High-performance glass cover plate and ARAF coating process thereof

Abstract

The invention relates to the technical field of glass cover plate coating, in particular to a high-performance glass cover plate and an ARAF coating process thereof. A Cr film layer, a SiO2 film layer and a SiF4 film layer are sequentially covered on the surface of a glass substrate from inside to outside. Compared with the prior art, the high-performance glass cover plate and the ARAF coating process thereof provided by the invention have the advantages that the hardness of the glass cover plate after the AR process is remarkably improved, and the glass cover plate is combined with the AF process, so that the glass film which is excellent in hardness and wear resistance, oleophobic, hydrophobic, oil-stain-resistant and fingerprint-resistant is prepared. And the adverse effect that the AF process is affected due to insufficient hardness after the AR process is eliminated. The method can be used for conventional and high-requirement products, and is wider in application range and more suitable for industrial production.

Description

Technical Field

[0001] The present application relates to the technical field of glass cover plate coating, and in particular to a high-performance glass cover plate and an ARAF coating process thereof. Background Art

[0002] AR (Anti-Reflection) glass is anti-reflective glass. By optically coating one or both sides of the glass, its reflectivity can be reduced and its transmittance can be increased. The maximum transmittance can be increased to more than 99% and the reflectivity to less than 1%. By increasing the transmittance of the glass, the content of the display screen is clearer. The AR process can be achieved through magnetron sputtering or thermal evaporation technology, using two materials with high and low refractive indices to cross-stack. AF (Anti-Fingerprint) glass is anti-fouling and anti-fingerprint glass. AF anti-fouling and anti-fingerprint glass is based on the lotus leaf principle. A layer of nanochemical material is coated on the outer surface of the glass to reduce the surface tension of the glass to a minimum, reducing the contact area between dust and the glass surface by 90%, making it highly hydrophobic, anti-oil, and anti-fingerprint; allowing the video glass panel to maintain a smooth and bright effect for a long time. By using SiO 2 A layer of AF material is vacuum-deposited on the surface or the PVD process is used to achieve the process to improve its wear resistance. The disadvantage of the traditional AR process is that the hardness is not improved enough, and the anti-oil and anti-fingerprint capabilities are not strong. The products manufactured by the traditional AF process do not have sufficient reflectivity. Summary of the invention

[0003] The technical problem solved by the present invention is to provide a high-performance glass cover plate and its ARAF coating process in view of the defects existing in the above-mentioned prior art, so as to solve the problems mentioned in the above-mentioned background technology.

[0004] The present invention provides a method for manufacturing glass coating, which comprises the following steps: on a Si substrate, a layer of SiO is coated on the substrate by thermal evaporation, two boats are used to hold Cr rods with high and low refractive indices respectively, and then a layer of SiO is coated on the substrate. 2 , and finally coat a layer of low surface energy SiF 4 .

[0005] Furthermore, the above-mentioned high-performance glass cover plate and its ARAF coating process are to perform cutting, edge grinding and cleaning on the glass before thermal evaporation.

[0006] Furthermore, the high-performance glass cover plate and its ARAF coating process are first evacuated for about an hour before thermal evaporation to reduce the pressure to the pressure required for the experiment.

[0007] Furthermore, the above-mentioned high-performance glass cover and its ARAF coating process are used to manufacture the first layer of ARAF glass film. The thermal evaporation rate is stabilized at about 0.2A / s by adjusting the power, and the pre-evaporation is performed for fifteen minutes.

[0008] Furthermore, in the above-mentioned method for manufacturing ARAF glass, after the pre-evaporation is completed, the evaporation rate is maintained at the same rate as the pre-evaporation, and the left and right Cr rods are respectively evaporated on Si at a thickness of 15 to 17 nm.

[0009] Furthermore, the above-mentioned high-performance glass cover plate and its ARAF coating process are used to manufacture the second layer of ARAF glass film, using radio frequency magnetron sputtering technology, and the gas introduced is pure argon. Before magnetron sputtering, it is first evacuated to the required pressure for the experiment.

[0010] Furthermore, the above-mentioned high-performance glass cover and ARAF coating process thereof, SiO 2 The target power is 50W and the pre-sputtering time is 15 minutes.

[0011] Furthermore, the above-mentioned high-performance glass cover and its ARAF coating process maintain the same sputtering power as the pre-sputtering, sputter for 15 minutes, keep the pure argon gas flowing, and evaporate 30-40nm SiO on the Cr film layer. 2 .

[0012] Furthermore, the high-performance glass cover and ARAF coating process described above heats the hydrophobic coating solution to 40°C. Furthermore, the above-mentioned high-performance glass cover and ARAF coating process thereof are composed of 5gC 11 H 13 F 13 O 3 Si, 5 mL H 2 O, 245 mL C 2 H 5 OH first, add 40 mL CH 3 COOH Adjust the pH value of the hydrophobic coating solution to 3.

[0013] Furthermore, the high-performance glass cover and its ARAF coating process are described above. The coated glass is placed in a hydrophobic coating solution for 10 minutes for hydrophobic modification. 2 SiF film evaporation 4 The film layer is 12~18nm.

[0014] Beneficial effect: Compared with the prior art, the new process provided by the present invention, which transforms the AR coating process and combines it with the AF process, significantly improves the hardness after the AR process, and combines it with the AF process to prepare a glass film with excellent hardness and wear resistance, and is oleophobic, hydrophobic, anti-greasy, and anti-fingerprint. It eliminates the adverse effect of insufficient hardness after the AR process affecting the AF process. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1It is a schematic diagram of the structure of the film layer of the glass cover plate of the present invention.

Claims

1. A high-performance glass cover plate and an ARAF coating process thereof, characterized in that: It includes a glass substrate and a functional layer covering the surface of the glass substrate, wherein the functional layer includes a Cr film layer, a SiO2 film layer and a SiF4 film layer, and the Cr film layer, the SiO2 film layer and the SiF4 film layer are alternately covered on the surface of the glass substrate from the inside to the outside.

2. The high-performance glass cover plate and the ARAF coating process thereof according to claim 1, characterized in that: Each functional layer has only one layer.

3. The high-performance glass cover plate and the ARAF coating process thereof according to claim 1, characterized in that: The thickness of the Cr film layer is 30-35 nm.

4. The high-performance glass cover plate and the ARAF coating process thereof according to claim 1, characterized in that: The SiO2 film layer has a thickness of 30-40 nm.

5. The high-performance glass cover plate and the ARAF coating process thereof according to claim 1, characterized in that: The SiF4 film layer has a thickness of 12-18 nm.

6. An AR coating process for producing the Cr film and SiO2 film as described in claims 3-4, characterized in that: The steps include: Selecting a glass substrate, and cutting the glass substrate into a specified size; Put the glass substrate into the cleaning chamber and clean the glass substrate with deionized water; The cleaned glass substrate is sent into a vacuum drying oven for drying; The glass substrate was placed in the chamber of the thermal evaporation equipment and vacuumed to a vacuum degree of 5.0×10 -4 pa started evaporation, and Cr rods with high and low refractive indices were placed in two evaporation boats respectively. The thermal evaporation rate was stabilized at about 0.2A / S, and the pre-evaporation lasted for 15 minutes. After the pre-evaporation was completed, the evaporation rate was maintained at the same level as the pre-evaporation. The left and right Cr rods were respectively evaporated on the glass substrate for 15-17nm, and a Cr film layer was plated on the surface of the glass collective. After the Cr film is plated, it is placed in the chamber of the magnetron sputtering equipment for vacuum treatment with a vacuum degree of 8.0×10 -4 pa, with SiO2 target as the target material, the Ar flow rate is 220sccm, the sputtering power is 50W, pre-sputtering for 15 minutes, while maintaining the same sputtering power as the pre-sputtering, sputtering for 15 minutes, the thickness is 30~40nm, and a SiO2 film layer is plated on the Cr film layer.

7. An AF coating process for producing the SiF4 film layer according to claim 5, characterized in that: The following steps are involved: The hydrophobic coating solution required for the preparation of hydrophobic coating is composed of 5g C 11 H 13 F 13 O3Si, 5mLH2O, and 245mL C2H5OH were mixed first, and then 40mL CH3COOH was added to adjust the pH value of the hydrophobic coating solution to 3, and the coating solution was heated to 40°C; The glass substrate coated with the Cr film and the SiO2 film in claim 6 is placed in a hydrophobic coating solution with a thickness of 12 to 18 nm, and the above-mentioned SiF4 film is coated on the SiO2 film.

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