An etching device with precise pressure control

Abstract

The present invention belongs to the field of semiconductor technology, and discloses an etching device with precise pressure control, which includes an etching main body, a pressure control ring, a transmission rod, a transmission ring, a first elastic member and an adjustment component. The etching main body includes a reaction chamber, the pressure control ring is arranged in the reaction chamber, a plurality of transmission rods are arranged at intervals along the circumferential direction, and the first end of the transmission rod penetrates through the etching main body and is connected with the pressure control ring; the transmission ring is arranged at the top of the etching main body, and one side of the transmission ring facing the etching main body abuts against the second end of the transmission rod; the first elastic member is arranged between the transmission rod and the etching main body, a plurality of adjustment components are arranged at intervals along the circumferential direction, and the adjustment component includes a first limiting member and a locking member, and the first limiting member abuts against the side of the transmission ring facing away from the etching main body. The etching device with precise pressure control provided by the present invention can adjust the position of the pressure control ring by moving the first limiting member, and the locking member locks and limits the first limiting member, so as to increase the adjustable range of the density of the plasma acting on the product to be etched and improve the etching accuracy.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and particularly to an etching device with precise pressure control. Background Art

[0002] Capacitively Coupled Plasma (CCP) is a highly efficient plasma formed by capacitance and circuit coupling. In principle, through the characteristics of the circuit and ion chemistry, a capacitive coupled plasma field is formed in the gas to achieve the plasma effect. Among them, capacitively coupled plasma is widely used in etching devices.

[0003] In the prior art, the adjustable range of the density of the plasma acting on the product to be etched in the reaction chamber of the etching device is relatively limited, which affects the etching accuracy. Therefore, there is an urgent need for an etching device with precise pressure control to solve the above technical problems. Summary of the Invention

[0004] The purpose of the present invention is to provide an etching device with precise pressure control, which can improve the etching accuracy.

[0005] To achieve this purpose, the present invention adopts the following technical solutions:

[0006] Provide an etching device with precise pressure control, including:

[0007] An etching main body, including a reaction chamber, in which a product to be etched can be placed;

[0008] A pressure control ring, arranged in the reaction chamber, and plasma gas can flow through the inner ring of the pressure control ring and act on the product to be etched;

[0009] A plurality of transmission rods are arranged at intervals in the circumferential direction. The first end of the transmission rod axially slides through the etching main body and is connected to the pressure control ring;

[0010] A transmission ring is arranged on the top of the etching main body, and one side of the transmission ring facing the etching main body abuts against the second end of the transmission rod;

[0011] A first elastic member is arranged between the transmission rod and the etching main body, and the first elastic member makes the second end of the transmission rod always have a tendency to axially press towards the pressure control ring;

[0012] A plurality of position adjustment components are arranged at intervals in the circumferential direction. The position adjustment component includes a first limiting member and a locking member arranged opposite to the first limiting member. The first limiting member abuts against the side of the transmission ring facing away from the etching main body. The first limiting member can axially move to drive the transmission ring to axially move, and the locking member is used to lock and limit the first limiting member on the etching main body.

[0013] Optionally, the position adjustment component further includes:

[0014] A support base, provided on the top of the etching main body, and the locking member is provided on the support base;

[0015] A sliding block, axially slidably connected to the support base, and the first limiting member is provided on the sliding block; wherein,

[0016] The locking member is used to lock and fix the sliding block on the support base.

[0017] Optionally, a long slot is provided on the sliding block, the first end of the locking member passes through the long slot and is threadedly connected to the support base, and a limiting protrusion is provided at the second end of the locking member, and the limiting protrusion is used to press and fix the sliding block on the support base.

[0018] Optionally, the position adjustment component further includes a knob threadedly connected to the support base, and the knob axially abuts against the sliding block.

[0019] Optionally, a second elastic member is provided between the support base and the sliding block, and the second elastic member makes the first limiting member always have a tendency to axially press against the pressure control ring through the sliding block.

[0020] Optionally, it further includes a second limiting member provided on the top of the etching main body, a plurality of the second limiting members are circumferentially spaced, and the circumferences of the second limiting members are all in contact with the inner ring surface of the transmission ring.

[0021] Optionally, a plurality of guiding surfaces are provided on one side of the transmission ring facing the etching main body, the guiding surfaces are arranged corresponding to the transmission rods one by one, and the guiding surfaces are in contact with the second ends of the corresponding transmission rods;

[0022] The etching equipment with precise pressure control further includes a driving member connected to the transmission ring, and the driving member is used to drive the transmission ring to rotate axially to drive the corresponding transmission rod to slide axially through the guiding surface.

[0023] Optionally, a rotating member is provided at the second end of the transmission rod, and the circumference of the rotating member is in contact with the corresponding guiding surface.

[0024] Optionally, it further includes:

[0025] A gas distribution component, provided in the reaction chamber;

[0026] An electrostatic chuck, provided in the reaction chamber, the gas distribution component, the pressure control ring and the electrostatic chuck are axially spaced from top to bottom in sequence, and the electrostatic chuck is used to fix the product to be etched; wherein,

[0027] A flow guiding space is formed among the gas distributing component, the electrostatic chuck and the pressure control ring, and gas can flow through the gas distributing component to the flow guiding space and be ionized into plasma to act on the product to be etched on the electrostatic chuck.

[0028] Optionally, the gas distributing component includes:

[0029] A gas distributing main body, on which an annular pressing table is provided, and a first side of the annular pressing table abuts against the etching main body;

[0030] An annular pressing block, sleeved on the gas distributing main body, and a first side of the annular pressing block axially abuts against a second side of the annular pressing table;

[0031] A first pressing ring, a first side of the first pressing ring abuts against a second side of the annular pressing block and the etching main body;

[0032] A second pressing ring, arranged on a side of the first pressing ring facing away from the annular pressing block and abutting against a second side of the first pressing ring.

[0033] Beneficial effects:

[0034] For the etching equipment with precise pressure control provided by the present invention, under the action of the first elastic member, a second end of the transmission rod abuts against a side of the transmission ring facing the etching main body, and the first limiting member abuts against a side of the transmission ring facing away from the etching main body. By adjusting the position of the first limiting member along the axial direction, the position of the transmission ring along the axial direction is adjusted, so that the transmission rod slides along the axial direction, and further the position of the pressure control ring along the axial direction is adjusted. Among them, the plasma gas acts on the product to be etched after flowing through the inner ring of the pressure control ring. By adjusting the position of the pressure control ring along the axial direction, the density of the plasma gas flowing through the inner ring of the pressure control ring can be adjusted, and further the density of the plasma acting on the product to be etched can be adjusted, increasing the adjustable range of the density of the plasma acting on the product to be etched, effectively ensuring the uniformity of etching of the product to be etched, and improving the etching precision. In addition, the first limiting member is locked and limited on the etching main body through the locking member, and through the setting of the first elastic member, the second end of the transmission rod and the first limiting member can tightly abut against the transmission ring. With the design of multiple transmission rods and multiple position adjustment components, the position of the pressure control ring is effectively ensured to be stable and reliable, further ensuring the uniformity of etching of the product to be etched and improving the etching precision. Description of the Drawings

[0035] Figure 1 is a schematic structural view of a partial structure of the etching equipment with precise pressure control provided by the present invention from one perspective;

[0036] Figure 2It is another perspective structural schematic diagram of a partial structure of the etching equipment with precise pressure control provided by the present invention;

[0037] Figure 3 It is a structural schematic diagram of the interior of the reaction chamber provided by the present invention;

[0038] Figure 4 It is another partial structure schematic diagram of the etching equipment with precise pressure control provided by the present invention;

[0039] Figure 5 It is a partial structure schematic diagram of the etching equipment with precise pressure control provided by the present invention;

[0040] Figure 6 It is a cross-sectional view of the etching equipment with precise pressure control provided by the present invention at the through-hole.

[0041] In the figure:

[0042] 100, etching main body; 110, installation groove; 120, through-hole; 121, sealing groove; 122, limiting groove; 130, sealing assembly; 131, second sealing ring; 132, washer;

[0043] 200, pressure control ring; 201, diversion space; 202, exhaust passage; 210, first pressure control ring; 220, second pressure control ring; 230, limiting sleeve; 231, limiting ring; 240, sliding sleeve; 241, retaining ring;

[0044] 300, transmission rod; 301, boss; 310, rotating member; 320, support block; 330, gasket;

[0045] 400, transmission ring; 410, guiding surface; 411, first surface; 412, second surface; 413, third surface; 414, fourth surface; 420, sensing member;

[0046] 500, first elastic member;

[0047] 600, position adjusting assembly; 610, first limiting member; 620, locking member; 621, limiting protrusion; 630, support seat; 640, sliding block; 641, long slot; 650, knob; 660, second elastic member;

[0048] 700, gas distribution assembly; 710, gas distribution main body; 711, annular pressing platform; 720, annular pressing block; 730, first pressing ring; 740, second pressing ring; 750, first sealing ring;

[0049] 810, driving member; 811, synchronous belt; 820, position sensor;

[0050] 900, second limiting member. Detailed implementation manners

[0051] The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only for explaining the present invention, rather than limiting the present invention. In addition, it should be noted that, for the sake of convenience of description, only the parts related to the present invention rather than all the structures are shown in the drawings.

[0052] In the description of the present invention, unless otherwise clearly defined and limited, the terms "connected", "connected to", and "fixed" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0053] In the present invention, unless otherwise clearly defined and limited, the first feature being "above" or "below" the second feature may include the direct contact between the first and second features, or may include the situation where the first and second features are not in direct contact but in contact through other features therebetween. Moreover, the first feature being "above", "above and over", and "on the top of" the second feature includes that the first feature is directly above and obliquely above the second feature, or simply means that the horizontal height of the first feature is higher than that of the second feature. The first feature being "below", "below and under", and "under the bottom of" the second feature includes that the first feature is directly below and obliquely below the second feature, or simply means that the horizontal height of the first feature is lower than that of the second feature.

[0054] In the description of this embodiment, the orientation or positional relationships such as "above", "below", "right", etc. are based on the orientation or positional relationships shown in the drawings, and are only for the convenience of description and simplifying the operation, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention. In addition, the terms "first" and "second" are only used for distinction in description and do not have special meanings.

[0055] Refer to Figures 1 to 6 As shown, this embodiment provides an etching device with precise pressure control. The etching device with precise pressure control includes an etching main body 100, a pressure control ring 200, a transmission rod 300, a transmission ring 400, a first elastic member 500, and an adjustment assembly 600.

[0056] Specifically, the etching main body 100 includes a reaction chamber (not shown), in which the product to be etched can be placed; a pressure control ring 200 is arranged in the reaction chamber, and the plasma gas can flow through the inner ring of the pressure control ring 200 and act on the product to be etched; a plurality of transmission rods 300 are arranged at intervals in the circumferential direction, and the first end of the transmission rod 300 axially slides through the etching main body 100 and is connected to the pressure control ring 200; a transmission ring 400 is arranged on the top of the etching main body 100, and one side of the transmission ring 400 facing the etching main body 100 abuts against the second end of the transmission rod 300; a first elastic member 500 is arranged between the transmission rod 300 and the etching main body 100, and the first elastic member 500 makes the second end of the transmission rod 300 always have a tendency to axially press towards the pressure control ring 200; a plurality of position adjustment components 600 are arranged at intervals in the circumferential direction, and the position adjustment component 600 includes a first limiting member 610 and a locking member 620 arranged opposite to the first limiting member 610. The first limiting member 610 abuts against the side of the transmission ring 400 facing away from the etching main body 100, and the first limiting member 610 can move axially to drive the transmission ring 400 to move axially. The locking member 620 is used to lock and limit the first limiting member 610 on the etching main body 100. Wherein, the a direction in the figure is the axial direction, the axial direction can be the height direction of the etching main body 100, the b direction is the circumferential direction, and the circumferential direction can be the circumferential direction of the pressure control ring 200.

[0057] Wherein, under the action of the first elastic member 500, the second end of the transmission rod 300 abuts against the side of the transmission ring 400 facing the etching main body 100, and the first limiting member 610 abuts against the side of the transmission ring 400 facing away from the etching main body 100. By adjusting the axial position of the first limiting member 610, the axial position of the transmission ring 400 is adjusted, so that the transmission rod 300 slides axially, and further the axial position adjustment of the pressure control ring 200 is realized. Wherein, the plasma gas flows through the inner ring of the pressure control ring 200 and acts on the product to be etched. By adjusting the axial position of the pressure control ring 200, the density of the plasma gas flowing through the inner ring of the pressure control ring 200 can be adjusted, and further the density of the plasma acting on the product to be etched can be adjusted, increasing the adjustable range of the density of the plasma acting on the product to be etched, effectively ensuring the uniformity of the etching of the product to be etched, and improving the etching accuracy. In addition, by locking the first limiting member 610 on the etching main body 100 through the locking member 620, that is, limiting the axial position of the first limiting member 610, and through the setting of the first elastic member 500, the second end of the transmission rod 300 and the first limiting member 610 can tightly abut against the transmission ring 400. With the design of a plurality of transmission rods 300 and a plurality of position adjustment components 600, the position of the pressure control ring 200 is effectively ensured to be stable and reliable, further ensuring the uniformity of the etching of the product to be etched and improving the etching accuracy.

[0058] Exemplarily, the number of the transmission rods 300 can be set to three to eight, such as four or six.

[0059] Exemplarily, three to eight positioning components 600 may be provided, such as four or six.

[0060] In this embodiment, referring to Figure 2 and Figure 3 as shown, the etching equipment with precise pressure control further includes a gas distribution component 700 and an electrostatic chuck (not shown) disposed in the reaction chamber. The gas distribution component 700, the pressure control ring 200, and the electrostatic chuck are sequentially arranged at intervals along the axial direction from top to bottom. The electrostatic chuck is used to fix the product to be etched. In this embodiment, a flow guiding space 201 is formed between the gas distribution component 700, the electrostatic chuck, and the pressure control ring 200. Gas can flow through the gas distribution component 700 to the flow guiding space 201 and be ionized into plasma to act on the product to be etched on the electrostatic chuck. The flow guiding space 201 has a converging effect, making the pressure in the flow guiding space 201 higher than other areas of the reaction chamber. By adjusting the position of the pressure control ring 200, the converging effect of the flow guiding space 201 can be changed, realizing the adjustment of the pressure in the flow guiding space 201. By changing the pressure, the density of the plasma acting on the product to be etched can be adjusted to ensure the uniformity of the etching of the product to be etched and improve the etching accuracy. Among them, Figure 3 the arrow direction in

[0061] is the gas flow direction. Among them, the specific principle and structure of ionizing the gas into plasma are prior arts and not the focus of this application, so they will not be elaborated here. Among them, the specific structure of the electrostatic chuck is prior art and not the focus of this application, so it will not be elaborated here.

[0062] In this embodiment, referring to Figure 3As shown, the gas distribution component 700 includes a gas distribution main body 710, an annular pressing block 720, a first pressing ring 730, and a second pressing ring 740. Among them, an annular pressing platform 711 is provided on the gas distribution main body 710, and the first side of the annular pressing platform 711 abuts against the etching main body 100; the annular pressing block 720 is sleeved on the gas distribution main body 710, and the first side of the annular pressing block 720 abuts against the second side of the annular pressing platform 711 along the axial direction; the first side of the first pressing ring 730 abuts against the second side of the annular pressing block 720 and the etching main body 100; the second pressing ring 740 is arranged on the side of the first pressing ring 730 facing away from the annular pressing block 720 and abuts against the second side of the first pressing ring 730. In this embodiment, through the mutual cooperation of the annular pressing block 720, the first pressing ring 730, and the second pressing ring 740, the gas distribution main body 710 is fixed in the reaction chamber.

[0063] Specifically, the gas distribution main body 710 includes a plurality of gas distribution discs (not shown) arranged side by side along the axial direction. Air vents are provided on the gas distribution discs. The gas distribution disc at the lowermost position is provided with a receiving groove, and the remaining gas distribution discs are arranged in the receiving groove. Among them, the gas distribution disc at the lowermost position is provided with an annular pressing platform 711.

[0064] Specifically, the etching main body 100 is provided with an installation groove 110 at the top of the reaction chamber, and the gas distribution main body 710 is arranged in the installation groove 110. Among them, the annular pressing platform 711 abuts against the bottom of the installation groove 110, and the first pressing ring 730 abuts against the end of the installation groove 110.

[0065] Specifically, at least one first sealing ring 750 is arranged between the annular pressing platform 711 and the etching main body 100 to ensure the sealing performance between the gas distribution main body 710 and the etching main body 100.

[0066] Exemplarily, the material of the first pressing ring 730 can be a ceramic material, such as silicon carbide, to maintain impedance and ensure the process environment in the reaction chamber.

[0067] Exemplarily, the material of the second pressing ring 740 can be quartz material. Among them, quartz has good etching resistance, low part cost, low processing difficulty, and can protect the first pressing ring 730 during long-term use. After etching loss, only the second pressing ring 740 needs to be replaced. Without changing the process environment in the reaction chamber, the cost can be reduced and the maintenance burden can be reduced.

[0068] In this embodiment, refer to Figure 4 and Figure 5As shown in the figure, the position adjustment component 600 further includes a support base 630 and a sliding block 640. The support base 630 is provided on the top of the etching main body 100. A locking member 620 is provided on the support base 630. The sliding block 640 is slidably connected to the support base 630 along the axial direction. A first limiting member 610 is provided on the sliding block 640. Among them, the locking member 620 is used to lock and fix the sliding block 640 on the support base 630. In this embodiment, the support base 630 can hold up the sliding block 640 and the first limiting member 610, so that the first limiting member 610 is adapted to abut against the side of the transmission ring 400 facing away from the etching main body 100. The sliding fit between the sliding block 640 and the support base 630 can ensure the stability of the axial movement of the first limiting member 610, so as to ensure the position adjustment accuracy of the pressure control ring 200, and the locking member 620 is provided on the support base 630 and can lock and fix the sliding block 640 to facilitate locking the position of the first limiting member 610.

[0069] Specifically, a long slot 641 is provided on the sliding block 640. The first end of the locking member 620 passes through the long slot 641 and is threadedly connected to the support base 630. A limiting protrusion 621 is provided at the second end of the locking member 620. The limiting protrusion 621 is used to press and fix the sliding block 640 on the support base 630, which is convenient for the locking member 620 to press and release the sliding block 640, and the structure is stable and reliable. Exemplarily, the locking member 620 can be a screw. Of course, the locking member 620 can also be set as an electromagnetic brake or other structural members, which is not limited in this application.

[0070] In a feasible implementation manner, the position adjustment component 600 further includes a knob 650 threadedly connected to the support base 630. The knob 650 abuts against the sliding block 640 along the axial direction. In this embodiment, by screwing the knob 650, the sliding block 640 can be driven to slide along the axial direction, which is convenient and reliable, and has good position adjustment accuracy. Exemplarily, the knob 650 can be a pointer knob 650 to ensure the adjustment accuracy.

[0071] In a feasible implementation manner, a second elastic member 660 is provided between the support base 630 and the sliding block 640. The second elastic member 660 makes the first limiting member 610 always have a tendency to extrude axially towards the pressure control ring 200 through the sliding block 640. In this embodiment, the extrusion of the first elastic member 500 on the transmission rod 300 can act on the knob 650 through the transmission ring 400, the first limiting member 610 and the sliding block 640. Through the design of the second elastic member 660, part of the extrusion force of the first elastic member 500 can be offset, and it is more labor-saving when screwing the knob 650. In addition, under the action of the first elastic member 500 and the second elastic member 660, the abutment of the transmission rod 300 and the first limiting member 610 against the transmission ring 400 can be stable and reliable.

[0072] It is worth mentioning that the elastic potential energy of the first elastic member 500 is greater than that of the second elastic member 660, so that the mutual abutment between the slider 640 and the knob 650 is stable and reliable.

[0073] Exemplarily, the second elastic member 660 may be a spring.

[0074] In this embodiment, referring to Figure 1 and Figure 5 As shown, on one side of the transmission ring 400 facing the etching main body 100, there are provided a plurality of guiding surfaces 410. The guiding surfaces 410 are arranged in one-to-one correspondence with the transmission rods 300, and the guiding surfaces 410 abut against the second ends of the corresponding transmission rods 300. Further, the etching equipment with precise pressure control further includes a driving member 810 connected to the transmission ring 400. The driving member 810 is used to drive the transmission ring 400 to rotate axially to drive the corresponding transmission rod 300 to slide axially through the guiding surface 410. In this embodiment, by driving the transmission ring 400 to rotate axially by the driving member 810 to drive all the transmission rods 300 to slide axially, and then driving the pressure control ring 200 to move axially, a larger position adjustment range of the pressure control ring 200 can be achieved, that is, the adjustable range of the density of the plasma acting on the product to be etched is further increased, and the process flexibility and variability are increased. In addition, through the design of the plurality of transmission rods 300, the stability of the movement of the pressure control ring 200 is effectively ensured, and it has good precision. The design of the transmission ring 400 can form a space for other components at the top of the etching main body 100, so that the etching equipment with precise pressure control is more compact.

[0075] Exemplarily, the driving member 810 may be a motor. A driving pulley is provided on the output shaft of the driving member 810. A synchronous belt 811 is provided between the driving pulley and the transmission ring 400. Both ends of the synchronous belt 811 are fixed to the transmission ring 400, that is, no pulley is provided on the transmission ring 400, so that the structure of the etching equipment with precise pressure control is compact. In another feasible implementation manner, a driving gear is provided on the output shaft of the driving member 810, and a semi-tooth ring meshing with the driving gear may be provided on the transmission ring 400, so that the structure of the etching equipment with precise pressure control is compact. Of course, the driving connection manner between the driving member 810 and the transmission ring 400 may also be in other forms, and the present application does not make specific limitations.

[0076] Of course, the driving member 810 may also be other driving members 810, such as air cylinders, electric cylinders, etc., and the present application does not make specific limitations.

[0077] Exemplarily, the guiding surface 410 includes a first surface 411, a second surface 412, and a third surface 413 that are sequentially connected. The first surface 411 and the second surface 412 are arranged at an angle, and the first surface 411 is parallel to the third surface 413. Among them, the first surface 411 and the third surface 413 can be planes perpendicular to the axis. In this embodiment, when the second end of the transmission rod 300 abuts against the first surface 411 or the third surface 413, the rotation of the transmission ring 400 will not drive the transmission rod 300 to slide axially. When the second end of the transmission rod 300 abuts against the second surface 412, the rotation of the transmission ring 400 can drive the transmission rod 300 to slide axially, which is stable and reliable.

[0078] Exemplarily, the first limiting member 610 can be a high-precision roller or bearing, so that the movement between the first limiting member 610 and the transmission ring 400 is smoother and the wear is reduced. Preferably, the first limiting member 610 can be a bearing with a step provided on the inner ring to reduce unnecessary friction.

[0079] Exemplarily, the second surface 412 can be an arc surface, a plane, or a surface of other shapes, which is not limited in this application.

[0080] Furthermore, the guiding surface 410 further includes a fourth surface 414 connected to the third surface 413. The fourth surface 414 is provided on the side of the third surface 413 facing away from the second surface 412. The fourth surface 414 and the second surface 412 are arranged at an angle, and the angle α between the second surface 412 and the third surface 413 is not equal to the angle β between the third surface 413 and the fourth surface 414. When the second end of the transmission rod 300 abuts against the second surface 412 or the fourth surface 414, the rotation of the transmission ring 400 can drive the transmission rod 300 to slide axially.

[0081] Exemplarily, the angle α between the first surface 411 and the second surface 412 is smaller than the angle β between the third surface 413 and the fourth surface 414. It can be understood that the adjustment accuracy when the second end of the transmission rod 300 abuts against the fourth surface 414 is better than the adjustment accuracy when the second end of the transmission rod 300 abuts against the second surface 412.

[0082] Exemplarily, the fourth surface 414 can be an arc surface, a plane, or a surface of other shapes, which is not limited in this application.

[0083] In a feasible implementation manner, a plurality of position sensors 820 are further disposed on the top of the etching main body 100, and an induction member 420 is disposed on the transmission ring 400. The position sensors 820 identify the induction member 420 to achieve precise positioning of the transmission ring 400 and improve the safety of the operation of the etching equipment for precise pressure control. Exemplarily, the position sensors 820 may be groove-type sensors, and the induction member 420 may be a sheet body. Among them, a plurality of position sensors 820 may be spaced apart on the rotation path of the induction member 420, for example, two to six. In addition, the positions of the position sensors 820 can be adjusted to facilitate the debugging of the etching equipment for precise pressure control.

[0084] In this embodiment, referring to Figure 5 and Figure 6 As shown, a rotating member 310 is provided at the second end of the transmission rod 300. The circumferential portion of the rotating member 310 abuts against the corresponding guiding surface 410, and the movement between the rotating member 310 and the transmission ring 400 is smoother, effectively reducing wear. Exemplarily, the rotating member 310 may be a high-precision roller or bearing. Preferably, the rotating member 310 may be a bearing with a step provided on the inner ring.

[0085] Specifically, a support block 320 is provided at the second end of the transmission rod 300, and the rotating member 310 is disposed on the support block 320.

[0086] More specifically, a boss 301 is provided at the second end of the transmission rod 300. A support block 320 is provided on the boss 301, and a gasket 330 is sleeved on the transmission rod 300. The gasket 330 is located between the first elastic member 500 and the boss 301. One end of the first elastic member 500 facing the support block 320 abuts against the gasket 330. Under the action of the first elastic member 500, the gasket 330 abuts against the boss 301, which is convenient for assembly.

[0087] Exemplarily, the first elastic member 500 may be a spring and is sleeved on the transmission rod 300.

[0088] Specifically, a plurality of through holes 120 are formed in the etching main body 100, and the transmission rods 300 are respectively inserted into the through holes 120. A sealing groove 121 is provided at one end of the through hole 120 facing the support block 320, and a sealing assembly 130 is provided in the sealing groove 121 to ensure the sealing performance of the reaction chamber. Exemplarily, the first elastic member 500 is always in a compressed state. One end of the first elastic member 500 facing away from the support block 320 abuts against the sealing assembly 130, which can press the sealing assembly 130 and further ensure the sealing performance of the sealing chamber.

[0089] Further, the sealing assembly 130 includes at least one second sealing ring 131. When there are more than two second sealing rings 131, a washer 132 can be arranged between adjacent second sealing rings 131 to better ensure the sealing effect. Among them, the first elastic member 500 can directly abut against the outermost second sealing ring 131, or a cover plate (not shown) can be arranged at the end of the sealing groove 121, and the first elastic member 500 presses the sealing assembly 130 by abutting against the cover plate.

[0090] In this embodiment, referring to Figure 4 As shown, the etching equipment with precise pressure control further includes a second limiting member 900 arranged on the top of the etching main body 100. A plurality of second limiting members 900 are arranged at intervals along the circumferential direction, and the circumferential parts of the second limiting members 900 abut against the inner ring surface of the transmission ring 400 to realize the circumferential positioning of the transmission ring 400, so as to ensure the stable and reliable rotation of the transmission ring 400 around the axis and the movement along the axis. Exemplarily, the second limiting member 900 can be a high-precision roller or bearing, so that the movement between the second limiting member 900 and the transmission ring 400 is smoother and the wear is reduced. Exemplarily, the number of the second limiting members 900 can be set to three to eight, such as four or six. Preferably, the second limiting member 900 can be a bearing with a step on the inner ring.

[0091] In this embodiment, referring to Figure 6 As shown, the pressure control ring 200 includes a first pressure control ring 210, a second pressure control ring 220 and a limiting sleeve 230. Among them, the first pressure control ring 210 is fixedly connected to the first end of the corresponding transmission rod 300, the second pressure control ring 220 is arranged on the side of the first pressure control ring 210 facing the transmission ring 400, the second pressure control ring 220 is slidably connected to the corresponding transmission rod 300 along the axis, a plurality of limiting sleeves 230 are provided and are arranged in one-to-one correspondence with the transmission rods 300, the limiting sleeves 230 are sleeved on the corresponding transmission rods 300 and are fixedly connected to the second pressure control ring 220, a limiting ring 231 is arranged on the outer wall of the limiting sleeve 230, and a limiting groove 122 is arranged on the hole wall of the through hole 120, and the limiting ring 231 is arranged in the corresponding limiting groove 122. Among them, the limiting ring 231 can be arranged at one end of the limiting sleeve 230 facing away from the second pressure control ring 220. In this embodiment, the transmission rod 300 has an initial position and an extreme position in sequence when sliding from top to bottom. By setting the position adjustment assembly 600, the initial position and the extreme position of the transmission rod 300 can be adjusted, and further a larger position adjustment range of the first pressure control ring 210 and the second pressure control ring 220 is realized.

[0092] When the transmission rod 300 slides from the initial position towards the extreme position, first, the second pressure control ring 220 moves downward with the first pressure control ring 210 under its own weight until the limiting ring 231 abuts against the lower groove surface of the limiting groove 122. Subsequently, the first pressure control ring 210 slides down to the extreme position. At this time, exhaust channels 202 are respectively formed between the first pressure control ring 210 and the second pressure control ring 220, between the gas equalizing assembly 700 and the second pressure control ring 220, and between the electrostatic chuck and the first pressure control ring 210. When the transmission rod 300 slides from the extreme position towards the initial position, the first pressure control ring 210 acts first and moves upward with the transmission rod 300 until the first pressure control ring 210 contacts the second pressure control ring 220. Subsequently, the first pressure control ring 210 pushes the second pressure control ring 220 upward. In this embodiment, the control driving member 810 drives the transmission ring 400 to rotate to drive the transmission rod 300 to slide between the initial position and the extreme position, thereby realizing the position adjustment of the first pressure control ring 210 and the second pressure control ring 220, changing the gathering effect of the diversion space 201, and adjusting the pressure in the diversion space 201 to ensure the plasma density acting on the product to be etched and ensure the uniformity of the etching of the product to be etched. Exemplarily, when the transmission rod 300 is at the initial position, the first pressure control ring 210 and the second pressure control ring 220 may be attached together or arranged at intervals, and the present application does not make specific limitations.

[0093] Specifically, the pressure control ring 200 further includes a plurality of sliding sleeves 240. The sliding sleeves 240 are arranged in one-to-one correspondence with the transmission rods 300. The sliding sleeves 240 are sleeved on the corresponding transmission rods 300 and clamp the second pressure control ring 220 with the corresponding limiting sleeves 230 to realize the fixed connection among the second pressure control ring 220, the sliding sleeve, and the limiting sleeve 230. Further specifically, a retaining ring 241 is provided at the first end of the sliding sleeve 240. The retaining ring 241 and the end of the limiting sleeve 230 facing the second pressure control ring 220 clamp the second pressure control ring 220. Further specifically, the second end of the sliding sleeve 240 can be inserted into the limiting sleeve 230. Exemplarily, the sliding sleeve 240 can be connected to the limiting sleeve 230 by means of threaded connection, welding, or other connection methods, and the present application does not make limitations.

[0094] Exemplarily, when there is one pressure control ring 200, that is, only the first pressure control ring 210 is included.

[0095] Exemplarily, when there are two or more pressure control rings 200, except for the first pressure control ring 210, the connection manner between adjacent pressure control rings 200 may be the same as the connection manner between the second pressure control ring 220 and the transmission rod 300, and the present application will not elaborate too much.

[0096] Exemplarily, the materials of the first pressure control ring 210 and the second pressure control ring 220 can be ceramics, such as silicon carbide. In this embodiment, the surface of the pressure control ring 200 can be sprayed with a yttrium oxide coating to prevent particulate deposition and increase the etching resistance of the pressure control ring 200, thereby increasing the service life of the pressure control ring 200. The pressure control ring 200 is designed with a ceramic material and a yttrium oxide coating on its surface, which can prevent particulate deposition and increase the etching resistance of the part, thus increasing the service time of the part.

[0097] It can be understood that for the connection methods not clearly described in the text, common connection methods such as threaded connection, welding or bonding can be selected according to needs.

[0098] Obviously, the above embodiments of the present invention are merely examples for clearly explaining the present invention, rather than limiting the implementation manners of the present invention. For those of ordinary skill in the art, various obvious changes, re-adjustments and substitutions can be made without departing from the protection scope of the present invention. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A precise pressure-controlled etching device, characterized in that: include: The etching body (100) comprises a reaction chamber, in which the product to be etched can be placed; A pressure control ring (200) is arranged in the reaction chamber, and plasma gas can flow through the inner ring of the pressure control ring (200) and act on the product to be etched; A plurality of transmission rods (300) are arranged at intervals along the circumferential direction, and a first end of the transmission rod (300) slides through the etching body (100) along the axial direction and is connected to the pressure control ring (200); A transmission ring (400) is arranged on the top of the etching body (100), and a side of the transmission ring (400) facing the etching body (100) abuts against the second end of the transmission rod (300); A first elastic member (500) is disposed between the transmission rod (300) and the etching body (100), wherein the first elastic member (500) enables the second end of the transmission rod (300) to always have a tendency to be pressed toward the pressure control ring (200) along the axial direction; A plurality of positioning components (600) are arranged at intervals along the circumferential direction, and the positioning components (600) include a first limiting member (610) and a locking member (620) arranged opposite to the first limiting member (610), wherein the first limiting member (610) abuts against a side of the transmission ring (400) facing away from the etching body (100), the first limiting member (610) can move axially to drive the transmission ring (400) to move axially, and the locking member (620) is used to lock and limit the first limiting member (610) on the etching body (100).

2. The precise pressure-controlled etching device according to claim 1, characterized in that: The positioning component (600) further includes: A support seat (630) is arranged on the top of the etching body (100), and the locking member (620) is arranged on the support seat (630); The sliding block (640) is axially slidably connected to the support seat (630), and the first limiting member (610) is provided on the sliding block (640); wherein, The locking member (620) is used to lock and fix the sliding block (640) on the supporting seat (630).

3. The precise pressure-controlled etching device according to claim 2, characterized in that: The sliding block (640) is provided with a long hole (641), the first end of the locking member (620) passes through the long hole (641) and is threadedly connected to the support seat (630), and the second end of the locking member (620) is provided with a limiting protrusion (621), and the limiting protrusion (621) is used to press and fix the sliding block (640) on the support seat (630).

4. The precise pressure-controlled etching device according to claim 2, characterized in that: The positioning assembly (600) further comprises a knob (650) threadedly connected to the support seat (630), and the knob (650) abuts against the sliding block (640) along the axial direction.

5. The precise pressure-controlled etching device according to claim 2, characterized in that: A second elastic member (660) is provided between the support seat (630) and the sliding block (640), and the second elastic member (660) enables the first limiting member (610) to always have a tendency to be squeezed axially toward the pressure control ring (200) through the sliding block (640).

6. The precise pressure-controlled etching device according to claim 1, characterized in that: It also includes a second limiting member (900) arranged on the top of the etching body (100), wherein a plurality of the second limiting members (900) are arranged at intervals along the circumferential direction, and the circumference of the second limiting members (900) are all in contact with the inner ring surface of the transmission ring (400).

7. The precise pressure-controlled etching device according to any one of claims 1 to 6, characterized in that: A plurality of guide surfaces (410) are provided on one side of the transmission ring (400) facing the etching body (100), the guide surfaces (410) are arranged in one-to-one correspondence with the transmission rods (300), and the guide surfaces (410) abut against the second ends of the corresponding transmission rods (300); The precise pressure-controlled etching device further comprises a driving member (810) connected to the transmission ring (400), wherein the driving member (810) is used to drive the transmission ring (400) to rotate axially so as to drive the corresponding transmission rod (300) to slide axially through the guide surface (410).

8. The precise pressure-controlled etching device according to claim 7, characterized in that: A rotating member (310) is provided at the second end of the transmission rod (300), and the periphery of the rotating member (310) abuts against the corresponding guide surface (410).

9. The precise pressure-controlled etching device according to any one of claims 1 to 6, characterized in that: Also includes: A gas homogenizing component (700) is disposed in the reaction chamber; An electrostatic chuck is arranged in the reaction chamber, the gas homogenizing assembly (700), the pressure control ring (200) and the electrostatic chuck are sequentially arranged from top to bottom along the axial direction, and the electrostatic chuck is used to fix the product to be etched; wherein, A flow guide space (201) is formed between the gas uniformizing component (700), the electrostatic chuck and the pressure control ring (200), and gas can flow into the flow guide space (201) through the gas uniformizing component (700) and be ionized into plasma to act on the product to be etched on the electrostatic chuck.

10. The precise pressure-controlled etching device according to claim 9, characterized in that: The gas homogenizing assembly (700) comprises: A gas-uniform body (710), wherein an annular pressing platform (711) is provided on the gas-uniform body (710), and a first side of the annular pressing platform (711) is in contact with the etching body (100); An annular pressing block (720) is sleeved on the gas homogenizing body (710), and a first side of the annular pressing block (720) abuts against a second side of the annular pressing platform (711) along the axial direction; A first pressure ring (730), wherein a first side of the first pressure ring (730) abuts against a second side of the annular pressure block (720) and the etching body (100); The second pressure ring (740) is arranged on a side of the first pressure ring (730) facing away from the annular pressure block (720) and abuts against a second side of the first pressure ring (730).

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