Wide-temperature planetary roller screw low-friction tough solid lubricating film and preparation method thereof

Abstract

The invention belongs to the technical field of solid lubricating films, and particularly relates to a low-friction tough solid lubricating film for a wide-temperature planetary roller screw and a preparation method of the low-friction tough solid lubricating film. The lubricating film comprises a polycrystalline silicon transition layer, a silicon-carbon-tungsten-molybdenum gradient transition layer, a silicon carbide-tungsten-molybdenum-doped DLC composite layer, a silicon-tungsten gradient transition layer, a silicon-doped tungsten disulfide layer, a tungsten carbide-doped molybdenum disulfide gradient transition layer and a silicon carbide-doped molybdenum disulfide layer which are sequentially deposited. The preparation method of the lubricating film comprises the following steps that the surface of the planetary screw roller is machined so that the roughness can be better than Ra0.2, and the planetary screw roller is cleaned for 20 min or above in acetone and alcohol solutions respectively; and starting vacuum coating equipment, and when the vacuum degree of a vacuum coating cavity is superior to 3 * 10 <-5 > torr, performing sputtering cleaning on the surface of the roller of the planetary screw rod and depositing a low-friction tough solid lubricating film of the wide-temperature planetary roller screw rod. The invention provides a low-friction tough solid lubricating film for a wide-temperature planetary roller screw and a preparation method of the low-friction tough solid lubricating film.

Description

Technical Field

[0001] The invention belongs to the technical field of solid lubricating films, and in particular relates to a low-friction and strong solid lubricating film for a wide-temperature planetary roller screw and a preparation method thereof. Background Art

[0002] Components using ordinary MoS2 coating systems experience extremely harsh and complex environmental conditions such as vibration and impact loads, high humidity and heat, high and low temperature alternation, atmosphere-vacuum, etc. during their entire service life. They cannot meet the requirements of high reliability in multiple environments. Self-lubrication and wear resistance are balanced, wear and corrosion interact, and performance is highly sensitive to the environment. These are common problems when ordinary MoS2 coatings are used in harsh environments. Summary of the invention

[0003] In order to solve the above problems existing in the prior art, the object of the present invention is to provide a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw and a preparation method thereof.

[0004] The technical solution adopted by the present invention is:

[0005] The low-friction and tough solid lubricating film of the wide-temperature planetary roller screw comprises a polysilicon transition layer, a silicon-carbon-tungsten-molybdenum gradient transition layer, a DLC composite layer doped with silicon carbide, tungsten and molybdenum, a silicon-tungsten gradient transition layer, a silicon-doped tungsten disulfide layer, a tungsten carbide-doped molybdenum disulfide-tungsten disulfide gradient transition layer and a silicon-tungsten carbide-doped molybdenum disulfide layer, which are deposited in sequence.

[0006] The method for preparing a low-friction and strong solid lubricating film of a wide-temperature planetary roller screw comprises the following steps:

[0007] S1: Process the surface of the planetary screw roller to make the roughness better than Ra0.2, clean the planetary screw roller in acetone and alcohol solution for more than 20 minutes each, and finally blow dry the planetary screw roller;

[0008] S2: Install the cleaned planetary screw roller on the fixture; start the vacuum coating equipment. When the vacuum degree of the vacuum coating chamber is better than 3×10 -5 torr, sputtering cleans the surface of the planetary screw rollers and deposits a low-friction, strong solid lubricant film for wide temperature planetary roller screws.

[0009] As a preferred embodiment of the present invention, in step S1, the planetary screw roller is cleaned in acetone and alcohol solution for more than 20 minutes respectively by using ultrasonic waves, and finally the surface is blown dry with nitrogen.

[0010] As a preferred embodiment of the present invention, in step S2, the cleaned planetary screw roller is wrapped with clean aluminum foil and placed on a fixture; when depositing a wide temperature planetary roller screw low friction strong solid lubricating film, the working gas is an inert gas, and the vacuum degree is controlled at 10-1 ~10 -3 torr, the bias voltage is controlled at 50-100V, and the workpiece speed is controlled at 2-5r / min.

[0011] As a preferred embodiment of the present invention, the deposition process of the polysilicon transition layer is specifically as follows: multi-target unbalanced magnetron sputtering technology is adopted, a polysilicon target material is used as a sputtering cathode, an inert gas Ar is used as a working gas, a target current is applied to the silicon target, a negative bias voltage is applied to the coating mechanism, and a polysilicon transition layer is deposited on the surface of the planetary roller screw; wherein, the sputtering current of the Si sputtering target is 3 to 5A, the sputtering time is 20 to 40 minutes, and the thickness of the polysilicon transition layer is 100 to 300nm.

[0012] As a preferred embodiment of the present invention, the deposition process of the silicon-carbon-tungsten-molybdenum gradient transition layer is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a polycrystalline silicon target, a doped silicon carbide composite carbon target and a doped tungsten carbide composite MoS2 target are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias is applied to the mechanism to be coated, and a silicon-carbon-tungsten-molybdenum gradient transition layer is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is gradually reduced from 3 to 5A to 0A, the current of the composite carbon target is gradually increased from 0 to 2 to 4A, the current of the composite MoS2 target is gradually increased from 0 to 0.5 to 1A, the bias voltage of the mechanism to be coated is 50 to 70V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 10 to 30 min, and the thickness of the silicon-carbon-molybdenum gradient transition layer is 100 to 200 nm.

[0013] As a preferred embodiment of the present invention, the deposition process of the DLC composite layer doped with silicon carbide, tungsten and molybdenum is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a silicon carbide-doped composite carbon target and a tungsten carbide-doped composite MoS2 target are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias is applied to the mechanism to be coated, and a DLC composite layer doped with silicon carbide, tungsten and molybdenum is deposited on the surface of the planetary roller screw; wherein the sputtering current of the composite graphite target is 2 to 5A, the composite MoS2 target current is 0.5 to 1A, the bias voltage of the mechanism to be coated is 50 to 100V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 80-200 min, and the thickness of the DLC composite layer doped with silicon carbide, tungsten and molybdenum is 1-2 μm.

[0014] As a preferred embodiment of the present invention, the deposition process of the silicon-doped tungsten disulfide layer is specifically as follows: using multi-target unbalanced magnetron sputtering technology, using polycrystalline silicon target and tungsten disulfide target as sputtering cathodes, using inert gas Ar as working gas, applying target current to the target, applying negative bias to the coating mechanism, and depositing the silicon-doped tungsten disulfide layer on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is gradually increased from 0A to 0.5~1A, the sputtering current of the tungsten disulfide target is gradually increased from 0A to 1~2A, the sputtering time is 10~30min, and the thickness of the silicon-doped tungsten disulfide layer is 100~200nm.

[0015] As a preferred embodiment of the present invention, the deposition process of the doped silicon tungsten disulfide layer is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a polycrystalline silicon target material and a tungsten disulfide target material are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias voltage is applied to the mechanism to be coated, and a doped silicon tungsten disulfide layer is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is 0.5-1A, the WS2 target current is 1-2A, the bias voltage of the mechanism to be coated is 50-70V, and the coating vacuum is controlled at 10 -1 ~

[0016] 10 -3 torr, the deposition time is 60 to 100 min, and the thickness of the silicon-doped tungsten disulfide layer is 1 to 2 μm.

[0017] As a preferred embodiment of the present invention, the deposition process of the molybdenum disulfide layer doped with silicon tungsten carbide is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a polycrystalline silicon target and a tungsten carbide doped composite MoS2 target are used as a sputtering cathode, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias is applied to the coating mechanism, and a molybdenum disulfide layer doped with silicon tungsten carbide is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is 0.5 to 1A, the composite MoS2 target current is 1 to 2A, the bias voltage of the coating mechanism is 50 to 100V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 40 to 90 min, and the thickness of the molybdenum disulfide layer doped with silicon tungsten carbide is 1 to 2 μm.

[0018] The beneficial effects of the present invention are:

[0019] 1. The present invention is based on MoS2 and diamond-like carbon C film. Through film layer structure design, doping and other technical methods, it realizes a fixed lubricating film with low friction coefficient, high bonding quality between film and base metal, excellent lubricating film transfer performance, resistance to high and low temperature, vacuum and atmospheric environment, strong and long life, thus ensuring the use requirements of planetary roller screws.

[0020] 2. Roller coating adopts a composite coating method. Through precise deposition process parameter control, the coating structure and composition are regulated at the nanoscale, so that the concentration of various components of the coating presents a gradient change from the substrate interface to the surface. The metal doping phase is used to improve the bonding performance and wear resistance of the DLC phase ZrO2\AL2O3, and at the same time improve the bonding performance with the main lubricating phase MoS2 coating. Through this series of means, the shortcomings of the general MoS2 coating system are finally overcome and the requirements of roller coating are met. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a structural schematic diagram of the present invention.

[0022] In the figure: 1-polysilicon transition layer; 2-silicon carbon tungsten molybdenum gradient transition layer; 3-DLC composite layer doped with silicon carbide, tungsten and molybdenum; 4-silicon tungsten gradient transition layer; 5-silicon doped tungsten disulfide layer; 6-tungsten carbide doped molybdenum disulfide tungsten disulfide gradient transition layer; 7-silicon tungsten carbide doped molybdenum disulfide layer. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings here can be arranged and designed in various different configurations.

[0024] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present invention. It should be noted that the embodiments of the present invention and the features in the embodiments can be combined with each other without conflict.

[0025] like Figure 1 As shown, the low-friction and tough solid lubricating film of the wide temperature planetary roller screw of this embodiment is characterized by comprising a polycrystalline silicon transition layer 1, a silicon-carbon-tungsten-molybdenum gradient transition layer 2, a DLC composite layer 3 doped with silicon carbide, tungsten and molybdenum, a silicon-tungsten gradient transition layer 4, a silicon-doped tungsten disulfide layer 5, a tungsten carbide-doped molybdenum disulfide-tungsten disulfide gradient transition layer 6 and a silicon-tungsten carbide-doped molybdenum disulfide layer 7 deposited in sequence.

[0026] The present invention is based on MoS2 and diamond-like carbon C film, and through film layer structure design, doping and other technical methods, it achieves a fixed lubricating film with low friction coefficient, high bonding quality between film and base metal, excellent lubricating film transfer performance, resistance to high and low temperature, vacuum and atmospheric environment, strong and long life, thereby ensuring the use requirements of planetary roller screws.

[0027] The method for preparing a low-friction and strong solid lubricating film of a wide-temperature planetary roller screw comprises the following steps:

[0028] S1: Use polishing and other technical means to make the surface roughness of the planetary screw roller better than Ra0.2; then use ultrasonic waves to clean the planetary screw roller in acetone and alcohol solution for more than 20 minutes each to remove surface oil and adsorbed excess substances, and finally blow dry the surface with nitrogen;

[0029] S2: Wrap the cleaned planetary screw roller with clean aluminum foil and place it on a special fixture; start the vacuum coating equipment. When the vacuum degree of the vacuum coating chamber is better than 3×10 -5 torr, the surface of the planetary screw roller is sputter-cleaned and a low-friction, strong and solid lubricating film with a wide temperature range is deposited on it; the working gas is an inert gas, and the vacuum degree is controlled at 10 -1 ~10 -3 torr, the bias voltage is controlled at 50-100V, and the workpiece speed is controlled at 2-5r / min; preferably, the inert gas is high-purity argon.

[0030] The deposition process of the polysilicon transition layer 1 is as follows: a multi-target unbalanced magnetron sputtering technique is used, a polysilicon target is used as a sputtering cathode, an inert gas Ar is used as a working gas, a target current is applied to the silicon target, and a negative bias is applied to the coating mechanism, thereby depositing the polysilicon transition layer 1 on the surface of the planetary roller screw. The sputtering current of the Si sputtering target is 3 to 5A, the sputtering time is 20 to 40 minutes, and the thickness of the polysilicon transition layer 1 is 100 to 300nm.

[0031] The deposition process of the silicon-carbon-tungsten-molybdenum gradient transition layer 2 is as follows: using multi-target unbalanced magnetron sputtering technology, using polycrystalline silicon target, doped silicon carbide composite carbon target and doped tungsten carbide composite MoS2 target as sputtering cathodes, using inert gas Ar as working gas, applying target current to the cathode target, and applying negative bias to the mechanism to be coated, so as to deposit the silicon-carbon-tungsten-molybdenum gradient transition layer 2 on the surface of the planetary roller screw. Among them, the sputtering current of the Si sputtering target gradually decreases from 3 to 5A to 0A, the current of the composite carbon target gradually increases from 0 to 2 to 4A, the current of the composite MoS2 target gradually increases from 0 to 0.5 to 1A, the bias voltage of the mechanism to be coated is 50 to 70V, and the coating vacuum is controlled at 10 -1 ~10 -3torr, the deposition time is 10 to 30 min, and the thickness of the silicon-carbon-molybdenum gradient transition layer is 100 to 200 nm.

[0032] The deposition process of the DLC composite layer 3 doped with silicon carbide, tungsten and molybdenum is as follows: a multi-target unbalanced magnetron sputtering technique is used, with a silicon carbide-doped composite carbon target and a tungsten carbide-doped composite MoS2 target as the sputtering cathode, an inert gas Ar as the working gas, a target current is applied to the cathode target, and a negative bias is applied to the mechanism to be coated, thereby depositing the DLC composite layer 3 doped with silicon carbide, tungsten and molybdenum on the surface of the planetary roller screw. The sputtering current of the composite graphite target is 2 to 5A, the current of the composite MoS2 target is 0.5 to 1A, the bias voltage of the mechanism to be coated is 50 to 100V, and the vacuum degree of the coating is controlled at 10 -1 ~10 -3 torr, the deposition time is 80-200 min, and the thickness of the DLC composite layer 3 doped with silicon carbide, tungsten and molybdenum is 1-2 μm.

[0033] The first deposition method of the doped silicon tungsten disulfide layer 5 is specifically as follows: using multi-target unbalanced magnetron sputtering technology, using polysilicon target and tungsten disulfide target as sputtering cathodes, using inert gas Ar as working gas, applying target current to the target, and applying negative bias to the coating mechanism, thereby depositing the doped silicon tungsten disulfide layer 5 on the surface of the planetary roller screw. Among them, the sputtering current of the Si sputtering target is gradually increased from 0A to 0.5~1A, the sputtering current of the tungsten disulfide target is gradually increased from 0A to 1~2A, the sputtering time is 10~30min, and the thickness of the doped silicon tungsten disulfide layer 5 is 100~200nm.

[0034] The second deposition method of the doped silicon tungsten disulfide layer 5 is specifically as follows: using multi-target unbalanced magnetron sputtering technology, using polycrystalline silicon target and tungsten disulfide target as sputtering cathodes, using inert gas Ar as working gas, applying target current to the cathode target, and applying negative bias to the coating mechanism, thereby depositing the doped silicon tungsten disulfide layer 5 on the surface of the planetary roller screw. The sputtering current of the Si sputtering target is 0.5-1A, the WS2 target current is 1-2A, the bias voltage of the coating mechanism is 50-70V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 60 to 100 min, and the thickness of the silicon-doped tungsten disulfide layer is 1 to 2 μm.

[0035] The deposition process of the molybdenum disulfide layer 7 doped with silicon tungsten carbide is as follows: a multi-target unbalanced magnetron sputtering technique is used, a polycrystalline silicon target and a tungsten carbide doped composite MoS2 target are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, and a negative bias is applied to the mechanism to be coated, thereby depositing the molybdenum disulfide layer 7 doped with silicon tungsten carbide on the surface of the planetary roller screw. The sputtering current of the Si sputtering target is 0.5-1A, the current of the composite MoS2 target is 1-2A, the bias voltage of the mechanism to be coated is 50-100V, and the vacuum degree of the coating is controlled at 10 -1 ~10 -3 torr, the deposition time is 40 to 90 min, and the thickness of the molybdenum disulfide layer 7 doped with silicon tungsten carbide is 1 to 2 μm.

[0036] Roller coating adopts a composite coating method. Through precise deposition process parameter control, the coating structure and composition are regulated at the nanoscale, so that the concentration of various components of the coating presents a gradient change from the substrate interface to the surface. The metal doping phase is used to improve the bonding performance and wear resistance of the DLC phase ZrO2\AL2O3, and at the same time improve the bonding performance with the main lubricating phase MoS2 coating. Through this series of means, the shortcomings of the general MoS2 coating system are finally overcome and the requirements of roller coating are met.

[0037] The present invention is not limited to the above-mentioned optional implementation modes. Anyone can derive other various forms of products under the inspiration of the present invention. However, no matter what changes are made in the shape or structure, all technical solutions that fall within the scope defined by the claims of the present invention fall within the protection scope of the present invention.

Claims

1. Wide temperature range planetary roller screw with low friction and strong solid lubricating film, characterized by: The invention comprises a polysilicon transition layer (1), a silicon-carbon-tungsten-molybdenum gradient transition layer (2), a DLC composite layer doped with silicon-tungsten-molybdenum carbide (3), a silicon-tungsten gradient transition layer (4), a silicon-doped tungsten disulfide layer (5), a tungsten carbide-doped molybdenum disulfide-tungsten disulfide gradient transition layer (6), and a silicon-tungsten carbide-doped molybdenum disulfide layer (7) which are deposited in sequence.

2. A method for preparing a low-friction, strong and solid lubricating film for a wide temperature range planetary roller screw, characterized in that: The following steps are involved: S1: Process the surface of the planetary screw roller to make the roughness better than Ra0.2, clean the planetary screw roller in acetone and alcohol solution for more than 20 minutes each, and finally blow dry the planetary screw roller; S2: Install the cleaned planetary screw roller on the fixture; start the vacuum coating equipment. When the vacuum degree of the vacuum coating chamber is better than 3×10 -5 torr, the surface of the planetary screw roller is sputter-cleaned and the low-friction and tough solid lubricating film of the wide-temperature planetary roller screw as claimed in claim 1 is deposited.

3. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: In step S1, the planetary screw roller is cleaned in acetone and alcohol solution for more than 20 minutes respectively by using ultrasonic waves, and finally the surface is blown dry with nitrogen.

4. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: In step S2, the cleaned planetary screw roller is wrapped with clean aluminum foil and placed on a fixture; when depositing the wide temperature planetary roller screw low friction strong solid lubricating film, the working gas is an inert gas, and the vacuum degree is controlled at 10 -1 ~10 -3 torr, the bias voltage is controlled at 50-100V, and the workpiece speed is controlled at 2-5r / min.

5. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the polysilicon transition layer (1) is specifically as follows: using multi-target unbalanced magnetron sputtering technology, using a polysilicon target as a sputtering cathode, using an inert gas Ar as a working gas, applying a target current to the silicon target, applying a negative bias voltage to the coating mechanism, and depositing the polysilicon transition layer (1) on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is 3 to 5A, the sputtering time is 20 to 40 minutes, and the thickness of the polysilicon transition layer (1) is 100 to 300nm.

6. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the silicon-carbon-tungsten-molybdenum gradient transition layer (2) is specifically as follows: a multi-target unbalanced magnetron sputtering technology is used, a polycrystalline silicon target, a doped silicon carbide composite carbon target and a doped tungsten carbide composite MoS2 target are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias voltage is applied to the coating mechanism, and a silicon-carbon-tungsten-molybdenum gradient transition layer (2) is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is gradually reduced from 3 to 5 A to 0 A, the current of the composite carbon target is gradually increased from 0 to 2 to 4 A, the current of the composite MoS2 target is gradually increased from 0 to 0.5 to 1 A, the bias voltage of the coating mechanism is 50 to 70 V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 10 to 30 min, and the thickness of the silicon-carbon-molybdenum gradient transition layer is 100 to 200 nm.

7. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the DLC composite layer (3) doped with silicon carbide, tungsten and molybdenum is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a silicon carbide-doped composite carbon target and a tungsten carbide-doped composite MoS2 target are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias voltage is applied to the mechanism to be coated, and the DLC composite layer (3) doped with silicon carbide, tungsten and molybdenum is deposited on the surface of the planetary roller screw; wherein the sputtering current of the composite graphite target is 2 to 5A, the current of the composite MoS2 target is 0.5 to 1A, the bias voltage of the mechanism to be coated is 50 to 100V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 80 to 200 minutes, and the thickness of the DLC composite layer (3) doped with silicon carbide, tungsten and molybdenum is 1 to 2 μm.

8. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the doped silicon tungsten disulfide layer (5) is specifically as follows: using a multi-target unbalanced magnetron sputtering technology, using a polycrystalline silicon target and a tungsten disulfide target as a sputtering cathode, using an inert gas Ar as a working gas, applying a target current to the target, applying a negative bias voltage to the coating mechanism, and depositing the doped silicon tungsten disulfide layer (5) on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is gradually increased from 0A to 0.5-1A, the sputtering current of the tungsten disulfide target is gradually increased from 0A to 1-2A, the sputtering time is 10-30min, and the thickness of the doped silicon tungsten disulfide layer (5) is 100-200nm.

9. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the doped silicon tungsten disulfide layer (5) is specifically as follows: a multi-target unbalanced magnetron sputtering technology is used, a polycrystalline silicon target material and a tungsten disulfide target material are used as sputtering cathodes, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias voltage is applied to the coating mechanism, and the doped silicon tungsten disulfide layer (5) is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is 0.5-1A, the WS2 target current is 1-2A, the bias voltage of the coating mechanism is 50-70V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 60 to 100 min, and the thickness of the silicon-doped tungsten disulfide layer is 1 to 2 μm.

10. The method for preparing a low-friction and strong solid lubricating film for a wide temperature range planetary roller screw according to claim 2, characterized in that: The deposition process of the molybdenum disulfide layer (7) doped with silicon tungsten carbide is specifically as follows: a multi-target unbalanced magnetron sputtering technology is adopted, a polycrystalline silicon target material and a tungsten carbide doped composite MoS2 target are used as a sputtering cathode, an inert gas Ar is used as a working gas, a target current is applied to the cathode target, a negative bias voltage is applied to the mechanism to be coated, and the molybdenum disulfide layer (7) doped with silicon tungsten carbide is deposited on the surface of the planetary roller screw; wherein the sputtering current of the Si sputtering target is 0.5-1A, the current of the composite MoS2 target is 1-2A, the bias voltage of the mechanism to be coated is 50-100V, and the coating vacuum is controlled at 10 -1 ~10 -3 torr, the deposition time is 40 to 90 minutes, and the thickness of the molybdenum disulfide layer (7) doped with silicon tungsten carbide is 1 to 2 μm.

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