Display device including window body and method of manufacturing window body

Abstract

The invention discloses a display device including a window and a method of manufacturing the window, the display device including: a substrate including a bending area, a boundary area adjacent to the bending area in one direction, and a non-bending area adjacent to the boundary area in one direction; and a window body disposed on the substrate. The window body includes: a base substrate having a thickness in a bending region thinner than a thickness in a non-bending region, and including a first surface having an inclination of 0.1 DEG to 0.9 DEG with respect to the bending region in a boundary region; and a coating layer disposed on a second surface of the base substrate facing the first surface.

Description

Technical Field

[0001] The invention relates to a display device comprising a window and a method for manufacturing the window. Background Art

[0002] Recently, flexible display devices that can be deformed in various forms are being developed. Unlike flat display devices, flexible display devices can be folded, bent, or rolled like paper. Flexible display devices are easy to carry and can improve user convenience.

[0003] A flexible display device may include a display panel having a flexible characteristic and a window for protecting the display panel. The flexible display device requires a window for protecting the display panel from external influences while not hindering the folding, bending or rolling operation of the display device. Summary of the invention

[0004] An object of the present invention is to provide a display device including a window with improved reliability.

[0005] Another object of the present invention is to provide a method for manufacturing the window.

[0006] However, the purpose of the present invention is not limited to the above-mentioned purpose, and various extensions can be made without departing from the concept and scope of the present invention.

[0007] In order to achieve the aforementioned one purpose of the present invention, a display device according to an embodiment of the present invention may include: a substrate including a curved region, a boundary region adjacent to the curved region in one direction; and a non-curved region adjacent to the boundary region in the one direction; and a window disposed on the substrate. The window may include: a base substrate having a thickness thinner in the curved region than in the non-curved region, and including a first surface having an inclination of about 0.1° to about 0.9° relative to the curved region in the boundary region; and a coating disposed on a second surface of the base substrate facing the first surface.

[0008] In one embodiment, the width of the border area of ​​the window may be about 1 mm to about 20 mm.

[0009] In one embodiment, in the curved region and the boundary region, a corner of at least one of the first surface and the second surface of the base substrate may have a chamfered shape.

[0010] In one embodiment, the slope of the first surface of the base substrate may be constant in the boundary region.

[0011] In one embodiment, the slope of the first surface of the base substrate may change at least once in the boundary region.

[0012] In one embodiment, the boundary region may include: a first region adjacent to the curved region; a second region adjacent to the non-curved region; and a third region located between the first region and the second region. The slope of the third region of the base substrate may be greater than the slopes of each of the first region and the second region of the base substrate.

[0013] In one embodiment, the width of the third area of ​​the window may be greater than the sum of the width of the first area of ​​the window and the width of the second area of ​​the window.

[0014] In order to achieve another object of the present invention as mentioned above, the method for manufacturing a window according to one embodiment of the present invention includes: a step of immersing the curved area and the border area of ​​a base substrate including a curved area, a border area adjacent to the curved area in one direction, and a non-curved area adjacent to the border area in the one direction in an etching liquid; and a step of extracting the base substrate from the etching liquid in a manner that the first surface of the base substrate has a slope in the border area.

[0015] In one embodiment, the step of extracting the base substrate may include the step of forming a chamfered shape at a corner of at least one of the first surface and a second surface facing the first surface in the curved region and the boundary region.

[0016] In one embodiment, the first surface may be formed in the boundary region to have the slope of about 0.1° to about 0.9° with respect to the bending region.

[0017] In one embodiment, the width of the border area may be about 1 mm to about 20 mm.

[0018] In one embodiment, in the step of extracting the base substrate, a speed of extracting the boundary region of the base substrate from the etching liquid may be constant.

[0019] In one embodiment, in the step of extracting the base substrate, the speed of extracting the boundary area of ​​the base substrate from the etching liquid is changed at least once.

[0020] In one embodiment, the boundary region may include: a first region adjacent to the curved region; a second region adjacent to the non-curved region; and a third region located between the first region and the second region. The slope of the third region may be formed to be greater than the slope of each of the first region and the second region.

[0021] In one embodiment, the width of the third region may be greater than the sum of the width of the first region and the width of the second region.

[0022] In one embodiment, the step of extracting the base substrate may include the step of discharging or flowing the etching solution.

[0023] In one embodiment, in the step of immersing the curved region and the boundary region of the base substrate in the etching solution, the base substrate may be immersed at an angle.

[0024] In one embodiment, the method for manufacturing the window may further include a step of forming a coating on a second surface of the base substrate facing the first surface before the step of immersing the curved area and the boundary area of ​​the base substrate in the etching solution.

[0025] In one embodiment, the method for manufacturing the window may further include a step of forming an inorganic layer between the second surface and the coating layer before the step of immersing the curved region and the boundary region of the base substrate in the etching solution.

[0026] In one embodiment, the method for manufacturing the window may further include a step of immersing the curved region, the boundary region, and the non-curved region of the base substrate in the etching solution for recovery.

[0027] The display device according to an embodiment of the present invention may include a window having a slope in a border region. The window may have a relatively small slope in the border region, so that the step between the thickness in the curved region and the thickness in the non-curved region is not recognized. Therefore, the impact resistance of the display device can be improved and the repulsive force can be reduced, thereby improving the durability of the display device. In addition, the window can be formed so that a part of the window is immersed in an etching liquid, and the speed of extracting the window from the etching liquid is adjusted. Therefore, the manufacturing process of the window can be simplified, thereby improving the efficiency of the process.

[0028] However, the effects of the present invention are not limited to the aforementioned effects, and various extensions can be made within the scope of the concept and field of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 as well as Figure 2 is a perspective view showing a display device according to an embodiment of the present invention.

[0030] Figure 3 It is shown Figure 1 A cross-sectional view of a display device.

[0031] Figure 4 It is intercepted along the line I-I' and includes Figure 1 A cross-sectional view of a window in a display device.

[0032] Figure 5 It is intercepted along the II-II' line, the III-III' line and the IV-IV' line. Figure 1 A cross-sectional view of a window in a display device.

[0033] Figures 6 to 10 It shows the manufacturing Figure 4 FIG. 1 is a diagram of an embodiment of a method of a form.

[0034] Figures 11 to 14 It shows the manufacturing Figure 4 FIG. 1 is a diagram of another embodiment of a method of the form.

[0035] Figures 15 to 19 It shows the manufacturing Figure 4 FIG. 1 is a diagram of yet another embodiment of a method of a form.

[0036] Fig. 20 is a cross-sectional view showing a display device according to another embodiment of the present invention.

[0037] Fig.21 It is shown that the Fig. 20 A cross-sectional view of a window in a display device.

[0038] Fig. 22 Is magnification Fig.21 Cross-sectional view of region A.

[0039] Figure 23 to Figure 26 It shows the manufacturing Fig.21 FIG. 1 is a diagram of an embodiment of a method of a form.

[0040] Fig. 27 is a cross-sectional view showing a display device according to still another embodiment of the present invention.

[0041] Fig.28 as well as Fig.29 It is shown that the Fig. 27 A cross-sectional view of a window in a display device.

[0042] Figures 30 to 38 It shows the manufacturing Fig. 27 FIG. 1 is a diagram of an embodiment of a method of a form.

[0043] Fig.39 is a cross-sectional view showing a display device according to still another embodiment of the present invention.

[0044] Fig.40 It is shown that the Fig.39 A cross-sectional view of a window in a display device.

[0045] (Explanation of Reference Numerals)

[0046] 10, 20, 30, 40: Display device

[0047] BA: Bend Area

[0048] SA: Border Area

[0049] NBA: Non-bend zone

[0050] WD: Form

[0051] BS: Base substrate

[0052] CL: coating

[0053] S1, S2: first and second sides

[0054] ET:etching liquid

[0055] A1, A2, A3: First to third areas

[0056] IL: Inorganic Layer DETAILED DESCRIPTION

[0057] Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. The same reference numerals are used for the same components in the drawings, and repeated descriptions of the same components are omitted.

[0058] Figure 1 as well as Figure 2 is a perspective view showing a display device according to an embodiment of the present invention. For example, it may be, Figure 1 is a perspective view showing the display device 10 in an unfolded state, Figure 2 1 is a perspective view showing a state where the display device 10 is bent.

[0059] Reference Figure 1 as well as Figure 2 , the display device 10 may include a display area DA and a non-display area NDA.

[0060] The display area DA may be an area capable of generating light to display an image. A plurality of pixels that emit light may be configured in the display area DA, whereby the image may be displayed in the display area DA. The pixels may be arranged in a matrix along a first direction D1 and a second direction D2 that intersects the first direction D1. For example, the second direction D2 may be perpendicular to the first direction D1. At this time, in the display area DA, the image may be displayed in a third direction D3 that is perpendicular to each of the first direction D1 and the second direction D2.

[0061] The non-display area NDA may be an area where no image is displayed. The non-display area NDA may surround at least a portion of the display area DA. For example, the non-display area NDA may surround the display area DA as a whole.

[0062] The display device 10 may be a flexible display device. The display device 10 may include a bending area BA and a non-bending area NBA. The bending area BA and the non-bending area NBA may be separated from each other. In addition, the display device 10 may include a boundary area SA between the bending area BA and the non-bending area NBA. In other words, the boundary area SA may be adjacent to the bending area BA in the first direction D1, and the non-bending area NBA may be adjacent to the boundary area SA in the first direction D1.

[0063] The curved area BA may be a curved area of ​​the display device 10, and the non-curved area NBA may be a non-curved area of ​​the display device 10. The curved area BA may be curved to have a curvature. The boundary area SA may be a curved area of ​​the display device 10, or may be a non-curved area.

[0064] exist Figure 1 as well as Figure 2 In the figure, the display device 10 is shown to include one bending area BA and bend once, but the present invention is not limited thereto. For example, the display device 10 may also include more than two bending areas BA and be bent more than twice.

[0065] In addition, Figure 1 as well as Figure 2 In the figure, the display device 10 is shown to be bent in the first direction D1, but the present invention is not limited thereto. For example, the display device 10 may also be bent in the second direction D2.

[0066] Figure 3 It is shown Figure 1 A cross-sectional view of a display device.

[0067] Reference Figure 3, the display device 10 may include a substrate SUB, a display portion DP, an overcoat layer OC, and a window WD.

[0068] The substrate SUB may include a transparent material or an opaque material. Examples of materials that can be used as the substrate SUB include polyimide, quartz, glass, etc. These materials may be used alone or in combination with each other.

[0069] The display portion DP may be disposed on the substrate SUB. The display portion DP may include the pixels to display the image. That is, the display portion DP may emit light to an upper surface (ie, the third direction D3) separated from the substrate SUB to display the image.

[0070] The overcoat layer OC may be disposed on the display portion DP. The overcoat layer OC may allow the window WD to be bound to the display portion DP without a gap. The refractive index of the overcoat layer OC may be similar to or the same as the refractive index of the window WD. The overcoat layer OC may include an organic insulating material. Examples of organic insulating materials that can be used as the overcoat layer OC include photoresist, polyacrylic resin, polyimide resin, acrylic resin, etc. They may be used alone or in combination with each other.

[0071] The window WD may be disposed on the overcoat layer OC. The window WD may cut off foreign matter that penetrates from the outside and prevent an impact applied from the outside from being transmitted to a structure disposed below the window WD.

[0072] In one embodiment, a functional coating may be further disposed between the outer coating OC and the window WD. The functional coating may be formed as a single layer or multiple layers. The functional coating may include an optical coating for improving the visibility of the display device 10, a primer coating for improving the adhesion between the outer coating OC and the window WD, a high-strength coating for improving the impact resistance of the display device 10, and the like.

[0073] Figure 4 It is intercepted along the line I-I' and includes Figure 1 A cross-sectional view of a window in a display device. Figure 5 It is intercepted along the II-II' line, the III-III' line and the IV-IV' line. Figure 1 A cross-sectional view of a window in a display device.

[0074] Reference Figure 4 as well as Figure 5 , the window body WD may include a base substrate BS and a coating layer CL.

[0075] The base substrate BS may include a first surface S1 and a second surface S2 facing the first surface S1. For example, the first surface S1 may be the bottom surface of the base substrate BS, and the second surface S2 may be the top surface of the base substrate BS. In one embodiment, the first surface S1 may have a step, and the second surface S2 may be substantially flat.

[0076] In one embodiment, in the bending area BA, the thickness TH1 of the base substrate BS may be thinner than the thickness TH2 of the base substrate BS in the non-bending area NBA.

[0077] In one embodiment, the width W of the boundary area SA of the base substrate BS may be about 1 mm to about 20 mm. In addition, the first surface S1 of the base substrate BS may have a slope θ in the boundary area SA. For example, the first surface S1 of the base substrate BS has a slope θ of about 0.1° to about 0.9° relative to the bending area BA in the boundary area SA. In one embodiment, the slope θ may be constant.

[0078] In one embodiment, in the bending area BA and the boundary area SA, corners of the first surface S1 of the base substrate BS may have a chamfered shape.

[0079] That is, in the bending area BA, the thickness TH3 of the corner of the base substrate BS may be thinner than or the same as the thickness TH1 of the base substrate BS. For example, in the bending area BA, the thickness TH3 of the corner of the base substrate BS may be about 60% to about 100% of the thickness TH1 of the base substrate BS.

[0080] In addition, in the boundary area SA, the thickness TH4 of the corner of the base substrate BS may be thinner than or the same as the thickness TH5 of the base substrate BS. For example, in the boundary area SA, the thickness TH4 of the corner of the base substrate BS may be about 60% to about 100% of the thickness TH5 of the base substrate BS.

[0081] The coating layer CL may be disposed on the base substrate BS. Specifically, the coating layer CL may be disposed on the second surface S2 of the base substrate BS. For example, the coating layer CL may include a polymer film.

[0082] Figures 6 to 10 It shows the manufacturing Figure 4 FIG. 1 is a diagram of an embodiment of a method of a form.

[0083] Reference Figure 6The coating layer CL may be formed on the second surface S2 of the base substrate BS. Therefore, the window WD including the base substrate BS and the coating layer CL may be formed.

[0084] Reference Figure 7 as well as Figure 8 The window WD may be immersed in the etching solution ET contained in the inner space of the chamber CB. The chamber CB may define a space for performing a process of etching the window WD.

[0085] In one embodiment, only a portion of the window WD may be immersed in the etching solution ET. For example, the curved area BA and the boundary area SA of the window WD may be immersed in the etching solution ET, and the non-curved area NBA of the window WD may not be immersed in the etching solution ET.

[0086] As the window WD is immersed in the etching solution ET, micro cracks existing on the surfaces of the curved area BA and the boundary area SA of the window WD can be removed, thereby improving the strength of the curved area BA and the boundary area SA of the window WD.

[0087] In one embodiment, the window WD may be dipped in the etching solution ET at an angle. That is, the angle formed by the etching solution ET and the window WD may be less than about 90°. When the window WD is dipped at an angle, the wettability between the window WD and the etching solution ET may become relatively large. Therefore, the time for etching the curved area BA and the boundary area SA of the window WD may be saved.

[0088] Reference Figures 8 to 10 , the window WD can be extracted from the etching liquid ET. For example, the window WD can be extracted from the etching liquid ET by moving in the first direction D1.

[0089] In one embodiment, the speed of extracting the boundary area SA of the window WD from the etching liquid ET may be adjusted. For example, the boundary area SA of the window WD may be extracted at a constant speed. Therefore, the first surface S1 of the base substrate BS may have the slope θ in the boundary area SA.

[0090] In addition, the corners of the first surface S1 of the base substrate BS immersed in the etching solution ET can be formed into a chamfered shape. That is, the corners of the first surface S1 of the curved area BA and the boundary area SA of the base substrate BS are etched to have a chamfered shape. Therefore, the window WD having a step on the first surface S1 of the base substrate BS can be manufactured.

[0091] Figures 11 to 14 It shows the manufacturing Figure 4 FIG. 1 is a diagram of another embodiment of a method of the form.

[0092] However, referring to Figures 11 to 14 The method for manufacturing the window WD described in the following description can be the same as that described in the reference except for the method for extracting the window WD from the etching solution ET. Figures 6 to 10 The method for manufacturing the window WD described above is substantially the same. Hereinafter, repeated descriptions are omitted or simplified.

[0093] Reference Fig.11 as well as Fig.12 , the curved area BA and the boundary area SA of the window WD may be immersed in the etching solution ET, and the non-curved area NBA of the window WD may not be immersed in the etching solution ET.

[0094] Reference Figure 12 to Figure 14 , the etching liquid ET is discharged from the chamber CB, so that the window WD can be extracted from the etching liquid ET.

[0095] In one embodiment, the speed at which the etching liquid ET is discharged can be adjusted while the etching liquid ET passes through the boundary area SA of the window WD. For example, the etching liquid ET can be discharged at a constant speed so that the first surface S1 of the base substrate BS has the slope θ in the boundary area SA. Therefore, the window WD having a step on the first surface S1 of the base substrate BS can be manufactured.

[0096] Figures 15 to 19 It shows the manufacturing Figure 4 FIG. 1 is a diagram of yet another embodiment of a method of a form.

[0097] However, referring to Figures 15 to 19 The method for manufacturing the window WD described in the following description may be the same as that described in reference to the method for extracting the window WD from the etching solution ET. Figures 6 to 10 The method for manufacturing the window WD described above is substantially the same. Hereinafter, repeated descriptions are omitted or simplified.

[0098] Reference Fig.15 as well as Fig.16, it may be that at least a portion of the curved area BA and the boundary area SA of the window WD are immersed in the etching liquid ET, and the non-curved area NBA of the window WD is not immersed in the etching liquid ET. For example, at least a portion of the curved area BA of the window WD is immersed in the etching liquid ET, and the boundary area SA and the non-curved area NBA of the window WD are not immersed in the etching liquid ET, but the present invention is not limited to this. As another example, it may be that the curved area BA and a portion of the boundary area SA of the window WD are immersed in the etching liquid ET, and another portion of the boundary area SA of the window WD and the non-curved area NBA are not immersed in the etching liquid ET.

[0099] Reference Figures 16 to 19 The etching liquid ET may flow into the chamber CB. That is, the etching liquid ET flows into the curved area BA and the boundary area SA of the window WD so as to be immersed in the etching liquid ET.

[0100] In one embodiment, the etching liquid ET may flow in at a speed that is adjusted while the etching liquid ET passes through the boundary area SA of the window WD. For example, the etching liquid ET may flow in at a constant speed so that the first surface S1 of the base substrate BS has the slope θ in the boundary area SA.

[0101] Then, the window WD may be extracted from the etching liquid ET. For example, the window WD may be moved from the etching liquid ET toward the first direction D1. Therefore, the window WD having a step on the first surface S1 of the base substrate BS may be manufactured.

[0102] The display device 10 according to an embodiment of the present invention may include the window WD having the slope θ in the boundary area SA. The window WD has a relatively small slope θ in the boundary area SA, and therefore, a step between the thickness TH1 in the curved area BA and the thickness TH2 in the non-curved area NBA is not recognized. Therefore, the impact resistance of the display device 10 is improved and the repulsive force is reduced, thereby improving the durability of the display device 10. In addition, the window WD may be formed such that a part of the window WD is immersed in the etching liquid ET, and the speed of extracting the window WD from the etching liquid ET is adjusted. Therefore, the manufacturing process of the window WD can be simplified, thereby improving the efficiency of the process.

[0103] Fig. 20 is a cross-sectional view showing a display device according to another embodiment of the present invention. Fig.21 It is shown that the Fig. 20A cross-sectional view of a window in a display device. Fig. 22 Is magnification Fig.21 A cross-sectional view of region A. For example, it can be, Fig. 20 and Figure 3 Corresponding to the cross-sectional view, Fig.21 and Figure 4 corresponds to the cross-sectional view of .

[0104] Below, omitted or simplified with reference Figures 1 to 5 The form WD described above is repeated.

[0105] Reference Fig. 20 The display device 20 may include the substrate SUB, the display portion DP, the overcoat layer OC, and the window WD. The display device 20 may include the bending area BA, the boundary area SA, and the non-bending area NBA.

[0106] Reference Fig.21 as well as Fig. 22 The window WD may include a base substrate BS and a coating layer CL. The base substrate BS may include a first surface S1 and a second surface S2 facing the first surface S1. In an embodiment, the first surface S1 may have a step, and the second surface S2 may be substantially flat.

[0107] In one embodiment, the thickness TH1 of the base substrate BS in the bending area BA may be thinner than the thickness TH2 of the base substrate BS in the non-bending area NBA. In addition, the width W of the boundary area SA of the base substrate BS may be about 1 mm to about 20 mm.

[0108] The first surface S1 of the base substrate BS may have a slope in the boundary area SA. For example, the first surface S1 of the base substrate BS may have a slope of about 0.1° to about 0.9° relative to the bending area BA in the boundary area SA. In one embodiment, the slope may be changed at least once. For example, the slope may be changed twice.

[0109] In one embodiment, the boundary area SA may include a first area A1, a second area A2, and a third area A3. For example, the first area A1 may be an area adjacent to the bending area BA, the second area A2 may be an area adjacent to the non-bending area NBA, and the third area A3 may be an area between the first area A1 and the second area A2. That is, the third area A3 may be adjacent to the first area A1 in the first direction D1, and the second area A2 may be adjacent to the third area A3 in the first direction D1.

[0110] The first surface S1 may have a first slope θ1 with respect to the bending area BA in the first area A1, a second slope θ2 with respect to the bending area BA in the second area A2, and a third slope θ3 with respect to the bending area BA in the third area A3.

[0111] In one embodiment, the third slope θ3 may be greater than each of the first slope θ1 and the second slope θ2. For example, the first slope θ1 and the second slope θ2 may be different from each other. For another example, the first slope θ1 and the second slope θ2 may be the same as each other. Each of the first slope θ1, the second slope θ2 and the third slope θ3 may be about 0.1° to about 0.9°.

[0112] As the third slope θ3 is greater than each of the first slope θ1 and the second slope θ2, the step of the thickness TH1 of the base substrate BS in the bending area BA and the thickness TH2 of the base substrate BS in the non-bending area NBA is relatively not recognized. However, the present invention is not limited thereto. For example, the third slope θ3 may also be smaller than the first slope θ1 or the second slope θ2.

[0113] The width W3 of the third area A3 of the base substrate BS is greater than the sum of the width W1 of the first area A1 of the base substrate BS and the width W2 of the second area A2 of the base substrate BS. For example, the width W1 of the first area A1 of the base substrate BS and the width W2 of the second area A2 of the base substrate BS may be different from each other. For another example, the width W1 of the first area A1 of the base substrate BS and the width W2 of the second area A2 of the base substrate BS may be the same as each other.

[0114] exist Fig.21 as well as Fig. 22 In the figure, it is shown and described that the first surface S1 has a cross-sectional shape whose slope changes twice in the boundary area SA, but the present invention is not limited thereto. For example, the boundary area SA of the first surface S1 of the base substrate BS may have a cross-sectional shape whose slope changes n times (however, n is a natural number), a cross-sectional shape of an exponential function, etc.

[0115] Figure 23 to Figure 26 It shows the manufacturing Fig.21 FIG. 1 is a diagram of an embodiment of a method of a form.

[0116] Below, omitted or simplified with reference Figures 6 to 19 The method of manufacturing the window WD described above will be described repeatedly.

[0117] Reference Fig.23 as well as Fig.24 , the curved area BA and the boundary area SA of the window WD may be immersed in the etching solution ET, and the non-curved area NBA of the window WD may not be immersed in the etching solution ET.

[0118] Reference Figure 24 to Figure 26 , the form WD can be extracted from the etching solution ET.

[0119] For example, the window WD may be extracted by moving the etching liquid ET toward the first direction D1. In another example, the etching liquid ET may be discharged from the chamber CB, thereby extracting the window WD. In yet another example, the etching liquid ET may flow into the chamber CB, thereby extracting the window WD.

[0120] In one embodiment, the speed of extracting the boundary area SA of the window WD from the etching liquid ET may be adjusted. For example, the speed of extracting the boundary area SA of the window WD may be changed at least once. Therefore, the first surface S1 of the base substrate BS may have the slope that changes at least once in the boundary area SA.

[0121] For example, the speed of extracting the boundary area SA of the window WD may be changed twice. Therefore, the window WD in which the first surface S1 of the base substrate BS has the slopes θ1, θ2, and θ3 that are changed twice in the boundary area SA may be manufactured.

[0122] Fig. 27 is a cross-sectional view showing a display device according to still another embodiment of the present invention. Fig.28 as well as Fig.29 It is shown that the Fig. 27 A cross-sectional view of a window in a display device. For example, it may be, Fig. 27 and Figure 3 Corresponding to the cross-sectional view, Fig.28 and Figure 4 Corresponding to the cross-sectional view, Fig.29 and Figure 5 corresponds to the cross-sectional view of .

[0123] Below, omitted or simplified with reference Figures 1 to 5 The form WD described above is repeated.

[0124] Reference Fig. 27The display device 30 may include the substrate SUB, the display part DP, the overcoat layer OC, and the window WD. The display device 30 may include the bending area BA, the boundary area SA, and the non-bending area NBA.

[0125] Reference Fig.28 as well as Fig.29 The window body WD may include a base substrate BS and a coating layer CL. The base substrate BS may include a first surface S1 and a second surface S2 facing the first surface S1.

[0126] In one embodiment, a thickness TH1 of the base substrate BS in the bending area BA may be thinner than a thickness TH2 of the base substrate BS in the non-bending area NBA.

[0127] In one embodiment, the width W of the boundary area SA of the base substrate BS may be about 1 mm to about 20 mm. In addition, the first surface S1 of the base substrate BS may have a slope θ in the boundary area SA. For example, the first surface S1 of the base substrate BS may have a slope θ of about 0.1° to about 0.9° relative to the bending area BA in the boundary area SA. The slope θ may be constant or changed at least once.

[0128] In one embodiment, the corners of each of the first surface S1 and the second surface S2 of the base substrate BS in the bending area BA and the boundary area SA may have a chamfered shape. For example, the chamfered shapes of the corners of the first surface S1 and the second surface S2 may be asymmetric. For another example, the chamfered shapes of the corners of the first surface S1 and the second surface S2 may also be symmetric.

[0129] Figures 30 to 38 It shows the manufacturing Fig. 27 FIG. 1 is a diagram of an embodiment of a method of a form.

[0130] Below, omitted or simplified with reference Figures 6 to 19 The method of manufacturing the window WD described above will be described repeatedly.

[0131] Reference Fig.30 , an inorganic layer IL may be formed on the second surface S2 of the base substrate BS. The coating layer CL may be formed on the inorganic layer IL. The etching rate of the inorganic layer IL with respect to the etching liquid ET may be higher than the etching rate of the base substrate BS with respect to the etching liquid ET. Therefore, the window WD including the base substrate BS and the coating layer CL may be formed.

[0132] Reference Figure 31 to Figure 33 , the curved area BA and the boundary area SA of the window WD may be immersed in the etching solution ET, and the non-curved area NBA of the window WD may not be immersed in the etching solution ET.

[0133] Then, the window WD may be extracted from the etching liquid ET. For example, the window WD may be moved from the etching liquid ET toward the first direction D1, thereby extracting the window WD. For another example, the etching liquid ET may be discharged from the chamber CB, thereby extracting the window WD. For another example, the etching liquid ET may flow into the chamber CB, thereby extracting the window WD.

[0134] In one embodiment, the speed of extracting the boundary area SA of the window WD from the etching liquid ET may be adjusted. The speed of extracting the window WD may be constant, or may be changed at least once.

[0135] As the etching rate of the inorganic layer IL to the etching liquid ET is relatively high, the inorganic layer IL is etched, so that at least a portion of the second surface S2 of the base substrate BS can be etched. Therefore, the corners of each of the first surface S1 and the second surface S2 of the base substrate BS immersed in the etching liquid ET can be formed into a chamfered shape. That is, in the curved area BA and the boundary area SA, the corners of each of the first surface S1 and the second surface S2 of the base substrate BS can be etched to have a chamfered shape.

[0136] In one embodiment, the amount of the corners of the first surface S1 etched may be greater than the amount of the corners of the second surface S2 etched. However, the present invention is not limited thereto. For example, the amount of the corners of the first surface S1 etched and the amount of the corners of the second surface S2 etched may also be the same.

[0137] Reference Figures 35 to 38 , the window WD may be immersed in the etching solution ET again for recovery. At this time, the bending area BA, the boundary area SA and the non-bending area NBA of the window WD may be immersed in the etching solution ET as a whole.

[0138] As the window WD is restored, microcracks existing on the surface of the non-bending area NBA of the window WD can be removed, and the strength of the non-bending area NBA of the window WD can be improved. In addition, as the etching rate of the inorganic layer IL with respect to the etching solution ET is relatively high, the inorganic layer IL can be removed.

[0139] Therefore, the window WD having the chamfered shape of each of the corners of the first surface S1 and the second surface S2 of the bending area BA and the boundary area SA of the base substrate BS may be manufactured.

[0140] Fig.39 is a cross-sectional view showing a display device according to still another embodiment of the present invention. Fig.40 It is shown that the Fig.39 A cross-sectional view of a window in a display device. For example, Fig.39 Can be used with Figure 4 corresponds to the cross-sectional view of .

[0141] Below, omitted or simplified with reference Figures 1 to 5 The form WD described above is repeated.

[0142] Reference Fig.39 The display device 40 may include the substrate SUB, the display part DP, the overcoat layer OC, and the window WD. The display device 40 may include the bending area BA, the boundary area SA, and the non-bending area NBA.

[0143] Reference Fig.40 The window WD may include a base substrate BS and a coating layer CL. The base substrate BS may include a first surface S1 and a second surface S2 facing the first surface S1. In an embodiment, the first surface S1 may have a step, and the second surface S2 may be substantially flat.

[0144] In one embodiment, the thickness in the bending area BA of the base substrate BS may be thinner than the thickness in the non-bending area NBA of the base substrate BS. In addition, the width W of the boundary area SA of the base substrate BS may be about 1 mm to about 20 mm.

[0145] In one embodiment, the bending area BA may include a first bending area BA1, a second bending area BA2, and a third bending area BA3. The first to third bending areas BA1, BA2, and BA3 may be arranged along the first direction D1. The thickness of the base substrate BS in the first bending area BA1 may be thinner than the thickness of the base substrate BS in the third bending area BA3. The first surface S1 of the base substrate BS may have a slope in the second bending area BA2.

[0146] As the first surface S1 has the slope in the bending area BA, the thickness of the area where the bending starts can be relatively thin. That is, the thickness of the first bending area BA1 is relatively thin, so the repulsive force generated when the window WD is bent can be reduced.

[0147] exist Fig.40 In the embodiment, it is shown and described that the curved area BA has one slope, but the present invention is not limited thereto. For example, the curved area BA may also have more than two slopes.

[0148] In one embodiment, the first surface S1 of the base substrate BS may have a slope θ in the boundary area SA. For example, the first surface S1 of the base substrate BS may have a slope θ of about 0.1° to about 0.9° relative to the third bending area BA3 in the boundary area SA. The slope θ may be constant or changed at least once.

[0149] The present invention can be applied to display devices and electronic devices including the same. For example, the present invention can be applied to high-resolution smartphones, mobile phones, smart pads, smart watches, tablet PCs, car navigation systems, televisions, computer monitors, notebook computers, etc.

[0150] Although the present invention has been described above with reference to the exemplary embodiments, it will be apparent to those skilled in the art that various modifications and changes may be made to the present invention without departing from the concept and scope of the present invention as described in the appended claims.

Claims

1. A display device, It is characterized in that include: A substrate, comprising a curved region, a boundary region adjacent to the curved region in one direction, and a non-curved region adjacent to the boundary region in the one direction; as well as a window, arranged on the substrate, the window comprising: a base substrate having a thickness in the curved region thinner than that in the non-curved region, and comprising a first surface having a slope of 0.1° to 0.9° relative to the curved region in the boundary region; and a coating layer disposed on a second surface of the base substrate facing the first surface.

2. The display device according to claim 1, It is characterized in that The width of the border area of ​​the window is 1 mm to 20 mm.

3. The display device according to claim 1, It is characterized in that In the curved region and the boundary region, a corner of at least one of the first surface and the second surface of the base substrate has a chamfered shape.

4. The display device according to claim 1, It is characterized in that In the boundary region, the slope of the first surface of the base substrate is constant.

5. The display device according to claim 1, It is characterized in that In the boundary region, the slope of the first surface of the base substrate changes at least once.

6. The display device according to claim 5, It is characterized in that The boundary area includes: a first region, adjacent to the curved region; a second region adjacent to the non-bending region; and a third region, located between the first region and the second region, The slope of the third region of the base substrate is greater than the slopes of each of the first region and the second region of the base substrate.

7. The display device according to claim 6, It is characterized in that The width of the third area of ​​the window is greater than the sum of the width of the first area of ​​the window and the width of the second area of ​​the window.

8. A method for manufacturing a window, It is characterized in that include: The step of immersing the curved region and the boundary region of a base substrate including a curved region, a boundary region adjacent to the curved region in one direction, and a non-curved region adjacent to the boundary region in the one direction in an etching solution; as well as A step of extracting the base substrate from the etching liquid in such a manner that the first surface of the base substrate has a slope in the boundary region.

9. The method for manufacturing a window according to claim 8, It is characterized in that The step of extracting the base substrate comprises: A step of forming a chamfered corner of at least one of the first surface and a second surface facing the first surface in the curved region and the boundary region.

10. The method for manufacturing a window according to claim 8, It is characterized in that The first surface is formed in the boundary region to have the slope of 0.1° to 0.9° with respect to the bending region.

11. The method for manufacturing a window according to claim 8, It is characterized in that The width of the boundary area is formed to be 1 mm to 20 mm.

12. The method for manufacturing a window according to claim 8, It is characterized in that In the step of extracting the base substrate, The speed at which the boundary region of the base substrate is extracted from the etching liquid is constant.

13. The method for manufacturing a window according to claim 8, It is characterized in that In the step of extracting the base substrate, A speed at which the boundary region of the base substrate is extracted from the etching liquid is changed at least once.

14. The method for manufacturing a window according to claim 13, It is characterized in that The boundary area includes: a first region, adjacent to the curved region; a second region adjacent to the non-bending region; and a third region, located between the first region and the second region, The slope of the third region is formed to be greater than the slopes of each of the first region and the second region.

15. The method for manufacturing a window according to claim 14, It is characterized in that The width of the third region is formed to be larger than the sum of the width of the first region and the width of the second region.

16. The method for manufacturing a window according to claim 8, It is characterized in that The step of extracting the base substrate includes the step of discharging or flowing the etching solution.

17. The method for manufacturing a window according to claim 8, It is characterized in that In the step of immersing the curved region and the boundary region of the base substrate in the etching solution, The base substrate is dipped at an angle.

18. The method for manufacturing a window according to claim 8, It is characterized in that The method for manufacturing the window includes, before the step of immersing the curved region and the boundary region of the base substrate in the etching solution, The method also includes forming a coating layer on a second surface of the base substrate that faces the first surface.

19. The method for manufacturing a window according to claim 18, It is characterized in that The method for manufacturing the window includes, before the step of immersing the curved region and the boundary region of the base substrate in the etching solution, The method further includes forming an inorganic layer between the second surface and the coating layer.

20. The method for manufacturing a window according to claim 8, It is characterized in that The method for manufacturing the window further includes the step of immersing the curved region, the boundary region, and the non-curved region of the base substrate in the etching solution for recovery.

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