A screen glass photoetching machine and a screen glass exposure method

Abstract

The application discloses a screen glass photoetching machine and a screen glass exposure method, and relates to the field of screen production equipment. The screen glass photoetching machine comprises a rack, a first long-side light source, a second long-side light source, a first short-side light source and a second short-side light source which are installed on the rack, and a first exposure station and a second exposure station which are arranged along the left-right direction below the rack. The first long-side light source and the second long-side light source are used for providing front-back cross downward inclined light sources to the first exposure station. The first short-side light source provides vertical light sources to the first exposure station in a vertical state, and the second short-side light source provides vertical light sources to the second exposure station in a vertical state. The first short-side light source and the second short-side light source provide left-right cross downward inclined light sources to the second exposure station in an inclined state. The screen glass photoetching machine can meet the exposure requirements of screen glasses with different structures, improve the quality of ink frame forming, and thus improve the quality of mobile phone screens.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of screen production equipment, in particular to a screen glass photoetching machine and a screen glass exposure method. BACKGROUND

[0002] The surface of a mobile phone screen is a glass layer, and the inner surface of the glass layer needs to be processed into an ink frame to block the light leakage part of the screen edge. Currently, the market mainly uses a photoetching development method to prepare an ink frame on the inner surface of the glass layer. First, an ink layer is applied to the inner surface of the glass layer, then a negative photoresist is applied to the surface of the ink layer, then a specific photoetching plate is used for vertical exposure, after exposure, the negative photoresist and the excess ink layer in the middle area are etched off, and finally the remaining negative photoresist at the edge is stripped to obtain an ink frame covering the edge area of the inner surface of the glass layer.

[0003] The glass layer on the market mainly includes three types of flat glass, long curved edge glass and full curved edge glass. The two long edges and two short edges of the flat glass are basically straight or slightly curved. The two long edges of the long curved edge glass are curved with a large radius, and the two short edges are basically straight. The two long edges and two short edges of the full curved edge glass are curved with a large radius.

[0004] When curing the negative photoresist by vertical exposure, the exposure effect of the flat glass is relatively good. However, due to the large radius of the curved edge of the long curved edge glass and the full curved edge glass, the vertical light cannot enter the inner side of the curved edge directly, and the exposure effect is poor. The photoresist covered on the inner side of the curved edge cannot be completely cured, resulting in poor quality of the ink frame formation, and thus seriously affecting the quality of the mobile phone screen. SUMMARY

[0005] The purpose of the present application is to provide a screen glass photoetching machine that can meet the exposure needs of screen glasses of different structures, improve the quality of ink frame formation, and thus improve the quality of mobile phone screens.

[0006] Another purpose of the present application is to provide a screen glass exposure method that can improve the quality of ink frame formation, and thus improve the quality of mobile phone screens.

[0007] Embodiments of the present application provide a technical solution:

[0008] A screen glass photoetching machine, comprising:

[0009] A rack, wherein a first exposure station and a second exposure station are arranged below the rack, and the first exposure station and the second exposure station are arranged in a left-right direction.

[0010] a first long-side light source and a second long-side light source, the first long-side light source and the second long-side light source are fixed on the rack and above the first exposure station, the first long-side light source and the second long-side light source are inclined towards the first exposure station from front to back, for providing front-to-back cross downward inclined light sources to the first exposure station;

[0011] a first short-side light source and a second short-side light source, the first short-side light source and the second short-side light source are movably arranged on the rack, the first short-side light source and the second short-side light source are used to rotate to a vertical state or an inclined state;

[0012] in the vertical state, the first short-side light source vertically downwardly faces the first exposure station to provide a vertical light source to the first exposure station, and the second short-side light source vertically downwardly faces the second exposure station to provide a vertical light source to the second exposure station;

[0013] in the inclined state, the first short-side light source and the second short-side light source are inclined towards the second exposure station from left to right, for providing left-to-right cross downward inclined light sources to the second exposure station.

[0014] in an optional embodiment, the first short-side light source is movably arranged on the rack and vertically above the first exposure station, and the first short-side light source is used to rotate relative to the rack in a vertical plane.

[0015] in an optional embodiment, the rack is provided with a first driving mechanism, the first driving mechanism is connected with the first short-side light source, and is used to drive the first short-side light source to rotate in a vertical plane.

[0016] in an optional embodiment, the rack is provided with a rodless cylinder, and the second short-side light source is movably arranged on the rodless cylinder, and is used to move relative to the rack from left to right under the driving of the rodless cylinder.

[0017] in an optional embodiment, the rack is slidably provided with a second driving mechanism, the second driving mechanism is connected with the second short-side light source, and is used to drive the second short-side light source to rotate in a vertical plane.

[0018] in an optional embodiment, the screen glass photolithography machine further comprises a first carrier, the first carrier is arranged on the first exposure station, and is used to place a screen glass;

[0019] The first long side light source is used for obliquely irradiating the rear side area of the first photolithography plate, the second long side light source is used for obliquely irradiating the front side area of the first photolithography plate, and the first short side light source is used for vertically irradiating the surface of the first photolithography plate in the vertical state.

[0020] In an optional embodiment, the screen glass photolithography machine further comprises a second carrier, which is arranged at the second exposure station and used for placing screen glass.

[0021] The second carrier is arranged above the second photolithography plate, the first short side light source is used for obliquely irradiating the right side area of the second photolithography plate in the inclined state, the second short side light source is used for obliquely irradiating the left side area of the second photolithography plate in the inclined state, and is also used for vertically irradiating the surface of the second photolithography plate in the vertical state.

[0022] Embodiments of the present application also provide a screen glass exposure method applied to the screen glass photolithography machine, and the screen glass exposure method comprises the following steps:

[0023] An integral photolithography plate is arranged at one of the first exposure station and the second exposure station, wherein the integral photolithography plate has two long side light transmission areas distributed in front and back, and two short side light transmission areas distributed in left and right.

[0024] A planar glass is placed below the integral photolithography plate and aligned with the integral photolithography plate, wherein the planar glass has two long straight sides distributed in front and back, and two short straight sides distributed in left and right.

[0025] The first short side light source and the second short side light source are controlled to keep the vertical state, and one of the two is controlled to start to expose the two long straight sides and the two short straight sides of the planar glass through the two long side light transmission areas and the two short side light transmission areas.

[0026] Embodiments of the present application also provide a screen glass exposure method applied to the screen glass photolithography machine, and the screen glass exposure method comprises the following steps:

[0027] A long side photolithography plate is arranged at the first exposure station, and a short side photolithography plate is arranged at the second exposure station, wherein the long side photolithography plate has two long side light transmission areas distributed in front and back, and the short side photolithography plate has two short side light transmission areas distributed in left and right.

[0028] A long curved side glass is placed below the long side photolithography plate and aligned with the long side photolithography plate, wherein the long curved side glass has two long curved sides distributed in front and back, and two short straight sides distributed in left and right.

[0029] controlling the first long-side light source to obliquely irradiate a rear side region of the long-side photoetching plate and the second long-side light source to obliquely irradiate a front side region of the long-side photoetching plate, so as to perform oblique exposure on the two long curved edges of the long curved edge glass;

[0030] placing the long curved edge glass, which has completed the oblique exposure under the long-side photoetching plate, under the short-side photoetching plate;

[0031] controlling the second short-side light source to keep the vertical state and start, so as to perform vertical exposure on the two short straight edges of the long curved edge glass through the two short-side light transmission regions of the short-side photoetching plate.

[0032] The embodiment of the present application further provides a screen glass exposure method applied to the aforementioned screen glass photoetching machine table, and the screen glass exposure method comprises the following steps:

[0033] arranging a long-side photoetching plate at the first exposure station and a short-side photoetching plate at the second exposure station, wherein the long-side photoetching plate has two long-side light transmission regions distributed in front and back, and the short-side photoetching plate has two short-side light transmission regions distributed in left and right;

[0034] placing a full curved edge glass under the long-side photoetching plate and aligning the full curved edge glass with the long-side photoetching plate, wherein the full curved edge glass has two long curved edges distributed in front and back and two short curved edges distributed in left and right;

[0035] controlling the first long-side light source to obliquely irradiate a rear side region of the long-side photoetching plate and the second long-side light source to obliquely irradiate a front side region of the long-side photoetching plate, so as to perform oblique exposure on the two long curved edges of the long curved edge glass;

[0036] placing the full curved edge glass, which has completed the oblique exposure under the long-side photoetching plate, under the short-side photoetching plate;

[0037] controlling the first short-side light source and the second short-side light source to keep the oblique state;

[0038] controlling the first short-side light source to obliquely irradiate a right side region of the short-side photoetching plate and the second short-side light source to obliquely irradiate a left side region of the short-side photoetching plate, so as to perform oblique exposure on the two short curved edges of the full curved edge glass.

[0039] Compared with the prior art, the screen glass photoetching machine table provided by the application can place the plane glass in the first exposure station or the second exposure station when exposing the plane glass, and can vertically irradiate the plane glass by using the corresponding first short side light source or the second short side light source; when exposing the long curved edge glass, the first long side light source and the second long side light source can be used to obliquely irradiate two long curved edges of the long curved edge glass in the first exposure station, the inner sides of the two long curved edges can be irradiated at a better angle, better exposure effect can be obtained, and after completion, the second short side light source can be used to vertically irradiate two short straight edges of the long curved edge glass in the second exposure station; when exposing the full curved edge glass, the first long side light source and the second long side light source can be used to respectively obliquely irradiate two long curved edges of the full curved edge glass in the first exposure station, and after completion, the first short side light source and the second short side light source can be used to respectively obliquely irradiate two short curved edges of the full curved edge glass in the second exposure station, so that the two long curved edges and the two short curved edges can obtain better exposure effect. Therefore, the beneficial effects of the screen glass photoetching machine table provided by the application include that the exposure requirements of screen glasses with different structures can be met, the quality of ink frame forming is improved, and the quality of the mobile phone screen is improved. BRIEF DESCRIPTION OF DRAWINGS

[0040] In order to more clearly illustrate the technical solutions of the embodiments of the application, the following will briefly introduce the drawings needed to be used in the embodiments. It should be understood that the following drawings only show some embodiments of the application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0041] Figure 1 Structure schematic diagram of the screen glass photoetching machine table provided by the first embodiment of the application in one state;

[0042] Figure 2 Structure schematic diagram of the screen glass photoetching machine table provided by the first embodiment of the application in another state;

[0043] Figure 3 Structure schematic diagram of the screen glass photoetching machine table provided by the first embodiment of the application in another state; Figure 2 Structure enlarged schematic diagram of the A area in the screen glass photoetching machine table provided by the first embodiment of the application;

[0044] Figure 4 Structure enlarged schematic diagram of the B area in the screen glass photoetching machine table provided by the first embodiment of the application; Figure 2 Structure enlarged schematic diagram of the B area in the screen glass photoetching machine table provided by the first embodiment of the application;

[0045] Figure 5 Structure schematic diagram of the plane glass being exposed by the first short side light source;

[0046] Figure 6 Structure schematic diagram of the long curved edge glass being exposed by the first long side light source and the second long side light source;

[0047] Figure 7 This is a schematic diagram of the structure of a fully curved glass when its two short curved edges are exposed by a first short-side light source and a second short-side light source.

[0048] Figure 8 A flowchart illustrating a screen glass exposure method provided in a second embodiment of the present invention;

[0049] Figure 9 A flowchart illustrating a screen glass exposure method provided in the third embodiment of the present invention;

[0050] Figure 10 This is a flowchart of a screen glass exposure method provided in the fourth embodiment of the present invention.

[0051] Icons: 100 - Screen glass lithography machine; 110 - Rack; 111 - First exposure station; 112 - Second exposure station; 120 - First long-side light source; 130 - Second long-side light source; 140 - First short-side light source; 150 - Second short-side light source; 160 - First drive mechanism; 170 - Rodless cylinder; 180 - Second drive mechanism; 191 - First stage; 192 - First photomask; 193 - Second stage; 194 - Second photomask; 200 - Flat glass; 300 - Long curved edge glass; 400 - Fully curved edge glass. Detailed Implementation

[0052] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0053] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0054] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0055] In the description of the present application, it should be understood that the terms "upper", "lower", "inner", "outer", "left", "right", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly understood by those skilled in the art, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation of the present application.

[0056] In addition, the terms "first", "second", and the like are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0057] In the description of the present application, it should be noted that, unless otherwise specified and limited, the terms "provided", "connected" and the like should be understood broadly, for example, "connected" can be fixedly connected, or detachably connected, or integrally connected; can be mechanically connected, or electrically connected; can be directly connected, or indirectly connected through an intermediate medium, or the internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0058] The specific embodiments of the present application will be described in detail below with reference to the accompanying drawings.

[0059] First embodiment

[0060] Please refer to Figure 1 and Figure 2 , Figure 1 The screen glass photoetching machine 100 provided by the present embodiment is shown in a state of structure schematic diagram, Figure 2 is a structure schematic diagram of the screen glass photoetching machine 100 in another state.

[0061] The screen glass photoetching machine 100 provided by the present embodiment is used for exposing different screen glasses to light to solidify the edges of the photoresist layer on the screen glasses, so as to facilitate the formation of ink frames after development, etching and glass processing.

[0062] The screen glass photoetching machine 100 includes a rack 110, a first long side light source 120, a second long side light source 130, a first short side light source 140 and a second short side light source 150. The first exposure station 111 and the second exposure station 112 are arranged below the rack 110, and the first exposure station 111 and the second exposure station 112 are arranged along the left and right directions.

[0063] The first long-side light source 120 and the second long-side light source 130 are fixed on the rack 110 and above the first exposure station 111, and the first long-side light source 120 and the second long-side light source 130 are inclined towards the first exposure station 111 from front to back, for providing inclined light sources from front to back and downwards to the first exposure station 111.

[0064] The first short-side light source 140 and the second short-side light source 150 are movably arranged on the rack 110, and the first short-side light source 140 and the second short-side light source 150 are used to rotate to a vertical state or an inclined state.

[0065] In the vertical state, the first short-side light source 140 is vertically downwards to the first exposure station 111, for providing vertical light sources to the first exposure station 111; and the second short-side light source 150 is vertically downwards to the second exposure station 112, for providing vertical light sources to the second exposure station 112.

[0066] In the inclined state, the first short-side light source 140 and the second short-side light source 150 are inclined towards the second exposure station 112 from left to right, for providing inclined light sources from left to right and downwards to the second exposure station 112.

[0067] Figure 1 The direction indicated by the X arrow is the direction from left to right, the direction indicated by the Y arrow is the direction from front to back, and the direction indicated by the Z arrow is the vertical downwards direction.

[0068] It can be understood that the first long-side light source 120 and the second long-side light source 130 are fixedly arranged on the rack 110 in the inclined state, the first long-side light source 120 is inclined to irradiate the first exposure station 111 from front up to back down, the second long-side light source 130 is inclined to irradiate the first exposure station 111 from back up to front down, and the light rays of the two extend and intersect in the vertical plane perpendicular to the direction indicated by the X arrow.

[0069] The first short-side light source 140 is movably arranged on the rack 110 and vertically above the first exposure station 111, and the first short-side light source 140 is used to rotate relative to the rack 110 in the vertical plane perpendicular to the direction indicated by the Y arrow.

[0070] Figure 1 In the illustrated state, the first short-side light source 140 and the second short-side light source 150 are in the vertical state, at this time, the first short-side light source 140 is vertically downwards and faces the first exposure station 111; and the second short-side light source 150 is vertically downwards and faces the second exposure station 112.

[0071] Figure 2In the shown state, the first short side light source 140 and the second short side light source 150 are in an inclined state, at this time, the first short side light source 140 and the second short side light source 150 are respectively located on the left and right sides of the second exposure station 112, the first short side light source 140 is inclined to irradiate the second exposure station 112 from the upper left to the lower right, and the second short side light source 150 is inclined to irradiate the second exposure station 112 from the upper right to the lower left, the light rays of the two extend in the vertical plane perpendicular to the direction indicated by the Y arrow and intersect.

[0072] Please refer to Figure 3 and Figure 4 , Figure 3 as shown in Figure 2 , the structure of the A region is enlarged and shown in the schematic view, Figure 4 as shown in Figure 2 , the structure of the B region is enlarged and shown in the schematic view.

[0073] In this embodiment, the first driving mechanism 160 is arranged on the rack 110, the first driving mechanism 160 is connected with the first short side light source 140, and is used to drive the first short side light source 140 to rotate in the vertical plane.

[0074] Specifically, the first short side light source 140 is installed on the rack 110 through a rotating shaft extending in the front-rear direction, the first driving mechanism 160 is an electric push rod, the output end of the electric push rod is connected with the first short side light source 140 through a rotating floating joint, and the first driving mechanism 160 drives the first short side light source 140 to rotate clockwise or counterclockwise in the plane perpendicular to the direction indicated by the Y arrow.

[0075] The rack 110 is provided with a rodless cylinder 170, the second short side light source 150 is rotatably arranged on the rodless cylinder 170, and is used to move left and right relative to the rack 110 under the driving of the rodless cylinder 170. The second driving mechanism 180 is slidably arranged on the rack 110, the second driving mechanism 180 is connected with the second short side light source 150, and is used to drive the second short side light source 150 to rotate in the vertical plane.

[0076] The rodless cylinder 170 drives the second short side light source 150 to slide in the left-right direction, so as to adjust the horizontal distance between the second short side light source 150 and the first short side light source 140. The second short side light source 150 is also rotatably connected with the rodless cylinder 170 through a rotating shaft extending in the front-rear direction, and the second driving mechanism 180 is also an electric push rod, the output end of the electric push rod is connected with the first short side light source 140 through a rotating floating joint. The second driving mechanism 180 can move in the left-right direction under the driving of the second short side light source 150, and can also drive the second short side light source 150 to rotate clockwise or counterclockwise in the plane perpendicular to the direction indicated by the Y arrow.

[0077] In this embodiment, the screen glass photoetching machine table 100 further comprises a first carrier 191, which is arranged at the first exposure station 111 and used for placing the screen glass. Above the first carrier 191 is arranged a first photoetching plate 192, the first long-side light source 120 is used for obliquely irradiating the rear side region of the first photoetching plate 192, the second long-side light source 130 is used for obliquely irradiating the front side region of the first photoetching plate 192, and the first short-side light source 140 is used for vertically irradiating the surface of the first photoetching plate 192 in a vertical state.

[0078] The screen glass photoetching machine table 100 further comprises a second carrier 193, which is arranged at the second exposure station 112 and used for placing the screen glass. Above the second carrier 193 is arranged a second photoetching plate 194, the first short-side light source 140 is used for obliquely irradiating the right side region of the second photoetching plate 194 in an oblique state, the second short-side light source 150 is used for obliquely irradiating the left side region of the second photoetching plate 194 in an oblique state, and is also used for vertically irradiating the surface of the second photoetching plate 194 in a vertical state.

[0079] The projection of the screen glass placed horizontally on a horizontal plane is approximately rectangular, having two opposite long sides and two opposite short sides. The long side and the short side of the flat glass 200 are both straight, without bending, so the long side is defined as a long straight side, and the short side is defined as a short straight side. The long side of the long-curved-side glass 300 has a certain curvature, and the short side is straight, so the long side is defined as a long curved side, and the short side is defined as a short straight side. The long side and the short side of the full-curved-side glass 400 both have a certain curvature, so the long side is defined as a long curved side, and the short side is defined as a short curved side.

[0080] It can be understood that the structures of the first photoetching plate 192 and the second photoetching plate 194 can be adjusted and replaced according to actual conditions. For example, please refer to FIG. 2A and FIG. 2B. Figure 5 Figure 5 FIG. 2A shows a structure schematic diagram of the flat glass 200 being exposed by the first short-side light source 140. If the flat glass 200 is exposed on the first carrier 191, the first photoetching plate 192 can have two long-side light-transmitting regions distributed in front and back, and two short-side light-transmitting regions distributed in left and right, the two long-side light-transmitting regions correspond to the two long straight sides of the flat glass 200 respectively, and the two short-side light-transmitting regions correspond to the two short straight sides of the flat glass 200 respectively. The first short-side light source 140 vertically irradiates the first photoetching plate 192, realizing one-time exposure of the flat glass 200.

[0081] When the long-curved-side glass 300 needs to be exposed, the first photoetching plate 192 has two long-side light-transmitting regions distributed in front and back, and the second photoetching plate 194 has two short-side light-transmitting regions distributed in left and right. Please refer to FIG. 3A and FIG. 3B. Figure 6 Figure 6 ​​The structure diagram of the long curved edge glass 300 when the long curved edge is exposed is shown. First, the long curved edge glass 300 is placed in the first exposure station 111, and its state is adjusted to be aligned with the first photoetching plate 192, so that the long curved edge extends in the left-right direction, the short straight edge extends in the front-back direction, and the inner side faces upward, i.e., the side coated with the photoresist layer faces upward.

[0082] Then, the first long edge light source 120 and the second long edge light source 130 are used to complete the oblique irradiation of the concave-arc inner side area of the two long curved edges of the long curved edge glass 300 distributed in the front-back direction, and the exposure of the two long curved edges is completed. Specifically, the first long edge light source 120 irradiates the rear side long curved edge on the long curved edge glass 300 through the long edge light transmission area on the rear side of the first photoetching plate 192, and the second long edge light source 130 irradiates the front side long curved edge on the long curved edge glass 300 through the long edge light transmission area on the front side of the first photoetching plate 192.

[0083] After the exposure of the two long curved edges is completed, the long curved edge glass 300 is transferred to the second exposure station 112, and its state is adjusted to be aligned with the second photoetching plate 194. The second short edge light source 150 remains in the vertical state and vertically irradiates the second photoetching plate 194 to realize the exposure of the two short straight edges at the left and right ends of the long curved edge glass 300.

[0084] When the full curved edge glass 400 needs to be exposed, the first photoetching plate 192 has two long edge light transmission areas distributed in the front-back direction, and the second photoetching plate 194 has two short edge light transmission areas distributed in the left-right direction. First, the full curved edge glass 400 is placed in the first exposure station 111, and its state is adjusted to be aligned with the first photoetching plate 192. Then, the first long edge light source 120 and the second long edge light source 130 are used to complete the oblique irradiation of the concave-arc inner side area of the two long curved edges of the full curved edge glass 400 distributed in the front-back direction, and the exposure of the two long curved edges is completed.

[0085] After the exposure of the two long curved edges is completed, the full curved edge glass 400 is transferred to the second exposure station 112, and its state is adjusted to be aligned with the second photoetching plate 194. Please refer to Figure 7 , Figure 7 The structure diagram of the full curved edge glass 400 when the short curved edge is exposed is shown. The first short edge light source 140 and the second short edge light source 150 both remain in the oblique state, and the oblique irradiation of the concave-arc inner side area of the two short curved edges of the full curved edge glass 400 distributed in the left-right direction is completed by using the first short edge light source 140 and the second short edge light source 150, and the exposure of the two short curved edges is completed. Specifically, the first short edge light source 140 irradiates the right side short curved edge on the full curved edge glass 400 through the short edge light transmission area on the right side of the second photoetching plate 194, and the second short edge light source 150 irradiates the left side short curved edge on the full curved edge glass 400 through the short edge light transmission area on the left side of the second photoetching plate 194.

[0086] In summary, the screen glass photoetching machine 100 provided by the embodiment can expose the planar glass 200, the long curved edge glass 300 and the full curved edge glass 400, can meet the exposure requirements of screen glasses with different structures, improve the quality of ink frame forming, and thus improve the quality of mobile phone screens.

[0087] Second embodiment

[0088] Referring to Figure 8 , Figure 8 Fig. 4 is a flow chart of a screen glass exposure method provided by the embodiment, and the screen glass exposure method is applied to the screen glass photoetching machine 100 provided by the first embodiment. Specifically, the screen glass exposure method comprises the following steps.

[0089] In step S101, the integral photoetching plate is arranged at one of the first exposure station 111 and the second exposure station 112.

[0090] The integral photoetching plate has two long side light transmission zones distributed in front and back, and two short side light transmission zones distributed in left and right.

[0091] In step S102, the planar glass 200 is placed below the integral photoetching plate and aligned with the integral photoetching plate.

[0092] The planar glass 200 has two long straight sides distributed in front and back, and two short straight sides distributed in left and right.

[0093] In step S103, the first short side light source 140 and the second short side light source 150 are controlled to keep vertical, and one of the two is controlled to start to expose the two long straight sides and the two short straight sides of the planar glass 200 through the two long side light transmission zones and the two short side light transmission zones.

[0094] The planar glass 200 is exposed on the first carrier 191, and the first photoetching plate 192 is the integral photoetching plate, has two long side light transmission zones distributed in front and back, and two short side light transmission zones distributed in left and right, the two long side light transmission zones correspond to the two long straight sides of the planar glass 200 respectively, and the two short side light transmission zones correspond to the two short straight sides of the planar glass 200 respectively. The first short side light source 140 vertically irradiates the first photoetching plate 192 to realize one-time exposure of the planar glass 200.

[0095] Third embodiment

[0096] Referring to Figure 9 , Figure 9 Fig. 4 is a flow chart of a screen glass exposure method provided by the embodiment, and the screen glass exposure method is applied to the screen glass photoetching machine 100 provided by the first embodiment. Specifically, the screen glass exposure method comprises the following steps.

[0097] Step S201, a long-side photoetching plate is arranged at the first exposure station 111, and a short-side photoetching plate is arranged at the second exposure station 112.

[0098] The long-side photoetching plate has two long-side light-transmitting areas distributed in front and back, and the short-side photoetching plate has two short-side light-transmitting areas distributed in left and right.

[0099] Step S202, the long-curved-edge glass 300 is placed below the long-side photoetching plate and aligned with the long-side photoetching plate.

[0100] The long-curved-edge glass 300 has two long curved edges distributed in front and back, and two short straight edges distributed in left and right.

[0101] Step S203, the first long-side light source 120 is controlled to obliquely irradiate the rear area of the long-side photoetching plate, and the second long-side light source 130 is controlled to obliquely irradiate the front area of the long-side photoetching plate, so as to perform oblique exposure on the two long curved edges of the long-curved-edge glass 300.

[0102] Step S204, the long-curved-edge glass 300, which has completed oblique exposure below the long-side photoetching plate, is placed below the short-side photoetching plate.

[0103] Step S205, the second short-side light source 150 is controlled to keep vertical and start, so as to perform vertical exposure on the two short straight edges of the long-curved-edge glass 300 through the two short-side light-transmitting areas of the short-side photoetching plate.

[0104] The first photoetching plate 192 is the long-side photoetching plate, which has two long-side light-transmitting areas distributed in front and back; the second photoetching plate 194 is the short-side photoetching plate, which has two short-side light-transmitting areas distributed in left and right. First, the long-curved-edge glass 300 is placed at the first exposure station 111, the first long-side light source 120 irradiates the rear long curved edge on the long-curved-edge glass 300 through the long-side light-transmitting area at the rear side of the long-side photoetching plate, and the second long-side light source 130 irradiates the front long curved edge on the long-curved-edge glass 300 through the long-side light-transmitting area at the front side of the long-side photoetching plate, so as to complete exposure on the two long curved edges of the long-side photoetching plate.

[0105] Then, the long-curved-edge glass 300 is transferred below the short-side photoetching plate at the second exposure station 112, and its state is adjusted to be aligned with the short-side photoetching plate, the second short-side light source 150 keeps vertical and irradiates the short-side photoetching plate vertically, so as to realize exposure on the two short straight edges at the left and right ends of the long-curved-edge glass 300.

[0106] Fourth embodiment

[0107] Please refer to Figure 10 , Figure 10A flow chart of the screen glass exposure method provided by the embodiment is shown, which is applied to the screen glass photoetching machine 100 provided by the first embodiment. Specifically, the screen glass exposure method comprises:

[0108] In step S301, a long-side photoetching plate is arranged at the first exposure station 111, and a short-side photoetching plate is arranged at the second exposure station 112.

[0109] The long-side photoetching plate has two long-side light-transmitting regions distributed in front and back, and the short-side photoetching plate has two short-side light-transmitting regions distributed in left and right.

[0110] In step S302, the full-curved-edge glass 400 is placed below the long-side photoetching plate and aligned with the long-side photoetching plate.

[0111] The full-curved-edge glass 400 has two long curved edges distributed in front and back, and two short curved edges distributed in left and right.

[0112] In step S303, the first long-side light source 120 is controlled to obliquely irradiate the rear side region of the long-side photoetching plate, and the second long-side light source 130 is controlled to obliquely irradiate the front side region of the long-side photoetching plate, so as to perform oblique exposure on the two long curved edges of the full-curved-edge glass 400.

[0113] In step S304, the full-curved-edge glass 400, which has completed oblique exposure below the long-side photoetching plate, is placed below the short-side photoetching plate.

[0114] In step S305, the first short-side light source 140 and the second short-side light source 150 are controlled to maintain an oblique state.

[0115] In step S306, the first short-side light source 140 is controlled to obliquely irradiate the right side region of the short-side photoetching plate, and the second short-side light source 150 is controlled to obliquely irradiate the left side region of the short-side photoetching plate, so as to perform oblique exposure on the two short curved edges of the full-curved-edge glass 400.

[0116] When the full-curved-edge glass 400 needs to be exposed, the first photoetching plate 192 is the long-side photoetching plate having two long-side light-transmitting regions distributed in front and back, and the second photoetching plate 194 is the short-side photoetching plate having two short-side light-transmitting regions distributed in left and right. First, the full-curved-edge glass 400 is placed at the first exposure station 111 and adjusted to be aligned with the long-side photoetching plate. Then, the first long-side light source 120 and the second long-side light source 130 are used to complete oblique irradiation on the concave-arc inner side regions of the two long curved edges of the full-curved-edge glass 400 distributed in front and back, and complete exposure of the two long curved edges.

[0117] After the exposure of the two long curved edges is completed, the full curved glass 400 is transferred to the second exposure station 112, and its state is adjusted to be aligned with the short edge photoetching plate. The first short edge light source 140 and the second short edge light source 150 are both kept in an inclined state, the first short edge light source 140 irradiates the right short curved edge on the full curved glass 400 through the short edge light transmission area on the right side of the short edge photoetching plate, and the second short edge light source 150 irradiates the left short curved edge on the full curved glass 400 through the short edge light transmission area on the left side of the short edge photoetching plate, and the exposure of the two short curved edges is completed.

[0118] Benefiting from the beneficial effects of the screen glass photoetching machine platform 100 provided in the embodiment, the screen glass exposure method provided in the application can improve the ink frame forming quality, thereby improving the quality of the mobile phone screen.

[0119] The above only describes the preferred embodiments of the present application and is not used to limit the present application. For those skilled in the art, the present application can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A screen glass lithography machine, characterized in that, include: A frame (110) is provided with a first exposure station (111) and a second exposure station (112) below the frame (110), and the first exposure station (111) and the second exposure station (112) are arranged at intervals in the left and right direction; A first long-side light source (120) and a second long-side light source (130) are fixed on the frame (110) and located above the first exposure station (111). The first long-side light source (120) and the second long-side light source (130) are tilted back and forth toward the first exposure station (111) to provide the first exposure station (111) with tilted light sources that are crossed and pointing downwards. The first short-side light source (140) and the second short-side light source (150) are movably mounted on the frame (110). The first short-side light source (140) and the second short-side light source (150) are used to rotate to a vertical state or an inclined state. In the vertical state, the first short-side light source (140) is vertically downward and directly facing the first exposure station (111) to provide a vertical light source to the first exposure station (111), and the second short-side light source (150) is vertically downward and directly facing the second exposure station (112) to provide a vertical light source to the second exposure station (112); In the tilted state, the first short-side light source (140) and the second short-side light source (150) tilt left and right toward the second exposure station (112) to provide the second exposure station (112) with tilted light sources that cross each other from left to right and downward.

2. The screen glass lithography machine according to claim 1, characterized in that, The first short-side light source (140) is rotatably mounted on the frame (110) and is located vertically above the first exposure station (111). The first short-side light source (140) is used to rotate relative to the frame (110) in a vertical plane.

3. The screen glass lithography machine according to claim 2, characterized in that, The frame (110) is provided with a first drive mechanism (160), which is connected to the first short-side light source (140) and is used to drive the first short-side light source (140) to rotate in the vertical plane.

4. The screen glass lithography machine according to claim 1, characterized in that, A rodless cylinder (170) is provided on the frame (110), and the second short-side light source (150) is rotatably mounted on the rodless cylinder (170) for moving left and right relative to the frame (110) under the drive of the rodless cylinder (170).

5. The screen glass lithography machine according to claim 4, characterized in that, A second drive mechanism (180) is slidably provided on the frame (110). The second drive mechanism (180) is connected to the second short-side light source (150) and is used to drive the second short-side light source (150) to rotate in the vertical plane.

6. The screen glass lithography machine according to claim 1, characterized in that, The screen glass lithography machine (100) also includes a first stage (191), which is disposed at the first exposure station (111) and is used to place the screen glass; A first photomask (192) is disposed above the first stage (191). The first long-side light source (120) is used to obliquely illuminate the rear area of ​​the first photomask (192). The second long-side light source (130) is used to obliquely illuminate the front area of ​​the first photomask (192). The first short-side light source (140) is used to vertically illuminate the surface of the first photomask (192) in the vertical state.

7. The screen glass lithography machine according to claim 1, characterized in that, The screen glass lithography machine (100) also includes a second stage (193), which is located at the second exposure station (112) and is used to place the screen glass. A second photomask (194) is disposed above the second stage (193). The first short-side light source (140) is used to obliquely irradiate the right side region of the second photomask (194) in the tilted state. The second short-side light source (150) is used to obliquely irradiate the left side region of the second photomask (194) in the tilted state, and is also used to vertically irradiate the surface of the second photomask (194) in the vertical state.

8. A method for exposing screen glass, applied to a screen glass lithography machine (100) as described in any one of claims 1-7, characterized in that, The screen glass exposure method includes: An integral photomask is arranged in one of the first exposure station (111) and the second exposure station (112), wherein the integral photomask has two long side light-transmitting areas distributed front and back, and two short side light-transmitting areas distributed left and right. A flat glass (200) is placed below the overall photomask and aligned with it. The flat glass (200) has two long straight edges distributed front and back, and two short straight edges distributed left and right. The first short-side light source (140) and the second short-side light source (150) are controlled to maintain the vertical state, and one of them corresponding to the overall photomask is activated to expose the two long straight edges and two short straight edges of the planar glass (200) through the two long side light transmission areas and the two short side light transmission areas.

9. A method for exposing screen glass, applied to a screen glass lithography machine (100) as described in any one of claims 1-7, characterized in that, The screen glass exposure method includes: A long-side photomask is arranged at the first exposure station (111), and a short-side photomask is arranged at the second exposure station (112). The long-side photomask has two long-side light-transmitting areas distributed front to back, and the short-side photomask has two short-side light-transmitting areas distributed left to right. The long curved glass (300) is placed below the long photomask and aligned with it. The long curved glass (300) has two long curved edges distributed front and back, and two short straight edges distributed left and right. The first long-side light source (120) is controlled to tilt and illuminate the rear area of ​​the long-side photomask, and the second long-side light source (130) is tilted and illuminates the front area of ​​the long-side photomask, so as to tilt and expose the two long curved edges of the long curved glass (300). The long curved glass (300), which has undergone tilted exposure under the long side photomask, is placed below the short side photomask; The second short-side light source (150) is controlled to maintain the vertical state and start so as to vertically expose the two short straight edges of the long curved glass (300) through the two short-side light-transmitting areas of the short-side photomask.

10. A method for exposing screen glass, applied to a screen glass lithography machine (100) as described in any one of claims 1-7, characterized in that, The screen glass exposure method includes: A long-side photomask is arranged at the first exposure station (111), and a short-side photomask is arranged at the second exposure station (112). The long-side photomask has two long-side light-transmitting areas distributed front to back, and the short-side photomask has two short-side light-transmitting areas distributed left to right. The fully curved glass (400) is placed below the long side photomask and aligned with the long side photomask, wherein the fully curved glass (400) has two long curved edges distributed front and back, and two short curved edges distributed left and right; The first long-side light source (120) is controlled to tilt and illuminate the rear area of ​​the long-side photomask, and the second long-side light source (130) is controlled to tilt and illuminate the front area of ​​the long-side photomask, so as to tilt and expose the two long curved edges of the full-curved glass (400). The fully curved glass (400), which has undergone tilted exposure under the long-side photomask, is placed below the short-side photomask; Control the first short-side light source (140) and the second short-side light source (150) to maintain the tilted state; The first short-side light source (140) is controlled to tilt and illuminate the right side region of the short-side photomask, and the second short-side light source (150) is controlled to tilt and illuminate the left side region of the short-side photomask, so as to tilt and expose the two short curved edges of the full-curved glass (400).

Images