A glass microprobe rapid automatic scanning device and method based on SICM

Abstract

The present application discloses a glass microprobe rapid automatic scanning device and method based on SICM, the method comprising: depositing two deposition points on a substrate; obtaining the image distance between the two deposition points based on the image of the deposition points; obtaining the spatial distance between the two deposition points based on the scanning result of the probe; determining the relative position relationship between the image distance and the probe displacement distance; obtaining the corresponding position relationship of the sample in the coordinate system; and planning the path based on the path algorithm to perform three-dimensional scanning on the sample and obtain the three-dimensional structure of the target. The present application reduces the cumbersome steps of lifting the probe holder when switching between the deposition probe and the scanning probe, and reduces the possibility of collision between the probe and the substrate caused by lifting the probe holder; completes the calibration of the relative position relationship between the image distance and the probe displacement distance, eliminates the redundancy of the scanning trajectory of the scanning probe, and greatly improves the scanning imaging efficiency of three-dimensional micro-nano structures.

Description

Technical Field

[0001] The present application belongs to the technical field of microscopes and image analysis, and specifically relates to a glass microprobe rapid automatic scanning device and method based on SICM. Background Art

[0002] Scanning Ion Conductance Microscopy (SICM) is a scanning probe microscopic imaging technology that has the advantages of micro-nano imaging resolution and easy preparation of probes. It also has the unique advantage of imaging living cells under physiological conditions, and can achieve multifunctional imaging of the morphology, mechanics, and electrical information of conductors, semiconductors, and non-conductors. Therefore, it gradually plays an important role in the fields of electrochemistry, life sciences, and materials science. In order to ensure that all morphological information of three-dimensional micro-nano structures can be obtained, and because the positional relationship between the probe and the three-dimensional micro-nano structure to be scanned cannot be determined, the probe is often used to scan the entire substrate within a large area containing the object to be measured. Each operation requires a pre-estimation of the scanning position and a pre-setting of the scanning range, which will lead to redundancy of the probe scanning trajectory, and the scanning trajectory redundancy greatly limits its imaging efficiency.

[0003] The patent application number is 202010869933.X, and the name is "A liquid phase micro-nano processing method and equipment". In this patent, the probe needs to be lifted up again after each deposition point to find the deposition position of the next point, which wastes time. The frequent rising and falling of the probe may cause the liquid bridge to break or the probe to collide, and the success rate is low.

[0004] The patent application number is 202210773450.9, and the name is "A micro-nanoscale rapid reading and writing system and method based on glass microprobe". This invention adopts a dual-probe alternating method, using a scanning probe to obtain the normal vector of the printing plane, generate the corresponding scanning printing path of the plane, and then lift the probe holder and adjust it to the printing probe for printing deposition at the micro-nano scale. Then lift the probe holder and adjust it to the scanning probe to measure and image the previously printed model. In this patent, the dual probes need to lift the probe holder before alternating, and the steps are relatively cumbersome. In addition, this patent cannot determine the correspondence between the image distance and the probe displacement distance. When the deposition probe is deposited, the scanning probe cannot be located at the deposition point, so it can only scan the entire substrate to complete the measurement imaging. This will cause a large scanning trajectory redundancy and greatly limit the imaging efficiency. Summary of the invention

[0005] The present application provides a glass microprobe rapid automatic scanning device and method based on SICM to solve the above-mentioned technical problems.

[0006] In order to solve the above technical problems, a technical solution adopted in the present application is: a glass microprobe rapid automatic scanning method based on SICM, comprising the following steps:

[0007] Depositing two deposition points on the substrate and taking images of the deposition points;

[0008] Based on the images of the deposition points, an image distance between two deposition points is obtained;

[0009] Switch the probe and scan the deposition points to obtain the spatial distance between the two deposition points;

[0010] Based on the image distance and the spatial distance, determine the relative position relationship between the image distance and the probe displacement distance;

[0011] Placing the sample on the substrate, and selecting a deposition point as the origin to establish a coordinate system, and obtaining a second image; wherein the second image includes the origin and the relative position of the sample;

[0012] Based on the second image and the coordinate system, obtaining the corresponding position relationship of the sample in the coordinate system;

[0013] Based on the path algorithm and the corresponding position relationship of the sample in the coordinate system, a path is planned to perform three-dimensional scanning on the sample and obtain the three-dimensional structure of the sample.

[0014] Further, based on the image of the deposition point, a method for obtaining the image distance between two deposition points includes:

[0015] Determine the center of the circumscribed circle of the first deposition point as the origin of the probe coordinate system and the image coordinate system, determine the center of the circumscribed circle of the second deposition point as the coordinate point of the second deposition point in the image coordinate system, and calculate the first horizontal axis distance and the first vertical axis distance of the two deposition points in the image coordinate system.

[0016] Further, the method of switching the probe and scanning the deposition points to obtain the spatial distance between the two deposition points includes:

[0017] The deposition probe rises and the scanning probe descends to scan the substrate;

[0018] The scanning probe stops after finding the first deposition point, and the first position of the scanning probe at this time is recorded;

[0019] The scanning probe continues scanning to find the second deposition point, and records the second position of the probe at this time;

[0020] Based on the first position and the second position, a second horizontal axis distance and a second vertical axis distance between the two deposition points on the platform coordinate system are calculated.

[0021] Further, based on the image distance and the spatial distance, a method for determining the relative positional relationship between the image distance and the probe displacement distance includes:

[0022] Based on the first horizontal axis distance, the first vertical axis distance, the second horizontal axis distance, and the second vertical axis distance, a relative positional relationship between the image distance and the probe displacement distance is determined.

[0023] Another technical solution adopted in the present application is: a glass microprobe fast automatic scanning device based on SICM, including: a probe assembly, used to deposit deposition points and scan deposition points and samples; a motor assembly, used to complete the switching of deposition probes and scanning probes; a gear assembly, connected to the probe assembly, wherein the gear assembly drives the probe assembly to move; a probe bracket, fixedly connected to the motor assembly, wherein the probe bracket is used to support the motor assembly; a shooting assembly, located below the probe assembly, wherein the shooting assembly is used to take pictures of deposition points and samples; a main control assembly, connected to the motor assembly and the shooting assembly, wherein the main control assembly is used to receive and analyze image information and send a transmission signal to the motor assembly.

[0024] Furthermore, the probe assembly includes: a deposition probe for forming a deposition point; and a scanning probe for scanning and acquiring the position of the deposition point.

[0025] Furthermore, the gear assembly includes a main body plate, a gear and a rack. The gear is located in a groove in the middle of the main body plate. The rack is movably arranged on both sides of the gear and meshes with the gear. Thereafter, the deposition probe and the scanning probe are respectively fixed to the racks on both sides through probe connectors.

[0026] Furthermore, the motor assembly includes a motor bracket and a DC motor, the DC motor is connected to the central axis of the gear, and the DC motor is connected to the main plate through a probe bracket.

[0027] Furthermore, the probe bracket includes a movable frame and a platform. The platform is provided with an opening. The movable frame is arranged at the edge of the opening and connected to the main body plate. A base is provided in the opening, and the base is connected to the platform through the bottom plate.

[0028] The beneficial effects of the present application are as follows: the present application reduces the cumbersome steps of lifting the probe holder required for switching between the deposition probe and the scanning probe, and reduces the possibility of collision between the probe and the substrate caused by lifting the probe holder; the present application completes the calibration of the relative position relationship between the image distance and the probe displacement distance, eliminates the redundancy of the scanning trajectory of the scanning probe, and greatly improves the scanning imaging efficiency of three-dimensional micro-nano structures. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 It is a flow chart of an embodiment of a glass microprobe rapid automatic scanning method based on SICM of the present application;

[0030] Figure 2 for Figure 1 A schematic flow chart of an embodiment of step S3 in FIG.

[0031] Figure 3 It is a structural schematic diagram of an embodiment of a glass microprobe rapid automatic scanning device based on SICM of the present application;

[0032] Figure 4 yes Figure 3 A schematic diagram of a process flow of an embodiment of a gear tooth assembly;

[0033] Figure 5 A comparison chart of the scanning method of the present application and the traditional scanning method. DETAILED DESCRIPTION

[0034] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention is further described in detail below in conjunction with specific embodiments.

[0035] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments of the following disclosure.

[0036] See also Figure 1 , Figure 1 1 is a flow chart of an embodiment of a method for rapid automatic scanning of a glass microprobe based on SICM of the present application. The method comprises:

[0037] Step S1. Deposit two deposition points on the substrate and take images of the deposition points.

[0038] Specifically, two deposition points are deposited on the base by a deposition needle, and a deposition image including the two points is captured.

[0039] Step S2: Based on the image of the deposition point, obtain the image distance between two deposition points.

[0040] Specifically, the center of the circumscribed circle of the first deposition point is determined as the origin of the probe coordinate system and the image coordinate system, the center of the circumscribed circle of the second deposition point is used as the coordinate point of the second deposition point in the image coordinate system, and the first horizontal axis distance of the deposition point along the X and Y axes in the image coordinate system is calculated. Δ x and a first vertical axis distance Δy.

[0041] Step S3: Switch the probe and scan the deposition points to obtain the spatial distance between the two deposition points.

[0042] For details, see Figure 2 , Figure 2 for Figure 1 The flowchart of step S3 in the embodiment of FIG. 1 is as follows. Step S2 includes:

[0043] Step S31: The deposition probe rises and the scanning probe descends to scan the substrate.

[0044] Specifically, the deposition probe rises and the scanning probe descends to scan the substrate to find the deposition point.

[0045] Step S32: The scanning probe stops after finding the first deposition point, and the first position of the scanning probe at this time is recorded.

[0046] Specifically, after finding the deposition point, the scanning probe stops scanning and stops at a position substantially overlapping with the deposition point, and records the first position scanned at this time.

[0047] Step S33: The scanning probe continues scanning to find the second deposition point and records the second position of the probe at this time.

[0048] Specifically, the scanning probe continues to scan to find another deposition point. When scanning to another point, the probe stops scanning and records the second position at this time.

[0049] Step S34: Based on the first position and the second position, calculate the second horizontal axis distance and the second vertical axis distance between the two deposition points on the platform coordinate system.

[0050] Specifically, the distances between the first position and the second position along the X and Y axes on the platform coordinate system are calculated to be ΔX and ΔY respectively.

[0051] Step S4: Based on the image distance and the spatial distance, determine the relative positional relationship between the image distance and the probe displacement distance.

[0052] Specifically, according to Δx 、 Δy, ΔX and ΔY determine the relative position relationship between the image distance and the probe displacement distance.

[0053] Step S5. Place the sample on the substrate, select a deposition point as the origin to establish a coordinate system, and obtain a second image; wherein the second image includes the origin and the relative position of the sample.

[0054] Specifically, the sample is placed on a substrate, a deposition point is deposited on the substrate as an origin, and a second picture including the sample and the deposition point is taken.

[0055] Step S6. Based on the second image and the coordinate system, obtain the corresponding position relationship of the sample in the coordinate system.

[0056] Specifically, the second image is analyzed by a computer, and the positional relationship between the projection imaging contour of the target object to be measured and the projection imaging of its origin is analyzed using digital image processing technology to obtain the corresponding positional relationship between the deposition point and the sample in the image coordinate system.

[0057] Step S7. Based on the path algorithm and the corresponding position relationship of the sample in the coordinate system, plan the path to perform three-dimensional scanning on the sample and obtain the three-dimensional structure of the target

[0058] Specifically, according to the path planning algorithm, an optimal path is planned to perform a three-dimensional structure scan of the target to be measured, thereby obtaining the three-dimensional structure of the target to be measured.

[0059] The present application reduces the cumbersome steps of lifting the probe holder required for switching between the deposition probe and the scanning probe, and reduces the possibility of collision between the probe and the substrate caused by lifting the probe holder; completes the calibration of the relative position relationship between the image distance and the probe displacement distance, eliminates the redundancy of the scanning probe scanning trajectory, and greatly improves the scanning imaging efficiency of three-dimensional micro-nano structures.

[0060] See also Figure 3 , Figure 3 1 is a schematic diagram of the structure of an embodiment of a glass microprobe rapid automatic scanning device based on SICM of the present application. The device comprises:

[0061] The probe assembly 1 is used for scanning and detecting the positions of the deposition points and samples; the probe assembly 1 comprises a deposition probe 11 for forming the deposition points and a scanning probe 12 for scanning and acquiring the positions of the deposition points.

[0062] The motor assembly 2 is used to switch between the deposition probe 11 and the scanning probe 12;

[0063] The gear assembly 3 is connected to the probe assembly 1, wherein the gear assembly 3 drives the probe assembly 1 to move;

[0064] The probe bracket 4 is fixedly connected to the motor assembly 2, wherein the motor assembly 2 is used to support the motor assembly 2;

[0065] A shooting component 5 is located below the probe component 1, wherein the shooting component 5 is used to take pictures of the deposition point and the sample;

[0066] The main control component 6 is connected to the motor component 2 and the shooting component 5 , wherein the main control component 6 is used to receive and analyze image phase information and send a transmission signal to the motor component 2 .

[0067] See also Figure 4 , Figure 4 yes Figure 3The process diagram of an embodiment of the gear assembly in the figure. The gear assembly 3 includes a main body plate 31, a gear 32 and a rack 33. The gear 32 is located in a groove in the middle of the main body plate 31. The rack 33 is movably arranged on both sides of the gear 32 and meshes with the gear 32. Thereafter, the deposition probe 11 and the scanning probe 12 are respectively fixed to the racks 33 on both sides through probe connectors 34. The gear 32 and the rotation in the above design can simultaneously control the racks 33 on both sides to move up and down. When the rack 33 on one side moves down, the rack 33 on the other side rises, so that there is no need to consider the influence of lifting the probe bracket when switching the deposition probe 11 and the scanning probe 12.

[0068] The motor assembly 2 includes a motor bracket 21 and a DC motor 22, the DC motor 22 is connected to the central axis of the gear 32, and the DC motor 22 is connected to the main plate 31 through the probe bracket 4. The above-mentioned motor can control the rotation of the gear 32 in real time, thereby controlling the up and down movement of the probe connected to the rack 33.

[0069] The probe support 4 includes a moving frame 41 and a platform 42. The platform 42 is provided with an opening 43. The moving frame 41 is arranged at the edge of the opening 43 and connected to the main plate 31. A base 44 is arranged in the opening 43, and the base 44 is connected to the platform 42 through a bottom plate 45. The moving frame 41 in the above design can control the overall movement of the gear assembly 3 up and down, left and right, and front and back, so as to more accurately adjust the position of the probe.

[0070] The specific operation method is that a gear 32 is installed in the circular groove part in the middle of the main plate 31, a DC motor 22 is installed on the axis of the gear 32, and the two sides of the gear 32 are respectively meshed with two racks 33, and the DC motor 22 is covered with a probe bracket 4 on the outside to play a supporting role, and the DC motor 22 is connected to an embedded controller, and the racks 33 are respectively embedded in the rectangular grooves on both sides of the central axis of the main plate 31, and probes are installed on the racks 33. The device can use a camera to complete the calibration of the positional relationship between the two probes, thereby realizing the automatic deposition and scanning of the probes. And the DC motor can rotate to drive the gear 32 and the rack 33 to drive, so as to realize the rising and descending movement of the probes on both sides, so as to achieve the purpose of one probe going down and being in a working state, and the other probe is rising and in a pending state, reducing the cumbersome steps of lifting the probe bracket before the double probes are alternated and eliminating the problems of probe damage that may be caused thereby.

[0071] See also Figure 5 , Figure 5This is a comparison chart between the scanning method of the present application and the traditional scanning method. The traditional method is that the scanning probe 12 obtains the normal vector of the printing plane, generates the corresponding scanning printing path of the plane, then lifts the probe holder and adjusts it to the printing probe for printing deposition at the micro-nano scale, and then lifts the probe holder and adjusts it to the scanning probe 12 to measure and image the previously printed model. Compared with the traditional method, the present application does not need to lift the probe holder before alternating the dual probes, and the steps are relatively simple. In addition, the present application can determine the corresponding relationship between the image distance and the probe displacement distance. When the deposition probe 11 is deposited, the scanning probe 12 is positioned at the deposition point. The measurement imaging can be completed without scanning the entire substrate 44, which will not cause a large scanning track redundancy and greatly improve the imaging efficiency.

[0072] The above description is only an embodiment of the present application and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly used in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A glass microprobe rapid automatic scanning method based on SICM, characterized in that: The following steps are involved: Depositing two deposition points on a substrate and taking images of the deposition points; Based on the images of the deposition points, acquiring an image distance between two of the deposition points; Switching the probe and scanning the deposition points to obtain the spatial distance between the two deposition points; Based on the image distance and the spatial distance, determining a relative positional relationship between the image distance and the probe displacement distance; Placing the sample on the substrate, and selecting one of the deposition points as the origin to establish a coordinate system, and obtaining a second image; wherein the second image includes the origin and the relative position of the sample; Based on the second picture and the coordinate system, obtaining a corresponding position relationship of the sample in the coordinate system; Based on the path algorithm and the corresponding position relationship of the sample in the coordinate system, a path is planned to perform three-dimensional scanning on the sample and obtain the three-dimensional structure of the sample.

2. The method according to claim 1, characterized in that The method for obtaining the image distance between two deposition points based on the images of the deposition points comprises: Determine the center of the circumscribed circle of the first deposition point as the origin of the probe coordinate system and the image coordinate system, determine the center of the circumscribed circle of the second deposition point as the coordinate point of the second deposition point in the image coordinate system, and calculate the first horizontal axis distance and the first vertical axis distance of the two deposition points in the image coordinate system.

3. The method according to claim 2, characterized in that The method of switching the probe and scanning the deposition points to obtain the spatial distance between the two deposition points comprises: The deposition probe rises and the scanning probe descends to scan the substrate; The scanning probe stops after finding the first deposition point, and the first position of the scanning probe at this time is recorded; The scanning probe continues scanning to find the second deposition point, and records the second position of the probe at this time; Based on the first position and the second position, a second horizontal axis distance and a second vertical axis distance between the two deposition points on the platform coordinate system are calculated.

4. The method according to claim 3, characterized in that The method for determining the relative position relationship between the image distance and the probe displacement distance based on the image distance and the spatial distance includes: Based on the first horizontal axis distance, the first vertical axis distance, the second horizontal axis distance, and the second vertical axis distance, a relative positional relationship between the image distance and the probe displacement distance is determined.

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