Anti-reflective multilayer film and method for manufacturing anti-reflective multilayer film

Abstract

An anti-reflective multilayer film and a method for manufacturing an anti-reflective multilayer film are provided. The anti-reflection multilayer film includes: a substrate; at least one highly reflective layer, the at least one highly reflective layer being over the substrate; and an uppermost low refractive index nanoporous layer, the uppermost low refractive index nanoporous layer over the at least one high reflective layer, where the at least one high reflective layer has a refractive index greater than 1.7 and the uppermost low refractive index nanoporous layer has a refractive index less than 1.7. The method comprises the following steps: providing a substrate; depositing at least one highly reflective layer material on the substrate to form at least one highly reflective layer; and depositing a low refractive index layer material comprising low refractive index nanoparticles on the at least one high reflective layer to form an uppermost low refractive index nanoporous layer, where the at least one high reflective layer has a refractive index greater than 1.7 and the uppermost low refractive index nanoporous layer has a refractive index less than 1.7.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to an anti-reflective multilayer film and a method for manufacturing the anti-reflective multilayer film. Background Art

[0002] Over the past few decades, displays have become ubiquitous in our lives, found in all sorts of unexpected places, from refrigerators to windshields to helmets. Today, displays enhance our lives by helping us plan, experience, monitor, organize, and create in all sorts of new ways. As a result, the use of displays has increased significantly across a wide range of applications.

[0003] Although display technology has been around for more than a hundred years and several advances have been made in this area of ​​technology, display technology still faces some limitations. For example, there is a greater likelihood of using a display in situations that result in low visibility, such as in environments where the display is exposed to ambient light or light from a lighting device. In this case, the display acts as a mirror and reflects anything illuminated within the field of view into the user's eyes, which results in so-called specular reflections. Therefore, since the specular reflections are superimposed on the display's own image, the specular reflections reduce contrast, wash out the intended image, and cause difficulty for the user to read the display. In this way, specular reflections reduce the user's speed and accuracy and cause discomfort, including headaches and eyestrain.

[0004] Because specular reflections of displays cause this inconvenience, displays having improved anti-reflection properties have been conceived.

[0005] As part of developing displays with improved anti-reflective properties, recent techniques for reducing specular reflections in displays have focused on applying anti-reflective layers on films suitable for use in displays, wherein reflected light is reduced by canceling out reflected light.

[0006] However, there is a need for further improvements in antireflective films suitable for displays, and there is a need for further improvements in the production of such films. There is a particular need for films, particularly for displays, which exhibit enhanced antireflective properties, which reduce specular reflections. Furthermore, there is a need for methods for providing such antireflective multilayer films, particularly for display technology, which are relatively easy and cost-effective to perform and provide a robust antireflective layer, which also allows the antireflective properties of an antireflective film suitable for a display to be adjusted. Summary of the invention

[0007] In view of the above, an anti-reflective multilayer film and a method for manufacturing an anti-reflective multilayer film are provided. Other aspects, advantages and features of the present disclosure are apparent from the claims, the description and the drawings.

[0008] According to one aspect of the present disclosure, an anti-reflection multilayer film is provided. The anti-reflection multilayer film includes: a substrate; at least one high-reflection layer, at least one high-reflection layer is above the substrate; and an uppermost low-refractive index nanoporous layer, the uppermost low-refractive index nanoporous layer is above the at least one high-reflection layer. Further, the refractive index of the at least one high-reflection layer is greater than 1.7, and the refractive index of the uppermost low-refractive index nanoporous layer is less than 1.7.

[0009] According to another aspect of the present disclosure, a method for manufacturing an anti-reflective multilayer film is provided. The method comprises: providing a substrate; depositing at least one high-reflective layer material on the substrate to form at least one high-reflective layer; and depositing a low-refractive index layer material including low-refractive index nanoparticles on at least one high-reflective layer to form an uppermost low-refractive index nanoporous layer. Further, the refractive index of at least one high-reflective layer is greater than 1.7, and the refractive index of the uppermost low-refractive index nanoporous layer is less than 1.7.

[0010] BRIEF DESCRIPTION OF THE DRAWINGS

[0011] In order to be able to understand in detail the manner in which the above-mentioned features of the present disclosure are achieved, a more particular description of the present disclosure briefly summarized above may be made by reference to the embodiments. The accompanying drawings relate to the embodiments of the present disclosure and are described below:

[0012] Figures 1 to 6 shows a schematic cross-sectional view of an anti-reflective multilayer film according to an embodiment described herein;

[0013] Figure 7 A schematic diagram showing a deposition apparatus for manufacturing an anti-reflective multilayer film according to an embodiment described herein;

[0014] Figure 8 A flow chart showing a method for manufacturing an anti-reflective multilayer film according to an embodiment described herein; and

[0015] Fig. 9 Graphs showing reflectance of comparable films having multiple antireflective layers and antireflective multilayer films according to embodiments described herein are shown. DETAILED DESCRIPTION

[0016] Reference will now be made in detail to various embodiments of the present disclosure, one or more examples of which are illustrated in the accompanying drawings. In the following description of the drawings, the same reference numerals denote the same features. Typically, only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation of the present disclosure, but this is not meant to limit the present disclosure. Further, features illustrated or described as part of one embodiment may be used on other embodiments or used in combination with other embodiments to produce yet another embodiment. This specification is intended to include such modifications and variations.

[0017] Due to the increase in the number of different applications in which films exhibiting enhanced anti-reflective properties can be used, such as displays, the need for films exhibiting enhanced anti-reflective properties, particularly films for displays, has now become more significant than ever. In this regard, the reduction of specular reflections of films for displays improves the speed and accuracy with which users can read the display and reduces discomfort, including headaches and eye fatigue. Different strategies have been proposed to reduce specular reflections of films for displays, including the use of films suitable for displays having multiple anti-reflective layers.

[0018] As an example, a low refractive index layer containing SiOx can be formed by physical vapor deposition on a film suitable for use in a display to reduce specular reflections in such a display. However, production costs from physical vapor deposition are relatively high, deposition by physical vapor deposition is relatively slow, antireflective layers produced by physical vapor deposition are generally brittle, and a high degree of control over the thickness uniformity of the antireflective layer is required.

[0019] In addition, although the anti-reflective properties of the low refractive index layer containing SiOx on the film are relatively acceptable, and it is possible to form other anti-reflective layers (e.g., multiple anti-reflective layers) on the film using physical vapor deposition, an anti-reflective layer having a refractive index lower than that of the low refractive index layer containing SiOx has been envisioned to improve the anti-reflective properties of films suitable for use in displays.

[0020] As an alternative, an anti-reflective layer can also be formed on a film suitable for a display by a wet coating process. The wet coating process produces an anti-reflective layer with a very low refractive index, high robustness and low production cost. However, it is technically difficult to deposit multiple layers using a wet coating process, which hinders the formation of multiple anti-reflective layers on a film suitable for a display and makes it difficult to produce such a film with multiple anti-reflective layers, multiple anti-reflective layers having different refractive indices, and making it difficult to adjust the anti-reflective properties of such a film.

[0021] Therefore, there is a need for further improvements in the production of anti-reflective films suitable for displays. There is a particular need for films, especially for displays, which exhibit enhanced anti-reflective properties, which reduce specular reflections. Furthermore, there is a need for methods for providing such anti-reflective multilayer films, especially for display technology, which are relatively easy and cost-effective to perform and provide a robust anti-reflective layer.

[0022] The present disclosure overcomes the above disadvantages by providing an anti-reflective multilayer film and a method for manufacturing the anti-reflective multilayer film. In particular, since the anti-reflective multilayer film of the present disclosure includes: at least one high-reflective layer deposited, in particular by physical vapor deposition or chemical vapor deposition, at least one high-reflective layer is above the substrate and has a refractive index greater than 1.7; and the topmost low-refractive-index nanoporous layer deposited, in particular by a wet coating process, the topmost low-refractive-index nanoporous layer is above the at least one high-reflective layer and has a refractive index less than 1.7, the anti-reflective multilayer film of the present disclosure shows higher robustness and better performance.

[0023] Furthermore, the method for producing an antireflective multilayer film allows a reduction in production costs due to the reduction in layer deposition by physical vapor deposition or chemical vapor deposition, the reduction in the deposition of multiple layers on the film, and the possibility of adjusting the antireflective properties of the antireflective multilayer film.

[0024] Before describing various embodiments of the present disclosure in more detail, some aspects regarding some terms and expressions used herein are explained.

[0025] The term "layer stack" as used herein refers to a group of layers. The term "anti-reflective layer stack" as used herein refers to a group of layers that provide anti-reflective properties for the film to resist light reflection (particularly specular reflection). The term "high-reflective layer stack" as used herein refers to a group of layers that provide high-reflective properties for the film so that the refractive index of the film is greater than 1.7. The anti-reflective layer, high-reflective layer, layer stack, anti-reflective layer stack or high-reflective layer stack described herein can be flexible and / or transparent. Similarly, the topmost low-refractive-index nanoporous layer described in the present disclosure can be flexible and / or transparent. The term "transparent" as used herein can particularly include the ability of a structure to transmit light with relatively low scattering, so that, for example, light transmitted therethrough can be seen in a substantially clear manner.

[0026] The term "organic layer" may be understood as a layer made of an organic material, particularly formed on a substrate (e.g., on a substrate surface). The term "organic layer" may also be understood as a layer made of an organic layer material, which fills a recessed feature structure formed in the substrate surface and / or covers the top surface of a raised feature structure formed on the substrate surface. In addition, the term "organic layer" may refer to a layer that makes the surface of a substrate (particularly a flexible substrate) level or flat (in terms of planarization).

[0027] The term "organic layer material" may refer to a material composition that forms an organic layer. In addition, in some embodiments, the term "organic layer material" may refer to a material composition that is provided (e.g., coated or applied) on a substrate, in particular on a substrate such as a substrate surface, and forms an organic layer. Similarly, the term "low refractive index layer material" may refer to a material composition that forms the uppermost low refractive index nanoporous layer. In addition, in some embodiments, the term "low refractive index layer material" may refer to a material composition that is provided (e.g., coated or applied) on at least one high reflective layer and forms the uppermost low refractive index nanoporous layer.

[0028] When referring to the terms "on", "over" or "after", i.e. one layer after another, it is understood that the terms "on", "over" or "after" are used to define the order of layers, layer stacks and / or films, where the starting point is the substrate. This order is independent of whether the antireflective multilayer film is depicted upside down.

[0029] The term "dispersion" may be understood as a state in which particles, in particular organic particles, may be uniformly distributed or dispersed in an organic layer. The term "agglomerate" may be understood as a state in which particles, in particular organic particles, may be held together by weak physical interactions, ultimately resulting in at least one group of particles, in particular a group of organic particles, in a specific region of a layer (e.g., an organic layer).

[0030] The term "substrate" or "flexible substrate" as used herein may particularly include flexible substrates, such as rolls or foils. The term "substantially inflexible" should be understood to be distinguished from "flexible". In particular, a substantially inflexible substrate may have a certain degree of flexibility, such as a glass plate having a thickness of 0.9 mm or less (e.g., 0.5 mm or less), wherein the substantially inflexible substrate is less flexible than a flexible substrate. The term "flexible" may also refer to being able to be formed into a roll.

[0031] It is noted here that a typical feature of the flexible substrate or coil used in the embodiments described herein may be that the flexible substrate is bendable. The term "coil" may be used synonymously with the term "strip", the term "band" or the term "flexible substrate". For example, the coil described in the embodiments herein may be a foil or another flexible substrate. However, as described in more detail herein, the benefits of the embodiments described herein may also be provided for non-flexible substrates or carriers for other in-line deposition systems. However, it should be understood that particular benefits may be used for flexible substrates and for applications for manufacturing devices on flexible substrates.

[0032] The term "refractive index" (or refractive index) n of a material or optical medium is a dimensionless number that describes how light or any other radiation propagates through the material. It is defined as n = c / v, where c is the speed of light in a vacuum and v is the speed of light in the material.

[0033] The antireflective multilayer film according to the embodiments described herein may have color neutrality. Color neutrality provides improved optical properties of the antireflective multilayer film.

[0034] Figure 1 A schematic cross-sectional view of an anti-reflective multilayer film 100 according to an embodiment described herein is shown. Although various embodiments of the present disclosure are described with reference to the anti-reflective multilayer film 100 for simplicity, the various embodiments with reference to the anti-reflective multilayer film 100 of the present disclosure may also be applied or referred to the anti-reflective multilayer films further described in the present disclosure.

[0035] According to some embodiments that can be combined with other embodiments described herein, the anti-reflective multilayer film 100 includes a substrate 110, in particular a transparent substrate. In addition, the anti-reflective multilayer film 100 includes at least one high reflective layer 120, and the at least one high reflective layer is above the substrate 110. In addition, the anti-reflective multilayer film 100 includes an uppermost low-refractive index nanoporous layer 130, and the uppermost low-refractive index nanoporous layer is above the at least one high reflective layer 120. In addition, the refractive index of the at least one high reflective layer 120 is greater than 1.7. In addition, the refractive index of the uppermost low-refractive index nanoporous layer 130 is less than 1.7.

[0036] In some embodiments, the substrate 110 may include at least one material selected from the group consisting of polycarbonate, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyacrylate and / or derivatives of polyacrylate, polymethacrylate and / or derivatives of polymethacrylate, cycloolefin polymer, polyethylene naphthalate, polyethylene terephthalate, polyethylene glycol, polyimide, and combinations thereof.

[0037] In some embodiments, the thickness of the substrate 110 may be equal to or less than 500 μm, particularly equal to or less than 400 μm, and more particularly equal to or less than 300 μm. In some embodiments, the thickness of the substrate 110 may be equal to or greater than 10 μm, particularly equal to or greater than 30 μm, and more particularly equal to or greater than 50 μm. In some embodiments, the thickness of the substrate 110 may be 10 μm or more and 500 μm or less, particularly 30 μm or more and 400 μm or less, and more particularly 50 μm or more and 300 μm or less.

[0038] In some embodiments, at least one highly reflective layer 120 may be disposed or deposited directly over the substrate 110. In some embodiments, the uppermost low refractive index nanoporous layer 130 may be disposed or deposited directly over the at least one highly reflective layer 120.

[0039] In some embodiments, at least one high reflective layer 120 may be a single high reflective layer. In some embodiments, the refractive index of the single high reflective layer may be at least 1.9. In some embodiments, the refractive index of the single high reflective layer may be at least 1.9, particularly at least 2, and more particularly at least 2.1. In some embodiments, the single high reflective layer of the at least one high reflective layer 120 having a refractive index of at least 1.9 may include at least one of TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof.

[0040] In some embodiments, the refractive index of the single high reflective layer may be between 1.7 and 1.9. In some embodiments, the single high reflective layer of at least one high reflective layer 120 having a refractive index between 1.7 and 1.9 may include at least one of the following: SiNx, SiN, SiOxNy, AlxOy, AlOxNy, an organic material such as a polymer material, and / or a combination thereof.

[0041] In some embodiments, the uppermost low refractive index nanoporous layer 130 may include substantially spherical pores. In some embodiments, the substantially spherical pores may have a maximum D10 pore size of 100 nm, particularly a maximum D10 pore size of 80 nm, and more particularly a maximum D10 pore size of 60 nm; and / or the substantially spherical pores may have a minimum D10 pore size of 30 nm, particularly a minimum D10 pore size of 35 nm, and more particularly a minimum D10 pore size of 40 nm.

[0042] In some embodiments, the substantially spherical pores may have a maximum D50 pore size of 100 nm, particularly a maximum D50 pore size of 80 nm, and more particularly a maximum D50 pore size of 60 nm; and / or the substantially spherical pores may have a minimum D50 pore size of 30 nm, particularly a minimum D50 pore size of 35 nm, and more particularly a minimum D50 pore size of 40 nm.

[0043] In some embodiments, the substantially spherical pores may have a maximum D90 pore diameter of 100 nm, particularly a maximum D90 pore diameter of 80 nm, and more particularly a maximum D90 pore diameter of 60 nm; and / or the substantially spherical pores may have a minimum D90 pore diameter of 30 nm, particularly a minimum D90 pore diameter of 35 nm, and more particularly a minimum D90 pore diameter of 40 nm.

[0044] The term "D10" refers to the pore size of substantially spherical pores in a pore size distribution or to the particle size of organic particles or low refractive index nanoparticles in a particle size distribution, wherein 10% of the substantially spherical pores in the pore size distribution have a smaller pore size and 90% of the substantially spherical pores in the pore size distribution have a larger pore size; or 10% of the organic particles or low refractive index nanoparticles in the particle size distribution have a smaller particle size and 90% of the organic particles or low refractive index nanoparticles in the particle size distribution have a larger particle size.

[0045] The term "D50" refers to the pore size of substantially spherical pores in a pore size distribution or to the particle size of organic particles or low refractive index nanoparticles in a particle size distribution, wherein 50% of the substantially spherical pores in the pore size distribution have a smaller pore size and 50% of the substantially spherical pores in the pore size distribution have a larger pore size; or 50% of the organic particles or low refractive index nanoparticles in the particle size distribution have a smaller particle size and 50% of the organic particles or low refractive index nanoparticles in the particle size distribution have a larger particle size. The term "D50" is also referred to as the median diameter.

[0046] The term "D90" refers to the pore size of substantially spherical pores in a pore size distribution or to the particle size of organic particles or low refractive index nanoparticles in a particle size distribution, wherein 90% of the substantially spherical pores in the pore size distribution have a smaller pore size and 10% of the substantially spherical pores in the pore size distribution have a larger pore size; or 90% of the organic particles or low refractive index nanoparticles in the particle size distribution have a smaller particle size and 10% of the organic particles or low refractive index nanoparticles in the particle size distribution have a larger particle size.

[0047] Examples of methods for measuring pore size distribution and pore diameter according to the present disclosure are gas adsorption, e.g. according to ISO 15901-2:2022, mercury porosimetry, e.g. according to ISO 15901-1:2016, the Brunauer, Emmett and Teller (BET) method, e.g. according to ISO 9277:2010, and electron microscopy analysis.

[0048] In some embodiments, the D10 pore size of the substantially spherical pores may be less than 100% of the thickness of the uppermost low refractive index nanoporous layer 130, in particular less than 80% of the thickness of the uppermost low refractive index nanoporous layer 130, and more particularly less than 60% of the thickness of the uppermost low refractive index nanoporous layer 130. In some embodiments, the D50 pore size of the substantially spherical pores may be less than 100% of the thickness of the uppermost low refractive index nanoporous layer 130, in particular less than 80% of the thickness of the uppermost low refractive index nanoporous layer 130, and more particularly less than 60% of the thickness of the uppermost low refractive index nanoporous layer 130. In some embodiments, the D90 pore size of the substantially spherical pores may be less than 100% of the thickness of the uppermost low refractive index nanoporous layer 130, in particular less than 80% of the thickness of the uppermost low refractive index nanoporous layer 130, and more particularly less than 60% of the thickness of the uppermost low refractive index nanoporous layer 130.

[0049] In some embodiments, the thickness of the uppermost low refractive index nanoporous layer 130 may be equal to or less than 180 nm, particularly equal to or less than 160 nm, and more particularly equal to or less than 140 nm; and / or the thickness of the uppermost low refractive index nanoporous layer 130 may be equal to or greater than 50 nm, particularly equal to or greater than 70 nm, and more particularly equal to or greater than 90 nm. In some embodiments, the thickness of the uppermost low refractive index nanoporous layer 130 may be 50 nm or more and 180 nm or less, particularly 70 nm or more and 160 nm or less, and more particularly 90 nm or more and 400 nm or less.

[0050] In some embodiments, the refractive index of the topmost low-refractive-index nanoporous layer 130 may be less than 1.4, particularly less than 1.35, and more particularly less than 1.3; and / or greater than 1.1, particularly greater than 1.15, and more particularly greater than 1.2. In some embodiments, the refractive index of the topmost low-refractive-index nanoporous layer 130 may be greater than 1.1 and less than 1.4, particularly greater than 1.15 and less than 1.35, and more particularly greater than 1.2 and less than 1.30.

[0051] In some embodiments, the topmost low refractive index nanoporous layer 130 may include oligomers and / or polymers derived from hydrolyzable organosilane compounds, such as hydrolyzable organosilane compounds having one or more fluorine-substituted alkyl groups, one or more alkyl groups, one or more alkoxy groups, one or more acetoxy groups, one or more oxime groups, one or more enoxy groups, one or more aminooxy groups, or any combination thereof.

[0052] Figure 2 A schematic cross-sectional view of an anti-reflective multilayer film 200 according to further embodiments described herein is shown. According to some embodiments that can be combined with other embodiments described herein, the anti-reflective multilayer film 200 includes a substrate 210, in particular a transparent substrate. In addition, the anti-reflective multilayer film 200 includes at least one high reflective layer 220, the at least one high reflective layer being above the substrate 210. In addition, the anti-reflective multilayer film 200 includes an uppermost low refractive index nanoporous layer 230, the uppermost low refractive index nanoporous layer being above the at least one high reflective layer 120. In addition, the anti-reflective multilayer film 200 may include an organic layer 215, the organic layer being above the substrate 210 and below the at least one high reflective layer 220. In addition, the refractive index of the at least one high reflective layer 220 is greater than 1.7. In addition, the refractive index of the uppermost low refractive index nanoporous layer 230 is less than 1.7.

[0053] In some embodiments, the organic layer 215 may have anti-glare and / or anti-scratch properties. In some embodiments, the organic layer 215 may be disposed or deposited directly on the substrate 210. In some embodiments, at least one high reflective layer 220 may be disposed or deposited directly on the organic layer 215. In some embodiments, there is no additional layer or film between the substrate 210 and the organic layer 215, between the organic layer 215 and the at least one high reflective layer 220, and / or between the at least one high reflective layer 220 and the uppermost low refractive index nanoporous layer 230.

[0054] In some embodiments, the thickness of the organic layer 215 may be equal to or less than 15 μm, in particular, equal to or less than 12 μm, and more particularly equal to or less than 9 μm. In some embodiments, the thickness of the organic layer 215 may be equal to or greater than 1 μm, in particular, equal to or greater than 4 μm, and more particularly equal to or greater than 7 μm. In some embodiments, the thickness of the organic layer 215 may be 1 μm or greater and 15 μm or less, in particular, 4 μm or greater and 12 μm or less, and more particularly, 7 μm or greater and 9 μm or less. In some embodiments, the organic layer 215 may have a sufficiently high degradation temperature to remain stable during subsequent processing, which may involve extreme temperatures.

[0055] In some embodiments, the organic layer material may include at least one cross-linkable polymer, in particular at least one cross-linkable polymer selected from the group consisting of polyacrylic resin, acrylic polyurethane resin, epoxy acrylic resin, melamine resin, amino resin, polyurethane resin, polyester resin, polysiloxane resin, and combinations thereof.

[0056] According to another embodiment, the organic layer material may include monomers, in particular monomers selected from the group consisting of polyurethane acrylate, isobornyl acrylate, dipentaerythritol pentaacrylate, epoxy acrylate blended with styrene, di-trimethylolpropane tetraacrylate, diethylene glycol diacrylate, 1,3-butanediol diacrylate, pentaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, ethoxylated (3) trimethylolpropane triacrylate, ethoxylated (3) trimethylolpropane triacrylate, alkoxylated trifunctional acrylate, dipropylene glycol diacrylate, neopentyl glycol diacrylate, ethoxylated (4) bisphenol A dimethacrylate, cyclohexanedimethanol diacrylate, isobornyl methacrylate, cyclic diacrylate and tris(2-hydroxyethyl)isocyanurate triacrylate, acrylates of the aforementioned methacrylates, and methacrylates of the aforementioned acrylates.

[0057] In some embodiments, the organic layer material may further include monomers, in particular monomers selected from the group consisting of vinyl ethers, vinyl naphthalene, acrylonitrile, and mixtures thereof, and / or acrylate oligomers. In some embodiments, the organic layer may include an organic layer material selected from the group consisting of poly(vinyl alcohol), poly(vinyl pyrrolidone), ethylene oxide polymers, polyurethanes, polyurethane acrylic copolymers, acrylic polymers, in particular UV cross-linked acrylic polymers, styrene acrylic copolymers, vinyl polymers, polyesters, silicone polymers, and combinations thereof.

[0058] In some embodiments, the organic layer 215 may include organic particles, in particular, protruding organic particles. The term “protruding particles” refers to organic particles partially protruding from the organic layer 215 in a direction away from the substrate 210 and the organic layer 215 .

[0059] In some embodiments, the D10 particle size of the organic particles, in particular the protruding organic particles, may be less than 100% of the thickness of the organic layer 215, in particular less than 80% of the thickness of the organic layer 215, and more particularly less than 60% of the thickness of the organic layer 215. In some embodiments, the D50 particle size of the organic particles, in particular the protruding organic particles, may be less than 100% of the thickness of the organic layer 215, in particular less than 80% of the thickness of the organic layer 215, and more particularly less than 60% of the thickness of the organic layer 215.

[0060] In some embodiments, the D90 particle size of the organic particles, particularly the protruding organic particles, may be less than 200%, particularly less than 150%, and more particularly less than 110% of the thickness of the organic layer 215 .

[0061] In some embodiments, organic particles, especially protruding organic particles, can be spherical. The term "spherical" in the present disclosure should be understood to include curved surfaces. In addition, the term "spherical" refers to the surface of organic particles, especially protruding organic particles, the surface of low-refractive index nanoparticles, or the surface of holes with curvature in any direction. Therefore, the term "spherical" can refer to spherical, oval, elliptical surfaces.

[0062] The term "spherical" in relation to organic particles, in particular protruding organic particles, low refractive index nanoparticles or pores does not mean that all organic particles, in particular protruding organic particles, all low refractive index nanoparticles or all pores are spherical. It means that most organic particles, in particular protruding organic particles, low refractive index nanoparticles or pores, for example more than 90%, preferably 95%, most preferably 99% of the organic particles, in particular protruding organic particles, low refractive index nanoparticles or pores are substantially spherical.

[0063] In particular, the term "spherical" refers to a completely round geometric surface. In addition, the term "substantially spherical" should be interpreted as the surface of organic particles, especially protruding organic particles, the surface of low-refractive index nanoparticles or the surface of holes having curvature in any direction, which has the technical tolerance of the method for manufacturing such organic particles, especially protruding organic particles, low-refractive index nanoparticles or holes.

[0064] According to some embodiments, the organic particles, in particular the protruding organic particles, may include a material selected from the group consisting of poly(methyl methacrylate), poly(butyl methacrylate), copolymers of methyl acrylate, copolymers of butyl methacrylate, and combinations thereof. In particular, the organic particles, in particular the protruding organic particles, may include a cross-linked material selected from the group consisting of cross-linked poly(methyl methacrylate), cross-linked poly(butyl methacrylate), cross-linked copolymers of methyl acrylate, cross-linked copolymers of butyl methacrylate, and combinations thereof.

[0065] Organic particles, especially protruding organic particles, can be produced by various procedures. For example, Makhlouf et al. proposed a method for producing cross-linked acrylic polymer microparticles (US 4,180,619A).

[0066] In some embodiments, the organic layer 215 may further include dispersed organic particles, such as dispersed organic particles completely surrounded by organic layer materials in the organic layer 215 ; and / or agglomerated organic particles, such as agglomerated organic particles completely surrounded by organic layer materials in the organic layer 215 .

[0067] The size (e.g., size) of the organic particles or low-refractive-index nanoparticles described herein can be determined by dynamic light scattering, disk centrifugation, particle tracking analysis, adjustable resistive pulse sensing, atomic force microscopy, and / or electron microscopy. Such methods for determining particle size distribution are known in the art. In particular, the size of the organic particles of the organic layer 215 or the size of the low-refractive-index nanoparticles can be determined by dynamic light scattering according to ISO 13320:2020, such as particle size analysis—laser diffraction methods. ISO 13320:2020 regards the particles as spherical, and therefore, the particle size is reported as a volume equivalent spherical diameter.

[0068] In some embodiments, the organic particles, in particular the protruding organic particles, may have a maximum D10 particle size of 5 μm, in particular a maximum D10 particle size of 4 μm, and more particularly a maximum D10 particle size of 2.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D10 particle size of 0.8 μm, in particular a minimum D10 particle size of 1 μm, and more particularly a minimum D10 particle size of 1.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D10 particle size of 0.8 μm and a maximum D10 particle size of 5 μm, in particular a minimum D10 particle size of 1 μm and a maximum D10 particle size of 4 μm, and more particularly a minimum D10 particle size of 1.5 μm and a maximum D10 particle size of 2.5 μm.

[0069] In some embodiments, the organic particles, in particular the protruding organic particles, may have a maximum D50 particle size of 5 μm, in particular a maximum D50 particle size of 4 μm, and more particularly a maximum D50 particle size of 2.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D50 particle size of 0.8 μm, in particular a minimum D50 particle size of 1 μm, and more particularly a minimum D50 particle size of 1.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D50 particle size of 0.8 μm and a maximum D50 particle size of 5 μm, in particular a minimum D50 particle size of 1 μm and a maximum D50 particle size of 4 μm, and more particularly a minimum D50 particle size of 1.5 μm and a maximum D50 particle size of 2.5 μm.

[0070] In some embodiments, the organic particles, in particular the protruding organic particles, may have a maximum D90 particle size of 5 μm, in particular a maximum D90 particle size of 4 μm, and more particularly a maximum D90 particle size of 2.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D90 particle size of 0.8 μm, in particular a minimum D90 particle size of 1 μm, and more particularly a minimum D90 particle size of 1.5 μm. In some embodiments, the organic particles, in particular the protruding organic particles, may have a minimum D90 particle size of 0.8 μm and a maximum D90 particle size of 5 μm, in particular a minimum D90 particle size of 1 μm and a maximum D90 particle size of 4 μm, and more particularly a minimum D90 particle size of 1.5 μm and a maximum D90 particle size of 2.5 μm.

[0071] The properties of organic particles described in the present disclosure, such as material or particle size, also refer to the properties of protruding organic particles, dispersed organic particles and / or agglomerated organic particles.

[0072] In some embodiments, the anti-reflective multilayer film 200 may further include a seed layer between the organic layer 215 and the at least one high reflective layer 220. Therefore, the seed layer may be deposited on the organic layer 215, for example, by chemical vapor deposition or physical vapor deposition (e.g., sputtering or evaporation). Some examples of materials for the seed layer may be SiOx, TiOx, NbOx, SiNx, and / or combinations thereof. In some embodiments, the thickness of the seed layer may be between 0 nm and 5 nm.

[0073] In some embodiments, the refractive index of the organic layer 215 and the refractive index of the organic particles, especially the protruding organic particles, may be substantially the same. Therefore, in particular when referring to the refractive index of the organic particles, especially the protruding organic particles, and the refractive index of the organic layer, the term "substantially" is understood to allow the difference between the refractive index of the organic particles, especially the protruding organic particles, and the refractive index of the organic layer to deviate by ±0.05 or less, and in particular ±0.02 or less.

[0074] Because the refractive indices of the organic layer 215 and the organic particles, particularly the protruding organic particles, are similar, it is observed that internal scattering of light is reduced at the interface between the organic particles, particularly the protruding organic particles, and the organic layer 215, and thus specular reflection is reduced.

[0075] The refractive index of particles (eg low-refractive-index nanoparticles or organic particles), layers or films can be determined as described, for example, in ISO 13320:2020, eg particle size analysis - laser diffraction method, or in ISO 489:1999, Plastics - Determination of refractive index.

[0076] In some embodiments, the surface of the substrate 210 on which the organic layer 215 is provided (e.g., coated or otherwise bonded) can be treated to improve adhesion. Useful surface treatments include discharge (e.g., plasma, glow discharge, corona discharge, dielectric barrier discharge, or atmospheric pressure discharge) in the presence of a suitable reactive or non-reactive atmosphere; chemical pretreatment; or flame pretreatment.

[0077] Figure 3 A schematic cross-sectional view of an anti-reflective multilayer film 300 according to another embodiment described herein is shown. According to some embodiments that can be combined with other embodiments described herein, the anti-reflective multilayer film 300 includes a substrate 310, in particular a transparent substrate. In addition, the anti-reflective multilayer film 300 includes at least one high reflective layer 320, at least one high reflective layer is above the substrate 310.

[0078] In addition, the anti-reflection multilayer film 300 includes an uppermost low-refractive-index nanoporous layer 330, which is above the at least one high-reflection layer 320. In addition, the anti-reflection multilayer film 300 may include an organic layer 315, which is above the substrate 310 and below the at least one high-reflection layer 320. In addition, the refractive index of the at least one high-reflection layer 320 is greater than 1.7. In addition, the refractive index of the uppermost low-refractive-index nanoporous layer 330 is less than 1.7.

[0079] In some embodiments, at least one highly reflective layer 320 may be a layer stack. In some embodiments, the layer stack may be a highly reflective layer stack. According to some embodiments, the layer stack of this embodiment may include a plurality of layers formed by overlapping each other (e.g., by deposition). In some embodiments, the layer stack may be directly disposed or deposited on the organic layer 315. In some embodiments, the layers of the layer stack may be directly disposed or deposited on each other.

[0080] In some embodiments, the thickness of at least one of the layers of a single highly reflective layer, such as the at least one highly reflective layer 120 or 220, or a layer stack, such as the at least one highly reflective layer 320, may be greater than 5 nm, in particular greater than 20 nm, and more in particular greater than 30 nm. In some embodiments, the thickness of at least one of the layers of a single highly reflective layer, such as the at least one highly reflective layer 120 or 220, or a layer stack, such as the at least one highly reflective layer 320, may be less than 120 nm, in particular less than 100 nm, and more in particular less than 80 nm.

[0081] In some embodiments, a single highly reflective layer, for example the at least one highly reflective layer 120 or 220, or at least one of the layers of the layer stack, for example the at least one highly reflective layer 320, may have a thickness in the range of 5 nm to 120 nm, in particular in the range of 20 nm to 100 nm, and more particularly in the range of 30 nm to 80 nm. The thickness and / or optical properties of the individual layers of the layer stack may be different.

[0082] According to some embodiments, which can be combined with other embodiments described herein, the thickness of the layer stack of, for example, the at least one highly reflective layer 320, can be greater than 20 nm, in particular greater than 40 nm, and more particularly greater than 60 nm. In some embodiments, for example, the thickness of the layer stack of the at least one highly reflective layer 320 can be less than 160 nm, in particular less than 140 nm, and more particularly less than 120 nm. In some embodiments, for example, the thickness of the layer stack of the at least one highly reflective layer 320 can be 20 nm or more and 160 nm or less, in particular 40 nm or more and 140 nm or less, and more particularly 60 nm or more and 120 nm or less.

[0083] The layer stack of the present disclosure may include alternating layers, in particular alternating layers of different materials. The layers of the layer stack may include a medium refractive index material (e.g., a refractive index between 1.7 and 1.9) and a high refractive index material (e.g., a refractive index of at least 1.9); or a low refractive index material (e.g., a refractive index less than 1.7) and a high refractive index material (e.g., a refractive index of at least 1.9) in an alternating manner.

[0084] According to some embodiments, the layer stack may include two layers. Thus, the layer stack may include a first layer 321 and a second layer 322 arranged in sequence.

[0085] refer to Figure 3, the refractive index of the first layer 321 may be between 1.7 and 1.9, and the refractive index of the second layer 322 may be at least 1.9, in particular 2. In some embodiments, the first layer 321 of the layer stack may include at least one of the following: SiNx, SiN, SiOxNy, AlxOy, AlOxNy, an organic material such as a polymer material, and / or a combination thereof. In some embodiments, the second layer 322 of the layer stack may include at least one of the following: TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof. As an example, the layer stack may include two layers of SiNx / TiOx in the following order.

[0086] Figure 4 A schematic cross-sectional view of an anti-reflective multilayer film 400 according to further embodiments described herein is shown. According to some embodiments that can be combined with other embodiments described herein, the anti-reflective multilayer film 400 includes a substrate 410, in particular a transparent substrate. In addition, the anti-reflective multilayer film 400 includes at least one high reflective layer 420, the at least one high reflective layer being above the substrate 410. In addition, the anti-reflective multilayer film 300 includes an uppermost low refractive index nanoporous layer 430, the uppermost low refractive index nanoporous layer being above the at least one high reflective layer 420. In addition, the anti-reflective multilayer film 400 may include an organic layer 415, the organic layer being above the substrate 410 and below the at least one high reflective layer 420. In addition, the refractive index of the at least one high reflective layer 420 is greater than 1.7. In addition, the refractive index of the uppermost low refractive index nanoporous layer 430 is less than 1.7.

[0087] According to some embodiments, which can be combined with other embodiments described herein, at least one highly reflective layer 420 can be a layer stack. The layer stack can include three layers. Thus, the layer stack can include a first layer 421, a second layer 422, and a third layer 423 arranged in sequence. In some embodiments, the refractive index of the first layer 421 and the third layer 423 can be at least 1.9, particularly about 2. In some embodiments, the refractive index of the second layer 422 can be less than 1.7, particularly less than 1.5, and more particularly 1.46.

[0088] In some embodiments, the first layer 421 of the layer stack may include at least one of the following: TiOx, NbOx, TaOx, ZrOx, organic materials such as polymer materials, and / or combinations thereof. In some embodiments, the second layer 422 of the layer stack may include at least one of the following: SiOx, MgFx, SiOxNy, organic materials such as polymer materials, and / or combinations thereof.

[0089] In some embodiments, the third layer 423 of the layer stack may include at least one of the following: TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof. As an example, the first layer 421 may include or be made of TiOX, the second layer 422 may include or be made of SiOx, and the third layer 423 may include or be made of NbOx. As another example, the layer stack may include three layers of NbOx / SiOx / TiOx in the following order.

[0090] According to some embodiments, which can be combined with other embodiments described herein, the layer stack can include further layers above the third layer, in particular a fourth layer and a fifth layer, or a fourth layer, a fifth layer, a sixth layer and a seventh layer, such as Figure 5 and Figure 6 A layer stack with five layers may be referred to as NONON, and a layer stack with seven layers may be referred to as NONONON.

[0091] Symbols N and O may represent materials of layers of a layer stack. In some embodiments, symbol N represents a material or layer having a high refractive index (e.g., TiOx), and symbol O represents a material or layer having a low refractive index (e.g., SiOx). The low refractive index may be in the range of 1.4 to 1.6, in particular about n=1.46. However, it should be understood that the present disclosure is not limited to TiOx and SiOx, and any suitable material having a high refractive index of at least 1.9 and a low refractive index of less than 1.7 may be used for the layer having a high refractive index and the layer having a low refractive index, respectively.

[0092] In some embodiments, the extinction coefficient of a material having a high refractive index and a low refractive index can be small. The refractive index and the extinction coefficient are the real and imaginary parts of the complex refractive index, respectively. In particular, as light passes through a medium, some portion of the light will be absorbed. This effect can be described by defining the complex refractive index as equal to n+ik. The real part "n" represents the phase velocity, while the imaginary part "ik" represents the amount of absorption loss when an electromagnetic wave propagates through a material.

[0093] exist Figure 5 , an anti-reflective multilayer film 500 according to another embodiment of the present disclosure is depicted. Figure 5 The anti-reflection multilayer film 500 is similar to Figure 4 The anti-reflection multilayer film 400 is different in that the layer stack of at least one high-reflection layer 520 includes additional layers, and the corresponding layer stack can be referred to as NONON.

[0094] For example, the anti-reflection multilayer film 500 includes a substrate 510, in particular a transparent substrate. In addition, the anti-reflection multilayer film 500 includes at least one high reflective layer 520, and the at least one high reflective layer is above the substrate 510. In addition, the anti-reflection multilayer film 300 includes an uppermost low-refractive index nanoporous layer 430, and the uppermost low-refractive index nanoporous layer is above the at least one high reflective layer 420. In addition, the refractive index of the at least one high reflective layer 520 is greater than 1.7. In addition, the refractive index of the uppermost low-refractive index nanoporous layer 530 is less than 1.7. In addition, the anti-reflection multilayer film 500 may include an organic layer 515, which is above the substrate 510 and below the at least one high reflective layer 520. The layer stack of the at least one high reflective layer 520 of the anti-reflection multilayer film 500 can be referred to as NONON.

[0095] refer to Figure 5 , the layer stack may include a first layer 521, a second layer 522, a third layer 523, a fourth layer 524, and a fifth layer 525 arranged in order. The refractive index of the first layer 521, the third layer 523, and the fifth layer 525 may be at least 1.9, and the refractive index of the second layer 522 and the fourth layer 524 may be less than 1.7.

[0096] For example, the first layer 521, the third layer 523, and the fifth layer 525 may include TiOx or be made of TiOx, and the second layer 522 and the fourth layer 524 may include SiO 2 Or by SiO 2 Made.

[0097] exist Figure 6 , an anti-reflective multilayer film 600 according to another embodiment of the present disclosure is depicted. Figure 6 The anti-reflection multilayer film 600 is similar to Figure 4 The anti-reflection multilayer film 400 is different in that the layer stack of at least one high-reflection layer 620 includes additional layers, and the corresponding layer stack can be referred to as NONONON.

[0098] For example, the anti-reflection multilayer film 600 includes a substrate 610, in particular a transparent substrate. In addition, the anti-reflection multilayer film 600 includes at least one high-reflection layer 620, and the at least one high-reflection layer is above the substrate 610. In addition, the anti-reflection multilayer film 600 includes an uppermost low-refractive-index nanoporous layer 630, and the uppermost low-refractive-index nanoporous layer is above the at least one high-reflection layer 620. In addition, the refractive index of the at least one high-reflection layer 620 is greater than 1.7. In addition, the refractive index of the uppermost low-refractive-index nanoporous layer 630 is less than 1.7.

[0099] In addition, the anti-reflective multilayer film 600 may include an organic layer 615 over the substrate 610 and under the at least one high reflective layer 620. The layer stack of the at least one high reflective layer 620 of the anti-reflective multilayer film 600 may be referred to as NONONON.

[0100] refer to Figure 6 , the layer stack may include a first layer 621, a second layer 622, a third layer 623, a fourth layer 624, a fifth layer 625, a sixth layer 626, and a seventh layer 627 arranged in order. The refractive index of the first layer 621, the third layer 623, the fifth layer 625, and the seventh layer 627 may be at least 1.9, and the refractive index of the second layer 622, the fourth layer 624, and the sixth layer 626 may be less than 1.7.

[0101] As an example, the first layer 621, the third layer 623, the fifth layer 625, and the seventh layer 627 may include TiOx or be made of TiOx, and the second layer 622, the fourth layer 624, and the sixth layer 626 may include SiO 2 Or by SiO 2 Made.

[0102] According to some embodiments that can be combined with other embodiments described herein, the refractive index of the even layers of the layer stack can be less than 1.7, in particular less than 1.5, and more particularly 1.46. In some embodiments, the refractive index of the odd layers of the layer stack can be at least 1.9, in particular 2.0. The terms "odd" and "even" used throughout this application refer to mathematical parity, i.e., if an integer is divisible by 2, then it is an even number; and if the integer is not an even number, then it is an odd number. As an example, the odd layers of the layer stack can be the first layer, the third layer, the fifth layer, etc., and the even layers of the layer stack can be the second layer, the fourth layer, the sixth layer, etc. Therefore, this numbering does not include any other layers that can be provided in addition, such as seed layers, hard coatings, adhesion layers, etc.

[0103] As an example, the refractive index of the odd-numbered layers of the layer stack of the at least one highly reflective layer 320, 420, 520 or 620 may be at least about 1.9, in particular about 2. The refractive index of the even-numbered layers of the layer stack of the at least one highly reflective layer 320, 420, 520 or 620 may be less than 1.7, in particular less than 1.5, and more particularly about 1.46.

[0104] According to some embodiments, the odd-numbered layers of the layer stack of at least one high reflective layer 520 or 620 include at least one of the following items: TiOx, NbOx, TaOx, ZrOx, organic materials such as polymer materials, and / or combinations thereof; and / or the even-numbered layers of the layer stack of at least one high reflective layer 520 or 620 include at least one of the following items: SiOx, MgFx, SiOxNy, organic materials such as polymer materials, and / or combinations thereof.

[0105] By successively providing layers with alternating or different refractive indices, a layer stack of at least one highly reflective layer 320, 420, 520 or 620 may be provided with improved anti-reflection properties.

[0106] According to some embodiments that can be combined with other embodiments described herein, at least one layer of a layer stack (e.g., an even-numbered layer) of the at least one high reflective layer 320, 420, 520, or 620 can be provided by depositing at least one high reflective layer material, the at least one high reflective layer material containing SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and / or a combination thereof, etc. As another example, at least one layer of a layer stack (e.g., an odd-numbered layer) of the at least one high reflective layer 320, 420, 520, or 620 can be provided by depositing at least one high reflective layer material, the at least one high reflective layer material containing TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof, etc.

[0107] As an example, a single highly reflective layer having a refractive index of at least 1.9 may be provided by depositing a layer material containing TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof. As another example, a single highly reflective layer having a refractive index between 1.7 and 1.9 may be provided by depositing a layer material containing SiNx, SiN, SiOxNy, AlxOy, AlOxNy, an organic material such as a polymer material, and / or a combination thereof.

[0108] According to some implementations, the layers of the layer stack may be manufactured by chemical vapor deposition or physical vapor deposition, such as sputtering or evaporation.

[0109] According to some embodiments that may be combined with other embodiments herein, the thickness of each of the odd-numbered layers of the layer stack of at least one high reflective layer 320, 420, 520, or 620 may be less than the thickness of each of the even-numbered layers of the layer stack of at least one high reflective layer 320, 420, 520, or 620.

[0110] In some embodiments, there are no additional layers or films between the layers of the layer stack.In some other embodiments, additional layers may be provided between at least some of the layers of the layer stack of at least one highly reflective layer 320, 420, 520 or 620.

[0111] Methods for depositing layer materials, for example, on substrates or organic layers may include physical vapor deposition (PVD) processes, chemical vapor deposition (CVD) processes, plasma enhanced chemical vapor deposition (PECVD) processes, etc. As an example, the process is carried out in a processing device or a processing chamber, in which the substrate, in particular the substrate including the organic layer above the substrate to be coated, is located. The deposition material is provided in the device. A variety of materials, such as their oxides, nitrides or carbides can be used for deposition. In addition, other processes such as etching, structuring, annealing, etc. can be carried out in the processing chamber.

[0112] Figure 7 A schematic diagram of an apparatus 700 (eg, a roll-to-roll deposition apparatus) for depositing layer materials to form layers of a layer stack of at least one highly reflective layer of an anti-reflective multilayer film according to embodiments described herein is shown.

[0113] The device 700 may include at least three chamber parts 702A, 702B and 702C. At the chamber part 702C, one or more deposition sources 730 and an optional etching station 740 may be provided as processing tools. A substrate 741, in particular a substrate including an organic layer, is arranged on a first roller 764, for example, having a reel. As shown in the direction of substrate movement indicated by arrow 708, the substrate 741 is unrolled from the first roller 764. A separation wall 701 is provided for separating the chamber parts 702A and 702B. The separation wall 701 may also be provided with a gap gate 745 to allow the substrate 741 to pass therethrough. A vacuum flange 712 arranged between the chamber parts 702B and 702C may be provided with an opening to accommodate at least some of the processing tools.

[0114] The substrate 741 moves through a deposition area that is arranged at the coating drum 710 and corresponds to the position of the deposition source 730. During operation, the coating drum 710 rotates about an axis so that the substrate 741, in particular a substrate including an organic layer, moves in the direction of arrow 708. According to some embodiments, the substrate 741 layer is guided from a roller 764 to the coating drum 710 via one, two or more rollers, and from the coating drum 710 to a second roller 764', for example with a reel, on which the substrate 741, in particular a substrate including an organic layer, is wound after its processing.

[0115] According to some embodiments, the deposition source 730 may be configured to deposit at least one highly reflective layer of the anti-reflective multilayer film as described in the embodiments of the present disclosure. For example, at least one deposition source 730 may be suitable for depositing a layer material having a refractive index of at least 1.9, and at least one of the remaining deposition sources 730 may be suitable for depositing a layer material having a refractive index of less than 1.7.

[0116] For example, a first deposition source may be configured to deposit a first layer, a second deposition source may be configured to deposit a second layer, and a third deposition source may be configured to deposit a third layer.

[0117] In some implementations, the first chamber portion 702A is separated into a sandwich chamber portion unit 702A1 and a substrate chamber portion unit 702A2. In addition, the sandwich rollers 766 / 766' and the sandwich rollers 705 can be arranged as modular sections of the apparatus 700. The apparatus 700 can also include a preheating unit 794 to heat the substrate. Furthermore, additionally or alternatively, a pretreatment plasma source 792, such as an RF (radio frequency) plasma source, can be provided to treat the substrate, in particular the substrate including the organic layer, with plasma before entering the chamber portion 702C.

[0118] According to further embodiments, which can be combined with other embodiments described herein, an optical measurement unit 794 for evaluating the result of substrate processing and / or one or more ionization units 792 for adapting the charge on the substrate, in particular a substrate comprising an organic layer, may optionally also be provided.

[0119] According to some embodiments, the layer material may be selected according to the deposition process and the subsequent application of the coated substrate. For example, the layer material of the deposition source 730 may be silicon. For example, oxide layers, nitride layers, or carbide layers that may include such materials may be deposited by providing the layer material from the source or by reactive deposition, i.e., the layer material from the source reacts with a chemical (e.g., oxygen, nitride, or carbon) from a process gas.

[0120] According to one aspect of the present disclosure and as Figure 8 As shown, a method 800 for manufacturing an anti-reflection multilayer film is provided. The method 800 includes providing a substrate (step 810). The method further includes depositing at least one high-reflection layer material on the substrate, in particular on an organic layer on the substrate to form at least one high-reflection layer (step 820). In addition, the method includes depositing (e.g., coating or applying) a low-refractive index layer material including low-refractive index nanoparticles on at least one high-reflection layer to form an uppermost low-refractive index nanoporous layer (step 830). In addition, the refractive index of at least one high-reflection layer is greater than 1.7. In addition, the refractive index of the uppermost low-refractive index nanoporous layer is less than 1.7.

[0121] In some embodiments, depositing at least one high reflective layer material on a substrate, in particular on an organic layer on the substrate, to form at least one high reflective layer may include alternately depositing at least a first layer material and a second layer material on the substrate, in particular on an organic layer on the substrate, to form at least one high reflective layer as a layer stack, in particular forming at least a first layer, a second layer, and a third layer, more particularly forming at least a first layer, a second layer, a third layer, a fourth layer, and a fifth layer, and even more particularly forming at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, and a seventh layer arranged in sequence.

[0122] In some embodiments, depositing at least one high reflective layer material on a substrate, in particular on an organic layer on the substrate, to form at least one high reflective layer may include depositing a first layer material and a second layer material on the substrate, in particular on an organic layer on the substrate, to form a layer stack, in particular to form a first layer and a second layer arranged in sequence.

[0123] In some embodiments, depositing at least one high reflective layer material on a substrate, in particular on an organic layer on the substrate, to form at least one high reflective layer may include depositing a single high reflective layer material on the substrate, in particular on an organic layer on the substrate, to form a single high reflective layer having a refractive index of at least 1.9 or a refractive index between 1.7 and 1.9.

[0124] In some embodiments, the single high reflective layer material may include at least one of the following: TiOx, NbOx, TaOx, ZrOx, organic materials such as polymer materials, and / or combinations thereof. In some embodiments, the single high reflective layer material may include at least one of the following: SiNx, SiN, SiOxNy, AlxOy, AlOxNy, organic materials such as polymer materials, and / or combinations thereof.

[0125] In some embodiments, alternately depositing at least a first layer of material and a second layer of material on a substrate may include alternately depositing a first layer of material and a second layer of material, wherein the first layer of material includes at least one of the following items: TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material, and / or a combination thereof, and the second layer of material includes SiOx, MgFx, SiOxNy, an organic material such as a polymer material, and / or a combination thereof.

[0126] In some embodiments, depositing a first layer material and a second layer material on a substrate, in particular on an organic layer on the substrate to form a layer stack, in particular to form a first layer and a second layer arranged in sequence may include depositing a first layer material and a second layer material, the first layer material including at least one of the following items: TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material and / or a combination thereof, and the second layer material including SiOx, MgFx, SiOxNy, an organic material such as a polymer material and / or a combination thereof.

[0127] In some embodiments, depositing a first layer material and a second layer material on a substrate, in particular on an organic layer on the substrate to form a layer stack, in particular to form a first layer and a second layer arranged in sequence may include depositing a first layer material and a second layer material, the first layer material including at least one of the following items: SiNx, SiN, SiOxNy, AlxOy, AlOxNy, an organic material such as a polymer material and / or a combination thereof, and the second layer material including at least one of the following items: TiOx, NbOx, TaOx, ZrOx, an organic material such as a polymer material and / or a combination thereof.

[0128] According to some embodiments and with reference to the layer stack, a first layer of material may be deposited, for example, on a substrate, in particular an organic layer on a substrate. Then, a second layer of material may be deposited on or above the first layer. Thereafter, a third layer of material may be deposited on or above the second layer. Thereafter, a fourth layer of material may be deposited on or above the third layer. In some embodiments, a fifth layer of material may be deposited on or above the fourth layer. In some embodiments, a sixth layer of material may be deposited on or above the fifth layer. In addition, a seventh layer of material may be deposited on or above the sixth layer. Therefore, as described above with respect to the embodiments of the present disclosure, the first layer of material, the second layer of material, the third layer of material, etc. correspond to the first layer, the second layer, the third layer, etc., respectively.

[0129] Despite Figures 3 to 6 In these examples, two, three, five, or seven layers corresponding to the layer stack are arranged on top of each other, but the present embodiment is not limited thereto. For example, as described above, any number of layers may be arranged. In some embodiments, at least one highly reflective layer or layer stack may be treated with a PFPE silane solution to provide an anti-fouling effect.

[0130] According to another embodiment, the at least one high reflective layer material may be deposited on the substrate, in particular on an organic layer on the substrate, to form the at least one high reflective layer by physical vapor deposition or chemical vapor deposition (eg sputtering or evaporation).

[0131] In some embodiments, providing a substrate may include depositing (e.g., coating or applying) an organic layer material on the substrate to form an organic layer. In some embodiments, the organic layer material may include organic particles. In some embodiments, the term "organic layer material" may refer to a material composition provided (e.g., coated or applied) on a substrate, particularly on a substrate surface, and includes an organic layer material and organic particles, and forms an organic layer including organic particles, particularly protruding organic particles.

[0132] The term "low refractive index layer material" may refer to a material composition that forms a low refractive index nanoporous layer. In addition, in some embodiments, the term "low refractive index layer material" may refer to a material composition that is provided (e.g., coated or applied) on at least one high reflective layer and forms a low refractive index nanoporous layer.

[0133] In some embodiments, the low refractive index nanoparticles may have a maximum D10 particle size of 100 nm, particularly a maximum D10 particle size of 80 nm, and more particularly a maximum D10 particle size of 60 nm; and / or the low refractive index nanoparticles may have a minimum D10 particle size of 30 nm, particularly a minimum D10 particle size of 35 nm, and more particularly a minimum D10 particle size of 40 nm.

[0134] In some embodiments, the low refractive index nanoparticles may have a maximum D50 particle size of 100 nm, particularly a maximum D50 particle size of 80 nm, and more particularly a maximum D50 particle size of 60 nm; and / or the low refractive index nanoparticles may have a minimum D50 particle size of 30 nm, particularly a minimum D50 particle size of 35 nm, and more particularly a minimum D50 particle size of 40 nm.

[0135] In some embodiments, the low refractive index nanoparticles may have a maximum D90 particle size of 100 nm, particularly a maximum D90 particle size of 80 nm, and more particularly a maximum D90 particle size of 60 nm; and / or the low refractive index nanoparticles may have a minimum D90 particle size of 30 nm, particularly a minimum D90 particle size of 35 nm, and more particularly a minimum D90 particle size of 40 nm.

[0136] In some embodiments, low-refractive index nanoparticles may include SiOx. In some embodiments, low-refractive index nanoparticles may have a hollow structure. Because the composition of low-refractive index nanoparticles is similar to the composition of low-refractive index layer material, when forming the topmost low-refractive index nanoporous layer, low-refractive index nanoparticles are fully introduced into the low-refractive index layer material, while keeping the corresponding hollow structure of low-refractive index nanoparticles, and therefore, only the resulting nanostructure can be observed in the topmost low-refractive index nanoporous layer, and there is no difference between low-refractive index nanoparticles (particularly the shell of low-refractive index nanoparticles) and the low-refractive index layer material. In some embodiments, the refractive index of low-refractive index nanoparticles can be 1.17 to 1.40, particularly 1.17 to 1.35, and more particularly 1.17 to 1.40.

[0137] In some embodiments, the low refractive index layer material may include monomers and / or oligomers, which include hydrolyzable organosilane compounds, such as hydrolyzable organosilane compounds having one or more fluorine-substituted alkyl groups, one or more alkyl groups, one or more alkoxy groups, one or more acetoxy groups, one or more oxime groups, one or more alkenyloxy groups, one or more aminooxy groups, or any combination thereof.

[0138] According to some embodiments, the material composition of the low refractive index layer material can be 10wt% to 75wt% of low refractive index nanoparticles and the remainder of the low refractive index layer material, particularly 25wt% to 65wt% of low refractive index nanoparticles and the remainder of the low refractive index layer material, and more particularly 40wt% to 50wt% of low refractive index nanoparticles and the remainder of the low refractive index layer material.

[0139] In some embodiments, depositing (e.g., coating or applying) a low refractive index layer material including low refractive index nanoparticles on at least one high reflective layer to form the topmost low refractive index nanoporous layer may include mixing the low refractive index layer material, the low refractive index nanoparticles, and optionally at least one organic solvent. In some embodiments, depositing (e.g., coating or applying) a low refractive index layer material including low refractive index nanoparticles on at least one high reflective layer to form the topmost low refractive index nanoporous layer may include, for example, curing or cross-linking by heating.

[0140] According to some embodiments, depositing (e.g., coating or applying) an organic layer material on a substrate to form an organic layer may include mixing the organic layer material with at least one organic solvent and optional organic particles. In some embodiments, depositing (e.g., coating or applying) an organic layer material on a substrate to form an organic layer may include, for example, removing at least one organic solvent from the organic layer material by using heating and / or vacuum. In some embodiments, depositing (e.g., coating or applying) an organic layer material on a substrate to form an organic layer may include, for example, curing or crosslinking by heating and / or using an electron beam device, a UV light source, a discharge device, or another suitable device.

[0141] According to some embodiments, organic layer material or low refractive index layer material can be deposited (e.g., coated or applied) by using any suitable technique. For example, organic layer material or low refractive index layer material can be deposited by using a coating method, and in particular by a solution coating method particularly selected from the group consisting of the following items: gravure coating, flow coating, curtain coating, immersion coating, spray coating, and a combination thereof. In some embodiments, the low refractive index layer material including low refractive index nanoparticles can be deposited (e.g., coated or applied) on at least one high reflective layer to form the topmost low refractive index nanoporous layer by a wet coating process.

[0142] According to further embodiments, the organic layer material or the low refractive index layer material may additionally include at least one additive such as a cross-linking agent and a catalyst, for example a photoinitiator.

[0143] In some embodiments, after using conventional techniques to remove solvent, cross-linking can be performed, for example, using an electron beam device, a UV light source, a discharge device or another suitable device. In some embodiments, as an additional or alternative to heating, the organic layer material or the low refractive index layer material can also be cured or cross-linked by being exposed to light (for example, DUV, i line, g line and / or broadband). The conditions for forming an organic layer or a low refractive index nanoporous layer can depend on the specific organic layer material or the low refractive index layer material used, and a dry, cured and / or cross-linked organic layer or a dry, cured and / or cross-linked low refractive index nanoporous layer can be produced.

[0144] According to some embodiments, the material composition of the organic layer material may be 5wt% to 30wt% of organic particles and the balance of organic layer material, in particular 8wt% to 25wt% of organic particles and the balance of organic layer material, and more in particular 10wt% to 20wt% of organic particles and the balance of organic layer material. In some embodiments, the material composition of the organic layer material may be 2.5wt% to 15wt% of organic particles, 35wt% to 48wt% of organic layer material and the balance of at least one organic solvent, in particular 4wt% to 12.5wt% of organic particles, 37wt% to 46wt% of organic layer material and the balance of at least one organic solvent, and more in particular 5wt% to 10wt% of organic particles, 39wt% to 44wt% of organic layer material and the balance of at least one organic solvent. In some embodiments, each m provided on the substrate 2 The mass of the organic layer material of the substrate may be 2 g to 15 g, specifically 4 g to 13 g, and more specifically 6 g to 11 g.

[0145] Fig. 9 A graph of reflectance of comparable films with multiple anti-reflective layers and anti-reflective multilayer films according to embodiments described herein is shown. As used herein, the term "reflectance" is the fraction of incident electromagnetic power that is reflected. The term "reflectance" may be used synonymously with the term "reflectivity".

[0146] exist Fig. 9 In the graph, the y-axis represents the reflectance in % (percent), and the x-axis represents the wavelength λ (lambda) in nanometers (nm). Reference numeral 910 represents the reflectance of a comparable polyethylene terephthalate film having multiple anti-reflection layers (SiNx with a thickness of 71 nm, TiOx with a thickness of 50 nm, and SiOx with a thickness of 86 nm) deposited by physical vapor deposition, wherein the reflectance is less than 20% in the range of about 360 nm to about 710 nm. Reference numerals 920a and 920b represent the reflectance of an anti-reflection multilayer film at two different measurement points according to an embodiment described herein, the anti-reflection multilayer film having a polyethylene terephthalate substrate, a layer including SiNx with a thickness of 120 nm on the substrate and deposited by physical vapor deposition, and an uppermost low refractive index nanoporous layer, wherein the reflectance at the two different measurement points is less than 6% in the range of about 360 nm to about 710 nm. As Fig. 9 As shown, lower reflectances can be achieved with antireflective multilayer films according to embodiments described in the present disclosure, at least for some regions of the visible spectrum.

[0147] While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof, and the scope of the same is determined by the claims that follow.

Claims

1. An anti-reflective multilayer film comprising: substrate; at least one highly reflective layer, the at least one highly reflective layer being above the substrate; and an uppermost low refractive index nanoporous layer, the uppermost low refractive index nanoporous layer being above the at least one highly reflective layer, The at least one high reflective layer has a refractive index greater than 1.7, and the uppermost low refractive index nanoporous layer has a refractive index less than 1.

7.

2. The antireflective multilayer film according to claim 1 , wherein the uppermost low refractive index nanoporous layer comprises substantially spherical pores, and the substantially spherical pores have a maximum D50 pore size of 100 nm, in particular a maximum D50 pore size of 80 nm, and more in particular a maximum D50 pore size of 60 nm; and / or the substantially spherical pores have a minimum D50 pore size of 30 nm, in particular a minimum D50 pore size of 35 nm, and more in particular a minimum D50 pore size of 40 nm.

3. The antireflection multilayer film according to any one of claims 1 or 2, wherein the refractive index of the topmost low-refractive-index nanoporous layer is less than 1.4, particularly less than 1.35, and more particularly less than 1.3; and / or greater than 1.1, particularly greater than 1.15, and more particularly greater than 1.

2.

4. The antireflection multilayer film according to any one of the preceding claims, wherein the thickness of the topmost low refractive index nanoporous layer is equal to or less than 180 nm, particularly equal to or less than 160 nm, and more particularly equal to or less than 140 nm; and / or the thickness of the topmost low refractive index nanoporous layer is equal to or greater than 50 nm, particularly equal to or greater than 70 nm, and more particularly equal to or greater than 90 nm.

5. The antireflective multilayer film according to any one of the preceding claims, wherein the at least one highly reflective layer is a single highly reflective layer having a refractive index of at least 1.9 or a single highly reflective layer having a refractive index between 1.7 and 1.

9.

6. The antireflective multilayer film according to any one of claims 1 to 4, wherein the at least one highly reflective layer is a layer stack comprising: The first and second layers are arranged in order, wherein the refractive index of the first layer is between 1.7 and 1.9; and Wherein the refractive index of the second layer is at least 1.

9.

7. The antireflective multilayer film according to any one of claims 1 to 4, wherein the at least one highly reflective layer is a layer stack comprising: The first, second and third floors are arranged in order. wherein the refractive index of the first layer and the third layer is at least 1.9, and The refractive index of the second layer is less than 1.

7.

8. The antireflective multilayer film according to claim 7, wherein the layer stack further comprises additional layers above the third layer, in particular a fourth layer and a fifth layer, or a fourth layer, a fifth layer, a sixth layer and a seventh layer.

9. The antireflective multilayer film according to any one of claims 7 or 8, wherein the refractive index of the odd-numbered layers of the layer stack is at least 1.9, in particular 2.

0.

10. The antireflective multilayer film according to any one of claims 7 to 9, wherein the refractive index of the even-numbered layers of the layer stack is less than 1.7, in particular less than 1.5, and more particularly 1.

46.

11. The anti-reflective multilayer film according to any one of claims 6 to 10, wherein the thickness of the layer stack is less than 160 nm, in particular less than 140 nm, and more particularly less than 120 nm; and / or the thickness of the layer stack is greater than 20 nm, in particular greater than 40 nm, and more particularly greater than 60 nm.

12. The antireflective multilayer film according to any one of the preceding claims, wherein the antireflective multilayer film further comprises an organic layer, the organic layer being above the substrate and below the at least one highly reflective layer, and the organic layer comprising an organic layer material selected from the group consisting of poly(vinyl alcohol), poly(vinyl pyrrolidone), ethylene oxide polymers, polyurethanes, polyurethane acrylic copolymers, acrylic polymers, in particular UV cross-linked acrylic polymers, styrene acrylic copolymers, vinyl polymers, polyesters, silicone polymers, and combinations thereof.

13. A method for producing an anti-reflective multilayer film, comprising: providing a substrate; depositing at least one highly reflective layer material on the substrate to form at least one highly reflective layer; as well as A low refractive index layer material including low refractive index nanoparticles is deposited on the at least one high reflective layer to form an uppermost low refractive index nanoporous layer, wherein the at least one high reflective layer has a refractive index greater than 1.7 and the uppermost low refractive index nanoporous layer has a refractive index less than 1.

7.

14. The method for producing an anti-reflective multilayer film according to claim 13, wherein the low-refractive-index nanoparticles have a maximum D50 particle size of 100 nm, particularly a maximum D50 particle size of 80 nm, and more particularly a maximum D50 particle size of 60 nm; and / or the low-refractive-index nanoparticles have a minimum D50 particle size of 30 nm, particularly a minimum D50 particle size of 35 nm, and more particularly a minimum D50 particle size of 40 nm.

15. The method for manufacturing an anti-reflective multilayer film according to claim 14, wherein at least one high-reflective layer material is deposited on the substrate to form at least one high-reflective layer by physical vapor deposition or chemical vapor deposition; and a low-refractive index layer material including low-refractive index nanoparticles is deposited on the at least one high-reflective layer by a wet coating process.

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