Epitaxial wafer performance testing device and testing method

CN118888467BActive Publication Date: 2024-12-10ZHEJIANG LISHUI XIN WAFER SEMICON TECH CO LTD
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Patent Information

Application Number
CN202411368668.1
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-09-29
Publication Date
2024-12-10
Estimated Expiration
2044-09-29

AI Technical Summary

Technical Problem

The existing epitaxial sheet testing system is difficult to ensure the accuracy of the detection position, especially when multiple detections are difficult to maintain the stability and accuracy of the detection position.

Method used

A performance testing device for epitaxial sheet is designed, including a fixing frame, a support platform, a support assembly, a positioning assembly and a detection assembly. The rotation angle of the clamping rod is controlled by a stepper motor, the clamping rod and the teeth of the driving ring are meshed, and the supporting disk is supported. The sliding and elastic role of the reset reed ensures the centered positioning and stable fixation of the sample to be inspected, and avoids poor contact of the probe through the design of the flexible section and the contact plate, and uses the driving motor and rubber ring to achieve accurate rotation of the sample to be inspected and fixed.

Benefits of technology

The position stability and fixing effect of the sample to be inspected is achieved, the probe contact is avoided, the accuracy and repetition of the test are improved, and the sample is removed and the next inspection preparation is facilitated.

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Abstract

The present invention discloses an epitaxial wafer performance testing device and a testing method, which relates to the field of epitaxial wafer testing technology, including a fixed frame and a sample to be tested, and also including a supporting platform, a supporting component, a positioning component and a detection component, wherein the detection component is placed above the sample to be tested. The present invention also discloses a testing method for an epitaxial wafer performance testing device, which includes the following steps: positioning, first detection, shifting, second detection, and unloading. The present invention sets a supporting component, and the supporting component cooperates with the positioning component to adjust the position of the sample to be tested, so that the sample to be tested can be accurately positioned during multiple tests, and at the same time, the damage caused by the movement of the sample to be tested can be reduced. The sample to be tested is tested by the set detection component, and the probe contact position is cleaned before the test, and the sample to be tested can also be assisted to be removed after the test is completed.
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Citation Information

Patent Citations

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  • Automatic wafer testing machine

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  • Probe performance test system and test method thereof

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