High-precision measuring device for optical axis deviation of multi-aperture imaging system and adjusting and calibrating method

Abstract

The invention discloses a high-precision measuring device for optical axis deviation of a multi-aperture imaging system and an adjusting and calibrating method, and belongs to the technical field of multi-aperture imaging. In order to solve the problems that an existing measuring device is large in size, heavy, high in price and the like, the multi-aperture imaging device comprises an installation substrate and an optical axis deviation adjusting component, and a multi-aperture imaging system is located on one side of a reflection light path of the optical axis deviation adjusting component. The optical axis deviation adjusting part comprises a collimation light source, a plurality of light splitting elements, a large-aperture plane mirror and a light spot acquisition and analysis device, the large-aperture plane mirror is used for completely enveloping the optical axis of the multi-aperture imaging system and adjusting the large-aperture plane mirror, so that a light beam reflected by the N1 is returned, transmitted by the N1 and then focused to the focus of the focusing lens, and the light spot is acquired and analyzed. The mass center of the light spot is close to the center coordinate of the area array photoelectric detector, and similarly, the mass centers of other light spots reflected by Ni are located at the same position as the mass center of the light spot N1, so that calibration of the optical axis deviation of the multi-aperture imaging system is achieved.

Description

Technical Field

[0001] The invention relates to the technical field of multi-aperture imaging, and in particular to a high-precision measuring device and an adjustment and calibration method for optical axis deviation of a multi-aperture imaging system. Background Art

[0002] Multi-aperture imaging detection is an emerging imaging detection technology. This technology arranges multiple single-aperture imaging systems according to a certain geometric layout. It can use the method of coherent detection between multiple apertures to improve the imaging resolution; it can also increase the imaging field of view by stitching the fields of view between different apertures; it can also use different detection bands through different apertures to achieve imaging in a wider spectral range.

[0003] In the multi-aperture imaging system installation stage, in order to achieve high-precision adjustment of the multi-aperture visual axes, a large-diameter collimator that can envelop all multi-aperture imaging entrance pupils is usually used as a reference light source to precisely adjust each imaging visual axis so that the accuracy of each detection visual axis is maintained at the micro-arc level. However, after experiencing mechanical and temperature environments during use, it is difficult for each aperture imaging visual axis to maintain a high-precision relative visual axis relationship, which affects the coherent imaging or field of view stitching imaging capabilities, and frequent high-precision measurement and calibration of the visual axis is required.

[0004] However, due to the large size and high price of large-aperture collimators, it is difficult to conveniently calibrate the multi-aperture imaging system at the site of use. Based on this, a multi-aperture high-precision measurement device for visual axis deviation is proposed, which is light in weight, easy to move, and has a self-calibration function. Summary of the invention

[0005] In view of the deficiencies existing in the above-mentioned prior art, the present invention aims to provide a high-precision measurement device and adjustment and calibration method for the optical axis deviation of a multi-aperture imaging system, which utilizes a combination of multiple discrete optical elements and a large-aperture plane reflector to overcome the defects of the existing measuring devices such as bulky size and high price, and facilitates the calibration measurement of the visual axis deviation at the multi-aperture imaging system use site, thereby achieving the purpose of accurate measurement of the optical axis deviation of the multi-aperture imaging system and high-precision calibration of the multi-aperture imaging optical axis.

[0006] In order to achieve the above technical objectives, the present invention adopts the following technical solutions:

[0007] The technical solution of the first aspect disclosed in the present invention is: a high-precision measurement device for the optical axis deviation of a multi-aperture imaging system, comprising an optical axis deviation adjustment component and a multi-aperture imaging system arranged on the same plane, the multi-aperture imaging system being located on one side of the reflection light path of the optical axis deviation adjustment component, and the optical axis deviation of the multi-aperture imaging system being measured and calibrated by the optical axis deviation adjustment component.

[0008] As a further preferred embodiment of the above scheme: the optical axis deviation adjustment component includes a collimated light source, a plurality of light splitting elements, a large-aperture plane reflector and a light spot collection and analysis device, wherein:

[0009] Multiple light splitting elements include N1, N2...N i , the multiple beam splitting elements are parallel to each other and are located on the same axis as the collimated light source in the transverse direction, and are located on the same axis as the multi-aperture imaging system in the longitudinal direction;

[0010] A portion of the outgoing light beam from the collimated light source is transmitted through N1 to N2, ...N in sequence. i , the other part of the outgoing beam passes through N1, N2...N i Reflection to multi-aperture imaging system;

[0011] The spot collection and analysis device is coaxially arranged with the optical axis of aperture one in the multi-aperture imaging system, and the optical axis deviation between the two is less than 10 micro-radians;

[0012] The large-aperture plane reflector is mounted on a mounting substrate and is located between a plurality of light-splitting elements and a multi-aperture imaging system.

[0013] A further preferred solution is that each beam splitter element is mounted on the mounting substrate via a two-dimensionally adjustable mirror frame, and the wavefront variation between the reflected light and the transmitted light of the beam splitter element is less than λ / 10.

[0014] As a further preferred solution of the above technical solution: the spot collection and analysis device includes an analysis component and a collector, the analysis component is arranged on the side of the multiple spectroscopic elements away from the multi-aperture imaging system, and the optical axis of the analysis component is nearly coaxially arranged with the optical axis of aperture one, and the collector is a host computer, which is communicated with the analysis component.

[0015] Furthermore, the analysis component includes a planar array photoelectric detector and a focusing lens. The focusing lens is located between the plurality of light splitting elements and the planar array photoelectric detector. The planar array photoelectric detector is communicatively connected to the collector.

[0016] As a further preferred solution of the above technical solution: the deviation of the optical axis of aperture i equivalent to aperture 1 is:

[0017] Δα 1i =Δα1-Δα i

[0018] Δβ 1i =Δβ1-Δβ i

[0019] Where: Δα 1i , Δβ 1iThey represent the elevation and azimuth deviations of aperture i relative to the optical axis of aperture 1, Δα1 and Δβ1 represent the elevation and azimuth deviations of the optical axis of aperture 1 relative to the optical axis of the analysis component, respectively; Δα i , Δβ i They represent the elevation and azimuth deviations of the optical axis of aperture i relative to the optical axis of the analyzed component, respectively.

[0020] The technical solution of the second aspect disclosed in the present invention is: a high-precision adjustment and calibration method for optical axis deviation of a multi-aperture imaging system, comprising the following steps:

[0021] S1: Adjust the elevation and angular position of N1 so that the collimated light source is incident on aperture 1 after being reflected by the N1 element and imaged at the center of the focal plane of aperture 1;

[0022] S2: Install a large-aperture plane reflector on the mounting substrate and adjust it so that the light beam reflected by the large-aperture plane reflector returns to N1 along the original path in sequence, and after being transmitted through N1, it is focused to its focal point by the focusing lens;

[0023] S3: Adjust the array photodetector to the focal plane of the focusing lens and record the centroid position of the spot of N1 (Δ x1 ,Δ y1 );

[0024] S4: Block the light beam reflected by N1 to the large-aperture plane reflector, and adjust the pitch and angular position of N2 so that after being reflected by N2 to the large-aperture plane reflector, and then reflected by the large-aperture plane reflector, N2, and N1, the centroid position of the light spot returning to the analysis component is also located at (Δ x1 ,Δ y1 ), and successively block the N2…N i-1 The beam is reflected to the large-diameter plane mirror, and N is adjusted i The pitch and angular position of N i After reflection, it is reflected by a large-aperture plane mirror and then passes through N i-1 Reflection, returning to the center of mass of the light spot of the analysis component (Δ x1 ,Δ y1 );

[0025] S5: Remove the large-aperture plane reflector, so that i The reflected light beams are incident on the aperture i respectively, and the center of mass of the light spot (Δc x1 ,Δc y1 ), the optical axis of the imaging system with aperture i is measured as:

[0026] Δα i =Δ cxi / f i

[0027] Δβ i =Δ cyi / f i

[0028] Where: Δα i , Δβ i They represent the elevation and azimuth deviations of the optical axis of aperture i relative to the optical axis of the analyzed component, respectively; f i represents the focal length of aperture i;

[0029] S6: Based on the optical axis of the imaging system of aperture i, the deviation (Δα) of the optical axis of the imaging systems of the remaining apertures relative to the optical axis of aperture one is obtained. 1i , Δβ 1i ).

[0030] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0031] 1. The measuring device of the present invention uses a combination of multiple spectroscopic elements and large-aperture plane reflectors to perform high-precision measurement and adjustment calibration of the optical axis deviation of the multi-aperture imaging system. It is light in weight, easy to move, and has self-calibration functions (i.e., N1, N2...N i The outgoing light beam is parallel), which avoids the defects of existing measuring equipment such as large size and heavy weight, and facilitates the calibration measurement of the line of sight deviation at the site where the multi-aperture imaging system is used.

[0032] 2. The adjustment and calibration method of the present invention uses a large-aperture plane reflector to completely envelop the optical axis of the multi-aperture imaging system. By adjusting the inclination angle of the large-aperture plane reflector, the light beam reflected by N1 returns to N1 through the original path and is transmitted through N1. The light beam is focused to the focal point by the focusing lens, and the array photodetector is adjusted to the focal plane of the focusing lens, so that the centroid position of the light spot is close to the central coordinate of the array photodetector, and the preliminary optical path adjustment is realized, and then N1, N2...N are blocked in sequence. i , and by adjusting the pitch and angular position of each beam splitter element, the centroid positions of the light spots of the remaining beam splitters are all located at the same position as the centroid of the light spot of N1, thereby ensuring that the optical axis deviation of each beam splitter element is within the measurement error range, and realizing reasonable calibration of the optical axis deviation of the multi-aperture imaging system. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below.

[0034] Figure 1 It is a schematic diagram of the overall layout of a high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to the present invention;

[0035] Figure 2It is a schematic diagram of the overall layout of the measuring device (excluding calibration) and the multi-aperture imaging system of the present invention;

[0036] Figure 3 A schematic top view of the optical path relationship between the measuring device of the present invention and the multi-aperture imaging system;

[0037] In the figure: 1. Optical axis deviation adjustment component; 11. Collimated light source; 12. Spectral element; 13. Large-aperture plane emitting mirror; 14. Light spot collection and analysis device; 141. Array photodetector; 142. Focusing lens; 2. Multi-aperture imaging system; 21. Aperture 1; 3. Mounting substrate. DETAILED DESCRIPTION

[0038] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments.

[0039] Embodiment 1:

[0040] Reference Figure 1-3 The present invention provides a high-precision measurement device for the optical axis deviation of a multi-aperture imaging system, comprising an optical axis deviation adjustment component 1 and a multi-aperture imaging system 2 arranged on the same plane, the optical axis deviation adjustment component 1 and the multi-aperture imaging system 2 are both arranged on a mounting substrate 3, the mounting substrate 1 is made of high-rigidity metal / non-metallic materials through structural lightweight design and processing, the lightweight design method is a method well known in the art, such as local material removal, or the use of a frame structure, the lightweight rate is greater than 60%, so as to facilitate movement and transportation, the multi-aperture imaging system 2 is located on the side of the reflection light path of the optical axis deviation adjustment component 1, and the optical axis deviation of the multi-aperture imaging system 2 is measured and calibrated through the optical axis deviation adjustment component 1.

[0041] Specifically, the optical axis deviation adjustment component 1 includes a collimated light source 11, a plurality of light splitting elements 12, a large-aperture plane reflector 13 and a light spot collection and analysis device 14:

[0042] In this embodiment, the collimated light source 11 uses a laser with a wavelength of λ, and the output wavefront PV value is better than λ / 2. The output power of the collimated light source 11 can be adjusted to adapt to imaging systems with different gain coefficients;

[0043] The plurality of light splitting elements 12 include N1, N2, ..., N i , the plurality of beam splitting elements 12 are parallel to each other and are located on the same axis as the collimated light source 11 in the horizontal direction, and are located on the same axis as the multi-aperture imaging system 2 in the vertical direction, each beam splitting element 12 is mounted on the mounting substrate 3 through a two-dimensional adjustment frame, and each beam splitting element 12 is parallel to each other;

[0044] In this embodiment, the beam splitter element 12 adopts a beam splitter prism or a beam splitter in the prior art, and is used to reflect a part of the laser light and transmit a part of the laser light to the collimated light source 11, and its reflectivity is R, and its transmittance is T, and it is required that the wavefront change of the reflected light and the transmitted light is less than λ / 10, and the angle between the front and rear surfaces of the beam splitter element 12 is less than 1 microradian; the two-dimensional adjustment frame is used to clamp and fix the beam splitter element 12, and adjust the pitch and azimuth of the reflected and transmitted light of the beam splitter element 12;

[0045] A portion of the emitted light beam from the collimated light source 11 is transmitted through N1 to N2, ...N in sequence. i , the other part of the outgoing beam passes through N1, N2...N i The multi-aperture imaging system 2 includes i imaging apertures, C1, C2, ..., C i express;

[0046] In this embodiment, the mounting substrate 3 is processed with mounting holes of different types for correspondingly mounting the collimated light source 11, a plurality of two-dimensional adjustable mirror frames and a large-aperture plane mirror seat 13;

[0047] The large-aperture plane reflector 13 is mounted on the mounting substrate 1 and is located between the plurality of light-splitting elements 12 and the multi-aperture imaging system 2;

[0048] In this embodiment, the aperture of the large-aperture plane reflector 13 is larger than the optical axis envelope of the multi-aperture imaging system 2, its surface error is better than λ / 10, it highly reflects the laser of the collimated light source 11, its reflectivity is greater than 99%, and the inclination angle of the large-aperture plane reflector 13 is adjustable.

[0049] The spot collection and analysis device 14 includes an analysis component and a collector. The analysis component is arranged on a side of the plurality of light-splitting elements 12 away from the multi-aperture imaging system 2, and the optical axis of the analysis component is arranged nearly coaxially with the optical axis of the aperture 1 21. The collector is a host computer, and the collector and the analysis component are connected in communication.

[0050] Furthermore, the analysis component includes an area array photodetector 141 and a focusing lens 142. The area array photodetector 141 adopts an existing CCD or CMOS and can respond to the laser wavelength of the collimated light source 11; the focusing lens 142 is located between the multiple spectroscopic elements 12 and the area array photodetector 141, and is used to focus the collimated light source 11. The focal length of the focusing lens 142 is f. The area array photodetector 141 and the host computer are connected by a common USB cable or network cable. The host computer is a computer or other embedded system, which is used to display the light spot image detected by the area array photodetector 141.

[0051] The area array photodetector 141 is arranged on a side of the plurality of light splitting elements 12 away from the multi-aperture imaging system 2, and the optical axis of the area array photodetector 141 is arranged coaxially with the optical axis of C1;

[0052] The position of the centroid of the light spot relative to the center of the array photodetector 141 (Δ x , Δ y ), combined with the focal length, the deviation angle of the incident light axis can be calculated:

[0053] Δα=Δx / f

[0054] Δβ=Δy / f

[0055] Where: Δα, Δβ represent the deviation of the incident light beam relative to the optical axis of the spot detection device in pitch angle and azimuth angle respectively, and f represents the focal length of the imaging aperture.

[0056] The adjustment accuracy (Δx, Δy) of the spot centroid position depends on the pixel size Δ of the array photodetector 141 and the extraction accuracy N of the spot centroid; if the extraction accuracy N of the spot centroid can reach Δ / 8, the position measurement accuracy of the spot centroid (Δx1, Δy1) is Δ / 8, and the corresponding measurement accuracy of the light beam angle incident on the focusing lens 142 is Δ / (8f); if the pixel size of the array photodetector 141 is 4μm and the focal length of the focusing lens 142 is 1m, the detection accuracy of the optical axis can reach 0.5urad.

[0057] For ease of understanding, combined Figure 2-3 As shown, the installation relationship between the multi-aperture imaging system and the measuring device of the present invention is further described.

[0058] Reference Figure 3 , the multi-aperture imaging system 2 and the measuring device are installed respectively with the XOY plane as the reference plane. The center coordinate of the optical lens of the i-th aperture of the multi-aperture imaging system 2 is C i (x i ,y i ,z i ), and the imaging optical axis of its optical lens is parallel to the Y axis.

[0059] In this embodiment, for the sake of simplicity, the center height of each optical lens is adjusted to be consistent and at the same position in the y-axis direction, that is, z i =z0,y i =y0+L, so the center coordinate of aperture 1 21 is defined as C1(x1,y0+L,z0). Similarly, the center coordinate of aperture 2 is C2(x2,y0+L,z0), and the center coordinate of aperture i is C i (x i ,y0+L,z0);

[0060] The mounting substrate 3 is located at the XOY plane, and the collimated light source 11, each spectroscopic element 12, and the light spot collection and analysis device 14 are respectively mounted on the mounting substrate 3, so that the outgoing laser beam of the collimated light source 11 is parallel to the X axis, and its center height is z0, and the area array photoelectric detector 141 is mounted so that its center height is also z0, and the optical axis of the area array photoelectric detector 141 coincides with the optical axis of the aperture 121;

[0061] Install N1 and the two-dimensional adjustment mirror frame on the mounting substrate 3, so that the center position of N1 is P1 (x1, y0, z0), that is, P1 is aligned with the center of C1. Similarly, N2…N i , and the corresponding two-dimensional adjustment mirror frame is sequentially mounted on the mounting substrate 3, so that the center position of N2 is P2 (x2, y0, z0), N i The center position is P i (x i ,y0,z0), that is, P2…P i With C2…C i The centers are aligned and initially adjusted so that N1, N2…N i The reflecting surface is at an angle of 45 degrees to the optical axis of the aperture 21.

[0062] Combination Figure 2 After the light beam output by the collimated light source 11 passes through N1, a part of it is reflected to C1, and the transmitted light continues to reach N2. The light beam reflected by N2 is incident on C2, and the light beam transmitted by N2 is reflected by N3 and incident on C3. This constitutes the optical path relationship between each optical path structure and the multi-aperture imaging system.

[0063] Embodiment 2:

[0064] Combination Figure 1-3 The high-precision adjustment and calibration method for the optical axis deviation of a multi-aperture imaging system proposed in the present invention comprises the following steps:

[0065] 1) Adjust the elevation and angular position of N1 so that the collimated light source 11 is incident on the aperture 21 after being reflected by N1 and is imaged at the center of the focal plane of the aperture 21;

[0066] 2) If Figure 3 , a large-aperture plane reflector 13 is mounted on the mounting substrate 3, so that it is located between N1 and the aperture 1 21, with the reflective surface facing the direction of the incident light, and the large-aperture plane reflector 13 is adjusted so that the light beam reflected by it returns to N1 along the original path in sequence, and after being transmitted through N1, it is focused to its focal point by the focusing lens 142;

[0067] 3) Adjust the area array photodetector 141 to the focal plane of the focusing lens 142, and adjust the lateral position of the area array photodetector 141 so that the centroid position of the light spot (Δx1 ,Δ y1 ) approaches the center coordinate of the array photoelectric detector 141, and records (Δ x1 ,Δ y1 ) value;

[0068] 4) Block the light beam reflected by N1 to the large-aperture plane reflector 13, and start adjusting the next imaging aperture. After being transmitted by N1 and reflected by N2, the collimated light source 11 is incident on the large-aperture plane reflector 13. After being reflected by the large-aperture plane reflector 13, it is reflected by N2 and N1 respectively, and then returns to the array photodetector 141 through the focusing lens 142. The array photodetector 141 transmits the received spot image to the host computer for display. By finely adjusting the pitch and angular position of N2, the centroid position of the spot is also located at (Δ x1 ,Δ y1 ), so that the optical axis deviation between the light beam reaching the large-aperture plane reflector 13 via N2 and the light beam reaching the large-aperture plane reflector 13 via N1 is less than Δ / (8f), which is close to parallelism, and the deviation can be less than 1μrad; similarly, the light beams reaching the large-aperture plane reflector 13 via N2…N are blocked in sequence. i-1 The light beam reflected to the large-aperture plane reflector 13 is adjusted i The pitch and angular position of N i The light beam reaching the large-aperture plane reflector 13 is nearly parallel to the light beam reflected by N1 and reaching the large-aperture plane reflector 13. i The optical axes of the reflected light beams are nearly parallel, and the centers of the light beams are aligned with the respective apertures of the multi-aperture imaging system 2. The optical axis deviation of the multiple emission light beams formed after adjustment can be less than 1 μrad.

[0069] 5) Remove the large-aperture plane reflector 13, so that i The reflected light beams are incident on aperture i respectively, and the centroid of the light spot (Δc x1 ,Δc y1 ), the optical axis of the imaging system with aperture i is measured as:

[0070] Δα i =Δ cxi / f i

[0071] Δβ i =Δ cyi / f i

[0072] Where: Δα i , Δβ i Respectively represent..., f i represents the focal length of aperture i;

[0073] 6) Based on the optical axis of the imaging system of aperture i, solve the deviation of the optical axis of the imaging systems of other apertures relative to the optical axis of aperture 121:

[0074] Δα 1i =Δα1-Δα i

[0075] Δβ 1i =Δβ1-Δβ i

[0076] In the present invention, the measurement error is less than Δ / (8f), and different measurement accuracy requirements can be met by selecting different Δ and f.

[0077] The detailed description of the above embodiments is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the invention. Based on the embodiments in the present invention, it is only used to illustrate the technical solution of the present invention rather than to limit it. Other modifications or equivalent substitutions made by ordinary technicians in the field to the technical solution of the present invention, as long as they do not depart from the spirit and scope of the technical solution of the present invention, should be included in the scope of the claims of the present invention.

Claims

1. A high-precision measurement device for optical axis deviation of a multi-aperture imaging system, characterized in that: The invention comprises an optical axis deviation adjustment component (1) and a multi-aperture imaging system (2) arranged on the same plane, wherein the multi-aperture imaging system (2) is located on one side of the reflection light path of the optical axis deviation adjustment component (1), and the optical axis deviation of the multi-aperture imaging system (2) is measured and calibrated by the optical axis deviation adjustment component (1).

2. The high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to claim 1, characterized in that: The optical axis deviation adjustment component (1) comprises a collimated light source (11), a plurality of light splitting elements (12), a large-aperture plane reflector (13) and a light spot collection and analysis device (14), wherein: A plurality of light splitting elements (12) include N1, N2, ... N i , the plurality of light splitting elements (12) are parallel to each other and are located on the same axis as the collimated light source (11) in the transverse direction, and are located on the same axis as the multi-aperture imaging system (2) in the longitudinal direction; A portion of the emitted light beam of the collimated light source (11) is transmitted sequentially through N1 to N2, ...N i , the other part of the outgoing beam passes through N1, N2...N i Reflection to multi-aperture imaging system (2); The light spot collection and analysis device (14) is coaxially arranged with the optical axis of the first aperture (21) in the multi-aperture imaging system (2); The large-aperture plane reflector (13) is arranged between the plurality of light splitting elements (12) and the multi-aperture imaging system (2).

3. The high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to claim 2, characterized in that: The tilt angle of the beam splitter element (12) is adjusted by a two-dimensional adjustment mirror frame, and the wavefront variation of the reflected light and the transmitted light of the beam splitter element (12) is less than λ / 10.

4. The high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to claim 3, characterized in that: The light spot collection and analysis device (14) comprises an analysis component and a collector, wherein the analysis component is arranged on a side of the plurality of light splitting elements (12) away from the multi-aperture imaging system (2), and the optical axis of the analysis component is arranged coaxially with the optical axis of aperture one, and the collector and the analysis component are in communication connection.

5. The high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to claim 4, characterized in that: The analysis component comprises a planar array photoelectric detector (141) and a focusing lens (142); the focusing lens (142) is located between the plurality of light splitting elements (12) and the planar array photoelectric detector (141); and the planar array photoelectric detector (141) is communicatively connected to a collector.

6. The high-precision measurement device for optical axis deviation of a multi-aperture imaging system according to claim 5, characterized in that: The deviation of the optical axis of aperture i of the multi-aperture imaging system (2) relative to aperture one (21) is: Da 1i =Dα1-Dα i Db 1i =Δβ1-Δβ i Where: Δα 1i , Δβ 1i They represent the elevation and azimuth deviations of aperture i relative to the optical axis of aperture 1, Δα1 and Δβ1 represent the elevation and azimuth deviations of the optical axis of aperture 1 relative to the optical axis of the analysis component, respectively; Δα i , Δβ i They represent the elevation and azimuth deviations of the optical axis of aperture i relative to the optical axis of the analyzed component, respectively.

7. A high-precision calibration method for optical axis deviation of a multi-aperture imaging system, characterized in that: The method is used to adjust and calibrate the measuring device according to any one of claims 1 to 6 and to perform an optical axis deviation test, comprising the following steps: S1: adjusting the elevation and angular position of N1 so that the collimated light source (11) is incident on the aperture 1 (21) after being reflected by the N1 element and imaged at the center of the focal plane of the aperture 1 (21); S2: Install a large-aperture plane reflector (13) and adjust it so that the light beam reflected by the large-aperture plane reflector (13) returns to N1 along the original path in sequence, and after being transmitted through N1, is focused to its focal point by a focusing lens (142); S3: Adjust the array photoelectric detector (141) to the focal plane of the focusing lens (142) and record the centroid position of the light spot N1 (Δ x1 ,Δ y1 ); S4: Block the light beam reflected by N1 to the large-aperture plane reflector (13), and adjust the pitch and angular position of N2 so that after being reflected by N2 to the large-aperture plane reflector (13), and then reflected by the large-aperture plane reflector (13), N2, and N1, the centroid position of the light spot returning to the analysis component is also located at (Δ x1 ,Δ y1 ), and successively block N2…N i-1 The light beam is reflected to the large-aperture plane reflector (13), and N is adjusted. i The pitch and angular position of N i After reflection, it is reflected by a large-aperture plane reflector (13) and then passes through N i-1 Reflection, returning to the center of mass of the light spot of the analysis component (Δ x1 ,Δ y1 ); S5: Remove the large-aperture plane reflector (13) to make the i The reflected light beams are incident on the aperture i respectively, and the center of mass of the light spot (Δc x1 ,Δc y1 ), the optical axis of the imaging system with aperture i is measured as: Da i =D cxi / f i Db i =D cyi / f i Where: Δα i , Δβ i They represent the elevation and azimuth deviations of the optical axis of aperture i relative to the optical axis of the analyzed component, respectively; f i represents the focal length of aperture i; S6: Based on the imaging optical axis of aperture i, obtain the optical axis deviation (Δα) of the imaging optical axes of the remaining apertures relative to the optical axis of aperture one (21) 1i , Δβ 1i ).

Images