Glass panels, displays and electronic devices

Abstract

The present application provides a glass panel, a display screen and an electronic device. The glass panel includes a glass substrate and a multilayer film layer stacked on one side of the glass substrate, the multilayer film layer includes an anti-scratch layer and a buffer layer, the buffer layer is located between the anti-scratch layer and the glass substrate, wherein, the anti-scratch layer is a compressive stress layer, and the buffer layer is a tensile stress layer. In the present application, the tensile stress in the buffer layer and the compressive stress in the anti-scratch layer can interact with each other, and the tensile stress in the buffer layer can absorb the deformation of the anti-scratch layer caused by the compressive stress, so as to reduce the influence of the residual compressive stress of the anti-scratch layer on the glass substrate, thereby reducing the deformation of the glass substrate.

Description

Technical Field

[0001] The present application relates to the technical field of electronic equipment, and in particular to a glass panel, a display screen and an electronic device. Background Art

[0002] When users use electronic devices, scratches are likely to appear on the glass cover of the electronic device display, which not only affects the appearance of the electronic device, but also destroys the stress balance of the glass cover, resulting in a decrease in the impact resistance of the glass cover.

[0003] In some ways, to avoid scratches on the display screen, users can put a protective film on the display screen, but this will increase the user's operation and affect the touch experience of the display screen. In other ways, an anti-scratch layer can be plated on the surface of the display screen glass cover to enhance the scratch resistance of the display screen. However, there is usually a large difference in the stress state between the anti-scratch layer and the glass cover. When the electronic device is used for a period of time, the display screen is prone to deformation. Summary of the invention

[0004] The present application provides a glass panel, a display screen and an electronic device. The present application is introduced from multiple aspects below. The implementation methods and beneficial effects of the following multiple aspects can be referenced to each other.

[0005] In a first aspect, the present application provides a glass panel, comprising a glass substrate and a multilayer film layer stacked on one side of the glass substrate, the multilayer film layer comprising an anti-scratch layer and a buffer layer, the buffer layer being located between the anti-scratch layer and the glass substrate, wherein the anti-scratch layer is a compressive stress layer, and the buffer layer is a tensile stress layer.

[0006] According to the embodiment of the present application, the tensile stress in the buffer layer and the compressive stress in the anti-scratch layer can interact with each other to reduce the influence of the residual compressive stress of the anti-scratch layer on the glass substrate, thereby reducing the deformation of the glass substrate.

[0007] In some embodiments, the anti-scratch layer and the buffer layer are in contact with each other. This arrangement is conducive to the interaction between the tensile stress in the buffer layer and the compressive stress in the anti-scratch layer.

[0008] In some embodiments, the hardness of the buffer layer is above 4 to 6 on the Mohs hardness scale.

[0009] In some embodiments, the multilayer film further includes an anti-reflection layer.

[0010] In some embodiments, the anti-reflection layer is disposed on a side of the anti-scratch layer facing away from the glass substrate.

[0011] In some embodiments, the multi-layer film layer further includes a bonding layer bonded to the glass substrate, and the bonding layer is used to improve the bonding force between other film layers in the multi-layer film layer and the glass substrate.

[0012] In some embodiments, the material of the bonding layer includes SiO2 or Al2O3.

[0013] In some embodiments, the materials of the anti-scratch layer and the buffer layer are materials suitable for physical vapor deposition.

[0014] In some embodiments, the material of the anti-scratch layer includes one of the following: SiO x N y , Nb2O5, Ta2O5, Si3N4, SiC, AlN.

[0015] In some embodiments, the material of the anti-scratch layer further includes SiO2.

[0016] In some embodiments, the material of the buffer layer includes one of the following: ZrO2, LaF3, MgF2, AlF3.

[0017] In some embodiments, the anti-scratch layer has a thickness of 500 nm to 4000 nm; and / or the buffer layer has a thickness of 20 nm to 100 nm.

[0018] In a second aspect, the present application provides a display screen, comprising a display module and a glass panel provided by any embodiment of the first aspect of the present application, wherein the glass panel covers the display module.

[0019] In a third aspect, the present application provides an electronic device, including a housing and a display screen mounted on the housing, wherein the display screen is the display screen provided in any embodiment of the second aspect of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 An exemplary structural diagram of an electronic device provided in an embodiment of the present application;

[0021] Figure 2 An exemplary structural diagram of a display screen provided in an embodiment of the present application;

[0022] Figure 3 is an exemplary structural diagram of a scratch-resistant composite film in some embodiments;

[0023] Figure 4 (a) and Figure 4 (b) is a schematic diagram of deformation modes of a glass panel in some embodiments;

[0024] Figure 5 Schematic diagram of the scratch-resistant composite film in other embodiments;

[0025] Figure 6 This is an exemplary structural diagram of the scratch-resistant composite film in the embodiment of the present application;

[0026] Figure 7 Schematic diagram of the structure of the scratch-resistant composite film in other embodiments of the present application. DETAILED DESCRIPTION

[0027] The specific implementation of the present application will be described in detail below with reference to the accompanying drawings.

[0028] The present application is used to provide a glass panel, comprising an anti-scratch layer and a buffer layer arranged on a glass substrate, wherein the anti-scratch layer is a compressive stress layer, and the buffer layer is a tensile stress layer, and the tensile stress in the buffer layer and the compressive stress in the anti-scratch layer can interact with each other to reduce the influence of the residual compressive stress of the anti-scratch layer on the glass substrate, thereby reducing the deformation of the glass substrate.

[0029] Figure 1 An exemplary application scenario of the embodiment of the present application is shown. Figure 1 The electronic device 00 includes a housing 01 and a display screen 02 mounted on the housing 01. The electronic device 00 can output content to a user through the display screen 02, or can receive user input (eg, a user's touch input) through the display screen 02.

[0030] In the present application, the electronic device 00 can be various devices with display functions, such as mobile phones, tablet computers, e-book readers, laptop computers, personal digital assistants (PDA), personal computers, notebooks, vehicle-mounted devices, wearable devices (such as watches), boxes, etc.

[0031] In the figures herein, the x-axis direction is the length direction of the electronic device 00 and its components (eg, the glass panel of the display screen 02 ), the y-axis direction is the width direction of the electronic device 00 and its components, and the z-axis direction is the thickness direction of the electronic device 00 and its components.

[0032] Figure 2 FIG. 2 shows an exemplary structure of the display screen 02. Figure 2 The display screen 02 may include a display module 021 and a glass panel 100 covering the display module 021. The display module 021 is used to realize the display function of the display screen 02. For example, the display module 021 includes an array substrate for emitting light and a filter substrate for filtering light. The glass panel 100 is covered on the display module 021 to provide protection for the display module 021, for example, dustproof, moisture-proof and mechanical protection.

[0033] Figure 3 FIG. 1 shows a schematic diagram of the structure of a glass panel 100 ′ in some embodiments. Figure 3, the glass panel 100' includes a glass substrate 10 and an anti-scratch composite film 20' arranged on the surface of the glass substrate 10. The anti-scratch composite film 20' includes a lower optical layer 24', an anti-scratch layer 21' and an upper optical layer 25' which are arranged in sequence. Among them, the material of the anti-scratch layer 21' is a high-refractive index material with high hardness to improve the scratch resistance of the glass panel 100'. The upper optical layer 24' and the lower optical layer 25' are respectively low-refractive index materials. In this way, the anti-scratch composite film 20' as a whole is composed of high-refractive index materials and low-refractive index materials alternately stacked, so that the reflectivity of the glass panel 100' to light can be reduced to improve the user's visual experience.

[0034] exist Figure 3 In the example shown, by providing the anti-scratch composite film 20', the hardness of the glass panel 100' can be increased to Mohs hardness level 6 to 7; by providing the upper optical layer 24' and the lower optical layer 25', the transmittance of the glass panel 100' can be increased to about 94.5% (the transmittance of the glass substrate 10' is usually about 92%). In addition, since each film layer does not absorb visible light, the anti-scratch composite film 20' can have a relatively large total thickness (for example, more than 800nm) so that the glass panel 100' has sufficient scratch resistance.

[0035] However, in Figure 3 In the example shown, the anti-scratch layer 21' has a large difference in stress state, elastic modulus and other physical properties with the glass substrate 10, which can easily cause deformation of the glass substrate 10. For example, the anti-scratch layer 21' has residual compressive stress, and during the release of the residual compressive stress, the glass substrate 10 can easily be concavely deformed. After the anti-scratch composite film 20' is plated on the glass substrate 10, the yield of the display screen decreases. For example, when the anti-scratch composite film 20' is not plated, the yield of the display screen is about 95%, and after the anti-scratch composite film 20' is plated, the yield of the display screen is reduced to about 60%.

[0036] Figure 4 The deformation state of the glass panel 100' is shown. Figure 4 (a) is the shape of the front glass substrate glass panel 100' coated with a film ("coating" in this article refers to "coating with a scratch-resistant composite film"), Figure 4 (b) shows the shape of the coated rear glass panel 100'. Figure 4 (a), before coating, the depression depth of the first area 100a of the glass panel 100' is 0-0.047mm, and the depression depth of the second area 100b is 0.047mm-0.057mm. That is, before coating, the maximum depression depth of the glass panel 100' is 0.057mm. Figure 4(b) After coating, the first area 100a of the glass panel 100' has a concave depth of 0 to 0.047mm, the second area 100b has a concave depth of 0.047mm to 0.094mm, the third area 100c has a concave depth of 0.094mm to 0.147mm, and the fourth area 100d has a concave depth of 0.147mm to 0.193mm. That is, after coating, the maximum concave depth of the glass panel 100' is 0.193mm. Figure 4 It can be seen that according to Figure 3 After coating the glass substrate 10 in the manner shown, the concave deformation of the glass panel 100 ′ will be significantly increased.

[0037] Figure 5 FIG. 1 shows a schematic diagram of the structure of a glass panel 100 in some other embodiments. Figure 5 The glass panel 100" includes a glass substrate 10 and an anti-scratch composite film 20" disposed on the surface of the glass substrate 10. The anti-scratch composite film 20" includes alternatingly stacked soft layers 26" and hard layers 21". Among them, the soft layer 26" is a material that is more easily deformed (i.e., a material with lower hardness), for example, CrN, TiN, WC, ZrN, Cr, Ti, W, Zr, etc. The hard layer 21" is a material with higher hardness, for example, a diamond-like carbon film (also known as a "DLC" film). By alternately arranging the hard layer 21" and the soft layer 26", the interlayer interface structure between the hard layer 21" and the soft layer 26" can be used to inhibit the growth of grains and reduce the residual stress of the film layer, thereby preventing the hard layer 21" from cracking and deforming.

[0038] The soft layer 26" and the hard layer 21" can be grown alternately and repeatedly on the glass substrate 10 by magnetron sputtering or ion beam deposition. Each soft layer 26" and the adjacent hard layer 21" form a period. A thicker scratch-resistant composite film 20" can be obtained by modulating the number of periods and the thickness of the period of the hard layer 21"-soft layer 26". In some embodiments, the thickness of the scratch-resistant composite film 20" can reach 100 μm without cracking.

[0039] However, in Figure 5 In the example shown, the DLC film has a strong absorption capacity for visible light, which will significantly reduce the transmittance of the glass panel 100". For example, in some examples, the transmittance of the glass panel 100" is reduced to 60%. In addition, the existence of the interface between the soft layer 26" and the multi-layer film will greatly deteriorate the density of the film layer, thereby reducing the hardness of the film layer. When the soft layer 26" and the hard layer 21" are alternately plated on the 3D glass substrate 10 (each film layer can be formed by magnetron sputtering or electron gun evaporation), there will be a problem of uneven coating, which will reduce the brightness of the product.

[0040] in addition, Figure 5 In the example shown, the DLC film layer cannot achieve a higher thickness due to its brittleness (for example, the thickness of each hard layer 21" may be only about 100nm). In order to obtain a thicker scratch-resistant composite film 20", it is necessary to repeat the "hard layer-soft layer" structure for multiple cycles (for example, dozens or hundreds of cycles), which makes the forming process of the scratch-resistant composite film 20" complicated, the coating equipment needs to be redesigned, the production cycle of the glass panel 100" is long, and the production cost is high.

[0041] To this end, the embodiment of the present application provides a glass panel 100, including an anti-scratch layer and a buffer layer, wherein the anti-scratch layer is a compressive stress layer, and the buffer layer is a tensile stress layer, and the residual tensile stress in the buffer layer and the residual compressive stress in the anti-scratch layer can interact with each other, and the tensile stress in the buffer layer can absorb the deformation of the anti-scratch layer caused by the compressive stress, so as to reduce the influence of the residual compressive stress of the anti-scratch layer on the glass substrate, thereby reducing the deformation of the glass substrate. A detailed introduction is given below.

[0042] Figure 6 FIG. 1 shows an exemplary structural diagram of a glass panel 100 provided in some embodiments of the present application. Figure 6 , the glass panel 100 includes a glass substrate 10 and an anti-scratch composite film 20 laminated on one side of the glass substrate 10. The glass substrate 10 may be a flat substrate or a curved substrate. The anti-scratch composite film 20 includes a multilayer film layer. In the present embodiment, the anti-scratch composite film 20 includes a buffer layer 22 and an anti-scratch layer 21, and the buffer layer 22 is located between the glass substrate 10 and the anti-scratch layer 21. It can be understood that the anti-scratch layer 21 has a higher hardness to provide anti-scratch performance. Exemplarily, the hardness of the anti-scratch layer 21 can be above Mohs hardness level 6, for example, level 6, level 7, level 8, etc.

[0043] In order to obtain a higher hardness, residual compressive stress usually exists in the anti-scratch layer 21. That is to say, the anti-scratch layer 21 is a compressive stress layer (a film layer with residual compressive stress). After the glass panel 100 is formed, the residual compressive stress in the anti-scratch layer 21 will be gradually released. During the release of the residual compressive stress, the anti-scratch layer 21 will exert pressure on the glass substrate 10, causing the glass substrate 10 to deform (for example, concave deformation). In order to avoid the anti-scratch layer 21 from having such an adverse effect on the glass substrate 10, the anti-scratch composite film 20 of the embodiment of the present application also includes a buffer layer 22, and the buffer layer 22 is a tensile stress layer, that is, there is residual tensile stress in the buffer layer 22. In this way, the residual tensile stress in the buffer layer 22 can absorb the residual compressive stress of the anti-scratch layer 21. Through the interaction between the tensile stress and the compressive stress, the tensile stress in the buffer layer can absorb the deformation of the anti-scratch layer due to the compressive stress, and can reduce the force of the anti-scratch layer 21 on the glass substrate 10, thereby reducing the deformation of the glass substrate 10.

[0044] In this embodiment, the hardness of the buffer layer 22 can be above Mohs hardness level 4 to level 6. In this way, the buffer layer 22 has a higher hardness than Figure 5 The solution of buffering the residual compressive stress of the hard layer by the soft layer is beneficial to improving the overall scratch resistance of the scratch-resistant composite film 20.

[0045] Exemplarily, the anti-scratch layer 21 and the buffer layer 22 are bonded to each other to facilitate the interaction between the residual tensile stress of the buffer layer 22 and the residual compressive stress in the anti-scratch layer 21. In addition, the materials of the anti-scratch layer 21 and the buffer layer 22 can be materials suitable for physical vapor deposition (PVD), so that the anti-scratch layer 21 and the buffer layer 22 can be formed on the glass substrate 10 by the same PVD equipment, so as to simplify the production process of the glass panel 100 and reduce the production cost of the glass panel 100.

[0046] For example, the material of the anti-scratch layer 21 may include one or more of the following: SiO x N y , Nb2O5, Ta2O5, Si3N4, SiC, AlN. Further, since the above materials have a relatively high refractive index (for example, a refractive index of 1.6 or more), in order to lower the refractive index of the anti-scratch layer 21 to improve the overall transmittance of the glass panel 100, in some embodiments, the anti-scratch layer 21 may also include a material with a low refractive index (for example, a refractive index of 1.52 or less), such as SiO2. The anti-scratch layer 21 may be formed by atomic-level mixing of a high refractive index material and a low refractive index material. In this embodiment, the refractive index of the anti-scratch layer 21 may be close to the refractive index of the glass (for example, 1.52±0.08).

[0047] Exemplarily, the thickness of the anti-scratch layer 21 may be 500 nm to 4000 nm, for example, 500 nm, 1500 nm, 2000 nm, etc., to ensure the anti-scratch performance of the glass panel 100 .

[0048] Exemplarily, the material of the buffer layer 22 may include one or more of the following: ZrO2, LaF3, MgF2, AlF3. The buffer layer 22 formed by the above materials, after the film layer is formed, the material crystal parameters (for example, unit cell length, bond angle, etc.) change within the range of 0 to 30%, the amount of change is small, and the performance requirements are met. In addition, the thickness of the buffer layer 22 may be less than the thickness of the anti-scratch layer 21, for example, the thickness of the buffer layer 22 is 0.02 to 0.2 times the thickness of the anti-scratch layer 21. In some embodiments, the thickness of the buffer layer 22 may be 20nm to 100nm, for example, 20nm, 50nm, 80nm, etc.

[0049] Figure 7FIG. 1 shows an exemplary structural diagram of a glass panel 100 provided in another embodiment of the present application. Figure 7 The glass panel 100 includes a glass substrate 10 and an anti-scratch composite film 20. The anti-scratch composite film 20 includes not only an anti-scratch layer 21 and a buffer layer 22, but also a bonding layer 23 (or "bottom layer") and an anti-reflection layer 24 (or "transmittance-enhancing layer"). Figure 6 The methods shown are substantially the same, so the above description may be referred to and will not be described in detail. The following describes the arrangement of the bonding layer 23 and the anti-reflection layer 24.

[0050] The bonding layer 23 is a film layer that is attached to the glass substrate 10. The bonding layer 23 is used to improve the bonding force between the glass substrate 10 and other film layers of the anti-reflection film to avoid the phenomenon of film layer shedding. In some embodiments, the bonding layer 23 is a thin layer of SiO2. In this embodiment, the material of the bonding layer 23 is substantially the same as that of the glass substrate 10, which is conducive to the good bonding of the glass substrate 10 and other film layers of the anti-reflection film. In other embodiments, the bonding layer 23 may also include Al2O3.

[0051] The bonding layer 23 may have a relatively thin thickness compared to the anti-scratch layer 21. For example, the bonding layer 23 has a thickness of 10 nm to 50 nm, for example, 15 nm, 30 nm, etc.

[0052] The anti-reflection layer 24 is used to improve the transmittance of the anti-scratch composite film 20. In this embodiment, considering that the anti-scratch layer 21 usually has a relatively high refractive index, the anti-reflection layer 24 is set to a relatively low refractive index to improve the overall transmittance of the glass panel 100. Exemplarily, the material of the anti-reflection layer 24 is a material with a refractive index lower than 1.52, such as SiO2. In addition, the thickness of the anti-reflection layer 24 can be 20nm to 100nm, or 30nm to 100nm.

[0053] In this embodiment, the anti-reflection layer 24 is disposed above the anti-scratch layer 21. In this way, other film layers (e.g., protective layer) above the anti-scratch composite film 20 can be combined with the anti-scratch composite film 20 through the anti-reflection layer 24 to have a good combination effect. However, the present application is not limited thereto. In other embodiments, the anti-reflection layer 24 can also be disposed at other positions, for example, between the buffer layer 22 and the bonding layer 23.

[0054] In summary, by adding a buffer layer 22 to the anti-scratch composite film 20, the embodiment of the present application can balance the compressive stress in the anti-scratch layer 21 through the tensile stress in the buffer layer 22, so as to reduce the deformation of the glass panel 100. For example, in a test of a sample A of a glass panel 100, when other conditions are the same, when no buffer layer 22 is provided on the sample A, after CAV scanning, the average deformation of the sample A in the thickness direction is 0.427 mm; when the buffer layer 22 is added to the sample A, the average deformation of the sample A in the thickness direction is less than 0.15 mm, and the impact on the overall design of the glass panel 100 and the back-end process can be ignored.

[0055] In addition, the glass panel 100 (eg Figure 6 and Figure 7 The glass panel 100 shown in the figure has an overall hardness greater than 1400 HV in the Vickers hardness test; in the Mohs hardness test, under a force of 500g, the overall hardness is above level 7, and the glass panel 100 has strong scratch resistance and puncture resistance. In addition, for light within the wavelength range of 380nm to 780nm, the reflectivity of the glass panel 100 provided in the embodiment of the present application is less than 8%, and the transmittance is greater than 90%. In addition, the hundred-grid test result of the glass panel 100 provided in the embodiment of the present application is above level 4B, and there is no film shedding phenomenon on the glass panel 100.

[0056] In the embodiment of the present application, the materials of each film layer of the scratch-resistant composite film 20 can be a material suitable for physical vapor deposition (PVD). In this way, different film layers of the scratch-resistant composite film 20 can be formed on the glass substrate 10 by the same PVD equipment, so as to simplify the production process of the glass panel 100 and reduce the production cost of the glass panel 100.

[0057] The following is an exemplary introduction to the manufacturing process of the scratch-resistant composite film 20. The scratch-resistant composite film 20 can be formed by a magnetron sputtering process (a type of PVD process). For example, the magnetron furnace can use a single magnetron furnace; the bonding layer 23 can use a pure silicon target material, the buffer layer 22 can use a metal zirconium (Ar) target, or a LaF3 target material; the scratch-resistant layer 21 can use a silicon target, an aluminum target, etc.

[0058] Before coating, the glass substrate 10 can be washed with deionized water, and then the glass substrate 10 is fixed on the umbrella stand of the coating machine and vacuumed to 3.6×10 -3Pa. The glass substrate 10 is plasma cleaned using pure Ar with a power of 1kW to 3kW. Then different film materials are sputtered in sequence, and the sputtering process parameters can be as follows: target sputtering power is 6000W to 8000W; Ar flow rate is 50sccm to 500sccm; RF source power is 1000W to 2500W; Ar flow rate is 150sccm to 250sccm; O2 flow rate is 0 to 120sccm; N2 flow rate is 0 to 120sccm.

[0059] Several specific embodiments of the glass panel arrangement provided by the present application and comparative examples of the present application are given below. In the following embodiments 1 to 5, the material M of the anti-scratch layer is composed of SiO2 and one or more of the following materials: SiO x N y , Nb2O5, Ta2O5, Si3N4, SiC, AlN.

[0060] Embodiment 1

[0061] Table 1 Glass panel structure of Example 1

[0062] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer M 1.55～1.85 2000 Buffer layer ZrO2 1.9762 35 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0063] Embodiment 2

[0064] Table 2 Glass panel structure of Example 2

[0065] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer M 1.55～1.85 2000 Buffer layer ZrO2 1.9762 70 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0066] Embodiment 3

[0067] Table 3 Glass panel structure of Example 3

[0068] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer M 1.55～1.85 2000 Buffer layer ZrO2 1.9762 100 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0069] Embodiment 4

[0070] Table 4 Glass panel structure of Example 4

[0071] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer M 1.55～1.85 2000 Buffer layer LaF3 1.9762 70 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0072] Embodiment 5

[0073] Table 5 Glass panel structure of Example 5

[0074] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer M 1.55～1.85 2000 Buffer layer AlF3 1.3867 70 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0075] Comparative Example (Compared with Example 1, the buffer layer is omitted)

[0076] Table 6 Glass panel structure of comparative example

[0077] Film Material Refractive index of 550nm wavelength light Physical thickness (nm) environment Air 1.0003 / Anti-reflection layer <![CDATA[SiO2]]> 1.4541 60 Anti-scratch layer <![CDATA[SiO x N y ]]> 1.55～1.85 2000 Bonding layer <![CDATA[SiO2]]> 1.4541 20 Glass substrate Glass 1.5163 /

[0078] Table 7 gives a performance comparison of the glass panel provided in the embodiment of the present application and the glass panel provided in the comparative example. In Table 7, the deformation is the maximum deformation of the glass panel in the thickness direction after coating on the glass substrate and scanning by CAV. The optical properties (including reflectivity and refractive index) are the optical properties measured when the test light is a light with a wavelength of 550nm. The color difference is measured by the L, A, and B values ​​of the glass panel, where the L value represents the brightness (i.e., the color depth), the A value represents reddish or greenish (positive value represents reddish, negative value represents greenish), and B represents yellowish or bluish (positive value represents yellowish, negative value represents bluish). The wear resistance of the marble surface refers to the scratches on the glass panel and the marble surface after grinding.

[0079] Table 7 Performance comparison of the glass panels of Examples 1 to 5 and the glass panels of the comparative example

[0080]

[0081] It can be seen from the above table that in each embodiment of the present application, the reflectivity of the glass panel is less than 8%, the transmittance is more than 90%, and the optical performance meets the requirements. The Vickers hardness is more than 1400HV, the Mohs hardness is more than 7, and there is no scratch after grinding with marble. The hardness and scratch resistance meet the requirements.

[0082] In addition, in each embodiment of the present application, the deformation of the glass panel after coating is less than 0.15 mm, which is significantly reduced compared with 0.427 mm in the comparative example. Therefore, the present application can effectively alleviate the deformation of the glass panel by providing a buffer layer.

[0083] In the above description of this embodiment, unless otherwise specified, " / " means or, for example, A / B can identify A or B; "and / or" in this article is only a description of the association relationship of associated objects, indicating that there can be three relationships, for example, A and / or B can indicate the existence of A alone, B alone, and A and B at the same time. In addition, in this embodiment, the value of each data range includes the end value. For example, A=10~50 means that A can be 10 or 50.

Claims

1. A glass panel, characterized in that: The invention comprises a glass substrate and a multilayer film layer stacked on one side of the glass substrate, wherein the multilayer film layer comprises an anti-scratch layer and a buffer layer, wherein the buffer layer is located between the anti-scratch layer and the glass substrate, and wherein the anti-scratch layer is a compressive stress layer and the buffer layer is a tensile stress layer; The thickness of the buffer layer is 0.02 to 0.2 times the thickness of the anti-scratch layer; The material of the anti-scratch layer includes SiO2 and one of the following: SiO x N y , Nb2O5, Ta2O5, Si3N4, SiC, AlN; The material of the buffer layer includes one of the following: ZrO2, LaF3, MgF2, AlF3.

2. The glass panel according to claim 1, characterized in that: The anti-scratch layer and the buffer layer are in contact with each other.

3. The glass panel according to claim 1 or 2, characterized in that: The hardness of the buffer layer is above Mohs hardness level 4.

4. The glass panel according to claim 2, characterized in that: The multi-layer film layer also includes an anti-reflection layer.

5. The glass panel according to claim 4, characterized in that: The anti-reflection layer is arranged on the side of the anti-scratch layer facing away from the glass substrate.

6. The glass panel according to claim 1, characterized in that: The multi-layer film layer also includes a bonding layer bonded to the glass substrate, and the bonding layer is used to improve the bonding force between other film layers in the multi-layer film layer and the glass substrate.

7. The glass panel according to claim 6, characterized in that: The material of the bonding layer includes SiO2 or Al2O3.

8. The glass panel according to claim 1, characterized in that: The materials of the anti-scratch layer and the buffer layer are materials suitable for physical vapor deposition.

9. The glass panel according to claim 1, characterized in that: The anti-scratch layer has a thickness of 500 nm to 4000 nm; and / or the buffer layer has a thickness of 20 nm to 100 nm.

10. A display screen, characterized in that: It comprises a display module and the glass panel according to any one of claims 1 to 9, wherein the glass panel covers the display module.

11. An electronic device, characterized in that: It comprises a shell and a display screen mounted on the shell, and the display screen is the display screen according to claim 10.

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