Stratum resistivity detection method and device, electronic equipment and medium

Abstract

The invention relates to the technical field of formation information processing, and provides a formation resistivity detection method and device, electronic equipment and a medium. The method comprises the following steps: generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target stratum and a contrast stratum; generating a target envelope area based on the target voltage curve; and generating the resistivity of the target stratum based on a preset resistivity calculation model and the target envelope area. According to the embodiment of the invention, the calculated data volume can be greatly improved, and the detection precision of the target resistivity is greatly improved.

Description

Technical Field

[0001] The present disclosure relates to the technical field of formation information processing, and in particular to a formation resistivity detection method, device, electronic equipment and medium. Background Art

[0002] With the rapid development of exploration technology, more and more methods have been developed to obtain various data of the formation. Transient electromagnetic method is one of the methods used to measure the resistivity of the formation outside the casing in steel cased wells. The transient electromagnetic method uses a transmitting coil to transmit a pulse magnetic field. During the interval of a pulse magnetic field, the receiving coil is used to observe the secondary eddy current field and record the time-based change characteristics of the secondary field voltage signal, thereby extracting the electrical information of the surrounding medium and finally obtaining the formation resistivity.

[0003] When the instrument adopts a single-transmit and single-receive coil system mode, the received voltage curve is a comprehensive response of multiple media around the well, and they overlap in time, and it is impossible to use a delay method to distinguish different media. When a single-transmit and dual-receive coil system mode is adopted, the casing medium signal can be effectively eliminated after the receiving signal undergoes an addition circuit operation, and the instrument records the pure formation signal for later resistivity acquisition. When logging in a steel-cased well, the existing technology usually takes a real-time voltage value at fixed intervals (such as 1 millisecond) during the data processing process, and performs subsequent calculations. Since the voltage value of a single time channel is used, the data used for calculation is relatively small, resulting in low detection accuracy of the target formation resistivity. Summary of the invention

[0004] In view of this, the embodiments of the present disclosure provide a formation resistivity detection method, device, electronic device and medium to solve the problem in the prior art that the detection accuracy of the target formation resistivity is low due to less data used for calculation.

[0005] A first aspect of an embodiment of the present disclosure provides a formation resistivity detection method, comprising:

[0006] Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated;

[0007] Based on the target voltage curve, a target envelope area is generated;

[0008] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0009] In some embodiments, generating a target envelope area based on a target voltage curve includes:

[0010] Normalizing the target voltage curve to obtain a normalized voltage curve;

[0011] Based on a preset time division index, the normalized voltage curve is divided into a plurality of sub-curves with equal time differences, wherein the time difference is equal to the time division index;

[0012] Generate multiple sub-curve areas based on the first voltage data and the time cutting index of each sub-curve;

[0013] A target envelope area is generated based on multiple sub-curve areas.

[0014] In some embodiments, normalizing the target voltage curve to obtain a normalized voltage curve includes:

[0015] Obtaining transmitting current data, transmitting coil area and transmitting coil turns of the magnetic field transmitting device;

[0016] A normalized voltage curve is generated based on the transmission current data, the transmission coil area, the number of turns of the transmission coil, and each voltage data of the target voltage curve.

[0017] In some embodiments, generating the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area includes:

[0018] Generate a contrast area difference based on a preset contrast envelope area and a target envelope area;

[0019] The contrast area difference is introduced into the resistivity calculation model to obtain the target resistivity difference;

[0020] Based on the target resistivity difference and the comparative resistivity, a target resistivity is obtained.

[0021] In some embodiments, the step of determining the calculation parameters of the resistivity calculation model includes:

[0022] The resistivity of the test formation is set to a plurality of random initial resistivities, and a plurality of test resistivity difference values ​​are obtained based on each initial resistivity and the comparative formation resistivity;

[0023] Acquire multiple test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity;

[0024] Based on the test voltage signal, generating a plurality of test voltage curves;

[0025] Based on the test voltage curve, multiple test envelope areas are generated;

[0026] Based on each test envelope area and the comparison envelope area, a plurality of test envelope area differences are obtained;

[0027] A plurality of envelope area differences are introduced into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model.

[0028] In some embodiments, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0029] Acquire the voltage signal between the target formation and the comparison formation;

[0030] Purifying the voltage signal to obtain a pure voltage signal;

[0031] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0032] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0033] In some embodiments, the step of acquiring the signal interception time interval includes:

[0034] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0035] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0036] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0037] A signal capture time interval is generated based on the first time point and the second time point.

[0038] A second aspect of the embodiments of the present disclosure provides a formation resistivity detection device, comprising:

[0039] A first generating module is configured to generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation;

[0040] A second generating module is configured to generate a target envelope area based on the target voltage curve;

[0041] The third generating module is configured to generate the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area.

[0042] In some embodiments, generating a target envelope area based on a target voltage curve includes:

[0043] Normalizing the target voltage curve to obtain a normalized voltage curve;

[0044] Based on a preset time division index, the normalized voltage curve is divided into a plurality of sub-curves with equal time differences, wherein the time difference is equal to the time division index;

[0045] Generate multiple sub-curve areas based on the first voltage data and the time cutting index of each sub-curve;

[0046] A target envelope area is generated based on multiple sub-curve areas.

[0047] In some embodiments, normalizing the target voltage curve to obtain a normalized voltage curve includes:

[0048] Obtaining transmitting current data, transmitting coil area and transmitting coil turns of the magnetic field transmitting device;

[0049] A normalized voltage curve is generated based on the transmission current data, the transmission coil area, the number of turns of the transmission coil, and each voltage data of the target voltage curve.

[0050] In some embodiments, generating the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area includes:

[0051] Generate a contrast area difference based on a preset contrast envelope area and a target envelope area;

[0052] The contrast area difference is introduced into the resistivity calculation model to obtain the target resistivity difference;

[0053] Based on the target resistivity difference and the comparative resistivity, a target resistivity is obtained.

[0054] In some embodiments, the step of determining the calculation parameters of the resistivity calculation model includes:

[0055] The resistivity of the test formation is set to a plurality of random initial resistivities, and a plurality of test resistivity difference values ​​are obtained based on each initial resistivity and the comparative formation resistivity;

[0056] Acquire multiple test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity;

[0057] Based on the test voltage signal, generating a plurality of test voltage curves;

[0058] Based on the test voltage curve, multiple test envelope areas are generated;

[0059] Based on each test envelope area and the comparison envelope area, a plurality of test envelope area differences are obtained;

[0060] A plurality of envelope area differences are introduced into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model.

[0061] In some embodiments, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0062] Acquire the voltage signal between the target formation and the comparison formation;

[0063] Purifying the voltage signal to obtain a pure voltage signal;

[0064] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0065] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0066] In some embodiments, the step of acquiring the signal interception time interval includes:

[0067] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0068] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0069] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0070] A signal capture time interval is generated based on the first time point and the second time point.

[0071] According to a third aspect of the embodiments of the present disclosure, an electronic device is provided, including a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the steps implemented when the processor executes the computer program include:

[0072] Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated;

[0073] Based on the target voltage curve, a target envelope area is generated;

[0074] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0075] In some embodiments, generating a target envelope area based on a target voltage curve includes:

[0076] Normalizing the target voltage curve to obtain a normalized voltage curve;

[0077] Based on a preset time division index, the normalized voltage curve is divided into a plurality of sub-curves with equal time differences, wherein the time difference is equal to the time division index;

[0078] Generate multiple sub-curve areas based on the first voltage data and the time cutting index of each sub-curve;

[0079] A target envelope area is generated based on multiple sub-curve areas.

[0080] In some embodiments, normalizing the target voltage curve to obtain a normalized voltage curve includes:

[0081] Obtaining transmitting current data, transmitting coil area and transmitting coil turns of the magnetic field transmitting device;

[0082] A normalized voltage curve is generated based on the transmission current data, the transmission coil area, the number of turns of the transmission coil, and each voltage data of the target voltage curve.

[0083] In some embodiments, generating the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area includes:

[0084] Generate a contrast area difference based on a preset contrast envelope area and a target envelope area;

[0085] The contrast area difference is introduced into the resistivity calculation model to obtain the target resistivity difference;

[0086] Based on the target resistivity difference and the comparative resistivity, a target resistivity is obtained.

[0087] In some embodiments, the step of determining the calculation parameters of the resistivity calculation model includes:

[0088] The resistivity of the test formation is set to a plurality of random initial resistivities, and a plurality of test resistivity difference values ​​are obtained based on each initial resistivity and the comparative formation resistivity;

[0089] Acquire multiple test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity;

[0090] Based on the test voltage signal, generating a plurality of test voltage curves;

[0091] Based on the test voltage curve, multiple test envelope areas are generated;

[0092] Based on each test envelope area and the comparison envelope area, a plurality of test envelope area differences are obtained;

[0093] A plurality of envelope area differences are introduced into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model.

[0094] In some embodiments, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0095] Acquire the voltage signal between the target formation and the comparison formation;

[0096] Purifying the voltage signal to obtain a pure voltage signal;

[0097] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0098] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0099] In some embodiments, the step of acquiring the signal interception time interval includes:

[0100] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0101] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0102] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0103] A signal capture time interval is generated based on the first time point and the second time point.

[0104] In a fourth aspect of the embodiments of the present disclosure, a computer-readable storage medium is provided, wherein the computer-readable storage medium stores a computer program, and the steps implemented when the computer program is executed by a processor include:

[0105] Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated;

[0106] Based on the target voltage curve, a target envelope area is generated;

[0107] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0108] In some embodiments, generating a target envelope area based on a target voltage curve includes:

[0109] Normalizing the target voltage curve to obtain a normalized voltage curve;

[0110] Based on a preset time division index, the normalized voltage curve is divided into a plurality of sub-curves with equal time differences, wherein the time difference is equal to the time division index;

[0111] Generate multiple sub-curve areas based on the first voltage data and the time cutting index of each sub-curve;

[0112] A target envelope area is generated based on multiple sub-curve areas.

[0113] In some embodiments, normalizing the target voltage curve to obtain a normalized voltage curve includes:

[0114] Obtaining transmitting current data, transmitting coil area and transmitting coil turns of the magnetic field transmitting device;

[0115] A normalized voltage curve is generated based on the transmission current data, the transmission coil area, the number of turns of the transmission coil, and each voltage data of the target voltage curve.

[0116] In some embodiments, generating the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area includes:

[0117] Generate a contrast area difference based on a preset contrast envelope area and a target envelope area;

[0118] The contrast area difference is introduced into the resistivity calculation model to obtain the target resistivity difference;

[0119] Based on the target resistivity difference and the comparative resistivity, a target resistivity is obtained.

[0120] In some embodiments, the step of determining the calculation parameters of the resistivity calculation model includes:

[0121] The resistivity of the test formation is set to a plurality of random initial resistivities, and a plurality of test resistivity difference values ​​are obtained based on each initial resistivity and the comparative formation resistivity;

[0122] Acquire multiple test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity;

[0123] Based on the test voltage signal, generating a plurality of test voltage curves;

[0124] Based on the test voltage curve, multiple test envelope areas are generated;

[0125] Based on each test envelope area and the comparison envelope area, a plurality of test envelope area differences are obtained;

[0126] A plurality of envelope area differences are introduced into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model.

[0127] In some embodiments, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0128] Acquire the voltage signal between the target formation and the comparison formation;

[0129] Purifying the voltage signal to obtain a pure voltage signal;

[0130] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0131] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0132] In some embodiments, the step of acquiring the signal interception time interval includes:

[0133] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0134] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0135] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0136] A signal capture time interval is generated based on the first time point and the second time point.

[0137] Beneficial Effects

[0138] Compared with the prior art, the embodiments of the present disclosure have at least the following beneficial effects: by generating a target voltage curve based on a time-voltage coordinate system, a target envelope area is generated, and based on a preset resistivity calculation model, a comparison envelope area generated by a comparison voltage curve, and the target envelope area, a target resistivity is generated. By comparing the envelope area, the amount of calculated data can be greatly increased, thereby greatly improving the detection accuracy of the target resistivity. BRIEF DESCRIPTION OF THE DRAWINGS

[0139] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only for the embodiments, and ordinary technicians in this field can obtain other drawings based on these drawings without paying any creative work.

[0140] Figure 1 is a schematic diagram of an application scenario of the formation resistivity detection method provided according to an embodiment of the present disclosure;

[0141] Figure 2 is a flow chart of a second embodiment of a formation resistivity detection method provided according to an embodiment of the present disclosure;

[0142] Figure 3 is a flow chart of Embodiment 3 of another formation resistivity detection method provided according to an embodiment of the present disclosure;

[0143] Figure 4 It is a simplified structural schematic diagram of a formation resistivity detection device provided according to an embodiment of the present disclosure;

[0144] Figure 5 is a schematic diagram of an electronic device provided according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0145] Embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although certain embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be construed as being limited to the embodiments set forth herein. On the contrary, these embodiments are provided to provide a more thorough and complete understanding of the present disclosure. It should be understood that the drawings and embodiments of the present disclosure are only for exemplary purposes and are not intended to limit the scope of protection of the present disclosure.

[0146] It should also be noted that, for ease of description, only the parts related to the present disclosure are shown in the drawings. In the absence of conflict, the embodiments and features in the embodiments of the present disclosure can be combined with each other.

[0147] It should be noted that the concepts such as "first" and "second" mentioned in the present disclosure are only used to distinguish different systems, devices, modules or units, and are not used to limit the order or interdependence of the functions performed by these systems, devices, modules or units.

[0148] It should be noted that the modifications of "one" and "plurality" mentioned in the present disclosure are illustrative rather than restrictive, and those skilled in the art should understand that unless otherwise clearly indicated in the context, it should be understood as "one or more".

[0149] The names of the messages or information exchanged between multiple devices in the embodiments of the present disclosure are only used for illustrative purposes and are not used to limit the scope of these messages or information.

[0150] The present disclosure will be described in detail below with reference to the accompanying drawings and in conjunction with embodiments.

[0151] Embodiment 1:

[0152] Figure 1 It is a schematic diagram of an application scenario of the formation resistivity detection method according to the first embodiment of the present disclosure.

[0153] exist Figure 1 In the application scenario, first, the computing device 101 can generate a target voltage curve 103 based on a time-voltage coordinate system based on a voltage signal 102 between the target formation and the comparison formation.

[0154] Secondly, the computing device 101 may generate a target envelope area 104 based on the target voltage curve 103 .

[0155] Finally, the computing device 101 may generate the resistivity 106 of the target formation based on the preset resistivity calculation model 105 and the target envelope area 104 .

[0156] It should be noted that the computing device 101 can be hardware or software. When the computing device is hardware, it can be implemented as a distributed cluster consisting of multiple servers or terminal devices, or as a single server or a single terminal device. When the computing device is embodied as software, it can be installed in the hardware devices listed above. It can be implemented as multiple software or software modules for providing distributed services, or as a single software or software module. No specific limitation is made here.

[0157] It should be understood that Figure 1 The number of computing devices in the embodiment is only illustrative. Any number of computing devices may be provided according to implementation requirements.

[0158] It should be noted that the present disclosure may use a transient electromagnetic method to calculate the resistivity of the target formation. The transient electromagnetic method may refer to a method of using a transmitting coil to transmit a pulsed magnetic field, using a receiving coil to observe a secondary eddy current field during an interval of the pulsed magnetic field, and recording the time-based variation characteristics of the secondary field voltage signal, thereby extracting electrical information of the surrounding medium and ultimately obtaining the resistivity of the formation.

[0159] Embodiment 2:

[0160] Continue to refer Figure 2 , shows a process 200 of the second embodiment of the formation resistivity detection method according to the present disclosure. The method can be Figure 1 The method for detecting formation resistivity comprises the following steps:

[0161] Step 201 : generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation.

[0162] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101 shown can be connected to the target device via a wired connection or a wireless connection, and then generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation.

[0163] The comparison formation may refer to a formation with known formation-related information. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation. The time-voltage coordinate system may refer to a plane coordinate system with time data as the horizontal axis and voltage data as the vertical axis. The target voltage curve may refer to a curve generated by connecting all voltage amplitudes in the above voltage signal.

[0164] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0165] Step 202: Generate a target envelope area based on the target voltage curve.

[0166] In some implementations, the execution entity may generate a target envelope area based on a target voltage curve.

[0167] The target envelope area may refer to the area enclosed by the vertical lines of the two endpoints of the target voltage curve, the target voltage curve, and the abscissa axis. The target envelope area may be generated by integral calculation or by other methods, which may be selected as needed and is not specifically limited here.

[0168] In some preferred implementations, the execution subject may generate the target envelope area through the following steps:

[0169] In the first step, the execution entity may normalize the target voltage curve to obtain a normalized voltage curve.

[0170] Normalization processing can refer to the processing method or steps used to eliminate the differences in voltage curves caused by different signal transmitting devices. Due to different coil materials, coil numbers, etc., or due to different manufacturing processes or manufacturing accuracy issues, different tests will produce different results. Therefore, the original formation voltage signal is normalized to obtain a more accurate voltage curve.

[0171] In a second step, the execution entity may divide the normalized voltage curve into a plurality of sub-curves with equal time differences based on a preset time division index, wherein the time difference is equal to the time division index.

[0172] The preset time division index may refer to an index used to divide the normalized voltage curve. The smaller the time division index, the greater the amount of calculation and the higher the accuracy. Conversely, the smaller the time division index, the smaller the amount of calculation and the lower the accuracy. It is set as needed and is not specifically limited here. The time difference may refer to the absolute value of the difference between the time data at both ends of any sub-curve. Since this division is an equal value division, the number of sub-curves = the total time length of the normalized voltage curve / time division index.

[0173] In a third step, the execution entity may generate a plurality of sub-curve areas based on the first voltage data and the time cutting index of each sub-curve.

[0174] The first voltage data may refer to voltage data corresponding to an endpoint on a side where the sub-curve time data is smaller.

[0175] In the fourth step, the execution subject may generate a target envelope area based on the areas of the multiple sub-curves. As an example, the areas of each sub-curve may be added together to generate the target envelope area.

[0176] In some optional implementations of these preferred implementations, the execution subject may normalize the target voltage curve through the following steps to obtain a normalized voltage curve:

[0177] In the first step, the execution entity may obtain the transmitting current data, the transmitting coil area and the number of turns of the transmitting coil of the magnetic field transmitting device.

[0178] Transmitting current data may refer to data related to the current of the transmitting device. Transmitting coil area may refer to data related to the area of ​​the coil of the transmitting device. Transmitting coil turns may refer to data related to the number of turns of the transmitting coil. Transmitting coils may refer to a plurality of coils used by the transmitting device to transmit current.

[0179] In a second step, the execution entity may generate a normalized voltage curve based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

[0180] In some optional implementations of these implementations, the execution subject may normalize each voltage data of the target voltage curve by a normalization mathematical formula to obtain a plurality of normalized voltage data and generate a normalized voltage curve, wherein the normalization mathematical formula may be:

[0181] The voltage value after processing = the voltage value before processing / (transmitting current value * transmitting coil area value * transmitting coil turn value).

[0182] Step 203: Generate the resistivity of the target formation based on the preset resistivity calculation model and the target envelope area.

[0183] In some implementations, the execution subject may generate the resistivity of the target formation through the following steps based on a preset resistivity calculation model and a target envelope area:

[0184] In the first step, the execution subject may generate a comparison area difference based on a preset comparison envelope area and a target envelope area.

[0185] In the second step, the execution entity may import the contrast area difference into the resistivity calculation model to obtain the target resistivity difference.

[0186] The resistivity calculation model may refer to a pre-set calculation model for calculating the resistivity of a target formation.

[0187] In some preferred implementations, the calculation model may be:

[0188] R1=R+k*ΔS+b

[0189] Among them, R1 may refer to the target formation resistivity, R may refer to the comparative formation resistivity, △S may refer to the comparative area difference, and k and b may refer to the trained calculation parameters.

[0190] In the third step, the execution subject may obtain a target resistivity based on the target resistivity difference and the comparative resistivity. The target resistivity may be the sum of the target resistivity difference and the comparative resistivity.

[0191] In some preferred implementations, the execution entity may determine the calculation parameters according to the following steps:

[0192] In the first step, the execution entity may set the resistivity of the test formation to a plurality of random initial resistivities, and obtain a plurality of test resistivity differences based on each initial resistivity and the comparison formation resistivity.

[0193] As an example, the test formation may be composed of an aqueous solution that simulates the formation. The resistivity of the aqueous solution may be changed by adding a specific substance to the aqueous solution. The test formation may also be set in other ways, which are selected according to needs and are not specifically limited here.

[0194] In the second step, the execution entity may obtain a plurality of test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity.

[0195] In a third step, the execution entity may generate a plurality of test voltage curves based on the test voltage signal.

[0196] In a fourth step, the execution entity may generate a plurality of test envelope areas based on the test voltage curve.

[0197] In a fifth step, the execution subject may obtain a plurality of test envelope area differences based on each test envelope area and the comparison envelope area.

[0198] The composition and generation steps of each of the above-mentioned test voltage curves, test envelope areas and test envelope area differences correspond to the above-mentioned target voltage curves, target envelope areas and target envelope area differences, respectively, and will not be described one by one here.

[0199] In step 6, the execution subject may import the plurality of envelope area differences into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model. The training method may be linear fitting or other training methods, and the calculation parameters may be obtained, and no specific limitation is made here.

[0200] The beneficial effects of one of the implementation methods in the above embodiments of the present disclosure include at least: generating a target envelope area by generating a target voltage curve based on a time-voltage coordinate system, and generating a target resistivity based on a preset resistivity calculation model, a comparison envelope area generated by a comparison voltage curve, and the target envelope area. By comparing the envelope area, the amount of calculated data can be greatly increased, thereby greatly improving the detection accuracy of the target resistivity.

[0201] Embodiment three:

[0202] Continue to refer Figure 3 , shows a process 300 of the third embodiment of the formation resistivity detection method according to the present disclosure, which can be Figure 1 The formation resistivity detection method includes:

[0203] Step 301, obtaining a voltage signal between a target formation and a comparison formation.

[0204] In some implementations, the execution entity may obtain a voltage signal between the target formation and the comparison formation.

[0205] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101) shown can be connected to the target device via a wired connection or a wireless connection, and then obtain the voltage signal between the target formation and the comparison formation.

[0206] The comparative formation may refer to a formation for which formation-related information is known. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation.

[0207] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0208] Step 302: purify the voltage signal to obtain a pure voltage signal.

[0209] In some implementations, the execution entity may perform purification processing on the voltage signal to obtain a pure voltage signal.

[0210] Purification may refer to a processing method or step for removing other irrelevant impurity signals from a voltage signal. As an example, purification may use an adder circuit to remove impurity signals from a voltage signal. The impurity signal may include a bushing signal generated by the bushing itself.

[0211] Step 303, amplify the pure voltage signal to obtain an amplified voltage signal.

[0212] In some implementations, the execution subject may amplify the pure voltage signal to obtain an amplified voltage signal. Since the amplitude of the collected signal is small, it needs to be amplified according to a preset ratio for later processing.

[0213] Step 304 , generating the target voltage curve based on a preset signal capture time interval and the amplified voltage signal.

[0214] In some implementations, the execution subject may generate the target voltage curve based on a preset signal interception time interval and the amplified voltage signal. The signal interception time interval may refer to a time interval for intercepting the amplified voltage signal. When calculating signals of formations with different resistivity, the signal interception time interval is used to intercept the signal and perform subsequent calculations. As an example, the signal interception time interval may be "0.5 seconds to 1.5 seconds".

[0215] The overall trend of the voltage signal acquired by the present disclosure is constantly decreasing, and as the acquisition continues, the noise signal will increase. Therefore, it is a better choice to acquire the signal at the front part of the voltage signal.

[0216] In some preferred implementations, the execution subject may obtain the signal interception time interval by the following steps:

[0217] In the first step, the execution subject may obtain an upper limit interception threshold and a lower limit interception threshold.

[0218] The upper interception threshold may refer to an indicator for starting to intercept the amplified signal. When the voltage amplitude of the amplified voltage signal is not greater than the upper interception threshold, interception may begin. The lower interception threshold may refer to an indicator for ending to intercept the amplified signal. When the voltage amplitude of the amplified voltage signal is not greater than the lower interception threshold, interception may stop.

[0219] In the second step, when the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, the execution subject may obtain a first time point. The first time point may refer to the time data when the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time.

[0220] In the third step, when the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, the execution subject may obtain a second time point. The second time point may refer to the time data when the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold for the first time.

[0221] In a fourth step, the execution entity may generate a signal capture time interval based on the first time point and the second time point.

[0222] Step 305: Generate a target envelope area based on the target voltage curve.

[0223] Step 306: Generate the resistivity of the target formation based on the preset resistivity calculation model and the target envelope area.

[0224] In some optional implementations, the specific implementation of steps 305-306 and the technical effects brought about can be referred to Figure 2 The corresponding steps 202-203 in the second embodiment are not described again here.

[0225] The beneficial effects of one of the above-mentioned embodiments of the present disclosure include at least: by purifying the voltage signal, the interference of impurity signals can be eliminated, thereby increasing the accuracy of the present disclosure.

[0226] All the above optional technical solutions can be combined in any way to form optional implementation methods of the present application, and will not be described in detail here.

[0227] Embodiment 4:

[0228] The following are embodiments of the device disclosed herein, which can be used to execute the method embodiments disclosed herein. For details not disclosed in the device embodiments disclosed herein, please refer to the method embodiments disclosed herein.

[0229] Further references Figure 4 As an implementation of the above methods in the above figures, the present disclosure provides an embodiment of a formation resistivity detection device. The embodiment of the device is similar to Figure 2 The above-mentioned embodiment 2 corresponds.

[0230] like Figure 4 As shown, the formation resistivity detection device 400 of this embodiment includes:

[0231] The first generating module is configured to generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation.

[0232] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101 shown can be connected to the target device via a wired connection or a wireless connection, and then generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation.

[0233] The comparison formation may refer to a formation with known formation-related information. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation. The time-voltage coordinate system may refer to a plane coordinate system with time data as the horizontal axis and voltage data as the vertical axis. The target voltage curve may refer to a curve generated by connecting all voltage amplitudes in the above voltage signal.

[0234] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0235] The second generating module is configured to generate a target envelope area based on the target voltage curve.

[0236] In some implementations, the execution entity may generate a target envelope area based on a target voltage curve.

[0237] The target envelope area may refer to the area enclosed by the vertical lines of the two endpoints of the target voltage curve, the target voltage curve, and the abscissa axis. The target envelope area may be generated by integral calculation or by other methods, which may be selected as needed and is not specifically limited here.

[0238] In some preferred implementations, the execution subject may generate the target envelope area through the following steps:

[0239] In the first step, the execution entity may normalize the target voltage curve to obtain a normalized voltage curve.

[0240] Normalization processing can refer to the processing method or steps used to eliminate the differences in voltage curves caused by different signal transmitting devices. Due to different coil materials, coil numbers, etc., or due to different manufacturing processes or manufacturing accuracy issues, different tests will produce different results. Therefore, the original formation voltage signal is normalized to obtain a more accurate voltage curve.

[0241] In a second step, the execution entity may divide the normalized voltage curve into a plurality of sub-curves with equal time differences based on a preset time division index, wherein the time difference is equal to the time division index.

[0242] The preset time division index may refer to an index used to divide the normalized voltage curve. The smaller the time division index, the greater the amount of calculation and the higher the accuracy. Conversely, the smaller the time division index, the smaller the amount of calculation and the lower the accuracy. It is set as needed and is not specifically limited here. The time difference may refer to the absolute value of the difference between the time data at both ends of any sub-curve. Since this division is an equal value division, the number of sub-curves = the total time length of the normalized voltage curve / time division index.

[0243] In a third step, the execution entity may generate a plurality of sub-curve areas based on the first voltage data and the time cutting index of each sub-curve.

[0244] The first voltage data may refer to voltage data corresponding to an endpoint on a side where the sub-curve time data is smaller.

[0245] In the fourth step, the execution subject may generate a target envelope area based on the areas of the multiple sub-curves. As an example, the areas of each sub-curve may be added together to generate the target envelope area.

[0246] In some optional implementations of these preferred implementations, the execution subject may normalize the target voltage curve through the following steps to obtain a normalized voltage curve:

[0247] In the first step, the execution entity may obtain the transmitting current data, the transmitting coil area and the number of turns of the transmitting coil of the magnetic field transmitting device.

[0248] Transmitting current data may refer to data related to the current of the transmitting device. Transmitting coil area may refer to data related to the area of ​​the coil of the transmitting device. Transmitting coil turns may refer to data related to the number of turns of the transmitting coil. Transmitting coils may refer to a plurality of coils used by the transmitting device to transmit current.

[0249] In a second step, the execution entity may generate a normalized voltage curve based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

[0250] In some optional implementations of these implementations, the execution subject may normalize each voltage data of the target voltage curve by a normalization mathematical formula to obtain a plurality of normalized voltage data and generate a normalized voltage curve, wherein the normalization mathematical formula may be:

[0251] The voltage value after processing = the voltage value before processing / (transmitting current value * transmitting coil area value * transmitting coil turn value).

[0252] The third generating module is configured to generate the resistivity of the target formation based on a preset resistivity calculation model and a target envelope area.

[0253] In some implementations, the execution subject may generate the resistivity of the target formation through the following steps based on a preset resistivity calculation model and a target envelope area:

[0254] In the first step, the execution subject may generate a comparison area difference based on a preset comparison envelope area and a target envelope area.

[0255] In the second step, the execution entity may import the contrast area difference into the resistivity calculation model to obtain the target resistivity difference.

[0256] The resistivity calculation model may refer to a pre-set calculation model for calculating the resistivity of a target formation.

[0257] In some preferred implementations, the calculation model may be:

[0258] R1=R+k*ΔS+b

[0259] Among them, R1 may refer to the target formation resistivity, R may refer to the comparative formation resistivity, △S may refer to the comparative area difference, and k and b may refer to the trained calculation parameters.

[0260] In the third step, the execution subject may obtain a target resistivity based on the target resistivity difference and the comparative resistivity. The target resistivity may be the sum of the target resistivity difference and the comparative resistivity.

[0261] In some preferred implementations, the execution entity may determine the calculation parameters according to the following steps:

[0262] In the first step, the execution entity may set the resistivity of the test formation to a plurality of random initial resistivities, and obtain a plurality of test resistivity differences based on each initial resistivity and the comparison formation resistivity.

[0263] As an example, the test formation may be composed of an aqueous solution that simulates the formation. The resistivity of the aqueous solution may be changed by adding a specific substance to the aqueous solution. The test formation may also be set in other ways, which are selected according to needs and are not specifically limited here.

[0264] In the second step, the execution entity may obtain a plurality of test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity.

[0265] In a third step, the execution entity may generate a plurality of test voltage curves based on the test voltage signal.

[0266] In a fourth step, the execution entity may generate a plurality of test envelope areas based on the test voltage curve.

[0267] In a fifth step, the execution subject may obtain a plurality of test envelope area differences based on each test envelope area and the comparison envelope area.

[0268] The composition and generation steps of each of the above-mentioned test voltage curves, test envelope areas and test envelope area differences correspond to the above-mentioned target voltage curves, target envelope areas and target envelope area differences, respectively, and will not be described one by one here.

[0269] In step 6, the execution subject may import the plurality of envelope area differences into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model. The training method may be linear fitting or other training methods, and the calculation parameters may be obtained, and no specific limitation is made here.

[0270] In some preferred implementations, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0271] Acquire the voltage signal between the target formation and the comparison formation;

[0272] Purify the voltage signal to obtain a pure voltage signal;

[0273] Amplify the pure voltage signal to obtain an amplified voltage signal;

[0274] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0275] In some preferred implementations, the step of acquiring the signal interception time interval includes:

[0276] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0277] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0278] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0279] A signal capture time interval is generated based on the first time point and the second time point.

[0280] It is understandable that the modules described in the device 400 are similar to those described in the reference Figure 2 Therefore, the operations, features and beneficial effects described above for the method are also applicable to the device 400 and the modules contained therein, and will not be described in detail here.

[0281] Embodiment five:

[0282] like Figure 5 As shown, the electronic device 500 may include a processing device (e.g., a central processing unit, a graphics processing unit, etc.) 501, which can perform various appropriate actions and processes according to a program stored in a read-only memory (ROM) 502 or a program loaded from a storage device 508 into a random access memory (RAM) 503. In the RAM 503, various programs and data required for the operation of the electronic device 500 are also stored. The processing device 501, the ROM 502, and the RAM 503 are connected to each other via a bus 504. An input / output (I / O) interface 505 is also connected to the bus 504.

[0283] Typically, the following devices may be connected to the I / O interface 505: an input device 506 including, for example, a touch screen, a touch pad, a keyboard, a mouse, a camera, a microphone, an accelerometer, a gyroscope, etc.; an output device 507 including, for example, a liquid crystal display (LCD), a speaker, a vibrator, etc.; a storage device 508 including, for example, a magnetic tape, a hard disk, etc.; and a communication device 509. The communication device 509 may allow the electronic device 500 to communicate with other devices wirelessly or by wire to exchange data. Although Figure 5 The electronic device 500 is shown with various devices, but it should be understood that it is not required to implement or possess all the devices shown. More or fewer devices may be implemented or possessed instead. Figure 5 Each block shown in the figure may represent one device, or may represent multiple devices as required.

[0284] In particular, according to this embodiment, the process described above with reference to the flowchart can be implemented as a computer software program. For example, this embodiment includes a computer program product, which includes a computer program carried on a computer-readable medium, and the computer program contains program code for executing the method shown in the flowchart. In this embodiment, the computer program can be downloaded and installed from the network through the communication device 509, or installed from the storage device 508, or installed from the ROM 502. When the computer program is executed by the processing device 501, the following steps can be performed:

[0285] Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated.

[0286] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101 shown can be connected to the target device via a wired connection or a wireless connection, and then generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation.

[0287] The comparison formation may refer to a formation with known formation-related information. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation. The time-voltage coordinate system may refer to a plane coordinate system with time data as the horizontal axis and voltage data as the vertical axis. The target voltage curve may refer to a curve generated by connecting all voltage amplitudes in the above voltage signal.

[0288] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0289] Based on the target voltage curve, a target envelope area is generated.

[0290] In some implementations, the execution entity may generate a target envelope area based on a target voltage curve.

[0291] The target envelope area may refer to the area enclosed by the vertical lines of the two endpoints of the target voltage curve, the target voltage curve, and the abscissa axis. The target envelope area may be generated by integral calculation or by other methods, which may be selected as needed and is not specifically limited here.

[0292] In some preferred implementations, the execution subject may generate the target envelope area through the following steps:

[0293] In the first step, the execution entity may normalize the target voltage curve to obtain a normalized voltage curve.

[0294] Normalization processing can refer to the processing method or steps used to eliminate the differences in voltage curves caused by different signal transmitting devices. Due to different coil materials, coil numbers, etc., or due to different manufacturing processes or manufacturing accuracy issues, different tests will produce different results. Therefore, the original formation voltage signal is normalized to obtain a more accurate voltage curve.

[0295] In a second step, the execution entity may divide the normalized voltage curve into a plurality of sub-curves with equal time differences based on a preset time division index, wherein the time difference is equal to the time division index.

[0296] The preset time division index may refer to an index used to divide the normalized voltage curve. The smaller the time division index, the greater the amount of calculation and the higher the accuracy. Conversely, the smaller the time division index, the smaller the amount of calculation and the lower the accuracy. It is set as needed and is not specifically limited here. The time difference may refer to the absolute value of the difference between the time data at both ends of any sub-curve. Since this division is an equal value division, the number of sub-curves = the total time length of the normalized voltage curve / time division index.

[0297] In a third step, the execution entity may generate a plurality of sub-curve areas based on the first voltage data and the time cutting index of each sub-curve.

[0298] The first voltage data may refer to voltage data corresponding to an endpoint on a side where the sub-curve time data is smaller.

[0299] In the fourth step, the execution subject may generate a target envelope area based on the areas of the multiple sub-curves. As an example, the areas of each sub-curve may be added together to generate the target envelope area.

[0300] In some optional implementations of these preferred implementations, the execution subject may normalize the target voltage curve through the following steps to obtain a normalized voltage curve:

[0301] In the first step, the execution entity may obtain the transmitting current data, the transmitting coil area and the number of turns of the transmitting coil of the magnetic field transmitting device.

[0302] Transmitting current data may refer to data related to the current of the transmitting device. Transmitting coil area may refer to data related to the area of ​​the coil of the transmitting device. Transmitting coil turns may refer to data related to the number of turns of the transmitting coil. Transmitting coils may refer to a plurality of coils used by the transmitting device to transmit current.

[0303] In a second step, the execution entity may generate a normalized voltage curve based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

[0304] In some optional implementations of these implementations, the execution subject may normalize each voltage data of the target voltage curve by a normalization mathematical formula to obtain a plurality of normalized voltage data and generate a normalized voltage curve, wherein the normalization mathematical formula may be:

[0305] The voltage value after processing = the voltage value before processing / (transmitting current value * transmitting coil area value * transmitting coil turn value).

[0306] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0307] In some implementations, the execution subject may generate the resistivity of the target formation through the following steps based on a preset resistivity calculation model and a target envelope area:

[0308] In the first step, the execution subject may generate a comparison area difference based on a preset comparison envelope area and a target envelope area.

[0309] In the second step, the execution entity may import the contrast area difference into the resistivity calculation model to obtain the target resistivity difference.

[0310] The resistivity calculation model may refer to a pre-set calculation model for calculating the resistivity of a target formation.

[0311] In some preferred implementations, the calculation model may be:

[0312] R1=R+k*ΔS+b

[0313] Among them, R1 may refer to the target formation resistivity, R may refer to the comparative formation resistivity, △S may refer to the comparative area difference, and k and b may refer to the trained calculation parameters.

[0314] In the third step, the execution subject may obtain a target resistivity based on the target resistivity difference and the comparative resistivity. The target resistivity may be the sum of the target resistivity difference and the comparative resistivity.

[0315] In some preferred implementations, the execution entity may determine the calculation parameters according to the following steps:

[0316] In the first step, the execution entity may set the resistivity of the test formation to a plurality of random initial resistivities, and obtain a plurality of test resistivity differences based on each initial resistivity and the comparison formation resistivity.

[0317] As an example, the test formation may be composed of an aqueous solution that simulates the formation. The resistivity of the aqueous solution may be changed by adding a specific substance to the aqueous solution. The test formation may also be set in other ways, which are selected according to needs and are not specifically limited here.

[0318] In the second step, the execution entity may obtain a plurality of test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity.

[0319] In a third step, the execution entity may generate a plurality of test voltage curves based on the test voltage signal.

[0320] In a fourth step, the execution entity may generate a plurality of test envelope areas based on the test voltage curve.

[0321] In a fifth step, the execution subject may obtain a plurality of test envelope area differences based on each test envelope area and the comparison envelope area.

[0322] The composition and generation steps of each of the above-mentioned test voltage curves, test envelope areas and test envelope area differences correspond to the above-mentioned target voltage curves, target envelope areas and target envelope area differences, respectively, and will not be described one by one here.

[0323] In step 6, the execution subject may import the plurality of envelope area differences into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model. The training method may be linear fitting or other training methods, and the calculation parameters may be obtained, and no specific limitation is made here.

[0324] In some preferred implementations, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0325] Acquire the voltage signal between the target formation and the comparison formation;

[0326] Purifying the voltage signal to obtain a pure voltage signal;

[0327] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0328] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0329] In some preferred implementations, the step of acquiring the signal interception time interval includes:

[0330] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0331] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0332] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0333] A signal capture time interval is generated based on the first time point and the second time point.

[0334] It should be noted that the computer-readable medium in the present embodiment may be a computer-readable signal medium or a computer-readable storage medium or any combination of the two. The computer-readable storage medium may be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or device, or any combination of the above. More specific examples of computer-readable storage media may include, but are not limited to: an electrical connection with one or more wires, a portable computer disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above. In the present embodiment, the computer-readable storage medium may be any tangible medium containing or storing a program that may be used by or in combination with an instruction execution system, device or device. In the present embodiment, the computer-readable signal medium may include a data signal propagated in a baseband or as part of a carrier wave, which carries a computer-readable program code. This propagated data signal may take a variety of forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination of the above. The computer readable signal medium may also be any computer readable medium other than a computer readable storage medium, which may send, propagate or transmit a program for use by or in conjunction with an instruction execution system, apparatus or device. The program code contained on the computer readable medium may be transmitted using any suitable medium, including but not limited to: wires, optical cables, RF (radio frequency), etc., or any suitable combination of the above.

[0335] In some embodiments, the client and the server may communicate using any currently known or future developed network protocol such as HTTP (HyperText Transfer Protocol), and may be interconnected with any form or medium of digital data communication (e.g., a communication network). Examples of communication networks include a local area network ("LAN"), a wide area network ("WAN"), an internet (e.g., the Internet), and a peer-to-peer network (e.g., an ad hoc peer-to-peer network), as well as any currently known or future developed network.

[0336] The computer-readable medium may be included in the device, or may exist independently without being installed in the electronic device. The computer-readable medium carries one or more programs. When the one or more programs are executed by the electronic device, the electronic device performs the following steps:

[0337] Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated.

[0338] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101 shown can be connected to the target device via a wired connection or a wireless connection, and then generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation.

[0339] The comparison formation may refer to a formation with known formation-related information. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation. The time-voltage coordinate system may refer to a plane coordinate system with time data as the horizontal axis and voltage data as the vertical axis. The target voltage curve may refer to a curve generated by connecting all voltage amplitudes in the above voltage signal.

[0340] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0341] Based on the target voltage curve, a target envelope area is generated.

[0342] In some implementations, the execution entity may generate a target envelope area based on a target voltage curve.

[0343] The target envelope area may refer to the area enclosed by the vertical lines of the two endpoints of the target voltage curve, the target voltage curve, and the abscissa axis. The target envelope area may be generated by integral calculation or by other methods, which may be selected as needed and is not specifically limited here.

[0344] In some preferred implementations, the execution subject may generate the target envelope area through the following steps:

[0345] In the first step, the execution entity may normalize the target voltage curve to obtain a normalized voltage curve.

[0346] Normalization processing can refer to the processing method or steps used to eliminate the differences in voltage curves caused by different signal transmitting devices. Due to different coil materials, coil numbers, etc., or due to different manufacturing processes or manufacturing accuracy issues, different tests will produce different results. Therefore, the original formation voltage signal is normalized to obtain a more accurate voltage curve.

[0347] In a second step, the execution entity may divide the normalized voltage curve into a plurality of sub-curves with equal time differences based on a preset time division index, wherein the time difference is equal to the time division index.

[0348] The preset time division index may refer to an index used to divide the normalized voltage curve. The smaller the time division index, the greater the amount of calculation and the higher the accuracy. Conversely, the smaller the time division index, the smaller the amount of calculation and the lower the accuracy. It is set as needed and is not specifically limited here. The time difference may refer to the absolute value of the difference between the time data at both ends of any sub-curve. Since this division is an equal value division, the number of sub-curves = the total time length of the normalized voltage curve / time division index.

[0349] In a third step, the execution entity may generate a plurality of sub-curve areas based on the first voltage data and the time cutting index of each sub-curve.

[0350] The first voltage data may refer to voltage data corresponding to an endpoint on a side where the sub-curve time data is smaller.

[0351] In the fourth step, the execution subject may generate a target envelope area based on the areas of the multiple sub-curves. As an example, the areas of each sub-curve may be added together to generate the target envelope area.

[0352] In some optional implementations of these preferred implementations, the execution subject may normalize the target voltage curve through the following steps to obtain a normalized voltage curve:

[0353] In the first step, the execution entity may obtain the transmitting current data, the transmitting coil area and the number of turns of the transmitting coil of the magnetic field transmitting device.

[0354] Transmitting current data may refer to data related to the current of the transmitting device. Transmitting coil area may refer to data related to the area of ​​the coil of the transmitting device. Transmitting coil turns may refer to data related to the number of turns of the transmitting coil. Transmitting coils may refer to a plurality of coils used by the transmitting device to transmit current.

[0355] In a second step, the execution entity may generate a normalized voltage curve based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

[0356] In some optional implementations of these implementations, the execution subject may normalize each voltage data of the target voltage curve by a normalization mathematical formula to obtain a plurality of normalized voltage data and generate a normalized voltage curve, wherein the normalization mathematical formula may be:

[0357] The voltage value after processing = the voltage value before processing / (transmitting current value * transmitting coil area value * transmitting coil turn value).

[0358] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0359] In some implementations, the execution subject may generate the resistivity of the target formation through the following steps based on a preset resistivity calculation model and a target envelope area:

[0360] In the first step, the execution subject may generate a comparison area difference based on a preset comparison envelope area and a target envelope area.

[0361] In the second step, the execution entity may import the contrast area difference into the resistivity calculation model to obtain the target resistivity difference.

[0362] The resistivity calculation model may refer to a pre-set calculation model for calculating the resistivity of a target formation.

[0363] In some preferred implementations, the calculation model may be:

[0364] R1=R+k*ΔS+b

[0365] Among them, R1 may refer to the target formation resistivity, R may refer to the comparative formation resistivity, △S may refer to the comparative area difference, and k and b may refer to the trained calculation parameters.

[0366] In the third step, the execution subject may obtain a target resistivity based on the target resistivity difference and the comparative resistivity. The target resistivity may be the sum of the target resistivity difference and the comparative resistivity.

[0367] In some preferred implementations, the execution entity may determine the calculation parameters according to the following steps:

[0368] In the first step, the execution entity may set the resistivity of the test formation to a plurality of random initial resistivities, and obtain a plurality of test resistivity differences based on each initial resistivity and the comparison formation resistivity.

[0369] As an example, the test formation may be composed of an aqueous solution that simulates the formation. The resistivity of the aqueous solution may be changed by adding a specific substance to the aqueous solution. The test formation may also be set in other ways, which are selected according to needs and are not specifically limited here.

[0370] In the second step, the execution entity may obtain a plurality of test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity.

[0371] In a third step, the execution entity may generate a plurality of test voltage curves based on the test voltage signal.

[0372] In a fourth step, the execution entity may generate a plurality of test envelope areas based on the test voltage curve.

[0373] In a fifth step, the execution subject may obtain a plurality of test envelope area differences based on each test envelope area and the comparison envelope area.

[0374] The composition and generation steps of each of the above-mentioned test voltage curves, test envelope areas and test envelope area differences correspond to the above-mentioned target voltage curves, target envelope areas and target envelope area differences, respectively, and will not be described one by one here.

[0375] In step 6, the execution subject may import the plurality of envelope area differences into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model. The training method may be linear fitting or other training methods, and the calculation parameters may be obtained, and no specific limitation is made here.

[0376] In some preferred implementations, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0377] Acquire the voltage signal between the target formation and the comparison formation;

[0378] Purifying the voltage signal to obtain a pure voltage signal;

[0379] amplifying the pure voltage signal to obtain an amplified voltage signal;

[0380] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0381] In some preferred implementations, the step of acquiring the signal interception time interval includes:

[0382] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0383] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0384] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0385] A signal capture time interval is generated based on the first time point and the second time point.

[0386] The computer program code for performing the operation of the present embodiment can be written in one or more programming languages ​​or a combination thereof, including object-oriented programming languages, such as Java, Smalltalk, C++, and conventional procedural programming languages, such as "C" language or similar programming languages. The program code can be executed entirely on the user's computer, partially on the user's computer, as an independent software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In the case of a remote computer, the remote computer can be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or can be connected to an external computer (e.g., using an Internet service provider to connect through the Internet).

[0387] The flow chart and block diagram in the accompanying drawings illustrate the possible architecture, function and operation of the system, method and computer program product according to various embodiments of the present disclosure. In this regard, each square box in the flow chart or block diagram can represent a module, a program segment or a part of a code, and the module, the program segment or a part of the code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some implementations as replacements, the functions marked in the square box can also occur in a sequence different from that marked in the accompanying drawings. For example, two square boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, depending on the functions involved. It should also be noted that each square box in the block diagram and / or flow chart, and the combination of the square boxes in the block diagram and / or flow chart can be implemented with a dedicated hardware-based system that performs a specified function or operation, or can be implemented with a combination of dedicated hardware and computer instructions.

[0388] The modules described in this embodiment may be implemented by software or hardware. The modules described may also be set in a processor, for example, may be described as:

[0389] The method is configured to generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparative formation.

[0390] In some optional implementations, the execution subject of the formation resistivity detection method (such as Figure 1 The computing device 101 shown can be connected to the target device via a wired connection or a wireless connection, and then generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation.

[0391] The comparison formation may refer to a formation with known formation-related information. The target formation may refer to a formation for which formation-related information needs to be detected. Formation-related information may include a resistivity value of the formation. The time-voltage coordinate system may refer to a plane coordinate system with time data as the horizontal axis and voltage data as the vertical axis. The target voltage curve may refer to a curve generated by connecting all voltage amplitudes in the above voltage signal.

[0392] It should be noted that the above-mentioned wireless connection methods may include but are not limited to 3G / 4G connection, WiFi connection, Bluetooth connection, WiMAX connection, Zigbee connection, UWB (ultra wideband) connection, and other wireless connection methods currently known or to be developed in the future.

[0393] Based on the target voltage curve, a target envelope area is generated.

[0394] In some implementations, the execution entity may generate a target envelope area based on a target voltage curve.

[0395] The target envelope area may refer to the area enclosed by the vertical lines of the two endpoints of the target voltage curve, the target voltage curve, and the abscissa axis. The target envelope area may be generated by integral calculation or by other methods, which may be selected as needed and is not specifically limited here.

[0396] In some preferred implementations, the execution subject may generate the target envelope area through the following steps:

[0397] In the first step, the execution entity may normalize the target voltage curve to obtain a normalized voltage curve.

[0398] Normalization processing can refer to the processing method or steps used to eliminate the differences in voltage curves caused by different signal transmitting devices. Due to different coil materials, coil numbers, etc., or due to different manufacturing processes or manufacturing accuracy issues, different tests will produce different results. Therefore, the original formation voltage signal is normalized to obtain a more accurate voltage curve.

[0399] In a second step, the execution entity may divide the normalized voltage curve into a plurality of sub-curves with equal time differences based on a preset time division index, wherein the time difference is equal to the time division index.

[0400] The preset time division index may refer to an index used to divide the normalized voltage curve. The smaller the time division index, the greater the amount of calculation and the higher the accuracy. Conversely, the smaller the time division index, the smaller the amount of calculation and the lower the accuracy. It is set as needed and is not specifically limited here. The time difference may refer to the absolute value of the difference between the time data at both ends of any sub-curve. Since this division is an equal value division, the number of sub-curves = the total time length of the normalized voltage curve / time division index.

[0401] In a third step, the execution entity may generate a plurality of sub-curve areas based on the first voltage data and the time cutting index of each sub-curve.

[0402] The first voltage data may refer to voltage data corresponding to an endpoint on a side where the sub-curve time data is smaller.

[0403] In the fourth step, the execution subject may generate a target envelope area based on the areas of the multiple sub-curves. As an example, the areas of each sub-curve may be added together to generate the target envelope area.

[0404] In some optional implementations of these preferred implementations, the execution subject may normalize the target voltage curve through the following steps to obtain a normalized voltage curve:

[0405] In the first step, the execution entity may obtain the transmitting current data, the transmitting coil area and the number of turns of the transmitting coil of the magnetic field transmitting device.

[0406] Transmitting current data may refer to data related to the current of the transmitting device. Transmitting coil area may refer to data related to the area of ​​the coil of the transmitting device. Transmitting coil turns may refer to data related to the number of turns of the transmitting coil. Transmitting coils may refer to a plurality of coils used by the transmitting device to transmit current.

[0407] In a second step, the execution entity may generate a normalized voltage curve based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

[0408] In some optional implementations of these implementations, the execution subject may normalize each voltage data of the target voltage curve by a normalization mathematical formula to obtain a plurality of normalized voltage data and generate a normalized voltage curve, wherein the normalization mathematical formula may be:

[0409] The voltage value after processing = the voltage value before processing / (transmitting current value * transmitting coil area value * transmitting coil turn value).

[0410] The resistivity of the target formation is generated based on the preset resistivity calculation model and the target envelope area.

[0411] In some implementations, the execution subject may generate the resistivity of the target formation through the following steps based on a preset resistivity calculation model and a target envelope area:

[0412] In the first step, the execution subject may generate a comparison area difference based on a preset comparison envelope area and a target envelope area.

[0413] In the second step, the execution entity may import the contrast area difference into the resistivity calculation model to obtain the target resistivity difference.

[0414] The resistivity calculation model may refer to a pre-set calculation model for calculating the resistivity of a target formation.

[0415] In some preferred implementations, the calculation model may be:

[0416] R1=R+k*ΔS+b

[0417] Among them, R1 may refer to the target formation resistivity, R may refer to the comparative formation resistivity, △S may refer to the comparative area difference, and k and b may refer to the trained calculation parameters.

[0418] In the third step, the execution subject may obtain a target resistivity based on the target resistivity difference and the comparative resistivity. The target resistivity may be the sum of the target resistivity difference and the comparative resistivity.

[0419] In some preferred implementations, the execution entity may determine the calculation parameters according to the following steps:

[0420] In the first step, the execution entity may set the resistivity of the test formation to a plurality of random initial resistivities, and obtain a plurality of test resistivity differences based on each initial resistivity and the comparison formation resistivity.

[0421] As an example, the test formation may be composed of an aqueous solution simulating the formation. The resistivity of the aqueous solution may be increased by adding a specific substance to the aqueous solution. The test formation may also be set in other ways, which may be selected as needed and are not specifically limited here.

[0422] In the second step, the execution entity may obtain a plurality of test voltage signals between the test formation and the comparison formation corresponding to each initial resistivity.

[0423] In a third step, the execution entity may generate a plurality of test voltage curves based on the test voltage signal.

[0424] In a fourth step, the execution entity may generate a plurality of test envelope areas based on the test voltage curve.

[0425] In a fifth step, the execution subject may obtain a plurality of test envelope area differences based on each test envelope area and the comparison envelope area.

[0426] The composition and generation steps of each of the above-mentioned test voltage curves, test envelope areas and test envelope area differences correspond to the above-mentioned target voltage curves, target envelope areas and target envelope area differences, respectively, and will not be described one by one here.

[0427] In step 6, the execution subject may import the plurality of envelope area differences into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model. The training method may be linear fitting or other training methods, and the calculation parameters may be obtained, and no specific limitation is made here.

[0428] In some preferred implementations, generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation includes:

[0429] Acquire the voltage signal between the target formation and the comparison formation;

[0430] Purify the voltage signal to obtain a pure voltage signal;

[0431] Amplify the pure voltage signal to obtain an amplified voltage signal;

[0432] A target voltage curve is generated based on a preset signal interception time interval and an amplified voltage signal.

[0433] In some preferred implementations, the step of acquiring the signal interception time interval includes:

[0434] Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold;

[0435] When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, obtaining a first time point;

[0436] When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point;

[0437] A signal capture time interval is generated based on the first time point and the second time point.

[0438] The functions described above herein may be performed at least in part by one or more hardware logic components. For example, without limitation, exemplary types of hardware logic components that may be used include: field programmable gate arrays (FPGAs), application specific integrated circuits (ASICs), application specific standard products (ASSPs), systems on chips (SOCs), complex programmable logic devices (CPLDs), and the like.

[0439] The above descriptions are only some preferred embodiments of the present disclosure and an explanation of the technical principles used. Those skilled in the art should understand that the scope of the invention involved in the embodiments of the present disclosure is not limited to the technical solutions formed by a specific combination of the above-mentioned technical features, but should also cover other technical solutions formed by any combination of the above-mentioned technical features or their equivalent features without departing from the above-mentioned inventive concept. For example, the above-mentioned features are replaced with the technical features with similar functions disclosed in the embodiments of the present disclosure (but not limited to) and the technical solutions formed.

Claims

1. A formation resistivity detection method, characterized in that: include: Based on the voltage signal between the target formation and the comparison formation, a target voltage curve based on a time-voltage coordinate system is generated; Based on the target voltage curve, generating a target envelope area; Based on a preset resistivity calculation model and the target envelope area, the resistivity of the target formation is generated.

2. The method according to claim 1, characterized in that: The step of generating a target envelope area based on the target voltage curve comprises: Normalizing the target voltage curve to obtain a normalized voltage curve; Based on a preset time division index, dividing the normalized voltage curve into a plurality of sub-curves with equal time differences, wherein the time difference is equal to the time division index; Generate a plurality of sub-curve areas based on the first voltage data of each sub-curve and the time cutting index; The target envelope area is generated based on the multiple sub-curve areas.

3. The method according to claim 2, characterized in that The step of normalizing the target voltage curve to obtain a normalized voltage curve includes: Obtaining transmitting current data, transmitting coil area and transmitting coil turns of the magnetic field transmitting device; The normalized voltage curve is generated based on the transmitting current data, the transmitting coil area, the number of turns of the transmitting coil, and each voltage data of the target voltage curve.

4. The method according to claim 1, characterized in that: The step of generating the resistivity of the target formation based on a preset resistivity calculation model and the target envelope area includes: Generate a contrast area difference based on a preset contrast envelope area and the target envelope area; Importing the contrast area difference into the resistivity calculation model to obtain a target resistivity difference; The target resistivity is obtained based on the target resistivity difference and the comparative resistivity.

5. The method according to claim 4, characterized in that The step of determining the calculation parameters of the resistivity calculation model comprises: Setting the resistivity of the test formation to a plurality of random initial resistivities, and obtaining a plurality of test resistivity difference values ​​based on each of the initial resistivities and the comparative formation resistivity; Acquire a plurality of test voltage signals between the test formation corresponding to each initial resistivity and the comparison formation; Based on the test voltage signal, generating a plurality of test voltage curves; Based on the test voltage curve, generating a plurality of test envelope areas; Based on each of the test envelope areas and the comparison envelope area, a plurality of test envelope area differences are obtained; The multiple envelope area differences are introduced into an untrained resistivity calculation model for training to obtain calculation parameters of the resistivity calculation model.

6. The method according to any one of claims 1 to 5, characterized in that: The step of generating a target voltage curve based on a time-voltage coordinate system based on a voltage signal between the target formation and the comparison formation includes: Acquiring a voltage signal between the target formation and the comparison formation; Purifying the voltage signal to obtain a pure voltage signal; amplifying the pure voltage signal to obtain an amplified voltage signal; The target voltage curve is generated based on a preset signal interception time interval and the amplified voltage signal.

7. The method according to claim 6, characterized in that The step of acquiring the signal interception time interval includes: Obtaining a preset upper limit interception threshold and a preset lower limit interception threshold; When the amplitude of the amplified voltage signal is not greater than the upper limit interception threshold for the first time, acquiring a first time point; When the amplitude of the amplified voltage signal is not greater than the lower limit interception threshold, acquiring a second time point; The signal capture time interval is generated based on the first time point and the second time point.

8. A formation resistivity detection device, characterized in that: The device comprises: A first generating module is configured to generate a target voltage curve based on a time-voltage coordinate system based on a voltage signal between a target formation and a comparison formation; A second generating module is configured to generate a target envelope area based on the target voltage curve; The third generating module is configured to generate the resistivity of the target formation based on a preset resistivity calculation model and the target envelope area.

9. An electronic device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: When the processor executes the computer program, the steps of the method according to any one of claims 1 to 7 are implemented.

10. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 7 are implemented.

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