Electrorheological polishing device and polishing method

Abstract

The present invention relates to an electrorheological polishing device and polishing method. The device includes an electrode housing, a mounting plate, a pressure plate, a connector, a funnel electrode, a negative electrode rod, and a positive electrode rod; the electrode housing is mounted on one side of the mounting plate, and the interior is divided into a first area and a second area by the pressure plate, with gas flowing into the first area and polishing liquid flowing into the second area; the funnel electrode is mounted at one end of the electrode housing, and a funnel-shaped cavity is provided inside; the negative electrode rod passes through the connector, the mounting plate, the electrode housing, and the funnel-shaped cavity; and one end of the positive electrode rod is embedded in the funnel electrode. Compared with the prior art, the present invention has the advantages of pressing the polishing liquid down through the pressure plate, thereby increasing the shear strength of the polishing liquid and improving the material removal efficiency; enabling the polishing liquid to be quickly updated and improving the processing stability; and providing a certain gap between the negative electrode rod and the funnel electrode to achieve uniform distribution of the electric field during the processing, thereby improving the quality of the polishing process and the surface finish.

Description

Technical Field

[0001] The invention relates to a polishing process technology, in particular to an electrorheological polishing device and a polishing method. Background Art

[0002] Electrorheological polishing (ERP) is an advanced field-assisted polishing method that utilizes the electric field-induced electrorheological effect to reduce abrasive loss and improve processing efficiency. This technology is particularly suitable for processing optical components with complex morphologies, such as those used in the medical, aerospace, and defense sectors. It achieves high-quality polishing of workpieces by adding abrasive particles with high hardness and good dielectric properties to an ER fluid. The application of an external electric field modifies the fluid's microstructure and rheological properties, thereby achieving high-quality workpiece polishing. During ERP, the abrasive particles form a chain-like structure under the influence of the electric field, generating a shearing motion on the workpiece surface and achieving a polishing effect. Compared to traditional polishing methods, ERP's primary advantage lies in its ability to more precisely control the movement and force of the abrasive particles, resulting in lower surface roughness and higher material removal accuracy. The tiny, needle-shaped tool electrodes used in ERP allow for a small and flexible polishing area, making it particularly suitable for polishing conductive workpieces with small, complex morphologies.

[0003] Currently, electrorheological polishing mostly uses a static liquid method. Compared with this method, synchronous liquid supply has obvious advantages and importance. First, it can ensure that the electrorheological fluid always maintains an appropriate concentration and flow state during the processing. This stable liquid supply environment can effectively prevent fluctuations in processing quality caused by evaporation or concentration changes of the electrorheological fluid, thereby improving processing stability and consistency. Secondly, synchronous liquid supply can make the electric field evenly distributed, avoid local accumulation of charges on the electrode surface, and thus reduce the possibility of local corrosion. This can improve the uniformity and consistency of the polishing process, thereby improving the processing quality and surface finish. In addition, synchronous liquid supply can also effectively control the contact time and degree of action between the electrolyte and the workpiece surface, which is conducive to precisely controlling the processing parameters and achieving more precise processing effects. However, most synchronous liquid supply equipment has a complex structure, high cost, and unsatisfactory effect.

[0004] After searching, application publication number CN115446718A discloses a polishing and deburring system and polishing method for surgical blade surfaces. Specifically, the system includes a tool electrode, the top of which is connected to a control device; a polishing groove is provided at the bottom of the tool electrode, a through-hole is provided at the bottom center of the polishing groove, a silicone foam strip is provided at the top of the through-hole, a polishing liquid is provided in the polishing groove, and the silicone foam strip and the bottom end of the tool electrode are both immersed in the polishing liquid, and the tool electrode is also connected to a power supply; a support plate is provided at the bottom of the polishing groove, the support plate has a hole connected to the through-hole, a suction cup is provided at the bottom of the support plate, the suction cup is connected to a vacuum generator, and the vacuum generator is connected to an air compressor. However, the polishing liquid in this prior art is static and cannot be updated.

[0005] In summary, how to design a polishing device and a polishing method that can update the polishing liquid and has a simple structure is a technical problem that needs to be solved. Summary of the Invention

[0006] The purpose of the present invention is to provide an electrorheological polishing device and a polishing method in order to overcome the defects of the above-mentioned prior art in that the polishing liquid is difficult to update and the structure is complex.

[0007] The purpose of the present invention can be achieved by the following technical solutions:

[0008] According to one aspect of the present invention, there is provided an electrorheological polishing device, which is mounted on a processing device and connected to a power supply, and the device comprises an electrode housing, a mounting plate, a pressure plate, a connector, a funnel electrode, a negative electrode rod and a positive electrode rod; one end of the electrode housing is mounted on one side of the mounting plate, and the interior is divided into a first area and a second area which are not connected to each other by a movable pressure plate, the first area being close to the mounting plate and having gas flowing therein, and the second area being having polishing liquid flowing therein; the other side of the mounting plate is mounted on the processing device via a connector; the funnel electrode is mounted on an end of the electrode housing away from the mounting plate, and a funnel-shaped cavity is provided therein; one end of the negative electrode rod is connected to the negative pole of the power supply, and the other end passes through the connector, the mounting plate, the electrode housing and the funnel-shaped cavity and does not contact the funnel electrode; one end of the positive electrode rod is connected to the positive pole of the power supply, and the other end is embedded in the funnel electrode.

[0009] As a preferred technical solution, a first gas sealing ring is installed between the electrode shell and the mounting plate, and a second gas sealing ring is installed between the electrode shell and the negative electrode rod; the electrode shell, the mounting plate and the funnel electrode are all connected by sealing pipe threads.

[0010] As a preferred technical solution, the equipment also includes a pressure gas conduit and a polishing liquid conduit. The pressure gas conduit is connected to the side wall of the first area to introduce gas into the first area, and a third gas sealing ring is installed between the pressure gas conduit and the electrode shell; the polishing liquid conduit is connected to the side wall of the second area to introduce polishing liquid into the second area.

[0011] As a preferred technical solution, a slide groove is provided on the side wall of the first region of the electrode housing, and the pressure plate and the slide groove form a moving pair.

[0012] As a preferred technical solution, one end of the negative electrode rod passing through the funnel-shaped cavity is spherical.

[0013] As a preferred technical solution, the diameter of the negative electrode rod is 1mm to 2mm, the distance between the negative electrode rod and the funnel electrode is 0.5mm to 1mm, and the length extending from the funnel electrode is half the diameter of the spherical surface at one end of the negative electrode rod.

[0014] As a preferred technical solution, the power supply provides a pulse voltage.

[0015] As an optimal technical solution, one end of the electrode housing where the funnel electrode is mounted is provided with a leakage plate, the middle of the leakage plate is provided with a through hole for the negative electrode rod to pass through, and the rest of the plate is provided with a hollow fan ring for the polishing liquid to flow into the funnel electrode.

[0016] As an optimal technical solution, the device further includes an upper fixing nut, a limiting sleeve and a lower fixing nut; the negative electrode rod is fixed to the mounting plate via the upper fixing nut and the limiting sleeve, and is fixed to the leakage plate via the lower fixing nut.

[0017] According to another aspect of the present invention, a polishing method using an electrorheological polishing device is provided, which specifically comprises the following steps:

[0018] Step S1, setting the polishing path and the on-off time of the power supply according to the shape of the workpiece surface to be polished and the polishing requirements;

[0019] Step S2: The polishing liquid is introduced into the second area of ​​the electrode housing, and the power is turned on. The polishing liquid forms a chain structure between the negative electrode rod and the funnel electrode.

[0020] Step S3: gas is introduced into the first area of ​​the electrode housing, and the pressure plate is pressed downward to polish the workpiece;

[0021] Step S4: the power is interrupted, and the polishing liquid returns to liquid state and flows away; it is determined whether the polishing is completed, if it is completed, the polishing is stopped, otherwise it returns to step S3.

[0022] Compared with the prior art, the present invention has the following beneficial effects:

[0023] 1) The polishing liquid in the second area of ​​the electrode housing is pressed down by the pressure plate, which increases the contact pressure, improves the shear strength of the chain structure, and improves the material removal efficiency; the polishing liquid can be quickly refreshed, and the processing stability is improved; the structure is simple and easy to operate;

[0024] 2) The positive electrode rod of the present invention is embedded in the funnel electrode, and the negative electrode rod passes through the funnel electrode with a certain gap between them, thereby achieving uniform distribution of the electric field during the processing and improving the quality of the polishing process and the surface finish;

[0025] 3) The present invention improves the efficiency and consistency of polishing processing, reduces processing costs, and provides a more economical and sustainable solution for industrial production; the present invention can be widely used in fields such as micromachining and optical component manufacturing, providing flexible and efficient solutions for the processing needs of different industries. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 This is a schematic structural diagram of the electrorheological polishing equipment of the present invention;

[0027] Figure 2 This is a partial enlarged view of the electrorheological polishing equipment of the present invention;

[0028] Figure 3 This is a cross-sectional view of the electrode housing of the present invention;

[0029] Figure 4 A top view of the electrode housing of the present invention;

[0030] Figure 5 The pulse voltage waveform diagram provided by the power supply of the present invention;

[0031] The numbers in the figure show:

[0032] 1. Mounting plate, 2. Connector, 3. Limit sleeve, 4. Upper fixing nut, 5. Negative electrode rod, 6. First gas sealing ring, 7. Second gas sealing ring, 8. Gasket, 9. Screw, 10. Pressure gas conduit, 11. Three gas sealing rings, 12. Polishing liquid conduit, 13. Lower fixing nut, 14. Funnel electrode, 15. Positive electrode rod, 16. Polishing liquid, 17. Pressure plate, 18. Power supply, 19. Electrode housing. DETAILED DESCRIPTION

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0034] Example 1

[0035] like Figure 1 As shown, the present invention provides an electrorheological polishing device, which is installed on the processing equipment and connected to the power supply 18, including a mounting plate 1, a connector 2, an upper fixing nut 4, a limiting sleeve 3, a negative electrode rod 5, a first gas sealing ring 6, a second gas sealing ring 7, a gasket 8, a screw 9, a pressure gas conduit 10, a third gas sealing ring 11, a polishing liquid conduit 12, a lower fixing nut 13, a funnel electrode 14, a positive electrode rod 15, polishing liquid 16, a pressure plate 17 and an electrode shell 19.

[0036] Mounting plate 1 is made of an insulating material, such as a transparent acrylic sheet. One side is provided with a sealing pipe screw (internal thread) that mates with the sealing pipe screw (external thread) at one end of electrode housing 19. The other side is secured to connector 2 via a gasket 8 and screw 9. Gasket 8 can be a flat gasket, and screw 9 can be a cross-recessed pan head screw. Mounting plate 1 has a through-hole for the negative electrode rod 5 to pass through.

[0037] The connector 2 is made of aluminum alloy and is connected to processing equipment (such as machine tools and robotic arms). A keyway can be designed on the connector 2, and a flat key can be used to connect to the processing equipment. The connector 2 is provided with a through hole for the negative electrode rod 5 to pass through.

[0038] The negative electrode rod 5 has threads at both ends. One end connects to the negative terminal of the power supply 18, while the other end passes through the connector 2, mounting plate 1, electrode housing 19, and funnel electrode 14. It is connected to the connector 2 via an upper fixing nut 4. A limiting sleeve 3 is sleeved on the negative electrode rod 5 between the upper fixing nut 4 and the connector 2. It is secured to the pressure plate 17 within the electrode housing 19 via a lower fixing nut 13. The lower end of the negative electrode rod 5 is spherical with a diameter of 1mm to 2mm. A diameter greater than 2mm results in a larger contact surface, affecting surface quality during polishing. The length of the negative electrode rod 5 extending beyond the lower funnel electrode 14 is 1 / 2 the diameter of the sphere. The diameter of the negative electrode rod 5 is 1mm to 2mm. A diameter less than 1mm is insufficiently rigid, making polishing difficult, while a diameter greater than 2mm is larger than the spherical diameter, making manufacturing difficult. The rod is made of a hard metal, and tungsten wire may be used.

[0039] The upper fixing nut 4 and the lower fixing nut 13 may be M5 hexagonal nuts.

[0040] The limiting sleeve 3 is made of hard rubber.

[0041] The first gas sealing ring 6 is installed between the electrode shell 19 and the mounting plate 1, the second gas sealing ring 7 is installed between the electrode shell 19 and the negative electrode rod 5, and the third gas sealing ring 11 is installed between the pressure gas conduit 10 and the electrode shell 19; the first gas sealing ring 6, the second gas sealing ring 7 and the third gas sealing ring 11 are made of elastic non-metallic material, and nitrile rubber can be selected to ensure good airtightness during installation.

[0042] The funnel electrode 14 is a cylinder with a funnel-shaped cavity inside and a sealing pipe thread (external thread) on the outer surface; the negative electrode rod 5 passes through the funnel-shaped cavity, and the distance between it and the funnel electrode 14 is 0.5mm to 1mm; one end of the positive electrode rod 15 is embedded in the funnel electrode 14.

[0043] One end of the positive electrode rod 15 is connected to the positive pole of the power supply 18 , and the other end is embedded in the funnel electrode 14 .

[0044] like Figure 5 As shown, the power supply 18 can provide a pulse voltage to make the electrorheological fluid solid during time t1 and liquid during time t2 within a cycle T.

[0045] like Figure 3 and Figure 4 As shown, the electrode shell 19 is cylindrical and is divided into a first area and a second area that are not connected to each other by a movable pressure plate 17. The first area is close to the mounting plate 1, and a slide groove is provided on the inner wall. A movable pair is formed between the pressure plate 17 and the slide groove; the side walls of the first area and the second area are respectively provided with holes, and the pressure gas conduit 10 is connected to the first area through the holes to pass the pressure gas into the first area. The pressure value of the gas in the first area must ensure that the chain structure formed by the polishing liquid 16 is not damaged; the polishing liquid conduit 12 is connected to the second area through the hole to pass the polishing liquid 16 into the second area. A groove is provided at one end of the first area close to the mounting plate 1 to facilitate the sealing of the first gas sealing ring 6. A sealing pipe thread (external thread) is provided at one end of the electrode shell 19 close to the mounting plate 1, which is threadedly connected to the mounting plate 1; a sealing pipe thread (internal thread) is provided at the other end to be threadedly connected to the funnel electrode 14. A leakage plate is provided at one end near the funnel electrode 14. A through hole is provided in the middle of the leakage plate for the negative electrode rod 5 to pass through. Hollow fan rings are provided at the rest of the position for the polishing liquid 16 to flow into the funnel electrode 14. The funnel electrode 14 is installed below the leakage plate.

[0046] Example 2

[0047] The present invention provides an electrorheological polishing method, which is as follows:

[0048] S1. Connect the negative electrode rod 5 to the negative pole of the pulse power supply 18 through a wire, and connect the positive electrode rod 15 to the positive pole of the pulse power supply 18 through a wire;

[0049] S2. Connect the polishing liquid conduit 12 to the liquid supply device, and connect the pressure gas conduit 10 to the gas supply device;

[0050] S3, according to the shape of the polishing surface and the polishing requirements, set the polishing path and the pulse current on and off time to t1 and t2 respectively;

[0051] S4, open the liquid supply device, the polishing liquid 16 fills the lower part of the pressure plate 17, open the air supply device, press the pressure plate 17 downward, so that the polishing liquid 16 can flow out of the funnel electrode 14 at a certain flow rate;

[0052] S5, turning on the pulse power supply 18, the polishing liquid 16 between the negative electrode rod 5 and the funnel electrode 14 flows, forming a chain structure;

[0053] S6. The entire device moves along a preset path, and the solidified polishing liquid 16 in a chain structure between the negative electrode rod 5 and the funnel electrode 14 polishes the portion in contact with the workpiece.

[0054] S7. As the pulse power supply 18 is disconnected, the chain structure is destroyed, and the polishing liquid 16 becomes a liquid state and continues to flow, taking away the chips generated by polishing, preventing the chips from staying on the surface and affecting the polishing effect.

[0055] S8. Repeat the changing process of S5-S7 with the periodic change of the pulse power supply 18 until the polishing is completed.

[0056] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art can easily conceive of various equivalent modifications or substitutions within the technical scope disclosed in the present invention, and such modifications or substitutions are intended to be within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be subject to the scope of protection of the claims.

Claims

1. An electrorheological polishing device, mounted on a processing device and connected to a power supply (18), characterized in that: The device comprises an electrode shell (19), a mounting plate (1), a pressure plate (17), a connector (2), a funnel electrode (14), a negative electrode rod (5) and a positive electrode rod (15); one end of the electrode shell (19) is mounted on one side of the mounting plate (1), and the interior is divided into a first area and a second area which are not connected to each other by a movable pressure plate (17), the first area is close to the mounting plate (1) and is fed with gas, and the second area is fed with polishing liquid (16); the other side of the mounting plate (1) is mounted on the processing equipment through the connector (2); the funnel electrode (14) is mounted on the end of the electrode shell (19) away from the mounting plate (1), and a funnel-shaped cavity is provided inside; one end of the negative electrode rod (5) is connected to the negative pole of the power supply (18), and the other end passes through the connector (2), the mounting plate (1), the electrode shell (19) and the funnel-shaped cavity, and does not contact the funnel electrode (14); one end of the positive electrode rod (15) is connected to the positive pole of the power supply (18), and the other end is embedded in the funnel electrode (14).

2. The electrorheological polishing device according to claim 1, characterized in that: A first gas sealing ring (6) is installed between the electrode shell (19) and the mounting plate (1), and a second gas sealing ring (7) is installed between the electrode shell (19) and the negative electrode rod (5); the electrode shell (19), the mounting plate (1) and the funnel electrode (14) are all connected via sealing pipe threads.

3. The electrorheological polishing device according to claim 1, characterized in that: The device also includes a pressure gas conduit (10) and a polishing liquid conduit (12). The pressure gas conduit (10) is connected to the side wall of the first area and gas is introduced into the first area. A third gas sealing ring (11) is installed between the pressure gas conduit (10) and the electrode shell (19); the polishing liquid conduit (12) is connected to the side wall of the second area and polishing liquid (16) is introduced into the second area.

4. The electrorheological polishing device according to claim 1, characterized in that: A sliding groove is provided on the side wall of the first region of the electrode housing (19), and the pressure plate (17) and the sliding groove form a moving pair.

5. The electrorheological polishing device according to claim 1, characterized in that: One end of the negative electrode rod (5) passing through the funnel-shaped cavity is a spherical surface.

6. The electrorheological polishing device according to claim 2, characterized in that: The negative electrode rod (5) has a diameter of 1mm to 2mm, a distance from the funnel electrode (14) of 0.5mm to 1mm, and a length extending from the funnel electrode (14) is half the diameter of the spherical surface of one end of the negative electrode rod (5).

7. The electrorheological polishing device according to claim 1, characterized in that: The power supply (18) provides a pulse voltage.

8. The electrorheological polishing device according to claim 1, characterized in that: A liquid leakage plate is provided at one end of the electrode housing (19) for mounting the funnel electrode (14). A through hole is provided in the middle of the liquid leakage plate for the negative electrode rod (5) to pass through, and hollow fan rings are provided at the remaining positions for the polishing liquid (16) to flow into the funnel electrode (14).

9. The electrorheological polishing device according to claim 1, characterized in that: The device also includes an upper fixing nut (4), a limiting sleeve (3) and a lower fixing nut (13); the negative electrode rod (5) is fixed to the mounting plate (1) via the upper fixing nut (4) and the limiting sleeve (3), and is fixed to the leakage plate via the lower fixing nut (13).

10. A polishing method using the electrorheological polishing device according to claim 1, characterized in that: The specific steps include: Step S1, setting the polishing path and the on-off time of the power supply (18) according to the shape of the surface to be polished of the workpiece and the polishing requirements; Step S2, the polishing liquid (16) is introduced into the second area of ​​the electrode housing (19), the power supply (18) is turned on, and the polishing liquid (16) forms a chain structure between the negative electrode rod (5) and the funnel electrode (14); Step S3, gas is introduced into the first area of ​​the electrode housing (19), and the pressure plate (17) is pressed downward to polish the workpiece; In step S4, the power supply (18) is interrupted, and the polishing liquid (16) returns to liquid state and flows away; it is determined whether the polishing is completed, and if it is completed, the polishing is stopped, otherwise it returns to step S3.

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