A vapor deposition system and a carrier component of a vapor deposition device

Abstract

The present invention discloses a vapor deposition system and a bearing assembly of a vapor deposition device, belonging to the technical field of deposition devices, including an installation box, a movable plate and a cylinder for driving the movable plate to move are arranged on the installation box, a lower plate and an upper plate are arranged on one side of the movable plate from bottom to top, a storage part, a plurality of bearing parts and a conveying unit for transferring samples from the storage part to a plurality of bearing parts are arranged on the upper plate, a plurality of partitions are arranged on the upper surface of the upper plate, and the upper plate is divided into a plurality of areas by the plurality of partitions, and the storage part and the plurality of bearing parts are respectively located in different areas. It is possible to realize the separate deposition of a plurality of samples, and it is also possible to ensure that each sample can be evenly acted upon by the reaction substance, and to avoid mutual interference between samples.

Description

Technical Field

[0001] The present invention relates to the technical field of deposition equipment, and in particular to a vapor deposition system and a bearing component of the vapor deposition equipment. Background Art

[0002] Chemical vapor deposition (CVD) reaction equipment or atomic layer deposition (ALD) reaction equipment rotates the carrier plate (substrate support assembly) on which the processed substrate is placed during deposition, thereby providing a uniform deposition effect for the substrate. A typical vapor deposition reactor structure is a reaction chamber surrounded by the side walls of the reaction chamber, the reaction chamber includes an axis structure, and the substrate tray on which the substrate is placed is installed on the top of the axis structure. The top of the reaction chamber includes a gas shower head, which is used to uniformly inject the reaction gas from the reaction gas source into the reaction chamber to achieve the processing of the substrate. The bottom of the reaction chamber also includes a vacuum device to control the internal air pressure of the reaction chamber and to remove the waste gas generated during the reaction process.

[0003] For example, a Chinese invention patent with publication number CN118048623A discloses a carrier assembly of a vapor deposition device and a vapor deposition device, specifically comprising: a tray body capable of receiving radio frequency radiation to generate an induced current to heat a substrate, on which a plurality of tray positions are circumferentially arranged for placing substrates; a disc-shaped sub-tray for carrying substrates, which can be movably placed on the tray position and rotate around the central axis of the sub-tray; an annular step is arranged around the sub-tray, and its upper surface close to the sub-tray is configured to be lower than the upper surface of the sub-tray; a lifting pin that passes through the tray body and the annular step and can move between a high position and a low position, and whose upper surface is at least partially located under the substrate, for driving the substrate to move up and down when taking and placing the substrate.

[0004] The above solution has the following shortcomings in actual use:

[0005] This solution adopts the thin film deposition process of radio frequency induction heater. By increasing the volume of the annular step parts around the substrate, the heat conversion rate of radio frequency energy in the annular step is increased to prevent uneven film formation caused by too low temperature at the edge of the substrate. At the same time, lifting pins are set in the annular step to cooperate with the robot arm to realize the placement of substrates. In actual use, since multiple substrates are located on the same tray body, although the production efficiency is improved, it cannot ensure that each substrate can be evenly affected by the reaction substances, and mutual interference between substrates cannot be avoided. Summary of the invention

[0006] The object of the present invention is to provide a vapor deposition system and a carrier assembly of a vapor deposition device to solve the problems raised in the above-mentioned background technology.

[0007] To achieve the above object, the present invention provides the following technical solutions:

[0008] A supporting component of a vapor deposition device includes an installation box, on which a movable plate and a cylinder for driving the movable plate are arranged, one side of the movable plate is provided with a lower plate and an upper plate in sequence from bottom to top, the upper plate is provided with a storage piece, a plurality of carriers and a conveying unit for transferring samples from the storage piece to a plurality of carriers respectively, the upper surface of the upper plate is provided with a plurality of partitions, the upper plate is divided into a plurality of areas by the plurality of partitions, and the storage piece and the plurality of carriers are respectively located in different areas.

[0009] Preferably, the conveying unit includes a transfer shell, the bottom of the inner wall of the transfer shell is rotatably connected to a mounting disk, one side of the transfer shell is provided with an actuator for driving the mounting disk to rotate, a conveying member is provided on the mounting disk, and the transfer shell is provided with a plurality of through grooves respectively connected to a plurality of areas.

[0010] Preferably, the conveying member includes a mounting seat, on which a motor is provided, the output shaft of the motor extends to the interior of the mounting seat and is provided with a worm, both sides of the worm are meshed with worm wheels, and a driving shaft is provided on each of the worm wheels, the top end of the driving shaft passes through the mounting seat and is connected to a driving arm, the end of the driving arm is rotatably connected to a connecting arm, the ends of the two connecting arms are rotatably connected to a connecting seat, and a transfer plate and two cylinders for driving the transfer plate to move up and down are provided on the connecting seat.

[0011] Preferably, a cover body is arranged above the transfer shell, the inner wall of the cover body is connected to cylinder three through a bearing plate, a top plate is arranged at the output end of cylinder three, a plurality of baffles corresponding to the through grooves are arranged on the lower surface of the top plate, and a plurality of plug-in strips corresponding to the baffles are arranged on the inner wall of the transfer shell.

[0012] Preferably, the supporting member includes a cylinder four, which is arranged on the lower plate body, and a lifting platform is arranged at the output end of the cylinder four, and a heating plate and a driving motor for driving the heating plate to rotate are arranged on the lifting platform, and an induction coil is arranged in the heating plate.

[0013] Preferably, two arc-shaped placing platforms are provided on the upper surface of the heating plate, a fixing block is provided on one side of the arc-shaped placing platform, a locking bolt is rotatably connected to the fixing block, a threaded hole corresponding to the locking bolt is opened on the upper surface of the heating plate, and a plurality of through holes are opened on the side of the arc-shaped placing platform that abuts against the sample.

[0014] Preferably, the storage member includes a cylinder five, a plurality of partition plates are provided at the output end of the cylinder five, a connecting member is provided between two adjacent partition plates, two arc-shaped placement platforms two are provided on the upper surface of the partition plates, a locking bolt two is rotatably connected to the arc-shaped placement platform two, and a plurality of threaded grooves corresponding to the locking bolts two are opened on the partition plates.

[0015] A vapor deposition system includes a machine base and a supporting component. A control system is arranged on one side of the upper surface of the machine base, a reaction system is arranged on the other side of the upper surface of the machine base, a partial structure of the supporting component is located in the reaction system, and an air path system, a vacuum system and an exhaust system are arranged in the machine base.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] The present invention divides the upper plate into multiple areas by partitions, and under the action of the conveying unit, the samples are transferred from the storage member to multiple carriers for deposition, so that multiple samples can be deposited separately, and each sample can be ensured to be evenly acted upon by the reaction substances, and mutual interference between samples can be avoided. By setting the storage member, the sample can be stored, and the deposited samples can be placed for cooling, avoiding frequent opening of the box door when depositing multiple samples, thereby reducing energy consumption and the use of resources such as gas. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the overall structure of the load-bearing assembly of the present invention;

[0019] Figure 2 It is a cross-sectional view of the overall structure of the load-bearing assembly of the present invention;

[0020] Figure 3 It is a schematic diagram of the structure of the conveying unit of the load-bearing assembly of the present invention;

[0021] Figure 4 It is a partial structural exploded view of the conveying unit of the load-bearing assembly of the present invention;

[0022] Figure 5 It is a schematic diagram of the structure of the bearing member of the bearing assembly of the present invention;

[0023] Figure 6 It is a cross-sectional view of the bearing structure of the bearing assembly of the present invention;

[0024] Figure 7 It is a schematic diagram of the structure of the storage component of the load-bearing assembly of the present invention;

[0025] Figure 8 is a schematic structural diagram of a vapor deposition system of the present invention;

[0026] Fig. 9It is a structural breakdown diagram of the vapor deposition system of the present invention.

[0027] In the figure:

[0028] 1. Installation box; 2. Moving plate; 3. Cylinder 1; 4. Guide column; 5. Lower plate; 6. Upper plate; 7. Transfer shell; 8. Mounting plate; 9. Actuator; 10. Mounting seat; 11. Motor; 12. Worm; 13. Worm gear; 14. Driving shaft; 15. Driving arm; 16. Connecting arm; 17. Connecting seat; 18. Transfer plate; 19. Cylinder 2; 20. Through slot; 21. Connecting strip; 22. Baffle; 23. Top plate; 24. Cylinder 3; 25. Cover; 26. Loading plate; 27. Partition; 28. Cylinder four; 29. ​​Lifting platform; 30. Driving motor; 31. Flexible cover; 32. Heating plate; 33. Induction coil; 34. Arc-shaped placement table one; 35. Fixing block; 36. Locking bolt one; 37. Threaded hole; 38. Through hole one; 39. Cylinder five; 40. Separation plate; 41. Connecting piece; 42. Arc-shaped placement table two; 43. Locking bolt two; 100. Machine base; 200. Control system; 300. Reaction system; 400. Gas system; 500. Vacuum system; 600. Exhaust system. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0030] See also Figure 1-Figure 9 , the present invention provides a technical solution:

[0031] like Figure 1 and Figure 2As shown, a carrier assembly of a vapor deposition device includes an installation box 1, on which a movable plate 2 and a cylinder 3 for driving the movable plate 2 to move are arranged, two guide pillars 4 are sleeved on the movable plate 2, and the ends of the guide pillars 4 are connected to the inner wall of the installation box 1, and one side of the movable plate 2 is sequentially provided with a lower plate 5 and an upper plate 6 from bottom to top, and the upper plate 6 is provided with a storage piece, a plurality of carriers, and a conveying unit for transferring samples from the storage piece to the plurality of carriers respectively. By providing the storage piece, the sample can be stored, and the deposited sample can also be placed for cooling. In order to avoid opening the box door frequently when depositing multiple samples and reduce energy consumption and the use of resources such as gas, a plurality of partitions 27 are arranged on the upper surface of the upper plate body 6, and the upper plate body 6 is divided into a plurality of areas by the plurality of partitions 27. The storage piece and the plurality of carriers are respectively located in different areas. The upper plate body 6 is divided into a plurality of areas by the partitions 27, and the samples are transferred from the storage piece to the plurality of carriers for deposition by the action of the conveying unit. This enables the separate deposition of multiple samples, ensures that each sample is evenly affected by the reaction substance, and avoids mutual interference between samples.

[0032] like Figure 3 and Figure 4 As shown, the conveying unit includes a transfer shell 7, the bottom of the inner wall of the transfer shell 7 is rotatably connected to a mounting plate 8, one side of the transfer shell 7 is provided with an actuator 9 for driving the mounting plate 8 to rotate, a conveying member is provided on the mounting plate 8, and the transfer shell 7 is provided with a plurality of through grooves 20 respectively connected to a plurality of areas. The mounting plate 8 starts to rotate by controlling the actuator 9 to make the conveying side of the conveying member align with the through groove 20 of the corresponding area, and then the sample is conveyed to the storage member or a plurality of carriers under the action of the conveying member.

[0033] Furthermore, the conveying member includes a mounting seat 10, on which a motor 11 is arranged, the output shaft of the motor 11 extends to the interior of the mounting seat 10 and is provided with a worm 12, on both sides of the worm 12 are meshed worm wheels 13, and on each of the worm wheels 13 are provided a driving shaft 14, the top end of the driving shaft 14 passes through the mounting seat 10 and is connected to a driving arm 15, the end of the driving arm 15 is rotatably connected to a connecting arm 16, the ends of the two connecting arms 16 are rotatably connected to a connecting seat 17, and the connecting seat 17 is provided with a transfer plate 18 and a cylinder 2 19 for driving the transfer plate 18 to move up and down. By controlling the operation of the motor 11, the drive shaft 14 drives the drive arm 15 to start rotating under the transmission of the worm 12 and the worm wheel 13, and the transfer plate 18 is pushed to start moving under the cooperation of the connecting arm 16, and the transfer plate 18 is driven up and down by the cylinder 2 19 to realize the taking and placing of the sample.

[0034] Furthermore, a cover body 25 is arranged above the transfer shell 7, and a sealing strip is arranged on the abutting side of the cover body 25 and the transfer shell 7. The inner wall of the cover body 25 is connected to the cylinder three 24 through the supporting plate 26. The output end of the cylinder three 24 is provided with a top plate 23, and the lower surface of the top plate 23 is provided with a plurality of baffles 22 corresponding to the through grooves 20. The inner wall of the transfer shell 7 is provided with a plurality of plug-in strips 21 corresponding to the baffles 22, and a sealing ring is arranged on the abutting side of the plug-in strips 21 and the baffles 22. By arranging the sealing strips and the sealing rings, the relative sealing of each area can be ensured during the deposition process, so that the samples can be evenly affected by the reaction substances during deposition, and mutual interference between samples can be avoided.

[0035] like Figure 5 and Figure 6 As shown, the bearing member includes a cylinder 28, which is arranged on the lower plate 5, and a lifting platform 29 is arranged at the output end of the cylinder 28. A groove corresponding to the lifting platform 29 is opened on the upper plate 6, and a flexible cover 31 is arranged between the bottom of the lifting platform 29 and the inner wall of the groove. A heating plate 32 and a driving motor 30 for driving the heating plate 32 to rotate are arranged on the lifting platform 29, and an induction coil 33 is arranged in the heating plate 32. When the sample is heated, the induction coil 33 generates an alternating magnetic field, so that eddy currents are generated inside the heated object, thereby achieving heating. It also includes a power supply system, which provides high-frequency alternating current to the induction coil to generate the required alternating magnetic field; a cooling system, which takes away the heat generated by the induction coil and keeps the coil working within a suitable temperature range; a heat insulation structure, which reduces heat loss during induction heating, improves heating efficiency, and protects other parts of the equipment from high temperature; a control system, which accurately controls the induction heating process, including temperature control, power control, time control, etc.

[0036] Specifically, by controlling the operation of cylinder 28 to adjust the height of the heating plate 32 and the sample, the distance between the sample and the evaporation source can be accurately controlled to improve the deposition efficiency. By driving the motor 30 to rotate the heating plate 32 and the sample at a certain rate, uniform distribution of the material can be ensured.

[0037] Furthermore, two arc-shaped placement platforms 34 are provided on the upper surface of the heating plate 32, and a fixing block 35 is provided on one side of the arc-shaped placement platform 34. A locking bolt 36 is rotatably connected to the fixing block 35. A threaded hole 37 corresponding to the locking bolt 36 is provided on the upper surface of the heating plate 32, and a plurality of through holes 38 are provided on the side of the arc-shaped placement platform 34 that abuts against the sample. By providing two arc-shaped placement platforms 34 for carrying the sample, it is convenient to take and place the sample and can also avoid the sample and the arc-shaped placement platform 34 from slipping. By providing a plurality of through holes 38 on the arc-shaped placement platform 34, it can be ensured that the sample is heated evenly. By rotating the locking bolt 36 to separate it from the threaded hole 37, and then adjusting the position of the arc-shaped placement platform 34, it can be suitable for samples of different sizes.

[0038] like Figure 7 As shown, the storage member includes a cylinder five 39, and a plurality of partition plates 40 are provided at the output end of the cylinder five 39. A connecting member 41 is provided between two adjacent partition plates 40. Two arc-shaped placing tables 42 are provided on the upper surface of the partition plates 40. Locking bolts 43 are rotatably connected to the arc-shaped placing tables 42. A plurality of threaded grooves corresponding to the locking bolts 43 are provided on the partition plates 40. Specifically, when depositing the samples, the actuator 9 is controlled to make the mounting plate 8 start to rotate, and then the conveying member takes the samples on the partition plates 40 with the cooperation of the cylinder five 39, and then transports them to the designated carrier for vapor deposition. After the deposition is completed, the conveying member transports the deposited samples to the corresponding partition plates 40 for cooling. When all the samples are deposited, the staff unloads the samples.

[0039] like Figure 8 and Fig. 9As shown, a vapor deposition system includes a machine base 100 and a bearing assembly, a control system 200 is arranged on one side of the upper surface of the machine base 100, a reaction system 300 is arranged on the other side of the upper surface of the machine base 100, a partial structure of the bearing assembly is located in the reaction system 300, a plurality of partition plates are arranged in the reaction system 300, when the bearing assembly is moved into the reaction system 300, the plurality of partition plates are respectively aligned with the plurality of partition plates 27, so that the area forms a relatively sealed environment, a gas path system 400, a vacuum system 500 and an exhaust system 600 are arranged in the machine base 100, wherein the control system 200 monitors various parameters of the vapor deposition equipment The reaction system 300 is the core place where chemical reactions or physical changes occur, and it provides a closed, stable and controlled space for the vapor deposition process. The gas system 400 is responsible for delivering the reaction gas and carrier gas to the reaction chamber, and accurately controlling parameters such as gas flow, proportion and pressure. The vacuum system 500 removes air and other impurity gases in the reaction system 300 to maintain a stable pressure in the reaction system 300. The exhaust system 600 is used to remove waste gas and excess reaction gas generated during the reaction, maintain a stable pressure in the reaction chamber, and prevent waste gas from polluting the environment.

[0040] The working process of this embodiment is as follows: before starting the device, it is necessary to check each component of the device to ensure that the mechanical structure, electrical system, gas system, heating system, vacuum system, etc. of the device are in normal working condition, select appropriate sample materials and clean the samples, place the cleaned samples in the storage part, and under the action of cylinder 1 3, make the movable plate 2 fit with the reaction system 300, then control the actuator 9 to make the mounting disk 8 start to rotate, so that the conveying side of the conveying part is opposite to the through groove 20 of the corresponding storage part, and then the conveying part takes out the sample and places it on the carrier, control the cylinder 3 24 to make the baffle 22 block the through groove 20, start the reaction system 300, the gas system 400 and the vacuum system 500 through the control system 200, and perform vapor deposition. After the deposition is completed, the baffle 22 moves up, and then the conveying part takes out the sample from the carrier and places it on the storage part for cooling, and repeats the above steps to deposit the next sample.

[0041] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A carrier assembly of a vapor deposition device, comprising a mounting box, characterized in that: The installation box is provided with a movable plate body and a cylinder for driving the movable plate body to move, one side of the movable plate body is provided with a lower plate body and an upper plate body in sequence from bottom to top, the upper plate body is provided with a storage piece, a plurality of carriers and a conveying unit for transferring samples from the storage piece to the plurality of carriers respectively, the upper surface of the upper plate body is provided with a plurality of partitions, the upper plate body is divided into a plurality of areas by the plurality of partitions, and the storage piece and the plurality of carriers are respectively located in different areas; The conveying unit includes a transfer shell, the bottom of the inner wall of the transfer shell is rotatably connected to a mounting disk, one side of the transfer shell is provided with an actuator for driving the mounting disk to rotate, a conveying member is provided on the mounting disk, and the transfer shell is provided with a plurality of through grooves respectively connected to a plurality of areas.

2. The carrier assembly of a vapor deposition device according to claim 1, characterized in that: The conveying member includes a mounting seat, on which a motor is arranged, the output shaft of the motor extends to the interior of the mounting seat and is provided with a worm, worm wheels are meshed on both sides of the worm, and a driving shaft is provided on each of the worm wheels, the top end of the driving shaft passes through the mounting seat and is connected to a driving arm, the end of the driving arm is rotatably connected to a connecting arm, the ends of the two connecting arms are rotatably connected to a connecting seat, a transfer plate and two cylinders for driving the transfer plate to move up and down are provided on the connecting seat.

3. The supporting assembly of a vapor deposition device according to claim 1, characterized in that: A cover body is arranged above the transfer shell, and the inner wall of the cover body is connected to cylinder three through a bearing plate, a top plate is arranged at the output end of cylinder three, a plurality of baffles corresponding to the through grooves are arranged on the lower surface of the top plate, and a plurality of plug-in strips corresponding to the baffles are arranged on the inner wall of the transfer shell.

4. The supporting assembly of a vapor deposition device according to claim 1, characterized in that: The supporting member includes a cylinder four, which is arranged on the lower plate body. A lifting platform is arranged at the output end of the cylinder four, and a heating plate and a driving motor for driving the heating plate to rotate are arranged on the lifting platform. An induction coil is arranged in the heating plate.

5. The supporting assembly of a vapor deposition device according to claim 4, characterized in that: Two arc-shaped placement platforms are arranged on the upper surface of the heating plate, a fixing block is arranged on one side of the arc-shaped placement platform, a locking bolt is rotatably connected to the fixing block, threaded holes corresponding to the locking bolt are opened on the upper surface of the heating plate, and a plurality of through holes are opened on the side of the arc-shaped placement platform that abuts against the sample.

6. The supporting assembly of a vapor deposition device according to claim 1, characterized in that: The storage part includes a cylinder five, and a plurality of partition plates are arranged at the output end of the cylinder five, and a connecting piece is arranged between two adjacent partition plates. Two arc-shaped placement platforms two are arranged on the upper surface of the partition plates, and a locking bolt two is rotatably connected to the arc-shaped placement platform two, and a plurality of threaded grooves corresponding to the locking bolt two are opened on the partition plates.

7. A vapor deposition system, characterized in that: It comprises a machine base and a bearing assembly as described in any one of claims 1 to 6, wherein a control system is arranged on one side of the upper surface of the machine base, a reaction system is arranged on the other side of the upper surface of the machine base, a partial structure of the bearing assembly is located in the reaction system, and an air path system, a vacuum system and an exhaust system are arranged in the machine base.

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