Ultra-wideband electromagnetic wave radiation source based on compact ring pulse plasma generator

Abstract

The invention discloses an ultra wide band electromagnetic wave radiation source based on a compact ring pulse plasma generator, and belongs to the field of ultra wide band and terahertz, the ultra wide band electromagnetic wave radiation source comprises a master control system, a host system and a power supply system, the master control system is in communication connection with the host system, and the master control system and the host system are both electrically connected with the power supply system; the host system comprises a forming area and a radiation receiving area, a metal cylindrical outer electrode and a metal cylindrical inner electrode are arranged on the forming area, a compact ring plasma is arranged between the metal cylindrical outer electrode and the metal cylindrical inner electrode, and a plurality of groups of air inlet windows are arranged on the metal cylindrical outer electrode. The plasma excited by the device has anisotropic and non-uniform properties, and can effectively tune and control the frequency. The ultra-wideband terahertz radiation device has the advantages of ultra-wideband radiation and high radiation power, and has important practical value in ultra-wideband and terahertz technology research.

Description

Technical Field

[0001] The invention relates to the fields of ultra-wideband and terahertz, in particular to an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator. Background Art

[0002] In the study of switching arc discharge experiments, the generation of ultra-wideband microwave radiation was observed. After experiments in planar diodes, it was found that when a planar vacuum diode breaks down, it will also radiate ultra-wideband microwaves. In recent years, a variety of plasma-filled devices have made great progress by using plasma to improve the efficiency, power, bandwidth and frequency tuning of microwave equipment, such as plasma-filled waveguides, traveling wave tubes, plasma wave tubes and plasma-assisted slow wave oscillators. The plasma formed during the discharge process of the diode is the main reason for the generation of ultra-wideband microwave radiation.

[0003] Plasmas excited by existing devices cannot be effectively tuned and controlled in frequency, which affects research in ultra-wideband and terahertz technologies. Summary of the invention

[0004] With regard to the above-mentioned problems existing in the prior art, an object of the present invention is to provide an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solutions:

[0006] An ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator comprises a master control system, a host system and a power supply system, wherein the master control system is communicatively connected with the host system, and the master control system and the host system are electrically connected with the power supply system;

[0007] The host system includes a forming area and a radiation receiving area. The forming area is provided with a metal cylindrical outer electrode and a metal cylindrical inner electrode. A compact ring plasma is provided between the metal cylindrical outer electrode and the metal cylindrical inner electrode. The metal cylindrical outer electrode is provided with a plurality of groups of air inlet windows.

[0008] The metal cylindrical outer electrode is connected to one side of the power supply system through a wire, and the other end of the power supply system is connected to the metal ring cover plate. The metal ring cover plate and the metal ring plate flange are fixed together by screws. The metal cylindrical inner electrode is welded to the metal ring cover plate, and the insulating lower end of the metal ring plate flange is directly contacted and connected with the metal cylindrical inner electrode. One end of the metal ring plate flange is fixedly connected to the metal cylindrical cover plate through a ceramic insulating cylinder, and the other end of the metal ring plate flange is fixedly connected to the metal ring outer electrode welding plate through screws, and the metal ring outer electrode welding plate is welded to the metal cylindrical outer electrode.

[0009] As a further solution of the present invention: the metal ring cover is grounded.

[0010] As a further solution of the present invention: a double-ridged horn antenna is provided on the radiation receiving area.

[0011] As a further solution of the present invention: the metal cylindrical outer electrode is arranged on the outermost layer of the host device.

[0012] As a further solution of the present invention: the distance between the radiation receiving area and the forming area is 4m.

[0013] As a further solution of the present invention: the power supply system is mainly composed of a solenoid pulse power supply, a gas valve pulse power supply, a forming pulse power supply and a local controller.

[0014] As a further solution of the present invention: the solenoid pulse power supply, the gas valve pulse power supply and the forming pulse power supply are connected in parallel.

[0015] As a further solution of the present invention: the master control system includes a control discharge system.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] When the electrodes are charged, the gas valve releases the working gas, and the inner and outer electrodes break down the working gas to generate plasma, forming ultra-wideband electromagnetic wave radiation. The insulating layer is mainly made of ceramic, which can effectively prevent the wall material from being ionized and bringing in impurities. The plasma excited by the device of the present invention has anisotropic and non-uniform properties, and can effectively tune and control the frequency. The present invention has the advantages of ultra-wideband radiation and high radiation power, and has important practical value in the research of ultra-wideband and terahertz technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 The present invention is a schematic structural diagram of an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator disclosed in an embodiment.

[0019] Figure 2 The present invention is a schematic structural diagram of a host system in an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator disclosed in an embodiment.

[0020] Figure 3 A cross-sectional view of a host system in an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator disclosed in an embodiment.

[0021] The reference numerals in the figure are: 1. forming area, 2. metal cylindrical outer electrode, 3. metal cylindrical inner electrode, 4. compact ring plasma, 5. air inlet window, 6. power supply system, 7. radiation receiving area, 8. double-ridge horn antenna, 9. ceramic insulating cylinder, 10. metal circular ring plate flange, 11. metal circular ring cover plate, 12. metal circular ring plate flange, 13. metal circular ring outer electrode welding plate, 14. metal cylindrical cover plate. DETAILED DESCRIPTION

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention; it is obvious that the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0023] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "provided with", "connected", and "connected" should be understood in a broad sense; for example, it can be a fixed connection, a detachable connection, or an integral connection, a mechanical connection, or an electrical connection, a direct connection, or an indirect connection through an intermediate medium, or the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0024] See also Figure 1-3 , an ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator, comprising a master control system, a host system and a power supply system 6, wherein the master control system is communicatively connected with the host system, the master control system is used to control the operation of the host system, the master control system and the host system are electrically connected to the power supply system 6, and the power supply system is used to provide electric energy to facilitate the operation of the master control system and the host system;

[0025] The host system includes a forming area 1 and a radiation receiving area 7. A metal cylindrical outer electrode 2 and a metal cylindrical inner electrode 3 are provided on the forming area 1. A compact ring plasma 4 is provided between the metal cylindrical outer electrode 2 and the metal cylindrical inner electrode 3. A plurality of gas inlet windows 5 are provided on the metal cylindrical outer electrode 2.

[0026] The metal cylindrical outer electrode 2 is connected to one side of the power system 6 through a wire, and the other end of the power system 6 is connected to the metal ring cover plate 11. The metal ring cover plate 11 and the metal ring plate flange 12 are fixed together by screws. The metal cylindrical inner electrode 3 is welded to the metal ring cover plate 11, and the insulating lower end of the metal ring plate flange 12 is directly contacted and connected to the metal cylindrical inner electrode 3. One end of the metal ring plate flange 12 is fixedly connected to the metal cylindrical cover plate 11 through the ceramic insulating cylinder 9, and the other end of the metal ring plate flange 12 is fixedly connected to the metal ring outer electrode welding plate 13 through screws. The metal ring outer electrode welding plate 13 is welded to the metal cylindrical outer electrode 2. The neutral gas injected through the air inlet window will diffuse between the metal cylindrical inner electrode and the metal cylindrical outer electrode. Through the ionization and acceleration of the high-voltage pulse power supply, the injected neutral gas will form a dense compact ring plasma. It can be connected to the test platform or observation room during testing according to experimental requirements, and can also be removed in actual application.

[0027] The metal ring cover plate 11 is grounded.

[0028] A double-ridged horn antenna 8 is provided on the radiation receiving area 7; the double-ridged horn antenna 8 is used for receiving radiation.

[0029] The metal cylindrical outer electrode 2 is arranged at the outermost layer of the host device.

[0030] At a distance of 4m from the radiation source, a double-ridged horn antenna was used to receive microwave signals. In the frequency range of 300MHz to 13.2GHz, the measured microwave field intensity amplitude reached up to 10V / M. The radiation center frequency f0 was about 7GHz, the radiation spectrum was very wide, the 3dB bandwidth was 1 to 11GHz, and the angular distribution of the radiation was basically uniform.

[0031] The ceramic insulating cylinder 9 can effectively prevent the wall material from being broken down by the high voltage power supply and causing impurities to be introduced into the plasma.

[0032] In the forming area, a metal annular plate flange is welded to the end of the metal cylindrical outer electrode, which can be used to connect with the test platform or drift tube during experimental testing.

[0033] The power supply system is mainly composed of solenoid pulse power supply, gas valve pulse power supply, forming pulse power supply and local controller. The pulse power supplies are connected in parallel, and the device shell is grounded to avoid high voltage sparks between the power supplies and between the device and the detection probe.

[0034] The master control system includes a control discharge system, which is installed on a computer and can perform remote discharge through the computer during operation.

[0035] A single discharge of a high-voltage pulse power supply is sufficient to form a compact ring plasma in a host device, that is, a single discharge of a single high-voltage pulse power supply can achieve the formation of a compact ring plasma as a radiation source. In addition, the broadening band and frequency of the ultra-wideband electromagnetic wave radiation source can be adjusted by adjusting the voltage of the high-voltage pulse power supply.

[0036] When the host system starts, the vacuum degree of the host system will reach 10 -4 Pa, the purity of the injected high-pressure gas is higher than 99.99%, and the gas pressure ranges from 0.2-8.0MPa.

[0037] The invention has the advantages of ultra-wideband radiation and high radiation power, has important practical value in the research of ultra-wideband and terahertz technology, and is of great significance for the research of plasma radiation microwave.

[0038] The forming area of ​​the host device of the present invention is designed to be cylindrical, which has certain advantages for the formation of plasma. At the same time, this design also has certain advantages for improving the radiation bandwidth and power. At a distance of 4m from the radiation source, a double-ridged horn antenna is used to receive microwave signals. In the frequency range of 300MHz to 13.2GHz, the measured microwave field intensity amplitude is up to 10V / M. The radiation center frequency f0 is about 7GHz, the radiation spectrum is very wide, the 3dB bandwidth is 1 to 11GHz, and the angular distribution of the radiation is basically uniform.

[0039] The host system consists of an inner electrode, an outer electrode, a gas valve and an insulating layer. When the electrode is charged, the gas valve releases the working gas, and the inner and outer electrodes break down the working gas to generate plasma, forming ultra-wideband electromagnetic wave radiation. The insulating layer is mainly made of ceramics, which can effectively prevent the wall material from being ionized and bringing in impurities.

[0040] The plasma excited by the device of the present invention has anisotropic and non-uniform properties, and can effectively tune and control the frequency. The present invention has the advantages of ultra-wideband radiation and high radiation power, and has important practical value in the research of ultra-wideband and terahertz technology.

[0041] The specific working implementation method of the ultra-wideband electromagnetic wave radiation source based on the compact ring pulse plasma generator of the present invention is as follows:

[0042] First, the gas is injected into the space between the metal cylindrical inner electrode 3 and the metal cylindrical outer electrode 2 from the gas inlet window 5;

[0043] Secondly, the high-voltage pulse power supply 6 is triggered, and the high-voltage pulse power supply 6 breaks down between the metal cylindrical inner electrode 3 and the metal cylindrical outer electrode 2 and ionizes the gas into neutral plasma, while generating ultra-wideband radiation.

[0044] The specific working principle of the present invention is:

[0045] (a) First, the solenoid coil is energized to generate a polar magnetic field, and at the same time, gas is injected through a window between the inner electrode and the outer electrode of the metal cylinder;

[0046] (b) secondly, triggering a high-voltage pulse power supply, which breaks down between the metal cylindrical inner electrode and the metal cylindrical outer electrode and ionizes the gas into a neutral plasma, while generating ultra-wideband radiation;

[0047] Compared with the prior art, the invention has the advantages that the excited plasma has anisotropic and non-uniform properties, and can effectively tune and control the frequency of radiated microwaves. The invention has the advantages of ultra-wideband radiation and high radiation power, and has important practical value in ultra-wideband and terahertz technology research.

[0048] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be considered exemplary and non-restrictive from any point of view. The scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention, and any reference numerals in the claims should not be considered as limiting the claims involved.

[0049] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.

Claims

1. An ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator, characterized in that: It comprises a master control system, a host system and a power supply system (6), wherein the master control system is in communication connection with the host system, and the master control system and the host system are both in electrical connection with the power supply system (6); The host system comprises a forming area (1) and a radiation receiving area (7), the forming area (1) is provided with a metal cylindrical outer electrode (2) and a metal cylindrical inner electrode (3), a compact ring plasma (4) is provided between the metal cylindrical outer electrode (2) and the metal cylindrical inner electrode (3), and the metal cylindrical outer electrode (2) is provided with a plurality of groups of air inlet windows (5); The metal cylindrical outer electrode (2) is connected to one side of a power supply system (6) through a wire, and the other end of the power supply system (6) is connected to a metal circular ring cover plate (11). The metal circular ring cover plate (11) and a metal circular ring plate flange (12) are fixed together by screws. The metal cylindrical inner electrode (3) is welded to the metal circular ring cover plate (11), and the insulating lower end of the metal circular ring plate flange (12) is directly contacted and connected to the metal cylindrical inner electrode (3). One end of the metal circular ring plate flange (12) is fixedly connected to the metal cylindrical cover plate (11) through a ceramic insulating cylinder (9), and the other end of the metal circular ring plate flange (12) is fixedly connected to a metal circular ring outer electrode welding plate (13) through screws. The metal circular ring outer electrode welding plate (13) is welded to the metal cylindrical outer electrode (2).

2. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 1, characterized in that: The metal ring cover plate (11) is grounded.

3. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 2, characterized in that: A double-ridged horn antenna (8) is provided on the radiation receiving area (7).

4. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 3, characterized in that: The metal cylindrical outer electrode (2) is arranged on the outermost layer of the host device.

5. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 4, characterized in that: The distance between the radiation receiving area (7) and the molding area (1) is 4 m.

6. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 5, characterized in that: The power supply system (6) is mainly composed of a solenoid pulse power supply, a gas valve pulse power supply, a forming pulse power supply and a local controller.

7. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 6, characterized in that: The solenoid pulse power supply, the gas valve pulse power supply and the forming pulse power supply are connected in parallel.

8. The ultra-wideband electromagnetic wave radiation source based on a compact ring pulse plasma generator according to claim 7, characterized in that: The master control system includes a control discharge system.

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