Inductively coupled coil, inductively coupled plasma source and plasma processing device

Abstract

The present application provides an inductively coupled coil, an inductively coupled plasma source and a plasma processing device, which are applied to the technical field of plasma equipment. The inductively coupled coil specifically comprises a hollow coil winding, in the inner cavity of the coil winding, a cooling core tube made of a flexible insulating material is arranged along a winding path, one end of the cooling core tube passes through the coil from the beginning of the coil winding to the outside, and the other end of the cooling core tube passes through the coil from the end of the coil winding to the outside, so as to connect the cooling core tube to an external cooling liquid circulation loop, wherein the inductively coupled plasma source comprises a base, a dielectric tube and the inductively coupled coil, and the plasma processing device comprises a reaction chamber, a wafer mounting table installed in the reaction chamber and the inductively coupled plasma source, and the arrangement of the cooling core tube can avoid the coil grounding caused by the cooling liquid, and at the same time avoid the cooling liquid from corroding the inner cavity of the coil.

Description

Technical Field

[0001] The present application relates to the technical field of plasma equipment, and in particular to an inductively coupled coil, an inductively coupled plasma source and a plasma processing device. Background Art

[0002] A plasma source refers to a device or apparatus that utilizes an electric field or a magnetic field to excite a process gas in a set reaction chamber to ionize it and thereby generate plasma. Since the process of gas ionization involves gas discharge and is accompanied by a certain amount of light energy radiation, the above-mentioned device or apparatus is also called a discharge tube or a discharge lamp.

[0003] Inductively coupled plasma source (ICP source for short) is a commonly used plasma source for dry etching and thin film deposition in the semiconductor field. The ICP source generates plasma by exciting gas with a high-frequency electromagnetic field generated by a high-frequency current passing through a coil. It can work at a lower chamber pressure and has the characteristics of high plasma density and less damage to the workpiece. When the ICP source structure is working, a large amount of heat will be generated on the RF induction coil. This heat generally needs to be dissipated to the outside through structures such as the side walls of the reaction chamber and the coil bracket. However, the existing coil bracket is generally made of resin material, which has poor thermal conductivity and temperature resistance. This will prevent the heat generated on the coil from being released in time, resulting in damage to components such as the coil and bracket. It will not only affect the vacuum of the device, but also cause changes in the plasma impedance, which will have a certain impact on the RF power input. Therefore, it is necessary to control the heat generated by the above-mentioned induction coil.

[0004] In view of this, there is a coil wound by a silver-plated copper tube in the prior art, and a water inlet and a water outlet are respectively arranged at both ends of the coil. When working, the coil is cooled and cooled individually by passing a circulating coolant into the coil, so as to achieve the technical purpose of controlling the heat generated by the coil. There are the following technical contradictions in the implementation stage of this scheme. On the one hand, for safety reasons, the circulating chiller generally needs to be grounded. If a conductive coolant such as water is used, when the coil is energized, a path will be formed between the coil, the coolant and the circulating chiller, causing the coil to be grounded, thereby causing the RF current to change and the amount of change is unknown. If the RF current decreases, the feed power will decrease, thereby affecting the generation of plasma, and even causing equipment failure in severe cases. On the other hand, the use of an insulating coolant with good thermal conductivity, such as a fluorinated liquid, can avoid the grounding of the coil, but it increases the cost of the coolant, and will cause serious corrosion in the coil cavity during long-term use. If a coil with an insulating coating on the inner cavity is used, the temperature of the coil winding changes greatly each time a high-frequency current is fed in, causing the coil to frequently expand and contract, which can easily cause the insulating coating to crack, which will not only contaminate the coolant, but also pose a risk of coil grounding.

[0005] Based on this, there is an urgent need to improve the cooling structure of the above-mentioned inductive coupling coil so that even if a conductive coolant is used, the coil will not be grounded, and the corrosion of the coolant to the coil winding can be avoided, thereby extending the service life of the coil winding. Summary of the invention

[0006] In view of this, an embodiment of the present specification first provides an inductive coupling coil, including a hollow coil winding, in which a cooling core tube made of flexible insulating material is arranged along the winding path in the inner cavity of the coil winding, one end of the cooling core tube passes through the coil from the beginning of the coil winding to the outside, and the other end passes through the coil from the end of the coil winding to the outside, so as to facilitate the connection of the cooling core tube to an external coolant circulation loop.

[0007] In order to optimize the above scheme, the following technical measures are also taken:

[0008] As a preferred embodiment, the cooling core tube is made of carbon fiber reinforced composite material CFRP.

[0009] As a preferred embodiment, the coil winding is made of a bare metal tube, and the cooling core tube is suitable for passing water or fluorinated liquid as a circulating coolant to cool the coil winding.

[0010] As a preferred embodiment, the cooling core tube is configured to be detachably assembled on the coil winding.

[0011] An embodiment of the present specification also provides an inductively coupled plasma source, comprising a base; a dielectric tube supported on the base and used to define a plasma chamber for generating plasma; the above-mentioned inductively coupled coil, wrapped around the outside of the dielectric tube, used to generate a magnetic field in the plasma chamber and excite process gas to generate plasma.

[0012] In order to optimize the above scheme, the following technical measures are also taken:

[0013] As a preferred embodiment, the inductive coupling coil includes an inner coil and an outer coil respectively controlled by independent power supplies.

[0014] As a preferred embodiment, it also includes a locking structure for locking the cooling core tube of the inductive coupling coil on the base.

[0015] As a preferred embodiment, the locking structure includes a clamping member installed on the base, and the cooling core tube is clamped and fixed on the base by the clamping member.

[0016] As a preferred embodiment, the invention further comprises a coil holder for holding the position of the inductive coupling coil.

[0017] As a preferred embodiment, the coil holding member comprises:

[0018] A plurality of first arms, each having a first positioning portion for positioning the outer coil;

[0019] A plurality of second arms, each having a second positioning portion for positioning the inner coil;

[0020] The plurality of first arms and second arms are all connected to the base and are evenly distributed at equal angles in the circumferential direction of the dielectric tube.

[0021] An embodiment of the present specification further provides a plasma processing device, comprising a reaction chamber, a wafer stage installed in the reaction chamber, and a plasma source installed on the upper part of the reaction chamber, wherein the plasma source is the above-mentioned inductively coupled plasma source, wherein the lower end of the dielectric tube of the inductively coupled plasma source is connected to the reaction chamber to supply plasma for wafer processing into the reaction chamber.

[0022] Compared with the prior art, the at least one technical solution adopted in the embodiments of this specification can achieve the following beneficial effects:

[0023] Firstly, by inserting a cooling core tube made of a flexible insulating material into the inner cavity of the coil winding along the winding path and introducing circulating coolant into the cooling core tube, the purpose of rapidly cooling the inductive coupling coil can be achieved. At the same time, the insulating cooling core tube body can isolate the coolant from the coil winding, thereby avoiding the occurrence of coil grounding caused by the coolant, and also preventing the coolant from corroding the inner cavity of the coil winding.

[0024] Furthermore, in this embodiment, since the cooling core tube is made of a flexible material that can bend and deform, it can compensate for the thermal expansion and contraction of the coil winding to a certain extent, thereby preventing the cooling core tube from cracking due to thermal stress concentration, thereby enhancing the safety and reliability of the coil cooling structure during operation.

[0025] Furthermore, in this embodiment, not only fluorinated liquid, mineral oil, etc. can be selected as the circulating coolant passed into the cooling core tube, but water can also be selected as the circulating coolant passed into the cooling core tube. This not only reduces the cooling cost of the coil, but also further expands the scope of application of the coil on the basis of ensuring the cooling efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0027] Figure 1 is a schematic diagram of the structure of the inductive coupling coil in the first embodiment of the present application (I);

[0028] Figure 2 is a structural schematic diagram (II) of the inductive coupling coil in the first embodiment of the present application;

[0029] Figure 3 is a schematic diagram of the three-dimensional structure of the inductively coupled plasma source in Example 2 of the present application (I);

[0030] Figure 4 is a schematic diagram of the three-dimensional structure of the inductively coupled plasma source in Example 2 of the present application (II);

[0031] Figure 5 It is a schematic diagram of the structure of some components in the second embodiment of the present application;

[0032] Figure 6 It is a schematic diagram of the cross-sectional structure of the plasma processing device in Example 3 of the present application.

[0033] Reference numerals:

[0034] 1. Base; 2. Dielectric tube; 3. Inductively coupled coil; 31. Winding section; 32. Lead-out section; 33. Conductive terminal; 35. Cooling core tube; 351. Rigid fixing bracket; 352. Clamp; 4. Reaction chamber; 51. Outer mounting ring; 52. Inner positioning block; 53. Inner mounting ring; 54. Second arm; 55. First arm; 56. Fixing pin; 57. Outer positioning block; 6. Wafer mounting table; 100. Inductively coupled plasma source; 301. Outer coil; 302. Inner coil. DETAILED DESCRIPTION

[0035] The embodiments of the present application are described in detail below with reference to the accompanying drawings.

[0036] The following describes the implementation methods of the present application through specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The present application can also be implemented or applied through other different specific implementation methods, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present application. It should be noted that, in the absence of conflict, the following embodiments and the features in the embodiments can be combined with each other. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work belong to the scope of protection of the present application.

[0037] It should be noted that various aspects of the embodiments within the scope of the appended claims are described below. It should be apparent that the aspects described herein can be embodied in a wide variety of forms, and any specific structure and / or function described herein is merely illustrative. Based on the present application, it should be understood by those skilled in the art that an aspect described herein can be implemented independently of any other aspect, and two or more of these aspects can be combined in various ways. For example, any number and aspect described herein can be used to implement the device and / or practice the method. In addition, other structures and / or functionalities other than one or more of the aspects described herein can be used to implement this device and / or practice this method.

[0038] It should also be noted that the illustrations provided in the following embodiments are only schematic illustrations of the basic concept of the present application. The drawings only show components related to the present application rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.

[0039] Embodiment 1:

[0040] The embodiments of this specification firstly propose an inductive coupling coil, which aims to solve the problem in the prior art that conductive coolant will cause the coil to be grounded, while insulating coolant with good thermal conductivity will cause the coil to corrode, which not only improves the cooling efficiency of the coil, thereby extending the service life of components such as the coil and the coil support, but also reduces the change of plasma impedance in the reaction chamber, so that the RF power can be stably fed in. It also further expands the application scope of the coil and improves the flexibility and reliability of the coil when working.

[0041] refer to Figure 1-2As shown, the inductive coupling coil 3 specifically includes a hollow coil winding, in which a cooling core tube 35 made of a flexible insulating material is arranged along the winding path in the inner cavity of the coil winding, one end of the cooling core tube 35 passes out of the coil from the beginning of the coil winding and the other end passes out of the coil from the end of the coil winding, so as to connect the cooling core tube 35 to the external coolant circulation loop. Here, Figure 1 The coil structure shown in FIG. is wound in a planar spiral shape. Figure 2 The coil structure shown in FIG. 1 is wound in a three-dimensional spiral shape. The embodiment does not limit the specific form of the coil winding structure.

[0042] Among them, the coil winding can be made of a bare metal tube such as a copper tube, an aluminum tube, or a metal tube with an outer coating such as a silver-plated copper tube, or a stainless steel tube. In short, any metal tube that is not coated with an insulating coating in the inner cavity is included in the category of the bare metal tube.

[0043] Among them, the cooling core tube 35 can be made of carbon fiber reinforced composite material (CFRP). This insulating material not only has the advantages of small thermal expansion coefficient, large thermal conductivity, corrosion resistance, etc., but also has fiber-like flexibility and can be woven and wound. Therefore, the cooling core tube 35 can be freely meandered along the winding path when assembled on the coil winding, thereby improving the convenience and flexibility of the assembly process. As an extension, the cooling core tube 35 can be processed into different cross-sectional shapes such as rectangle, triangle, circle, and ellipse using the bending technology of CFRP materials. Similarly, the cross-sectional shape of the coil winding can also be processed into different cross-sectional shapes such as rectangle, triangle, circle, and ellipse according to requirements. Distilled water or tap water can be passed into the cooling core tube 35 as a coolant, and fluorinated liquid or mineral oil can also be passed into the cooling core tube 35 as a coolant according to requirements.

[0044] By introducing circulating coolant into the cooling core tube 35, the purpose of rapidly cooling the inductive coupling coil 3 can be achieved. At the same time, the insulated cooling core tube 35 can isolate the coolant from the coil winding, thereby avoiding the occurrence of coil grounding caused by the coolant, and also preventing the coolant from corroding the inner cavity of the coil winding, thereby improving the safety and reliability of the coil during operation. In addition, since the cooling core tube 35 is made of a flexible material that can be flexibly deformed, it can absorb or bridge the thermal expansion and contraction of the coil winding to a certain extent, thereby preventing the cracking of the cooling core tube caused by the concentration of thermal stress, causing the coolant to leak to the outside of the cooling core tube 35, thereby causing the risk of coil grounding. Therefore, the safety and reliability of the coil cooling structure during operation are further enhanced.

[0045] In this embodiment, the coil winding includes a winding section 31 and a lead-out section 32 formed by leading outwards from both ends of the winding section 31, and the outer end of each lead-out section 32 is provided with a conductive terminal 33, and the cooling core tube 35 includes an inner core section embedded in the inner cavity of the coil winding and a protruding section extending outwards from both ends of the inner core section and exposed to the outside of the coil winding. Here, the protruding section is the portion of the cooling core tube 35 that protrudes outwards from the circumference of the coil winding along the winding diameter direction. As a variation, the protruding section can also be the portion of the cooling core tube 35 that protrudes outwards from the end of the coil winding along the winding length direction. Furthermore, both ends of the coil winding are provided with openings for the cooling core tube 35 to pass through.

[0046] When the inductive coupling coil 3 is working, the conductive terminal 33 is first connected to the high-frequency power supply, and at the same time, one of the outlet sections of the cooling core tube 35 is connected to the output port of the external circulation cooling device (chiller), and the other outlet section is connected to the input port of the external circulation cooling device, thereby forming a coolant circulation loop. Then the high-frequency power supply is energized, and at the same time, the coolant is controlled to quickly cool the coil winding, thereby ensuring the reliability of the coil working process.

[0047] In this embodiment, the cooling core tube 35 can be fixed on the coil winding by bonding or welding. In order to facilitate subsequent maintenance and replacement, the cooling core tube 35 can also be detachably assembled on the coil winding. There are many detachable connection structures. For example, the outer side of the coil winding is provided with a clamping hole, and the protruding section of the cooling core tube 35 passes through the corresponding clamping hole and is clamped and fixed. For another example, a stop buckle is respectively installed on the two protruding sections of the cooling core tube 35, and the stop buckle is limited in the length direction by the two ends of the coil winding, so that the cooling core tube 35 is kept on the coil winding.

[0048] Embodiment 2:

[0049] refer to Figures 3 to 4 As shown, this embodiment provides an inductively coupled plasma source 100, which specifically includes a base 1, a dielectric tube 2 supported on the base 1, and the above-mentioned inductively coupled coil 3, wherein the dielectric tube 2 is used to define a plasma chamber for generating plasma, and the inductively coupled coil 3 is wrapped around the outside of the dielectric tube, and is used to generate a magnetic field in the plasma chamber and excite the process gas to generate plasma. When the inductively coupled plasma source 100 is working, the conductive terminal 33 of the inductively coupled coil 3 is externally connected to a high-frequency power supply, and the cooling core tube is connected to an external circulating cooling device (chiller), and a high-frequency magnetic field is generated by the high-frequency current passing through the inductively coupled coil 3, thereby exciting the process gas in the plasma chamber and generating plasma.

[0050] In this embodiment, the inductive coupling coil 3 includes an inner coil 302 and an outer coil 301 which are controlled by independent power supplies. When working, both the inner coil 302 and the outer coil 301 are fed with high-frequency current, and the temperature generated on the coil surface can be calculated by the following formula:

[0051] T = (I 2 R t) / (KA)

[0052] Among them, T represents the temperature of the coil, I represents the current of the coil, R represents the resistance of the coil, t represents the power-on time of the coil, K represents the thermal conductivity of the coil, and A represents the surface area of ​​the coil.

[0053] The coil resistance is calculated as follows:

[0054] R = (ρ×L) / a

[0055] Where R is the coil resistance, ρ is the wire resistivity, L is the coil length, and a is the coil cross-sectional area.

[0056] In this embodiment, two shorter coils are used instead of one longer coil, and the required high-frequency current is fed. According to the above formula, it can be concluded that the heat is proportional to the coil length. Under the condition of a certain current, the heat generated by the single shorter coil used in combination in this embodiment is less than the heat generated by the longer coil when used alone. Therefore, the service life of a single coil can be effectively increased.

[0057] refer to Figure 5 As shown, in this embodiment, a locking structure for locking the cooling core tube 35 of the inductive coupling coil 3 on the base is also included. Specifically, the locking structure includes a rigid fixing bracket 351 installed on the base 1 and a clamp 352 connected to the rigid fixing bracket 351, wherein the rigid fixing bracket 351 is locked on the base by a threaded fastener, the clamp 352 is in an "Ω" shape as a whole, and an arc-shaped clamp groove is provided on the clamp 352, and at least a part of the cooling core tube 35 passing through the section is clamped and fixed in the clamp groove. The setting of the locking structure can not only ensure the stability of the cooling core tube 35 when docking with the external circulation cooling device, but also prevent the cooling core tube 35 from retracting into the inner cavity of the coil winding during operation, thereby causing greater vibration when the coil is working.

[0058] refer to Figure 4, showing the situation where the inner coil 302 and the outer coil 301 are arranged in a plane. Specifically, the dielectric tube 2 is cylindrical, and the inner coil 302 and the outer coil 301 both adopt a planar winding structure, and the inner coil 302 and the outer coil 301 are both arranged at the same height of the dielectric tube 2. Here, both coils are arranged at a gap set above the base 1. The planar arrangement of the inner and outer coils makes the plasma density generated by the excitation of the coil in the plasma chamber unevenly distributed, which is specifically manifested as a large density in the center and a small density at the edge. In order to enable the plasma to diffuse quickly in the cavity, the gas pressure in the chamber is required to be relatively high, and generally 1-10mTorr is more suitable for application.

[0059] refer to Figure 3 , showing the situation where the inner coil 302 and the outer coil 301 are arranged in a three-dimensional shape. Specifically, the dielectric tube 2 is constructed in a cone shape with a diameter gradually decreasing toward the end away from the base. The inner coil 302 is a three-dimensional spiral structure, such as a conical spiral adapted to the shape of the dielectric tube 2 as shown in the figure. In other ways, a columnar spiral structure can also be used, and there is no limitation to this. The inner coil 302 is wrapped around the upper part of the dielectric tube 2, and the outer coil 301 adopts a planar winding structure and is wrapped around the lower part of the dielectric tube 2. The three-dimensional arrangement of the inner and outer coils makes the magnetic field generated by the planar outer coil 301 greater than the magnetic field generated by the three-dimensional inner coil 302, thereby making the density distribution of the plasma in the plasma chamber more uniform, so that the gas pressure requirement in the chamber is relatively small, and it can be competent for occasions where the gas pressure is below 1mTorr. However, the structure of the three-dimensional coil is relatively complex, and the manufacturing and installation difficulties are relatively large, so the equipment cost is increased. The technicians can make their own choices according to the process requirements and manufacturing requirements.

[0060] In this embodiment, a coil holder for holding the position of the inductive coupling coil 3 is also included. Specifically, the coil holder includes: a plurality of first arms 55 and a plurality of second arms 54, the first arms 55 have a first positioning portion for positioning the outer layer coil 301, and the second arms 54 have a second positioning portion for positioning the inner layer coil 302, wherein the plurality of first arms 55 and the second arms 54 are both joined to the base 1 and are evenly distributed at equal angles in the circumferential direction of the dielectric tube 2.

[0061] For the inner coil 302 and the outer coil 301 arranged in a three-dimensional shape, in order to enable the coil to be stably maintained in the designed position, the coil retaining member specifically includes an outer mounting ring 51 and an inner mounting ring 53 which are coaxially arranged with the dielectric tube 2, wherein the outer mounting ring 51 is fixed on the base 1 and surrounds the outer side of the lower end of the dielectric tube 2, and a plurality of first arms 55 are radially distributed along the outer circumference of the outer mounting ring 51, and the first positioning portion includes an outer positioning block 57 arranged at the lower part of each first arm 55, and the outer positioning block 57 is provided with a first positioning hole, and the coil winding of the outer coil 301 passes through the first positioning hole and is retained in the positioning hole. The inner mounting ring 53 surrounds the outer side of the upper end of the dielectric tube 2. A plurality of downwardly inclined second arms 54 are evenly arranged at equal angles on the outer circumference of the inner mounting ring 53. The lower end of each second arm 54 is fixedly connected to the corresponding first arm 55. The second positioning portion includes a plurality of U-shaped limiting grooves evenly arranged on each second arm 54 along the length direction. Each limiting groove can support one of the coil layers of the inner coil 302 arranged at intervals in the height direction, thereby limiting the position of the coil winding in the height direction. The outer mounting ring 51 is also provided with a plurality of inner layer positioning blocks 52. Each inner layer positioning block 52 has a second positioning hole. The lower end coil layer of the inner layer coil 302 passes through the second positioning hole and is retained in the positioning hole, thereby limiting the position of the inner layer coil 302 in the horizontal direction. The plurality of inner layer positioning blocks 52 are evenly distributed at equal angles along the outer circumference of the outer mounting ring 51, and the plurality of inner layer positioning blocks 52 and the plurality of first arms 55 are cross-arranged along the circumference of the outer mounting ring 51.

[0062] By setting the second arm 54 with multiple limiting grooves and multiple inner positioning blocks 52, the position of the inner coil 302 relative to the dielectric tube 2 can be locked, that is, it can be kept at the designed position. By setting the first arm 55 with multiple outer positioning blocks 57, the position of the outer coil 301 relative to the dielectric tube 2 can be locked. By locking the installation position of the coil, the thermal expansion and contraction deformation of the coil when working at high temperature can be suppressed, thereby improving the stability of the coil coupling process and improving the stability and uniformity of the plasma generation process. By setting the inner mounting ring 53, the outer mounting ring 51, the first arm 55 and the second arm 54, the coaxiality between the coil and the dielectric tube 2 after installation can be guaranteed, so that the inner and outer combined coils can generate a uniformly distributed magnetic field in the plasma chamber, thereby making the plasma density distribution more uniform. Preferably, the base 1 is disc-shaped, one end of the first arm 55 is fixed on the outer mounting ring 51, and the other end is connected to the base 1 through a fixing pin 56.

[0063] For the inner coil 302 and the outer coil 301 arranged in a plane, in order to ensure that the coils can be stably maintained at the designed positions, such as Figure 4 As shown, a plurality of first arms 55 are radially distributed on the base 1, and the first positioning portion includes an outer positioning block 57 arranged at the bottom of the first arm 55, and the coil winding of the outer coil 301 passes through the first positioning hole and is retained in the positioning hole. A plurality of first connecting seats are evenly arranged at equal angles on the outer periphery of the disc-shaped base, and one end of the first arm 55 is inserted and fixed on the corresponding first connecting seat through a fixing pin 56, and the other end is fixed on the end surface of the base 1. An inner mounting ring 53 is also arranged in the center of the base 1, and the inner mounting ring 53 surrounds the outer side of the dielectric tube 2 in a coaxial manner. A plurality of second arms 54 are integrally processed and formed with the inner mounting ring 53, and a plurality of second arms 54 are radially distributed on the outer periphery of the inner mounting ring 53, and the second positioning portion includes an inner positioning block 52 arranged at the lower part of the second arm 54, and the inner positioning block 52 is provided with a third positioning hole, and the coil winding of the inner coil 302 passes through the third positioning hole and is retained in the positioning hole. By utilizing the arrangement and cooperation of the first support arm 55 and the second support arm 54 , the coil on the plane can be positioned.

[0064] Preferably, a positioning pin is provided at the lower outer end of the second arm 54, and a plurality of second connecting seats are evenly spaced at equal angles on the outer circumference of the base 1, and the positioning pin of each second arm 54 is inserted and fixed on the corresponding second connecting seat.

[0065] Preferably, the coil holding member is made of resin material.

[0066] Embodiment three:

[0067] refer to Figure 6 As shown, this embodiment provides a plasma processing device, including a reaction chamber 4, a wafer stage 6 installed in the reaction chamber 4, and a plasma source installed on the reaction chamber, wherein the plasma source is the inductively coupled plasma source 100 in the above-mentioned embodiment 2, wherein the lower end of the dielectric tube 2 of the inductively coupled plasma source is connected to the reaction chamber 4 so as to be able to supply plasma for wafer processing into the reaction chamber 4.

[0068] Here, the base 1 of the inductively coupled plasma source 100 may be disposed on an upper cover plate of the reaction chamber 4, or the base 1 may be integrally covered on the reaction chamber 4 in the form of a cover plate, which is not limited here.

[0069] It should be noted that the inductively coupled plasma source 100 in this embodiment can be used not only in the above-mentioned plasma processing device, but also in, for example, an ICP mass spectrometer, a spectrometer, and a thin film deposition device, without limitation herein.

[0070] In the above embodiment, by introducing circulating coolant into the cooling core tube 35 on the inductive coupling coil 3, the purpose of quickly cooling the inductive coupling coil 3 can be achieved. At the same time, the tube body of the insulating cooling core tube 35 can isolate the coolant from the coil winding, thereby avoiding the coil grounding caused by the coolant, and also preventing the coolant from corroding the inner cavity of the coil winding, thereby improving the safety and reliability of the coil during operation.

[0071] In addition, since the cooling core tube 35 is made of a flexible material that can be flexibly deformed, it can absorb or bridge the thermal expansion and contraction of the coil winding to a certain extent, thereby preventing the cooling core tube from cracking due to thermal stress concentration, causing the coolant to leak to the outside of the cooling core tube 35, thereby causing the risk of the coil being grounded. Therefore, the safety and reliability of the coil cooling structure during operation are further enhanced.

[0072] In this specification, the same or similar parts between the various embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the embodiments described later, the description is relatively simple, and the relevant parts can be referred to the partial description of the previous embodiments.

[0073] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application shall be based on the protection scope of the claims.

Claims

1. An inductively coupled coil, comprising a hollow coil winding, characterized in that: A cooling core tube made of a flexible insulating material that can be flexibly deformed is arranged along the winding path in the inner cavity of the coil winding. The flexible insulating material is a carbon fiber reinforced composite material CFRP. When assembled on the coil winding, the cooling core tube can freely meander along the winding path, with one end passing through the coil from the beginning of the coil winding and the other end passing through the coil from the end of the coil winding, so as to connect the cooling core tube to an external coolant circulation circuit. The cooling core tube is also configured to be detachably assembled on the coil winding.

2. The inductive coupling coil according to claim 1, characterized in that: The coil winding is made of a bare metal tube, and water or fluorinated liquid is suitable for passing into the cooling core tube as a circulating coolant to cool the coil winding.

3. An inductively coupled plasma source, characterized in that: include: Base; a dielectric tube supported on the base and used to define a plasma chamber for generating plasma; The inductively coupled coil according to any one of claims 1 to 2, wrapped around the outside of the dielectric tube, is used to generate a magnetic field in a plasma chamber and excite a process gas to generate plasma.

4. The inductively coupled plasma source according to claim 3, characterized in that: The inductive coupling coil comprises an inner coil and an outer coil which are respectively controlled by independent power supplies.

5. The inductively coupled plasma source according to claim 3 or 4, characterized in that: The invention also comprises a locking structure for locking the cooling core tube of the inductive coupling coil on the base.

6. The inductively coupled plasma source according to claim 5, characterized in that The locking structure comprises a clamping member installed on the base, through which the cooling core tube is clamped and fixed on the base.

7. The inductively coupled plasma source according to claim 4, characterized in that: Also included is a coil holder for holding the position of the inductive coupling coil.

8. The inductively coupled plasma source according to claim 7, characterized in that: The coil holder comprises: A plurality of first arms, each having a first positioning portion for positioning the outer coil; A plurality of second arms, each having a second positioning portion for positioning the inner coil; The plurality of first arms and second arms are all connected to the base and are evenly distributed at equal angles in the circumferential direction of the dielectric tube.

9. A plasma processing device, comprising a reaction chamber, a wafer stage installed in the reaction chamber, and a plasma source installed on the upper part of the reaction chamber, characterized in that: The plasma source is an inductively coupled plasma source as claimed in any one of claims 3 to 8, wherein a lower end of a dielectric tube of the inductively coupled plasma source is connected to a reaction chamber to supply plasma for wafer processing into the reaction chamber.

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