Correction device, correction method and evaporation equipment

Abstract

The invention provides a correction device, a correction method and evaporation equipment. The correction device comprises a detection device, an adjusting device and a controller connected with the detection device and the adjusting device. The detection device is used for detecting deformation information of a substrate to be evaporated and transmitting the deformation information to the controller; the adjusting device comprises a plurality of adjusting assemblies, any adjusting assembly comprises an adjusting rod, the adjusting rod is used for extending into an adjusting groove of a mask plate, the mask plate is provided with a first surface opposite to the substrate to be evaporated, and the first surface is provided with a plurality of adjusting grooves corresponding to the adjusting assemblies one to one; and the controller is used for calculating the adjusting force required by each adjusting groove when the mask plate is corrected according to the deformation information, and controlling each adjusting rod to apply the adjusting force to the corresponding adjusting groove so as to correct the shape of the mask plate.

Description

Technical Field

[0001] The present disclosure relates to the field of semiconductor technology, and more specifically, to a correction device, a correction method and a vapor deposition device. Background Art

[0002] Organic Light Emitting Diode (OLED) displays have been widely used in various electronic devices including computers, mobile phones and other electronic products due to their advantages such as self-luminescence, light weight, low power consumption, high contrast, high color gamut, and flexible display.

[0003] Among them, in the actual production process of OLED display devices (especially AMOLED display devices), it is usually necessary to use a mask to evaporate the OLED material onto a glass substrate by vacuum evaporation to form each functional layer pattern. However, in this production process, the temperature fluctuation of the glass substrate is an important problem. Due to the influence of factors such as the quality of incoming glass materials and the production rhythm, the glass temperature will fluctuate greatly, causing the glass substrate to deform, and then inconsistent with the shape of the mask. This inconsistency will cause the opening to be evaporated on the mask to be accurately aligned with the pixel opening on the glass substrate during the evaporation process, ultimately resulting in poor color mixing, which seriously affects product quality. At present, the mask is mainly corrected manually, but this method needs to be carried out off the production line, the repair is poor in real time, and it consumes a lot of manpower and material resources, affecting production efficiency and production costs. Summary of the invention

[0004] The purpose of the present disclosure is to provide a correction device, a correction method and an evaporation device to solve the problems in the related art of poor real-time performance, time-consuming and labor-intensive, and affecting production efficiency and production costs when manually correcting the mask.

[0005] In order to achieve the above objectives, the present invention adopts the following technical solutions:

[0006] A first aspect of the present disclosure provides a correction device, including a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device;

[0007] The detection device is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller;

[0008] The adjusting device comprises a plurality of adjusting components, any of which comprises an adjusting rod, and the adjusting rod is used to extend into an adjusting slot of a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjusting slots corresponding to the adjusting components are arranged on the first surface;

[0009] The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

[0010] Optionally, the mask plate includes a first frame, support bars and a metal mask sheet, the first frame has a hollow area, the support bars are connected to the first frame and span the hollow area of ​​the first frame to form a support net, the metal mask sheet is fixedly set on the support net, the surface of the first frame opposite to the substrate to be evaporated is the first surface, the multiple adjustment grooves are evenly distributed on the first surface, the adjustment component is set on the side of the mask plate away from the substrate to be evaporated, and when the mask plate is placed on the supporting table, the adjustment rod of the adjustment component extends into the adjustment groove.

[0011] Optionally, the first frame includes a first frame and a second frame extending in a first direction and arranged in parallel, and a third frame and a fourth frame extending in a second direction and arranged in parallel, at least one first adjustment groove is arranged on the first surfaces of the first frame and the second frame, and at least one second adjustment groove is arranged on the first surfaces of the third frame and the fourth frame;

[0012] The adjustment device includes a plurality of first adjustment components and a plurality of second adjustment components, wherein the first adjustment components correspond to the positions of the first adjustment slots, and the second adjustment components correspond to the positions of the second adjustment slots.

[0013] Optionally, the detection device includes a plurality of optical sensors uniformly distributed along a first direction and a plurality of optical sensors uniformly distributed along a second direction, each of the optical sensors forming a detection area, and when the substrate to be evaporated is located in the detection area, the orthographic projection of the optical sensor on the substrate to be evaporated is located in the edge area of ​​the substrate to be evaporated.

[0014] Optionally, the number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

[0015] Optionally, the adjustment component also includes a drive motor, the output shaft of the drive motor is connected to the adjustment rod, and the output end of the controller is connected to the drive motor for controlling the rotation of the drive motor to drive the adjustment rod to apply the adjustment force to the adjustment slot.

[0016] Optionally, the adjusting rod includes an end portion for extending into the adjusting slot, and the end portion abuts against a side wall of the adjusting slot when the adjusting force is applied.

[0017] Optionally, the adjustment groove is a circular groove, a rectangular groove or a regular polygonal groove.

[0018] A second aspect of the present disclosure provides an evaporation device, comprising a transmission chamber, an evaporation chamber, a carrier, a mask, and a correction device, wherein the correction device comprises a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device;

[0019] The detection device is arranged in the transmission chamber, and is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller;

[0020] The carrying platform is arranged in the evaporation chamber and is used to place a mask plate, wherein the mask plate has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment grooves are arranged on the first surface;

[0021] The adjusting device is disposed in the evaporation chamber, and includes a plurality of adjusting components corresponding to the plurality of adjusting slots one by one, and any of the adjusting components includes an adjusting rod, and when the mask is placed on the supporting platform, the adjusting rod extends into the corresponding adjusting slot;

[0022] The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

[0023] A third aspect of the present disclosure provides a correction method, comprising the following steps:

[0024] Obtaining deformation information of the substrate to be evaporated;

[0025] Calculating the adjustment force required for each adjustment groove when the adjustment device corrects the mask according to the deformation information, the mask has a first surface opposite to the substrate to be evaporated, a plurality of adjustment grooves are arranged on the first surface, the adjustment device includes a plurality of adjustment components corresponding to the plurality of adjustment grooves one by one, any of the adjustment components includes an adjustment rod, and the adjustment rod extends into the corresponding adjustment groove;

[0026] Each adjusting rod is controlled to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

[0027] The beneficial effects of the present disclosure are as follows:

[0028] The correction device of the disclosed embodiment includes a detection device, an adjustment device and a controller. The detection device can detect the deformation information of the substrate to be evaporated in real time and transmit the deformation information to the controller. The controller calculates the adjustment force required for each adjustment groove when the mask is corrected according to the received deformation information, and controls each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. With this arrangement, the online and automatic correction of the shape of the mask can be achieved without the need to repair the mask after it is removed from the production line. On the one hand, it can save manpower and time and improve the production efficiency. On the other hand, the shape of the mask can be adjusted in time and in real time so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force by the adjustment device to change the shape of the mask, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by only changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid the waste of repair materials, save resources and reduce costs. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] The specific implementation methods of the present disclosure are further described in detail below with reference to the accompanying drawings.

[0030] Figure 1 A schematic diagram of a structure of a metal mask provided in an embodiment of the present disclosure;

[0031] Figure 2 A schematic diagram of the structure of a correction device provided in an embodiment of the present disclosure;

[0032] Figure 3 A schematic diagram of the structure of the correction device provided in an embodiment of the present disclosure when applied to a vapor deposition device;

[0033] Figure 4 A top view of a carrier platform provided in an embodiment of the present disclosure;

[0034] Figure 5 A top view of a mask provided in an embodiment of the present disclosure when placed on a carrier;

[0035] Figure 6 A front view of a carrier platform, a mask plate, and a substrate to be evaporated provided in an embodiment of the present disclosure;

[0036] Figure 7 is a schematic diagram of the distribution of the orthographic projection of the detection device on the substrate to be evaporated;

[0037] Figure 8 A schematic diagram of correcting a mask by a correction device;

[0038] Fig. 9 A schematic diagram of the structure of the evaporation device provided in the embodiment of the present disclosure;

[0039] Fig.10 A flowchart of a correction method provided in an embodiment of the present disclosure. DETAILED DESCRIPTION

[0040] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0041] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. The "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as "one", "one" or "the" do not indicate quantity restrictions, but indicate that there is at least one. Similar words such as "include" or "comprise" mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0042] In order to better understand the technical solutions of the correction device, correction method and evaporation equipment disclosed in the present invention, the design concept of the present invention is first briefly introduced.

[0043] In order to solve the color mixing problem caused by the mismatch between the shape of the glass substrate and the mask in the evaporation process, the related technology usually adopts the solution of manually adjusting the shape of the mask to make the shape of the mask consistent with the glass substrate. Figure 1 , Figure 1 FIG. 1 is a schematic diagram of the structure of a metal mask according to an embodiment of the present invention. Figure 1 As shown, the metal mask 100 includes a metal frame 110 , a plurality of support bars 120 , and a plurality of metal mask sheets 130 .

[0044] The middle part of the metal frame 110 is a hollow area. Exemplarily, the metal frame 110 can be a rectangular metal frame, and a rectangular hollow area is arranged in the middle part of the rectangular frame. The plane structure of the metal frame 110 is a "U" structure, but in actual applications, the shape of the metal frame 110 and the shape of the hollow area in the middle of the metal frame 110 can be specifically set according to the shape required for vapor deposition on the substrate to be evaporated, and is not limited here.

[0045] The support bars 120 are in the shape of slats, wherein some of the support bars 120 are arranged across the hollow area of ​​the metal frame 110 along a first direction (such as the X direction), and the remaining support bars 120 are arranged across the hollow area of ​​the metal frame 110 along a second direction (such as the Y direction). Multiple support bars 120 arranged along the first direction and multiple support bars 120 arranged along the second direction are crossed to form a support network, and both ends of the support bars 120 are respectively connected to the metal frame 110.

[0046] The metal mask sheet 130 is located above the support bar 120, and the metal mask sheet 130 is fixedly welded to the support net formed by the metal frame 110 and the support bar 120 through a net stretching device. The metal mask sheet 130 is arranged across the hollow area of ​​the metal frame 110. Multiple metal mask sheets 130 are arranged in sequence along the first direction, and each metal mask sheet 130 includes multiple mask pattern areas A arranged in sequence along the second direction. Each mask pattern area A can correspond to a display screen, that is, each mask pattern area A is formed with multiple evaporation openings, and each evaporation opening corresponds one-to-one to each area where the evaporation material is required in the evaporation process of the display screen. For example, each evaporation opening (assuming it is recorded as a slot opening) corresponds one-to-one to multiple pixel openings (such as anode openings).

[0047] The number of the support bars 120 may be set according to actual needs, for example, according to the number of metal mask sheets 130 and the number of mask pattern areas A on each metal mask sheet 130. For example, Figure 1 As shown, along the X direction, 19 metal mask sheets 130 are formed on the metal frame 110, and each metal mask sheet 130 has 5 mask pattern areas A arranged along the Y direction. Then, 18 support bars 120 arranged along the X direction and 4 support bars 120 arranged along the Y direction can be set. Assuming that each mask pattern area A corresponds to the size of a mobile phone screen, the entire metal mask plate corresponds to 19*4=76 mobile phone screens, that is, the evaporation process for 76 mobile phone screens can be realized at the same time.

[0048] In the related art, a gasket is usually used or the support bar 120 is changed to adjust the shape of the metal mask 100. For example, a gasket is added in a specific area between the support bar 120 and the metal mask 130, and the gasket provides a force in a specific direction to the metal mask 130, so that the metal mask 130 is slightly deformed and then matches the shape of the glass substrate.

[0049] However, the above repair solutions all require the metal mask to be removed from the production line and then repaired. It is impossible to adjust the matching between the glass substrate and the metal mask in real time. On the one hand, the repair effect is poor; on the other hand, it takes a lot of time and affects production efficiency. In addition, it will also consume a lot of manpower and material resources, such as consuming a large number of support bars and gaskets, which increases costs.

[0050] In order to solve the above technical problems, the embodiments of the present disclosure provide a correction device, a correction method and a vapor deposition device. The specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.

[0051] Please refer to Figures 2 to 3 , Figure 2 A schematic diagram of the structure of a correction device provided in an embodiment of the present disclosure, Figure 3 A structural schematic diagram of an evaporation device provided in an embodiment of the present disclosure, wherein a correction device in an embodiment of the present disclosure is applied to the evaporation device, and is used to perform online real-time adjustment on the shape of a mask in the evaporation device, so as to correct the shape of the mask to match the shape of a substrate to be evaporated.

[0052] like Figure 2 As shown, the correction device 200 includes a detection device 210, an adjustment device 220, and a controller 230 connected to the detection device 210 and the adjustment device 220. The detection device 210 is used to detect the deformation information of the substrate 400 to be evaporated and transmit the deformation information to the controller 230; the adjustment device 220 includes a plurality of adjustment components 2210, any of which includes an adjustment rod, which is used to extend into the adjustment groove of the mask 340, wherein the mask 340 has a first surface opposite to the substrate 400 to be evaporated, and a plurality of adjustment grooves 3400 corresponding to the adjustment components 2210 are arranged on the first surface; the controller 230 is used to calculate the adjustment force required for each adjustment groove when the mask 340 is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment groove 3400 to correct the shape of the mask 340.

[0053] like Figure 3As shown, the evaporation device 300 includes a transmission chamber 310, an evaporation chamber 320, a carrier 330 and a mask 340. A conveying device is provided in the transmission chamber 310, which is used to transfer the substrate 400 to be evaporated from the transmission chamber 310 to the evaporation chamber 320. The evaporation chamber 320 is used to realize the evaporation of the substrate 400 to be evaporated, such as evaporating organic light-emitting materials and cathode materials onto a glass substrate under a vacuum and high temperature environment to form a light-emitting layer and a cathode layer of a light-emitting device, wherein the carrier 330 and the mask 340 are arranged in the evaporation chamber 320, and the carrier 330 is used to carry the mask 340, that is, during the evaporation process, the mask 340 is placed above the carrier 330, and the substrate to be evaporated is arranged above the mask 340, and the substrate to be evaporated 400 and the mask 340 are attached to each other during evaporation.

[0054] When the correction device 200 is applied to the evaporation device 300, the detection device 210 is arranged in the transmission chamber 310, the adjustment device 220 is arranged in the evaporation chamber 320, and the controller 230 can be a background server remotely connected to the detection device 210. In specific implementation, the detection device 210 can be located directly above the transmission device, and is used to perform real-time detection of deformation information of the substrate to be evaporated 400 transmitted on the transmission device.

[0055] In order to realize the online correction of the mask 340, the mask 340 needs to be improved in structure corresponding to the correction device 200. Specifically, when the substrate 400 to be evaporated is not deformed, the mask 340 has the same shape and size as the substrate 400 to be evaporated. At this time, when the mask 340 is attached to the substrate 400 to be evaporated, the slot opening pattern on the mask 340 and the anode opening pattern on the substrate 400 to be evaporated can be accurately aligned. When evaporation is performed in the evaporation chamber 320, the mask 340 is set on the carrier 330. Assuming that the surface opposite to the substrate to be evaporated is recorded as the first surface A, and the surface of the mask 340 attached to the substrate 400 to be evaporated is recorded as the second surface B, it is necessary to set a plurality of adjustment grooves 3400 on the first surface A, and each adjustment groove 3400 corresponds to an adjustment component 2210. Each adjustment component 2210 is fixedly disposed on the carrier 330 , and when the mask 340 is correctly placed on the carrier 330 , the adjustment rod of each adjustment component 2210 just extends into the corresponding adjustment slot 3400 .

[0056] Compared with the related art, the correction device of the embodiment of the present disclosure includes a detection device, an adjustment device and a controller. The detection device can detect the deformation information of the substrate to be evaporated in real time and transmit the deformation information to the controller. The controller calculates the adjustment force required for each adjustment groove when the mask is corrected according to the received deformation information, and controls each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. In this way, the shape of the mask can be corrected online and automatically without removing the mask from the production line and then repairing it. On the one hand, it can save manpower and time and improve the production efficiency. On the other hand, the shape of the mask can be adjusted in time and in real time so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force to change the shape of the mask through the adjustment device, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by only changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid the waste of repair materials, save resources and reduce costs.

[0057] In one possible implementation, see Figure 4 and Figure 6 , Figure 4 is a top view of the carrier platform. Figure 5 This is a top view of the mask placed on the carrier. Figure 6 This is a front view of the carrier, mask, and substrate to be evaporated. Figures 4 to 6 As shown, each adjustment component 2210 is fixedly disposed on the carrier 330. For any adjustment component 2210, the height of the adjustment rod in the adjustment component 2210 is greater than the height of the bearing surface of the carrier 340, and when the mask 340 is placed on the carrier 330, the adjustment rod just extends into the corresponding adjustment groove 3400. The bearing surface of the carrier 340 is the surface where the carrier 330 contacts the mask 340.

[0058] like Figures 4 to 6As shown, the mask 340 includes a first frame 3410, a support bar 3420 and a metal mask sheet 3430. The first frame 3410 has a hollow area. The support bar 3420 is connected to the first frame 3410 and is arranged across the hollow area of ​​the first frame 3410 to form a support net. The metal mask sheet 3430 is arranged on the support net. Exemplarily, the metal mask sheet 3430 is laser welded to the first frame 3410 and the support bar 3420. The surface of the first frame 3410 opposite to the substrate 400 to be evaporated is the first surface A. The multiple adjustment grooves 3400 are evenly distributed on the first surface A. The adjustment component 2210 is arranged on the side of the mask 340 away from the substrate 400 to be evaporated. When the mask 340 is placed on the carrier 330, the adjustment rod of the adjustment component 2210 extends into the adjustment groove 3400.

[0059] In the disclosed embodiment, the mask 340 is a precision metal mask (FMM), the first frame 3410 is a metal frame, and a plurality of adjustment slots 3400 are provided on the frame of the mask 340 (i.e., the first frame). When the shape of the mask 340 needs to be adjusted, the shape of the mask 340 can be changed by applying adjustment forces of different directions and magnitudes to different points on the frame, thereby achieving fine adjustment of the mask pattern on the metal mask sheet 3430. Specifically, when a force is applied to the first frame 3410, the first frame 3410 will drive the metal mask sheet 3430 fixedly connected thereto to undergo the same change trend, such as stretching or shrinking, so as to cause a certain offset in the position of the evaporation opening in the metal mask sheet 3430.

[0060] Optionally, the substrate 400 to be evaporated in the embodiment of the present disclosure is a glass substrate. When a large temperature fluctuation occurs during the production process (such as entering a normal temperature process from a high temperature process), the edge area of ​​the glass substrate will undergo a slight deformation, such as showing an outward expansion trend or an inward contraction trend. Usually, the deformation is invisible to the naked eye at the micron level, but the slight deformation will also cause the pixel units in the corresponding area to shift in the corresponding trend, such as the pixel units shifting outward or inward, and finally causing the display device to have a mixed color phenomenon. In order to improve this problem, it is necessary to fine-tune the shape of the mask plate 340 so that it is consistent with the shape of the substrate 400 to be evaporated. When the shape of the mask plate 340 is fine-tuned, the mask pattern area of ​​the corresponding area on the mask plate 340 will also be fine-tuned accordingly, so that the fine-tuned mask pattern matches the position of the pixel unit on the substrate 400 to be evaporated after deformation, such as the positions of each evaporation opening on the mask plate 340 after correction and each pixel opening on the substrate 400 to be evaporated accurately. Since the first frame 3410 is made of metal and has a certain elasticity, the shape of the first frame 3410 can be changed when force is applied to different points on the first frame 3410 , and since the adjustment process is a micro-adjustment process, it will not cause damage to the mask 340 .

[0061] It can be understood that the specific structure of the mask in the embodiment of the present disclosure may also be other mask structures in the related art, and the present disclosure is not limited thereto.

[0062] Optional, such as Figures 4 to 6 As shown, the first frame 3410 includes a first frame 3411 and a second frame 3412 extending in a first direction and arranged in parallel, and a third frame 3413 and a fourth frame 3414 extending in a second direction and arranged in parallel, at least one first adjustment groove 3400a is arranged on the first surfaces of the first frame 3411 and the second frame 3412, and at least one second adjustment groove 3400b is arranged on the first surfaces of the third frame 3413 and the fourth frame 3414; the adjustment device 220 includes a plurality of first adjustment components 2210a and a plurality of second adjustment components 2210b, the first adjustment component 2210a corresponds to the position of the first adjustment groove 3400a, and the second adjustment component 2210b corresponds to the position of the second adjustment groove 3400b.

[0063] Optionally, the first direction is perpendicular to the second direction. Exemplarily, the first direction is the X direction, and the second direction is the Y direction. In this case, the first frame 3410 is a quadrilateral, such as a rectangular arrangement, and correspondingly, the shape of the mask 340 is a rectangle. It is understandable that in other embodiments, the shape of the mask 340 can also be other shapes, not limited to a rectangle, as long as the shape of the mask matches the shape of the substrate 400 to be evaporated.

[0064] For example, Figures 4 to 6 As shown, the first frame 3411 and the second frame 3412 are two long frames of the mask, the third frame 3413 and the fourth frame 3414 are two short frames of the mask, 4 adjustment slots are set on each long frame, 1 adjustment slot is set on each short frame, and a total of 12 adjustment slots are set. In order to distinguish and represent, the embodiment of the disclosure is recorded as the first adjustment slot 3400 on the first frame 3411 and the second frame 3412 as the first adjustment slot 3400a, and the adjustment slot 3400 on the third frame 3413 and the fourth frame 3414 as the second adjustment slot 3400b. Correspondingly, the adjustment component 2210 corresponding to the first adjustment slot 3400a is recorded as the first adjustment component 2210a, and the adjustment component 2210 corresponding to the second adjustment slot 3400b is recorded as the second adjustment component 2210b.

[0065] It is understandable that the number of adjustment slots (including the first adjustment slot and the second adjustment slot) on the mask can be adaptively set according to the size of the mask and the adjustment accuracy of the mask, and the embodiment of the present disclosure does not limit the number of adjustment slots.

[0066] In a possible implementation, the detection device 210 includes a plurality of optical sensors 2110 uniformly distributed along a first direction and a plurality of optical sensors 2110 uniformly distributed along a second direction, each of the optical sensors 2110 forms a detection area, and when the substrate to be evaporated 400 is located in the detection area, the orthographic projection of the optical sensor 2110 on the substrate to be evaporated 400 is located in the edge area of ​​the substrate to be evaporated 400.

[0067] In the disclosed embodiment, the deformation information of the substrate 400 to be evaporated is detected by an optical sensor. Exemplarily, the optical sensor is a high-definition CCD device, and its detection accuracy can reach the micron level, which can realize the detection of small deformations on the substrate 400 to be evaporated. Optionally, the optical sensor 2110 is used to detect the pixel position accuracy (PPA) of the edge area of ​​the substrate 400 to be evaporated. The PPA can characterize the position offset of the pixel opening pattern in the substrate 400 to be evaporated, that is, the shape change of the substrate 400 to be evaporated. The controller 230 can obtain the shape change information of the substrate 400 to be evaporated according to the PPA data, including information such as the deformation position, deformation direction, and deformation intensity, and then determine the adjustment force required to make the mask 340 undergo the same deformation.

[0068] Optionally, there are multiple optical sensors, and the position distribution of the multiple optical sensors can cover the edge areas around the substrate to be evaporated 400, that is, the detection area formed by each optical sensor, that is, the detection range can cover the edge areas around the substrate to be evaporated 400, so that the deformation occurring in the edge area of ​​the substrate to be evaporated 400 can be detected in real time.

[0069] In a possible implementation, the number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

[0070] Among them, the relative position distribution between each optical sensor includes the relative position of any optical sensor among each optical sensor and other optical sensors, and the relative position includes direction and distance. Similarly, the relative position distribution between each adjustment slot includes the relative position of any adjustment slot among each adjustment slot and other adjustment slots. The relative position distribution of the optical sensor and the adjustment slot is the same, that is, the layout of the optical sensor and the adjustment slot is the same.

[0071] For example, Figures 4 to 6 The distribution structure of the adjustment grooves in the mask is shown in FIG. 1 , and the distribution of the positive projection of the detection device on the substrate to be evaporated 400 is shown in FIG. Figure 7 As shown, Figure 7 As shown, the detection device 210 includes 12 optical sensors 2110, wherein 5 optical sensors 2110 are arranged in the extension direction of each long side along the long side extension direction of the substrate 400 to be evaporated, and 1 optical sensor 2110 is arranged in the extension direction of each short side along the extension direction of the short side of the substrate 400 to be evaporated.

[0072] The detection device 210 is arranged in the transmission cavity 310. In specific implementation, the detection device 210 can be arranged directly above the conveying device in the transmission cavity 310, as long as the detection area of ​​the detection device 210 can be directly facing the surface of the material to be evaporated in the substrate 400 to be evaporated, and when the substrate 400 to be evaporated is placed on the conveying device and located in the detection area, the orthographic projections of each optical sensor 2110 on the substrate 400 to be evaporated are just evenly distributed in the edge area of ​​the substrate 400 to be evaporated. Exemplarily, the shape and size of the substrate 400 to be evaporated when it is not deformed are the same as the shape and size of the initial mask 340 that has not been corrected, then the distribution of the orthographic projections of each optical sensor 2110 on the substrate 400 to be evaporated when it is not deformed is exactly the same as the distribution of each adjustment slot 3400 on the initial mask 340 that has not been corrected.

[0073] In a possible implementation, the adjustment component 2210 is a torque adjustment component.

[0074] Optionally, the adjustment assembly 2210 includes not only the adjustment rod 2211 but also a drive motor 2212, the output shaft of the drive motor 2212 is connected to the adjustment rod 2211, and the output end of the controller 230 is connected to the drive motor 2212, and is used to control the drive motor 2212 to rotate according to the adjustment force to drive the adjustment rod 2211 to apply the adjustment force to the adjustment slot 3400. In a specific implementation, the adjustment rod 2211 can also be connected to the output shaft of the drive motor 2211 through a connecting mechanism (such as a gear, a belt, a chain, etc.) to ensure that the torque output by the drive motor 2212 can be accurately transmitted to the adjustment rod 2211.

[0075] For any adjustment component 2210, its working principle is as follows: the controller 230 calculates the adjustment force required when the mask plate 340 undergoes the same deformation based on the deformation information of the substrate to be evaporated 400, and the adjustment force includes the adjustment force required on each adjustment groove, and each adjustment force includes two information: magnitude and direction; then, the controller 230 adjusts the output frequency, current or magnetic field and other parameters of the corresponding drive motor 2212 based on the calculated adjustment force, thereby changing the magnitude and direction of the adjustment force applied by the adjustment rod to the adjustment groove.

[0076] Optionally, the adjustment rod 2211 includes an end portion for extending into the adjustment groove 3400, and the end portion abuts against the side wall of the adjustment groove 3400 when the adjustment force is applied. Specifically, the end of the adjustment rod 2211 is designed to be suitable for extending into the adjustment groove 3400 and contacting the side wall of the adjustment groove 3400, such as the end of the adjustment rod is spherical, conical, cylindrical or regular polygonal, etc. When the adjustment rod 2211 applies a force to the side wall of the adjustment groove 3400, the force will drive the shape of the mask 340 to change.

[0077] In addition, the length and diameter of the adjustment rod 2211 can be matched and designed according to the shape, depth, width and other parameters of the adjustment slot 3400 to ensure that the end of the adjustment rod 2211 can smoothly extend into the adjustment slot 3400 and apply the adjustment force. At the same time, the adjustment rod 2211 has sufficient rigidity and strength, so that it can maintain a stable shape during the adjustment process and can apply sufficient adjustment force to the corresponding adjustment slot 3400.

[0078] In a possible implementation, the adjustment groove 3400 is a circular groove, a rectangular groove or a regular polygonal groove, that is, the cross-sectional shape of the adjustment groove is circular, rectangular or regular polygonal. Correspondingly, the end of the adjustment rod 2211 can be spherical, cylindrical or other structures.

[0079] When the adjustment groove 3400 is a circular groove, the adjustment groove 3400 has an arc-shaped side wall of 360° in the first plane. When the adjustment rod 2211 abuts against the side wall of the adjustment groove 3400, it can flexibly output the adjustment force in various directions in the first plane, that is, it can apply the adjustment force in various directions to the mask 340, which is more conducive to the fine adjustment of the shape of the mask 340. In addition, when the adjustment groove 3400 is a circular, rectangular or regular polygonal groove, it is also conducive to the end of the adjustment rod 2211 abutting against the side wall of the adjustment groove 3400, and the processing technology of the adjustment groove is simple and easy to implement. It can be understood that in other embodiments, the end of the adjustment rod 2211 can also contact the bottom wall of the adjustment groove 3400, and the adjustment rod 2211 can also apply the adjustment force toward the bottom wall of the adjustment groove.

[0080] For example, please refer to Figure 8 , Figure 8 Schematic diagram of correcting the mask by using a correction device. Figure 8 400 in the figure represents the substrate 400 to be evaporated after deformation, and the dotted frame represents the shape of the substrate 400 to be evaporated when no deformation occurs. Figure 8 It can be seen that the substrate 400 to be evaporated has undergone an outward expansion deformation in the two long side directions and an inward contraction deformation in the two short side directions. The controller 230 calculates the adjustment force required by each adjustment component 2210 based on the detected deformation information of the substrate 400 to be evaporated, which are respectively recorded as F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11 and F12, where the length of the arrow indicates the magnitude of the adjustment force, and the direction of the arrow indicates the direction of action of the adjustment force, which is represented by Figure 8 It can be seen that the magnitudes of the adjustment forces F1, F2, F3, F4, F5, F6, F7, F8, F9, F10, F11 and F12 are all different, and the direction of the adjustment force is the same as the deformation direction at the corresponding position. After the adjustment components 2210 apply their respective corresponding adjustment forces to the side walls of the adjustment grooves 3400 in their respective adjustment grooves 3400, the mask plate 340 undergoes the same deformation as the substrate 400 to be evaporated, and the shape of the corrected mask plate 340 is the same as the shape of the substrate 400 to be evaporated.

[0081] Based on the same inventive concept, a second aspect of the present disclosure provides a vapor deposition device having the correction device as described above.

[0082] For example, Fig. 9As shown, the evaporation device includes a transmission chamber 310, an evaporation chamber 320, a carrier 330, a mask 340, and a correction device, wherein the correction device includes a detection device 210, an adjustment device 220, and a controller 230 connected to the detection device 210 and the adjustment device 230; the detection device 210 is arranged in the transmission chamber 310, and is used to detect the deformation information of the substrate 400 to be evaporated and transmit the deformation information to the controller 230; the carrier 330 is arranged in the evaporation chamber 320, and is used to place the mask 340, and the mask 340 has a contact with the substrate to be evaporated. The first surface is opposite to the evaporation substrate 400, and a plurality of adjustment grooves are arranged on the first surface; the adjustment device 220 is arranged in the evaporation chamber 320, and the adjustment device 320 includes a plurality of adjustment components corresponding to the plurality of adjustment grooves one by one, and any of the adjustment components includes an adjustment rod, and when the mask is placed on the supporting platform, the adjustment rod extends into the corresponding adjustment groove; the controller 230 is used to calculate the adjustment force required for each adjustment groove when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment groove to correct the shape of the mask.

[0083] like Fig. 9 As shown, Fig. 9 Passage1 and Passage2 both represent transmission sections, wherein Passage1 represents the input transmission section of the evaporation chamber 320, and Passage2 represents the output transmission section of the evaporation chamber 320, that is, the glass substrate in Passage1 (i.e., the substrate to be evaporated 400) is transmitted to the evaporation chamber 320 for the evaporation process, and the glass substrate after evaporation in the evaporation chamber 320 is output to Passage2 to enter the next process. When a new glass substrate in Passage1 needs to be transferred to the evaporation chamber 320 for evaporation, the detection device 210 in Passage1 measures the PPA of the current glass substrate in real time, and feeds the data back to the controller 230, and the controller 230 adjusts the shape of the mask 340 in real time; similarly, when the glass substrate in Passage2 needs to be evaporated again for the next process, the detection device 210 in Passage2 is also required to detect the PPA data of the glass substrate therein and feed it back to the controller 230. Among them, the PPA data of the glass substrate detected by the detection device 210 is transmitted to the controller 230. The controller calculates the deformation of the glass substrate according to the PPA data, calculates the adjustment force required to change the shape of the mask according to the deformation of the glass substrate, and outputs the adjustment force information to the adjustment device 220. The adjustment device 220 applies the adjustment force to the mask 340, thereby realizing the correction of the shape of the mask 340.

[0084] Based on the same inventive concept, the third aspect of the present disclosure provides a correction method, which is applicable to the correction device shown above. Fig.10 As shown, the correction method includes the following steps:

[0085] Step S101, obtaining deformation information of a substrate to be evaporated;

[0086] Step S102, calculating the adjustment force required for each adjustment groove when the adjustment device corrects the mask according to the deformation information, the mask having a first surface opposite to the substrate to be evaporated, a plurality of adjustment grooves being arranged on the first surface, the adjustment device comprising a plurality of adjustment components corresponding to the plurality of adjustment grooves one by one, any of the adjustment components comprising an adjustment rod, the adjustment rod extending into the corresponding adjustment groove;

[0087] Step S103 , controlling each adjusting rod to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

[0088] Compared with the related art, the correction method of the embodiment of the present invention can detect the deformation information of the substrate to be evaporated in real time, calculate the adjustment force required for each adjustment groove when correcting the mask according to the received deformation information, and control each adjustment rod to apply the adjustment force to the adjustment groove at the corresponding position on the mask to correct the shape of the mask. With such a configuration, the online and automatic correction of the shape of the mask can be achieved without the need to remove the mask from the production line and then repair it. On the one hand, it can save manpower and time and improve production efficiency. On the other hand, it can adjust the shape of the mask in time and in real time so that the shape of the mask is the same as the shape of the current substrate to be evaporated, and the repair effect is more accurate. In addition, by applying the adjustment force through the adjustment device to change the shape of the mask, the adjustment device can be reused multiple times. The mask can be adjusted to a different shape by only changing the output adjustment force each time. Compared with the solution of using gaskets for repair, it can avoid the waste of repair materials, save resources and reduce costs.

[0089] Based on the same inventive concept, the fourth aspect of the present disclosure provides a computer-readable storage medium on which a computer program is stored, and when the program is executed by a processor, the steps of the correction method described above are implemented.

[0090] In the specific implementation process, the computer storage medium may include: Universal Serial Bus Flash Drive (USB), mobile hard disk, read-only memory (ROM), random access memory (RAM), magnetic disk or optical disk, and other storage media that can store program codes.

[0091] Based on the same inventive concept, the fifth aspect of the present disclosure provides a computer program product, including a computer program, which implements the steps of the data management method described above when executed by a processor. Since the principle of solving the problem by the above computer program is similar to the principle of the data management method, the implementation of the above computer program can refer to the implementation of the data management method, and the repeated parts will not be repeated.

[0092] The computer program product may employ any combination of one or more readable media. The readable medium may be a readable signal medium or a readable storage medium. The readable storage medium may be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device or device, or any combination thereof. More specific examples (non-exhaustive list) of readable storage media include: an electrical connection with one or more conductors, a portable disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination thereof.

[0093] Obviously, the above embodiments of the present disclosure are merely examples for clearly illustrating the present disclosure, and are not limitations on the implementation methods of the present disclosure. For ordinary technicians in this field, other different forms of changes or modifications can be made on the basis of the above description. It is impossible to list all the implementation methods here. All obvious changes or modifications derived from the technical solution of the present disclosure are still within the protection scope of the present disclosure.

Claims

1. A correction device, characterized in that: It includes a detection device, an adjustment device and a controller connected to the detection device and the adjustment device; The detection device is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller; The adjusting device comprises a plurality of adjusting components, any of which comprises an adjusting rod, and the adjusting rod is used to extend into an adjusting slot of a mask, wherein the mask has a first surface opposite to the substrate to be evaporated, and a plurality of adjusting slots corresponding to the adjusting components are arranged on the first surface; The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

2. The correction device according to claim 1, characterized in that The mask plate includes a first frame, a support bar and a metal mask sheet, the first frame has a hollow area, the support bar is connected to the first frame and spans the hollow area of ​​the first frame to form a support net, the metal mask sheet is fixedly set on the support net, the surface of the first frame opposite to the substrate to be evaporated is the first surface, the multiple adjustment grooves are evenly distributed on the first surface, the adjustment component is set on the side of the mask plate away from the substrate to be evaporated, and when the mask plate is placed on the supporting platform, the adjustment rod of the adjustment component extends into the adjustment groove.

3. The correction device according to claim 2, characterized in that: The first frame includes a first frame and a second frame extending in a first direction and arranged in parallel, and a third frame and a fourth frame extending in a second direction and arranged in parallel, at least one first adjustment groove is arranged on the first surfaces of the first frame and the second frame, and at least one second adjustment groove is arranged on the first surfaces of the third frame and the fourth frame; The adjustment device includes a plurality of first adjustment components and a plurality of second adjustment components, wherein the first adjustment components correspond to the positions of the first adjustment slots, and the second adjustment components correspond to the positions of the second adjustment slots.

4. The correction device according to any one of claims 1 to 3, characterized in that: The detection device includes a plurality of optical sensors uniformly distributed along a first direction and a plurality of optical sensors uniformly distributed along a second direction, each of the optical sensors forming a detection area, and when the substrate to be evaporated is located in the detection area, the orthographic projection of the optical sensor on the substrate to be evaporated is located in the edge area of ​​the substrate to be evaporated.

5. The correction device according to claim 4, characterized in that: The number of the optical sensors is the same as the number of the adjustment slots on the mask, and the relative position distribution between the optical sensors is the same as the relative position distribution between the adjustment slots.

6. The correction device according to claim 1, characterized in that The adjustment component also includes a drive motor, the output shaft of the drive motor is connected to the adjustment rod, and the output end of the controller is connected to the drive motor for controlling the rotation of the drive motor to drive the adjustment rod to apply the adjustment force to the adjustment slot.

7. The correction device according to claim 1, characterized in that The adjusting rod comprises an end portion for extending into the adjusting slot, and the end portion abuts against a side wall of the adjusting slot when the adjusting force is applied.

8. The correction device according to claim 1, characterized in that The adjusting groove is a circular groove, a rectangular groove or a regular polygonal groove.

9. A vapor deposition device, characterized in that: It includes a transmission chamber, an evaporation chamber, a carrier, a mask, and a correction device, wherein the correction device includes a detection device, an adjustment device, and a controller connected to the detection device and the adjustment device; The detection device is arranged in the transmission chamber, and is used to detect deformation information of the substrate to be evaporated and transmit the deformation information to the controller; The carrying platform is arranged in the evaporation chamber and is used to place a mask plate, wherein the mask plate has a first surface opposite to the substrate to be evaporated, and a plurality of adjustment grooves are arranged on the first surface; The adjusting device is disposed in the evaporation chamber, and includes a plurality of adjusting components corresponding to the plurality of adjusting slots one by one, and any of the adjusting components includes an adjusting rod, and when the mask is placed on the supporting platform, the adjusting rod extends into the corresponding adjusting slot; The controller is used to calculate the adjustment force required for each adjustment slot when the mask is corrected according to the deformation information, and control each adjustment rod to apply the adjustment force to the corresponding adjustment slot to correct the shape of the mask.

10. A correction method, characterized in that: The following steps are involved: Obtaining deformation information of the substrate to be evaporated; Calculating the adjustment force required for each adjustment groove when the adjustment device corrects the mask according to the deformation information, the mask has a first surface opposite to the substrate to be evaporated, a plurality of adjustment grooves are arranged on the first surface, the adjustment device includes a plurality of adjustment components corresponding to the plurality of adjustment grooves one by one, any of the adjustment components includes an adjustment rod, and the adjustment rod extends into the corresponding adjustment groove; Each adjusting rod is controlled to apply the adjusting force to the corresponding adjusting slot to correct the shape of the mask.

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