Silicon carbide single-face polishing device and method

Abstract

The invention discloses a silicon carbide single-face polishing device and method. The silicon carbide single-face polishing device comprises a base table and a polishing table installed on the top face of the base table, and a silicon carbide substrate is placed on the top of the polishing table; a strip-shaped guide notch corresponding to the guide supporting rod is formed in the surface of the right end of the side supporting base plate. According to the silicon carbide wafer polishing device, a silicon carbide wafer polishing device in the prior art is improved and optimized, so that when an operator takes and places a silicon carbide wafer, the polishing and grinding disc, the supporting base plate and other structures can be directly rotated and moved away from the top of the silicon carbide wafer, hindrance on the silicon carbide wafer is removed, and the silicon carbide wafer polishing efficiency is improved. Convenience is brought to an operator to quickly take and place the silicon carbide wafers, the operator can quickly take and place the silicon carbide substrates under the condition that no blocking exists above the silicon carbide substrates, and the operation convenience of the polishing device is improved; the problem that the original device is blocked and hindered by numerous structural members above when taking and placing the silicon carbide substrate is solved.

Description

Technical Field

[0001] The invention belongs to the technical field of silicon carbide polishing, and in particular relates to a silicon carbide single-side polishing device and a method thereof. Background Art

[0002] In the fields of semiconductor materials, optical elements and mechanical seals, silicon carbide (SiC) materials have been widely used due to their excellent physical and chemical properties. Silicon carbide materials have the characteristics of high hardness, high elastic modulus, high thermal conductivity, good corrosion resistance and wear resistance, making it an ideal material for the third generation of semiconductors after silicon (Si) and gallium arsenide (GaAs). At the same time, it also has irreplaceable advantages in optical mirrors and high-performance mechanical seals. Silicon carbide materials need to go through multiple steps in production and processing, and different steps require different equipment and devices. In the polishing step of silicon carbide, a silicon carbide single-sided polishing device is needed to polish it. For example, the existing patent with publication number CN216504265U discloses "a polishing device for silicon carbide wafers, including a body, a supporting mechanism, a fixing mechanism, a comprehensive polishing mechanism and a guiding mechanism. The supporting mechanism is fixedly installed on both sides of the top of the body, and a buffering and shock absorbing mechanism is arranged on the inner side of the supporting mechanism. The fixing mechanism is provided with a buffering and shock absorbing mechanism. The mechanism is fixedly mounted on both sides of the top of the machine body, and the comprehensive polishing mechanism is fixedly mounted on both sides of the top of the machine body, and the comprehensive polishing mechanism includes two rocker arms, two second electric push rods respectively fixedly mounted inside the two rocker arms, two extension plates respectively fixedly mounted on the telescopic ends of the two second electric push rods, two servo motors respectively fixedly mounted on the top of the two extension plates, two rotating shafts respectively fixedly connected to the telescopic ends of the two servo motors, a plurality of movable blocks respectively fixedly mounted on both sides of the two rotating shafts, a plurality of movable hooks respectively matched and mounted on the inner sides of the two movable blocks, and two polishing heads respectively fixedly mounted on one side of the plurality of movable hooks, and the guide mechanism is fixedly mounted below the rocker arms. It can be seen that the application describes a common silicon carbide wafer polishing device. When in use, the silicon carbide wafer is first placed on the polishing table, then fixed, and then the motor is started, so that the motor drives the polishing disc to realize the polishing and grinding of the silicon carbide wafer. It can be seen that this silicon carbide wafer polishing device can complete the effective polishing of a single side of the silicon carbide wafer;

[0003] When the silicon carbide wafer polishing device in the prior art is actually used, the silicon carbide wafer is placed on a polishing table for polishing. After polishing, it is necessary to remove the silicon carbide wafer and place a new silicon carbide wafer. However, due to the obstruction of structures such as the polishing mechanism above, there are many obstacles in the actual process of taking and placing the silicon carbide wafer, which reduces the convenience of taking and placing the silicon carbide wafer during the actual polishing process, thereby reducing the convenience of use and work efficiency of the entire device. There are certain disadvantages. For this reason, the present invention proposes a silicon carbide single-sided polishing device and method. Summary of the invention

[0004] The object of the present invention is to provide a silicon carbide single-sided polishing device and method thereof, so as to solve the problem that in the prior art of the silicon carbide wafer polishing device proposed in the above background technology, when the silicon carbide wafer is actually used, the silicon carbide wafer is placed on the polishing table for polishing, and after polishing, it needs to be removed and a new silicon carbide wafer is placed. However, due to the obstruction of the polishing mechanism above and other structures, there are many obstacles in the actual process of taking and placing the silicon carbide wafer, which reduces the convenience of taking and placing the silicon carbide wafer during the actual polishing process, thereby reducing the convenience of use and work efficiency of the entire device, and there are certain disadvantages.

[0005] To achieve the above object, the present invention provides the following technical solution: a silicon carbide single-side polishing device, comprising

[0006] A base, a polishing table installed on the top surface of the base, and a silicon carbide substrate is placed on the top of the polishing table;

[0007] A rotating top seat is rotatably mounted on the top surface of the base relative to the left side of the polishing table, and a supporting base column is fixed on the top of the rotating top seat, a surface movable sleeve of the supporting base column is provided with a rectangular supporting base sleeve, and a side supporting base plate is fixed on the right side surface of the rectangular supporting base sleeve, the side supporting base plate extends above the polishing table, and a servo reduction motor is fixed on the top surface of the side supporting base plate, the output end of the servo reduction motor passes through the bottom of the side supporting base plate and is installed with a polishing grinding disc, a movable structure is provided between the rectangular supporting base sleeve and the supporting base column, a guide support rod is fixed on the top surface of the base relative to the right side of the polishing table, a strip guide notch corresponding to the guide support rod is opened on the right end surface of the side supporting base plate, and the top end of the guide support rod is embedded in the strip guide notch;

[0008] The bottom end of the guide support rod is movably inserted into the bottom of the base, and an adjusting rod structure is also provided between the base and the guide support rod. The adjusting rod structure includes a side rectangular notch opened on the side of the base, a side rectangular plug plate inserted into the side rectangular notch, a transverse plug rod fixed on the side of the side rectangular plug plate, and a plurality of transverse rod holes opened on the bottom end surface of the guide support rod, and the end of the transverse plug rod passes through one of the transverse rod holes. The adjusting rod structure also includes two vertical rods fixed to the bottom surface of the base, a transverse support plate fixed to the bottom surfaces of the two vertical rods, and an L-shaped movable base movably sleeved on the surfaces of the two vertical rods. The right end of the side rectangular plug plate extends to the right side surface of the base, the top end of the L-shaped movable base is attached to the bottom surface of the side rectangular plug plate, and an arc-shaped clip strip is fixed on the top surface of the L-shaped movable base, and a strip clip groove corresponding to the arc clip strip is opened on the right end surface of the side rectangular plug plate, and the arc clip strip is inserted into the strip clip groove, and the surfaces of the two vertical rods are sleeved with springs B.

[0009] Preferably, the movable structure includes an inner sliding groove opened in the supporting base column, a movable inner sliding seat is slidably arranged in the inner sliding groove, rectangular side connecting blocks are fixed to the two side surfaces of the movable inner sliding seat, and two strip side sliding openings corresponding to the rectangular side connecting blocks are symmetrically opened on the surface of the supporting base column, and the ends of the rectangular side connecting blocks pass through the strip side sliding openings to the surface of the supporting base column and are fixed to the inner wall of the rectangular supporting base sleeve.

[0010] Preferably, the movable structure further comprises a return spring installed inside the inner slide groove, the top end of the return spring is fixed to the top inner wall of the inner slide groove, and the bottom end of the return spring is fixed to the top surface of the movable inner slide seat.

[0011] Preferably, a triangular support block is fixed to the left top and the left bottom of the side support base plate, and the triangular support block is fixed to the rectangular support base sleeve by welding.

[0012] Preferably, a cylindrical shaft block is fixed to the bottom surface of the rotating top seat, and the bottom end of the cylindrical shaft block penetrates to the bottom of the base and is fixed to the rotating base.

[0013] Preferably, it also includes a rotation positioning structure, which is arranged between the bottom surface of the base and the rotating base. The rotation positioning structure includes a rubber positioning seat fixed to the bottom surface of the base, and the rubber positioning seat is located on the left side of the rotating base. The right side surface of the rubber positioning seat is provided with an integrated hemispherical positioning protrusion, and the surface of the rotating base is symmetrically provided with two positioning grooves corresponding to the hemispherical positioning protrusion.

[0014] Preferably, it also includes a clamping mechanism, and two clamping mechanisms are symmetrically arranged on the top of the polishing table relative to the two sides of the silicon carbide substrate, and the clamping mechanism includes a transverse slide groove opened inside the polishing table, a transverse inner slide seat is slidably arranged in the transverse slide groove, and a strip sliding block is fixed on the top surface of the transverse inner slide seat, and the top surface of the polishing table is provided with two strip slideways corresponding to the strip sliding blocks, and the top of the strip sliding block passes through the strip slideway to the top of the polishing table and is fixed with a rectangular clamping seat, and the side of the rectangular clamping seat is installed with a rubber anti-slip clamping block that is in close contact with the silicon carbide substrate. A vertical slide groove is provided in the rectangular clamping seat, and a vertical inner slide seat and a spring A are installed in the vertical slide groove. The vertical inner slide seat is movably installed in the vertical slide groove by the spring A, and a vertical bottom clamping rod is fixed to the bottom of the vertical inner slide seat. The inner wall of the bottom end of the horizontal slide groove is provided with a plurality of limiting bottom clamping grooves corresponding to the vertical bottom clamping rod. The vertical bottom clamping rod passes through the strip sliding block and the horizontal inner slide seat and is inserted into one of the limiting bottom clamping grooves. A vertical inner connecting rod is fixed to the top surface of the vertical inner slide seat, and the top end of the vertical inner connecting rod passes through the top of the rectangular clamping seat and is fixed with an L-shaped upper movable seat.

[0015] Preferably, the strip-shaped sliding block and the surface of the transverse inner sliding seat are both provided with vertical through holes corresponding to the vertical bottom clamping rods.

[0016] Preferably, a disassembly and assembly structure is further provided between the rubber anti-slip clamp block and the rectangular clamp seat, the disassembly and assembly structure comprises two rubber mounting blocks arranged on the side of the rubber anti-slip clamp block, and a rubber triangular side clamp block is arranged on the side of the rubber mounting block, the rubber anti-slip clamp block, the rubber mounting block and the rubber triangular side clamp block are an integrated structure, two mounting slots corresponding to the rubber mounting blocks are provided on the side of the rectangular clamp seat, and a rectangular side clamping groove corresponding to the rubber triangular side clamping block is provided on the side wall of the mounting slot, the rubber mounting block is inserted into the mounting slot, and the rubber triangular side clamping block is clamped into the rectangular side clamping groove.

[0017] A method for single-side polishing of silicon carbide using the silicon carbide single-side polishing device as claimed in any one of claims 1 to 4, comprising the following steps:

[0018] Step 1: Move the rectangular support base sleeve upward so that the side support substrate slides toward the top of the support base column until the height of the rectangular support base sleeve is higher than the height of the guide support rod. At this time, the rectangular support base sleeve can be directly rotated away from the top of the polishing table by rotating the support base column;

[0019] Step 2: Place the silicon carbide substrate to be polished on the top of the polishing table and between the two clamping mechanisms;

[0020] Step 3: Pull up the L-shaped upper movable seat to release the limit on the rectangular clamping seat, and then slide the rectangular clamping seat to adjust the position until the rectangular clamping seat is adjusted to a suitable position and the rubber anti-slip clamping block is pressed against the side of the silicon carbide substrate, then release the L-shaped upper movable seat to complete the rapid clamping of the silicon carbide substrate after placement;

[0021] Step 4: lift the rectangular support base sleeve again and rotate it to the top of the polishing table, and make the height of the rectangular support base sleeve higher than the height of the guide support rod, and then slowly lower the rectangular support base sleeve so that the top of the guide support rod can pass through the strip guide notch to the top of the rectangular support base sleeve, thereby completing the preparation work before polishing;

[0022] Step 5: Start the servo reduction motor to make the polishing disc start to rotate, and slowly press down the rectangular support base sleeve so that the polishing disc contacts the top surface of the silicon carbide substrate, thereby achieving single-side polishing of the silicon carbide substrate;

[0023] Step 6. After polishing is completed, lift the rectangular support base sleeve again and rotate it away from the top of the polishing table, then release the clamping mechanism from the silicon carbide substrate, and the polished silicon carbide substrate can be quickly removed without any obstruction on the top, completing the entire set of polishing processing steps.

[0024] Compared with the prior art, the beneficial effects of the present invention are as follows: the present invention improves and optimizes the silicon carbide wafer polishing device in the prior art, designs a rotating top seat, a supporting base column and a rotating base on the basis of its original structure, and installs the supporting substrate for installing the polishing and grinding disc on the rectangular supporting base sleeve on the surface of the supporting base column, so that when the operator takes and places the silicon carbide wafer, the polishing and grinding disc, the supporting substrate and other structures can be directly rotated away from the top of the silicon carbide wafer to remove the obstruction on the silicon carbide wafer, which brings convenience to the operator to quickly take and place the silicon carbide wafer, and is convenient for the operator to quickly take and place the silicon carbide substrate without any obstruction above the silicon carbide substrate, thereby improving the operational convenience of the polishing device and solving the problem that the original device would be blocked and hindered by many structural parts above when taking and placing the silicon carbide substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a structural schematic diagram of the present invention;

[0026] Figure 2 is a cross-sectional view of the present invention;

[0027] Figure 3 For the present invention Figure 2 A partial enlarged view of the middle B area;

[0028] Figure 4 For the present invention Figure 2 A partial enlarged view of the middle C area;

[0029] Figure 5 For the present invention Figure 1 A partial enlarged view of the middle A area;

[0030] Figure 6 For the present invention Figure 2 A partial enlarged view of the D area in the middle;

[0031] Figure 7 For the present invention Figure 6 A partial enlarged view of the middle E area;

[0032] Figure 8 For the present invention Figure 2 A partial enlarged view of the middle F area;

[0033] In the figure: 1, base; 11, guide support rod; 12, rubber positioning seat; 121, hemispherical positioning protrusion; 2, polishing table; 3, silicon carbide substrate; 41, rotating top seat; 42, supporting base column; 43, rotating base; 431, positioning slot; 44, inner slide slot; 45, movable inner slide seat; 46, reset spring; 47, rectangular side connecting block; 48, strip side sliding mouth; 5, rectangular support base sleeve; 6, side support base plate; 61, strip guide notch; 71, servo reduction motor; 72, polishing and grinding disc; 8, clamping mechanism; 81, rectangular clamping seat; 82, rubber anti-skid clamp block; 821, rubber installation plug block; 822, rubber Rubber triangle side block; 83, L-shaped upper movable seat; 84, strip slide; 85, horizontal slide groove; 86, horizontal inner slide seat; 87, strip sliding block; 88, vertical slide groove; 89, spring A; 810, vertical inner slide seat; 811, vertical inner connecting rod; 812, vertical bottom clamping rod; 813, limit bottom clamping groove; 814, installation slot; 815, rectangular side clamping groove; 9, rod adjustment structure; 91, side rectangular notch; 92, side rectangular plug-in plate; 93, horizontal plug-in rod; 94, horizontal rod hole; 95, L-shaped movable base; 96, arc-shaped clamping strip; 97, strip clamping groove; 98, horizontal support plate; 99, vertical rod; 910, spring B. DETAILED DESCRIPTION

[0034] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0035] Example

[0036] See also Figures 1 to 8 , is an embodiment of the present invention, which provides a technical solution: a silicon carbide single-side polishing device, comprising

[0037] A base 1, a polishing table 2 installed on the top surface of the base 1, and a silicon carbide substrate 3 is placed on the top of the polishing table 2;

[0038] A rotating top seat 41 is rotatably mounted on the top surface of the base 1 relative to the left side of the polishing table 2, and a supporting base column 42 is welded and fixed to the top of the rotating top seat 41, a rectangular supporting base sleeve 5 is movably sleeved on the surface of the supporting base column 42, and a side supporting base plate 6 is welded and fixed to the right side surface of the rectangular supporting base sleeve 5, the side supporting base plate 6 extends to the top of the polishing table 2, and a servo reduction motor 71 is fixed to the top surface of the side supporting base plate 6, the output end of the servo reduction motor 71 passes through the bottom of the side supporting base plate 6 and is installed with a polishing and grinding disk 72, the polishing and grinding disk 72 is directly above the polishing table 2, a movable structure is provided between the rectangular supporting base sleeve 5 and the supporting base column 42, a guide support rod 11 is welded and fixed to the top surface of the base 1 relative to the right side of the polishing table 2, and a strip guide corresponding to the guide support rod 11 is provided on the right end surface of the side supporting base plate 6 The side support substrate 6 is provided with a groove 61, and the top end of the guide support rod 11 is embedded in the strip guide groove 61. When the side support substrate 6 moves up and down subsequently, the guide support rod 11 can play an effective guiding and limiting effect on the side support substrate 6, so that the side support substrate 6 can only move up and down, but cannot rotate. If the silicon carbide substrate 3 is to be taken and placed subsequently, it is only necessary to move the side support substrate 6 upward so that the right end of the side support substrate 6 is separated from the guide support rod 11, and the support base column 42 can be rotated, so that the side support substrate 6 and the servo reduction motor 71 and other structures are directly rotated and moved away from the top of the polishing table 2, thereby no longer causing any obstacles to the taking and placing of the silicon carbide substrate 3, facilitating the rapid taking and placing of the silicon carbide substrate 3 during the actual polishing process, and solving the problem that the original device is blocked and hindered by many structural parts above when taking and placing the silicon carbide substrate 3;

[0039] The bottom end of the guide support rod 11 movably penetrates to the bottom of the base 1, and an adjusting rod structure 9 is also provided between the base 1 and the guide support rod 11, so that the height of the guide support rod 11 can be adaptively adjusted according to actual use requirements later. The adjusting rod structure 9 includes a side rectangular notch 91 opened on the side of the base 1, a side rectangular plug plate 92 inserted into the side rectangular notch 91, a transverse plug rod 93 welded and fixed to the side of the side rectangular plug plate 92, and a plurality of transverse rod holes 94 opened on the bottom end surface of the guide support rod 11. The end of the transverse plug rod 93 penetrates into one of the transverse rod holes 94, which is used to limit the guide support rod 11 during daily use. The adjusting rod structure 9 also includes two vertical rods 99 fixed to the bottom surface of the base 1, a transverse support plate 98 welded and fixed to the bottom surfaces of the two vertical rods 99, and an L-shaped movable base 95 movably sleeved on the surfaces of the two vertical rods 99. The right end of the side rectangular plug plate 92 extends out to the right side surface of the base 1, and the top of the L-shaped movable base 95 fits on The bottom surface of the side rectangular plug plate 92 and the top surface of the L-shaped movable base 95 are welded and fixed with an arc-shaped card strip 96. The right end surface of the side rectangular plug plate 92 is provided with a strip card slot 97 corresponding to the arc-shaped card strip 96. The arc-shaped card strip 96 is inserted into the strip card slot 97 to stably limit the side rectangular plug plate 92. The surfaces of the two vertical rods 99 are both sleeved with springs B910. Under the push of the springs B910, the arc-shaped card strip 96 can be stably stuck in the strip card slot 97. To ensure the position stability of the side rectangular insert plate 92, it is only necessary to pull down the L-shaped movable base 95 to compress the spring B910, so that the arc-shaped card strip 96 can be moved out of the bar card groove 97, and then pull the side rectangular insert plate 92 sideways to move the end of the horizontal insert rod 93 out of the horizontal rod hole 94. The guide support rod 11 is no longer limited, and the height of the guide support rod 11 can be adjusted by sliding up and down, thereby further improving the flexibility and convenience of use of the entire silicon carbide single-sided polishing device.

[0040] The movable structure includes an inner slide groove 44 provided in the support base column 42, and a movable inner slide seat 45 is slidably provided in the inner slide groove 44. Rectangular side connecting blocks 47 are welded and fixed to the two side surfaces of the movable inner slide seat 45, and two strip side sliding openings 48 corresponding to the rectangular side connecting blocks 47 are symmetrically provided on the surface of the support base column 42. The ends of the rectangular side connecting blocks 47 pass through the strip side sliding openings 48 to the surface of the support base column 42 and are fixed to the inner wall of the rectangular support base sleeve 5, so that the rectangular support base sleeve 5 can slide up and down smoothly on the surface of the support base column 42, and the rectangular side connecting blocks 47 will also slide on the strip side when sliding. The movable structure also includes a reset spring 46 installed in the inner slide groove 44, the top of the reset spring 46 is fixed to the top inner wall of the inner slide groove 44, and the bottom of the reset spring 46 is fixed to the top surface of the movable inner slide seat 45. In the drawings of the present application specification, when the reset spring 46 is in the initial state, when the operator subsequently presses down the side support substrate 6 so that the polishing disc 72 polishes the surface of the silicon carbide substrate 3, the reset spring 46 will be stretched, thereby having a certain buffering effect on the downward pressure of the operator, preventing the operator from excessively pressing down the polishing disc 72, and when the operator When the operator releases the side support substrate 6, under the pulling action of the reset tension spring 46, the movable inner slide 45 will move up with the rectangular support base sleeve 5 and the side support substrate 6 through the rectangular side connecting block 47, so that the polishing grinding disc 72 is quickly separated from the silicon carbide substrate 3, thereby facilitating the operator's polishing work on the silicon carbide substrate 3, and achieving the effect that when the operator's hand leaves the side support substrate 6, the polishing grinding disc 72 is automatically lifted up and separated from the silicon carbide substrate 3. When it is necessary to complete the single-sided polishing of the silicon carbide substrate 3 and to take and place the silicon carbide substrate 3, it is only necessary to lift the side support substrate 6 first, so that The side support substrate 6 is moved up to the top of the guide support rod 11, so that the right end of the side support substrate 6 is separated from the guide support rod 11, and the support base column 42 can be directly rotated, so that the side support substrate 6 and the servo reduction motor 71 and the polishing and grinding disk 72 are directly rotated and moved away from the top of the silicon carbide substrate 3, thereby removing the obstruction of these structures to the silicon carbide substrate 3, making it convenient for operators to quickly take and place the silicon carbide substrate 3 without any obstruction above the silicon carbide substrate 3, thereby improving the convenience of operation and solving the problem that the original device would be blocked and hindered by many structural parts above when taking and placing the silicon carbide substrate 3.

[0041] Among them, a triangular support block is welded and fixed to the left top and left bottom of the side support base plate 6, and the triangular support block is welded and fixed to the rectangular support base sleeve 5. By welding and fixing two triangular support blocks between the rectangular support base sleeve 5 and the side support base plate 6, the stability of the connection between the side support base plate 6 and the rectangular support base sleeve 5 can be guaranteed, and based on the characteristics of the triangle stability, the support stability of the side support base plate 6 can be guaranteed.

[0042] Among them, a cylindrical shaft block is fixed on the bottom surface of the rotating top seat 41, and the bottom end of the cylindrical shaft block passes through the bottom of the base 1 and is fixed with a rotating base 43, so that the rotating top seat 41 can rotate smoothly on the top of the base 1, which is used to realize the subsequent rotation of the side support substrate 6 after moving up.

[0043] The rotatable base 43 is provided with a rubber positioning seat 12 which is glued and fixed to the bottom surface of the base 1, and the rubber positioning seat 12 is located on the left side of the rotatable base 43. The right side surface of the rubber positioning seat 12 is provided with an integrated hemispherical positioning protrusion 121. Both are made of rubber material and will undergo elastic deformation when squeezed. The surface of the rotatable base 43 is symmetrically provided with two positioning grooves 431 corresponding to the hemispherical positioning protrusion 121. When the rotatable base 43 rotates subsequently, the end of the hemispherical positioning protrusion 121 will first be squeezed out of the positioning groove 431 at the initial position, so as to realize the smooth rotation of the rotatable base 43. When the rotatable base 43 rotates 180 degrees together with the upper support column 42 and the rotatable top seat 41, the end of the hemispherical positioning protrusion 121 will be squeezed into another positioning groove 431, so as to realize the auxiliary positioning after the rotatable base 43 rotates 180 degrees, thereby achieving the effect of auxiliary positioning after rotation.

[0044] The polishing table 2 also includes a clamping mechanism 8. Two clamping mechanisms 8 are symmetrically arranged on the top of the polishing table 2 relative to the two sides of the silicon carbide substrate 3. The clamping mechanism 8 includes a transverse slide groove 85 opened inside the polishing table 2. A transverse inner slide seat 86 is slidably arranged in the transverse slide groove 85. A strip sliding block 87 is welded and fixed to the top surface of the transverse inner slide seat 86. Two strip slideways 84 corresponding to the strip sliding blocks 87 are arranged on the top surface of the polishing table 2. The top of the strip sliding block 87 passes through the strip slideway 84 to the top of the polishing table 2 and is fixed with a rectangular clamping seat 81. The side of the rectangular clamping seat 81 is installed with a rubber The anti-slip clamp block 82 and the rectangular clamping seat 81 are provided with a vertical slide groove 88, and the vertical slide groove 88 is provided with a vertical inner slide seat 810 and a spring A89. The vertical inner slide seat 810 is movably installed in the vertical slide groove 88 through the spring A89, and a vertical bottom clamping rod 812 is welded and fixed at the bottom of the vertical inner slide seat 810. The inner wall of the bottom end of the horizontal slide groove 85 is provided with a plurality of limiting bottom clamping grooves 813 corresponding to the vertical bottom clamping rod 812. The vertical bottom clamping rod 812 passes through the strip sliding block 87 and the horizontal inner slide seat 86 and is inserted into one of the limiting bottom clamping grooves 813, so as to achieve the stability of the horizontal inner slide seat 86 during daily use. The limit also ensures the position stability of the rectangular clamping seat 81. A vertical inner connecting rod 811 is fixed to the top surface of the vertical inner sliding seat 810, and the top end of the vertical inner connecting rod 811 penetrates to the top of the rectangular clamping seat 81 and is fixed with an L-shaped upper movable seat 83. The subsequent operator can lift the L-shaped upper movable seat 83 to make the vertical inner connecting rod 811 move up with the vertical inner sliding seat 810, causing the spring A89 to be gradually compressed, so that the bottom end of the vertical bottom clamping rod 812 can be smoothly moved out of the limit bottom clamping groove 813, and the limit of the horizontal inner sliding seat 86 can be quickly released. At this time, the horizontal inner sliding seat 86 can be moved in the horizontal sliding groove 85 The inner lateral sliding allows the position of the rectangular clamping seat 81 to be adjusted. When the rectangular clamping seat 81 is adjusted to a suitable position, the L-shaped upper movable seat 83 is released. Under the pushing action of the spring A89, the vertical inner sliding seat 810 will move the vertical bottom clamping rod 812 downward and reset, and finally the bottom end of the vertical bottom clamping rod 812 is inserted into the limiting bottom clamping groove 813 at other positions. The lateral inner sliding seat 86 and the rectangular clamping seat 81 can be limited again to complete the rapid adjustment of the position of the rectangular clamping seat 81, so that the position of the rectangular clamping seat 81 can be flexibly adjusted according to the actual clamping needs, thereby improving the overall flexibility of the polishing device.

[0045] The surfaces of the strip sliding block 87 and the transverse inner sliding seat 86 are both provided with vertical through holes corresponding to the vertical bottom clamping rod 812 , so that the vertical bottom clamping rod 812 can pass through smoothly.

[0046] Among them, a disassembly structure is also provided between the rubber anti-skid clamping block 82 and the rectangular clamping seat 81, and the disassembly structure includes two rubber mounting plugs 821 arranged on the side of the rubber anti-skid clamping block 82, and a rubber triangular side clamping block 822 is arranged on the side of the rubber mounting plug 821. The rubber anti-skid clamping block 82, the rubber mounting plug 821 and the rubber triangular side clamping block 822 are an integrated structure, and all three are made of rubber material and will undergo elastic deformation when squeezed. Two mounting slots 814 corresponding to the rubber mounting plug 821 are provided on the side of the rectangular clamping seat 81, and a rectangular side clamping groove 815 corresponding to the rubber triangular side clamping block 822 is provided on the side wall of the mounting slot 814. The rubber mounting plug 821 is inserted into the installation slot 814, and the rubber triangular side clamp block 822 is clamped into the rectangular side clamp slot 815, so as to achieve stable installation of the rubber anti-skid clamp block 82 during daily use. If the rubber anti-skid clamp block 82 is to be removed for replacement later, it is only necessary to pull the rubber anti-skid clamp block 82 sideways with force, so that the rubber triangular side clamp block 822 is elastically deformed by the pulling, and the rubber triangular side clamp block 822 is squeezed out of the rectangular side clamp slot 815, and the rubber installation block 821 can be smoothly pulled out of the installation slot 814, so as to achieve rapid removal of the rubber anti-skid clamp block 82, and facilitate the disassembly, assembly and replacement of the rubber anti-skid clamp block 82 in the later stage, thereby improving the convenience of maintenance of the entire polishing device in the later stage.

[0047] A single-side polishing method for silicon carbide using a single-side polishing device for silicon carbide comprises the following steps:

[0048] Step 1: Move the rectangular support base sleeve 5 upward so that the side support substrate 6 slides toward the top of the support base column 42 until the height of the rectangular support base sleeve 5 is higher than the height of the guide support rod 11. At this time, the rectangular support base sleeve 5 can be directly rotated away from the top of the polishing table 2 by rotating the support base column 42;

[0049] Step 2: Place the silicon carbide substrate 3 to be polished on the top of the polishing table 2 and between the two clamping mechanisms 8;

[0050] Step 3: Pull up the L-shaped upper movable seat 83 to release the limit on the rectangular clamping seat 81, and then slide the rectangular clamping seat 81 to adjust the position until the rectangular clamping seat 81 is adjusted to a suitable position and the rubber anti-slip clamping block 82 is pressed against the side of the silicon carbide substrate 3, then the L-shaped upper movable seat 83 can be released to complete the rapid clamping of the silicon carbide substrate 3 after placement;

[0051] Step 4: lift the rectangular support base sleeve 5 again and rotate it to the top of the polishing table 2, and make the height of the rectangular support base sleeve 5 higher than the height of the guide support rod 11, and then slowly lower the rectangular support base sleeve 5 so that the top of the guide support rod 11 can pass through the strip guide notch 61 to the top of the rectangular support base sleeve 5, thereby completing the preparation work before polishing;

[0052] Step 5: Start the servo reduction motor 71 to make the polishing disc 72 start to rotate, and slowly press down the rectangular support base sleeve 5 so that the polishing disc 72 contacts the top surface of the silicon carbide substrate 3, thereby achieving single-side polishing of the silicon carbide substrate 3;

[0053] Step 6: After polishing is completed, the rectangular support base sleeve 5 is lifted again and rotated away from the top of the polishing table 2, and then the clamping mechanism 8 is released from the silicon carbide substrate 3. The silicon carbide substrate 3 after polishing can be quickly removed without any obstruction on the top, completing the whole set of polishing processing steps.

[0054] Although embodiments of the present invention have been shown and described (see the above detailed description for details), it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A single-side polishing device for silicon carbide, characterized in that: include A base (1), a polishing table (2) mounted on the top surface of the base (1), a silicon carbide substrate (3) being placed on the top of the polishing table (2); A rotating top seat (41) is rotatably mounted on the top surface of the base (1) relative to the left side of the polishing table (2), and a supporting base column (42) is fixed on the top of the rotating top seat (41), a rectangular supporting base sleeve (5) is movably sleeved on the surface of the supporting base column (42), and a side supporting base plate (6) is fixed on the right side surface of the rectangular supporting base sleeve (5), the side supporting base plate (6) extends above the polishing table (2), and a servo reduction motor (71) is fixed on the top surface of the side supporting base plate (6), and the servo reduction motor (71) is fixed on the top surface of the side supporting base plate (6). The output end of the motor (71) passes through the bottom of the side support base plate (6) and is installed with a polishing and grinding disc (72); a movable structure is provided between the rectangular support base sleeve (5) and the support base column (42); a guide support rod (11) is fixed to the top surface of the base (1) on the right side of the polishing table (2); a strip-shaped guide notch (61) corresponding to the guide support rod (11) is opened on the right end surface of the side support base plate (6), and the top end of the guide support rod (11) is embedded in the strip-shaped guide notch (61); The bottom end of the guide support rod (11) is movably inserted into the bottom of the base (1); a rod adjustment structure (9) is also provided between the base (1) and the guide support rod (11); the rod adjustment structure (9) comprises a side rectangular notch (91) provided on the side of the base (1); a side rectangular plug plate (92) inserted into the side rectangular notch (91); a transverse plug rod (93) fixed to the side of the side rectangular plug plate (92); and a plurality of transverse rod holes (94) provided on the bottom end surface of the guide support rod (11); the end of the transverse plug rod (93) is inserted into one of the transverse rod holes (94); and the rod adjustment structure (9) further comprises two vertical rods (99) fixed to the bottom surface of the base (1). , a transverse support plate (98) fixed on the bottom surfaces of the two vertical poles (99), and an L-shaped movable base (95) movably sleeved on the surfaces of the two vertical poles (99); the right end of the side rectangular plug plate (92) extends to the right side surface of the base (1); the top of the L-shaped movable base (95) is attached to the bottom surface of the side rectangular plug plate (92), and an arc-shaped clamping strip (96) is fixed on the top surface of the L-shaped movable base (95); the right end surface of the side rectangular plug plate (92) is provided with a strip-shaped clamping groove (97) corresponding to the arc-shaped clamping strip (96), and the arc-shaped clamping strip (96) is inserted into the strip-shaped clamping groove (97); and the surfaces of the two vertical poles (99) are sleeved with springs B (910).

2. A silicon carbide single-side polishing device according to claim 1, characterized in that: The movable structure comprises an inner slide groove (44) provided in the support base column (42), a movable inner slide seat (45) being slidably arranged in the inner slide groove (44), rectangular side connecting blocks (47) being fixed to both side surfaces of the movable inner slide seat (45), and two strip-shaped side sliding openings (48) corresponding to the rectangular side connecting blocks (47) being symmetrically provided on the surface of the support base column (42), and the ends of the rectangular side connecting blocks (47) passing through the strip-shaped side sliding openings (48) to the surface of the support base column (42) and being fixed to the inner wall of the rectangular support base sleeve (5).

3. A silicon carbide single-side polishing device according to claim 2, characterized in that: The movable structure also includes a reset spring (46) installed inside the inner slide groove (44), the top end of the reset spring (46) is fixed to the top inner wall of the inner slide groove (44), and the bottom end of the reset spring (46) is fixed to the top surface of the movable inner slide seat (45).

4. A silicon carbide single-side polishing device according to claim 1, characterized in that: A triangular support block is fixed to the top and bottom of the left end of the side support base plate (6), and the triangular support block is fixed to the rectangular support base sleeve (5) by welding.

5. The silicon carbide single-side polishing device according to claim 1, characterized in that: A cylindrical shaft block is fixed on the bottom surface of the rotating top seat (41), and the bottom end of the cylindrical shaft block penetrates the bottom of the base (1) and is fixed with a rotating base (43).

6. A silicon carbide single-side polishing device according to claim 5, characterized in that: The invention also comprises a rotation positioning structure, wherein the rotation positioning structure is arranged between the bottom surface of the base (1) and the rotating base (43), and the rotation positioning structure comprises a rubber positioning seat (12) fixed to the bottom surface of the base (1), and the rubber positioning seat (12) is located on the left side of the rotating base (43), and the right side surface of the rubber positioning seat (12) is provided with an integrated hemispherical positioning protrusion (121), and the surface of the rotating base (43) is symmetrically provided with two positioning slots (431) corresponding to the hemispherical positioning protrusion (121).

7. The silicon carbide single-side polishing device according to claim 1, characterized in that: The polishing table (2) also includes a clamping mechanism (8), wherein two clamping mechanisms (8) are symmetrically arranged on the top of the polishing table (2) relative to the two sides of the silicon carbide substrate (3), and the clamping mechanism (8) includes a transverse slide groove (85) provided inside the polishing table (2), and a transverse inner slide seat (86) is slidably arranged inside the transverse slide groove (85), and a strip sliding block (87) is fixed on the top surface of the transverse inner slide seat (86), and the top surface of the polishing table (2) is provided with two strip slideways (84) corresponding to the strip sliding blocks (87), and the top of the strip sliding block (87) passes through the strip slideway (84) to the top of the polishing table (2) and is fixed with a rectangular clamping seat (81), and the side of the rectangular clamping seat (81) is installed with a rubber anti-skid clamping block (82) which is in close contact with the silicon carbide substrate (3), and the rectangular clamping seat (81) is provided with a A vertical slide groove (88) is provided, and a vertical inner slide seat (810) and a spring A (89) are installed in the vertical slide groove (88). The vertical inner slide seat (810) is movably installed in the vertical slide groove (88) through the spring A (89), and a vertical bottom clamping rod (812) is fixed at the bottom of the vertical inner slide seat (810). The bottom inner wall of the horizontal slide groove (85) is provided with a plurality of vertical bottom clamping rods (812) corresponding to the vertical bottom clamping rods (812). The vertical bottom clamping rod (812) passes through the bar-shaped sliding block (87) and the horizontal inner sliding seat (86) and is inserted into one of the bottom clamping grooves (813). A vertical inner connecting rod (811) is fixed to the top surface of the vertical inner sliding seat (810), and the top end of the vertical inner connecting rod (811) passes through the top of the rectangular clamping seat (81) and is fixed to an L-shaped upper movable seat (83).

8. A silicon carbide single-side polishing device according to claim 7, characterized in that: The surfaces of the strip-shaped sliding block (87) and the transverse inner sliding seat (86) are both provided with vertical through holes corresponding to the vertical bottom clamping rod (812).

9. The silicon carbide single-side polishing device according to claim 7, characterized in that: A disassembly structure is also provided between the rubber anti-skid clamping block (82) and the rectangular clamping seat (81), the disassembly structure comprising two rubber installation plug-ins (821) provided on the side of the rubber anti-skid clamping block (82), and a rubber triangular side clamping block (822) provided on the side of the rubber installation plug-in block (821). The rubber anti-skid clamping block (82), the rubber installation plug-in block (821) and the rubber triangular side clamping block (822) are an integrated structure. Two installation slots (814) corresponding to the rubber installation plug-in blocks (821) are provided on the side of the rectangular clamping seat (81), and a rectangular side clamping groove (815) corresponding to the rubber triangular side clamping block (822) is provided on the side wall of the installation slot (814). The rubber installation plug-in block (821) is inserted into the installation slot (814), and the rubber triangular side clamping block (822) is clamped into the rectangular side clamping groove (815).

10. A method for single-side polishing of silicon carbide using the silicon carbide single-side polishing device according to any one of claims 1 to 9, characterized in that: The following steps are involved: Step 1: Move the rectangular support base sleeve (5) upward so that the side support substrate (6) slides toward the top of the support base column (42) until the height of the rectangular support base sleeve (5) is moved upward to a height higher than the guide support rod (11). At this time, the rectangular support base sleeve (5) can be directly rotated and removed from the top of the polishing table (2) by rotating the support base column (42); Step 2: placing the silicon carbide substrate (3) to be polished on the top of the polishing table (2) and between the two clamping mechanisms (8); Step 3: Pull up the L-shaped upper movable seat (83) to release the limit on the rectangular clamping seat (81), and then slide the rectangular clamping seat (81) to adjust the position until the rectangular clamping seat (81) is adjusted to a suitable position and the rubber anti-slip clamping block (82) is pressed against the side of the silicon carbide substrate (3), then release the L-shaped upper movable seat (83) to complete the rapid clamping of the silicon carbide substrate (3) after placement; Step 4: lift the rectangular support base sleeve (5) again and rotate it to the top of the polishing table (2), and make the height of the rectangular support base sleeve (5) higher than the height of the guide support rod (11), and then slowly lower the rectangular support base sleeve (5) so that the top end of the guide support rod (11) can pass through the strip guide notch (61) to the top of the rectangular support base sleeve (5), thereby completing the preparation work before polishing; Step 5: Start the servo reduction motor (71) to make the polishing disc (72) start to rotate, and slowly press down the rectangular support base sleeve (5) to make the polishing disc (72) contact with the top surface of the silicon carbide substrate (3), so as to achieve single-side polishing of the silicon carbide substrate (3); Step 6: After polishing is completed, the rectangular support base sleeve (5) is lifted up again and rotated away from the top of the polishing table (2), and then the clamping mechanism (8) is released from the silicon carbide substrate (3). The silicon carbide substrate (3) after polishing can be quickly removed without any obstruction on the top, completing the whole set of polishing processing steps.

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