A production equipment for isostatic graphite for semiconductors

Abstract

The present invention discloses a production device for isostatic graphite for semiconductors, which relates to the technical field of isostatic graphite cutting, including a base plate for supporting isostatic graphite blocks and a cutting device for segmenting isostatic graphite blocks, wherein the cutting device is slidably mounted on the top of the base plate, and a transfer device for transferring the segmented isostatic graphite blocks is arranged on the top of the base plate, and the transfer device includes a vertical plate and a supporting plate, a support plate is fixedly mounted on the top of the base plate, a transmission slide rail is fixedly mounted on the middle part of the top end of the support plate along its longitudinal direction, and a limiting assembly for limiting isostatic graphite of different sizes is arranged on the top of the support plate, and a vertical plate is mounted on the top of the transmission slide rail through threaded transmission. Through the mutual cooperation of the above-mentioned components, it is beneficial to separate the uncut isostatic graphite from the cut isostatic graphite, and the time and effort required for transferring and cutting the isostatic graphite are reduced.

Description

Technical Field

[0001] The invention relates to the technical field of isostatic graphite cutting, in particular to production equipment for isostatic graphite for semiconductors. Background Art

[0002] Isostatic graphite is pressed from high-purity graphite. It is a new product developed internationally in the past 50 years and is closely linked to today's high technology. It not only plays a big role in civilian use, but also occupies an important position in the forefront of national defense. It is a new type of material and is eye-catching. As a major global manufacturing country and the largest producer of photovoltaic products, China has always maintained a huge demand for isostatic graphite. At present, with the rapid development of the domestic photovoltaic industry, China's demand for isostatic graphite is expanding year by year. Therefore, the demand for related equipment such as isostatic graphite cutting devices is also increasing.

[0003] When cutting the existing isostatic graphite, the isostatic graphite is placed on a cutting platform, and the cutting equipment on the top of the cutting platform is used to quickly cut the isostatic graphite into several isostatic graphite blocks. However, the cut isostatic graphite blocks are still attached to the top of the uncut isostatic graphite under the action of gravity. When the cut isostatic graphite blocks are manually transferred, the two cut isostatic graphite blocks are closely attached to each other, so they cannot be quickly separated and transferred, which increases the time and energy required for cutting and transferring the isostatic graphite. Summary of the invention

[0004] The object of the present invention is to provide a production equipment for isostatically pressed graphite for semiconductors to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solution: a production device for isostatic graphite for semiconductors, comprising a base plate for supporting isostatic graphite blocks and a cutting device for dividing the isostatic graphite blocks, the cutting device being slidably mounted on the top of the base plate, and a transfer device for transferring the divided isostatic graphite blocks being provided on the top of the base plate.

[0006] The transfer equipment includes a vertical plate and a supporting plate, a supporting plate is fixedly installed on the top of the bottom plate, a transmission slide rail is fixedly installed on the middle part of the top end of the supporting plate along its longitudinal direction, and a limiting component for limiting isostatic graphite of different sizes is arranged on the top of the supporting plate, and a vertical plate is installed on the top of the transmission slide rail through threaded transmission, sliding grooves are symmetrically opened along the vertical direction on the side of the vertical plate close to the isostatic graphite, and a U-shaped plate is arranged on the side of the vertical plate away from the isostatic graphite, one end of the U-shaped plate passes through the two sliding grooves and extends to the other side of the vertical plate, and a supporting plate for transferring the cut isostatic graphite blocks is fixedly installed on the end of the vertical plate close to the isostatic graphite.

[0007] The transfer assembly also includes a driving threaded rod, on which the driving threaded rod is installed on the side of the vertical plate away from the isostatic graphite and rotates in a direction perpendicular to the top of the support plate. A threaded hole matching the driving threaded rod is provided at the top of the end of the U-shaped plate away from the support plate, and the top of the driving threaded rod passes through the threaded hole and extends to directly below the U-shaped plate.

[0008] Preferably, a reciprocating motor is fixedly mounted on one side of the top of the vertical plate, and tensioning wheels are fixedly mounted on the power output end of the reciprocating motor and the top of the driving threaded rod, and the two tensioning wheels are rotatably connected via a tensioning belt.

[0009] Preferably, a slider connected to the bottom of the vertical plate is slidably installed in the inner cavity of the transmission slide rail, a threaded groove is opened on one side of the slider, a transmission threaded rod is installed in the inner cavity of the threaded groove through threaded cooperation, both ends of the transmission threaded rod pass through the threaded groove and are rotatably connected to the two sides of the inner cavity of the transmission slide rail, and a transmission motor for rotating the transmission threaded rod is fixedly installed on the top side of the base plate.

[0010] Preferably, the limit assembly includes a limit plate and a bidirectional threaded rod for limiting the isostatic graphite, a slide groove is opened on the top of the support plate along its own transverse direction, and sliding blocks are symmetrically installed in the inner cavity of the slide groove, and the limit plates are fixedly installed on the tops of the two sliding blocks, and the tops of the two limit plates are symmetrically provided with cutting grooves for isostatic graphite cutting, through holes are opened on adjacent sides of the two sliding blocks, and a bidirectional threaded rod is arranged between the two sliding blocks, and both ends of the bidirectional threaded rod pass through the two through holes and are rotatably connected to the inner wall of the slide groove, the inner wall of the through hole is opened with a spiral groove compatible with the bidirectional threaded rod, and a driving motor for rotating the bidirectional threaded rod is fixedly installed on the top of the base plate.

[0011] Preferably, a plurality of bearing blocks supporting the isostatic graphite bottom are fixedly mounted on adjacent sides of the two limit plates, and the top of the bearing block and the bottom of the inner cavity of the cutting groove are flush with each other.

[0012] Preferably, two guide grooves are symmetrically provided on the top of the support plate, the two guide grooves are parallel to the slide groove, and guide blocks connected to the bottoms of the two limit plates are symmetrically slidably installed in the inner cavities of the two guide grooves.

[0013] Preferably, a plurality of rows of accommodating grooves are provided on adjacent sides of the two limiting plates, and guide rollers in contact with the outer wall of the isostatic graphite are rotatably installed in the inner cavity of the accommodating grooves via a rotating shaft.

[0014] Preferably, a guide rail perpendicular to the top of the support plate is symmetrically mounted at one end of the support plate away from the reciprocating motor, a baffle is arranged between the two guide rails to prevent the isostatic graphite from moving, and both sides of the baffle extend into the inner cavity of the guide rail.

[0015] Preferably, limiting balls are elastically mounted on both sides of the baffle along the vertical direction, and the inner walls of the two guide rails are provided with a plurality of slots adapted to the limiting balls.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] The present invention describes a production device for isostatic graphite for semiconductors:

[0018] By setting up a transfer device, after the isostatic graphite is cut, the vertical plate is pushed to move it along the transmission slide rail toward the isostatic graphite until the support plate moves with the vertical plate to directly below the cut isostatic graphite. When the isostatic graphite directly above the support plate is cut, the U-shaped plate is pushed to move upward, and the upwardly moved support plate contacts the bottom of the cut isostatic graphite and pushes it upward until the cut isostatic graphite is completely removed from the limiting assembly, which is beneficial to separating the uncut isostatic graphite from the cut isostatic graphite, and reduces the time and energy required for transferring and cutting the isostatic graphite. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the main structure of the present invention;

[0020] Figure 2 It is an assembly diagram of the bottom plate and the limiting plate of the present invention;

[0021] Figure 3 It is an assembly diagram of the vertical plate and the limiting plate of the present invention;

[0022] Figure 4 It is an assembly diagram of the baffle and the limit plate of the present invention;

[0023] Figure 5 It is an assembly diagram of the vertical plate and the supporting plate of the present invention;

[0024] Figure 6 For the present invention Figure 2 A magnified view of the structure at center A;

[0025] Figure 7 For the present invention Figure 3 A magnified view of the structure at B in the middle;

[0026] Figure 8 For the present invention Figure 4 Enlarged view of the structure at C in the middle.

[0027] In the figure: 1. bottom plate; 2. limit plate; 3. cutting equipment; 4. guide block; 5. support plate; 6. vertical plate; 7. guide rail; 8. baffle; 9. sliding block; 10. guide groove; 11. transmission threaded rod; 12. transmission rail; 13. two-way threaded rod; 14. slide groove; 15. driving threaded rod; 16. support plate; 17. U-shaped plate; 18. sliding groove; 19. guide roller; 20. limit ball. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. Example

[0029] See also Figure 1-8 The present embodiment provides a production device for isostatic graphite for semiconductors, including a base plate 1 for supporting isostatic graphite blocks and a cutting device 3 for dividing the isostatic graphite blocks, wherein the cutting device 3 is slidably mounted on the top of the base plate 1, and a transfer device for transferring the divided isostatic graphite blocks is provided on the top of the base plate 1, wherein the cutting device 3 is driven by a screw rod and mounted on the top of the base plate 1, the isostatic graphite is placed on the top of the base plate 1 and fixed, and then the cutting device 3 is used to cut the isostatic graphite into blocks and the moving distance of the cutting device 3 is precisely controlled by rotating the screw rod, which is beneficial to the continuous cutting of the isostatic graphite and the control of the thickness of the cut isostatic graphite.

[0030] The transfer equipment includes a vertical plate 6 and a supporting plate 16, a support plate 5 is fixedly installed on the top of the base plate 1, a transmission slide rail 12 is fixedly installed in the middle of the top end of the support plate 5 along its longitudinal direction, and a limiting component for limiting the position of isostatic graphite of different sizes is provided on the top of the support plate 5, wherein the isostatic graphite is placed on the top of the support plate 5, and then the limiting component is used to clamp and limit the two sides of the isostatic graphite, while preventing the bottom of the isostatic graphite and the top of the support plate 5 from fitting together, and preventing the isostatic graphite from shaking or shifting during cutting.

[0031] A vertical plate 6 is installed on the top of the transmission slide rail 12 through threaded transmission. A sliding groove 18 is symmetrically provided along the vertical direction on the side of the vertical plate 6 close to the isostatic graphite, and a U-shaped plate 17 is provided on the side of the vertical plate 6 away from the isostatic graphite. One end of the U-shaped plate 17 passes through the two sliding grooves 18 and extends to the other side of the vertical plate 6. The two sliding grooves 18 can limit the sliding trajectory of the U-shaped plate 17, preventing the U-shaped plate 17 from shaking and deflecting when moving up and down, thereby improving the stability of the up and down movement of the U-shaped plate 17.

[0032] A support plate 16 for transferring the cut isostatic graphite block is fixedly installed on one end of the vertical plate 6 close to the isostatic graphite, wherein the vertical plate 6 is pushed after the isostatic graphite is cut to move along the transmission slide rail 12 toward the isostatic graphite until the support plate 16 moves with the vertical plate 6 to directly below the cut isostatic graphite, and when the isostatic graphite directly above the support plate 16 is cut, the U-shaped plate 17 is pushed to move upward, and the upwardly moved support plate 16 contacts the bottom of the cut isostatic graphite and pushes it upward until the cut isostatic graphite is completely removed from the limiting assembly, which is beneficial to separating the uncut isostatic graphite from the cut isostatic graphite, and reduces the time and energy required for transferring and cutting the isostatic graphite.

[0033] The transfer assembly also includes a driving threaded rod 15, on which the driving threaded rod 15 is rotatably installed on one side of the vertical plate 6 away from the isostatic graphite in a direction perpendicular to the top of the support plate 5, and a threaded hole compatible with the driving threaded rod 15 is opened on the top of the end of the U-shaped plate 17 away from the support plate 16, and the top of the driving threaded rod 15 passes through the threaded hole and extends to directly below the U-shaped plate 17, wherein the driving threaded rod 15 is rotated to control the up and down movement distance of the U-shaped plate 17 with the cooperation of the threaded hole, and the U-shaped plate 17 is fixed after movement, which is beneficial to improving the convenience and stability of transferring the isostatic graphite after cutting.

[0034] A reciprocating motor is fixedly installed on one side of the top of the vertical plate 6, and tensioning wheels are fixedly installed on the power output end of the reciprocating motor and the top of the driving threaded rod 15. The two tensioning wheels are rotatably connected by a tensioning belt. After the reciprocating motor is started, the tensioning wheel connected to the power output end of the reciprocating motor rotates accordingly and transmits power to the other tensioning wheel through the tensioning belt, which is beneficial to the synchronous rotation of the two tensioning wheels and the convenience of rotating the driving threaded rod 15.

[0035] A slider connected to the bottom of the vertical plate 6 is slidably installed in the inner cavity of the transmission slide rail 12, and a threaded groove is opened on one side of the slider. A transmission threaded rod 11 is installed in the inner cavity of the threaded groove through threaded cooperation. Both ends of the transmission threaded rod 11 pass through the threaded groove and are rotatably connected to the two sides of the inner cavity of the transmission slide rail 12. A transmission motor for rotating the transmission threaded rod 11 is fixedly installed on one side of the top of the bottom plate 1. When the transmission motor is started, the transmission threaded rod 11 rotates together with the power output end of the transmission motor. With the cooperation of the threaded groove, the slider moves along the transmission slide rail 12, and the slider can be positioned after moving. At the same time, the rotation direction of the power output end of the transmission motor is changed to control the direction of movement of the slider. Example

[0036] See also Figure 1-8 , further improvements made on the basis of Example 1:

[0037] The limiting assembly includes a limiting plate 2 for limiting the isostatically pressed graphite and a bidirectional threaded rod 13. A slide groove 14 is provided on the top of the support plate 5 along its own transverse direction. Sliding blocks 9 are symmetrically installed in the inner cavity of the slide groove 14. The limiting plates 2 are fixedly installed on the tops of the two sliding blocks 9. The slider can limit the sliding trajectory of the sliding blocks 9 to prevent the two limiting plates 2 from shaking and deflecting when moving back and forth, thereby improving the stability of the two limiting plates 2 moving back and forth.

[0038] The tops of the two limit plates 2 are symmetrically provided with cutting grooves for isostatic graphite cutting, and the adjacent sides of the two sliding blocks 9 are provided with through holes, and a bidirectional threaded rod 13 is arranged between the two sliding blocks 9, and the two ends of the bidirectional threaded rod 13 pass through the two through holes and are rotatably connected to the inner wall of the slide groove 14, and the inner wall of the through hole is provided with a spiral groove compatible with the bidirectional threaded rod 13, and a driving motor for rotating the bidirectional threaded rod 13 is fixedly installed on the top of the base plate 1. After the isostatic graphite is placed between the two limit plates 2, the driving motor is started to let the bidirectional threaded rod 13 rotate with the power output end of the driving motor, so that the two sliding blocks 9 are controlled to approach or move away synchronously under the cooperation of the spiral groove, and when the two limit plates 2 are close to each other, the two sides of the placed isostatic graphite can be clamped, and when the two limit plates 2 are far away from each other, it is beneficial to place the subsequent uncut isostatic graphite between the two, so as to facilitate the clamping and positioning of isostatic graphite of different sizes.

[0039] A plurality of supporting blocks 21 for supporting the bottom of the isostatic graphite are fixedly installed on adjacent sides of the two limit plates 2. The top of the supporting block 21 and the bottom of the inner cavity of the cutting groove are flush with each other. When the isostatic graphite is placed between the two limit plates 2, the bottom of the isostatic graphite and the tops of the plurality of supporting blocks 21 fit together, thereby supporting the bottom of the isostatic graphite and facilitating the movement of the support plate 16 to the bottom of the isostatic graphite and transferring the cut isostatic graphite.

[0040] Two guide grooves 10 are symmetrically provided on the top of the support plate 5, and the two guide grooves 10 are parallel to the slide groove 14, and guide blocks 4 connected to the bottom of the two limit plates 2 are symmetrically slidably installed in the inner cavities of the two guide grooves 10, wherein the guide grooves 10 can limit the sliding trajectory of the guide blocks 4, thereby preventing the two limit plates 2 from shaking and deflecting when moving, thereby improving the stability of the movement of the two limit plates 2.

[0041] Multiple rows of accommodating grooves are provided on the adjacent sides of the two limit plates 2, and a guide roller 19 that fits the outer wall of the isostatic graphite is installed in the inner cavity of the accommodating groove through a rotating shaft. When the two limit plates 2 clamp the two sides of the isostatic graphite, the outer wall of the guide roller 19 fits tightly against the outer wall of the isostatic graphite, which not only achieves the clamping and positioning of the isostatic graphite, but also helps to reduce the resistance on both sides of the cut isostatic graphite when it is separated from the two limit plates 2, thereby improving the smoothness of the cut isostatic graphite when it is moved out from the inside of the limit plate 2.

[0042] A guide rail 7 perpendicular to the top of the support plate 5 is symmetrically installed at one end away from the reciprocating motor, and a baffle 8 is arranged between the two guide rails 7 to prevent the isostatic graphite from moving. Both sides of the baffle 8 extend into the inner cavity of the guide rail 7. When the isostatic graphite is clamped by the two limit plates 2, the baffle 8 is placed between the two guide rails 7 and is positioned under the action of the two guide rails 7.

[0043] Furthermore, when the isostatic graphite is cut, the cutting device 3 generates a continuous thrust on the isostatic graphite toward the baffle 8, so that one end of the isostatic graphite fits against the side wall of the baffle 8, preventing the uncut isostatic graphite from escaping from between the two limit plates 2.

[0044] Limiting balls 20 are elastically installed on both sides of the baffle 8 along the vertical direction, and the inner walls of the two guide rails 7 are provided with multiple slots that are compatible with the limiting balls 20. When the bottom of the baffle 8 and the top of the support plate 5 are in contact, multiple limiting balls 20 are simultaneously engaged with multiple slots, thereby improving the installation stability of the baffle 8.

[0045] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A production equipment for isostatic graphite for semiconductors, characterized in that: It comprises a base plate (1) for supporting an isostatic graphite block and a cutting device (3) for dividing the isostatic graphite block, wherein the cutting device (3) is slidably mounted on the top of the base plate (1), and a transfer device for transferring the divided isostatic graphite block is provided on the top of the base plate (1); The transfer device comprises a vertical plate (6) and a supporting plate (16), a supporting plate (5) being fixedly mounted on the top of the bottom plate (1), a transmission slide rail (12) being fixedly mounted on the middle portion of the top end of the support plate (5) along its longitudinal direction, and a limiting assembly for limiting the position of isostatic graphite of different sizes being arranged on the top of the support plate (5), the vertical plate (6) being mounted on the top of the transmission slide rail (12) through threaded transmission, a side of the vertical plate (6) close to the isostatic graphite being symmetrically provided with sliding grooves (18) along the vertical direction, and a U-shaped plate (17) being arranged on a side of the vertical plate (6) away from the isostatic graphite, one end of the U-shaped plate (17) passing through two sliding grooves (18) and extending to the other side of the vertical plate (6), and a supporting plate (16) for transferring the cut isostatic graphite blocks being fixedly mounted on the end of the vertical plate (6) close to the isostatic graphite; The transfer device further comprises a driving threaded rod (15), the driving threaded rod (15) being rotatably mounted on a side of the vertical plate (6) away from the isostatic graphite in a direction perpendicular to the top of the support plate (5), a threaded hole matching the driving threaded rod (15) being formed on the top of one end of the U-shaped plate (17) away from the support plate (16), and the top of the driving threaded rod (15) passing through the threaded hole and extending to directly below the U-shaped plate (17); A reciprocating motor is fixedly mounted on one side of the top of the vertical plate (6), and a tensioning wheel is fixedly mounted on the power output end of the reciprocating motor and the top of the driving threaded rod (15), and the two tensioning wheels are rotatably connected via a tensioning belt; A slider connected to the bottom of the vertical plate (6) is slidably mounted in the inner cavity of the transmission slide rail (12); a threaded groove is provided on one side of the slider; a transmission threaded rod (11) is mounted in the inner cavity of the threaded groove by threaded engagement; both ends of the transmission threaded rod (11) pass through the threaded groove and are rotatably connected to both sides of the inner cavity of the transmission slide rail (12); a transmission motor for rotating the transmission threaded rod (11) is fixedly mounted on one side of the top of the bottom plate (1).

2. The production equipment of isostatic graphite for semiconductor according to claim 1, characterized in that: The limiting assembly comprises a limiting plate (2) for limiting the isostatic graphite and a bidirectional threaded rod (13); a slide groove (14) is provided on the top of the support plate (5) along its transverse direction; sliding blocks (9) are symmetrically installed in the inner cavity of the slide groove (14); the limiting plates (2) are fixedly installed on the tops of the two sliding blocks (9); the tops of the two limiting plates (2) are symmetrically provided with cutting grooves for isostatic graphite cutting; through holes are provided on adjacent sides of the two sliding blocks (9); a bidirectional threaded rod (13) is provided between the two sliding blocks (9); two ends of the bidirectional threaded rod (13) pass through the two through holes and are rotatably connected to the inner wall of the slide groove (14); the inner wall of the through hole is provided with a spiral groove matched with the bidirectional threaded rod (13); and a driving motor for rotating the bidirectional threaded rod (13) is fixedly installed on the top of the bottom plate (1).

3. The production equipment of isostatic graphite for semiconductor according to claim 2, characterized in that: A plurality of bearing blocks (21) supporting the isostatic graphite bottom are fixedly mounted on adjacent sides of the two limit plates (2), and the tops of the bearing blocks (21) and the bottom of the inner cavity of the cutting groove are flush with each other.

4. The production equipment of isostatic graphite for semiconductor according to claim 2, characterized in that: Two guide grooves (10) are symmetrically formed on the top of the support plate (5), the two guide grooves (10) are parallel to the slide groove (14), and guide blocks (4) connected to the bottoms of the two limit plates (2) are symmetrically slidably installed in the inner cavities of the two guide grooves (10).

5. The production equipment of isostatic graphite for semiconductor according to claim 3, characterized in that: A plurality of rows of accommodating grooves are provided on adjacent sides of the two limiting plates (2), and guide rollers (19) that are in contact with the outer wall of the isostatic graphite are rotatably installed in the inner cavity of the accommodating grooves via a rotating shaft.

6. The production equipment of isostatic graphite for semiconductor according to claim 1, characterized in that: A guide rail (7) perpendicular to the top of the support plate (5) is symmetrically mounted at one end of the support plate (5) away from the reciprocating motor, and a baffle (8) is arranged between the two guide rails (7) to prevent the isostatic graphite from moving, with both sides of the baffle (8) extending into the inner cavity of the guide rail (7).

7. The production equipment of isostatic graphite for semiconductor according to claim 6, characterized in that: Limiting balls (20) are elastically mounted on both sides of the baffle plate (8) along the vertical direction, and the inner walls of the two guide rails (7) are provided with a plurality of slots adapted to the limiting balls (20).

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