Liquid supply device and substrate cleaning method

Abstract

This invention proposes a liquid supply device and a substrate cleaning method. The liquid supply device includes a nozzle, the liquid inlet of which can adopt a tangential liquid inlet to promote gas-liquid separation using centrifugal force; a plate-shaped separation section or a cylindrical separation section can be provided above the liquid outlet of the nozzle to suppress the discharge of air bubbles from the liquid outlet; the nozzle can have an upper and lower chamber structure, with exhaust ports in both chambers to achieve secondary exhaust; both chambers can also be equipped with liquid inlets to allow the processing liquid to be mixed twice, which reduces the amount and rate of gas generation compared to single mixing; it also includes a control unit and a liquid level sensor. The control unit adjusts the opening of the regulating valve on the exhaust line of the nozzle based on the liquid level detection signal obtained by the liquid level sensor, so as to maintain a stable liquid level in the nozzle, which helps to reduce the flow fluctuation when the nozzle supplies liquid to the substrate and improves the uniformity and reliability of liquid treatment.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing equipment, and in particular to a liquid supply device and a substrate cleaning method. Background Technology

[0002] Chip manufacturing processes involve numerous cleaning steps to remove polymers. SPM (a mixture of H₂SO₄ and H₂O₂) is typically used for this purpose. The mixture of H₂SO₄ and H₂O₂ forms carboxylic acid, which has very strong oxidizing properties. This carboxylic acid reacts rapidly with organic residues on the wafer surface to form H₂SO₄, CO₂, and H₂O, thus achieving rapid removal of these residues.

[0003] Temperature and volume ratio are the two major factors determining the efficiency of organic matter removal in SPM. In single-plate SPM processes, H2SO4 and H2O2 are usually mixed in the liquid supply line or in the liquid supply nozzle to obtain higher reaction temperature and reaction activity.

[0004] When H2O2 comes into contact with high-temperature H2SO4, it decomposes to produce O2. The mixing of H2SO4 and H2O2 is an exothermic reaction. After mixing, the temperature of the SPM can usually reach 180℃~220℃. This will cause some of the mixed liquid to vaporize. The oxygen produced by decomposition and the steam produced by high-temperature vaporization will cause the sprayed SPM to carry air masses, which can easily cause liquid splashing and affect the stability and uniformity of the liquid supply. Summary of the Invention

[0005] The purpose of this invention is to provide a liquid supply device and a substrate cleaning method to solve the problem of how to achieve stable liquid supply to a liquid containing gas in the prior art.

[0006] To achieve the above and other related objectives, the present invention provides a liquid supply device, including a nozzle having an internal cavity, the nozzle comprising:

[0007] Liquid inlet, used to introduce liquid into the cavity;

[0008] A liquid outlet is located at the bottom of the cavity and is used to drain liquid from the cavity.

[0009] An exhaust port, located at the top of the cavity, is used to expel gas from the cavity.

[0010] The separation section is cylindrical, located above the liquid outlet and inside the cavity. The separation section includes a cylindrical body with multiple oblique holes on its side wall. When viewed from the inside of the cylindrical body to the outside, the multiple oblique holes are inclined upwards. The bottom of the cylindrical body is open and communicates with the liquid outlet.

[0011] The present invention also provides another liquid supply device, including a nozzle having an internal cavity, the nozzle comprising:

[0012] The first liquid inlet is tangential to the side wall of the cavity, and is used to allow the first liquid to enter the cavity of the nozzle tangentially;

[0013] The second liquid inlet is tangential to the side wall of the cavity and is used to allow the second liquid to enter the cavity of the nozzle tangentially. The first liquid and the second liquid rotate in the same direction after entering the cavity.

[0014] A liquid outlet is located at the bottom of the cavity and is used to discharge a mixture of the first liquid and the second liquid from the cavity.

[0015] The exhaust port is located at the top of the cavity and is used to discharge gas from the cavity.

[0016] The present invention also provides another liquid supply device, including a nozzle having an internal cavity, the nozzle comprising:

[0017] The mixture inlet is tangential to the side wall of the cavity, and is used to allow a mixture of at least two liquids to enter the cavity of the nozzle tangentially;

[0018] A liquid outlet is located at the bottom of the cavity for discharging the mixture from the cavity;

[0019] The exhaust port is located at the top of the cavity and is used to discharge gas from the cavity.

[0020] The present invention also provides another liquid supply device having a nozzle, wherein the nozzle has an upper chamber and a lower chamber, wherein,

[0021] The upper chamber includes:

[0022] Upper liquid inlet, used to introduce liquid into the upper chamber;

[0023] The upper exhaust port is located at the top of the upper chamber and is used to exhaust the gas in the upper chamber.

[0024] The upper liquid outlet is located between the upper chamber and the lower chamber and is used to introduce liquid from the upper chamber into the lower chamber.

[0025] The lower chamber includes:

[0026] The lower exhaust port is located at the upper part of the lower chamber and is used to exhaust the gas in the lower chamber.

[0027] The lower liquid outlet is located at the bottom of the lower chamber and is used to drain the liquid from the lower chamber.

[0028] As described above, the present invention provides a liquid supply device, which has the following beneficial effects:

[0029] 1) A plate-shaped separation part or a cylindrical separation part is provided above the liquid outlet of the nozzle for gas-liquid separation. The cylindrical separation part relies on multiple inclined holes provided on the side wall of the cylinder body to achieve gas-liquid separation when the liquid flows from the outside of the cylinder body to the inside of the cylinder body. Under the blocking effect of the inclined holes, gas-liquid separation is realized;

[0030] 2) The liquid inlet of the nozzle adopts a tangential liquid inlet method, and the centrifugal force is used to promote gas-liquid separation, so that the gas in the nozzle can be quickly discharged, and stable liquid supply can be achieved;

[0031] 3) The control part adjusts the opening degree of the regulating valve on the exhaust pipeline of the nozzle according to the liquid level detection signal of the nozzle obtained by the liquid level sensor, so as to keep the liquid level in the nozzle stable, which is beneficial to reducing the flow rate fluctuation when the nozzle supplies liquid to the substrate, and improving the uniformity and reliability of liquid treatment;

[0032] 4) The nozzle adopts an upper and lower chamber structure, and both the upper and lower chambers are equipped with exhaust ports, which can achieve secondary exhaust;

[0033] 5) The nozzle adopts an upper and lower chamber structure, and both the upper and lower chambers are equipped with liquid inlets, so that the processing liquid is mixed in two times. Compared with the one-time mixing of the processing liquid, both the gas generation amount and the generation speed may be reduced, which will make the bubble discharge smoother;

[0034] 6) The nozzle adopts an upper and lower chamber structure, and the exhaust port of the upper chamber is connected to a negative pressure generator. Corresponding to the SPM cleaning process, after the upper chamber stops feeding liquid, it is used to reduce the pressure in the upper chamber, so that the residual liquid in the upper chamber can be slowly discharged into the lower chamber, which can make the switching from the H2SO4 and H2O2 mixed liquid supply stage to the H2O2 liquid supply stage more stable, and avoid the liquid flow turbulence problem caused by the sudden increase in the concentration of H2O2 in the lower chamber. Description of the Drawings

[0035] Figure 1 It shows a schematic diagram of the overall structure of the substrate processing device;

[0036] Figure 2 It shows a schematic diagram of the liquid supply device and its nozzle structure in Embodiment 1 of the present invention;

[0037] Figure 3 It shows Figure 2 The partial enlarged view at A in;

[0038] Figures 4(a) to 4(d) It shows a schematic diagram of cylinders with different structures;

[0039] Figure 5 It shows a schematic diagram of another liquid supply device and its nozzle structure in Embodiment 1 of the present invention;

[0040] Figures 6(a) and 6(b) show a schematic diagram of the liquid supply device and its nozzle structure in Embodiment 2 of the present invention;

[0041] Figure 7 The diagram shown is a schematic diagram of the liquid supply device and its nozzle structure in Embodiment 3 of the present invention. The nozzle is roughly cylindrical in shape and has a first liquid inlet and a second liquid inlet.

[0042] Figure 8 Displayed as Figure 7 Cross-sectional view along the AA direction;

[0043] Figure 9 The image shown is a top view of the nozzle in Embodiment 3 of the present invention;

[0044] Figure 10 Displayed as Figure 9 A three-dimensional cross-sectional view along the BB direction, wherein the separation part is a plate-shaped separation part;

[0045] Figure 11 Displayed as Figure 9 Another cross-sectional perspective view along the BB direction, in which the separation section is a cylindrical separation section;

[0046] Figure 12 The diagram shown is a schematic diagram of another liquid supply device and its nozzle structure in Embodiment 3 of the present invention, wherein the nozzle is roughly conical in shape and has a liquid inlet;

[0047] Figure 13 The diagram shown is a schematic diagram of the liquid supply device and its nozzle structure in Embodiment 4 of the present invention.

[0048] Figure 14 The diagram shows another liquid supply device and its nozzle structure in Embodiment 4 of the present invention.

[0049] Figure 15 The diagram shows another liquid supply device and its nozzle structure in Embodiment 4 of the present invention.

[0050] Figure 16 The diagram shows another liquid supply device and its nozzle structure in Embodiment 4 of the present invention.

[0051] Figure 17 The diagram shown is a schematic diagram of the liquid supply device and its nozzle structure in Embodiment 5 of the present invention.

[0052] Figure 18 The diagram shown is a schematic diagram of the liquid supply device and its nozzle structure in Embodiment Six of the present invention; and

[0053] Figure 19 The diagrams shown are the opening and closing timing diagrams of the nozzle liquid inlet valve and the mixing ratio timing diagram in the lower chamber, as shown in Embodiments 5 and 6 of the present invention. Detailed Implementation

[0054] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0055] Please see Figures 1 to 19 It should be noted that the illustrations provided in this embodiment are only schematic representations of the basic concept of the present invention. Although the illustrations only show components related to the present invention and are not drawn according to the actual number, shape and size of the components in the actual implementation, the shape, quantity and proportion of each component in the actual implementation can be arbitrarily changed, and the layout of the components may also be more complex.

[0056] like Figure 1 As shown, the substrate processing apparatus 10 includes a chamber 11, a substrate holding device 12, and a liquid supply device 13. The substrate holding device 12 is located within the chamber 11 and is used to hold and rotate the substrate. The substrate holding device 12 typically includes a stage 121 for clamping the substrate; a rotation shaft 122 for rotating the stage 121; and a collection cup 123 disposed around the stage 121 for recovering the processing liquid. The liquid supply device 13 supplies processing liquid to the substrate for liquid treatment.

[0057] Commonly used processing solutions include SC-1, SC-2, DHF, SPM, and high-temperature phosphoric acid aqueous solutions. Among these, SPM and high-temperature phosphoric acid aqueous solutions often contain entrained gas during the supply process. If this gas cannot be discharged in time, it will be ejected from the nozzle along with the processing solution, causing liquid splashing and affecting the stability of the supply. Therefore, in this invention, for a liquid supply device used to supply processing solutions containing entrained gas, the nozzle structure of the supply device is modified to promptly discharge the gas in the processing solution before it reaches the substrate, thereby improving the stability of the supply. The following sections will describe liquid supply devices with different nozzle structures one by one.

[0058] Example 1

[0059] Please see Figure 2 and Figure 3 This embodiment proposes a liquid supply device, including a nozzle for supplying a processing liquid, such as SPM, to a substrate. This processing liquid contains gases that may affect stable liquid supply. The nozzle has an internal cavity 101 and further includes: a liquid inlet 102 for introducing liquid into the cavity 101; a liquid outlet 103, located at the lower part of the cavity 101, for discharging liquid from the cavity 101; and an exhaust port 104, located at the upper part of the cavity 101, for discharging gas from the cavity 101.

[0060] It should be noted that the liquid inlet 102 can introduce at least one liquid into the cavity 101. Each liquid can be configured with an independent liquid inlet, or a mixture of at least two liquids can be introduced into the cavity 101 through a single liquid inlet.

[0061] In this embodiment, the liquid inlet 102 is used to introduce two liquids into the cavity 101, which are referred to as the first liquid and the second liquid, respectively. For example, the first liquid can be H2O2 and the second liquid can be H2SO4.

[0062] like Figure 2 In the illustrated embodiment, each liquid is provided with an independent liquid inlet. Specifically, the liquid inlet 102 includes a first liquid inlet 1021 and a second liquid inlet 1022. The first liquid inlet 1021 is used to introduce a first liquid into the cavity 101, and the second liquid inlet 1022 is used to introduce a second liquid into the cavity 101. The first liquid and the second liquid are mixed inside the cavity 101. It is understood that in other embodiments, each liquid may also be provided with two or more independent liquid inlets. For example, two or more first liquid inlets 1021 may be provided, all for introducing the first liquid into the cavity 101, and two or more second liquid inlets 1022 may be provided, all for introducing the second liquid into the cavity 101.

[0063] like Figure 5 In the embodiment shown, a mixture of at least two liquids is introduced into the cavity 101 through a liquid inlet. Specifically, the liquid inlet 102 includes a mixture inlet 1023 for introducing a mixture of the first liquid and the second liquid into the cavity 101. Figure 5 The illustration is for illustrative purposes only and is not intended to limit the number of mixing inlets 1023; that is, two or more mixing inlets 1023 may be provided. The first liquid and the second liquid may be mixed in a supply line outside the nozzle and then supplied to the nozzle cavity 101. Alternatively, a mixer may be provided on the supply line, through which the first liquid and the second liquid are mixed before being supplied to the nozzle cavity 101.

[0064] It should be noted that, depending on the process requirements, liquid inlet 102 can also be configured with both an independent liquid inlet for supplying one type of liquid and a liquid inlet for supplying a mixture of at least two liquids. For example, liquid inlet 102 can be configured with a first liquid inlet 1021, a second liquid inlet 1022, and a mixture inlet 1023.

[0065] A cylindrical separation section 105 is provided above the liquid outlet 103, and the separation section 105 is located within the cavity 101. The separation section 105 is used to achieve gas-liquid separation. Specifically, the separation section 105 includes a cylindrical body 1051, with multiple oblique holes 1052 provided on the side wall of the cylindrical body 1051, and an opening at the bottom 1051b of the cylindrical body 1051 that communicates with the liquid outlet 103. Viewed from the inside to the outside of the cylindrical body 1051, the oblique holes 1052 on the side wall of the cylindrical body 1051 are inclined upwards, and the angle between the oblique holes 1052 and the vertical direction is 15° to 75°, for example, 30° to 60°. It should be noted that the shape of the cylindrical body 1051 is not limited to this. Figure 2 The cylindrical shape shown can also be a frustum, a square tube, a prism, etc., that is, the cross-section of the cylinder 1051 can be any shape such as polygon, circle, ellipse, etc., without any special limitation.

[0066] When the first and second liquids are supplied to the cavity 101 of the nozzle, they first enter the outer region of the cylinder 1051, and then enter the inner side of the cylinder 1051 through the inclined hole 1052 on the side wall of the cylinder 1051. As the liquid flows downward along the inclined hole 1052 into the inner side of the cylinder 1051, most of the gas will float upward due to the resistance of the inclined hole 1052 and will not be able to enter the inner side of the cylinder 1051. After escaping from the liquid, the gas is discharged from the cavity 101 through the exhaust port 104, thus completing the gas-liquid separation, thereby reducing the gas content in the mixture and improving the stability of the liquid supply.

[0067] Figure 3 It shows Figure 2 A magnified view of a portion at point A. The bottom of the nozzle's internal cavity 101 is provided with a guide surface 1011, which slopes downwards towards the cylinder 1051. Specifically, the guide surface 1011 slopes downwards along the nozzle wall towards the cylinder 1051 wall. The lowest row of oblique holes 1052 in the cylinder 1051 communicates with the lowest point of the guide surface 1011 to prevent liquid accumulation inside the nozzle.

[0068] The structure of the top 1051a of the cylinder 1051 can have the following various modifications. Figures 4(a) to 4(d) A schematic diagram of a cylinder with a different top structure is shown.

[0069] As shown in Figure 4(a), the top 1051a of the cylinder 1051 is sealed.

[0070] As shown in Figure 4(b), the top 1051a of the cylinder 1051 is open. If some gas is entrained by the liquid and enters the inside of the cylinder 1051, the gas inside the cylinder 1051 can be discharged upward through the opening of the top 1051a and discharged from the nozzle through the exhaust port 104, further reducing the gas content in the mixture and improving the stability of the liquid supply.

[0071] As shown in FIG. 4(c), at least one through hole 1053 is formed in the top 1051a of the cylinder 1051. The gas inside the cylinder 1051 can be discharged from the cylinder 1051 through the through hole 1053 on the top 1051a of the cylinder 1051, and then discharged from the nozzle via the exhaust port 104.

[0072] In FIG. 4(c), several through holes 1053 are provided in the top 1051a of the cylinder 1051, and the several through holes 1053 can be vertical through holes 1053. In FIG. 4(d), several through holes 1053 are provided in the top 1051a of the cylinder 1051, and the several through holes 1053 are inclined toward the exhaust port 104. In this way, the gas inside the cylinder 1051 can converge toward the exhaust port 104 after being discharged from the through holes 1053, which is convenient for the rapid discharge of bubbles. To promote the convergence of the gas inside the cylinder 1051 toward the exhaust port 104, the top 1051a of the cylinder 1051 can be provided in a V-shaped or arched shape.

[0073] Embodiment 2

[0074] Please refer to FIGS. 6(a) and 6(b). This embodiment provides a liquid supply device. Compared with Embodiment 1, the difference in this embodiment is that a buffer plate 106 for blocking the liquid inlet 102 is provided in the cavity 101, and there is a gap between the buffer plate 106 and the liquid inlet 102. The buffer plate 106 can be arranged near the liquid inlet 102 as shown in FIG. 6(a). In this example, the buffer plate 106 is arranged between the cylinder 1051 and the liquid inlet 102 to block the liquid inlet 102, buffer and block the liquid introduced through the liquid inlet 102, reduce the flow rate of the liquid, and prevent the liquid with entrained gas from directly impacting and entering the inside of the cylinder 1051 after entering the cavity 101 and then being discharged through the liquid outlet 103, thereby reducing the gas content in the liquid ejected from the liquid outlet 103 and achieving stable liquid supply.

[0075] In addition, the buffer plate 106 is not only used to block the liquid inlet 102, but also used to restrict the flow direction of the liquid entering the cavity 101. Specifically, as shown in FIG. 6(b), the buffer plate 106 is arranged in the cavity 101 to block the liquid inlet 102, and the buffer plate 106 extends along the axial direction of the cylinder 1051, so that the liquid entering the cavity 101 through the liquid inlet 102 flows upward from bottom to top outside the cylinder 1051 (as shown by the arrow in FIG. 6(b)).

[0076] It should be noted that in Embodiment 2, the same structures as those in Embodiment 1 are attached with the same reference numerals and will not be described in detail.

[0077] Embodiment 3

[0078] Please refer to Figures 7 to 12This embodiment provides a liquid supply device, including a nozzle for supplying a processing liquid to a substrate surface. The processing liquid contains a gas, such as SPM, that affects stable liquid supply. The nozzle has a cavity 401 inside and further includes: a liquid inlet tangential to the sidewall of the cavity 401 for allowing liquid to enter the nozzle tangentially; a liquid outlet 403 located at the lower part of the cavity 401 for discharging liquid from the nozzle; and an exhaust port 404 located at the upper part of the cavity 401 for discharging gas from the nozzle.

[0079] It should be noted that the liquid inlet can introduce at least one liquid into the cavity 401. Each liquid can be configured with an independent liquid inlet, or a mixture of at least two liquids can be introduced into the cavity 401 through a single liquid inlet.

[0080] In this embodiment, the liquid inlet is used to introduce two liquids into the cavity 401, referred to as the first liquid and the second liquid, respectively. For example, the first liquid can be H2O2 and the second liquid can be H2SO4.

[0081] The following will use the introduction of the first liquid and the second liquid into cavity 401 as an example to explain the two liquid inlet settings.

[0082] <Method 1 for setting up the liquid inlet>

[0083] Each liquid is equipped with a separate liquid inlet, such as Figure 7 and Figure 8 As shown, the liquid inlet includes a first liquid inlet 4021 and a second liquid inlet 4022. The first liquid inlet 4021 is tangential to the sidewall of the cavity 401, allowing the first liquid to enter the nozzle tangentially. The second liquid inlet 4022 is also tangential to the sidewall of the cavity 401, allowing the second liquid to enter the nozzle tangentially. The first and second liquids rotate in the same direction after entering the nozzle, as shown. Figure 8 As indicated by the dashed arrow.

[0084] <Method 2 for setting up the liquid inlet>

[0085] A mixture of at least two liquids is introduced into cavity 401 through a liquid inlet, such as... Figure 12 As shown, the liquid inlet includes a mixture inlet 4023, which is tangential to the sidewall of the cavity 401, allowing the mixture of the first and second liquids to enter the nozzle tangentially. The first and second liquids can be mixed in a supply line outside the nozzle before being supplied to the cavity 401 of the nozzle. Alternatively, a mixer can be installed on the supply line, through which the first and second liquids are mixed before being supplied to the cavity 401 of the nozzle.

[0086] Furthermore, depending on process requirements, the liquid inlet can also be configured with a first liquid inlet 4021, a second liquid inlet 4022, and a mixed liquid inlet 4023 simultaneously. In this embodiment, the liquid inlet adopts a tangential liquid inlet method. After the liquid enters the cavity 401, it forms a rotational motion along the wall of the cavity 401. This facilitates better mixing of the first and second liquids, and also allows for gas-liquid separation by relying on the centrifugal force generated by the rotational motion of the liquid, reducing the gas content in the liquid discharged from the nozzle. The shape of the cavity 401 can be approximately cylindrical (e.g., ...). Figure 7 As shown), it can also be roughly conical (as shown). Figure 12 As shown in the figure, the conical shape of the cavity 401 can promote the rotational movement of the liquid within the cavity 401, which is more conducive to gas-liquid separation.

[0087] A separation section is provided inside the cavity 401. The separation section is located above the liquid outlet 403 and is used to intercept and separate air bubbles in the liquid to reduce the gas content in the liquid discharged from the nozzle. Figure 10 and Figure 11 Two different structures of separation parts are illustrated, referred to as plate-shaped separation part 405 and cylindrical separation part 406, respectively. The two structures of separation parts will be described one by one below.

[0088] <Plate-shaped separation section 405>

[0089] like Figure 10 As shown, the separating section 405 is plate-shaped, including a plate body 4051. The plate body 4051 is disposed above the liquid outlet 403, and there is a certain distance between the plate body 4051 and the liquid outlet 403 in the height direction. Viewed from above, the plate body 4051 at least partially blocks the liquid outlet 403, thereby intercepting and separating air bubbles entrained in the liquid and preventing air bubbles from being discharged from the liquid outlet 403 with the liquid. In this embodiment, as... Figure 8 As shown, the projection of plate 4051 toward liquid outlet 403 completely covers liquid outlet 403. There is a gap between part of the edge of plate 4051 and the inner wall of cavity 401. This gap can serve as a flow channel for liquid to flow, so that the liquid in cavity 401 bypasses plate 4051 and is discharged through liquid outlet 403.

[0090] <Cylindrical separating section 406>

[0091] like Figure 11 As shown, the separation section 406 is cylindrical, including a cylindrical body 1051. Multiple oblique holes 1052 are provided on the side wall of the cylindrical body 1051. The bottom opening 1051b of the cylindrical body 1051 communicates with the liquid outlet 403. The top 1051a of the cylindrical body 1051 can have various different structures; see [reference needed] for details. Figures 4(a) to 4(d)The top 1051a of the cylinder 1051 is sealed (as shown in Figure 4(a)), or the top 1051a of the cylinder 1051 is open (as shown in Figure 4(b)), or the top 1051a of the cylinder 1051 is provided with at least one through hole 1053 (as shown in Figures 4(c) and 4(d)), the through hole 1053 is a vertical hole or the through hole 1053 is inclined towards the exhaust port 404.

[0092] Preferably, the top of the cylinder 1051 is located below the liquid inlet, which can reduce the interference of the cylinder on the rotational motion of the liquid.

[0093] When the separation section adopts a cylindrical separation section 406, in order to avoid liquid accumulation in the cavity 401, a guide surface 4011 is provided at the bottom of the cavity 401, such as... Figure 11 As shown in the enlarged view, the guide surface 4011 is inclined downward along the nozzle wall towards the wall of the cylinder 1051, so that the guide surface 4011 can guide the liquid accumulated at the bottom of the cavity 401 to the root of the cylinder 1051. The lowest row of inclined holes 1052 of the cylinder 1051 is connected to the lowest point of the guide surface 4011. After the liquid flows to the root of the cylinder 1051, it enters the inner side of the cylinder 1051 through the inclined holes 1052 and is discharged from the liquid outlet 403, thereby eliminating the problem of liquid residue in the cavity 401 area outside the cylinder 1051.

[0094] See you again Figure 7 To further achieve stable liquid supply, the liquid supply device is also equipped with a liquid level sensor 407, an exhaust line 4041, and a control unit. The liquid level sensor 407 detects the liquid level in the nozzle cavity 401. The exhaust line 4041 is connected to the exhaust port 404 to discharge gas from the cavity 401, and a regulating valve 4042 is installed on the exhaust line 4041. The control unit is signal-connected to the liquid level sensor 407 and the regulating valve 4042, forming a closed-loop control to maintain the liquid level in the cavity 401 at a predetermined height. By stabilizing the liquid level in the nozzle at a predetermined height, the flow rate of the liquid outlet 403 can be approximately constant, thereby achieving better cleaning or etching effects.

[0095] Specifically, when the liquid level sensor 407 detects that the liquid level in the cavity 401 is higher than the predetermined height and transmits the signal to the control unit, the control unit sends a command to the regulating valve 4042 to reduce the valve opening; when the liquid level sensor 407 detects that the liquid level in the cavity 401 is lower than the predetermined height and transmits the signal to the control unit, the control unit sends a command to the regulating valve 4042 to increase the valve opening.

[0096] The liquid level sensor 407 can be a contact-type liquid level sensor, such as a differential pressure type or a float-type liquid level sensor, and can be fixedly mounted on the nozzle, such as... Figure 7As shown. The level sensor 407 can also be a non-contact level sensor, such as an optical or capacitive level sensor.

[0097] In one embodiment, the predetermined height of the liquid level in the cavity 401 is set above the liquid inlet. In this way, when fresh liquid supplied by the liquid inlet enters the existing liquid in the cavity 401, the liquid level fluctuation can be reduced, which is conducive to maintaining a stable liquid level and achieving a stable liquid supply.

[0098] In another embodiment, the predetermined height of the liquid level in cavity 401 is set below the liquid inlet. In this way, when fresh liquid supplied by the liquid inlet enters the air above cavity 401, some of the gas in the fresh liquid will not be entrained into the liquid phase. This part of the gas does not need to overcome the escape resistance of the gas-liquid interface, which will facilitate the separation of gas and liquid and achieve better exhaust effect.

[0099] It is worth noting that controlling the predetermined height of the liquid level in cavity 401 above or below the liquid inlet is a preferred implementation method. However, the predetermined height of the liquid level in cavity 401 is not limited to this. It can be reasonably set in combination with process and nozzle structure parameters. For example, the predetermined height of the liquid level in cavity 401 can also be controlled at a height that is basically flush with the liquid inlet.

[0100] Example 4

[0101] Please see Figures 13 to 16 This embodiment provides a liquid supply device having a nozzle and a control unit. The nozzle is hollow and divided into an upper chamber 501 and a lower chamber 502. The following will describe the device in conjunction with the attached... Figures 13 to 16 The structures of the upper chamber 501 and the lower chamber 502 will be described separately.

[0102] (Upper Chamber 501)

[0103] The upper chamber 501 is provided with an upper liquid inlet 5011, an upper exhaust port 5012, an upper liquid outlet 5014, and an upper liquid level sensor 5015.

[0104] The upper liquid inlet 5011 is connected to the liquid supply line and is used to introduce liquid into the upper chamber 501. The upper liquid inlet 5011 can introduce at least one liquid into the upper chamber 501. Each liquid can be configured with an independent upper liquid inlet, or a mixture of at least two liquids can be introduced into the upper chamber 501 through one upper liquid inlet.

[0105] In this embodiment, the upper liquid inlet 5011 is used to introduce two liquids into the upper chamber 501, denoted as the first liquid and the second liquid, respectively. For example, the first liquid can be H2O2, and the second liquid can be H2SO4. The following will use the introduction of the first and second liquids into the upper chamber 501 as an example, combined with... Figures 13 to 15This section explains the various configuration methods for the upper liquid inlet 5011.

[0106] <Setting Method 1 for Upper Liquid Inlet 5011>

[0107] like Figure 13 As shown, the upper liquid inlet 5011 includes a first upper liquid inlet 50111 and a second upper liquid inlet 50112. The first upper liquid inlet 50111 and the second upper liquid inlet 50112 can be located at the same height or at different heights. Figure 13 In this configuration, the first upper liquid inlet 50111 is located above the second upper liquid inlet 50112. Figure 14 In this configuration, the first upper liquid inlet 50111 and the second upper liquid inlet 50112 are located at the same height. In this configuration, the first and second liquids are introduced independently, allowing them to be mixed within the nozzle. This shortens the distance between the mixing point and the liquid outlet, reduces temperature loss, and achieves higher reaction temperatures and reactivity.

[0108] The first liquid inlet 50111 is connected to the first liquid supply line S1 for introducing a first liquid, such as H2O2, into the upper chamber 501. The first liquid supply line S1 is equipped with a first valve V1 for switching between supplying and stopping the supply of the first liquid.

[0109] The second upper liquid inlet 50112 is connected to the second liquid supply line S2 and is used to introduce a second liquid, such as H2SO4, into the upper chamber 501. The second liquid supply line S2 is equipped with a second valve V2, which is used to switch the second liquid supply line S2 between supplying and stopping the supply of the second liquid.

[0110] <Second Method for Setting Up Liquid Inlet 5011>

[0111] like Figure 15 The upper liquid inlet 5011 includes a mixed liquid inlet 50113. The first liquid and the second liquid are mixed outside the nozzle before entering the nozzle. Specifically, as shown... Figure 15 As shown, the mixing inlet 50113 is connected to the mixing line S3 for introducing a mixture of the first and second liquids into the upper chamber 501. The first and second liquids can be mixed in the mixing line S3 before being supplied to the upper chamber 501. Furthermore, a mixer (not shown) can be installed on the mixing line S3, through which the first and second liquids are mixed before being supplied to the upper chamber 501. A fourth valve V4 is provided on the mixing line S3 for switching between supplying and stopping the supply of the mixture of the first and second liquids.

[0112] <Setting Method 3 for Upper Liquid Inlet 5011>

[0113] Based on method one or method two, the upper liquid inlet 5011 can also adopt a tangential liquid inlet method, that is, the upper liquid inlet 5011 is tangential to the side wall of the upper chamber 501. When the first liquid and the second liquid enter the upper chamber 501 tangentially, the liquid will rotate within the upper chamber 501. Under the action of centrifugal force, better mixing and venting effects can be achieved.

[0114] For example, in Figure 13 and Figure 14 In this configuration, the first upper liquid inlet 50111 and the second upper liquid inlet 50112 are tangential to the side wall of the upper chamber 501. The first liquid and the second liquid enter the upper chamber 501 tangentially, and their rotation directions are the same after entering the upper chamber 501. For example: in Figure 15 In the middle, the mixture inlet 50113 is tangential to the side wall of the upper chamber 501, so that the mixture of the first liquid and the second liquid enters the upper chamber 501 tangentially.

[0115] The upper exhaust port 5012 is located at the upper part of the upper chamber 501 and is connected to the first exhaust line L1 for discharging gas from the upper chamber 501. The first exhaust line L1 is equipped with an upper regulating valve 5013, which can be used to adjust the liquid level in the upper chamber 501 by changing the opening of the upper regulating valve 5013.

[0116] The upper liquid level sensor 5015 is used to detect the liquid level height in the upper chamber 501 and transmits the detection signal to the control unit. The control unit, the upper liquid level sensor 5015, and the upper regulating valve 5013 constitute a first closed-loop control to maintain the liquid level in the upper chamber 501 at a predetermined height. The upper liquid level sensor 5015 can be a contact liquid level sensor or a non-contact liquid level sensor, preferably a non-contact liquid level sensor, such as an optical or capacitive liquid level sensor. Figures 13 to 16 As shown, the upper liquid level sensor 5015 is a non-contact liquid level sensor, which is separately installed on one side of the nozzle.

[0117] The predetermined height of the liquid level in the upper chamber 501 is used as an input parameter and can be reasonably set according to process requirements and nozzle structure. In one example, the predetermined height of the liquid level in the upper chamber 501 is set above the upper liquid inlet 5011. This way, when fresh liquid supplied by the upper liquid inlet 5011 enters the upper chamber 501, it flows directly into the existing liquid in the upper chamber 501, which helps maintain a stable liquid level and achieve stable liquid supply. In another example, the predetermined height of the liquid level in the upper chamber 501 is set below the upper liquid inlet 5011. This way, when fresh liquid supplied by the upper liquid inlet 5011 enters the upper chamber 501, it directly contacts the gas phase above the liquid surface in the upper chamber 501. Some of the gas generated in the fresh liquid will not be entrained into the liquid phase. This gas does not need to overcome the escape resistance at the gas-liquid interface, which is more conducive to gas-liquid separation and achieves better exhaust effect.

[0118] The upper liquid outlet 5014 is located between the upper chamber 501 and the lower chamber 502, and is used to introduce the mixture of the first liquid and the second liquid in the upper chamber 501 into the lower chamber 502.

[0119] (Inferior Chamber 502)

[0120] Please see Figures 13 to 16 The lower chamber 502 includes a lower exhaust port 5022, a lower liquid outlet 5024, and a lower liquid level sensor 5025. The lower chamber 502 is located below the upper chamber 501, and the upper and lower chambers 502 are connected via the upper liquid outlet 5014. The lower liquid outlet 5024 is located at the lower part of the lower chamber 502 and is used to discharge a mixture of the first and second liquids from the lower chamber 502 for processing the substrate.

[0121] The lower exhaust port 5022 is located at the upper part of the lower chamber 502 and is connected to the second exhaust line L2 for discharging gas from the lower chamber 502. The second exhaust line L2 is equipped with a lower regulating valve 5023, which can be used to adjust the liquid level in the lower chamber 502 by changing the opening of the lower regulating valve 5023.

[0122] The lower liquid level sensor 5025 is used to detect the liquid level height in the lower chamber 502 and transmits the detection signal to the control unit. The control unit, the lower liquid level sensor 5025, and the lower regulating valve 5023 constitute a second closed-loop control to maintain the liquid level in the lower chamber 502 at a predetermined height. Similarly, the lower liquid level sensor 5025 can be a contact liquid level sensor or a non-contact liquid level sensor, preferably a non-contact liquid level sensor. The predetermined height of the liquid level in the lower chamber 502 is used as an input parameter and can be reasonably set according to process requirements and nozzle structure.

[0123] In this embodiment, the nozzle employs a dual-chamber design to achieve two-stage venting, resulting in better venting performance and more reliable liquid supply stability. Specifically, when the first and second liquids are supplied to the upper chamber 501, some of the gas in the liquid is discharged from the upper vent 5012, completing the first venting. Next, the mixture of the first and second liquids enters the lower chamber 502, and the remaining gas in the liquid is discharged from the lower vent 5022, completing the second venting. Through these two venting processes, the gas content in the liquid ejected from the nozzle can be significantly reduced, achieving stable liquid supply.

[0124] Furthermore, a separation section is provided in at least one of the upper chamber 501 and the lower chamber 502. The separation section is disposed above the liquid outlet of its respective chamber, and on the one hand, it promotes gas-liquid separation, and on the other hand, it inhibits gas from escaping from the liquid outlet of the corresponding chamber. In this embodiment, the separation section is either a plate-shaped separation section 5031 or a cylindrical separation section 5032; both structures will be described below. Figures 13 to 16 As shown, a cylindrical separation section 5032 is provided in the upper chamber 501, and a plate-shaped separation section 5031 is provided in the lower chamber 502. It should be noted that the specific forms in which the separation sections are provided in the upper chamber 501 and the lower chamber 502 are not limited to... Figures 13 to 16 Examples include cylindrical separation sections 5032 provided in both the upper and lower chambers; plate-shaped separation sections 5031 provided in both the upper and lower chambers; or cylindrical separation sections 5032 provided in the upper chamber 501, while no separation section is provided in the lower chamber 502.

[0125] <Plate-shaped separation section 5031>

[0126] The plate-shaped separation section 5031 includes a plate body 50311, which is disposed above the liquid outlet of the chamber in which it is located. In this embodiment, as... Figures 13 to 16 As shown, the plate-shaped separation section 5031 is disposed in the lower chamber 502, and the plate body 50311 is disposed above the lower liquid outlet 5024 of the lower chamber 502. Specifically, the plate body 50311 and the lower liquid outlet 5024 are spaced apart in the height direction. When viewed from above, the plate body 50311 at least partially blocks the lower liquid outlet 5024, thereby playing a certain role in intercepting and separating the air bubbles mixed in the liquid, and preventing the air bubbles from being discharged from the lower liquid outlet 5024 with the liquid.

[0127] <Cylindrical Separation Section 5032>

[0128] The cylindrical separation section 5032 includes a cylindrical body 1051, as shown in the figure. Figures 4(a) to 4(d)Multiple oblique holes 1052 are provided on the side wall of the cylinder 1051, and the bottom opening 1051b of the cylinder 1051 is connected to the liquid outlet of its chamber. Viewed from the inside to the outside of the cylinder 1051, the multiple oblique holes 1052 are inclined upwards. The angle between the oblique holes 1052 and the vertical direction is 15° to 75°, for example, 30° to 60°. When liquid enters the inside of the cylinder 1051 from the outside through the oblique holes 1052, most of the gas will float upwards due to the resistance of the oblique holes 1052 and will not be able to enter the inside of the cylinder 1051. The gas escapes from the liquid and is discharged through the exhaust port of its chamber, achieving gas-liquid separation and improving the stability of the liquid supply.

[0129] like Figures 13 to 16 As shown, a guide surface 501a is provided at the bottom of the chamber where the cylinder 1051 is located, and the guide surface 501a is inclined downward toward the cylinder 1051. The lowest row of inclined holes 1052 of the cylinder 1051 is connected to the lowest point of the guide surface 501a to avoid liquid accumulation inside the nozzle.

[0130] The top 1051a of the cylinder 1051 can have various different structures, as detailed in the following references. Figures 4(a) to 4(d) The top 1051a of the cylinder 1051 is sealed (as shown in Figure 4(a)), or the top 1051a of the cylinder 1051 is open (as shown in Figure 4(b)), or the top 1051a of the cylinder 1051 is provided with at least one through hole 1053 (as shown in Figures 4(c) and 4(d)), the through hole 1053 is a vertical hole or the through hole 1053 is inclined towards the exhaust port.

[0131] In this embodiment, as Figures 13 to 16 As shown, the cylindrical separation section 5032 is disposed in the upper chamber 501, the bottom 1051b of the cylindrical body 1051 is connected to the upper liquid outlet 5014, and the plate-shaped separation section 5031 is disposed in the lower chamber 502, located above the lower liquid outlet 5024. The first and second liquids enter the upper chamber 501 through the upper liquid inlet 5011. Then, the mixture of the two enters the inner side of the cylinder 1051 through multiple oblique holes 1052 opened on the side wall of the cylinder 1051. During this process, the mixture flows downward into the inner side of the cylinder 1051 along the oblique holes 1052. The gas mixed in the mixture floats upward and is discharged from the upper exhaust port 5012, completing the first exhaust. The mixture flows from the inner side of the cylinder 1051 through the upper liquid outlet 5014 into the lower chamber 502. Then, the mixture flows into the lower liquid outlet 5024. During this process, the remaining gas (or newly generated gas) mixed in the mixture is intercepted by the plate 50311 and moves in the opposite direction to the mixture. The gas floats upward and is discharged again through the lower exhaust port 5022, completing the second exhaust. The mixture is sprayed downward through the lower liquid outlet 5024 onto the surface of the substrate.

[0132] In addition, such as Figure 16As shown, a buffer plate 5016 is provided in the upper chamber 501 to block the upper liquid inlet 5011, and the buffer plate 5016 is spaced apart from the upper liquid inlet 5011. The buffer plate 5016 can buffer the first liquid and the second liquid entering the upper chamber 501 through the upper liquid inlet 5011, thereby improving the stability and reliability of the nozzle liquid supply.

[0133] Example 5

[0134] Please see Figure 17 This embodiment provides a liquid supply device. Compared with Embodiment 4, the difference in this embodiment is that the lower chamber 502 further includes a lower liquid inlet 5021, which is disposed on the side wall of the lower chamber 502 as a replenishment inlet and connected to the third liquid supply line S3 for introducing liquid, such as a first liquid and / or a second liquid. A third valve V3 is provided on the third liquid supply line S3 for switching between supplying and stopping the supply of the first liquid and / or the second liquid. In this embodiment, the lower liquid inlet 5021 can be configured to be tangential to the side wall of the lower chamber 502 so that the first liquid and / or the second liquid enter the lower chamber 502 tangentially. Additionally, in this embodiment, the upper chamber 501 and / or the lower chamber 502 can be provided with buffer plates that block the liquid inlets of the corresponding chambers. Figure 17 (Not shown in the image), the buffer plate is spaced from the liquid inlet of the corresponding chamber.

[0135] It should be noted that in Embodiment 5, the same structures as in Embodiment 4 are given the same reference numerals, and the description is omitted.

[0136] In one embodiment, the first liquid is H2O2, the second liquid is H2SO4, and the lower liquid inlet 5021 is used to introduce H2O2 into the lower chamber 502. During the process, H2SO4 and H2O2 need to be mixed in a preset ratio and supplied to the substrate surface to clean the substrate. In this embodiment, H2SO4 and H2O2 are supplied to the upper chamber 501 in a first ratio to obtain a premixed solution of H2SO4 and H2O2 with the first ratio. The premixed solution enters the lower chamber 502 and is mixed again with the H2O2 supplied to the lower chamber 502 to obtain a mixed solution of H2SO4 and H2O2 with the preset ratio, which is then sprayed onto the substrate surface from the lower liquid outlet 5024.

[0137] In this embodiment, a two-stage mixing mode is employed. Compared to a single-stage mixing mode, this reduces the consumption of H2O2 and the rate of bubble generation, making it easier to remove bubbles and lowering the gas content in the liquid ejected from the nozzle. Furthermore, the two-stage mixing mode can increase the temperature of the mixed solution and the concentration of carboxylic acid, resulting in a higher reaction temperature and reactivity, thus improving etching efficiency.

[0138] In addition, in this embodiment, the second closed-loop control formed by the control unit, the lower liquid level sensor 5025, and the lower regulating valve 5023 maintains the liquid level in the lower chamber 502 at a predetermined height, similar to the predetermined height setting of the liquid level in the upper chamber 501. The predetermined height of the liquid level in the lower chamber 502 is used as an input parameter and can be reasonably set according to process requirements and nozzle structure. In one example, the predetermined height of the liquid level in the lower chamber 502 is set above the lower liquid inlet 5021. In another example, the predetermined height of the liquid level in the lower chamber 502 is set below the lower liquid inlet 5021. To balance exhaust efficiency and stable liquid supply, in one example, the predetermined height of the liquid level in the upper chamber 501 is set below the upper liquid inlet 5011, and the predetermined height of the liquid level in the lower chamber 502 is set above the lower liquid inlet 5021.

[0139] The following will combine Figure 17 This embodiment describes in detail the SPM cleaning process performed on the substrate using the liquid supply device proposed in this embodiment. SPM is a mixture of H2SO4 and H2O2.

[0140] Step S1, H2O2 pre-supply stage (Pre-H2O2): Open the third valve V3, close the first valve V1 and the second valve V2, and supply H2O2 to the lower chamber 502 of the nozzle to clean the substrate surface and maintain a stable liquid level in the lower chamber 502. The control unit adjusts the opening of the lower regulating valve 5023 based on the detection signal from the lower liquid level sensor 5025 to maintain a stable liquid level in the lower chamber 502.

[0141] Step S2, SPM Supply Stage (SPM): First valve V1, second valve V2, and third valve V3 are opened, supplying H2SO4 and H2O2 to the upper chamber 501 of the nozzle while simultaneously supplying H2O2 to the lower chamber 502 of the nozzle. The liquid levels in both chambers 501 and 502 are maintained stable. The mixed liquids from the upper and lower chambers are then supplied to the substrate surface for cleaning. Specifically, the control unit adjusts the opening of the upper regulating valve 5013 based on the detection signal from the upper liquid level sensor 5015 to maintain a stable liquid level in the upper chamber 501, and the control unit adjusts the opening of the lower regulating valve 5023 based on the detection signal from the lower liquid level sensor 5025 to maintain a stable liquid level in the lower chamber 502.

[0142] Step S3, Post-H2O2 Supply Stage: The first valve V1 and the second valve V2 are closed, while the third valve V3 remains open. This cuts off the supply of H2SO4 and H2O2 to the upper chamber 501 of the nozzle, while continuing to supply H2O2 to the lower chamber 502 of the nozzle. This allows H2O2 to be supplied to the substrate surface to replace the H2SO4 and H2O2 mixture on the substrate surface. After cutting off the supply of H2SO4 and H2O2 to the upper chamber 501 of the nozzle, while maintaining a stable liquid level in the lower chamber 502, the control of the liquid level height in the upper chamber 501 is stopped. At this time, the upper regulating valve 5013 is in a normally open state. The control unit adjusts the opening degree of the lower regulating valve 5023 based on the detection signal from the lower liquid level sensor 5025 to maintain a stable liquid level in the lower chamber 502.

[0143] Figure 19 The timing diagrams for the operation of the liquid inlet valve at the nozzle and the timing diagram for the change in the mixed liquid ratio in the lower chamber 502 are shown in the SPM cleaning process. For clarity, the residual liquid depletion zone is defined as the time period from the cutting off of liquid inlet to the upper chamber 501 until the residual liquid in the upper chamber 501 is emptied. Figure 19 In this context, t0 represents the moment when the liquid inlet to the upper chamber 501 is cut off, at which time the first valve V1 and the second valve V2 are closed; t1 represents the moment when the residual liquid in the upper chamber 501 is emptied without controlling the residual liquid discharge rate; the period from t0 to t1 is the residual liquid depletion zone without controlling the residual liquid discharge rate. In the residual liquid depletion zone, the concentrations of H2SO4 and H2O2 in the lower chamber 502 are briefly maintained at the same concentration as during the SPM liquid supply phase, such as... Figure 19 The thick solid line represents the time interval t0 to t1. After the residual liquid in the upper chamber 501 is emptied, within a very short time, as... Figure 19 As shown by the thick solid line in the t1 to t2 time period, the H2O2 concentration in the lower chamber 502 changes rapidly from the initial concentration (e.g., 33%) to 100%. Therefore, if no intervention is made during the emptying of the residual liquid in the upper chamber 501, the H2O2 concentration in the lower chamber 502 may suddenly increase, generating a large amount of gas. This causes the liquid to be ejected from the nozzle all at once, and the liquid carrying air bubbles impacts the substrate surface, which may cause liquid splashing or damage to the substrate surface.

[0144] Example 6

[0145] To address the issues of liquid splashing and substrate surface damage that may arise from not controlling the residual liquid discharge rate in the upper chamber 501 residual liquid depletion zone as described in Example 5, please refer to [link to Example 5]. Figure 18This embodiment provides a liquid supply device. Compared with Embodiment 5, the difference in this embodiment is that the liquid supply device further includes a suction line L4. The suction line L4 connects the upper exhaust port 5012 to a negative pressure generator, which is used to reduce the pressure in the upper chamber 501 after the liquid inlet in the upper chamber 501 is cut off. Since the discharge rate of the residual liquid in the upper chamber 501 to the lower chamber 502 is mainly affected by its own gravity and the pressure difference between the upper and lower chambers, by reducing the pressure in the upper chamber 501, the pressure difference between the upper and lower chambers is increased, thereby increasing the downward resistance of the residual liquid in the upper chamber 501, and thus reducing the discharge rate of the residual liquid in the upper chamber 501 to the lower chamber 502. A pressure detector P can be installed on the suction line L4 to detect the pressure in the upper chamber 501 in real time.

[0146] exist Figure 19 In the diagram, the time period from t0 to t3 represents the residual liquid depletion zone under controlled residual liquid discharge rate. The dashed line within this time period represents the time-varying relationship between the H2SO4 and H2O2 concentrations in the lower chamber 502 under controlled residual liquid discharge rate. Δt1 represents the time taken for the H2O2 concentration to rise from an initial concentration of 33% to 100% when the discharge rate of the residual liquid in the upper chamber 501 is not controlled. Δt2 represents the time taken for the H2O2 concentration to rise from an initial concentration of 33% to 100% when the discharge rate of the residual liquid in the upper chamber 501 is controlled. Compared to Δt1, Δt2 is longer. In this embodiment, by controlling the slow discharge of the residual liquid from the upper chamber 501 to the lower chamber 502, the residual liquid discharge time is extended, thereby extending the H2O2 concentration change time. This makes the H2O2 concentration change in the lower chamber 502 more gradual, thus avoiding problems such as liquid splashing caused by a sudden increase in H2O2 concentration.

[0147] The following section will provide a detailed description of the SPM cleaning process performed on the substrate using the liquid supply device proposed in this embodiment. SPM is a mixture of H2SO4 and H2O2.

[0148] Step S1, H2O2 pre-supply stage (Pre-H2O2): Open the third valve V3, close the first valve V1 and the second valve V2, and supply H2O2 to the lower chamber 502 of the nozzle to supply H2O2 to the substrate surface for cleaning. At the same time, the control unit adjusts the opening of the lower regulating valve 5023 according to the detection signal of the lower liquid level sensor 5025 to maintain the stability of the liquid level in the lower chamber 502.

[0149] Step S2, SPM Supply Stage (SPM): First valve V1, second valve V2, and third valve V3 are opened, supplying H2SO4 and H2O2 to the upper chamber 501 of the nozzle while simultaneously supplying H2O2 to the lower chamber 502 of the nozzle. The liquid levels in both chambers 501 and 502 are maintained stable. The mixed liquids from the upper and lower chambers are then supplied to the substrate surface for cleaning. Specifically, the control unit adjusts the opening of the upper regulating valve 5013 based on the detection signal from the upper liquid level sensor 5015 to maintain a stable liquid level in the upper chamber 501, and the control unit adjusts the opening of the lower regulating valve 5023 based on the detection signal from the lower liquid level sensor 5025 to maintain a stable liquid level in the lower chamber 502.

[0150] Step S3, Post-H2O2 supply stage: Close the first valve V1 and the second valve V2, while keeping the third valve V3 open. This cuts off the supply of H2SO4 and H2O2 to the upper chamber 501 of the nozzle, while continuing to supply H2O2 to the lower chamber 502 of the nozzle. This allows H2O2 to be supplied to the substrate surface to replace the H2SO4 and H2O2 mixture on the substrate surface. Simultaneously, the opening of the lower regulating valve 5023 is adjusted according to the detection signal from the lower liquid level sensor 5025 to maintain a stable liquid level in the lower chamber 502. The control of the liquid level in the upper chamber 501 is stopped, and the upper regulating valve 5013 is closed. The negative pressure generator is turned on to reduce the pressure in the upper chamber 501 and maintain it at a predetermined pressure. Compared to not controlling the discharge rate of residual liquid in the upper chamber, pressure control of the upper chamber 501 after cutting off the inlet fluid can slow down the descent rate of the residual liquid in the upper chamber 501, thus prolonging the time for the concentration change of the mixed solution in the lower chamber 502. Figure 19 As shown, the H2O2 concentration change time in the lower chamber changes from Δt1 to Δt2, thereby prolonging the H2O2 concentration change time in the lower chamber, making the H2O2 concentration change more gradual, avoiding liquid splashing that could damage the substrate surface and reduce the cleaning effect caused by sudden concentration changes.

[0151] Step S4, Stop Liquid Supply (Process end): Close the first valve V1, the second valve V2 and the third valve V3, stop controlling the liquid level in the lower chamber 502, turn off the negative pressure generator, stop controlling the pressure in the upper chamber, open the upper exhaust valve 5013, and keep the upper regulating valve 5013 and the lower regulating valve 5014 in the normally open state.

[0152] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in the present invention should still be covered by the claims of the present invention.

Claims

1. A liquid supply device, characterized in that, The nozzle includes a cavity inside, the nozzle comprising: Liquid inlet, used to introduce liquid into the cavity; A liquid outlet is located at the bottom of the cavity and is used to drain liquid from the cavity. An exhaust port, located at the top of the cavity, is used to expel gas from the cavity. The separation section is cylindrical, located above the liquid outlet and inside the cavity. The separation section includes a cylindrical body with multiple oblique holes on its side wall. When viewed from the inside of the cylindrical body to the outside, the multiple oblique holes are inclined upwards. The bottom of the cylindrical body is open and communicates with the liquid outlet.

2. The liquid supply device according to claim 1, characterized in that, The top of the cylinder is sealed, or the top of the cylinder is open, or the top of the cylinder has at least one through hole.

3. The liquid supply device according to claim 2, characterized in that, The at least one through hole is a vertical hole, or the at least one through hole is inclined toward the exhaust port.

4. The liquid supply device according to claim 1, characterized in that, The liquid inlet includes: The first liquid inlet is used to introduce the first liquid into the cavity; The second liquid inlet is used to introduce a second liquid into the cavity.

5. The liquid supply device according to claim 1, characterized in that, The liquid inlet includes: The mixing inlet is used to introduce a mixture of the first and second liquids into the cavity.

6. The liquid supply device according to claim 1, characterized in that, The cavity is also equipped with a buffer plate that blocks the liquid inlet, and there is a gap between the buffer plate and the liquid inlet.

7. The liquid supply device according to claim 1, characterized in that, The bottom of the cavity is provided with a flow guide surface, which is inclined downwards towards the cylinder. The lowest row of inclined holes in the cylinder is connected to the lowest point of the flow guide surface.

8. The liquid supply device according to claim 1, characterized in that, The cavity has an upper chamber and a lower chamber that communicate with each other, wherein the separation part is disposed in the upper chamber and / or the lower chamber.

9. A liquid supply device, characterized in that, The nozzle includes a cavity inside, the nozzle comprising: The first liquid inlet is used to introduce the first liquid into the cavity of the nozzle; The second liquid inlet is used to introduce the second liquid into the cavity of the nozzle; A liquid outlet is located at the bottom of the cavity and is used to discharge a mixture of the first liquid and the second liquid from the cavity. An exhaust port, located at the top of the cavity, is used to discharge gas from the cavity; The liquid supply device further includes: A liquid level sensor is used to detect the height of the liquid level inside a cavity; An exhaust pipe, connected to an exhaust port, is used to expel gas from the cavity. A regulating valve is installed on the exhaust pipe. The control unit is connected to the liquid level sensor and the regulating valve to form a closed-loop control, so as to maintain the liquid level in the cavity at a predetermined height.

10. The liquid supply device according to claim 9, characterized in that, The liquid level inside the cavity is maintained above the liquid inlet.

11. The liquid supply device according to claim 9, characterized in that, The liquid level inside the cavity is maintained below the liquid inlet.

12. The liquid supply device according to claim 9, characterized in that, The nozzle also includes a separation section disposed within the cavity, the separation section being located above the liquid outlet.

13. The liquid supply device according to claim 12, characterized in that, The separation section is plate-shaped, including a plate body, which is located above the liquid outlet.

14. The liquid supply device according to claim 12, characterized in that, The separation section is cylindrical, including a cylindrical body. The side wall of the cylindrical body is provided with multiple oblique holes. When viewed from the inside of the cylindrical body to the outside, the multiple oblique holes are inclined upward. The bottom of the cylindrical body is open and communicates with the liquid outlet.

15. The liquid supply device according to claim 14, characterized in that, The top of the cylinder is sealed, or the top of the cylinder is open, or the top of the cylinder has at least one through hole.

16. The liquid supply device according to claim 15, characterized in that, The at least one through hole is a vertical hole, or the at least one through hole is inclined toward the exhaust port.

17. The liquid supply device according to claim 14, characterized in that, The bottom of the cavity is provided with a flow guide surface, which is inclined downwards towards the cylinder. The lowest row of inclined holes in the cylinder is connected to the lowest point of the flow guide surface.

18. A liquid supply device, characterized in that, The nozzle includes a cavity inside, the nozzle comprising: A mixture inlet is used to introduce a mixture of at least two liquids into the cavity of the nozzle; A liquid outlet is located at the bottom of the cavity for discharging the mixture from the cavity; An exhaust port, located at the top of the cavity, is used to discharge gas from the cavity; The liquid supply device further includes: A liquid level sensor is used to detect the height of the liquid level inside a cavity; An exhaust pipe, connected to an exhaust port, is used to expel gas from the cavity. A regulating valve is installed on the exhaust pipe. The control unit is connected to the liquid level sensor and the regulating valve to form a closed-loop control, so as to maintain the liquid level in the cavity at a predetermined height.

19. The liquid supply device according to claim 18, characterized in that, The liquid level inside the cavity is maintained above the liquid inlet.

20. The liquid supply device according to claim 18, characterized in that, The liquid level inside the cavity is maintained below the liquid inlet.

21. The liquid supply device according to claim 18, characterized in that, The nozzle also includes a separation section disposed within the cavity, the separation section being located between the mixture inlet and the liquid outlet.

22. The liquid supply device according to claim 21, characterized in that, The separation section is plate-shaped, including a plate body, which is located above the liquid outlet.

23. The liquid supply device according to claim 21, characterized in that, The separation section is cylindrical, including a cylindrical body. The side wall of the cylindrical body is provided with multiple oblique holes. When viewed from the inside of the cylindrical body to the outside, the multiple oblique holes are inclined upward. The bottom of the cylindrical body is open and communicates with the liquid outlet.

24. The liquid supply device according to claim 23, characterized in that, The top of the cylinder is sealed, or the top of the cylinder is open, or the top of the cylinder has at least one through hole.

25. The liquid supply device according to claim 24, characterized in that, The at least one through hole is a vertical hole, or the at least one through hole is inclined toward the exhaust port.

26. The liquid supply device according to claim 23, characterized in that, The bottom of the cavity is provided with a flow guide surface, which is inclined downwards towards the cylinder. The lowest row of inclined holes in the cylinder is connected to the lowest point of the flow guide surface.

27. A liquid supply device having a nozzle, characterized in that, The nozzle has an upper chamber and a lower chamber, wherein, The upper chamber includes: Upper liquid inlet, used to introduce liquid into the upper chamber; The upper exhaust port is located at the top of the upper chamber and is used to exhaust the gas in the upper chamber. The upper liquid outlet is located between the upper chamber and the lower chamber and is used to introduce liquid from the upper chamber into the lower chamber. The lower chamber includes: The lower exhaust port is located at the upper part of the lower chamber and is used to exhaust the gas in the lower chamber. The lower liquid outlet is located at the bottom of the lower chamber and is used to drain the liquid from the lower chamber. The liquid supply device further includes: Upper liquid level sensor is used to detect the liquid level height in the upper chamber; The upper exhaust pipe is connected to the upper exhaust port and is used to exhaust the gas in the upper chamber. An upper regulating valve is installed on the upper exhaust pipe. The lower liquid level sensor is used to detect the liquid level height in the lower chamber; The lower exhaust pipe is connected to the lower exhaust port and is used to exhaust the gas in the lower chamber. The lower exhaust pipe is equipped with a lower regulating valve. The control unit is connected to the upper liquid level sensor and the upper regulating valve to form a first closed-loop control, which is used to maintain the liquid level in the upper chamber at a predetermined height; the control unit is also connected to the lower liquid level sensor and the lower regulating valve to form a second closed-loop control, which is used to maintain the liquid level in the lower chamber at a predetermined height.

28. The liquid supply device according to claim 27, characterized in that, The upper liquid inlet includes: The first upper liquid inlet is used to introduce the first liquid into the upper chamber; The second upper liquid inlet is used to introduce a second liquid into the upper chamber.

29. The liquid supply device according to claim 27, characterized in that, The upper liquid inlet includes: The upper mixing inlet is used to introduce a mixture of the first and second liquids into the upper chamber.

30. The liquid supply device according to claim 27, characterized in that, The upper liquid inlet is tangent to the side wall of the upper chamber, so that the liquid introduced through the upper liquid inlet enters the upper chamber tangentially.

31. The liquid supply device according to claim 27, characterized in that, A separation section is provided in the upper chamber and / or lower chamber, and the separation section is located above the liquid outlet of the chamber in which it is located.

32. The liquid supply device according to claim 31, characterized in that, The separation section is plate-shaped, including a plate body, which is located above the liquid outlet of the chamber in which the plate body is located.

33. The liquid supply device according to claim 31, characterized in that, The separation section is cylindrical, including a cylindrical body. The side wall of the cylindrical body is provided with multiple oblique holes. When viewed from the inside of the cylindrical body to the outside, the multiple oblique holes are inclined upward. The bottom of the cylindrical body is open and communicates with the liquid outlet of the chamber in which the cylindrical body is located.

34. The liquid supply device according to claim 33, characterized in that, The top of the cylinder is sealed, or the top of the cylinder is open, or the top of the cylinder has at least one through hole.

35. The liquid supply device according to claim 34, characterized in that, The at least one through hole is a vertical hole, or the at least one through hole is inclined toward the exhaust port.

36. The liquid supply device according to claim 33, characterized in that, The bottom of the chamber containing the cylinder is provided with a flow guide surface, which is inclined downwards towards the cylinder. The lowest row of inclined holes in the cylinder is connected to the lowest point of the flow guide surface.

37. The liquid supply device according to claim 27, characterized in that, The upper chamber is provided with a buffer plate that blocks the upper liquid inlet, and there is a gap between the buffer plate and the upper liquid inlet.

38. The liquid supply device according to claim 27, characterized in that, The lower chamber also includes: The lower liquid inlet is used to introduce liquid into the lower chamber.

39. The liquid supply device according to claim 38, characterized in that, The upper chamber and / or lower chamber are provided with a buffer plate that blocks the liquid inlet of the corresponding chamber, and there is a gap between the buffer plate and the liquid inlet of the corresponding chamber.

40. The liquid supply device according to claim 38, characterized in that, The upper liquid inlet is used to introduce the first liquid and the second liquid into the upper chamber, and the lower liquid inlet is used to introduce the first liquid into the lower chamber.

41. The liquid supply device according to claim 40, characterized in that, The first liquid is H2O2, and the second liquid is H2SO4.

42. The liquid supply device according to claim 38, characterized in that, The lower liquid inlet is tangential to the side wall of the lower chamber, so that the liquid introduced through the lower liquid inlet enters the lower chamber tangentially.

43. The liquid supply device according to claim 38, characterized in that, The liquid level in the upper chamber is maintained below the upper liquid inlet; The liquid level in the lower chamber is maintained above the lower liquid inlet.

44. The liquid supply device according to claim 38, characterized in that, Also includes: The suction line connects the upper exhaust port to the negative pressure generator to reduce the pressure in the upper chamber after the liquid inlet to the upper chamber is cut off.

45. A substrate cleaning method, characterized in that, This includes performing an SPM cleaning process on the substrate using the liquid supply device as described in claim 44, wherein the SPM is a mixture of H2SO4 and H2O2, and the SPM cleaning process includes the following steps: Step S1, H2O2 pre-supply stage: H2O2 is supplied to the lower chamber of the nozzle to supply H2O2 to the substrate surface for cleaning and to maintain a stable liquid level in the lower chamber. Step S2, SPM supply stage: H2SO4 and H2O2 are supplied to the upper chamber of the nozzle while H2O2 is supplied to the lower chamber of the nozzle, and the liquid levels in the upper and lower chambers are kept stable. After the liquids in the upper and lower chambers are mixed, they are supplied to the substrate surface for cleaning the substrate. Step S3, H2O2 post-supply stage: Cut off the supply of H2SO4 and H2O2 to the upper chamber of the nozzle, and continue to supply H2O2 to the lower chamber of the nozzle, and maintain the liquid level in the lower chamber to supply H2O2 to the substrate surface to replace the H2SO4 and H2O2 mixture on the substrate surface.

46. ​​The substrate cleaning method according to claim 45, characterized in that, In step S3, after cutting off the supply of H2SO4 and H2O2 to the upper chamber of the nozzle, while maintaining the stability of the liquid level in the lower chamber, the control of the liquid level in the upper chamber is stopped, the upper regulating valve is closed, and the pressure in the upper chamber is reduced to the predetermined pressure.

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