Nickel electroplated part surface treatment device and treatment method thereof

Abstract

The invention discloses a nickel electroplated part surface treatment device and a treatment method thereof, and belongs to the technical field of surface treatment. Comprising a plurality of cleaning tanks, a rack is arranged above the cleaning tanks, a driving assembly is installed on the rack, and the driving assembly is connected with a cleaning assembly through a lifting air cylinder; the cleaning assembly comprises a driving box, a cleaning basket and a gear, and the driving box is in transmission connection with the cleaning basket through the gear; the cleaning tank comprises a tank body, an ultrasonic generator and a heating pipe, the heating pipe is arranged at the bottom of the tank body, and the ultrasonic generator is installed on the side wall of the tank body. And the cleaning area and the cleaning effect of the nickel electroplated part are improved through rotation of the cleaning basket and ultrasonic-assisted cleaning.

Description

Technical Field

[0001] The invention relates to the technical field of surface treatment, and in particular to a surface treatment device and a treatment method for a nickel electroplated part. Background Art

[0002] In recent years, with the continuous development of technologies such as smart phones, automobiles, aerospace, etc., the performance requirements for precision electronic devices have become increasingly higher, especially nickel electroplated parts are widely used in manufacturing industries such as smart phones, automobiles, aerospace, machinery, instruments, meters, medical devices, and household appliances.

[0003] The patent document with application number CN202011230933.1 discloses a surface treatment device, which includes a moving component, a lifting component, a clamping component, a rotary cleaning component, a reaction box, and a loading and unloading component. The reaction boxes are provided with two, and the two reaction boxes are symmetrically arranged on the ground. The two reaction boxes are respectively used for electroplating and sealing the electroplated parts. The moving component is fixedly arranged above the two reaction boxes, the lifting component is fixedly arranged on the working end of the moving component, the clamping component is fixedly arranged on the working end of the lifting component, the rotary cleaning component is fixedly arranged between the two reaction box bodies, and the rotary cleaning component is arranged below the moving component, and the loading and unloading components are fixedly arranged on the sides of the reaction box and the rotary cleaning component. Through the cooperation between the above components, the workpiece can be electroplated instead of manually, thereby improving the efficiency of electroplating, but its cleaning effect on nickel electroplated parts is not good. Therefore, a person skilled in the art provides a nickel electroplated part surface treatment device to solve the problems raised in the above background technology. Summary of the invention

[0004] The object of the present invention is to provide a surface treatment device and a treatment method for nickel electroplated parts, which are used to solve the problem of poor cleaning effect of nickel electroplated parts in the prior art.

[0005] The purpose of the present invention can be achieved through the following technical solutions:

[0006] A nickel electroplating part surface treatment device comprises a plurality of cleaning tanks, a frame is arranged above the plurality of cleaning tanks, a driving component is installed on the frame, and the driving component is connected to the cleaning component through a lifting cylinder;

[0007] The cleaning assembly comprises a driving box, a cleaning basket and a gear, wherein the driving box is drivingly connected to the cleaning basket via the gear;

[0008] The cleaning tank comprises a tank body, an ultrasonic generator and a heating tube, wherein the heating tube is arranged at the bottom of the tank body, and the ultrasonic generator is installed on the side wall of the tank body.

[0009] A method for treating a nickel electroplated part using the above-mentioned nickel electroplated part surface treatment device comprises the following steps:

[0010] The nickel-plated parts are placed in the cleaning component, and the driving component drives the cleaning component to move to the top of several cleaning tanks in sequence. The lifting cylinder is extended to immerse the cleaning component in the cleaning tank, and the ultrasonic generator and the heating tube are turned on to perform ultrasonic heating cleaning.

[0011] As a further solution of the present invention, the method for preparing the nickel electroplated part comprises the following steps:

[0012] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0013] S2, taking the pretreated substrate and spraying the graphene composite slurry on the surface thereof to obtain a graphene modified substrate;

[0014] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part.

[0015] As a further solution of the present invention, it is characterized in that the method for preparing the graphene composite slurry described in step S2 comprises the following steps:

[0016] S21, grinding, deashing, and sieving anthracite, and graphitizing the anthracite at 2500° C. for 2-4 hours to obtain material A;

[0017] S22, taking the material A, sodium nitrate, and sulfuric acid solution, mixing, stirring in an ice-water bath for 20-30 min, adding potassium permanganate, stirring at 30-40° C. for 1-2 h, adding deionized water and hydrogen peroxide, stirring at 98° C. in an oil bath for 15-25 min, filtering, washing the solid phase, and vacuum freeze-drying to obtain material B;

[0018] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 25-35 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 10-12 minutes, freeze-drying, heat-treating in a mixed atmosphere for 1-1.5 hours, cooling, and obtaining material C;

[0019] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 60-80 minutes to obtain the graphene composite slurry.

[0020] As a further scheme of the present invention, in step S22, the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water and hydrogen peroxide is 1-1.2g: 0.74-0.76g: 33-35mL: 5g: 50mL: 4-6mL.

[0021] As a further scheme of the present invention, in step S23, the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.2-0.22 g:100 mL:1.4-1.6 mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650-750°C.

[0022] As a further solution of the present invention, in step S24, the dosage ratio of the material C, 2-hydroxypyridine, anhydrous ethanol and deionized water is 35-45 mg: 22-28 mg: 25-30 mL: 50-55 mL.

[0023] As a further solution of the present invention, in step S3, the anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30-50°C, and the current density is 2.6A / dm 2 , the electroplating time is 30-40min.

[0024] As a further solution of the present invention, in step S3, the method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0025] S31, nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin, and deionized water are mixed, and ultrasonically stirred at 50-60° C. for 35-45 minutes to obtain the electroplating solution.

[0026] As a further scheme of the present invention, the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin, and deionized water is 17.4-17.6: 3.5-3.7: 0.7-0.9: 2.2-2.4: 3.2-3.4: 0.0016-0.0022: 0.37-0.45: 0.08-0.12: 80-85.

[0027] Beneficial effects of the present invention:

[0028] A nickel-plated part surface treatment device and a treatment method disclosed in the present invention place the nickel-plated parts after electroplating in a cleaning basket, and a servo motor drives a slider to pass through a plurality of cleaning tanks from left to right in sequence. After sliding to the top of the cleaning tank, the lifting cylinder is controlled to extend to insert the cleaning component into the cleaning tank. At the same time, a driving box drives the cleaning basket to rotate, and a heating tube heats the deionized water in the cleaning tank to 40°C. An ultrasonic generator performs ultrasonic auxiliary cleaning. After washing, the lifting cylinder is recovered to drive the cleaning component to rise, and then it is moved to the next cleaning tank for cleaning again, thereby improving the cleaning area and cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The present invention will be further described below in conjunction with the accompanying drawings.

[0030] Figure 1 It is a schematic diagram of the overall structure of a nickel electroplating part surface treatment device proposed by the present invention;

[0031] Figure 2 It is a schematic structural diagram of a cleaning component of a nickel electroplating part surface treatment device proposed by the present invention;

[0032] Figure 3 The present invention is a schematic diagram of a cleaning tank structure of a nickel electroplating part surface treatment device.

[0033] In the figure: 1. frame; 2. drive assembly; 3. lifting cylinder; 4. cleaning assembly; 5. cleaning tank; 6. control panel; 7. base; 201. slider; 202. servo motor; 401. cleaning basket; 402. gear; 403. drive box; 404. shell; 501. tank body; 502. ultrasonic generator; 503. heating tube. DETAILED DESCRIPTION

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0035] like Figure 1-3 As shown, a nickel electroplating part surface treatment device includes a base 7, a plurality of cleaning tanks 5 are installed on the base 7, a frame 1 is arranged above the cleaning tanks 5, a driving assembly 2 is installed on the frame 1, and the driving assembly 2 includes a slider 201 and a servo motor 202, and the servo motor 202 is connected to the slider 201 through a ball screw transmission;

[0036] A slide groove is provided on the frame 1, a slider 201 is sleeved on the rod of the ball screw and can be slidably installed in the slide groove, a servo motor 202 is installed at the right end of the frame 1, an output end of the servo motor 202 is axially connected to one end of the ball screw, and the other end of the ball screw is axially connected to the left end of the frame 1;

[0037] A lifting cylinder 3 is installed on the bottom surface of the slider 201, and a cleaning component 4 is connected to the output end of the lifting cylinder 3;

[0038] The cleaning assembly 4 includes a cleaning basket 401, a gear 402, a drive box 403 and a housing 404. The cleaning basket 401 is axially connected to the housing 404. The cleaning basket 401 is transmission-connected to the drive box 403 through the gear 402. The drive box 403 may be a power source driven by a drive motor, and its transmission connection method is a conventional technology well known to those skilled in the art.

[0039] A plurality of cleaning tanks 5 are sequentially arranged on the base 7. A heating tube 503 is installed at the bottom of the tank body 501 of each cleaning tank 5, and an ultrasonic generator 502 is installed on the inner wall of the tank body 501. All of them are water-proof and insulated.

[0040] A control panel 6 is also mounted on the frame 1 for controlling the operation of each component.

[0041] The working principle of the nickel electroplating surface treatment device and the treatment method disclosed in the present invention is as follows:

[0042] The surface cleaning treatment of the nickel-plated parts after nickel electroplating is performed by using the above-mentioned surface treatment device, which includes the following steps: placing the nickel-plated parts after electroplating in the cleaning basket 401, the servo motor 202 drives the slider 201 to pass through several cleaning tanks 5 from left to right in turn, and after sliding to the top of the cleaning tank 5, the lifting cylinder 3 is controlled to extend to insert the cleaning component 4 into the cleaning tank 5, and at the same time, the driving box 403 drives the cleaning basket 401 to rotate, the heating tube 503 heats the deionized water in the cleaning tank 5 to 40°C, and the ultrasonic generator 502 performs ultrasonic auxiliary cleaning. After washing, the lifting cylinder 3 is recovered to drive the cleaning component 4 to rise, and then moves to the next cleaning tank 5 for cleaning again. The cleaning area and cleaning effect are improved by rotating the cleaning basket 401 and ultrasonic auxiliary cleaning.

[0043] As a further technical solution of the present application, the method for preparing the above-mentioned nickel electroplated part comprises the following steps:

[0044] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0045] S2, taking the pretreated substrate and spraying the graphene composite slurry on the surface thereof to obtain a graphene modified substrate;

[0046] The graphene composite slurry has a spraying thickness of 200 μm;

[0047] The preparation method of the graphene composite slurry comprises the following steps:

[0048] S21, taking anthracite (purchased from Guangdong Wengjiang Chemical Reagent Co., Ltd.), crushing, deashing, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 2-4 hours to obtain material A;

[0049] The proportions of the main elements in the anthracite (the remainder is impurities) are shown in Table 1 below.

[0050] Table 1

[0051] C(％) H(％) N(％) O(％) S(％) 90.41 3.32 0.75 1.72 0.07

[0052] S22, mix the material A, sodium nitrate and sulfuric acid solution, stir in a water bath at 0-5°C for 20-30 min, add potassium permanganate, stir at 30-40°C for 1-2 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98°C for 15-25 min, filter, wash the solid phase, and freeze-dry in vacuum to obtain material B;

[0053] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 25-35 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 10-12 minutes, freeze-drying, heat-treating in a mixed atmosphere for 1-1.5 hours, cooling, and obtaining material C; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650-750°C;

[0054] S24, mixing the material C, 2-hydroxypyridine, anhydrous ethanol and deionized water, and stirring ultrasonically for 60-80 minutes to obtain the graphene composite slurry;

[0055] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0056] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30-50°C, and the current density is 2.6A / dm 2 , the electroplating time is 30-40min, and the coating thickness is 3mm;

[0057] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0058] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide (purchased from Shanghai Haohong Biopharmaceutical Technology Co., Ltd.), sodium saccharin, and deionized water are mixed and ultrasonically stirred at 50-60° C. for 35-45 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin, and deionized water is 17.4-17.6: 3.5-3.7: 0.7-0.9: 2.2-2.4: 3.2-3.4: 0.0016-0.0022: 0.37-0.45: 0.08-0.12: 80-85;

[0059] Example 1

[0060] The method for preparing the nickel electroplated part comprises the following steps:

[0061] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0062] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0063] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 400-mesh silicon carbide sandpaper;

[0064] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3:1:0.4:0.1; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0065] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1 minute, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3:0.1:0.5; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0066] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 3 seconds for micro-etching activation, taking it out for washing, and drying;

[0067] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0068] The preparation method of the graphene composite slurry comprises the following steps:

[0069] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 2 h to obtain material A;

[0070] S22, take the material A, sodium nitrate, and sulfuric acid solution, mix them, stir them in a water bath at 0°C for 20 minutes, add potassium permanganate, stir them at 30°C for 1 hour, add deionized water and hydrogen peroxide, stir them in an oil bath at 98°C for 15 minutes, filter, wash the solid phase, and freeze-dry in vacuum to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1g:0.74g:33mL:5g:50mL:4mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 10Pa and -20°C for 5 hours;

[0071] S23, take the material B and deionized water, mix them, ultrasonically disperse them for 25 minutes, add cobalt chloride hexahydrate, ultrasonically disperse them for 10 minutes, freeze-dry them at -40°C for 6 hours, heat-treat them in a mixed atmosphere for 1 hour, and cool them to obtain material C; the amount ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.2g:100mL:1.4mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150mL / min and ammonia with a flow rate of 50mL / min; the temperature of the heat treatment is 650°C;

[0072] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 60 minutes to obtain the graphene composite slurry; the dosage ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 35 mg: 22 mg: 25 mL: 50 mL;

[0073] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0074] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30°C, and the current density is 2.6A / dm 2 , the electroplating time is 30min;

[0075] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0076] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 50° C. for 35 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.4:3.5:0.7:2.2:3.2:0.0016:0.37:0.08:80.

[0077] Example 2

[0078] The method for preparing the nickel electroplated part comprises the following steps:

[0079] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0080] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0081] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 600-mesh silicon carbide sandpaper;

[0082] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4.5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0083] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1.5 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0084] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 seconds for micro-etching activation, taking it out for washing, and drying;

[0085] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0086] The preparation method of the graphene composite slurry comprises the following steps:

[0087] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 3 h to obtain material A;

[0088] S22, take the material A, sodium nitrate, sulfuric acid solution, mix, stir in a 2°C water bath for 25 min, add potassium permanganate, stir at 35°C for 1.5 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 20 min, filter, wash the solid phase, and vacuum freeze-dry to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1g:0.75g:34mL:5g:50mL:5mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 15Pa, -20°C for 6h;

[0089] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 30 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 11 minutes, freeze-drying at -30°C for 7 hours, heat-treating in a mixed atmosphere for 1.2 hours, cooling, and obtaining material C; the amount ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21g:100mL:1.5mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150mL / min and ammonia with a flow rate of 50mL / min; the temperature of the heat treatment is 700°C;

[0090] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 70 minutes to obtain the graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL;

[0091] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0092] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 40°C, and the current density is 2.6A / dm 2 , the electroplating time is 35min;

[0093] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0094] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 55° C. for 40 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0095] Example 3

[0096] The method for preparing the nickel electroplated part comprises the following steps:

[0097] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0098] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0099] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 800-grit silicon carbide sandpaper;

[0100] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 4:1.2:0.6:0.2; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0101] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 2 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 4:0.2:0.7; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0102] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 5 seconds for micro-etching activation, taking it out for washing, and drying;

[0103] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0104] The preparation method of the graphene composite slurry comprises the following steps:

[0105] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 4 h to obtain material A;

[0106] S22, take the material A, sodium nitrate, sulfuric acid solution, mix, stir in a 5°C water bath for 30 min, add potassium permanganate, stir at 40°C for 2 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 25 min, filter, wash the solid phase, and vacuum freeze-dry to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.2g:0.76g:35mL:5g:50mL:6mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 20Pa, -20°C for 7h;

[0107] S23, take the material B, deionized water, mix, ultrasonically disperse for 35 minutes, add cobalt chloride hexahydrate, ultrasonically disperse for 12 minutes, freeze-dry at -20 ° C for 8 hours, heat treat in a mixed atmosphere for 1.5 hours, cool, and obtain material C; the amount ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.22g:100mL:1.6mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150mL / min and ammonia with a flow rate of 50mL / min; the temperature of the heat treatment is 750 ° C;

[0108] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 80 minutes to obtain the graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 45 mg: 28 mg: 30 mL: 55 mL;

[0109] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0110] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 50°C, and the current density is 2.6A / dm 2 , the electroplating time is 40min;

[0111] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0112] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 60° C. for 45 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.6:3.7:0.9:2.4:3.4:0.0022:0.45:0.12:85.

[0113] Comparative Example 1

[0114] The method for preparing the nickel electroplated part comprises the following steps:

[0115] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0116] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0117] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 600-mesh silicon carbide sandpaper;

[0118] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4.5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0119] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1.5 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0120] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 seconds for micro-etching activation, taking it out for washing, and drying;

[0121] S2, taking the pretreated substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0122] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 40°C, and the current density is 2.6A / dm 2 , the electroplating time is 35min;

[0123] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0124] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 55° C. for 40 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0125] Comparative Example 2

[0126] The method for preparing the nickel electroplated part comprises the following steps:

[0127] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0128] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0129] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 600-mesh silicon carbide sandpaper;

[0130] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4.5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0131] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1.5 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0132] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 seconds for micro-etching activation, taking it out for washing, and drying;

[0133] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0134] The preparation method of the graphene composite slurry comprises the following steps:

[0135] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 3 h to obtain material A;

[0136] S22, take the material A, sodium nitrate, sulfuric acid solution, mix, stir in a 2°C water bath for 25 min, add potassium permanganate, stir at 35°C for 1.5 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 20 min, filter, wash the solid phase, and vacuum freeze-dry to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1g:0.75g:34mL:5g:50mL:5mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 15Pa, -20°C for 6h;

[0137] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 30 minutes, freeze-drying at -30°C for 7 hours, heat-treating in a mixed atmosphere for 1.2 hours, cooling, and obtaining material C; the material B and deionized water are in a ratio of 0.21 g:100 mL; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the heat treatment temperature is 700°C;

[0138] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 70 minutes to obtain the graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL;

[0139] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0140] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 40°C, and the current density is 2.6A / dm 2 , the electroplating time is 35min;

[0141] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0142] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 55° C. for 40 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0143] Comparative Example 3

[0144] The method for preparing the nickel electroplated part comprises the following steps:

[0145] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0146] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0147] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 600-mesh silicon carbide sandpaper;

[0148] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4.5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0149] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1.5 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0150] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 seconds for micro-etching activation, taking it out for washing, and drying;

[0151] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0152] The preparation method of the graphene composite slurry comprises the following steps:

[0153] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 3 h to obtain material A;

[0154] S22, take the material A, sodium nitrate, sulfuric acid solution, mix, stir in a 2°C water bath for 25 min, add potassium permanganate, stir at 35°C for 1.5 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 20 min, filter, wash the solid phase, and vacuum freeze-dry to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1g:0.75g:34mL:5g:50mL:5mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 15Pa, -20°C for 6h;

[0155] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 30 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 11 minutes, freeze-drying at -30°C for 7 hours, heat-treating in an argon atmosphere for 1.2 hours, cooling, and obtaining material C; the amount ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21g:100mL:1.5mg; the temperature of the heat treatment is 700°C;

[0156] S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 70 minutes to obtain the graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL;

[0157] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0158] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 40°C, and the current density is 2.6A / dm 2 , the electroplating time is 35min;

[0159] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0160] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 55° C. for 40 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0161] Comparative Example 4

[0162] The method for preparing the nickel electroplated part comprises the following steps:

[0163] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0164] The substrate is a rectangular iron substrate with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm.

[0165] The polishing refers to polishing the burrs on the surface of the substrate to make it smooth using 600-mesh silicon carbide sandpaper;

[0166] The alkaline washing refers to placing the polished substrate in 100 mL of alkaline washing solution at 45° C. for 4.5 minutes, taking it out for washing, and drying it; the alkaline washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0167] The pickling refers to placing the substrate after alkali washing in 100 mL of pickling solution at 45° C. for 1.5 minutes, taking it out for washing, and drying it; the pickling solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0168] The activation refers to placing the pickled substrate in 100 mL of a sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 seconds for micro-etching activation, taking it out for washing, and drying;

[0169] S2, take the pretreated substrate and spray the graphene composite slurry on its surface to obtain a graphene modified substrate; the spraying conditions are as follows: the nozzle diameter is 30 μm, the carrier gas volume flow rate is 50 sccm, the sheath gas volume flow rate is 140 sccm, the spraying speed is 10 mm / min, the spraying distance is 8 mm, the deposition temperature is 102 ° C, and the spraying time is 10 min;

[0170] The preparation method of the graphene composite slurry comprises the following steps:

[0171] S21, grinding and deashing anthracite, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 3 h to obtain material A;

[0172] S22, take the material A, sodium nitrate, sulfuric acid solution, mix, stir in a 2°C water bath for 25 min, add potassium permanganate, stir at 35°C for 1.5 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 20 min, filter, wash the solid phase, and vacuum freeze-dry to obtain material B; the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1g:0.75g:34mL:5g:50mL:5mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying refers to drying at 15Pa, -20°C for 6h;

[0173] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 30 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 11 minutes, freeze-drying at -30°C for 7 hours, heat-treating in a mixed atmosphere for 1.2 hours, cooling, and obtaining material C; the amount ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21g:100mL:1.5mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150mL / min and ammonia with a flow rate of 50mL / min; the temperature of the heat treatment is 700°C;

[0174] S24, taking the material C, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 70 minutes to obtain the graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 40 mg: 28 mL: 53 mL;

[0175] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0176] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 40°C, and the current density is 2.6A / dm 2 , the electroplating time is 35min;

[0177] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0178] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 55° C. for 40 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0179] Comparative Example 5

[0180] The difference from Example 2 is that no sodium saccharin is added in the preparation method of the electroplating solution required for nickel plating.

[0181] Comparative Example 6

[0182] The difference from Example 2 is that nano-molybdenum disulfide is not added in the preparation method of the electroplating solution required for nickel plating.

[0183] Performance Testing

[0184] The nickel electroplated parts prepared in Examples 1-3 and Comparative Examples 1-6 were tested for wear resistance.

[0185] The coating sliding friction and wear test was carried out according to the national standard GB / T 12444-2006. The samples were tested using the CSM ball friction and wear test equipment. The test results were expressed as the weight loss (mg) before and after the friction test. During the test, the friction coefficient was monitored using a tribometer. The test results are shown in Table 2 below.

[0186] Table 2

[0187] Friction loss (mg) Friction coefficient Example 1 2.071 0.212 Example 2 2.062 0.208 Example 3 2.068 0.210 Comparative Example 1 5.412 0.735 Comparative Example 2 3.711 0.543 Comparative Example 3 3.248 0.507 Comparative Example 4 4.522 0.629 Comparative Example 5 2.447 0.343 Comparative Example 6 2.796 0.382

[0188] As can be seen from Table 2, the nickel-plated parts prepared in Examples 1-3 of the present application have good wear resistance; the present application activates the substrate to facilitate the coating of the graphene composite slurry on the surface of the substrate, and dispersively treats the graphene and dopes it with cobalt and nitrogen atoms so that the pyridine ring is tilted and adsorbed on the graphene surface to form a dislocation step surface, and then the nickel plating layer is electroplated, so that the stress of the nickel-plated parts can be dispersed during the wear process, thereby improving the wear resistance; further, wear-resistant nano-molybdenum disulfide and saccharin sodium with a grain refinement effect are added to the electroplating solution to increase the wear resistance of the nickel-plated parts.

[0189] The above describes some embodiments of the present invention in detail, but the contents are only preferred embodiments of the present invention and cannot be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made within the scope of the present invention should still fall within the scope of the patent coverage of the present invention.

Claims

1. A nickel electroplating part surface treatment device, characterized in that: It comprises a plurality of cleaning tanks, a rack is arranged above the plurality of cleaning tanks, a driving assembly is installed on the rack, and the driving assembly is connected to the cleaning assembly through a lifting cylinder; The cleaning assembly comprises a driving box, a cleaning basket and a gear, wherein the driving box is drivingly connected to the cleaning basket via the gear; The cleaning tank comprises a tank body, an ultrasonic generator and a heating tube, wherein the heating tube is arranged at the bottom of the tank body, and the ultrasonic generator is installed on the side wall of the tank body.

2. A method for treating a nickel electroplated part using the nickel electroplated part surface treatment device as claimed in claim 1, characterized in that: The following steps are involved: The nickel-plated parts are placed in the cleaning component, and the driving component drives the cleaning component to move to the top of several cleaning tanks in sequence. The lifting cylinder is extended to immerse the cleaning component in the cleaning tank, and the ultrasonic generator and the heating tube are turned on to perform ultrasonic heating cleaning.

3. A method for treating a nickel electroplated part using the nickel electroplated part surface treatment device as claimed in claim 2, characterized in that: The method for preparing the nickel electroplated part comprises the following steps: S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate; S2, taking the pretreated substrate and spraying the graphene composite slurry on the surface thereof to obtain a graphene modified substrate; S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part.

4. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 3 is characterized in that: The method for preparing the graphene composite slurry described in step S2 comprises the following steps: S21, crushing, deashing, and sieving anthracite, and graphitizing the anthracite at 2500° C. for 2-4 hours to obtain material A; S22, taking the material A, sodium nitrate, and sulfuric acid solution, mixing, stirring in an ice-water bath for 20-30 min, adding potassium permanganate, stirring at 30-40° C. for 1-2 h, adding deionized water and hydrogen peroxide, stirring at 98° C. in an oil bath for 15-25 min, filtering, washing the solid phase, and vacuum freeze-drying to obtain material B; S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 25-35 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 10-12 minutes, freeze-drying, heat-treating in a mixed atmosphere for 1-1.5 hours, cooling, and obtaining material C; S24, taking the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 60-80 minutes to obtain the graphene composite slurry.

5. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 4, characterized in that: In step S22, the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water and hydrogen peroxide is 1-1.2 g: 0.74-0.76 g: 33-35 mL: 5 g: 50 mL: 4-6 mL.

6. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 4, characterized in that: In step S23, the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.2-0.22 g:100 mL:1.4-1.6 mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650-750°C.

7. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 4, characterized in that: In step S24, the dosage ratio of the material C, 2-hydroxypyridine, anhydrous ethanol and deionized water is 35-45 mg: 22-28 mg: 25-30 mL: 50-55 mL.

8. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 3, characterized in that: In step S3, the anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30-50°C, and the current density is 2.6A / dm 2 , the electroplating time is 30-40min.

9. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 3, characterized in that: In step S3, the method for preparing the electroplating solution required for nickel plating comprises the following steps: S31, nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin, and deionized water are mixed, and ultrasonically stirred at 50-60° C. for 35-45 minutes to obtain the electroplating solution.

10. The method for treating a nickel electroplated part using the nickel electroplated part surface treatment device according to claim 9, characterized in that: The mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.4-17.6: 3.5-3.7: 0.7-0.9: 2.2-2.4: 3.2-3.4: 0.0016-0.0022: 0.37-0.45: 0.08-0.12: 80-85.

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