Discharge degradation device and method for SF6 waste gas

Abstract

The invention discloses an SF6 waste gas discharge degradation device and method, and the device comprises a gas pump which can manually regulate and control the gas flow rate in each gas path; the gas mixing mechanism is arranged at one end of the gas pump and is used for mixing the background gas in the mechanism with SF6; the reaction mechanism comprises an air inlet wheel cylinder and a reactor arranged on one side of the air inlet wheel cylinder; the tail gas degradation mechanism is used for degrading tail gas and preventing secondary pollution; according to the invention, the problems of gas imbalance, reactor leakage, heat dissipation of a reaction device, difficulty in gas inlet during degradation of normal-pressure or negative-pressure waste gas and the like in each reactor in a plasma discharge matrix are solved, the degradation efficiency can be effectively improved, and the safety, the controllability and the economical efficiency of equipment are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of SF6 degradation, and in particular to a device and method for SF6 waste gas discharge degradation. Background Art

[0002] SF6 is a synthetic fluoride with an extremely stable molecular structure, excellent arc extinguishing ability and insulation performance, and relatively good thermal conductivity. Therefore, since the 1970s, SF6 has been widely used in various electrical equipment, mainly as an insulation and arc extinguishing medium for electrical equipment, including gas-insulated circuit breakers, gas-insulated current transformers, etc. SF6 is the gas with the strongest greenhouse effect among non-CO2 greenhouse gases, and it also has an extremely long atmospheric life, and its atmospheric content is increasing year by year.

[0003] At present, in order to reduce the damage of SF6 to the atmospheric environment, the main technologies used are SF6 purification and recovery, the use of environmentally friendly insulating alternative gases for SF6, and the degradation and conversion of SF6 waste gas. Among them, the degradation technology is particularly reliable and can achieve a high degradation rate. The dielectric barrier discharge low-temperature plasma method has shown advantages in the degradation of SF6 waste gas, such as strong discharge controllability, high energy efficiency, high degradation rate, and simple device structure. Therefore, it has great potential for industrial application, and there are related cases in SF6 waste gas treatment with excellent results.

[0004] At present, many scholars have conducted experiments on SF6 waste gas treatment, such as the "Sulfur hexafluoride degradation treatment device based on dielectric barrier discharge" published on June 7, 2019 with number CN208943805U; "A mixed gas treatment equipment based on plasma technology" published on July 30, 2021 with number CN113181744A. These patents mainly carry out efficient and harmless degradation of SF6 waste. The input gas is pressurized by a high-pressure gas cylinder, and then mixed for degradation. The plasma discharge matrix in the patent "A mixed gas treatment equipment based on plasma technology" is directly connected to the initial gas through a three-way and a four-way, exposing the reactor to the atmospheric environment.

[0005] The degradation of SF6 is mainly carried out in the form of dielectric barrier discharge. Zhang Xiaoxing and others used dielectric barrier discharge to conduct degradation experiments on SF6, mainly by changing the input voltage, frequency, medium type, background gas, external gas and other conditions to explore the effects of various factors on SF6 degradation. And the plasma discharge matrix is ​​used to efficiently degrade a large amount of waste gas at the same time. It uses root reactors, because of their large number and close distance between reactors, its heat dissipation problems and uneven reactor air intake problems need to be solved, and reactor leakage and other problems have not been considered. Summary of the invention

[0006] In view of the problem that SF6 is difficult to degrade in the above-mentioned prior art, the present invention is proposed.

[0007] Therefore, an object of the present invention is to provide a device and method for SF6 waste gas discharge degradation.

[0008] In order to solve the above technical problems, the present invention provides the following technical solutions:.

[0009] As a preferred solution of the SF6 waste gas discharge degradation device described in the present invention, it includes: an air pump, which can manually adjust the gas flow rate in each gas path; a mixing mechanism, which is arranged at one end of the air pump, and is used to mix the background gas transported in the air pump with SF6; a reaction mechanism, which includes an intake sub-pump arranged at one end of the mixing mechanism, and a reactor arranged at one side of the intake sub-pump; and an exhaust gas degradation mechanism, which is used to degrade the exhaust gas.

[0010] As a preferred solution for the SF6 waste gas discharge degradation device described in the present invention, one end of the mixing mechanism is fixedly connected to two air pumps, one of the air pumps is used to supply background gas, and the other air pump is used to supply degradation gas, and the other end of the mixing mechanism is connected to the intake sub-pump.

[0011] As a preferred solution of the SF6 waste gas discharge degradation device described in the present invention, an air intake sub-pump is added in front of the reactor, and the reactor adopts a plasma discharge matrix reactor.

[0012] As a preferred solution of the SF6 waste gas discharge degradation device described in the present invention, a packaging box is provided at the outer end of the reaction mechanism, and a cooling fan is provided at the rear of the reaction mechanism.

[0013] As a preferred embodiment of the SF6 waste gas discharge degradation device and method described in the present invention, the exhaust gas degradation mechanism includes an air pump and an alkaline liquid washing pool arranged on one side of the air pump.

[0014] The present invention also proposes a method for SF6 waste gas discharge degradation, including the above-mentioned SF6 waste gas discharge degradation device; and completing the mixing of SF6 and background gas, ionizing the degradation gas through a plasma power supply and a voltage regulator, opening the air inlet sub-pump of the reactor, and allowing the mixed gas in the gas mixing mechanism to enter the reactor for degradation.

[0015] As a preferred embodiment of the SF6 waste gas discharge degradation device and method described in the present invention, the background gas provided by the air pump can be an inert gas; wherein, the SF6 waste gas has a high concentration and needs to be diluted by the background gas to increase its degradation rate.

[0016] As a preferred embodiment of the SF6 waste gas discharge degradation device and method described in the present invention, the background gas is air; wherein, N2 accounts for about 78.1% and O2 accounts for about 20.9% in the air, and these gases can promote the degradation of SF6.

[0017] As a preferred embodiment of the SF6 waste gas discharge degradation device and method described in the present invention, the reaction mechanism can be flexibly configured to expand and reduce the number of plasma discharge matrix reactors according to the amount of SF6 waste gas.

[0018] As a preferred embodiment of the SF6 waste gas discharge degradation device and method described in the present invention, the rotation speed of each of the air intake sub-pumps is the same, and the flow rate and capacity of the degradation gas in each of the reactors are the same, so that the gas degradation is more uniform.

[0019] Beneficial effects of the present invention: The present invention solves the problems of gas imbalance in each reactor in the plasma discharge matrix, reactor leakage, heat dissipation of the reaction device, and difficulty in air intake when degrading normal pressure or negative pressure waste gas, and can effectively improve the degradation efficiency and improve the safety, ease of control and economy of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for describing the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work. Among them:

[0021] Figure 1 It is a schematic diagram of the overall structure of the SF6 waste gas discharge degradation device and method of the present invention.

[0022] Figure 2 This is a data diagram of the overall degradation rate of SF6 under different input powers described in the present invention. DETAILED DESCRIPTION

[0023] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below in conjunction with the accompanying drawings.

[0024] In the following description, many specific details are set forth to facilitate a full understanding of the present invention, but the present invention may also be implemented in other ways different from those described herein, and those skilled in the art may make similar generalizations without violating the connotation of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0025] Secondly, the term "one embodiment" or "embodiment" as used herein refers to a specific feature, structure, or characteristic that may be included in at least one implementation of the present invention. The term "in one embodiment" that appears in different places in this specification does not necessarily refer to the same embodiment, nor does it refer to a separate or selective embodiment that is mutually exclusive with other embodiments.

[0026] Secondly, the present invention is described in detail with reference to the schematic diagram. When describing the embodiments of the present invention in detail, for the sake of convenience, the cross-sectional diagrams showing the device structure will not be partially enlarged according to the general scale, and the schematic diagrams are only examples, which should not limit the scope of protection of the present invention. In addition, in actual production, the three-dimensional dimensions of length, width and depth should be included.

[0027] Example 1

[0028] Reference Figure 1 , a discharge degradation device for SF6 waste gas is provided, an air pump 100, which can manually adjust the gas flow rate in each gas path; a mixing mechanism 200, which is arranged at one end of the air pump 100, and is used to mix the background gas transported in the air pump with SF6;

[0029] The reaction mechanism 300 includes an air intake sub-pump 301 disposed at one end of the gas mixing mechanism 200 and a reactor 302 disposed at one side of the air intake sub-pump 301; the tail gas degradation mechanism 400 is used to degrade the tail gas to prevent secondary pollution.

[0030] Specifically, one end of the gas mixing mechanism 200 is fixedly connected to two air pumps 100 , one of the air pumps 100 is used to supply background gas, and the other air pump 100 is used to supply degradation gas. The other end of the gas mixing mechanism 200 is connected to the intake sub-pump 301 .

[0031] Furthermore, an air intake sub-pump 301 is added in front of the reactor 302. The reactor 302 adopts a plasma discharge matrix reactor 302. An air intake sub-pump 301 is set on each air intake gas path. The gas flow rate in the air pump 100 channel can be checked through the display, and the operation of the air pump 100 is controlled by the knob switch. The gas flow rate in each air path can be manually adjusted to set the gas ratio.

[0032] Furthermore, a packaging box 303 is provided at the outer end of the reaction mechanism 300, and a cooling fan 304 is provided at the back of the reaction mechanism 300, which can not only cool the reaction mechanism 300, but also blow the gas in the reaction mechanism 300 into the air box, and then pass the gas into the washing pool for washing through the air pump 100 to prevent personal injury caused by leakage of the reactor 302.

[0033] Furthermore, the exhaust gas degradation mechanism 400 includes an air pump 100 and an alkaline liquid washing pool arranged on one side of the air pump 100. The exhaust gas is discharged and degraded through the reactor 302, and the degraded gas is introduced into the alkaline liquid washing pool for treatment, and then the degraded gas is discharged through the exhaust port; the gas in the reaction device is sucked into the bellows through the cooling fan 304, and the gas is pumped into the alkaline liquid washing pool for washing through the air pump 100 in the bellows to prevent gas leakage from the reactor 302.

[0034] Operation process: Step 1, preparation: first follow the invention Figure 1 The device is connected according to the structural diagram of the invention, and the gas circuit part and the circuit part in the device are connected. The gas circuit part includes gas distribution, gas mixing, reaction degradation and tail gas treatment. Connect each part tightly according to the structural diagram, first pass the background gas detection device to check the air tightness, prevent the leakage of toxic gas during the reaction from causing harm to the staff, and ensure the stable and orderly operation of the entire device; check the display regularly to determine whether the air pump 100 is working normally. Check the alkali liquid level in the gas washing pool regularly to prevent the undegraded toxic gas from entering the atmosphere due to less alkali liquid, endangering personal safety; replace the alkali liquid regularly, and clean the solid precipitate in the gas washing pool. The circuit part includes plasma power supply, transformer, control panel, air pump 100, cooling fan 304 and other devices. First check the wiring line to ensure that the wiring is correct, and then check whether the wiring is safe and reliable to ensure effective wiring. Check each device regularly to see if it is operating normally. Even if there is a failure in one device, it will affect the entire device.

[0035] Step 2, during degradation: first turn on the starting power supply, turn on the control panel, power on all devices, then turn on the cooling fan 304, and then adjust the two air intake pumps 100 through the knob switch according to the experimental requirements, turn on the plasma power supply and the voltage regulator to ionize the degradation gas, and then turn on the air intake sub-pump 301 of the reactor 302 to allow the mixed gas in the mixing device to enter the reactor 302 for degradation.

[0036] Step 3, stop degradation: first stop the air pump 100 of the SF6 gas circuit, close the SF6 gas input valve, continue to introduce background gas, keep the reaction device running stably, turn off the plasma power after ten minutes, turn off the air pump 100 of the background gas circuit after ten minutes, and turn off the air pump 100 of the reactor 302, turn off the cooling fan 304 after five minutes, then turn off the control panel power, and disconnect the power supply. At this time, the entire process of the present invention is completed.

[0037] Example 2

[0038] Reference Figure 1This embodiment is different from the first embodiment in that: this embodiment provides a discharge degradation method for SF6 waste gas, wherein SF6 and background gas are mixed, the degraded gas is ionized through a plasma power supply and a voltage regulator, and the air inlet sub-pump 301 of the reactor 302 is opened to allow the mixed gas in the mixing device to enter the reactor 302 for degradation.

[0039] Specifically, the background gas provided by the gas pump 100 may be an inert gas; wherein, the SF6 waste gas has a high concentration and needs to be diluted by the background gas to increase its degradation rate.

[0040] Furthermore, the background gas is air; wherein N2 accounts for about 78.1% and oxygen O2 accounts for about 20.9% in the air, and these gases can promote the degradation of SF6;

[0041] Normal pressure waste gas and even negative pressure waste gas can be degraded, and the normal pressure or negative pressure waste gas to be degraded is pumped into the reactor 302 through the air pump 100; the background gas in the reaction device can be air, which has zero cost, and only the air inlet needs to be opened to improve its economy.

[0042] The rest of the structure is the same as that of Example 1.

[0043] Example 3

[0044] Reference Figure 1-2 This embodiment is different from the above embodiments in that the reaction mechanism 300 can be flexibly configured to expand and reduce the number of plasma discharge matrix reactors 302 according to the amount of SF6 waste gas.

[0045] Specifically, each of the air intake sub-pumps 301 has the same rotation speed, and the degradation gas flow rate and capacity in each of the reactors 302 are the same, so that the gas degradation is more uniform. The degradation gas flow rate and capacity in each reactor 302 are the same, so that the gas degradation is more uniform, avoiding the phenomenon of reduced degradation efficiency caused by uneven air intake in each reactor 302.

[0046] The rest of the structure is the same as that of Example 2.

[0047] Experimental conditions:

[0048] Gas composition: 2% SF6 / 98% air

[0049] Input flow rate: 2L / min

[0050] Power frequency: 9kHz

[0051] The flow rate in each reactor is almost consistent with the set value, and the flow rate in each reactor is balanced.

[0052] Single reactor flow

[0053]

[0054] Importantly, it should be noted that the construction and arrangement of the present application shown in a plurality of different exemplary embodiments are only exemplary. Although only a few embodiments are described in detail in this disclosure, it should be readily understood by those who refer to this disclosure that many modifications are possible (e.g., the size, scale, structure, shape and proportion of various elements, as well as parameter values ​​(e.g., temperature, pressure, etc.), mounting arrangements, use of materials, color, directional changes, etc.) without substantially departing from the novel teachings and advantages of the subject matter described in the application. For example, the element shown as integrally formed can be composed of multiple parts or elements, the position of the element can be inverted or otherwise changed, and the nature or number or position of the discrete element can be changed or changed. Therefore, all such modifications are intended to be included in the scope of the present invention. The order or sequence of any process or method steps can be changed or reordered according to alternative embodiments. In the claims, any "device plus function" clause is intended to cover the structure described herein that performs the function, and is not only structurally equivalent but also equivalent structure. Without departing from the scope of the present invention, other replacements, modifications, changes and omissions can be made in the design, operating conditions and arrangement of the exemplary embodiments. Therefore, the invention is not limited to a specific embodiment, but extends to numerous modifications still falling within the scope of the appended claims.

[0055] Additionally, in order to provide a concise description of exemplary embodiments, all features of an actual embodiment (ie, those features that are not relevant to the best mode presently contemplated for carrying out the invention or those that are not relevant to implementing the invention) may not be described.

[0056] It will be appreciated that in the development of any actual implementation, as in any engineering or design project, numerous implementation-specific decisions may be made. Such a development effort may be complex and time-consuming, but will be a routine task of design, fabrication, and production for those of ordinary skill having the benefit of this disclosure without undue experimentation.

[0057] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the preferred embodiments, those skilled in the art should understand that the technical solutions of the present invention may be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should all be included in the scope of the claims of the present invention.

Claims

1. A discharge degradation device for SF6 waste gas, characterized by: include, An air pump (100) can manually adjust the gas flow rate in each gas path; A gas mixing mechanism (200), which is arranged at one end of the gas pump (100) and is used to mix the background gas transported in the gas pump with SF6; A reaction mechanism (300), comprising an air intake sub-pump (301) disposed at one end of the gas mixing mechanism (200), and a reactor (302) disposed at one side of the air intake sub-pump (301); The tail gas degradation mechanism (400) is used to degrade the tail gas.

2. The SF6 waste gas discharge degradation device according to claim 1, characterized in that: One end of the gas mixing mechanism (200) is fixedly connected to two gas pumps (100), one of the gas pumps (100) is used to supply background gas, and the other gas pump (100) is used to supply degradation gas, and the other end of the gas mixing mechanism (200) is connected to an intake sub-pump (301).

3. The SF6 waste gas discharge degradation device according to claim 1, characterized in that: An air intake sub-pump (301) is additionally arranged in front of the reactor (302), and the reactor (302) adopts a plasma discharge matrix reactor (302).

4. The SF6 waste gas discharge degradation device according to claim 1, characterized in that: A packaging box (303) is provided at the outer end of the reaction mechanism (300), and a cooling fan (304) is provided at the rear of the reaction mechanism (300).

5. The SF6 waste gas discharge degradation device according to claim 1, characterized in that: The tail gas degradation mechanism (400) comprises an air pump (100) and an alkali liquid gas washing pool arranged on one side of the air pump (100).

6. A method for SF6 waste gas discharge degradation, characterized in that: It comprises the SF6 waste gas discharge degradation device as described in any one of claims 1 to 5, and the steps of mixing SF6 and background gas, ionizing the degradation gas through a plasma power supply and a voltage regulator, opening the air intake sub-pump (301) of the reactor (302), and allowing the mixed gas in the gas mixing mechanism (200) to enter the reactor (302) for degradation.

7. The method for SF6 waste gas discharge degradation according to claim 6, characterized in that: The background gas provided by the gas pump (100) may be an inert gas; Among them, the concentration of SF6 waste gas is high, and background gas needs to be introduced to dilute it and increase its degradation rate.

8. The method for SF6 waste gas discharge degradation according to claim 7, characterized in that: The background gas is air, and the ratio of air to SF6 is 49:1; Among them, N2 accounts for about 78.1% in the air and oxygen O2 accounts for about 20.9%. These gases can promote the degradation of SF6.

9. The method for SF6 waste gas discharge degradation according to claim 8, characterized in that: The reaction mechanism (300) can be flexibly configured to expand or reduce the number of plasma discharge matrix reactors (302) according to the amount of SF6 waste gas.

10. The method for SF6 waste gas discharge degradation according to claim 9, characterized in that: The rotation speed of each of the air intake sub-pumps (301) is the same, and the flow rate and volume of the degradation gas in each of the reactors (302) are the same, so that the gas degradation is more uniform, and the internal input flow rate of the reactor (302) is controlled at 2L / min.

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