Diamond curved surface optical element and forming method thereof

Abstract

The invention discloses a diamond curved surface optical element and a forming method thereof, and belongs to the technical field of optical element preparation. The method comprises the following steps: grinding the top of a molybdenum disilicide bar prepared in advance into a concave shape of a target curved-surface optical element; performing crystal planting treatment on the top of the molybdenum disilicide bar by adopting the diamond turbid liquid, and then growing a diamond film by adopting a chemical vapor deposition method to obtain a molybdenum disilicide substrate; the diamond film on the top of the molybdenum disilicide substrate is ground to a target shape, and the ground molybdenum disilicide substrate is obtained; and soaking the ground molybdenum disilicide substrate into an acid corrosion solution, and stripping to obtain the diamond curved-surface optical element. The diamond curved-surface optical element can solve the problem that in the prior art, a diamond curved-surface optical element is difficult to machine, and application of the diamond curved-surface optical element can be further promoted.

Description

Technical Field

[0001] The invention belongs to the technical field of optical element preparation, and relates to a diamond curved surface optical element and a molding method thereof. Background Art

[0002] The core raw materials of traditional optical components mainly rely on high-quality crystal bars. These crystal bars need to go through a series of precise and time-consuming processing steps, including rough grinding, fine grinding and final polishing, before they can be transformed into optical components with specific curved shapes. However, since diamond is a representative of superhard materials, its Mohs hardness is 10, and its tensile strength is greater than 1.2GPa. It has the characteristics of high hardness, low fracture toughness and difficulty in processing. It is a typical brittle and difficult-to-process material.

[0003] The processing method currently used to prepare diamond curved optical components has extremely low processing efficiency. During processing, the raw material crystal rod is usually roughly ground into shape, and after the convex surface is formed, it is turned over to perform concave processing. The processing process accounts for more than 50% of the cost of diamond optical components, and the material within the diameter of the curved concave surface is removed, wasting a lot of raw materials.

[0004] In summary, the current preparation method of diamond curved optical elements is time-consuming and inefficient, and wastes a large amount of raw materials. It is urgent to develop a method for obtaining diamond curved optical elements with high efficiency, low cost and high quality. Summary of the invention

[0005] The purpose of the present invention is to provide a diamond curved optical element and a forming method thereof, so as to solve the technical problems in the prior art that the preparation method of the diamond curved optical element is low in efficiency, time-consuming and difficult to control quality.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions: In a first aspect, the present invention provides a method for forming a diamond curved surface optical element, comprising the following steps: Grinding the top of the pre-prepared molybdenum disilicide rod into a concave shape of a target curved optical element; The top of the molybdenum disilicide rod is treated with a diamond suspension, and then a diamond film is grown by chemical vapor deposition to obtain a molybdenum disilicide substrate; Grinding the diamond film on the top of the molybdenum disilicide substrate to a target shape to obtain a ground molybdenum disilicide substrate; The ground molybdenum disilicide substrate is immersed in an acid etching solution and peeled off to obtain a diamond curved surface optical element.

[0007] Furthermore, the method for preparing the molybdenum disilicide rod comprises the following steps: Adding a mixture of molybdenum powder, tungsten powder and silicon powder into a ball mill mixer, and ball milling to obtain a powder; Mixing polyethylene glycol and polyacrylamide with water to obtain a binder; The powder and the binder are mixed into a mud material, which is first aged at a constant temperature, and then put into a vacuum mud kneading machine for mud kneading. After the mud kneading is completed, a molded rod body is obtained by an extrusion molding method; The formed rod body is sintered in a vacuum furnace to obtain molybdenum disilicide rods.

[0008] Furthermore, the mass ratio of molybdenum powder, tungsten powder and silicon powder in the mixture is (10-70): (10-15): (10-70); the mass ratio of the mixture to the balls in the ball mill mixer is 1:1, and the ball milling time is 8 hours to 10 hours.

[0009] Furthermore, the mass ratio of the polyethylene glycol to the polyacrylamide is 1:1, and the mass fraction of the obtained binder is 10% to 20%.

[0010] Furthermore, the volume ratio of the powder and the binder in the mud material is 1:2; the temperature of the constant temperature aging is less than 10°C; the sintering temperature is 1000°C~1500°C, and the sintering time is 0.5h~3h.

[0011] Furthermore, the diamond suspension is obtained by mixing diamond powder and water; the volume ratio of the diamond powder to water is 1:3, and the particle size of the diamond powder is 0.1μm~1μm; the crystal planting treatment method adopts ultrasonic crystal planting method, spin coating method or direct grinding method; the chemical vapor deposition method adopts microwave plasma CVD (Chemical Vapor Deposition, chemical vapor deposition) method, DC jet plasma CVD method or hot wire CVD method.

[0012] Furthermore, in the process of growing the diamond film by chemical vapor deposition, the surface temperature of the molybdenum disilicide rod is controlled to be 900° C. to 1100° C., and the thickness of the grown diamond film is 20 μm to 2000 μm.

[0013] Furthermore, the acid etching solution is a mixed solution of hydrofluoric acid and nitric acid, and the volume ratio of hydrofluoric acid to nitric acid is (1-3):1.

[0014] Furthermore, the method further comprises: washing the peeled diamond curved surface optical element with deionized water and then drying it.

[0015] In a second aspect, the present invention provides a diamond curved surface optical element, which is prepared by the above-mentioned forming method of a diamond curved surface optical element.

[0016] Compared with the prior art, the present invention has the following beneficial effects: The present invention discloses a diamond curved surface optical element and a forming method thereof. First, a molybdenum disilicide rod is ground into a target curved surface optical shape, then a diamond film is grown on the molybdenum disilicide rod, then the grown diamond film is ground, and finally the diamond curved surface optical element is obtained by stripping with an acid etching solution. Unlike the existing diamond curved surface optical element forming using crystal rods, the present invention directly grows a curved surface diamond blank using a near-size forming method, which reduces a large amount of diamond removal costs and significantly improves production efficiency. In addition, the method of the present invention can be used to prepare a thinner diamond curved surface optical element. Traditional preparation methods are often limited by material thickness and processing technology, and it is difficult to achieve the production of ultra-thin and high-quality diamond curved surface optical elements. The diamond curved surface optical element prepared by the present invention can greatly reduce the thickness while ensuring optical performance, which is undoubtedly a major breakthrough for modern optical elements that require lightweight and high light transmittance. Secondly, the present invention can regulate the growth temperature of the diamond film during the preparation process by regulating the composition of molybdenum disilicide, thereby regulating the quality of the diamond curved surface optical element. Not only does it make the growth process of diamond film more controllable, but it can also accurately optimize the different requirements of diamond curved surface optical components in different application scenarios, such as hardness, thermal conductivity, transmittance, etc. Diamond curved surface optical components with different performances and meeting diverse needs can be produced, greatly broadening the application range of diamond optical components. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 The manufacturing flow chart of the method of the present invention is shown in FIG. DETAILED DESCRIPTION

[0019] In order to enable those skilled in the art to understand the characteristics and effects of the present invention, the following is a general description and definition of the terms and expressions mentioned in the specification and claims. Unless otherwise specified, all technical and scientific terms used in the text are the common meanings understood by those skilled in the art for the present invention. In the event of a conflict, the definition in this specification shall prevail.

[0020] The theories or mechanisms described and disclosed herein, whether correct or incorrect, should not limit the scope of the present invention in any way, that is, the present invention can be implemented without being limited by any specific theory or mechanism.

[0021] In this article, all features such as values, quantities, contents and concentrations defined in the form of numerical ranges or percentage ranges are for simplicity and convenience only. Accordingly, the description of numerical ranges or percentage ranges should be considered to have included and specifically disclosed all possible secondary ranges and individual values ​​within the range (including integers and fractions).

[0022] In this document, unless otherwise specified, “includes,” “including,” “contains,” “has,” or similar terms cover the meanings of “consisting of” and “mainly consisting of,” for example, “A includes a” covers the meanings of “A includes a and other” and “A only includes a.”

[0023] In this document, in order to make the description concise, not all possible combinations of various technical features in various embodiments or examples are described. Therefore, as long as there is no contradiction in the combination of these technical features, the various technical features in various embodiments or examples can be combined arbitrarily, and all possible combinations should be considered to be within the scope of this specification.

[0024] The present invention is further described in detail below in conjunction with the accompanying drawings: See also Figure 1 The embodiment of the present invention discloses a method for forming a diamond curved surface optical element, comprising the following steps: S1, grinding the top of the pre-prepared molybdenum disilicide rod into a concave shape of the target curved optical element; In this step, the method for preparing the molybdenum disilicide rod comprises the following steps: Step 1, adding a mixture of molybdenum powder, tungsten powder and silicon powder into a ball mill mixer, and ball milling to obtain a powder; It should be noted that the mass ratio of molybdenum powder, tungsten powder and silicon powder in the mixture is (10-70): (10-15): (10-70); the mass ratio of the mixture to the balls in the ball mill mixer is 1:1, and the ball milling time is 8 hours to 10 hours.

[0025] Step 2, mixing polyethylene glycol and polyacrylamide with water to obtain a binder; It should be noted that the mass ratio of the polyethylene glycol to the polyacrylamide is 1:1, and the mass fraction of the obtained binder is 10% to 20%.

[0026] Step 3, mixing the powder and the binder into a mud material, first aging at a constant temperature, then adding the mud material into a vacuum mud kneading machine for mud kneading, and after the mud kneading is completed, obtaining a molded rod body by an extrusion molding method; It should be noted that the volume ratio of the powder and the binder in the mud material is 1:2; and the temperature of the constant temperature aging is <10°C.

[0027] Step 4, sintering the formed rod body in a vacuum furnace to obtain molybdenum disilicide rods.

[0028] It should be noted that the sintering temperature is 1000° C. to 1500° C., and the sintering time is 0.5 h to 3 h.

[0029] S2, using a diamond suspension to perform a crystal planting process on the top of the molybdenum disilicide rod, and then using a chemical vapor deposition method to grow a diamond film to obtain a molybdenum disilicide substrate; In this step, the diamond suspension is obtained by mixing diamond powder and water; the volume ratio of the diamond powder to water is 1:3, and the particle size of the diamond powder is 0.1μm~1μm; the crystal planting treatment method adopts ultrasonic crystal planting method, spin coating method or direct grinding method; the chemical vapor deposition method adopts microwave plasma CVD method, DC jet plasma CVD method or hot wire CVD method. In the process of growing diamond film by chemical vapor deposition method, the surface temperature of molybdenum disilicide rod is controlled to 900℃~1100℃ (the surface temperature of molybdenum disilicide rod can be achieved by adjusting the ratio of molybdenum powder, tungsten powder and silicon powder in the above step 1), and the thickness of the grown diamond film is 20μm~2000μm.

[0030] S3, grinding the diamond film on the top of the molybdenum disilicide substrate to a target shape to obtain a ground molybdenum disilicide substrate; S4, soaking the ground molybdenum disilicide substrate in an acid etching solution, and peeling it off to obtain a diamond curved surface optical element.

[0031] In this step, the acid etching solution is a mixed solution of hydrofluoric acid and nitric acid, and the volume ratio of hydrofluoric acid to nitric acid is (1-3):1.

[0032] S5, cleaning the peeled diamond curved surface optical element with deionized water and then drying it.

[0033] The embodiment of the present invention further discloses a diamond curved surface optical element, which is prepared by adopting the above-mentioned forming method of a diamond curved surface optical element.

[0034] The present invention can solve the problem of difficult processing of diamond curved optical elements in the prior art, and help to further promote the application of diamond curved optical elements. It has the following three advantages: 1. Unlike the existing curved optical element molding using crystal rods, the present invention uses a near-size molding method to directly grow curved diamond blanks, reducing a large amount of diamond removal costs. 2. The present invention can also prepare thinner curved diamond films. 3. The present invention can control the growth temperature of curved diamond by regulating the composition of molybdenum disilicide, thereby regulating the quality of curved diamond.

[0035] The present invention will be further described below in conjunction with specific embodiments. It should be understood that these embodiments are only used to illustrate the present invention and are not intended to limit the scope of the present invention. In addition, it should be understood that after reading the content taught by the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent forms fall within the scope limited by the appended claims of the application equally.

[0036] The following examples use conventional instruments and equipment in the art. The experimental methods in the following examples where specific conditions are not specified are usually carried out under conventional conditions or under conditions recommended by the manufacturer. The various raw materials used in the following examples are conventional commercial products unless otherwise specified, and their specifications are conventional specifications in the art. In the specification of the present invention and the following examples, unless otherwise specified, "%" means weight percentage, "part" means weight part, and ratio means weight ratio.

[0037] Embodiment 1: 1) Molybdenum powder, tungsten powder and silicon powder were mixed in a mass ratio of 20:14:50 to obtain a mixture, and then added into a ball mill mixer, and mixed for 8 hours in a mass ratio of mixture: ball of 1:1 to obtain a powder.

[0038] 2) Mix polyethylene glycol and polyacrylamide in a mass ratio of 1:1 with water to prepare a binder with a mass fraction of 13%.

[0039] 3) The powder and the binder are mixed into a mud material in a volume ratio of 1:2, and first aged at a constant temperature (8°C), and then added to a vacuum mud kneading machine for mud kneading. After the end, the molded rod is obtained by extrusion molding.

[0040] 4) The formed rod body is sintered in a high-temperature vacuum furnace, the temperature is set to 1300°C, the sintering time is 2 hours, and molybdenum disilicide rods are obtained after sintering.

[0041] 5) Use an ultra-precision machine tool to grind the top of the MoSi2 rod into the concave shape of the target curved optical element, and then cut the bottom of the MoSi2 rod so that the MoSi2 rod can maintain a stable position during the subsequent chemical vapor deposition process.

[0042] 6) The top of the molybdenum disilicide rod obtained in step 5) is subjected to a crystal planting treatment by ultrasonic crystal planting. The diamond suspension used for the crystal planting treatment is prepared by mixing diamond powder with a particle size of 0.3 μm and water in a volume ratio of 1:3.

[0043] 7) Diamond film was grown on MoSi2 rod after crystal planting by microwave plasma CVD method, the surface temperature of MoSi2 was 980℃; the thickness of the grown diamond film was 200μm.

[0044] 8) Using an ultra-precision machine tool to grind the diamond film grown on the top of the MoSi2 substrate to a target shape to obtain a ground MoSi2 substrate; 9) Soak the ground molybdenum disilicide substrate in a mixed solution of hydrofluoric acid and nitric acid in a volume ratio of 1:1, and peel off the diamond curved optical element by acid etching.

[0045] 10) The peeled diamond curved surface optical element is cleaned with deionized water and then dried to finally obtain the target diamond curved surface optical element.

[0046] Embodiment 2: 1) Molybdenum powder, tungsten powder and silicon powder were mixed in a mass ratio of 61:14:59 to obtain a mixture, which was then added into a ball mill mixer and fully mixed for 9.5 hours in a mass ratio of mixture: ball of 1:1 to obtain a powder.

[0047] 2) Mix polyethylene glycol and polyacrylamide in a mass ratio of 1:1 with water to prepare a binder with a mass fraction of 18%.

[0048] 3) The powder and the binder are mixed into a mud material in a volume ratio of 1:2, and first aged at a constant temperature (8°C), and then added to a vacuum mud kneading machine for mud kneading. After the end, the molded rod is obtained by extrusion molding.

[0049] 4) The formed rod body is sintered in a high-temperature vacuum furnace, the temperature is set to 1250°C, the sintering time is 1 hour, and molybdenum disilicide rods are obtained after sintering.

[0050] 5) Use an ultra-precision machine tool to grind the top of the MoSi2 rod into the concave shape of the target curved optical element, and then cut the bottom of the MoSi2 rod so that the MoSi2 rod can maintain a stable position during the subsequent chemical vapor deposition process.

[0051] 6) The top of the molybdenum disilicide rod obtained in step 5) is subjected to a crystal planting treatment by spin coating. The diamond suspension used for the crystal planting treatment is prepared by mixing diamond powder with a particle size of 0.5 μm and water in a volume ratio of 1:3.

[0052] 7) A diamond film was grown on the MoSi2 rod after the crystal planting process by using a DC jet plasma CVD method. The surface temperature of the MoSi2 was 1050°C. The thickness of the grown diamond film was 1500 μm.

[0053] 8) Using an ultra-precision machine tool to grind the diamond film grown on the top of the MoSi2 substrate to a target shape to obtain a ground MoSi2 substrate; 9) Soak the ground molybdenum disilicide substrate in a mixed solution of hydrofluoric acid and nitric acid in a volume ratio of 2:1, and peel off the diamond curved optical element by acid etching.

[0054] 10) The peeled diamond curved surface optical element is cleaned with deionized water and then dried to finally obtain the target diamond curved surface optical element.

[0055] Embodiment 3: 1) Molybdenum powder, tungsten powder and silicon powder were mixed in a mass ratio of 40:11:33 to obtain a mixture, which was then added to a ball mill mixer and fully mixed for 10 hours in a mass ratio of mixture: ball of 1:1 to obtain a powder.

[0056] 2) Mix polyethylene glycol and polyacrylamide in a mass ratio of 1:1 with water to prepare a binder with a mass fraction of 13%.

[0057] 3) The powder and the binder are mixed into a mud material in a volume ratio of 1:2, and first aged at a constant temperature (8°C), and then added to a vacuum mud kneading machine for mud kneading. After the end, the molded rod is obtained by extrusion molding.

[0058] 4) The formed rod body is sintered in a high-temperature vacuum furnace, the temperature is set to 1400°C, the sintering time is 2.5 hours, and molybdenum disilicide rods are obtained after sintering.

[0059] 5) Use an ultra-precision machine tool to grind the top of the MoSi2 rod into the concave shape of the target curved optical element, and then cut the bottom of the MoSi2 rod so that the MoSi2 rod can maintain a stable position during the subsequent chemical vapor deposition process.

[0060] 6) The top of the molybdenum disilicide rod obtained in step 5) is subjected to a crystal planting treatment by spin coating. The diamond suspension used for the crystal planting treatment is prepared by mixing diamond powder with a particle size of 0.8 μm and water in a volume ratio of 1:3.

[0061] 7) Diamond film was grown on MoSi2 rod after crystal planting by microwave plasma CVD method, the surface temperature of MoSi2 was 950℃; the thickness of the grown diamond film was 20μm.

[0062] 8) Using an ultra-precision machine tool to grind the diamond film grown on the top of the MoSi2 substrate to a target shape to obtain a ground MoSi2 substrate; 9) Soak the ground molybdenum disilicide substrate in a mixed solution of hydrofluoric acid and nitric acid in a volume ratio of 3:1, and peel off the diamond curved optical element by acid etching.

[0063] 10) The peeled diamond curved surface optical element is cleaned with deionized water and then dried to finally obtain the target diamond curved surface optical element.

[0064] Embodiment 4: 1) Molybdenum powder, tungsten powder and silicon powder were mixed in a mass ratio of 35:12:28 to obtain a mixture, and then added into a ball mill mixer, and mixed for 8.5 hours at a mass ratio of mixture: ball of 1:1 to obtain a powder.

[0065] 2) Mix polyethylene glycol and polyacrylamide in a mass ratio of 1:1 with water to prepare a binder with a mass fraction of 11%.

[0066] 3) The powder and the binder are mixed into a mud material in a volume ratio of 1:2, and first aged at a constant temperature (8°C), and then added to a vacuum mud kneading machine for mud kneading. After the end, the molded rod is obtained by extrusion molding.

[0067] 4) The formed rod body is sintered in a high-temperature vacuum furnace, the temperature is set to 1115°C, the sintering time is 3 hours, and molybdenum disilicide rods are obtained after sintering.

[0068] 5) Use an ultra-precision machine tool to grind the top of the MoSi2 rod into the concave shape of the target curved optical element, and then cut the bottom of the MoSi2 rod so that the MoSi2 rod can maintain a stable position during the subsequent chemical vapor deposition process.

[0069] 6) The top of the molybdenum disilicide rod obtained in step 5) is subjected to a direct grinding method to a crystal planting treatment. The diamond suspension used for the crystal planting treatment is prepared by mixing diamond powder with a particle size of 0.9 μm and water in a volume ratio of 1:3.

[0070] 7) Diamond film was grown on MoSi2 rod after crystal planting by microwave plasma CVD method, the surface temperature of MoSi2 was 1030℃; the thickness of the grown diamond film was 600μm.

[0071] 8) Using an ultra-precision machine tool to grind the diamond film grown on the top of the MoSi2 substrate to a target shape to obtain a ground MoSi2 substrate; 9) Soak the ground molybdenum disilicide substrate in a mixed solution of hydrofluoric acid and nitric acid in a volume ratio of 1.5:1, and peel off the diamond curved optical element by acid etching.

[0072] 10) The peeled diamond curved surface optical element is cleaned with deionized water and then dried to finally obtain the target diamond curved surface optical element.

[0073] Embodiment 5: 1) Molybdenum powder, tungsten powder and silicon powder were mixed in a mass ratio of 55:15:45 to obtain a mixture, and then added into a ball mill mixer, and mixed thoroughly for 9 hours in a mass ratio of mixture: ball of 1:1 to obtain a powder.

[0074] 2) Mix polyethylene glycol and polyacrylamide in a mass ratio of 1:1 with water to prepare a binder with a mass fraction of 16%.

[0075] 3) The powder and the binder are mixed into a mud material in a volume ratio of 1:2, and first aged at a constant temperature (8°C), and then added to a vacuum mud kneading machine for mud kneading. After the end, the molded rod is obtained by extrusion molding.

[0076] 4) The formed rod body is sintered in a high-temperature vacuum furnace, the temperature is set to 1500°C, the sintering time is 0.5h, and molybdenum disilicide rods are obtained after sintering.

[0077] 5) Use an ultra-precision machine tool to grind the top of the MoSi2 rod into the concave shape of the target curved optical element, and then cut the bottom of the MoSi2 rod so that the MoSi2 rod can maintain a stable position during the subsequent chemical vapor deposition process.

[0078] 6) The top of the molybdenum disilicide rod obtained in step 5) is subjected to a crystal planting treatment by ultrasonic crystal planting. The diamond suspension used for the crystal planting treatment is prepared by mixing diamond powder with a particle size of 0.6 μm and water in a volume ratio of 1:3.

[0079] 7) A hot-wire CVD method was used to grow a diamond film on the MoSi2 rod after the crystal planting process. The surface temperature of the MoSi2 was 1020°C. The thickness of the grown diamond film was 1100 μm.

[0080] 8) Using an ultra-precision machine tool to grind the diamond film grown on the top of the MoSi2 substrate to a target shape to obtain a ground MoSi2 substrate; 9) Soak the ground molybdenum disilicide substrate in a mixed solution of hydrofluoric acid and nitric acid in a volume ratio of 2:1, and peel off the diamond curved optical element by acid etching.

[0081] 10) The peeled diamond curved surface optical element is cleaned with deionized water and then dried to finally obtain the target diamond curved surface optical element.

[0082] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A method for forming a diamond curved surface optical element, characterized in that: The following steps are involved: Grinding the top of the pre-prepared molybdenum disilicide rod into a concave shape of a target curved optical element; The top of the molybdenum disilicide rod is treated with a diamond suspension, and then a diamond film is grown by chemical vapor deposition to obtain a molybdenum disilicide substrate; Grinding the diamond film on the top of the molybdenum disilicide substrate to a target shape to obtain a ground molybdenum disilicide substrate; The ground molybdenum disilicide substrate is immersed in an acid etching solution and peeled off to obtain a diamond curved surface optical element.

2. The method for forming a diamond curved surface optical element according to claim 1, characterized in that: The method for preparing the molybdenum disilicide rod comprises the following steps: Adding a mixture of molybdenum powder, tungsten powder and silicon powder into a ball mill mixer, and ball milling to obtain a powder; Mixing polyethylene glycol and polyacrylamide with water to obtain a binder; The powder and the binder are mixed into a mud material, which is first aged at a constant temperature, and then put into a vacuum mud kneading machine for mud kneading. After the mud kneading is completed, a molded rod body is obtained by an extrusion molding method; The formed rod body is sintered in a vacuum furnace to obtain molybdenum disilicide rods.

3. The method for forming a diamond curved surface optical element according to claim 2, characterized in that: The mass ratio of molybdenum powder, tungsten powder and silicon powder in the mixture is (10-70): (10-15): (10-70); the mass ratio of the mixture to the balls in the ball mill mixer is 1:1, and the ball milling time is 8 hours to 10 hours.

4. The method for forming a diamond curved surface optical element according to claim 2, characterized in that: The mass ratio of the polyethylene glycol to the polyacrylamide is 1:1, and the mass fraction of the obtained binder is 10% to 20%.

5. The method for forming a diamond curved surface optical element according to claim 2, characterized in that: The volume ratio of the powder and the binder in the mud material is 1:2; the temperature of the constant temperature aging is less than 10°C; the temperature of the sintering is 1000°C to 1500°C, and the sintering time is 0.5h to 3h.

6. The method for forming a diamond curved surface optical element according to claim 1, characterized in that: The diamond suspension is obtained by mixing diamond powder and water; the volume ratio of the diamond powder to water is 1:3, and the particle size of the diamond powder is 0.1μm~1μm; the crystal planting treatment method adopts ultrasonic crystal planting method, spin coating method or direct grinding method; the chemical vapor deposition method adopts microwave plasma CVD method, DC jet plasma CVD method or hot wire CVD method.

7. The method for forming a diamond curved surface optical element according to claim 1, characterized in that: In the process of growing the diamond film by chemical vapor deposition, the surface temperature of the molybdenum disilicide rod is controlled to be 900° C. to 1100° C., and the thickness of the grown diamond film is 20 μm to 2000 μm.

8. The method for forming a diamond curved surface optical element according to claim 1, characterized in that: The acid etching solution is a mixed solution of hydrofluoric acid and nitric acid, and the volume ratio of hydrofluoric acid to nitric acid is (1-3):

1.

9. The method for forming a diamond curved surface optical element according to claim 1, characterized in that: Also includes: The peeled diamond curved surface optical element is cleaned with deionized water and then dried.

10. A diamond curved surface optical element, characterized in that: The diamond curved optical element is prepared by the molding method of any one of claims 1 to 9.

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