A photovoltaic silicon wafer cleaning control system

Abstract

The present application relates to a photovoltaic silicon wafer cleaning control system. When setting the conveying order of the robot grabbing the pressure basket through the cleaning device and the drying device, the following conditions need to be met for setting: Condition 1: All cleaning devices are prior to all drying devices; Condition 2: The cleaning devices and drying devices at the front must be prior to the cleaning devices and drying devices at the back. Condition 1 stipulates that cleaning must be done before drying, and Condition 2 stipulates that the movement order of the robot during the working process can only be from front to back, avoiding the reciprocating movement of the robot and improving production efficiency.

Description

Technical Field

[0001] The present application belongs to the technical field of photovoltaic silicon wafer production equipment, and in particular, relates to a photovoltaic silicon wafer cleaning control system. Background Art

[0002] The texturing cleaning device usually includes a pre-cleaning device, which uses acid to clean the oil and metal ions on the surface of the silicon wafer; a texturing cleaning device, which first washes the silicon wafer with water and then texturizes the silicon wafer with alkali solution; a chemical polishing cleaning device, which uses alkali solution containing a composite solvent to remove a layer of the silicon wafer surface; an acid cleaning device, which uses acid containing hydrogen peroxide to clean the silicon wafer surface, and a drying device, which is used to air-dry the silicon wafer that has passed through the above cleaning devices. The pre-cleaning device, the texturing cleaning device, the chemical polishing cleaning device, and the acid cleaning device can be collectively referred to as a cleaning device in accordance with the process sequence.

[0003] The photovoltaic silicon wafer cleaning control system is set in the PLC program of the texturing and cleaning device, which is used to control the basket transporting device to transport the basket carrying the photovoltaic silicon wafers to the cleaning device or the drying device in sequence according to the set conveying sequence. Generally speaking, the texturing and cleaning device is customized according to the cleaning process, and the basket must traverse all the cleaning devices and drying devices. When the process is modified, it is necessary to modify the program in the PLC. However, the prior art has no restrictions on the conveying sequence after the modified program, which makes it easy for the robot to move back and forth, thereby reducing the production efficiency of the photovoltaic silicon wafers.

[0004] Reference documents: CN115411149A, CN115207154A. SUMMARY OF THE INVENTION

[0006] Technical issues

[0007] The technical problem to be solved by the present invention is: to solve the deficiencies in the prior art, thereby providing a photovoltaic silicon wafer cleaning control system that ensures production efficiency when modifying the cleaning sequence.

[0008] Technical Solutions

[0009] The technical solution adopted by the present invention to solve its technical problem is:

[0010] A photovoltaic silicon wafer cleaning control system, used to control photovoltaic silicon wafer cleaning equipment, comprising:

[0011] The photovoltaic silicon wafer cleaning equipment comprises a hanging basket transport device and a plurality of cleaning devices and a plurality of drying devices arranged in a row, wherein the cleaning device is used to clean the photovoltaic silicon wafers, and the drying device is used to dry the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used to control the hanging basket transport device to transport the hanging basket with the photovoltaic silicon wafers to the cleaning device or the drying device;

[0012] The photovoltaic silicon wafer cleaning control system comprises:

[0013] A working module is used to control the basket transport device to transport the basket with the photovoltaic silicon wafers to the cleaning device or the drying device in sequence according to a set transport sequence;

[0014] The setting module is used to set the delivery sequence, and the delivery sequence needs to meet the following conditions for setting:

[0015] Condition 1: All cleaning devices precede all drying devices;

[0016] Condition 2: The cleaning device and drying device at the front must be earlier than the cleaning device and drying device at the back.

[0017] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention,

[0018] The hanging basket handling device includes a conveying rail with multiple conveying sections and a robot arranged on each conveying section. The connecting area between two adjacent conveying sections is a transition section. The robots of two adjacent conveying sections can move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections.

[0019] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention has at least one transition section corresponding to at least one cleaning device and at least one drying device, so that the cleaning and drying process times can be freely adjusted according to actual conditions.

[0020] Preferably, in the photovoltaic silicon wafer cleaning control system of the present invention, a pre-drying device is further provided between the cleaning device and the drying device, and the pre-drying device is also located in the transition section.

[0021] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module for adjusting the cleaning process parameters and the drying process parameters in the cleaning device and the drying device.

[0022] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module for adjusting the cleaning process parameters and the drying process parameters in the cleaning device and the drying device.

[0023] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention further includes an adjustment module, and the processing time of the cleaning device corresponding to the transition section and the drying time corresponding to the transition section are not less than the time required for the robot to pass through the transition section.

[0024] Preferably, the photovoltaic silicon wafer cleaning control system of the present invention also includes a correction module, which is used to automatically adjust the settings that do not meet the conditions to settings that meet the conditions when the conveying sequence is manually set, and to synchronously adjust the cleaning process parameters and drying process parameters in the cleaning device and the drying device while adjusting the sequence of the cleaning device and the drying device.

[0025] The present application also includes a photovoltaic silicon wafer cleaning control system, wherein the photovoltaic silicon wafer cleaning equipment is a texturing cleaning equipment.

[0026] Beneficial Effects

[0027] The beneficial effects of the present invention are as follows: the photovoltaic silicon wafer cleaning control system of the present invention needs to meet the following conditions when setting the conveying order of the robot grabbing the pressure basket through the cleaning device and the drying device: Condition 1: All cleaning devices are prior to all drying devices; Condition 2: The cleaning devices and drying devices at the front must be prior to the cleaning devices and drying devices at the back. Condition 1 stipulates that cleaning must be done before drying, and Condition 2 stipulates that the movement order of the robot during the working process can only be from front to back, avoiding the reciprocating movement of the robot and improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] The technical solution of the present application is further described below in conjunction with the accompanying drawings and embodiments. Figure 1 It is a framework diagram of the photovoltaic silicon wafer cleaning control system of an embodiment of the present application.

[0029] Best Mode for Carrying Out the Invention

[0030] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application may be combined with each other.

[0031] The technical solution of the present application will be described in detail below with reference to the accompanying drawings and in combination with embodiments. Example

[0032] This embodiment provides a photovoltaic silicon wafer cleaning control system for controlling photovoltaic silicon wafer cleaning equipment, such as Figure 1 As shown, including:

[0033] The photovoltaic silicon wafer cleaning equipment comprises a hanging basket transport device and a plurality of cleaning devices and a plurality of drying devices arranged in a row, wherein the cleaning device is used to clean the photovoltaic silicon wafers, and the drying device is used to dry the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used to control the hanging basket transport device to transport the hanging basket with the photovoltaic silicon wafers to the cleaning device or the drying device;

[0034] The photovoltaic silicon wafer cleaning control system comprises:

[0035] A working module is used to control the basket transport device to transport the basket with the photovoltaic silicon wafers to the cleaning device or the drying device in sequence according to a set transport sequence;

[0036] The setting module is used to set the delivery sequence, and the delivery sequence needs to meet the following conditions for setting:

[0037] Condition 1: All cleaning devices precede all drying devices;

[0038] Condition 2: The cleaning device and drying device at the front must be earlier than the cleaning device and drying device at the back.

[0039] For example: the photovoltaic silicon wafer cleaning equipment used in the example includes a first cleaning tank, a second cleaning tank, a third cleaning tank, a fourth cleaning tank, a fifth cleaning tank, and a first drying tank and a second drying tank arranged in sequence. When setting the module, the conveying sequence can be directly set to the first cleaning tank, the second cleaning tank, the third cleaning tank, the fourth cleaning tank, the fifth cleaning tank-the first drying tank-the second drying tank, or one or more of the cleaning tanks or drying tanks can be ignored as needed, such as: the first cleaning tank-the third cleaning tank-the first drying tank-the second drying tank. However, it cannot be set to the following cleaning method: such as the third cleaning tank-the first cleaning tank-the first drying tank-the second drying tank, which violates condition two. Of course, the setting method of the cleaning device and the drying device in this example must meet condition one. It should be noted that after completing the cleaning, the manipulator must return to its original position and can move from back to front without grabbing the hanging basket.

[0040] The photovoltaic silicon wafer cleaning control system of this embodiment stipulates through condition one that cleaning must be done before drying, and condition two that the movement sequence of the robot during operation can only be from front to back, thus avoiding the reciprocating movement of the robot back and forth and improving production efficiency.

[0041] The hanging basket handling device includes a conveying rail with multiple conveying sections and a manipulator set on each conveying section. The connecting area between two adjacent conveying sections is a transition section. The manipulators of the two adjacent conveying sections can move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections. Multiple conveying sections correspond to multiple manipulators, so that the manipulators can grab a flower basket in different conveying sections at the same time, thereby improving work efficiency.

[0042] That is, all cleaning devices or drying devices in the transition section must have flower baskets entering, so that the entire hanging basket handling device can smoothly complete the handover of manipulators in different conveying sections in the transition section.

[0043] Taking the photovoltaic silicon wafer cleaning equipment as an example, the first robot corresponds to the first cleaning tank, the second cleaning tank, and the third cleaning tank; the second robot corresponds to the third cleaning tank, the fourth cleaning tank, and the fifth cleaning tank; the third robot corresponds to the fifth cleaning tank, the first drying tank, and the second drying tank. The transition section corresponds to the third cleaning tank and the fifth cleaning tank. The robot must grab the flower basket from the third cleaning tank and the fifth cleaning tank to complete the conversion of different robots. Therefore, when setting the conveying order, it must pass through the third cleaning tank and the fifth cleaning tank to optimize the time of the entire cleaning process.

[0044] Preferably, at least one transition section includes at least one cleaning device and at least one drying device, that is, a transition section must be set at the connecting part of the cleaning device and the drying device, and the transition section includes at least two devices, so that the cleaning and drying process time can be freely adjusted according to actual conditions.

[0045] Preferably, a pre-drying device is provided between the cleaning device and the drying device, and the pre-drying device is also located in the transition section. The pre-drying is usually for draining water.

[0046] The system also includes an adjustment module for adjusting the cleaning process parameters and drying process parameters in the cleaning device and the drying device. The cleaning process parameters generally include cleaning time, cleaning liquid type, cleaning liquid temperature, and cleaning liquid dosage. The drying process parameters include the problem of the blowing gas and the drying time.

[0047] The system also includes a correction module, which is used to automatically adjust the settings that do not meet the conditions to settings that meet the conditions when the conveying sequence is manually set, and adjust the cleaning process parameters and drying process parameters in the cleaning device and the drying device simultaneously while adjusting the sequence of the cleaning device and the drying device. Of course, the final decision on the conveying sequence is still in the hands of the operator.

[0048] The correction method of the correction module is:

[0049] S1: Read the conveying order of the robot carrying the flower basket to the cleaning device and the drying device;

[0050] S2: Determine whether all cleaning devices are prior to all drying devices. If so, proceed to step S3; if not, adjust the drying device to after all cleaning devices according to the principle of proximity and then proceed to step S3;

[0051] S3: Determine whether the front-end cleaning device and drying device are earlier than the rear-end cleaning device and drying device. If yes, end the process; if not, adjust the order of the drying devices to ensure that the cleaning device and drying device are earlier than the rear-end cleaning device and drying device, and then end the process;

[0052] If the hanging basket handling device includes a conveying rail with multiple conveying sections and a robot arranged on each conveying section, the connecting area between two adjacent conveying sections is a transition section, and the robots of the two adjacent conveying sections can all move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. Then, before ending, it is added to determine whether at least one of the cleaning devices and drying devices corresponding to all the transition sections is in the conveying sequence. If so, the process ends. Otherwise, the cleaning device or drying device closest to the cleaning devices and drying devices corresponding to the transition section is adjusted to the cleaning device and drying device corresponding to the transition section.

[0053] The photovoltaic silicon wafer cleaning equipment is a texturing cleaning equipment, that is, the photovoltaic silicon wafer cleaning control system is the control system of the texturing cleaning equipment.

[0054] Based on the above ideal embodiments of this application, the relevant staff can make various changes and modifications without departing from the technical concept of this application through the above description. The technical scope of this application is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

[0055] Those skilled in the art will appreciate that the embodiments of the present application may be provided as methods, systems, or computer program products. Therefore, the present application may adopt the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware. Moreover, the present application may adopt the form of a computer program product implemented on one or more computer-usable storage media that include computer-usable program code.

[0056] The present application is described with reference to the flowcharts and / or block diagrams of the methods, devices, and computer program products according to the embodiments of the present application. It should be understood that each process and / or block in the flowchart and / or block diagram, as well as the combination of the processes and / or blocks in the flowchart and / or block diagram, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing device to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowchart and / or block diagram. Figure 1 A process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0057] These computer program instructions may also be stored in a computer-readable memory capable of directing a computer or other programmable data processing device to operate in a specific manner, so that the instructions stored in the computer-readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 A process or multiple processes and / or boxes Figure 1 A function specified in one or more boxes.

[0058] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operating steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing instructions for implementing the process in the computer or other programmable device. Figure 1 A process or multiple processes and / or boxes Figure 1 The steps for the functions specified in one or more boxes.

Claims

1. A photovoltaic silicon wafer cleaning control system, used to control photovoltaic silicon wafer cleaning equipment, characterized in that: include: The photovoltaic silicon wafer cleaning equipment comprises a hanging basket transport device and a plurality of cleaning devices and a plurality of drying devices arranged in a row, wherein the cleaning device is used to clean the photovoltaic silicon wafers, and the drying device is used to dry the cleaned photovoltaic silicon wafers, and the photovoltaic silicon wafer cleaning control system is used to control the hanging basket transport device to transport the hanging basket with the photovoltaic silicon wafers to the cleaning device or the drying device; The photovoltaic silicon wafer cleaning control system comprises: A working module is used to control the basket transport device to transport the basket with the photovoltaic silicon wafers to the cleaning device or the drying device in sequence according to a set transport sequence; The setting module is used to set the delivery sequence, and the delivery sequence needs to meet the following conditions for setting: Condition 1: All cleaning devices precede all drying devices; Condition 2: The cleaning device and drying device at the front must be earlier than the cleaning device and drying device at the back; The hanging basket handling device includes a conveying rail with multiple conveying sections and a manipulator arranged on each conveying section. The connecting area between two adjacent conveying sections is a transition section. The manipulators of the two adjacent conveying sections can move to the transition section. The transition section corresponds to one or more cleaning devices or one or more drying devices. When setting the conveying sequence, the setting module must also meet condition three: the conveying sequence must include at least one cleaning device or one drying device corresponding to all transition sections; It also includes a correction module, and the correction method of the correction module is: S1: Read the conveying sequence of the robot carrying the hanging basket to the cleaning device and the drying device; S2: Determine whether all cleaning devices are prior to all drying devices. If so, proceed to step S3; if not, adjust the drying device to after all cleaning devices according to the principle of proximity and then proceed to step S3; S3: Determine whether the front-end cleaning device and drying device are earlier than the rear-end cleaning device and drying device, if yes, end; if no, adjust the order of the drying devices to meet the requirement that the cleaning device and drying device are earlier than the rear-end cleaning device and drying device, and end; If the hanging basket handling device includes a conveying rail with multiple conveying sections and a robot arranged on each conveying section, the connecting area between two adjacent conveying sections is a transition section, the robots of the two adjacent conveying sections can all move to the transition section, and the transition section corresponds to one or more cleaning devices or one or more drying devices, then before ending, it is added to judge whether at least one of the cleaning devices and drying devices corresponding to all the transition sections is in the conveying sequence, if so, ending, otherwise, the cleaning device or drying device closest to the cleaning devices and drying devices corresponding to the transition section is adjusted to the cleaning device and drying device corresponding to the transition section.

2. The photovoltaic silicon wafer cleaning control system according to claim 1, characterized in that: At least one transition section correspondingly includes at least one cleaning device and at least one drying device.

3. The photovoltaic silicon wafer cleaning control system according to claim 1, characterized in that: It also includes an adjustment module for adjusting the cleaning process parameters and drying process parameters in the cleaning device and the drying device.

4. The photovoltaic silicon wafer cleaning control system according to claim 3, characterized in that: The adjustment module is also used to ensure that the processing time of the cleaning device corresponding to the transition section and the drying time corresponding to the transition section are not less than the time required for the robot to pass through the transition section.

5. A photovoltaic silicon wafer cleaning control system, characterized in that: The photovoltaic silicon wafer cleaning equipment in any one of claims 1 to 4 is a texturing cleaning equipment.

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