Exposure equipment and exposure method

Abstract

The invention relates to exposure equipment and an exposure method.The exposure equipment comprises an exposure mechanism, an alignment mechanism and a rotating table, the exposure mechanism comprises a mask plate, a deviation rectifying mechanism and a projection lens, the mask plate is installed on the deviation rectifying mechanism, the exposure equipment is provided with at least eight stations, and the projection lens is installed on the mask plate; the stations are respectively a feeding station, an alignment station, an exposure station, a discharging station, at least one alignment buffer station, at least one exposure buffer station, at least one discharging buffer station and at least one feeding buffer station, each station is correspondingly provided with a workbench, the alignment mechanism is arranged on the alignment station, the exposure mechanism is arranged on the exposure station, and the discharging mechanism is arranged on the discharging buffer station. The alignment mechanism obtains the actual position of the workpiece, and the deviation rectifying mechanism of the exposure mechanism adjusts the position of the mask plate according to the actual position of the workpiece, so that the mask plate corresponds to the actual position of the workpiece, and the preparation work before processing of each station is realized by utilizing the buffer station of each station, the processing time of the corresponding station is shortened, and the processing efficiency is improved.

Description

Technical Field

[0001] The invention relates to the field of photovoltaic product processing, in particular to exposure equipment and exposure method for photovoltaic cells. Background Art

[0002] At present, when making photovoltaic cell grid lines, silver paste screen printing technology or copper electroplating process is mainly used. Silver paste screen printing technology has high cost and low efficiency and production capacity. At the same time, the conductivity of the grid line and the energy efficiency conversion of the battery are relatively low, making the copper electroplating process more concerned.

[0003] The copper electroplating process includes four steps: depositing a seed layer, patterning, copper electroplating, and post-processing. Patterning is a relatively important step in the copper electroplating process, and an exposure process is used to generate a pattern on the substrate. The current exposure process mainly includes digital scanning and mask projection. Digital scanning photolithography machines can meet the process requirements of copper electroplating grid lines. However, due to the small light output width of each optical lens in the digital scanning method, more parts are required. When making finer grid lines, a higher resolution configuration is required, the cost is high, the scanning speed of the working process is limited, and the processing efficiency is limited. Compared with PCB boards, the size of photovoltaic product substrates is relatively fixed, and the material number information rarely changes. Basically, the same size of substrates is used to make grid lines of the same specifications. The mask required for patterning is relatively fixed. It is difficult for digital scanning photolithography machines to give full play to their advantages of being able to expose a variety of patterns, and their production efficiency is limited. Summary of the invention

[0004] The technical problem to be solved by the present invention is to provide an exposure device and an exposure method for high-yield photovoltaic cells.

[0005] In order to solve the above problems, the present invention provides an exposure device, which includes an exposure mechanism, an alignment mechanism and a rotating table. The exposure mechanism includes a light source, a shaping unit, a mask plate, a correction mechanism and a projection lens. The mask plate is installed on the correction mechanism. The light emitted by the light source passes through the shaping unit, the mask plate and the projection lens in sequence. The rotating table includes a rotary drive device and a workbench arranged on the rotary drive device. The exposure device is provided with at least 8 stations, namely a loading station, an alignment station, an exposure station and a unloading station, and there are at least 8 stations between the loading station and the alignment station. There is at least one alignment buffer station, at least one exposure buffer station is included between the alignment station and the exposure station, at least one unloading buffer station is included between the exposure station and the unloading station, and at least one loading buffer station is included between the unloading station and the loading station. A workbench is arranged corresponding to each station, the alignment mechanism is arranged at the alignment station, and the exposure mechanism is arranged at the exposure station. The alignment mechanism obtains the actual position of the workpiece placed on the workbench, and the correction mechanism of the exposure mechanism adjusts the position of the mask plate according to the actual position of the workpiece, so that the mask plate corresponds to the actual position of the workpiece.

[0006] Preferably, the rotary drive device includes a turntable, a linear motor, a cross-roller bearing and a mover, the worktable is mounted on the turntable, the turntable is mounted on the cross-roller bearing, the cross-roller bearing is connected to the stator, and the diameter of the mover of the rotary drive mechanism is larger than the diameter of the turntable.

[0007] Preferably, the correcting mechanism is vertically arranged and installed on the projection lens, the correcting mechanism includes a mounting base plate, a driving adjustment mechanism and an adjustment plate, the driving adjustment mechanism is installed on the mounting base plate, the adjustment plate is connected to the driving adjustment mechanism, the driving adjustment mechanism includes at least three driving devices, the driving devices are respectively arranged on two adjacent sides of the mounting base plate, including a first driving device that drives the adjustment plate to move in a vertical direction, and a second driving device that drives the adjustment plate to move in a horizontal direction perpendicular to the vertical direction, at least the second driving device includes a driving source, a cross-moving mechanism and an auxiliary moving mechanism, the cross-moving mechanism and the auxiliary moving mechanism are located on both sides of the driving source, and the driving source drives the cross-moving mechanism and the auxiliary mechanism to move.

[0008] Preferably, the first driving device and the second driving device each include a driving source, a cross moving mechanism and an auxiliary moving mechanism, the cross moving mechanism and the auxiliary moving mechanism are located on both sides of the driving source, and the driving source drives the cross moving mechanism and the auxiliary mechanism to move.

[0009] Preferably, the cross-moving mechanism includes a first sliding member installed on a base plate, a second sliding member installed on the first sliding member, and a rotating bearing installed on the second sliding member, the sliding directions of the first sliding member and the second sliding member are perpendicular, the auxiliary moving mechanism is consistent with the sliding direction of the first sliding member, and the adjustment plate is connected to the rotating bearing.

[0010] Preferably, the cross moving mechanism of the second driving device is located at the lower part, and the auxiliary moving mechanism is located at the upper side.

[0011] Preferably, the cross-movement mechanism adopts a cross-roller guide rail, and the auxiliary movement mechanism includes a guide rail and a slider, and the slider is connected to the driving source.

[0012] Preferably, the driving source is a linear motor, and the driving device of the driving adjustment mechanism includes a cross-moving mechanism and an auxiliary moving mechanism. The linear motor drives the cross-moving mechanism and the auxiliary moving mechanism to move through a connecting member. The connecting member includes a first connecting part, a second connecting part and a third connecting part. The first connecting part is connected to the side of the linear motor and slides along the side of the linear motor. The second connecting part is laterally connected to the first sliding part of the cross-moving mechanism. The third connecting part is connected to the top of the auxiliary moving mechanism. The first connecting part and the second connecting part are connected, and the second connecting part and the third connecting part are vertically connected.

[0013] Preferably, the driving and adjusting mechanism further comprises an independently arranged rotating member, the rotating member and the three driving devices are symmetrically arranged and connected to the adjusting plate.

[0014] The exposure method of the above-mentioned exposure equipment, wherein the exposure equipment is provided with eight workstations, the workpiece is loaded from the loading station and placed on the workbench, or the workpiece is loaded from the loading station and the loading buffer station at the same time; the workbench drives the workpiece to move to the alignment buffer station to perform workpiece loading detection; the workbench moves to the alignment station for alignment, uses the exposure buffer station for alignment processing, and moves to the exposure station for exposure operation; performs pre-unloading preparations at the unloading buffer station, completes the unloading operation at the unloading station, or performs unloading operations at the unloading station and the unloading buffer station at the same time.

[0015] Compared with the prior art, the exposure method adopts an exposure method with at least eight workstations, and uses the buffer workstation of each workstation to realize the preparatory work before processing at each workstation, thereby reducing the processing time at the corresponding workstation. The worktable rotates no more than 45°, that is, one workpiece completes the exposure, thereby shortening the production interval time of the processed workpiece and improving the processing efficiency. The exposure equipment adopts a mask alignment method to reduce the load of each workstation, and adopts a design of at least eight workstations to improve the overall beat of the equipment, increase the overall fault tolerance, and ensure the improvement of the overall production capacity. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is a schematic diagram of each processing station.

[0017] Figure 2 is a schematic diagram of the exposure equipment.

[0018] Figure 3 It is the top view of the rotating platform.

[0019] Figure 4 It is a cross-sectional view of the rotating platform.

[0020] Figure 5 It is a schematic diagram of the exposure mechanism.

[0021] Figure 6 It is a schematic diagram of the correction mechanism.

[0022] Figure 7 It is a schematic diagram of an embodiment of a driving and adjusting mechanism of a deviation correcting mechanism.

[0023] Figure 8 It is a cross-sectional view of the cross-movement mechanism.

[0024] Fig. 9 Schematic diagram of the adjustment plate and mask mounting plate.

[0025] Fig.10 Schematic diagram of the adjustment member installed on the adjustment plate.

[0026] Fig.11 It is a schematic diagram of motion control principle.

[0027] Fig.12 It is a schematic diagram of another embodiment of the driving and adjusting mechanism of the deviation correcting mechanism.

[0028] Fig.13 It is a cross-sectional schematic diagram of another embodiment of the driving and adjusting mechanism of the deviation correcting mechanism.

[0029] Fig.14 It is a cross-sectional view of a driving device of another embodiment of a driving and adjusting mechanism of a deviation correcting mechanism.

[0030] Fig.15 It is a cross-sectional view of a connecting piece of another embodiment of a driving and adjusting mechanism of a deviation correcting mechanism. DETAILED DESCRIPTION

[0031] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention is described below by means of specific embodiments shown in the accompanying drawings.

[0032] like Figure 1As shown, an exposure method is provided, the exposure method comprising a loading station, an alignment station, an exposure station and an unloading station, at least one alignment buffer station is included between the loading station and the alignment station, at least one exposure buffer station is included between the alignment station and the exposure station, at least one unloading buffer station is included between the exposure station and the unloading station, and at least one loading buffer station is included between the unloading station and the loading station.

[0033] Each workstation corresponds to a workbench. The workpiece placed on the workbench is loaded from the loading station, aligned at the alignment station, exposed at the exposure station, and unloaded at the unloading station. Each workstation cycles back and forth, and each workstation moves one position to the next station, and each station works independently.

[0034] The loading station is provided with a loading device, and the workpiece is accurately placed on the workbench through the loading device. The loading device places the workpiece on the workbench when the workbench moves to the loading station. Alternatively, the loading device is located between the loading station and the loading buffer station, and performs loading preparation work when the workbench moves to the loading buffer station. When the workbench moves to the loading station and the next workbench moves to the loading buffer station, two workpieces are placed on their respective workbenches at the same time.

[0035] The alignment station is provided with an alignment mechanism, and the alignment mechanism includes an image acquisition mechanism, through which the actual position of the workpiece is obtained. Preferably, four image acquisition mechanisms are provided, and the image acquisition mechanisms include a camera, a telecentric lens and a light source, and the two ends of the telecentric lens are respectively connected to the camera and the light source. The image acquisition unit simultaneously acquires pictures of the four vertex corners of the workpiece, and there will be no distortion during the alignment process, and the alignment accuracy is higher. In addition, compared with acquiring the image of the entire workpiece through a panoramic camera, each image occupies less memory and has a faster data processing speed.

[0036] The exposure station is provided with an exposure mechanism, which includes a light source, a shaping unit, a mask, a correction mechanism and a projection mechanism. The light emitted by the light source is projected onto the workpiece through the shaping unit, the mask and the projection mechanism in sequence. The mask is installed on the correction mechanism, and the position of the mask is adjusted by the correction mechanism to correspond to the position of the workpiece.

[0037] The unloading station is provided with an unloading mechanism, and the workpiece is moved out of the workbench through the unloading device. The unloading device moves the workpiece out to the workbench when the workbench moves to the unloading station. Alternatively, the unloading device is located between the unloading station and the unloading buffer station, and when the workbench moves to the unloading buffer station, the unloading preparation work is performed, and when the workbench moves to the unloading station and the next workbench moves to the unloading buffer station, two workpieces are moved out of their respective workbenches at the same time.

[0038] The workstations are arranged in a ring shape, and the workbench is installed on a rotary drive device, and the workbench is driven to and from the workstations by the rotary drive device.

[0039] The number of workstations in the exposure method is an integer multiple N of 4 workstations, where N is a positive integer not less than 2. The angle of each rotation of the rotary drive device is 90 / N. According to the size of the exposure equipment and the inertia of the entire workstation, the larger the value of N, the smaller the rotation angle of the rotary drive mechanism. However, the number of corresponding workbenches increases, the overall weight of the rotary drive increases, and the required rotational inertia and diameter increase accordingly. Therefore, it is preferred to use 8 workstations with the shortest rotation time and be able to use the exposure process requirements without taking up too much space.

[0040] When the exposure method adopts eight stations, the workpiece is loaded from the loading station and placed on the workbench. The workbench drives the workpiece to move to the alignment buffer station to perform workpiece loading detection, detect whether the workpiece is successfully loaded, and / or detect whether the workpiece has defects such as cracks. The workbench moves to the alignment station for alignment, uses the exposure buffer station for alignment processing, moves to the exposure station for exposure operation, performs pre-unloading preparations through the unloading buffer station, and completes the unloading operation through the unloading station. Each workbench circulates back and forth, and each workbench moves one position to the next station, and each station works independently. The buffer station of each station can be used to implement the preparatory work before processing at each station, reduce the processing time at the corresponding station, and improve processing efficiency. At the same time, every time the workbench rotates 45°, a workpiece completes exposure, shortening the production interval time of the processed workpiece.

[0041] The exposure equipment to which the exposure method is applied is described in detail below. Figure 2-15 As shown, the exposure device includes a base 1, a support frame 2 and a rotating table 3 arranged on the base, and an exposure setting mechanism 4 and an alignment mechanism 5 arranged on the support frame 2.

[0042] The rotating table 3 includes a rotating drive device and a workbench 30 arranged on the rotating drive device, and the rotating drive device drives the workbench 30 to move to each workstation. The rotating drive device can be driven by a direct drive motor (DD motor) or a linear motor. The linear motor drive mode is specifically described below. The rotating drive device includes a turntable 31, a linear motor, a cross roller bearing 32, a stator 33 and a mover 34. The workbench 30 is installed on the turntable 31, and the turntable 31 is installed on the cross roller bearing 32. The cross roller bearing 32 is connected to the mover 34, and the mover 34 moves relative to the stator 33. By driving the cross roller bearing 32 to rotate, the workbench 30 installed on the turntable 31 is driven to move between different workstations. The diameter of the mover 34 of the rotating drive mechanism is larger than the diameter of the turntable 31, which solves the problem of end jump during the driving process of the larger diameter turntable, and improves the repeatability and positioning accuracy of the rotating drive mechanism. When the rotating drive device rotates, the moving position of each workstation is measured by a magnetic scale, and precision compensation is performed in real time.

[0043] The number of the workbenches 30 corresponds to the number of processing stations, including workbenches corresponding to the loading station, alignment station, exposure station and unloading station, and workbenches corresponding to at least one buffer station between each station. Preferably, eight workbenches are used. The rotary drive mechanism rotates 45° to drive the workbenches to move to the next station.

[0044] The exposure mechanism 4 includes a light source, a shaping unit 40, a correction mechanism 41, a projection lens 42 and a mask 43. The light source transmits light to the shaping unit 40 through an optical fiber. A mask and a correction mechanism 41 are arranged between the shaping unit 40 and the projection lens 42. The correction mechanism 41 is fixedly connected to the projection lens 42. The mask 43 is installed on the correction mechanism 41. The mask 43 is arranged vertically, and the exposure lens is divided into a front section and a rear section, so as to avoid the exposure lens being too long and occupying a small space. At the same time, the correction mechanism 41 is arranged to adjust the positional relationship between the mask 43 and the workpiece, and there is no need to set an adjustment mechanism on the workbench carrying the workpiece. Especially for the mode of setting multiple workbenches, the components of the workbench are greatly reduced, making the workbench simpler, reducing the weight of the workbench, and facilitating control. However, after the correction mechanism 41 is arranged vertically, the movement accuracy is affected due to the action of force.

[0045] In order to improve the accuracy of the vertical correction mechanism, Figure 5-Figure 15The deviation correction mechanism 41 shown includes a mounting base plate 400, an adjustment plate 500, a mask mounting plate 600 and a drive adjustment mechanism 700. The mounting base plate 400 is used to fix the position of the deviation correction mechanism 41. The drive adjustment mechanism 700 is mounted on the mounting base plate 400. The mounting base plate 400 and the adjustment plate 500 are connected through the drive adjustment mechanism 700. The drive adjustment mechanism pushes the adjustment plate 500 to move and adjust it to a suitable position. The mask mounting plate 600 is detachably mounted on the adjustment plate 500. The mounting base plate 400, the adjustment plate 500 and the mask mounting plate 600 are all hollow.

[0046] The driving and adjusting mechanism includes at least three driving devices, which are respectively arranged on two adjacent sides of the mounting base plate 400, including a first driving device 701 that drives the adjusting plate 500 to move in the vertical direction, and a second driving device 702 that drives the adjusting plate to move in the horizontal direction perpendicular to the vertical direction. The number of the first driving device 701 or the second driving device 702 is two, and the rotation of the adjusting plate is achieved by adjusting the different feed amounts of the two first driving devices 701 or the two second driving devices 702. By controlling the three driving devices, the adjusting plate 500 is driven to perform linear motion and rotational movement in the vertical plane. The driving and adjusting mechanism 700 also includes an independently arranged rotating member 703 to cooperate with the rotation of the adjusting plate. Preferably, the rotating member 703 and the three driving devices (701, 702) are symmetrically arranged and connected to the adjusting plate 500.

[0047] At least the second driving device located at the lower part of the installation base plate includes a driving source 710, a cross-moving mechanism 711 and an auxiliary moving mechanism 712. The cross-moving mechanism 711 and the auxiliary moving mechanism 712 are located on both sides of the driving source 710. The driving source 710 is connected to the cross-moving mechanism 711 and the auxiliary moving mechanism 712 through a connecting piece. The adjustment plate 500 is connected to the cross-moving mechanism 711. The driving source 710 drives the cross-moving mechanism 711 to drive the adjustment plate 500 to move, and the auxiliary moving mechanism 712 guides the movement to ensure the accuracy of the cross-moving mechanism 711 and avoid the accuracy influence caused by the vertical installation force. The cross moving mechanism 711 includes a first sliding member 7110 installed on the bottom plate, a second sliding member 7111 installed on the first sliding member 7110, and a rotating bearing 7112 installed on the second sliding member 7111. The sliding directions of the first sliding member 7110 and the second sliding member 7111 are perpendicular. The auxiliary moving mechanism 712 is consistent with the sliding direction of the first sliding member 7110, and the adjustment plate 700 is connected to the rotating bearing 7112. The auxiliary moving mechanism 712 includes a guide rail and a slider. The slider is connected to the driving source and adopts a linear guide rail. The first sliding member 7110 and the second sliding member 7111 can adopt a cross roller guide rail. For the driving device located at the lower part of the mounting bottom plate, preferably, the auxiliary moving mechanism 712 is located on the upper side, and the cross moving mechanism 711 is located on the lower side. The auxiliary moving mechanism 712 selects a moving mechanism that can bear a load greater than the load of the corresponding correction mechanism. Such arrangement allows the auxiliary moving mechanism 712 to bear more longitudinal loads, thereby protecting the cross moving mechanism 711 from wear and deformation due to stress, thereby ensuring the accuracy of the cross moving mechanism 711.

[0048] The four corners of the adjustment plate 500 are respectively provided with adjustment members 501, and the adjustment members 501 are against the mask mounting plate 500. By adjusting the adjustment members, the mask mounting plate 500 is pushed up, and the position of the mask mounting plate 500 is adjusted to obtain the best image plane of the mask. Preferably, the adjustment member 501 includes two pushers, which are respectively close to the two adjacent sides of the adjustment plate to adjust the mask mounting plate 500 in multiple directions. The adjustment member 501 can adopt a precision thread pair.

[0049] The mask mounting plate 600 includes a substrate 601, a light hole located in the middle of the substrate 601, a strip stopper 603 located around the light hole, and two corner positioning members 604 located at the lower part of the light hole, and the corner positioning members 604 cover the corner positions of the mask plate 43 located at the lower part. The strip stopper 603 fixes the four sides of the mask plate 43, and the two corner positioning members 604 and the lower strip stopper 603 support and limit the position of the mask plate 43. The lower part of the substrate 601 has two recesses, which cooperate with the protrusion 502 set on the adjustment plate 500 to support and limit the position of the mask mounting plate 600. The mask mounting plate 600 and the adjustment plate 500 are also positioned by the fixing member 605 on the side. When replacing the mask plate, it is only necessary to remove the mask mounting plate 600 as a whole, and there is no need to adjust the best focal plane of the mask plate when reinstalling it. The operation is simple and convenient, and the debugging time is shortened.

[0050] When the mask plate and the workpiece are aligned and corrected, the mask plate is moved and rotated in a certain plane in the vertical and horizontal directions by adjusting the feed amounts of the three drive devices respectively. Take the configuration of two first drive devices and one second drive device as an example.

[0051] like Fig.11 As shown, a coordinate system is established with the vertical direction as the X direction and the horizontal direction as the Y direction.

[0052] The relative feed amount d corresponding to the first driving device A701a X1 =Rcos(dθ+θ X1 +θ0)-Rcos(θ X1 +θ0).

[0053] The relative feed amount d corresponding to the first driving device B701b X2 =Rcos(dθ+θ X2 +θ0)-Rcos(θ X2 +θ0).

[0054] The relative feed amount d corresponding to the second driving device 702 Y =Rsin(dθ+θ Y +θ0)-Rsin(θ Y +θ0).

[0055] Where R is the radius of the virtual circle determined by the initial rotation bearing center of the first driving device A701a, the first driving device B701b and the second driving device 702, θ X1 is the angular position of the center of the rotating bearing of the first drive device A701a, θ X2 is the angular position of the center of the rotating bearing of the first drive device B701b, θY is the angular position of the center of the rotating bearing of the second driving device 7002, θ0 is the angle of the adjustment plate before the calculation action, and dθ is the rotation angle of the adjustment plate.

[0056] The following describes the deviation correction mechanism using different driving sources through different embodiments.

[0057] like Figure 6-Figure 10 As shown, it is the first embodiment of the correction mechanism, the correction mechanism adopts a servo screw as a driving source, and the driving adjustment mechanism includes three driving devices, namely a first driving device A701a, a first driving device B701b and a second driving device 702.

[0058] The first drive device A701a and the first drive device B701b include a vertical servo screw 720 and a vertical cross-moving mechanism 721. The vertical servo screw 720 includes a servo motor and a screw 722 connected to the servo motor. The first sliding member of the vertical cross-moving mechanism 721 moves vertically, and the second sliding member arranged on the upper part of the first sliding member moves horizontally perpendicular to the vertical direction, and the rotating bearing is arranged above the second sliding member. The vertical servo screw 720 is located on one side of the vertical cross-moving mechanism 721, connected to the first sliding member of the cross-moving mechanism 721, and the servo motor drives the screw 722 to drive the cross-moving mechanism to move vertically.

[0059] The second driving device 702 includes a transverse servo screw 710, a transverse cross-moving mechanism 711 and an auxiliary moving mechanism 712. The transverse servo screw 710 is located between the transverse cross-moving mechanism 711 and the auxiliary moving mechanism 712, and drives the transverse cross-moving mechanism 711 and the auxiliary moving mechanism 712 to move at the same time. The first sliding member of the transverse cross-moving mechanism 711 moves horizontally, and the second sliding member arranged on the upper part of the first sliding member moves vertically perpendicular to the horizontal direction, and the rotating bearing is arranged above the second sliding member. The auxiliary moving mechanism 712 moves in the same horizontal direction as the first sliding member. The longitudinal load is borne by the auxiliary moving mechanism to ensure the accuracy of the cross-moving mechanism.

[0060] Preferably, a rotating member 703 is symmetrically arranged with respect to the second driving device 702 , and the rotating member 703 includes a transverse cross movement mechanism 730 and an auxiliary movement mechanism 731 , and the auxiliary movement mechanism 731 is connected to the first sliding member of the transverse cross movement mechanism 730 .

[0061] like Figure 12-Figure 15As shown, it is a second embodiment of the correction mechanism, which adopts a linear motor as a driving source. Like the first embodiment, the driving adjustment mechanism includes three driving devices, namely a first driving device A741a, a first driving device B741b and a second driving device 742.

[0062] The first driving device A741a, the first driving device B741a and the second driving device 742 all include a linear motor 750, a cross moving mechanism 751, an auxiliary moving mechanism 752 and a connecting member 753. The linear motor 750 drives the cross moving mechanism 751 and the auxiliary moving mechanism 752 to move through the connecting member. The movement direction of the auxiliary moving mechanism 752 is the same as the movement direction of the first sliding member 7510 of the cross moving mechanism 751. The first sliding mechanisms of the cross moving mechanisms of the first driving device A741a and the first driving device B741a move vertically, and the first sliding mechanism of the cross moving mechanism of the second driving device 742 moves horizontally. The connecting member 753 includes a first connecting portion 7530, a second connecting portion 7531 and a third connecting portion 7532, wherein the first connecting portion 7530 is connected to the side of the linear motor 750, the second connecting portion 7531 is laterally connected to the first sliding member 7510 of the cross moving mechanism 751, and the third connecting portion 7532 is connected to the top of the auxiliary moving mechanism 752, the first connecting portion 7530 and the second connecting portion 7531 are connected, and the second connecting portion 7531 and the third connecting portion 7532 are vertically connected. The linear motor 750 drives the connecting member 753 to move, and the connecting member 753 drives the cross moving mechanism 751 and the auxiliary moving mechanism 752 to move. The linear motor 750 is externally arranged, and the cross moving mechanism 751 and the auxiliary moving mechanism 752 are driven to move by the connecting member 753, so as to facilitate the synchronous control of the cross moving mechanism 752 and the auxiliary moving mechanism 753, better play the guiding role of the auxiliary moving mechanism 752, and avoid the cross moving mechanism 751 from being worn and deformed by force, which affects the accuracy of the system.

[0063] The mounting base plate and the adjusting plate of the correction mechanism are provided with a magnetic device 760. When the power is off, the mounting base plate and the adjusting plate are fixed in position by the magnetic device 760 to avoid loss of the limiting device after the power is off, and free sliding, which is not conducive to transportation and fixation, and can also avoid damage due to external force after the power is off.

[0064] The use of linear motor drive can increase the moving speed and match a faster processing rhythm.

[0065] The alignment mechanism 5 includes a plurality of image acquisition mechanisms 50, which are located on the oblique side of the exposure mechanism 4. The number of the image acquisition mechanisms 50 corresponds to the number of vertex angles of the workpiece. For example, for a rectangular workpiece, the number of the image acquisition mechanisms 50 is four, which are arranged corresponding to the shape of the workpiece.

[0066] The exposure equipment adopts a mask alignment method to reduce the load of each workstation, and adopts a design of at least eight workbenches to improve the overall beat of the equipment, increase the overall fault tolerance, and ensure the improvement of overall production capacity.

Claims

1. An exposure device, characterized in that: The exposure device comprises an exposure mechanism, an alignment mechanism and a rotating table. The exposure mechanism comprises a light source, a shaping unit, a mask, a correction mechanism and a projection lens. The mask is installed on the correction mechanism. The light emitted by the light source passes through the shaping unit, the mask and the projection lens in sequence. The rotating table comprises a rotary drive device and a workbench arranged on the rotary drive device. The exposure device is provided with at least 8 stations, namely, a loading station, an alignment station, an exposure station and a unloading station, and at least one alignment buffer station is included between the loading station and the alignment station. There is at least one exposure buffer station between the alignment station and the exposure station, at least one unloading buffer station between the exposure station and the unloading station, and at least one loading buffer station between the unloading station and the loading station. A workbench is arranged corresponding to each station, the alignment mechanism is arranged at the alignment station, and the exposure mechanism is arranged at the exposure station. The alignment mechanism obtains the actual position of the workpiece placed on the workbench, and the correction mechanism of the exposure mechanism adjusts the position of the mask plate according to the actual position of the workpiece, so that the mask plate corresponds to the actual position of the workpiece.

2. The exposure device according to claim 1, characterized in that: The rotary drive device includes a turntable, a linear motor, a cross roller bearing and a mover. The workbench is installed on the turntable, the turntable is installed on the cross roller bearing, the cross roller bearing is connected to the stator, and the diameter of the mover of the rotary drive mechanism is larger than the diameter of the turntable.

3. The exposure device according to claim 1, characterized in that: The deflection correction mechanism is vertically arranged and installed on the projection lens. The deflection correction mechanism includes a mounting base plate, a driving adjustment mechanism and an adjustment plate. The driving adjustment mechanism is installed on the mounting base plate, and the adjustment plate is connected to the driving adjustment mechanism. The driving adjustment mechanism includes at least three driving devices, which are respectively arranged on two adjacent sides of the mounting base plate, including a first driving device that drives the adjustment plate to move in a vertical direction, and a second driving device that drives the adjustment plate to move in a horizontal direction perpendicular to the vertical direction. At least the second driving device includes a driving source, a cross-moving mechanism and an auxiliary moving mechanism. The cross-moving mechanism and the auxiliary moving mechanism are located on both sides of the driving source, and the driving source drives the cross-moving mechanism and the auxiliary mechanism to move.

4. The exposure device according to claim 3, characterized in that: The first driving device and the second driving device both include a driving source, a cross moving mechanism and an auxiliary moving mechanism. The cross moving mechanism and the auxiliary moving mechanism are located on both sides of the driving source. The driving source drives the cross moving mechanism and the auxiliary mechanism to move.

5. The exposure device according to claim 3, characterized in that: The cross-moving mechanism includes a first sliding member installed on a base plate, a second sliding member installed on the first sliding member, and a rotating bearing installed on the second sliding member. The sliding directions of the first sliding member and the second sliding member are perpendicular. The auxiliary moving mechanism is consistent with the sliding direction of the first sliding member, and the adjustment plate is connected to the rotating bearing.

6. The exposure device according to claim 3, characterized in that: The cross movement mechanism of the second driving device is located at the lower part, and the auxiliary movement mechanism is located at the upper side.

7. The exposure device according to claim 3, characterized in that: The cross movement mechanism adopts a cross roller guide rail. The auxiliary movement mechanism includes a guide rail and a slider, and the slider is connected to the driving source.

8. The exposure device according to claim 3, characterized in that: The driving source adopts a linear motor, and the driving device of the driving adjustment mechanism includes a cross-moving mechanism and an auxiliary moving mechanism. The linear motor drives the cross-moving mechanism and the auxiliary moving mechanism to move through a connecting member. The connecting member includes a first connecting part, a second connecting part and a third connecting part. The first connecting part is connected to the side of the linear motor and slides along the side of the linear motor. The second connecting part is laterally connected to the first sliding part of the cross-moving mechanism. The third connecting part is connected to the top of the auxiliary moving mechanism. The first connecting part and the second connecting part are connected, and the second connecting part and the third connecting part are vertically connected.

9. The exposure device according to claim 3, characterized in that: The driving and adjusting mechanism further comprises an independently arranged rotating member, the rotating member and the three driving devices are symmetrically arranged and connected to the adjusting plate.

10. The exposure method according to any one of claims 1 to 9, characterized in that: The exposure equipment is provided with eight workstations. The workpiece is loaded from the loading station and placed on the workbench, or the workpiece is loaded from the loading station and the loading buffer station at the same time; the workbench drives the workpiece to move to the alignment buffer station for workpiece loading detection; the workbench moves to the alignment station for alignment, uses the exposure buffer station for alignment processing, and moves to the exposure station for exposure operation; the unloading buffer station is used to carry out pre-unloading preparation, the unloading operation is completed at the unloading station, or the unloading operation is carried out at the unloading station and the unloading buffer station at the same time.

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