate 611 of the first baffle portion 61 is arranged in the gap S1 in a height-adjustable manner (see reference). Figure 7 With the opening 33h1 covered by the first shielding plate 611, the sealing member 91 provides an airtight seal between the back of the first shielding plate 611 and the first recess 33c1.
[0136] A second recess 33c2 is provided in the wall portion 33a facing the second base portion 72. The second recess 33c2 is recessed along the thickness direction of the wall portion 33a. An opening 33h2 is provided in the second recess 33c2 for connecting to the second path 82. The opening 33h2 forms part of the third path 83. A groove is provided in the second recess 33c2 in the portion surrounding the opening 33h2. A sealing member 92, such as an O-ring, is disposed in the groove.
[0137] A gap S2 is formed between the wall portion 33a and the second base portion 72 by providing a second recess 33c2. A second shielding plate 621 of the second baffle portion 62 is configured in a height-adjustable manner within this gap S2. Figure 7 With the second shielding plate 621 covering the opening 33h2, the sealing member 92 provides an airtight seal between the back of the second shielding plate 621 and the second recess 33c2.
[0138] Furthermore, a groove is provided on the surface side of the first base portion 71 around the opening 71h1 of the first base portion 71, and a sealing member 93 is disposed in the groove. The sealing member 93 is sandwiched between the first base portion 71 and the second plate-shaped body 22. Thus, the opening 71h1 is maintained to be airtight.
[0139] Furthermore, a stepped portion 71i is provided around the opening 71h2 of the first base portion 71, and a sealing member 95 is also disposed on the stepped portion 71i. The sealing member 95 is sandwiched between the flange portion 73 of the second base portion 72 located around the first portion R1. Moreover, a sealing member 94 is also disposed on the surface of the second base portion 72 in a groove provided around the opening 72h. The sealing member 94 is sandwiched between the back side of the second plate-shaped body 22 and the surface of the second base portion 72. As described above, by providing the sealing members 94 and 95, the opening 72h is maintained to be airtight.
[0140] Figure 7 This diagram shows the open state of the baffle mechanism provided by the quality analysis device in the embodiment. Figure 8 This diagram shows the closed state of the baffle mechanism included in the quality analysis device of the embodiment. (Refer to...) Figure 7 and Figure 8 The baffle mechanism 60 is described in detail.
[0141] like Figure 7 and Figure 8 As shown, the baffle mechanism 60 includes: a first baffle portion 61, a second baffle portion 62, a holding portion 63, a drive mechanism 64, and a control portion 65.
[0142] The first baffle portion 61 includes a first shielding plate 611, a first mounting portion 612, and a fastening member 613. As described above, the first shielding plate 611 is provided in a manner that allows it to move up and down within the first recess 33c1. Thus, the first shielding plate 611 blocks the opening 33h1 provided in the housing portion 33 in a manner that allows it to open and close.
[0143] The first shielding plate 611 has a plate-like shape. The lower part of the first shielding plate 611 is detachably fastened to the upper part of the first mounting portion 612 by a fastening member 613. The first mounting portion 612 is configured to be approximately rod-shaped. The first mounting portion 612 extends in the vertical direction. The first mounting portion 612 is held by a retaining portion 63.
[0144] The second baffle portion 62 includes a second shielding plate 621, a second mounting portion 622, and a fastening member (second fastening member) 623. As described above, the second shielding plate 621 is provided in a manner that allows it to rise and fall within the second recess 33c2. By raising and lowering the second shielding plate 621, the second baffle portion 62 switches between a connected state where the second path 82 and the third path 83 are connected and a blocked state where they are blocked.
[0145] More specifically, the second shielding plate 621 is disposed between the open end of the second path 82 located on the side of the third path 83 and the open end of the third path 83 located on the side of the second path 82. It is set to the blocking state by blocking the open end of the second path 82 and the open end of the third path 83, and is set to the connecting state by opening the open end of the second path 82 and the open end of the third path 83.
[0146] The second shielding plate 621 has a plate-like shape. The lower part of the second shielding plate 621 is detachably fastened to the upper part of the second mounting portion 622 by a fastening member 623. The second mounting portion 622 is generally rod-shaped. The second mounting portion 622 extends in the vertical direction. The second mounting portion 622 is held by a retaining portion 63.
[0147] The holding unit 63 holds the first mounted part 612 and the second mounted part 622. The holding unit 63 is raised and lowered by the drive mechanism 64. The operation of the drive mechanism 64 is controlled by the control unit 65.
[0148] By raising and lowering the holding part 63, the first mounted part 612 and the second mounted part 622 held by the holding part 63 are raised and lowered, thereby raising and lowering the first shielding plate 611 and the second shielding plate 621 mounted on the first mounted part 612 and the second mounted part 622.
[0149] Furthermore, in this embodiment, the case where the first mounted part 612 and the second mounted part 622 rise and fall simultaneously has been described, but it is also possible to configure the first mounted part 612 and the second mounted part 622 to rise and fall separately by being held by different holding parts.
[0150] Figure 9 This is a diagram showing the flow of gas from the sample in the exhaust path of the embodiment. (As shown) Figure 9 As shown, the gas from the sample is discharged through exhaust path 80, as indicated by the arrow.
[0151] Here, when analyzing the sample in combination with a liquid chromatograph, ammonium phosphate is sometimes used as the mobile phase (solvent). In this case, when the sample is ionized, gas from ammonium phosphate is generated as a gas from the sample. The gas from ammonium phosphate is corrosive and may degrade the components constituting the exhaust path 80 or deposit as a viscous liquid on the surrounding structural components.
[0152] In particular, liquids tend to deposit in the gap S2 between the wall portion 33a and the second base portion 72, and easily adhere to the back side of the second base portion 72. Furthermore, the second shielding plate 621 can slide on the back side of the second base portion 72. Therefore, the second shielding plate 621 is also easily contaminated and corroded.
[0153] Furthermore, the liquid adheres to the sealing member 92, which is disposed around the opening 33h2 and exposed to the gap S2. Moreover, the gas enters from the gap S2 into the gap between the first base portion 71 and the second base portion 72, or into the gap between the second plate-shaped body 22 and the second base portion 72, causing the liquid to adhere to the sealing member 94 and the sealing member 95.
[0154] When the sealing components 92, 94, and 95 are formed of silicone rubber, the silicone rubber is corrosion-resistant to the gas, thus suppressing the deterioration of the sealing components 92, 94, and 95 caused by the gas. On the other hand, for long-term stable use of the quality analysis device 1, it is preferable to clean or replace the sealing components 92, 94, and 95.
[0155] As described above, the second base portion 72 constituting the second path 82 and the components surrounding the second base portion 72 are relatively susceptible to the influence of gas.
[0156] In this embodiment, by disassembling the sampling unit 20 and the second base portion 72, components that are prone to liquid adhesion can be easily maintained.
[0157] Figure 10 This is a perspective view showing the state of the sampling unit of the implementation method after it has been disassembled. Figure 11 This is a perspective view showing the case where the second base part is disassembled from the base part of the embodiment. Figure 12 This is a perspective view showing the state where the second base portion has been removed from the base portion of the embodiment. (Refer to...) Figure 10 to Figure 12 The maintenance of the components is explained.
[0158] When performing maintenance on the component, firstly, the sampling unit 20 is removed from the base portion 70. During removal of the sampling unit 20, the fastening member 22g is removed from the second plate-shaped body 22. Next, the sampling unit 20 is moved towards the other side in the second direction, causing the first holding portion 71e1 and the second holding portion 71e2 to slide. This allows the sampling unit 20 to be removed. The removed sampling unit 20 can be appropriately disassembled and cleaned. Figure 10 As shown, with the sampling unit 20 removed, the base portion 70 is exposed.
[0159] like Figure 11As shown, the second base portion 72 is then disassembled. When disassembling the second base portion 72, the fastening member 72g that secures the second base portion 72 to the first base portion 71 is loosened. Next, the second base portion 72 is tilted to separate its upper side from the wall portion 33a. In this state, the second base portion 72 is lifted upwards, and pulled out between the first retaining portion 71e1 and the first base portion 71. The sealing member 94 disposed around the opening portion 72h can be removed from the second base portion 72 in this way for cleaning or replacement with a new sealing member. Furthermore, the back side of the second base portion 72, where liquids easily adhere, can also be cleaned. As a result, the second base portion 72 and the sealing member 94, which are susceptible to gas influence, can be easily maintained.
[0160] like Figure 12 As shown, with the second base portion 72 removed from the first base portion 71, the fastening member 623 of the second baffle portion 62 is exposed to the outside. Furthermore, with the fastening member 623 exposed to the outside, the second baffle portion 62 can be in a closed state or an open state.
[0161] With the fastening member 623 exposed, the second shielding plate 621 can be removed by loosening the fastening member 623. This allows for cleaning or replacement of the second shielding plate 621. Furthermore, the sealing member 95, which is sandwiched between the second base portion 72 and the first base portion 71, can also be removed, allowing for cleaning or replacement of the sealing member 95. As a result, the second shielding plate 621 and the sealing member 95, which are susceptible to gas exposure, can be easily maintained.
[0162] As described above, in this embodiment, the sampling unit 20 is removed from the base portion 70, and then the second base portion 72 is removed from the first base portion 71. As a result, the components that constitute the first path 81 and the second path 82 of the exhaust path 80, from the sampling portion to the housing portion 33 where the mass analysis portion 30 is provided, can be easily maintained.
[0163] Furthermore, in the described embodiment, the case in which the second base portion 72 is fixed to the first base portion 71 by the first retaining portion 71e1 and the fastening member 22g has been illustrated. However, as long as the second base portion 72 is fixed to the first base portion 71 in a detachable manner, a suitable method can be used for fixing.
[0164] (Note)
[0165] [Construction 1]
[0166] A quality analysis device, comprising:
[0167] The housing portion has a wall portion, and the housing portion is provided with a mass analysis portion;
[0168] A base portion is disposed on the wall portion;
[0169] A sampling unit, configured to guide an ionized sample to the mass analysis section, is detachably mounted to the base section; and
[0170] An exhaust path is provided to discharge gas from the sampling unit that was not introduced into the mass analysis unit.
[0171] The exhaust path includes: a first path disposed in the sampling unit; a second path connected to the first path and disposed in the base portion; and a third path connected to the second path and disposed in the housing portion.
[0172] The base portion includes: a first base portion fixed to the wall portion; and a second base portion having the second path.
[0173] The second base portion is fixed to the first base portion in a detachable manner.
[0174] [Construction 2]
[0175] As described in Construction 1, the mass analysis apparatus, wherein...
[0176] The first base portion and the second base portion are arranged along a first direction when viewed from a direction perpendicular to the wall portion.
[0177] The second base portion includes an overlapping portion that partially overlaps the first base portion in a direction perpendicular to the wall portion.
[0178] A retaining portion is provided in the first base portion, and the retaining portion holds the end side of the second base portion located on one side of a second direction orthogonal to the first direction.
[0179] At least one of the overlapping portions is detachably fastened to the first base portion by a first fastening member.
[0180] [Construction 3]
[0181] The mass analysis apparatus as described in configuration 1 or configuration 2 further includes: a sealing member disposed between the first base portion and the second base portion to airtightly seal the space between the first base portion and the second base portion.
[0182] The sealing member is formed of silicone rubber.
[0183] [Construction 4]
[0184] The quality analysis apparatus described in any one of configurations 1 to 3 further includes: a baffle portion configured to block the second path and the third path.
[0185] A gap is formed between the second base portion and the wall portion where the third path is provided.
[0186] The baffle portion is disposed in the gap.
[0187] [Construction 5]
[0188] As described in construction 4, the mass analysis apparatus, wherein...
[0189] The baffle portion includes: a shielding plate; a mounting portion for mounting the shielding plate; and a second fastening member for detachably fastening the shielding plate to the mounting portion.
[0190] With the second base portion removed from the first base portion, the second fastening member is exposed to the outside.
[0191] The embodiments described above are illustrative in all respects and are not intended to be limiting. The scope of this invention is defined by the scope of the claims, including all modifications within the scope of the claims.
Claims
1. A quality analysis device, characterized in that, include: The housing portion has a wall portion, and the housing portion is provided with a mass analysis portion; A base portion is disposed on the wall portion; A sampling unit is configured to guide an ionized sample to the mass analysis unit, and the sampling unit is detachably mounted to the base. as well as An exhaust path is provided to discharge gas from the sampling unit that was not introduced into the mass analysis unit. The exhaust path includes: a first path disposed in the sampling unit; a second path connected to the first path and disposed in the base portion; and a third path connected to the second path and disposed in the housing portion. The base portion includes: a first base portion fixed to the wall portion; and a second base portion having the second path. The second base portion is fixed to the first base portion in a detachable manner.
2. The quality analysis device according to claim 1, characterized in that, The first base portion and the second base portion are arranged along a first direction when viewed from a direction perpendicular to the wall portion. The second base portion includes an overlapping portion that partially overlaps the first base portion in a direction perpendicular to the wall portion. A retaining portion is provided in the first base portion, and the retaining portion holds the end side of the second base portion located on one side of a second direction orthogonal to the first direction. At least one of the overlapping portions is detachably fastened to the first base portion by a first fastening member.
3. The quality analysis apparatus according to claim 1 or 2, characterized in that, Also includes: A sealing member is disposed between the first base portion and the second base portion to provide an airtight seal between the first base portion and the second base portion. The sealing member is formed of silicone rubber.
4. The quality analysis apparatus according to claim 1 or 2, characterized in that, Also includes: The baffle is configured to switch between a state where the second path and the third path are connected and a state where they are blocked. A gap is formed between the second base portion and the wall portion where the third path is provided. The baffle portion is disposed in the gap.
5. The quality analysis apparatus according to claim 4, characterized in that, The baffle portion includes: a shielding plate; a mounting portion for mounting the shielding plate; and a second fastening member for detachably fastening the shielding plate to the mounting portion. With the second base portion removed from the first base portion, the second fastening member is exposed to the outside.