Cleaning systems and methods for chemical containers

Abstract

This invention relates to the field of chemical container cleaning technology, specifically to a chemical container cleaning system and method. The chemical container cleaning system includes a nozzle adjustment device and a cleaning fluid supply device. The nozzle adjustment device includes a base plate, a fixing frame, a nozzle, and a connecting rod. The base plate has a central through hole, which includes an observation hole and a rod hole. The fixing frame is connected to the base plate and includes a chassis and a support. The support includes two opposing base plates located at the two ends of the opening of the rod hole, and both base plates have sliding holes. The connecting rod has a hollow structure and is slidably connected to the support via a connector, with the connecting rod passing through the rod hole. The nozzle is connected to the connecting rod. The cleaning fluid supply device is connected to the nozzle. This chemical container cleaning system can achieve multiple fixed-point cleaning, expanding the cleaning radius and increasing the cleaning coverage area, thereby improving cleaning quality and efficiency.

Description

Technical Field

[0001] This invention relates to the field of cleaning technology for chemical containers, and more specifically, to a cleaning system and method for chemical containers. Background Technology

[0002] Chemical containers require professional cleaning services to remove scale before, during, and before disposal to ensure their safety and environmental protection requirements are met. Currently, common cleaning methods in the chemical container cleaning field include personnel using handheld guns to enter the container for high-pressure water jet cleaning. However, personnel entering the container for cleaning pose risks related to confined space operations and working at heights. Furthermore, 3D nozzles offer limited single-point cleaning coverage, making it difficult to meet the cleaning needs of larger containers.

[0003] In view of this, the present invention is hereby proposed. Summary of the Invention

[0004] One objective of this invention is to provide a cleaning system for chemical containers to address the technical problems of limited coverage, poor cleaning quality, low efficiency, and high HSE risks in existing chemical container cleaning methods. The cleaning system for chemical containers of this invention can achieve multi-point cleaning, expand the cleaning radius, and increase the cleaning coverage area, thereby improving cleaning quality and efficiency.

[0005] Another objective of this invention is to provide a method for cleaning chemical containers, which can improve the cleaning quality and efficiency of chemical containers.

[0006] In order to achieve the above-mentioned objectives of the present invention, the following technical solution is adopted:

[0007] A cleaning system for chemical containers includes a nozzle adjustment device and a cleaning fluid supply device.

[0008] The nozzle adjustment device includes a base plate, a fixing frame, a nozzle, and a connecting rod;

[0009] The base plate is provided with a central through hole, which includes an observation hole and a rod hole;

[0010] The fixing frame is connected to the base plate. The fixing frame includes a chassis and a support. The support includes two opposing base plates. The two base plates are located at both ends of the opening of the rod hole. Each of the two base plates is provided with a slide hole.

[0011] The connecting rod has a hollow structure, and the connecting rod is slidably connected to the bracket through a connector, and the connecting rod passes through the rod hole;

[0012] The nozzle is connected to the connecting rod;

[0013] The cleaning fluid supply device is connected to the nozzle.

[0014] In one embodiment, the slide hole is arc-shaped; the recess of the slide hole faces the base plate.

[0015] In one embodiment, a fixing component is provided on the connecting rod; the fixing component includes a support and a pin component, the support is provided with a first opening, the first opening being perpendicular to the connecting rod; the connecting member passes through the first opening; the pin component is provided at the top of the support, and the pin component is used to fix the connecting rod.

[0016] In one embodiment, the base plate has a plurality of side openings around its perimeter, which are used to fix the base plate to the manhole of the chemical container to be cleaned.

[0017] In one embodiment, the cleaning system for the chemical container further includes a cover plate, which is detachably connected to the base plate, and the cover plate is used to seal the observation hole.

[0018] In one embodiment, the nozzle is a 3D nozzle.

[0019] In one embodiment, the cleaning fluid supply device includes a cleaning fluid storage tank, a booster pump, and pipelines; the cleaning fluid storage tank is connected to the nozzle via the booster pump and pipelines, and the connecting rod is sleeved on the outside of a portion of the pipelines.

[0020] The cleaning method for chemical containers using the aforementioned cleaning system includes the following steps:

[0021] Install the base plate of the chemical container cleaning system onto the manhole of the chemical container to be cleaned, so that the nozzle is located inside the chemical container to be cleaned.

[0022] Based on the specifications and characteristics of the dirt in the chemical container to be cleaned, the position of the connecting rod is adjusted to determine the different suspension points of the nozzle inside the chemical container.

[0023] The chemical container is cleaned by providing cleaning fluid through a cleaning fluid supply device and by using chemical cleaning and / or high-pressure water jet cleaning.

[0024] In one embodiment, the fouling inside the chemical container includes at least one of rust, polymer scale, carbon deposits, oil, and weld oxide.

[0025] In one embodiment, when the dirt is rust or grease, high-pressure water jet cleaning or spray circulation chemical cleaning is used; when the dirt is polymer scale or carbon deposits, high-pressure water jet cleaning is used; and when the dirt is weld spot oxides, spray circulation chemical cleaning is used.

[0026] In one embodiment, the parameters of the high-pressure water jet cleaning include: the pressure of the high-pressure water jet cleaning is 0.5 to 1.1 MPa; the flow rate of the cleaning fluid is 50 to 260 L / min; the cleaning time for each hanging point is 30 to 45 min; and the nozzle inner diameter of the spray head is 1.0 to 2.0 mm.

[0027] In one embodiment, the parameters for the chemical cleaning include: the effective range of the nozzle is 8.5–20 m, and the flow rate of the cleaning fluid is 10.45–37.8 m³ / min. 3 The cleaning pressure is 0.6 to 0.9 MPa per hour, and the nozzle diameter of the spray head is 6.98 to 14.02 mm.

[0028] In one embodiment, when the dirt is rust or grease, the pressure of the high-pressure water jet cleaning is 0.5 to 0.6 MPa, and the flow rate of the cleaning fluid is 50 to 200 L / min.

[0029] In one embodiment, the polymer scale includes at least one of hard resin, tough and viscous resin, viscous and tough polymer, and latex polymer.

[0030] In one embodiment, when the polymer scale is a hard resin, the pressure of the high-pressure water jet cleaning is 1–1.1 MPa, and the flow rate of the cleaning fluid is 65–260 L / min; when the polymer scale is a tough and viscous resin, the pressure of the high-pressure water jet cleaning is 0.8–1 MPa, and the flow rate of the cleaning fluid is 60–240 L / min; when the polymer scale is a viscous and tough polymer, the pressure of the high-pressure water jet cleaning is 0.5–1 MPa, and the flow rate of the cleaning fluid is 50–200 L / min; when the polymer scale is a latex polymer, the pressure of the high-pressure water jet cleaning is 0.7–8 MPa, and the flow rate of the cleaning fluid is 55–230 L / min.

[0031] In one embodiment, when the dirt is carbon deposits, the pressure of the high-pressure water jet cleaning is 0.6 to 1 MPa, and the flow rate of the cleaning fluid is 60 to 240 L / min.

[0032] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0033] (1) The cleaning system of the present invention can safely and stably hold the nozzle, realize multi-point cleaning, expand the cleaning radius, increase the cleaning coverage area, thereby improving the cleaning quality and efficiency, reducing the HSE risk at the cleaning site, and improving safety performance.

[0034] (2) The cleaning method for chemical containers of the present invention can achieve multi-point cleaning, expand the cleaning radius, increase the cleaning coverage area, and significantly improve the cleaning quality and efficiency. Attached Figure Description

[0035] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0036] Figure 1 This is an overall schematic diagram of the cleaning system for chemical containers of the present invention;

[0037] Figure 2 This is a top view of the base plate of the present invention;

[0038] Figure 3 This is a schematic diagram of the structure of the fixing component on the connecting rod of the present invention.

[0039] Figure label:

[0040] 1-Base plate, 101-Central through hole, 1011-Observation hole, 1012-Rod hole, 102-Side opening, 2-Fixing bracket, 201-Chassis, 202-Bracket, 203-Slide hole, 204-Connector, 3-Connecting rod, 4-Sprayer, 5-Cover plate, 6-Cleaning fluid storage tank, 7-Pressure pump, 8-Pipeline, 9-Fixing component, 901-Support, 902-First opening, 903-Pin component. Detailed Implementation

[0041] The embodiments of the present invention will be described in detail below with reference to examples. However, those skilled in the art will understand that the following examples are for illustrative purposes only and should not be considered as limiting the scope of the invention. Unless otherwise specified in the examples, conventional conditions or conditions recommended by the manufacturer are followed. Reagents or instruments whose manufacturers are not specified are all commercially available conventional products.

[0042] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this invention is in use. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention. In addition, the terms "first," "second," "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0043] In the description of this invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0044] According to one aspect of the present invention, the present invention relates to a cleaning system for a chemical container, comprising a nozzle adjustment device and a cleaning fluid supply device; the nozzle adjustment device comprises a base plate, a fixing frame, a nozzle, and a connecting rod; the base plate is provided with a central through hole, the central through hole including an observation hole and a rod hole; the fixing frame is connected to the base plate, the fixing frame including a chassis and a support, the support including two opposing base plates located at both ends of the opening of the rod hole, and each of the two base plates is provided with a slide hole; the connecting rod has a hollow structure, the connecting rod is slidably connected to the support by a connector, and the connecting rod passes through the rod hole; the nozzle is connected to the connecting rod; the cleaning fluid supply device is connected to the nozzle.

[0045] The cleaning system of the present invention can safely and stably hold the nozzle, realize multi-point cleaning, expand the cleaning radius, increase the cleaning coverage area, thereby improving the cleaning quality and efficiency, reducing the HSE risk at the cleaning site, and improving safety performance.

[0046] In one embodiment, the nozzle is a 3D nozzle.

[0047] In one embodiment, the slide hole is arc-shaped; the recess of the slide hole faces the base plate. A connector passes through the slide hole and can move within it, thereby adjusting the position of the connecting rod to control the nozzle's suspension point and angle, thus enabling better removal of internal contaminants from the chemical container.

[0048] In one embodiment, the two substrates each include a bottom plate and a vertical side plate; the side plate is provided with the slide hole; the bottom plate is provided with a first through hole; the chassis is provided with a second through hole; the chassis and the bracket are fixed to the bottom plate by fasteners (e.g., bolts and nuts); the chassis is located on the upper part of the bottom plate.

[0049] In one embodiment, a fixing component is provided on the connecting rod; the fixing component includes a support and a pin component, the support having a first opening perpendicular to the connecting rod; the connecting member passes through the first opening; the pin component is provided at the top of the support, and the pin component is used to fix the connecting rod. The pin component of the present invention includes a base with a insertion hole and a insertion rod, the insertion rod and the base with the insertion hole being connected by a thread. In one embodiment, the connecting rod is made of a metal tube or a composite tube. In one embodiment, the connecting rod is a telescopic tube, and the length of the connecting rod is adjustable.

[0050] In one embodiment, the base plate has multiple side openings around its perimeter, which are used to fix the base plate to the manhole of the chemical container to be cleaned. In one embodiment, the side openings are evenly distributed around the perimeter of the base plate; in another embodiment, there are four side openings.

[0051] In one embodiment, the chemical container includes various chemical storage tanks, reaction vessels, and tanks. In one embodiment, the chemical container with the following conditions is suitable for using the cleaning system of the present invention: 1) it has a manhole or opening on the top or side for installing the cleaning system; 2) it has an opening at the bottom for draining and guiding the cleaning fluid; and 3) its internal structure is relatively simple.

[0052] In one embodiment, the cleaning system for the chemical container further includes a cover plate for sealing the observation port. The cover plate and the base plate are detachably connected. In one embodiment, the cover plate and the base plate are connected by a pin assembly.

[0053] In one embodiment, the cleaning fluid supply device includes a cleaning fluid storage tank, a pressure pump, and pipelines; the cleaning fluid storage tank is connected to the nozzle via the pressure pump and pipelines. The outlet of the cleaning fluid supply device is connected to the inlet of the pressure pump, the outlet of the pressure pump is connected to the inlet of the pipeline, and the outlet of the pipeline passes through the interior of the connecting rod and is connected to the nozzle; that is, the connecting rod is sleeved on the outside of a portion of the pipeline and connected to the nozzle.

[0054] The cleaning solution storage tank is used to hold the cleaning solution, which is then pumped through a pressurized pump and pipelines to the nozzles to clean the internal surface of the chemical container. In one embodiment, a filter device is installed between the cleaning solution storage tank and the pressurized pump to prevent particulate impurities from damaging the pump or causing secondary contamination of the equipment pipelines.

[0055] According to another aspect of the present invention, the present invention also relates to a method for cleaning chemical containers using the aforementioned cleaning system, comprising the following steps:

[0056] The base plate of the chemical container cleaning system is installed at the manhole of the chemical container to be cleaned, so that the nozzle is located inside the chemical container. According to the specifications and dirt characteristics of the chemical container to be cleaned, the position of the connecting rod is adjusted to determine the different suspension points of the nozzle inside the chemical container. Cleaning fluid is supplied through the cleaning fluid supply device, and the chemical container is cleaned by chemical cleaning and / or high-pressure water jet cleaning.

[0057] The method of the present invention can safely and securely suspend the nozzle, realize multi-point cleaning, expand the cleaning radius, increase the cleaning coverage area, and thus improve the cleaning quality and efficiency.

[0058] In one embodiment, the fouling inside the chemical container includes at least one of rust, polymer scale, carbon deposits, oil, and weld oxide.

[0059] In this invention, high-pressure water jet cleaning refers to: pressurizing water to a certain pressure using a pressure pump, and then converting it into a high-speed water jet through a spray device (nozzle) with a fine aperture, using this high-speed water jet to complete the cleaning work. Chemical cleaning refers to: using the principles of dissolving, emulsifying, complexing, dispersing, and adsorbing chemicals or preparations to remove dirt from the equipment being cleaned. Chemical cleaning includes spray circulation chemical cleaning, which refers to: establishing a circulation system including liquid cleaning medium, the equipment being cleaned, and a cleaning pump in chemical cleaning; using the power generated by the pressure pump, the cleaning medium is sprayed through nozzles onto the upper part or surface of the equipment being cleaned, ensuring full contact between the cleaning medium and the dirt; and utilizing the scouring, wetting, and dissolving effects of the cleaning medium to improve the dirt removal effect.

[0060] In this invention, the suspension point refers to the cleaning point where the nozzle is fixed inside the chemical container by means of a nozzle adjustment device.

[0061] In one embodiment, the parameters of the high-pressure water jet cleaning include: the pressure of the high-pressure water jet cleaning is 0.5 to 1.1 MPa, for example, 0.5 MPa, 0.6 MPa, 0.7 MPa, 0.8 MPa, 0.9 MPa, 1 MPa, or 1.1 MPa; the flow rate of the cleaning fluid is 50 to 260 L / min, for example, 50 L / min, 80 L / min, 100 L / min, 150 L / min, 200 L / min, or 260 L / min; the cleaning time for each hanging point is 30 to 45 min, for example, 30 min, 35 min, 40 min, or 45 min; and the nozzle inner diameter of the spray head is 1.0 to 2.0 mm, for example, 1 mm, 1.2 mm, 1.5 mm, 1.8 mm, or 2 mm.

[0062] In one embodiment, when the dirt is rust or grease, high-pressure water jet cleaning or spray-circulating chemical cleaning is used. When the dirt is polymer scale or carbon deposits, high-pressure water jet cleaning is used. When the dirt is solder plaque oxides, spray-circulating chemical cleaning is used.

[0063] In one embodiment, suspension points are set according to the effective cleaning range of the high-pressure water jet generated by the nozzle used for high-pressure water jet cleaning, the distance and angle that the nozzle adjustment device can extend, the size of the chemical container and the size of its internal insert structure; if the cleaning effect is not good, the cleaning effect can be improved by increasing the number of suspension points and shortening the cleaning range.

[0064] In one embodiment, suspension points are set according to the effective cleaning radius of the chemical jet generated by the nozzles used in the spray-circulating chemical cleaning, and based on the dimensions of the chemical container and its internal component structures. For cases where cleaning is achieved simply by immersing the container in the cleaning solution, suspension points can be installed at the top of the chemical container, allowing the vertical wall surface to be immersed and reacted by the cleaning solution flowing down from above.

[0065] In one embodiment, when the dirt is rust or grease, the pressure of the high-pressure water jet cleaning is 0.5 to 0.6 MPa, including but not limited to 0.5 MPa, 0.52 MPa, 0.55 MPa, 0.58 MPa, 0.6 MPa, etc.; the flow rate of the cleaning fluid is 50 to 200 L / min, for example 50 L / min, 100 L / min, 150 L / min, 180 L / min, 200 L / min, etc.

[0066] In one embodiment, the polymer scale includes at least one of hard resin, tough and viscous resin, viscous and tough polymer and latex polymer.

[0067] In one embodiment, when the polymer scale is a hard resin, the pressure of the high-pressure water jet cleaning is 1–1.1 MPa, and the flow rate of the cleaning fluid is 65–260 L / min. In another embodiment, when the polymer scale is a tough and viscous resin, the pressure of the high-pressure water jet cleaning is 0.8–1 MPa, and the flow rate of the cleaning fluid is 60–240 L / min. In another embodiment, when the polymer scale is a viscous and tough polymer, the pressure of the high-pressure water jet cleaning is 0.5–1 MPa, and the flow rate of the cleaning fluid is 50–200 L / min. In another embodiment, when the polymer scale is a latex polymer, the pressure of the high-pressure water jet cleaning is 0.7–8 MPa, and the flow rate of the cleaning fluid is 55–230 L / min. This invention uses different high-pressure water jet cleaning pressures and cleaning fluid flow rates for different types of polymer scale, making it more targeted and achieving better cleaning results.

[0068] In one embodiment, when the dirt is carbon deposits, the pressure of the high-pressure water jet cleaning is 0.6–1 MPa, and the flow rate of the cleaning fluid is 60–240 L / min. This invention uses a pressure of 0.6–1 MPa and a flow rate of 60–240 L / min to clean carbon deposits, resulting in better cleaning effects.

[0069] In one embodiment, the parameters for the chemical cleaning include: the effective range of the nozzle is 8.5–20 m, for example, 8.5 m, 10 m, 12 m, 15 m, 18 m, 20 m, etc.; and the flow rate of the cleaning fluid is 10.45–37.8 m³ / min. 3 / h, for example, 10.45m 3 / h, 15m 3 / h, 20m 3 / h, 25m 3 / h, 30m 3 / h, 35m 3 / h, 37.8m 3 The cleaning pressure is 0.6–0.9 MPa, for example, 0.6 MPa, 0.7 MPa, 0.8 MPa, or 0.9 MPa. The nozzle diameter of the spray head is 6.98–14.02 mm, for example, 6.98 mm, 7 mm, 8 mm, 9 mm, 10 mm, 12 mm, 13 mm, or 14 mm.

[0070] The following explanation, in conjunction with specific embodiments, further clarifies the situation.

[0071] Example 1

[0072] A cleaning system for chemical containers, such as Figure 1 As shown, it includes a nozzle 4 adjustment device and a cleaning fluid supply device.

[0073] The nozzle 4 adjustment device includes a base plate 1, a fixing frame 2, a nozzle 4, and a connecting rod 3.

[0074] The base plate 1 is provided with a central through hole 101, which includes an observation hole 1011 and a rod hole 1012. (See attached image.) Figure 2 .

[0075] The fixing frame 2 is connected to the base plate 1. The fixing frame 2 includes a base plate 201 and a support 202. The support 202 includes two opposing base plates located at both ends of the opening of the rod hole 1012. Each of the two base plates is provided with a slide hole 203. The slide hole 203 is arc-shaped. The concave part of the slide hole 203 faces the base plate 1.

[0076] The connecting rod 3 has a hollow structure. The connecting rod 3 is slidably connected to the bracket 202 through the connector 204, and the connecting rod 3 passes through the rod hole 1012.

[0077] The connecting rod 3 is provided with a fixing component 9, see [link]. Figure 3 The fixing component 9 includes a support 901 and a pin component 903. The support 901 is provided with a first opening 902, which is perpendicular to the connecting rod 3. The connecting member 204 passes through the first opening 902. The pin component 903 is provided on the top of the support 901 and is used to fix the connecting rod 3.

[0078] The nozzle 4 is connected to the connecting rod 3. The nozzle 4 is a 3D nozzle 4.

[0079] The cleaning fluid supply device includes a cleaning fluid storage tank 6, a pressure pump 7, and a pipeline 8; the cleaning fluid storage tank 6 is connected to the connecting rod 3 through the pipeline 8, and the pressure pump 7 is installed on the pipeline 8.

[0080] The base plate 1 has four side openings 102 around its perimeter, which are used to fix the base plate 1 to the observation hole 1011 of the chemical container to be cleaned.

[0081] The cleaning system for the chemical container also includes a cover plate 5, which is detachably connected to the bottom plate 1. The cover plate 5 is used to seal the observation hole 1011.

[0082] Example 2

[0083] A method for cleaning chemical containers, using the system of Example 1, includes the following steps:

[0084] The base plate 1 of the chemical container cleaning system is installed at the manhole of the chemical container to be cleaned, so that the nozzle 4 is located inside the chemical container to be cleaned. The dirt on the chemical container is rust.

[0085] By adjusting the position of the connecting rod 3, different suspension points of the 3D nozzle 4 inside the chemical container can be determined.

[0086] The chemical container is cleaned by supplying cleaning fluid through a cleaning fluid supply device and using high-pressure water jet cleaning.

[0087] The pressure of the high-pressure water jet cleaning is 0.6 MPa, the flow rate of the cleaning fluid is 65 L / min, the cleaning time for each hanging point is 35 min, the nozzle inner diameter of the nozzle 4 is 1.2 mm, and the cleaning distance is 1 m.

[0088] The descaling rate of the cleaned chemical container in the example was tested, and the result was 97%. The descaling rate refers to the percentage (%) of the mass of the cleaned scale to the mass of the original scale before cleaning; the descaling rate was determined according to the visual cleaning method in GB / T25148.

[0089] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A cleaning system for chemical containers, characterized in that, Includes a nozzle adjustment device and a cleaning fluid supply device; The nozzle adjustment device includes a base plate, a fixing frame, a nozzle, and a connecting rod; The base plate is provided with a central through hole, which includes an observation hole and a rod hole; The fixing frame is connected to the base plate. The fixing frame includes a chassis and a support. The support includes two opposing base plates. The two base plates are located at both ends of the opening of the rod hole. Each of the two base plates is provided with a slide hole. The connecting rod has a hollow structure, and the connecting rod is slidably connected to the bracket through a connector, and the connecting rod passes through the rod hole; The nozzle is connected to the connecting rod; the nozzle and the connecting rod are in communication. The cleaning fluid supply device is connected to the nozzle; The slide hole is arc-shaped; the concave part of the slide hole faces the bottom plate; The connecting rod is provided with a fixing component; the fixing component includes a support and a pin component, the support is provided with a first opening, the first opening being perpendicular to the connecting rod; the connecting member passes through the first opening; the pin component is provided at the top of the support, and the pin component is used to fix the connecting rod; The connector passes through the slide hole and can move within the slide hole, thereby adjusting the position of the connecting rod to control the suspension point and angle of the nozzle; the suspension point refers to the cleaning point where the nozzle is fixed inside the chemical container by means of the nozzle adjustment device; The base plate has multiple side openings around its perimeter, which are used to fix the base plate to the manhole of the chemical container to be cleaned. The cleaning system for the chemical container also includes a cover plate, which is detachably connected to the bottom plate, and the cover plate is used to seal the observation hole; The nozzle is a 3D nozzle; The cleaning fluid supply device includes a cleaning fluid storage tank, a pressurizing pump, and pipelines; the cleaning fluid storage tank is connected to the nozzle through the pressurizing pump and pipelines, and the connecting rod is sleeved on the outside of a portion of the pipelines.

2. A method for cleaning chemical containers using the cleaning system for chemical containers as described in claim 1, characterized in that, Includes the following steps: Install the base plate of the chemical container cleaning system onto the manhole of the chemical container to be cleaned, so that the nozzle is located inside the chemical container to be cleaned. Based on the specifications and characteristics of the dirt in the chemical container to be cleaned, the position of the connecting rod is adjusted to determine the different suspension points of the nozzle inside the chemical container. Cleaning fluid is supplied through a cleaning fluid supply device, and the chemical container is cleaned by chemical cleaning and / or high-pressure water jet cleaning. High-pressure water jet cleaning refers to the process of pressurizing water to a certain pressure using a pressure pump, and then converting it into a high-speed water jet through a spray device with a small aperture. This high-speed water jet is used to complete the cleaning work.

3. The cleaning method for chemical containers according to claim 2, characterized in that, The fouling inside the chemical container includes at least one of rust, polymer scale, carbon deposits, oil, and weld oxides.

4. The cleaning method for chemical containers according to claim 3, characterized in that, When the dirt is rust or grease, high-pressure water jet cleaning or spray circulation chemical cleaning is used. When the dirt is polymer scale or carbon deposit, high-pressure water jet cleaning is used; When the contaminant is weld spot oxide, a spray-circulating chemical cleaning method is used.

5. The cleaning method for chemical containers according to claim 3 or 4, characterized in that, It includes at least one of the following features (1) to (2): (1) The parameters of the high-pressure water jet cleaning include: the pressure of the high-pressure water jet cleaning is 0.5~1.1MPa; the flow rate of the cleaning fluid is 50~260L / min; the cleaning time for each hanging point is 30~45min; and the inner diameter of the nozzle of the spray head is 1.0~2.0mm. (2) The parameters for the chemical cleaning include: the effective range of the nozzle is 8.5~20m, and the flow rate of the cleaning fluid is 10.45~37.8m. 3 The cleaning pressure is 0.6~0.9MPa per hour, and the nozzle diameter of the spray head is 6.98~14.02mm.

6. The cleaning method for chemical containers according to claim 5, characterized in that, It includes any one of the following features (1) to (2): (1) When the dirt is rust or oil, the pressure of the high-pressure water jet cleaning is 0.5~0.6MPa, and the flow rate of the cleaning fluid is 50~200L / min; (2) When the dirt is carbon deposits, the pressure of the high-pressure water jet cleaning is 0.6~1MPa, and the flow rate of the cleaning fluid is 60~240L / min.

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