Waveguide diffraction assembly, manufacturing method thereof and AR display device

Abstract

The invention provides a waveguide diffraction assembly, a manufacturing method thereof and an AR display device. The waveguide diffraction assembly includes: a substrate; the first optical cement structure is formed on the surface of one side of the substrate through nanoimprint; the first isolation layer covers the side, away from the substrate, of the first optical cement structure in a shape follow-up mode, so that the side face and the top face of the first optical cement structure are wrapped by the first isolation layer; the functional layer covers the side, away from the substrate, of the first isolation layer in a shape follow-up mode, the refractive index of the functional layer is larger than that of the first optical cement structure, and the functional layer serves as an enhancement layer or a diffraction grating. The waveguide diffraction assembly solves the problem that the waveguide diffraction assembly in the prior art is difficult to give consideration to display quality stability and improvement of diffraction efficiency at the same time.

Description

Technical Field

[0001] The present invention relates to the technical field of diffraction optical equipment, and in particular to a waveguide diffraction component and a manufacturing method thereof, and an AR display device. Background Art

[0002] With the widespread application of semiconductor processing technology, for example, in the field of augmented reality, waveguide diffraction components are usually used for light coupling, pupil expansion and coupling out. Waveguide diffraction components are usually made by nanoimprinting. The refractive index of the nanoimprint optical adhesive material used to make the diffraction grating in the waveguide diffraction component is currently in the range of 1.1-2.0. Its diffraction efficiency is limited by the material itself and is difficult to improve. In order to improve the efficiency, an enhancement layer is often set on the diffraction grating, such as the patent with publication number CN114217438A. Usually, the material of the enhancement layer is TiO2, which has the best effect. Setting an enhancement layer on the coupling grating can improve the efficiency of the light transmitted by the micro-projector entering the coupling grating. Setting an enhancement layer at the coupling grating is expected to solve the problem of the bright bar in the middle of the display.

[0003] However, setting an enhancement layer on the surface of the diffraction grating in the prior art will bring new problems. Since TiO2 is a metal oxide, its advantage is that it can provide a higher refractive index and improve optical performance, but it also has inherent disadvantages. TiO2 is a photocatalyst. Under ultraviolet light, it will catalyze the imprinted grating material in the diffraction grating - acrylic acid, causing the refractive index of acrylic to change, affecting the display quality of the waveguide diffraction component.

[0004] At the same time, the diffraction grating material in the prior art is usually nano-imprinted optical adhesive, and the refractive index of the optical adhesive often cannot reach the high refractive index characteristics required by the current waveguide design. Therefore, the diffraction efficiency of the waveguide diffraction component is limited by the refractive index of the diffraction grating material.

[0005] That is to say, the waveguide diffraction assembly in the prior art has the problem that it is difficult to achieve both stability of display quality and improvement of diffraction efficiency at the same time. Summary of the invention

[0006] The main purpose of the present invention is to provide a waveguide diffraction component and a manufacturing method thereof, and an AR display device, so as to solve the problem that it is difficult to simultaneously take into account the stability of display quality and the improvement of diffraction efficiency in the waveguide diffraction component in the prior art.

[0007] In order to achieve the above-mentioned purpose, according to one aspect of the present invention, there is provided a waveguide diffraction component, comprising: a substrate; a first optical adhesive structure, the first optical adhesive structure is formed on a surface of one side of the substrate by nanoimprinting; a first isolation layer, the first isolation layer is conformally covered on a side of the first optical adhesive structure away from the substrate, so that the side and top surfaces of the first optical adhesive structure are covered by the first isolation layer; a functional layer, the functional layer is conformally covered on a side of the first isolation layer away from the substrate, the refractive index of the functional layer is greater than the refractive index of the first optical adhesive structure, and the functional layer is used as an enhancement layer or as a diffraction grating.

[0008] Furthermore, the first optical adhesive structure is a first diffraction grating, and the material of the functional layer is TiO2 or Nb2O5. In this case, the functional layer is used as an enhancement layer.

[0009] Furthermore, the functional layer is a second diffraction grating, and the waveguide diffraction assembly also includes a second isolation layer and a second optical adhesive layer, the second isolation layer conformally covers the side of the second diffraction grating away from the substrate, so that the first isolation layer and the second isolation layer sandwich the second diffraction grating therebetween, and the second optical adhesive layer is filled and arranged on the side of the second isolation layer away from the substrate.

[0010] Furthermore, the distance from the surface of the second optical adhesive layer on one side away from the substrate to the substrate is greater than the distance from the position of the second isolation layer farthest from the substrate to the substrate.

[0011] Furthermore, a surface of the second optical adhesive layer away from the substrate is a plane.

[0012] Furthermore, the material of the first isolation layer is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, and CeO2; and / or the material of the second isolation layer is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, and CeO2.

[0013] Furthermore, the thickness of the first isolation layer is greater than or equal to 1 nm and less than or equal to 5 nm; and the thickness of the second isolation layer is greater than or equal to 1 nm and less than or equal to 5 nm.

[0014] Furthermore, the material of the second diffraction grating is TiO2 or Nb2O5.

[0015] Furthermore, there are multiple first optical adhesive structures, and the multiple first optical adhesive structures are all arranged perpendicular to one side surface of the substrate, or the multiple first optical adhesive structures are all arranged obliquely to one side surface of the substrate.

[0016] According to another aspect of the present invention, an AR display device is provided, comprising the above-mentioned waveguide diffraction component.

[0017] According to another aspect of the present invention, a method for manufacturing a waveguide diffraction component is provided. The waveguide diffraction component is manufactured by the manufacturing method, and the manufacturing method comprises: step S1: obtaining a substrate, coating a first optical adhesive material on one side surface of the substrate, and using a master plate with a structure to emboss and demold the first optical adhesive material to form a first optical adhesive structure of the waveguide diffraction component; step S2: using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form Al2O3 or SiO2 with a thickness greater than or equal to 1nm and less than or equal to 5nm on the side of the first optical adhesive structure away from the substrate to form a first isolation layer of the waveguide diffraction component; step S3: using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to set TiO2 or Nb2O5 on the side of the first isolation layer away from the substrate to form a functional layer of the waveguide diffraction component.

[0018] Applying the technical solution of the present invention, the waveguide diffraction component includes a substrate, a first optical adhesive structure, a first isolation layer and a functional layer, the first optical adhesive structure is formed on a surface of one side of the substrate by nanoimprinting; the first isolation layer is conformally covered on a side of the first optical adhesive structure away from the substrate, so that the side and top surfaces of the first optical adhesive structure are covered by the first isolation layer; the functional layer is conformally covered on a side of the first isolation layer away from the substrate, the refractive index of the functional layer is greater than the refractive index of the first optical adhesive structure, and the functional layer is used as an enhancement layer or as a diffraction grating.

[0019] By setting a first isolation layer between the functional layer and the first optical adhesive structure, the first isolation layer can separate the functional layer and the first optical adhesive structure, thereby preventing the material of the functional layer from chemically reacting with the material of the first optical adhesive structure, avoiding the risk of the refractive index of the first optical adhesive structure changing to affect the diffraction efficiency of the waveguide diffraction assembly, greatly improving the structural stability of the first optical adhesive structure, ensuring the reliability of use and the stability of display quality of the waveguide diffraction assembly, and helping to extend the service life of the waveguide diffraction assembly. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] The drawings constituting a part of the present application are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0021] Figure 1 A schematic structural diagram of a waveguide diffraction assembly according to a first embodiment of the present invention is shown;

[0022] Figure 2 A schematic structural diagram of a waveguide diffraction assembly according to a second embodiment of the present invention is shown;

[0023] Figure 3A schematic structural diagram of a waveguide diffraction assembly according to another optional embodiment of the present invention is shown;

[0024] Figure 4 Shows Figure 2 A top view of various structural shapes of the second diffraction grating in FIG.

[0025] The above drawings include the following reference numerals:

[0026] 10. substrate; 20. first optical adhesive structure; 30. first isolation layer; 41. enhancement layer; 42. second diffraction grating; 50. second isolation layer; 60. second optical adhesive layer. DETAILED DESCRIPTION

[0027] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0028] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meanings as commonly understood by ordinary technicians in the technical field to which this application belongs.

[0029] In the present invention, unless otherwise specified, the directional words used, such as "up, down, top, bottom", usually refer to the directions shown in the drawings, or to the components themselves in the vertical, perpendicular or gravity directions; similarly, for ease of understanding and description, "inside and outside" refer to the inside and outside relative to the outline of each component itself, but the above-mentioned directional words are not used to limit the present invention.

[0030] In order to solve the problem in the prior art that it is difficult to simultaneously take into account the stability of display quality and the improvement of diffraction efficiency in a waveguide diffraction component, the present invention provides a waveguide diffraction component, a manufacturing method thereof, and an AR display device.

[0031] like Figures 1 to 4 As shown, the waveguide diffraction component includes a substrate 10, a first optical adhesive structure 20, a first isolation layer 30 and a functional layer. The first optical adhesive structure 20 is formed on a surface of one side of the substrate 10 by nanoimprinting; the first isolation layer 30 is conformally covered on a side of the first optical adhesive structure 20 away from the substrate 10, so that the side and top surfaces of the first optical adhesive structure 20 are covered by the first isolation layer 30; the functional layer is conformally covered on a side of the first isolation layer 30 away from the substrate 10, the refractive index of the functional layer is greater than the refractive index of the first optical adhesive structure 20, and the functional layer is used as an enhancement layer 41 or as a diffraction grating.

[0032] By setting the first isolation layer 30 between the functional layer and the first optical adhesive structure 20, the first isolation layer 30 can separate the functional layer and the first optical adhesive structure 20, thereby preventing the material of the functional layer from chemically reacting with the material of the first optical adhesive structure 20, avoiding the risk of the refractive index of the first optical adhesive structure 20 changing and affecting the diffraction efficiency of the waveguide diffraction assembly, greatly improving the structural stability of the first optical adhesive structure 20, ensuring the reliability of use and the stability of display quality of the waveguide diffraction assembly, and helping to extend the service life of the waveguide diffraction assembly.

[0033] The above functional layer can be used as the enhancement layer 41 in one embodiment of the present application, and can be used as the diffraction grating in another embodiment of the present application. The material of the functional layer is the same, and the material of the functional layer is TiO2 or Nb2O5. The following is a description of the specific embodiments and drawings.

[0034] In the first embodiment of the present application, Figure 1 As shown, there are multiple first optical adhesive structures 20, and multiple first optical adhesive structures 20 are arranged at intervals on one side surface of the substrate 10, and the first isolation layer and the functional layer are sequentially covered on the side of the multiple first optical adhesive structures 20 away from the substrate 10. So that the surface of the first isolation layer 30 facing the substrate 10 is in contact with the top surface, the side surface and the surface of the substrate 10 between two adjacent optical adhesive structures of the first optical adhesive structure 20. In this embodiment, the first optical adhesive structure 20 is a first diffraction grating, and the functional layer is used as an enhancement layer 41. By setting the first isolation layer 30, the chemical properties of the first diffraction grating can be stabilized by the first isolation layer 30 without affecting the diffraction performance of the waveguide diffraction component, so as to prevent the optical efficiency of the waveguide diffraction component from being affected by the reaction between the material of the enhancement layer 41 and the nanoimprint optical adhesive in the first diffraction grating. At the same time, the reliability of the waveguide diffraction component can be improved, and the service life of the device including the waveguide diffraction component can be extended. Since the first optical adhesive structure 20 in this embodiment is used as a first diffraction grating to achieve light coupling-in, pupil expansion and light coupling-out, the enhancement layer 41 is provided so that the enhancement layer 41 can improve the diffraction efficiency of the first diffraction grating.

[0035] The present application also provides a method for manufacturing a waveguide diffraction component, wherein the method is used to manufacture the waveguide diffraction component. Figure 1 The waveguide diffraction component in the present invention comprises:

[0036] Step S1: obtaining a substrate 10, coating a first optical adhesive material on one side surface of the substrate 10, and using a master plate or a daughter plate with a grating structure to emboss and demold the first optical adhesive material, thereby forming a first optical adhesive structure 20 of a waveguide diffraction component, that is, a first diffraction grating, and the first diffraction grating is multiple;

[0037] Step S2: forming Al2O3 or SiO2 with a thickness of 1 nm or more and 5 nm or less on one side of the plurality of first diffraction gratings away from the substrate 10 by using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a first isolation layer 30 of the waveguide diffraction component;

[0038] Step S3: TiO2 or Nb2O5 is grown on the surface of the first isolation layer 30 away from the substrate 10 by using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a functional layer of the waveguide diffraction component, that is, the enhancement layer 41.

[0039] In summary, the first diffraction grating is formed on the surface of the substrate 10 by nanoimprinting, so the first diffraction grating is an optical adhesive material. The structural shape of the first diffraction grating is determined by the grating structure carried by the master plate or the daughter plate, and the shape of the first diffraction grating is any grating shape that can be processed by nanoimprinting, such as a rectangular grating, a step grating, a tilted grating, a blazed grating, and a two-dimensional diffraction grating.

[0040] In the second embodiment of the present application, Figure 2 and Figure 3 As shown, a plurality of first optical adhesive structures 20 arranged at intervals are arranged on the surface of one side of the substrate 10, and the first isolation layer 30 and the functional layer are sequentially conformally covered on the side of the plurality of first optical adhesive structures 20 away from the substrate 10. In this embodiment, the functional layer is a second diffraction grating 42, that is, in this embodiment, the functional layer is used as the second diffraction grating 42 to achieve coupling, pupil expansion and coupling out of light. At this time, the waveguide diffraction component also includes a second isolation layer 50 and a second optical adhesive layer 60. The second isolation layer 50 conformally covers the side of the second diffraction grating 42 away from the substrate 10, so that the first isolation layer 30 and the second isolation layer 50 sandwich the second diffraction grating 42 therebetween, and the second optical adhesive layer 60 is filled and arranged on the side of the second isolation layer 50 away from the substrate 10. In this embodiment, the material of the second diffraction grating 42 is TiO2 or Nb2O5.

[0041] Since the first optical adhesive structure 20 is provided, the second diffraction grating 42 conformally covered thereon is formed according to the shape of the first optical adhesive structure 20. The shape of the second diffraction grating 42 can be adjusted by adjusting the shape of the first optical adhesive structure 20, so as to increase the diversity of the types of the second diffraction grating 42. At the same time, by providing the first isolation layer 30 and the second isolation layer 50 to sandwich the second diffraction grating 42 therebetween, the first isolation layer 30 and the second isolation layer 50 can protect the second diffraction grating 42, and can effectively avoid the first optical adhesive structure 20, the second optical adhesive layer 60 and the second diffraction grating 42 from chemically reacting, thereby affecting the refractive index of the second diffraction grating 42, and ensure the reliability of the second diffraction grating 42. In addition, the refractive indexes of the first optical adhesive structure 20 and the second optical adhesive layer 60 are both smaller than the refractive index of the second diffraction grating 42. The first optical adhesive structure 20 and the second optical adhesive layer 60 are provided to wrap the second diffraction grating 42 and the two isolation layers, so that the second diffraction grating 42 has diffraction conditions. TiO2 or Nb2O5 is selected as the material of the second diffraction grating 42 to ensure that the second diffraction grating 42 has a high refractive index and a high diffraction efficiency, which is beneficial to ensure that the diffraction efficiency of the waveguide diffraction component is high, the display effect is good, and it is not easy to have "refractive index change" or "foggy appearance", etc., and the reliability is strong.

[0042] like Figure 2 and Figure 3 As shown, the surface of the second optical adhesive layer 60 on the side away from the substrate 10 is a plane. The structure of the surface of the second optical adhesive layer 60 on the side facing the substrate 10 is equivalent to meshing with the gap between the two adjacent first optical adhesive structures 20 on the side of the second isolation layer 50 away from the substrate 10, so that the substrate 10, the first optical adhesive structure 20, the first isolation layer 30, the second diffraction grating 42, the second isolation layer 50 and the second optical adhesive layer 60 form a whole. The second diffraction grating 42 is a one-layer structure. The heights and shapes of the multiple first optical adhesive structures 20 shown in the figure are the same, so a second diffraction grating 42 of a uniform shape can be formed. The distance from the surface of the second optical adhesive layer 60 on the side away from the substrate 10 to the substrate 10 is greater than the distance from the position of the second isolation layer 50 farthest from the substrate 10 to the substrate 10. That is to say, the distance from the side surface of the second optical adhesive layer 60 away from the substrate 10 to the substrate 10 is greater than the distance from the second isolation layer 50 located on the first optical adhesive structure 20 to the substrate 10, that is, the thickness of the second optical adhesive layer 60 is higher than the second isolation layer 50 on the first optical adhesive structure 20, which is conducive to ensuring the rationality of the thickness of the second optical adhesive layer 60, so that the second optical adhesive layer 60, the substrate 10 and the first optical adhesive structure 20 can protect two isolation layers and a second diffraction grating 42 therein, which is conducive to ensuring the structural stability of the second diffraction grating 42.

[0043] Specifically, the material of the first isolation layer 30 is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, and CeO2; the material of the second isolation layer 50 is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, and CeO2. Al2O3 and SiO2 materials have good stability and are not prone to catalysis, oxidation, corrosion, and other reactions with the optical adhesive material or the material of the functional layer, and can effectively isolate the first optical adhesive structure 20 from the functional layer.

[0044] Specifically, the thickness of the first isolation layer 30 is greater than or equal to 1 nm and less than or equal to 5 nm. When the thickness of the first isolation layer 30 is set too small, it is not conducive to the isolation effect of the first isolation layer 30 on the first optical adhesive structure 20 and the enhancement layer 41. When the thickness of the first isolation layer 30 is set to be large, it will have an adverse effect on the optical performance of the waveguide diffraction component and the efficiency improvement effect of the enhancement layer 41. The thickness of the second isolation layer 50 is greater than or equal to 1 nm and less than or equal to 5 nm. When the thickness of the second isolation layer 50 is set too small, it is not conducive to the isolation effect of the second isolation layer 50 on the second diffraction grating 42 and the second optical adhesive layer 60. When the thickness of the second isolation layer 50 is set to be large, it will have an adverse effect on the optical performance of the waveguide diffraction component and the efficiency improvement effect of the second diffraction grating 42. It should be noted here that the thickness of the first isolation layer 30 at each position is consistent, and the thickness of the second isolation layer 50 at each position is consistent.

[0045] like Figure 1 and Figure 2 In the specific embodiment shown, the plurality of first optical adhesive structures 20 are arranged perpendicular to a side surface of the substrate 10. Figure 2 In the specific embodiment shown in , since the first optical adhesive structure 20 is arranged perpendicular to the substrate 10, an arched second diffraction grating 42 perpendicular to the substrate 10 is formed. Figure 3 In the specific embodiment shown, the plurality of first optical adhesive structures 20 are arranged obliquely to one side surface of the substrate 10 , thereby forming an arched second diffraction grating 42 oblique to the substrate 10 .

[0046] The present application also provides a method for manufacturing a waveguide diffraction component, wherein the method is used to manufacture the waveguide diffraction component. Figure 2 The waveguide diffraction component in the present invention comprises:

[0047] Step S1: Obtain a substrate 10, apply a first optical adhesive material on one side surface of the substrate 10, and use a master plate or a daughter plate with a grating structure to emboss and demold the first optical adhesive material to form a first optical adhesive structure 20 of a waveguide diffraction component. There are multiple first optical adhesive structures 20. It should be noted here that some residual adhesive will remain after the nanoimprint process, which is not shown in the figure, but can be understood by those skilled in the art.

[0048] Step S2: growing one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, CeO2 with a thickness of 1 nm or more and 5 nm or less on one side of the plurality of first optical adhesive structures 20 away from the substrate 10 by using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a first isolation layer 30 of the waveguide diffraction component;

[0049] Step S3: growing TiO2 or Nb2O5 on a surface of the first isolation layer 30 away from the substrate 10 by using a method selected from the group consisting of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a functional layer of a waveguide diffraction component, namely, a second diffraction grating 42;

[0050] Step S4: growing one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, CeO2 with a thickness of 1 nm or more and 5 nm or less on a surface of the second diffraction grating 42 away from the substrate 10 by using a method selected from the group consisting of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a second isolation layer 50 of the waveguide diffraction component;

[0051] Step S5: forming a second optical adhesive layer 60 on a surface of the second isolation layer 50 away from the substrate 10 by spin coating or embossing with a blank master plate / daughter plate.

[0052] In addition, the manufacturing method of the second embodiment of the present invention can also process the second diffraction grating 42 of other shapes. The top cross-sectional views of the second diffraction grating 42 with different structures are shown in FIG. Figure 4 As shown in ah, Figure 4 For example, the side cross-sectional view of Figure a is still the same as Figure 2 Same. Note Figure 4 Only the shape of the second diffraction grating 42 is shown, and the first isolation layer 30 , the second isolation layer 50 , the first optical adhesive structure 20 , and the second optical adhesive layer 60 are not shown in the figure.

[0053] The present invention also provides an AR display device, comprising the above-mentioned waveguide diffraction assembly. The AR display device comprising the above-mentioned waveguide diffraction assembly can have the advantages of high diffraction efficiency and good display effect, and is not prone to failures such as "refractive index change" or "fogging appearance", and has high reliability and long service life. The AR display device can specifically be AR glasses.

[0054] Obviously, the above-described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0055] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0056] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein.

[0057] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A waveguide diffraction component, characterized in that: include: Base (10); A first optical adhesive structure (20), wherein the first optical adhesive structure (20) is formed on a side surface of the substrate (10) by nano-imprinting; A first isolation layer (30), the first isolation layer (30) conformally covering a side of the first optical adhesive structure (20) away from the substrate (10), so that the side surface and the top surface of the first optical adhesive structure (20) are covered by the first isolation layer (30); A functional layer, the functional layer conformally covers the side of the first isolation layer (30) away from the substrate (10), the refractive index of the functional layer is greater than the refractive index of the first optical adhesive structure (20), and the functional layer is used as an enhancement layer (41) or as a diffraction grating.

2. The waveguide diffraction component according to claim 1, characterized in that: The first optical adhesive structure (20) is a first diffraction grating, and the material of the functional layer is TiO2 or Nb2O5. In this case, the functional layer serves as the enhancement layer (41).

3. The waveguide diffraction component according to claim 1, characterized in that: The functional layer is a second diffraction grating (42), and the waveguide diffraction component further comprises a second isolation layer (50) and a second optical adhesive layer (60), wherein the second isolation layer (50) conformally covers a side of the second diffraction grating (42) away from the substrate (10), so that the first isolation layer (30) and the second isolation layer (50) sandwich the second diffraction grating (42) therebetween, and the second optical adhesive layer (60) is filled and arranged on a side of the second isolation layer (50) away from the substrate (10).

4. The waveguide diffraction component according to claim 3, characterized in that: The distance from the side surface of the second optical adhesive layer (60) far from the substrate (10) to the substrate (10) is greater than the distance from the position of the second isolation layer (50) farthest from the substrate (10) to the substrate (10).

5. The waveguide diffraction component according to claim 4, characterized in that: A surface of the second optical adhesive layer (60) that is away from the substrate (10) is a plane.

6. The waveguide diffraction component according to claim 3, characterized in that: The material of the first isolation layer (30) is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, CeO2; and / or The material of the second isolation layer (50) is one or more of Al2O3, SiO2, HfO2, ZrO2, Ta2O5, and CeO2.

7. The waveguide diffraction component according to claim 3, characterized in that: The thickness of the first isolation layer (30) is greater than or equal to 1 nm and less than or equal to 5 nm; and the thickness of the second isolation layer (50) is greater than or equal to 1 nm and less than or equal to 5 nm.

8. The waveguide diffraction component according to claim 3, characterized in that: The material of the second diffraction grating (42) is TiO2 or Nb2O5.

9. An AR display device, characterized in that: A waveguide diffraction component comprising any one of claims 1 to 8.

10. A method for manufacturing a waveguide diffraction component, characterized in that: The waveguide diffraction component according to any one of claims 1 to 8 is manufactured by the manufacturing method, the manufacturing method comprising: Step S1: obtaining a substrate (10), coating a first optical adhesive material on a surface of one side of the substrate (10), and using a master plate with a structure to emboss and demold the first optical adhesive material, thereby forming a first optical adhesive structure (20) of the waveguide diffraction component; Step S2: using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form Al2O3 or SiO2 with a thickness of greater than or equal to 1 nm and less than or equal to 5 nm on a side of the first optical adhesive structure (20) away from the substrate (10) to form a first isolation layer (30) of the waveguide diffraction component; Step S3: TiO2 or Nb2O5 is disposed on the surface of the first isolation layer (30) away from the substrate (10) by using one of chemical vapor deposition, physical vapor deposition and atomic layer deposition to form a functional layer of the waveguide diffraction component.

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