A method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device

Abstract

The present invention discloses a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, which relates to the technical field of grating monochromators for synchrotron radiation devices and includes the following steps: S1, designing a planar tool; S2, measuring the tool surface angle data during continuous rotation; S3, calculating the angle between the two rotating shafts based on the tool surface angle data. The present invention designs a set of planar tooling with a high-precision laser interferometer rangefinder. By measuring the change in the tool surface angle of the tooling plane during rotation around the axis, the rotation axis angle is successfully calculated, filling the gap in the inability to accurately measure the biaxial parallelism of a grating monochromator. The present invention provides theoretical support and technical guidance for the design and construction of high-performance beamlines in synchrotron radiation devices, and can also be used to guide the structural optimization design of grating monochromators. The biaxial parallelism of the monochromator is calculated by measuring the change in the surface angle of a set of planar tooling loaded on the two rotating shafts of the grating monochromator during rotation.

Description

Technical Field

[0001] The present invention relates to the technical field of grating monochromators for synchrotron radiation devices, and in particular to a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device. Background Art

[0002] Synchrotron radiation facilities are comprehensive, large-scale scientific platforms. Using high-flux X-rays generated by electron synchrotron radiation as their light source, they can conduct a wide range of material characterization techniques, such as X-ray diffraction and scattering, soft X-ray absorption spectroscopy, and soft X-ray spectroscopic microscopy. They have become one of the most dynamic basic scientific research platforms in materials science and life sciences. Compared with traditional laboratory light sources, synchrotron radiation sources offer superior properties such as high flux, high monochromaticity, and low divergence, significantly enhancing characterization capabilities. For example, synchrotron radiation sources offer higher monochromaticity and narrower energy resolution, effectively mitigating the broadening of diffraction peaks caused by energy distribution during X-ray diffraction experiments, thereby simplifying data interpretation and improving the accuracy of analytical results.

[0003] High monochromaticity at a synchrotron radiation source is achieved by placing a monochromator system in the optical path. Commonly used monochromators, depending on their energy selection principles, include grating monochromators, double-crystal monochromators, and multilayer film monochromators, each designed for different energy ranges and providing varying energy resolutions. Grating monochromators are primarily used in the low-energy range, producing highly monochromatic soft X-rays. Their core structure consists of a reflective plane mirror and a grating, driven by two rotating shafts. In actual operation, the mirror and grating rotate on their respective shafts. The mirror adjusts the angle between the incident light and the grating. The beam that meets the Bragg diffraction law (d(sinα + sinβ) = mλ, where α is the incident angle and β is the diffraction angle) is split by the grating and enters the downstream optical path. The beam that does not meet the Bragg law is filtered out.

[0004] From the monochromation principle described above, it's clear that the parallelism of the two rotational axes of a grating monochromator significantly affects the monochromation effect, the luminous flux, and the position of the emitted light. Accurate measurement of biaxial parallelism is essential for the design and construction of high-performance beamlines. Currently, common methods for testing biaxial parallelism in grating monochromators include autocollimators and theodolites with collimation.

[0005] During testing, the theodolite can present cross images of both direct-reflected light and grating-reflected light on the eyepiece. During testing, the relative positions of the grating and the reflector are adjusted in the pitch direction so that the horizontal lines of the two cross images overlap. The distance between the vertical lines of the two cross images can then be used to qualitatively describe the biaxial parallelism. This method is relatively crude and cannot give precise values. Although the autocollimator can give the difference between the grating and the plane reflector in the pitch and roll directions, it is not the exact value of the angle between the two rotating axes of the monochromator. Instead, it is an overall result that includes the grating, reflector, and its support and adjustment mechanisms. This does not provide a clear guide for subsequent structural design optimization. In addition, during the test process, it is necessary to carefully deduct the interference of direct-reflected light, and the operation is also relatively complicated.

[0006] Grating monochromators are widely used in synchrotron radiation devices. The parallelism of their rotating axes determines the degree of monochromaticity of the synchrotron radiation light, as well as the flux and position of the output light. However, there is currently no systematic method to accurately measure the parallelism of the two axes.

[0007] Therefore, we proposed a method for detecting the dual-axis parallelism of a grating monochromator used in synchrotron radiation facilities. Summary of the Invention

[0008] The object of the present invention is to provide a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, so as to solve the problems raised by the above-mentioned background technology.

[0009] To achieve the above-mentioned object, the present invention provides the following technical solution: a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, comprising the following steps:

[0010] S1. Design a planar tooling for loading onto a monochromator. The planar tooling consists of tooling F, a reflective plane mirror G loaded onto tooling F, tooling E, and a laser interferometer rangefinder loaded onto tooling E. The monochromator consists of parallelly distributed structural components of a grating monochromator carrying a reflective mirror B, a reflective plane mirror B, a grating monochromator rotation axis C, a structural component of the grating monochromator carrying a grating, a grating A, and a grating monochromator rotation axis D. The structural component of the grating monochromator carrying a reflective mirror B and the structural component of the grating monochromator carrying a grating are loaded onto the grating monochromator rotation axis C and the grating monochromator rotation axis D, respectively.

[0011] S2. Measure the angle data of the tooling surface during continuous rotation;

[0012] S3. Calculate the angle between the two rotating shafts based on the tooling surface angle data.

[0013] Preferably, a reflecting plane mirror B is further provided on the top of the structural member carrying the reflecting mirror B in the grating monochromator, a tool F is installed on the side of the top of the structural member carrying the reflecting mirror B in the grating monochromator close to the reflecting plane mirror B, and a tool E is installed on the side of the structural member carrying the grating in the grating monochromator close to the top of the grating A, the tool E and the tool F are used to measure biaxial parallelism, and the tool E is provided with a laser interferometer mounted on the tool E, and the laser interferometer mounted on the tool E includes a laser probe 1, a laser probe 2, and a laser probe 3;

[0014] A grating A is further provided at the bottom of the structural member carrying the grating in the grating monochromator, and a reflecting plane mirror G mounted on the tooling F for reflecting laser light is provided on the upper side of the tooling F.

[0015] Preferably, the structural component carrying the reflector B in the grating monochromator cooperates with the grating A of the structural component carrying the grating in the grating monochromator through the reflecting plane mirror B to monochromate the incident light, and the structural component carrying the reflector B in the grating monochromator and the structural component carrying the grating in the grating monochromator can rotate around the grating monochromator rotation axis C and the grating monochromator rotation axis D respectively.

[0016] Preferably, the plane tooling in step S2 can continuously rotate the monochromator shaft in any step length after completing the loading, and record the distance between each laser probe of the tooling E and the reflective plane mirror G loaded on the tooling F during the rotation process;

[0017] The distance measured by each laser probe can be used to calculate the corresponding tooling surface angle at each rotation angle.

[0018] Preferably, the structural component carrying the reflector B in the grating monochromator and the structural component carrying the grating in the grating monochromator in step S3 are tightly connected to the grating monochromator rotation axis C and the grating monochromator rotation axis D, respectively. The angle between the two rotation axes can be calculated by measuring the change in the angle of the tooling surface during rotation, thereby obtaining the biaxial parallelism.

[0019] Compared with existing technologies, the present invention has the following advantages: It designs a planar fixture equipped with a high-precision laser interferometer rangefinder. By measuring the change in the fixture surface angle during its rotation, it successfully calculates the rotation axis angle, thus filling the gap in the precise measurement of the biaxial parallelism of grating monochromators. This invention provides theoretical support and technical guidance for the design and construction of high-performance beamlines of synchrotron radiation facilities and can also be used to guide the structural optimization design of grating monochromators. The biaxial parallelism of the monochromator is calculated by measuring the change in the surface angle of a set of planar fixtures loaded on the two rotating shafts of the grating monochromator during rotation.

[0020] 1. The mathematical formula for the angle between the tooling surface and the rotation axis during rotation provided by the present invention is universal and can be used to calculate the biaxial parallelism of other precision instruments with biaxial rotation mechanisms.

[0021] 2. The measurement concept of converting the measurement of the shaft angle into the measurement of the angle between two planes tightly connected to the shaft used in the present invention is universal and can be used for dual-axis parallelism measurement of other precision instruments with dual-axis rotation mechanisms. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 Schematic diagram of the detection process of the present invention;

[0023] Figure 2 This is a schematic diagram of the working principle of the monochromator and the three-dimensional concept of the load tooling of the present invention;

[0024] Figure 3 Schematic diagram of the tool E and tool F of the present invention;

[0025] Figure 4 Schematic diagram of the geometric relationship between the monochromator shaft angle θ and the load tooling surface angle Φ of the present invention;

[0026] Figure 5 This is a comparison chart of the first test results of the present invention;

[0027] Figure 6 This is a comparison chart of the second test results of the present invention;

[0028] Figure 7 This is a frequency distribution diagram of the shaft angle of the first test result of the present invention;

[0029] Figure 8 This is the frequency distribution diagram of the shaft angle of the second test result of the present invention.

[0030] In the figure: 1. Structural component carrying reflector B in the grating monochromator; 2. Reflecting plane mirror B; 3. Fixture F; 4. Reflecting plane mirror G mounted on fixture F; 5. Rotating shaft C of the grating monochromator; 6. Structural component carrying the grating in the grating monochromator; 7. Grating A; 8. Fixture E; 9. Laser interferometer rangefinder mounted on fixture E; 901. Laser probe one; 902. Laser probe two; 903. Laser probe three; 10. Rotating shaft D of the grating monochromator. DETAILED DESCRIPTION

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0032] See also Figure 1-Figure 3 The present invention provides a technical solution: a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, comprising the following steps:

[0033] S1. Design a plane tooling, wherein the plane tooling is used to be loaded on a monochromator, and the plane tooling is composed of a tooling F (3), a reflecting plane mirror G4 loaded on the tooling F, a tooling E8, and a laser interferometer rangefinder 9 loaded on the tooling E. The monochromator is composed of a parallelly distributed structure 1 for carrying a reflecting mirror B in a grating monochromator, a reflecting plane mirror B2, a grating monochromator rotation shaft C5, a structure 6 for carrying a grating in the grating monochromator, a grating A7, and a grating monochromator rotation shaft D10. The structure 1 for carrying a reflecting mirror B in the grating monochromator and the structure 6 for carrying a grating in the grating monochromator are loaded on the grating monochromator rotation shaft C5 and the grating monochromator rotation shaft D10, respectively.

[0034] A reflecting plane mirror B2 is also provided on the top of the structural member 1 carrying the reflecting mirror B in the grating monochromator. A tool F3 is installed on the side of the top of the structural member 1 carrying the reflecting mirror B in the grating monochromator near the reflecting plane mirror B2. A tool E8 is installed on the side of the structural member 6 carrying the grating in the grating monochromator near the top of the grating A7. The tool E8 and the tool F3 are used to measure biaxial parallelism. A laser interferometer rangefinder 9 mounted on the tool E consisting of three laser probes is installed on the tool E8. A grating A7 is also provided on the bottom of the structural member 6 carrying the grating in the grating monochromator. A reflecting plane mirror G4 mounted on the tool F for reflecting laser light is provided on the upper side of the tool F3.

[0035] The structure 1 of the grating monochromator carrying the reflector B cooperates with the grating A7 of the structure 6 of the grating monochromator carrying the grating through the reflecting plane mirror B2 to monochromate the incident light, and the structure 1 of the grating monochromator carrying the reflector B and the structure 6 of the grating monochromator carrying the grating can rotate around the grating monochromator rotation axis C5 and the grating monochromator rotation axis D10 respectively.

[0036] S2. Measure the included angle data of the tooling surface during continuous rotation. After the planar tooling is loaded, the monochromator shaft can be continuously rotated at any step length. The distance from each laser probe of tooling E8 to the reflective plane mirror G4 mounted on tooling F of tooling F3 during rotation is recorded. Then, the included angle of the tooling surface corresponding to each rotation angle can be calculated using the distance measured by each laser probe.

[0037] See Figure 3 As can be seen, fixture E8 is tightly connected to the grating monochromator shaft D10 of structural member 6, which carries the grating in the grating monochromator. Fixture E8 is equipped with the laser interferometer rangefinder 9 mounted on fixture E. This laser interferometer rangefinder 9 is composed of laser probe 1 901, laser probe 2 902, and laser probe 3 903, arranged in an equilateral triangle for laser ranging. Fixture F3 is tightly connected to the grating monochromator shaft C5 of structural member 1, which carries reflector B in the grating monochromator. Fixture F3 is equipped with the reflective plane mirror G4 mounted on fixture F. The three laser probes on fixture E8 form a plane. The dihedral angle between this plane and the reflective plane mirror G4 mounted on fixture F of fixture F3 can be indirectly calculated using the distances measured by each of the three probes, as shown in the following formula (K1).

[0038]

[0039] Among them, laser probe 1 901, laser probe 2 902, and laser probe 3 903 are three laser probes on tooling E8, which are distributed in an equilateral triangle with a side length of L, d A d B d C is the distance reading measured by the three laser probes, and the normal vector of the plane where the three laser probes are located is n E =[0,0,1]; the normal vector of the tooling F3 plane is n F The included angle of the tooling surface is Φ, which can be calculated by the dot product of the two normal vectors. The rotation angle of the shaft during the test is φ i .

[0040] S3. Calculate the angle between the two rotating shafts based on the tooling surface angle data. Structural component 1 carrying the reflector B in the grating monochromator and structural component 6 carrying the grating in the grating monochromator are tightly connected to the grating monochromator rotating shaft C5 and the grating monochromator rotating shaft D10, respectively. By measuring the change in the tooling surface angle during rotation, the angle between the two rotating shafts can be calculated, thereby obtaining the biaxial parallelism.

[0041] When fixture E8 and fixture F3 rotate synchronously around their respective axes, the fixture surface angle and the rotation axis angle satisfy a fixed geometric relationship, as shown in the following formula (K2). iis the rotation angle of the shaft; the other parameters are the posture parameters of tooling E8 and tooling F3. i ) into the equation, the shaft angle θ can be calculated, and other tooling posture parameters can also be calculated.

[0042]

[0043] The detailed derivation process of formula (K2) is as follows:

[0044] The specific calculation method of the shaft angle is as follows:

[0045] The shaft angle can be indirectly calculated by the tooling surface angle. For ease of description, the derivation process is presented using vector geometry. The tooling surface angle Φ is derived in the form of a normal vector. The geometric relationship between the monochromator shaft angle θ and the load tooling surface angle Φ is shown in the figure below. Figure 4 As shown:

[0046] Establish a spatial rectangular coordinate system with the grating monochromator rotation axis C5 as the Z axis and the plane containing the grating monochromator rotation axis C5 and the grating monochromator rotation axis D10 as the YOZ plane. Grating monochromator rotation axis C5 = [0, 0, 1]. If the angle between the rotation axes is θ, then the grating monochromator rotation axis D10 = [0, sinθ, cosθ]. Let the angle between the normal vector En of the tooling E8 and the grating monochromator rotation axis C5 be α. E (close to 90°), if the YOZ plane is used as the reference plane, the normal vector En is expressed as follows (K3) during the rotation around the grating monochromator axis C5:

[0047]

[0048] where ω E is the initial phase angle of fixture E8 relative to the YOZ reference plane, ranging from 0 to 180°; φ i is the angle of the monochromator's two-axis rotation; rotate is the rotation transformation function, rotate(C,En,ω E ) represents the counterclockwise rotation of the normal vector En around the grating monochromator axis C5 by ω E Angle. Similarly, the expression of the normal vector Fn of the tooling F3 is shown in the following formula (K4):

[0049]

[0050] where α F is the angle between the fixture F3 and the grating monochromator axis D10, ω F is the initial phase angle of the fixture F3 relative to the YOZ reference plane, and the range is also 0 to 180°; φ iIt is also the angle of the monochromator's biaxial rotation. After the monochromator is rotated to any angle, the angle Φ between the plane fixture E8 and the fixture F3 can be calculated using the vector method, as shown in the following formula (K5):

[0051] Φ(φ i )=acos[Εn(φ i )·Fn(φ i )](K5)

[0052] Where acos is the arccosine function, and '˙' represents the dot product of the normal vectors En and Fn. Combining equations (K3), (K4), and (K5) yields an analytical expression for the tooling surface angle Φ and the axis angle θ. For ease of description, this is rewritten as an equation, as shown in equation (K6):

[0053]

[0054] There is a total of α E , α F ,θ,ω E 、ω F Five unknowns, among which θ is the angle between the rotating axes, i.e. the parallelism of the two axes. By measuring the rotation angle φ of the grating monochromator i The tooling surface angle Φ(φi) obtained at this time can completely solve the above five parameters.

[0055] Formula (K6) is a trigonometric equation in implicit form. Using the particle swarm optimization algorithm, we can easily and directly solve for the five parameters, including θ. The key is to rewrite Formula (K6) as the objective function obj, as shown in Formula (K7):

[0056]

[0057] Where Σ is the summation function, abs is the absolute value function, k is the iteration indicator parameter, φ i is the rotation angle of the shaft, and obj(k) represents the average absolute error between the theoretical calculation data and the measured data at the kth iteration. This formula can transform the equation solving problem into a minimum value problem. A set of optimal parameter groups (α E , α F ,θ,ω E 、ω F ) makes the objective function obj less than the set upper limit of mean absolute error, that is, finds a possible solution.

[0058] In the specific implementation, the particle swarm algorithm is used as an example to demonstrate the calculation process. First, the parameter range is set, α E (88°,90°),α F (88°,90°), θ(0,1000″), ω E(0,360°),ω F (0,360°), and randomly generate 1000 groups of swarms. When generating, each parameter only retains 3 significant digits. This setting is because the tooling is basically installed perpendicular to the shaft, α E With α F is the angle between the axis and the normal vector of the tooling plane, which will not be greater than 90°. It can be assumed that the error will not exceed 2°. The parallelism of the grating monochromator axis itself is unknown, but it can be considered to be relatively high. Here, it can be assumed that the angle between the two axes does not exceed 1000". E and ω F From formulas (K3) and (K4), we can know that is the initial phase angle of the tooling, which can be taken anywhere in the range of 0-360°, so there is no range restriction.

[0059] Then calculate the obj values ​​of 1000 groups of populations, and initialize the self-optimal cluster pbest and the global optimal cluster gbset.

[0060] Then randomly generate the population update rate v, set the overall weight factor w = 0.9, the self-learning factor c1 = 2 (related to the aforementioned self-optimal population cluster pbest), the population learning factor c2 = 2 (related to the aforementioned global optimal population cluster gbest), and update the population swarm.

[0061] The iterative process is run until the obj obtained from the new population no longer decreases, and a possible solution is found.

[0062] The final output (α E , α F ,θ,ω E 、ω F ) gbest Then, θ gbest That’s what you want.

[0063] The comparison between the measured tooling surface angle and the theoretical calculation results of the particle swarm optimization algorithm can be found in Figure 5 and Figure 6 The results of two comparative tests are as follows: Figure 5 and Figure 6 The scattered points are the measured tooling surface angles, the test range is 0 ~ 11.5 °, and the red solid line is the possible solution obtained by the particle swarm optimization algorithm (α E , α F ,θ,ω E 、ω F ) gbestFrom the calculation results, we can see that the calculation results of the possible solutions can fit the measured data well. In order to prove the feasibility, two tests were carried out. During the period, the device was completely disassembled and reassembled for testing one day. Therefore, the data obtained in the first group ranged from 2911 to 2914", while the data obtained in the second group ranged from 3278 to 3283". It can be seen that the application of the particle swarm optimization algorithm to the two test data can obtain good results. The average errors between the simulation results and the measured results are 0.24" and 0.28", respectively, and the fitting errors are small. The oscillation of the data in the figure (the oscillation amplitude of the two sets of data is less than 5") is smaller than the numerical value (2900" and 3300").

[0064] Particle swarm optimization algorithm is a random number algorithm, and the result of a single calculation is not convincing. Figure 5 and Figure 6 The measured data was substituted into the particle swarm optimization algorithm and the operation was repeated 4000 times. For the first experiment, all possible solutions with an average error of 0.24" to 0.25" were statistically analyzed. For the second experiment, all possible solutions with an average error of 0.28" to 0.29" were statistically analyzed. Here, the possible solutions of the axis angle θ are mainly listed. By repeatedly executing the particle swarm optimization algorithm, the frequency distribution diagram of the angle θ between the two axes can be obtained. Figure 7 and Figure 8 As shown in the figure, the height of each small rectangle represents the frequency of occurrence of the corresponding axis angle θ, and the solid line represents the cumulative distribution curve of the axis angle. It can be seen that the axis angle θ calculated by the particle swarm optimization algorithm in both experiments exhibits a certain distribution and has a maximum probability solution. The maximum probability solution for the first experiment occurs at θ = 190", and the maximum probability solution for the second experiment occurs at θ = 230". These two most likely solutions can be regarded as the final solution for the axis angle θ. It should be noted that Figure 7 and Figure 8 The statistical distributions of the two experimental results are consistent, demonstrating the reliability of the technology protected by this patent. Discrepancies in specific numerical values ​​(e.g., θ = 190" in the first experiment and θ = 230" in the second) are due to the need for further optimization of the specific structure of the designed tooling. The precise design of the tooling components is not the focus of this patent.

[0065] In summary, the present invention accurately measures the biaxial parallelism of the monochromator by measuring the change in the angle between the two planar tooling mounted on the two rotating shafts of the monochromator during rotation. The contents not described in detail in this specification belong to the existing technology known to professional and technical personnel in this field.

[0066] Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, characterized in that: The following steps are involved: S1. Design a plane tooling, wherein the plane tooling is used to be loaded on a monochromator, and the plane tooling is composed of a tooling F (3), a reflecting plane mirror G (4) loaded on the tooling F, a tooling E (8), and a laser interferometer rangefinder (9) loaded on the tooling E. The monochromator is composed of a parallel distributed structure (1) of a grating monochromator carrying a reflecting mirror B, a reflecting plane mirror B (2), a grating monochromator rotation axis C (5), a structure (6) of a grating monochromator carrying a grating, a grating A (7), and a grating monochromator rotation axis D (10). The structure (1) of the grating monochromator carrying a reflecting mirror B and the structure (6) of the grating monochromator carrying a grating are loaded on the grating monochromator rotation axis C (5) and the grating monochromator rotation axis D (10), respectively. S2. Measure the angle data of the tooling surface during continuous rotation; S3. Calculate the angle between the two rotating shafts based on the tooling surface angle data; S4, a reflecting plane mirror B (2) is further provided on the top of the structural member (1) carrying the reflecting mirror B in the grating monochromator, a tool F (3) is installed on the side of the top of the structural member (1) carrying the reflecting mirror B in the grating monochromator close to the reflecting plane mirror B (2), a tool E (8) is installed on the side of the structural member (6) carrying the grating in the grating monochromator close to the top of the grating A (7), the tool E (8) and the tool F (3) are used for measuring biaxial parallelism, a laser interferometer (9) loaded on the tool E is provided on the tool E (8), and the laser interferometer (9) loaded on the tool E includes a laser probe 1 (901), a laser probe 2 (902) and a laser probe 3 (903); S5, a grating A (7) is further provided at the bottom of the structural member (6) carrying the grating in the grating monochromator, and a reflecting plane mirror G (4) mounted on the tooling F for reflecting laser light is provided on the upper side of the tooling F (3); S6. The structural component (1) carrying the reflector B in the grating monochromator and the structural component (6) carrying the grating in the grating monochromator in step S3 are tightly connected to the grating monochromator rotation axis C (5) and the grating monochromator rotation axis D (10), respectively. The angle between the two rotation axes can be calculated by measuring the change in the angle between the tooling surfaces during the rotation process, thereby obtaining the biaxial parallelism.

2. The method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device according to claim 1, characterized in that: The structural component (1) carrying the reflective mirror B in the grating monochromator cooperates with the grating A (7) of the structural component (6) carrying the grating in the grating monochromator to monochromatize the incident light through the reflecting plane mirror B (2), and the structural component (1) carrying the reflective mirror B in the grating monochromator and the structural component (6) carrying the grating in the grating monochromator can rotate around the grating monochromator rotation axis C (5) and the grating monochromator rotation axis D (10) respectively.

3. The method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device according to claim 2, characterized in that: The plane tooling of step S2 can continuously rotate the monochromator shaft in any step length after completing the loading, and record the distance between each laser probe of tooling E (8) and the reflective plane mirror G (4) loaded on tooling F (3) during the rotation process; The distance measured by each laser probe can be used to calculate the corresponding tooling surface angle at each rotation angle.

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