Plasma source resonant cavity adjusting method and device and resonant cavity

Abstract

The invention provides a plasma source resonant cavity adjusting method and device and a resonant cavity, and relates to the technical field of resonant cavities, and the technical scheme is characterized in that shape information and depth information of an adjusting column in the plasma source resonant cavity are acquired; according to the task type, adjusting the shape information and the depth information of the adjusting column to obtain corresponding reflection power data under different shape information and depth information; acquiring corresponding shape information and depth information when the reflection power is minimum or smaller than a target value; generating an associated data set according to the shape information and the depth information corresponding to the reflection power when the minimum value is or is less than the target value and the task type; and when it is detected that the new task type has the corresponding associated data set, adjusting an adjusting column in the plasma source resonant cavity according to the shape information and the depth information in the corresponding associated data set. The plasma source resonant cavity adjusting method and device and the resonant cavity provided by the invention have the advantage of improving the use efficiency.

Description

Technical Field

[0001] The present application relates to the field of resonant cavity technology, and in particular to a plasma source resonant cavity adjustment method, device and resonant cavity. Background Art

[0002] When a gas receives enough energy, it can turn into a plasma state. Plasma is a system composed of charged particles (including ions, electrons, and ion clusters) and neutral particles. In layman's terms, plasma is a special ionized gas, and only ionized gas with a sufficient degree of ionization can have plasma characteristics.

[0003] Remote Plasma Source (RPS) is an advanced plasma generating device. The basic principle of remote plasma source is to use radio frequency or microwave electromagnetic waves to generate high-frequency electric fields in the cavity. These high-frequency electric fields ionize gas molecules to form plasma composed of positively charged ions and negatively charged electrons. Because there is an isolation barrier between the plasma and the cavity, the plasma can be transmitted to the target area without directly contacting the treatment surface, thus realizing remote treatment.

[0004] In remote plasma source equipment, the introduction of resonant cavity (resonant cavity is a closed or semi-closed electromagnetic wave cavity that can produce resonance phenomenon) is of great significance. The resonant cavity can solve the problem of energy loss. In remote plasma source equipment, electromagnetic waves or light waves often have energy loss during transmission. The resonant cavity can reduce this loss and ensure that more energy is used for plasma generation through multiple reflections and energy accumulation, thereby improving the overall efficiency of the equipment. The resonant cavity can also solve the problem of frequency instability. During the use of remote plasma source equipment, it may be affected by external electromagnetic interference, resulting in unstable plasma frequency. The selective enhancement and suppression characteristics of the resonant cavity help to reduce this interference and maintain the stability of the plasma frequency. The resonant cavity can also solve the problem of inconsistent plasma quality. Different working environments and operating conditions may lead to inconsistent plasma quality. By optimizing the parameter settings of the resonant cavity, precise control of the plasma generation process can be achieved, thereby improving the quality and consistency of the plasma.

[0005] In summary, the resonant cavity can not only enhance and focus energy, selectively enhance or suppress electromagnetic waves of specific frequencies, and improve plasma quality, but also effectively solve problems such as energy loss, frequency instability, and inconsistent plasma quality encountered during the use of the equipment.

[0006] Therefore, when designing and manufacturing remote plasma source equipment, it is crucial to reasonably select and configure the resonant cavity. The design of the resonant cavity in the remote plasma source equipment is a complex and delicate process, which involves many aspects of consideration, including the shape, size, material selection, excitation and coupling methods of the resonant cavity. In the actual use of existing remote plasma source related equipment, most of the resonant cavities are designed as cavities with specific mechanical structures (such as round, spherical, annular, rectangular, etc.). However, these resonant cavities may only have a good resonance effect on a certain type of electromagnetic wave, but a poor resonance effect on others. Therefore, when facing different work tasks, different resonant cavities often need to be replaced, and the resonant cavity needs to be re-debugged, and the debugging process is very dependent on human experience, which will make the overall work task efficiency low, and the intelligence and adaptability are very poor.

[0007] In view of the above problems, this application proposes a new solution. Summary of the invention

[0008] The purpose of the present application is to provide a plasma source resonant cavity adjustment method, device and resonant cavity, which have the advantage of improving utilization efficiency.

[0009] In the first aspect, the present application provides a plasma source resonant cavity adjustment method, and the technical solution is as follows: Obtaining shape information and depth information of the adjustment column in the plasma source resonance cavity; According to the task type, the shape information and the depth information of the adjustment column are adjusted to obtain corresponding reflection power data under different shape information and depth information; Acquire the shape information and the depth information corresponding to when the reflected power is at a minimum value or is less than a target value; Generate an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type; When it is detected that a new task type has a corresponding associated data group, the adjustment column in the plasma source resonance cavity is adjusted according to the shape information and the depth information in the corresponding associated data group.

[0010] Further, in the present application, the step of obtaining shape information and depth information of the adjustment column in the plasma source resonance cavity includes: Obtaining a basic shape of one or more of the adjustment columns in the plasma source resonance cavity, wherein the basic shape at least includes one or more of an embedded and overlapping triangle, a rectangle, and a circle; Acquiring initial adjustment information of each of the adjustment columns; Obtaining the depth information corresponding to each shape of the embedded nesting in each of the adjustment columns according to the initial adjustment information; The shape information of each adjusting column is obtained according to the depth information corresponding to each shape of the embedded overlapping in each adjusting column.

[0011] Further, in the present application, the step of adjusting the shape information and the depth information of the adjustment column includes: Roughly adjusting the shape information and the depth information of the adjustment column to generate plasma in the plasma source resonance cavity; After plasma is generated in the plasma source resonance cavity, the shape information and the depth information of the adjustment column are fine-tuned.

[0012] Further, in the present application, the step of generating an associated data group according to the shape information and the depth information corresponding to the reflected power when the minimum value or less than the target value and the task type includes: Selecting three smallest groups of data from the multiple groups of reflected power in turn as target data; The shape information, the depth information and the task type corresponding to the target data are used to generate the associated data group.

[0013] Further, in the present application, the step of adjusting the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group includes: Selecting the shape information and the depth information corresponding to the first smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirement is not met, the shape information and the depth information corresponding to the second smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirement is not met, the shape information and the depth information corresponding to the third smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, the scheme with the best ionization effect is selected from the three groups of schemes to adjust the adjustment column.

[0014] Furthermore, in the present application, the method further comprises: When it is detected that there is no corresponding associated data group for a new task type, a new associated data group is generated according to the shape information and depth information corresponding to the minimum reflected power after adjustment test or when it is less than the target value and the corresponding new task type.

[0015] Furthermore, in the present application, the task type includes work parameter information, and the method further includes: When it is detected that the new task type does not have a corresponding associated data group, searching the associated data group for the associated data group that is closest to the working parameters in the new task type according to the working parameters in the new task type; Recommended adjustment parameters for a new task type are generated according to the closest associated data set, and the recommended adjustment parameters include parameters for adjusting the shape information and the depth information of the adjustment column.

[0016] In a second aspect, the present application further proposes a plasma source resonant cavity adjustment device, comprising: A first acquisition module is used to acquire shape information and depth information of the adjustment column in the plasma source resonance cavity; A first adjustment module, used for adjusting the shape information and the depth information of the adjustment column according to the task type, so as to obtain corresponding reflection power data under different shape information and depth information; A second acquisition module is used to acquire the shape information and the depth information corresponding to when the reflected power is at a minimum value or is less than a target value; A generating module, configured to generate an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type; The second adjustment module is used to adjust the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group when detecting that a new task type has a corresponding associated data group.

[0017] In a third aspect, the present application further proposes a plasma source resonant cavity, comprising a resonant cavity, and further comprising: An adjusting device, connected to the resonant cavity, includes one or more adjusting columns, wherein a plurality of shape components are embedded and stacked in the adjusting columns, and the shape of the shape components includes at least one or more of a triangle, a rectangle and a circle; A piezoelectric drive control device is connected to the adjustment column and is used to control the extension position of each shape component in the adjustment column in the resonance cavity.

[0018] Furthermore, the present application also includes: A data recording device is used to record and store the adjustment information of the adjustment column by the piezoelectric drive control device.

[0019] From the above, it can be seen that the present application provides a plasma source resonant cavity adjustment method, device and plasma source resonant cavity, which obtains the shape information and depth information of the adjustment column in the plasma source resonant cavity, makes adjustments according to the task type, generates an associated data group, and adjusts the adjustment column according to the associated data group, thereby realizing intelligent adjustment of the plasma source resonant cavity, improving the flexibility and efficiency of the plasma source resonant cavity adjustment, meeting the requirements of different work tasks, and having the advantage of improving utilization efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A flow chart of a plasma source resonant cavity adjustment method provided in this application.

[0021] Figure 2 A schematic diagram of the structure of a plasma source resonant cavity adjustment device provided in this application.

[0022] Figure 3 A schematic diagram of the structure of a plasma source resonant cavity provided in this application.

[0023] Figure 4 This is a schematic structural diagram of one of the shape components provided in this application.

[0024] Figure 5 This is a schematic structural diagram of one of the shape components provided in this application.

[0025] Figure 6 This is a schematic structural diagram of one of the shape components provided in this application.

[0026] Figure 7 This is a schematic structural diagram of one of the shape components provided in this application.

[0027] Figure 8 This is a physical picture of a plasma source resonance cavity provided in this application.

[0028] In the figure: 210, first acquisition module; 220, first adjustment module; 230, second acquisition module; 240, generation module; 250, second adjustment module; 300, resonant cavity; 400, adjustment column; 500, piezoelectric drive control device; 600, power supply; 700, input power controller and reflected power receiver; 800, data recording device; 900, RPS cavity; 1000, observation window; 410, shape component. DETAILED DESCRIPTION

[0029] The technical solutions in the present application will be clearly and completely described below in conjunction with the drawings in the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. The components of the present application generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the present application for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0030] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0031] Please refer to Figure 1 , the present application provides a plasma source resonant cavity adjustment method, the technical solution is as follows: S110, acquiring shape information and depth information of an adjustment column in a plasma source resonance cavity; S120, adjusting the shape information and depth information of the adjustment column according to the task type to obtain corresponding reflection power data under different shape information and depth information; S130, obtaining shape information and depth information corresponding to a minimum reflected power value or a value less than a target value; S140, generating an associated data group according to the shape information and depth information corresponding to the reflected power when it is at a minimum value or less than a target value and the task type; S150: When it is detected that a corresponding associated data group exists for a new task type, the adjustment column in the plasma source resonance cavity is adjusted according to the shape information and depth information in the corresponding associated data group.

[0032] The core innovation of this application is that a method for adjusting a plasma source resonant cavity based on an associated data group is proposed. By establishing a mapping relationship between task types and optimal adjustment parameters, rapid and precise adjustment of the plasma source resonant cavity (hereinafter referred to as the resonant cavity) under different working conditions is achieved, thereby significantly improving the intelligence level and adaptability of the adjustment.

[0033] Specifically, in the resonant cavity, the adjustment column can adjust its shape information and depth information, thereby producing different effects on the resonant cavity.

[0034] According to different task types, the shape information and depth information of the adjustment column are systematically adjusted. By changing the shape information and depth information, the internal structure of the resonant cavity can be dynamically changed. Under different shape information and depth information configurations, the corresponding reflected power data is measured and recorded. The purpose is to comprehensively evaluate the performance of the resonant cavity under different structural configurations for different task types. Different task types usually correspond to different working parameters, such as power input power, gas flow parameters, etc. These different working parameters will be affected by the different shape structures in the resonant cavity.

[0035] By selecting the configuration with the minimum reflected power or lower than the preset target value, based on these optimal configurations and the corresponding task types, an associated data set is generated. Each associated data set contains the optimal shape information and depth information under a specific task type.

[0036] Therefore, when encountering a new task type, the system first checks whether there is a matching associated data set. If so, the drive device can directly adjust the adjustment column accurately based on the shape and depth information recorded in the associated data set to quickly achieve the optimal configuration of the resonant cavity.

[0037] In some specific implementations, different task types can be tested in advance to obtain many different associated data groups and form a database. When a new task type is encountered, if a corresponding associated data group is found in the database, the shape information and depth information of the corresponding adjustment column in the associated data group can be directly called.

[0038] Specifically, the step of obtaining shape information and depth information of the adjustment column in the plasma source resonance cavity includes: Obtaining a basic shape of one or more adjustment columns in the plasma source resonance cavity, the basic shape at least comprising one or more of an embedded overlapping triangle, a rectangle and a circle; Obtain initial adjustment information for each adjustment column; Obtaining depth information corresponding to each shape of the embedded nesting in each adjustment column according to the initial adjustment information; The shape information of each adjusting column is obtained according to the depth information corresponding to each shape of the embedded nesting in each adjusting column.

[0039] Among them, the basic shape of the adjustment column refers to the various basic shapes of the adjustment column that are embedded and overlapped. Specifically, the adjustment column includes multiple groups of embedded and overlapped shape components, and different shape components have different shapes, including triangles, rectangles, circles, etc.

[0040] Specifically, in some of the embodiments, the overall adjustment column is a columnar structure with a hollow interior, in which retractable shaped components with different shapes are nested in sequence. The different shaped components can be driven individually to retract and extend, thereby extending different distances in the resonance cavity.

[0041] This design allows the adjustment column to have a more complex and flexible geometric structure. By obtaining the basic shape and initial adjustment information of the adjustment column, the structural characteristics of the adjustment column can be accurately determined. The specific implementation can be carried out in the following ways: First, get the basic shapes of the adjustment column. These shapes can be triangular, rectangular or circular, and are combined in an embedded and nested manner. For example, an adjustment column can contain an embedded triangular component, a rectangular component on the outside, and a circular component on the outside. The nesting depth and position of components of each shape can be precisely controlled by the initial adjustment information.

[0042] Secondly, the initial adjustment information of each adjustment column is obtained. This information may include parameters such as the relative position, nesting depth, extension degree, etc. of various shape components. Through this initial information, the specific depth information of each embedded shape can be accurately calculated.

[0043] In practical applications, the shape information and depth information of the adjustment column can be adjusted according to different task types. For example, the internal shape structure of the resonant cavity can be adjusted by adjusting the depth of components of different shapes.

[0044] The multiple shape designs of the built-in stacking allow for more flexible and fine adjustment to better suit different work tasks and conditions.

[0045] Furthermore, in some of the embodiments, the step of adjusting the shape information and the depth information of the adjustment column includes: Roughly adjusting the shape information and depth information of the adjustment column to generate plasma in the plasma source resonance cavity; After plasma is generated in the plasma source resonant cavity, the shape information and depth information of the adjustment column are fine-tuned.

[0046] In a specific implementation, the rough adjustment step can be achieved by quickly adjusting the basic parameters of the adjustment column. The goal of this step is to quickly establish plasma and lay the foundation for subsequent fine adjustments. For example, the initial position and depth of the triangular, rectangular or circular member embedded in the adjustment column can be selected to enable it to generate basic plasma.

[0047] Specifically, coarse adjustment can be achieved by manually adjusting the knob, and fine adjustment can be achieved by a piezoelectric power device, which can specifically include a motor, a piezoelectric drive sensor, and the like.

[0048] Among them, the fine adjustment step further accurately adjusts the shape information and depth information of the adjustment column based on the rough adjustment. This step achieves accurate adjustment of the adjustment column by obtaining the reflected power data and selecting the parameter combination with the minimum reflected power or less than the preset target value. Specifically, the three smallest groups of reflected power data can be selected in turn, and the shape information and depth information corresponding to these data can be gradually adjusted.

[0049] This step-by-step adjustment method can effectively solve the complexity of adjusting the parameters of the adjustment column in the resonant cavity. The coarse adjustment step quickly establishes the plasma, and the fine adjustment step further optimizes the quality and stability of the plasma. This method not only improves the accuracy of the adjustment, but also enhances the flexibility and adaptability of the adjustment process.

[0050] Further, in some of the embodiments, the step of generating an associated data group according to the shape information and depth information corresponding to the reflected power when it is at a minimum value or less than a target value and the task type includes: Selecting the three smallest groups of data from the multiple groups of reflected powers in turn as target data; The shape information, depth information and task type corresponding to the target data are used to generate an associated data group.

[0051] In a specific implementation, the technical features of the solution can be realized in the following manner: first, the three smallest groups of data are selected in turn from multiple groups of reflected power data.

[0052] In some other embodiments, the selection process does not simply take the minimum value, but comprehensively considers the magnitude and change trend of the reflected power. For each set of data, not only the numerical value of the reflected power should be paid attention to, but also the corresponding adjustment column shape information and depth information should be analyzed. For example, a scoring mechanism can be established to conduct a comprehensive evaluation based on the magnitude of the reflected power, data stability, and the degree of matching with the task type.

[0053] In some other embodiments, multiple sets of data may be selected as needed, rather than being limited to three sets of data.

[0054] In the data association generation process, different task types correspond to different optimal adjustment parameters, namely shape information and depth information. By associating the selected three sets of target data with their corresponding shape information, depth information and task types, a multi-dimensional data set can be constructed. When the system encounters a new task type, it can quickly select the most matching adjustment parameters from the existing associated data set.

[0055] In practical applications, this method can significantly improve the adjustment accuracy and efficiency of the plasma source resonant cavity. By selecting the smallest three sets of reflected power data, the system can obtain a more comprehensive and reliable adjustment reference. When the first set of parameters cannot meet the requirements, it can quickly switch to the adjustment parameters corresponding to the second or third set of data, greatly reducing the debugging time and manual intervention.

[0056] Specifically, the step of adjusting the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group includes: Selecting shape information and depth information corresponding to the first smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determine whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, the shape information and depth information corresponding to the second smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determine whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirement is not met, the shape information and depth information corresponding to the third smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determine whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, select the scheme with the best ionization effect from the three groups of schemes to adjust the adjustment column.

[0057] First, select target data from the associated data group, which contains reflection power data under different shapes and depth information, in order to find the optimal adjustment parameters. Secondly, adopt a progressive adjustment strategy, first try the adjustment scheme corresponding to the first smallest target data, if the ionization effect does not meet the requirements, then try the adjustment schemes corresponding to the second smallest and third smallest target data in turn. Finally, if the three adjustments cannot meet the ionization effect requirements, select the scheme with the best ionization effect from the three groups of schemes that have been tried.

[0058] This adjustment method, which has been tried many times and gradually optimized, is adaptive and intelligent, and can accurately adjust the adjustment column in the plasma source resonant cavity under different task types to ensure that the plasma ionization effect can meet the requirements of specific tasks. This method overcomes the limitations of traditional adjustment that relies on manual experience and improves the adjustment efficiency and adaptability of the plasma source resonant cavity.

[0059] In the specific implementation process, the technical solution of the present application can be implemented in a variety of ways. For example, with respect to selecting target data from the associated data group, different data sorting and screening algorithms can be used, such as sorting based on the size of the reflected power, sorting based on the ionization effect, etc. For the progressive adjustment strategy, the number of attempts can be adjusted according to actual needs, for example, increased to four or five attempts. When judging whether the ionization effect meets the requirements, multiple evaluation indicators can be set, such as ionization degree, plasma density, uniformity, etc.

[0060] Compared with the prior art, the technical solution of this application is mainly innovative in the following aspects: First, by establishing an associated data group, the shape information and depth information of the adjustment column are associated with the specific task type, laying the foundation for subsequent intelligent adjustment. Secondly, the use of a progressive adjustment strategy not only improves the adjustment efficiency, but also reduces the number of adjustments as much as possible while ensuring the ionization effect. Finally, through multiple attempts and comparisons, the best solution is selected. This method can adapt to different task requirements and improve the adaptability and flexibility of the plasma source resonant cavity.

[0061] In practical applications, the technical solution of the present application can be implemented as follows: Assume that there is a resonant cavity, which contains an adjustable adjustment column. Based on the previous experimental data, an associated data group is established, which contains reflection power data under different shapes and depth information. When a new task is required, the system first selects three sets of data with the smallest reflection power from the associated data group.

[0062] First, the system adjusts the adjustment column to the shape and depth corresponding to the first minimum reflected power. Assume that this set of parameters is: conical shape, depth is 10mm. The system starts the plasma and measures the ionization effect. If the ionization effect does not meet the requirements, the system will make a second adjustment.

[0063] The second adjustment uses the parameters corresponding to the second smallest reflected power, assuming: stepped shape, depth of 12mm. Measure the ionization effect again, if it still does not meet the requirements, the system will make a third adjustment.

[0064] The third adjustment uses the parameters corresponding to the third smallest reflected power, assuming: cone, depth of 11mm. If the ionization effect still does not meet the requirements after this adjustment, the system will compare the results of the three adjustments and select a set of parameters with the best ionization effect. Assuming that the second adjustment has the best effect, the system will eventually set the adjustment column to a stepped shape with a depth of 12mm.

[0065] Through this method, the system can quickly find the best adjustment parameters under different task types, greatly improving the adjustment efficiency and accuracy. At the same time, this method also reduces the dependence on manual experience and improves the automation and intelligence level of the system.

[0066] In addition, in some preferred embodiments, when a new task type appears and there is a corresponding associated data group, but after the adjustment column is adjusted using the shape information and depth information in the corresponding associated data group, if the adjusted effect does not meet the expectations, at this time, the task type of the associated data group is marked, that is, the first mark, and after adjusting the adjustment columns corresponding to other task types corresponding to the first mark, a newly added associated data group with a second mark is generated. At the same time, it is recorded which of the different associated data groups corresponding to the task type has the highest applicability. When the subsequent newly added task type is this task type, the associated data group with the highest applicability is used for adjustment.

[0067] For example, a task type is a, and its associated data group is A; When a new task type appears, if the task type is also a, the associated data group A will be used for adjustment. However, if it is found that the effect does not meet the expectations after adjustment, the shape information and depth information need to be readjusted. At this time, a new associated data group B will be obtained. In this case, A has a first tag and B has a second tag. That is to say, the same task type a corresponds to the associated data group A and the associated data group B. In this case, the state of counting the associated data groups with the first tag and the second tag will be entered, that is, the applicability of A and B is counted to determine which associated data group has the highest applicability. Specifically, when the newly added task type is a, the associated data group A and the associated data group B will be used in turn for adjustment to determine which associated data group can make the effect of the task type a meet the expectations. If it is A, the count of A will increase by one, and if it is B, the count of B will increase by one. For example, when the count of A is 1 and the count of B is 2, if the newly added task type is a again, the associated data group B will be used for adjustment first.

[0068] In addition, if the adjustment based on the associated data group A and the associated data group B cannot achieve the expected result, then the associated data group C will be added again, and the priority adjustment and use of the associated data groups will be carried out in the same way.

[0069] Furthermore, in some embodiments, the method further comprises: When it is detected that there is no corresponding associated data group for a new task type, a new associated data group is generated according to the shape information and depth information corresponding to the minimum reflected power after adjustment test or when it is less than the target value and the corresponding new task type.

[0070] First, check whether there is a corresponding associated data group for the new task type. If not, perform an adjustment test to obtain the shape information and depth information when the reflected power is at the minimum value or less than the target value. Then, bind this information to the new task type to generate a new associated data group.

[0071] In the specific implementation, the adjustment test can be divided into two stages: coarse adjustment and fine adjustment. In the coarse adjustment stage, plasma is first generated in the plasma source resonant cavity. In the fine adjustment stage, the shape information and depth information of the adjustment column are finely adjusted. Through multiple tests, the three sets of data with the smallest reflected power are selected as target data, and the associated data set is generated accordingly.

[0072] The advantage of this method is that it can adaptively handle new task types. When encountering a task type without preset data, the system can quickly generate the corresponding adjustment reference data through actual testing. This method not only improves the flexibility of the system, but also reduces the need for manual intervention, making the resonant cavity adjustment process more intelligent.

[0073] Furthermore, in some of the embodiments, the task type includes work parameter information, and the method further includes: When it is detected that there is no corresponding associated data group for the new task type, searching for an associated data group closest to the working parameters in the new task type from the associated data groups according to the working parameters in the new task type; Recommended adjustment parameters for the new task type are generated according to the most closely associated data set, and the recommended adjustment parameters include parameters for adjusting the shape information and the depth information of the adjustment column.

[0074] When searching for the closest associated data set, a variety of parameter matching strategies can be used. For example, the Euclidean distance, cosine similarity or other similarity indicators between the working parameters can be calculated. For multi-dimensional working parameters, weighted processing can be performed to assign different importance weights to different parameters. In this way, the most similar data set can be found more accurately.

[0075] Based on the closest associated data set, the method of the present application will generate recommended adjustment parameters for the new task type. The recommended adjustment parameters include adjustment suggestions for the shape information and depth information of the adjustment column. Since they are generated based on the most similar historical data set, the recommended adjustment parameters have high reliability and reference value.

[0076] In practical applications, this method can significantly improve the efficiency of plasma source resonant cavity adjustment. By utilizing existing empirical data, the tedious process of adjusting from scratch for each new task type is avoided. At the same time, through intelligent matching and parameter recommendation, a preliminary feasible adjustment plan can be quickly obtained, greatly shortening the debugging time.

[0077] Compared with the traditional empirical adjustment method, the method of the present application is more intelligent and adaptable. It no longer relies on the personal experience of the operator, but systematically uses historical data to recommend and adjust parameters in a data-driven manner.

[0078] Second, refer to Figure 2 , the present application also proposes a plasma source resonant cavity adjustment device, comprising: A first acquisition module 210 is used to acquire shape information and depth information of an adjustment column in a plasma source resonance cavity; A first adjustment module 220, configured to adjust the shape information and depth information of the adjustment column according to the task type, so as to obtain corresponding reflection power data under different shape information and depth information; The second acquisition module 230 is used to acquire the shape information and depth information corresponding to the minimum value of the reflected power or when the reflected power is less than the target value; A generating module 240, configured to generate an associated data group according to shape information and depth information corresponding to the reflected power when the reflected power is at a minimum value or less than a target value, and a task type; The second adjustment module 250 is used to adjust the adjustment column in the plasma source resonance cavity according to the shape information and depth information in the corresponding associated data group when detecting that a new task type has a corresponding associated data group.

[0079] By acquiring the shape information and depth information of the adjustment column in the plasma source resonant cavity, adjusting it according to the task type, generating a related data group, and adjusting the adjustment column according to the related data group, intelligent adjustment of the plasma source resonant cavity is realized, the flexibility and efficiency of the plasma source resonant cavity adjustment are improved, the requirements of different work tasks are met, and the utilization efficiency is improved.

[0080] In addition, in some preferred embodiments, a plasma source resonant cavity adjustment device proposed in the present application can perform any one of the steps in the above scheme.

[0081] Thirdly, refer to Figures 3 to 8 The present application also proposes a plasma source resonant cavity, including the resonant cavity 300, and further including: The adjustment device is in communication with the resonant cavity 300 and includes one or more adjustment columns 400. A plurality of shape components 410 are embedded and stacked in the adjustment columns 400. The shape of the shape components 410 includes at least one or more of a triangle, a rectangle and a circle. The piezoelectric driving device 500 is connected to the adjusting column 400 and is used to control the extension position of each shape component 410 in the adjusting column 400 in the resonant cavity 300 .

[0082] The resonant cavity 300 proposed in the present application is adjusted by using an adjustable column 400 composed of a shape member 410 having a variety of shapes, thereby realizing flexible adjustment of the structure of the resonant cavity 300. The shape members 410 of different shapes and depths are combined to adapt to different work tasks, significantly improving the adaptability of the resonant cavity 300. The piezoelectric drive control device 500 can accurately control the position of the shape member 410, so that the resonant cavity 300 can be quickly and accurately optimized for different working environments, overcoming the limitations of the traditional resonant cavity 300 that the equipment needs to be replaced or the debugging relies on manual experience.

[0083] In the plasma source resonant cavity 300 of the present application, the design of the adjustment device is key. The adjustment device includes one or more adjustment columns 400, each of which has an embedded nested structure and includes a plurality of shape components 410. These shape components 410 include at least one or more of a triangle, a rectangle, and a circle. For example, an adjustment column 400 may include a triangular component, two rectangular components, and a circular component, which are nested together in a specific order.

[0084] The diversity of the shape components 410 provides more possibilities for adjusting the structure of the resonant cavity 300. Triangular components may be used to form a sharp electric field distribution in the resonant cavity 300, rectangular components may be used to create a uniform electric field area, and circular components may be used to form a smooth electric field transition. By combining these components of different shapes, complex electromagnetic field distributions can be created in the resonant cavity 300 to meet different plasma generation requirements.

[0085] The piezoelectric drive control device 500 is connected to the adjustment column 400 and is used to accurately control the extension position of each shape component 410 in the resonant cavity 300. This precise control may be achieved by a stepper motor, a servo motor or other precision drive mechanism. By adjusting the extension depth of each shape component 410, the effective volume and shape of the resonant cavity 300 can be changed, thereby affecting the resonant characteristics of the electromagnetic wave.

[0086] For example, when high-density plasma needs to be generated, the circular member may be extended into the resonant cavity 300 to create a larger resonant space; and when high-energy but low-density plasma needs to be generated, the triangular member may be extended deeper to form a more concentrated electric field distribution. This flexible adjustment capability enables the resonant cavity 300 of the present application to adapt to a variety of different work tasks and environmental conditions.

[0087] The resonant cavity 300 of the present application can be operated as follows in practical applications: First, according to the requirements of a specific work task, select a suitable adjustment column 400 for configuration. Then, adjust the extension position of each shape component 410 through the piezoelectric drive control device 500. During the adjustment process, it may be necessary to monitor the electromagnetic field distribution and plasma parameters in the resonant cavity 300 in real time for fine-tuning. Finally, when the optimal configuration is reached, record the current adjustment parameters so that they can be quickly reproduced when encountering similar tasks in the future.

[0088] In this way, the plasma source resonant cavity 300 of the present application can quickly adapt to different work requirements without changing the hardware, greatly improving the flexibility and adaptability of the device. Compared with the traditional fixed structure resonant cavity 300, the solution of the present application avoids the trouble of frequent equipment replacement and reduces the dependence on manual experience. In addition, since the structure of the resonant cavity 300 can be precisely controlled, the solution of the present application can also achieve more precise plasma parameter control and improve the quality and stability of the plasma.

[0089] Furthermore, in some embodiments, it also includes: The data recording device 800 is used to record and store the adjustment information of the adjustment column 400 by the piezoelectric driving control device 500 .

[0090] The introduction of the data recording device 800 solves the problem of recording and storing the adjustment information of the resonant cavity 300. By recording and storing the adjustment information of the piezoelectric drive control device 500 on the adjustment column 400, the adjustment process of the resonant cavity 300 can be tracked and analyzed. This method can help the operator understand the impact of different adjustment parameters on plasma performance and provide data support for future adjustment optimization. At the same time, the stored adjustment information can also be used to quickly reproduce a specific resonant cavity 300 configuration to improve adjustment efficiency and consistency.

[0091] This technical solution, by combining the adjustable resonant cavity 300 structure and the data recording function, not only improves the adaptability and controllability of the plasma source, but also provides a basis for the intelligent adjustment and optimization of the resonant cavity 300. By analyzing the recorded adjustment data, the relationship between the adjustment parameters and the plasma performance can be found, so as to formulate a more effective adjustment strategy and improve the overall performance and stability of the plasma source.

[0092] The data recording device 800 can be implemented in various forms. For example, an embedded memory, a solid state drive, or a cloud storage system can be used to store the adjustment information. The recorded information may include shape information and depth information of the adjustment column 400, control parameters of the piezoelectric drive control device 500, and corresponding plasma performance data.

[0093] The data recording device 800 and the piezoelectric drive control device 500 can communicate with each other via wired or wireless communication. For example, a serial communication interface (such as RS-232, RS-485) or a network interface (such as Ethernet, Wi-Fi) can be used to achieve real-time data transmission and storage.

[0094] In order to improve the availability and analysis efficiency of data, the data recording device 800 can be equipped with a data processing module. This module can pre-process, classify and preliminarily analyze the original adjustment data and generate data reports that are easy to understand and use. These reports can include information such as correlation charts of adjustment parameters and plasma performance, optimization suggestions, etc.

[0095] The data recording device 800 can also be integrated with external systems, such as a production management system or an equipment monitoring system, so as to achieve more extensive data sharing and analysis, which is helpful for optimizing the overall production process and improving equipment performance.

[0096] In practical applications, the introduction of the data recording device 800 forms a closed-loop feedback system with the existing resonant cavity 300 adjustment mechanism. The piezoelectric drive control device 500 adjusts the adjustment column 400 according to the task requirements, and the data recording device 800 records these adjustment information and the corresponding plasma performance data. By analyzing these historical data, guidance can be provided for future adjustments, achieving smarter and more efficient resonant cavity 300 adjustments.

[0097] Specifically, in some preferred embodiments, the plasma source resonant cavity proposed in the present application includes a resonant cavity 300, and the resonant cavity 300 has a plurality of adjustment columns 400, each of which is composed of a plurality of shape components 410 of different sizes and shapes that are stacked in a strictly embedded manner and can be retracted; each of the adjustment columns 400 has two adjustment modes, namely, coarse adjustment and fine adjustment, wherein the coarse adjustment is a manual adjustment knob, and the fine adjustment is achieved by a piezoelectric drive control device 500; The piezoelectric drive control device 500 is composed of a motor, a piezoelectric drive sensor, etc., which are all installed on the periphery of the adjustment column 400, and can realize the adjustment of the adjustment column 400; It also includes a power supply 600, which can supply power to the piezoelectric drive control device 500; The RPS cavity 900 is also included. The RPS cavity 900 is sealed and connected to the resonant cavity 300. An observation window 1000 is provided on the RPS cavity 900. The generation state of the plasma can be observed through the observation window 1000. Also included is an input power controller and a reflected power receiver 700, which can control the generation of plasma by setting the output power of the power supply and receive information related to the reflected power; It also includes a data recording device 800, which can dynamically record data information such as shape information, depth information of the adjustment column 400 in the resonant cavity 300, and reflected power of the power source 600 in real time; It also includes a display device, which is composed of a calculator and a display screen, and can display, view, calculate, call, classify and draw curves of the data recorded by the data recording device 800.

[0098] In one embodiment, the steps of the method are as follows: Step 1: Connect the resonant cavity 300 to the power supply 600 and the RPS cavity 900, and check and confirm the sealing of the entire device system.

[0099] Step 2: According to the common types of plasma work tasks, set the work task (A / B / C / D / ... / X), power input power, gas flow rate and other parameters through the input power controller and the reflected power receiver 700, and set the maximum threshold M of the reflected power.

[0100] Step 3: Roughly adjust the adjustment column 400 and confirm through the observation window 1000 that plasma is generated in the RPS chamber 900 .

[0101] Step 4: Adjust the adjustment column 400 in the resonant cavity 300 with different shape information and depth information, record its reflected power data in different states, and sort them.

[0102] Step 5: Subtract it from the maximum threshold M, take its absolute value, and record it.

[0103] Step 6: Find the data group with the smallest absolute value, fine-tune the depth of the shape component 410 through the piezoelectric drive control device 500, and record the corresponding reflected power to form data of "shape information-depth information-reflected power-task type".

[0104] Step 7: Draw the curve graph of "depth information-reflection power" under different shapes (it should show a "V" or "inverted V" trend) and form a data set.

[0105] Step 8: Find the shape information and depth information corresponding to the minimum reflected power, and mark them as the best data under this task type as the associated data group (shape information-depth information-reflected power-task type).

[0106] Step nine: Summarize all data under different work task types to form a resonant cavity 300 adjustment database, and save it in the form of "shape information-depth information-reflected power-task type".

[0107] Step 10: Feature and confirm the new task type to be done, and adjust the adjustment column 400 according to the corresponding shape information and depth information according to the associated data group, so as to achieve optimal adjustment of the reflected power.

[0108] Step 11: Return to step 2, update the work task, and then repeat steps 2 to 10.

[0109] Step 12: Form a database of "shape information - depth information - reflection power - task type".

[0110] When a new task is determined, the parameters (shape information and depth information) corresponding to the lowest reflected power are used first, and then the actual ionization of the plasma in the RPS cavity 900 is checked. If the actual ionization effect is not ideal, the depth of the adjustment column 400 can be fine-tuned; if it is still not ideal, switch to the parameters (shape information and depth information) corresponding to the second lowest reflected power; if it is still not ideal, switch to the parameters (shape information and depth information) corresponding to the third lowest reflected power. In this way, the shape of the resonant cavity 300 that better matches the actual situation can be quickly found.

[0111] The above description is only an embodiment of the present application and is not intended to limit the protection scope of the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A plasma source resonant cavity adjustment method, characterized in that: The steps of the method include: Obtaining shape information and depth information of the adjustment column in the plasma source resonance cavity; According to the task type, the shape information and the depth information of the adjustment column are adjusted to obtain corresponding reflection power data under different shape information and depth information; Acquire the shape information and the depth information corresponding to when the reflected power is at a minimum value or is less than a target value; Generate an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type; When it is detected that a new task type has a corresponding associated data group, the adjustment column in the plasma source resonance cavity is adjusted according to the shape information and the depth information in the corresponding associated data group.

2. A plasma source resonant cavity adjustment method according to claim 1, characterized in that: The step of obtaining shape information and depth information of the adjustment column in the plasma source resonance cavity comprises: Obtaining a basic shape of one or more of the adjustment columns in the plasma source resonance cavity, wherein the basic shape at least includes one or more of an embedded and overlapping triangle, a rectangle, and a circle; Acquiring initial adjustment information of each of the adjustment columns; Obtaining the depth information corresponding to each shape of the embedded nesting in each of the adjustment columns according to the initial adjustment information; The shape information of each adjusting column is obtained according to the depth information corresponding to each shape of the embedded overlapping in each adjusting column.

3. A plasma source resonant cavity adjustment method according to claim 2, characterized in that: The step of adjusting the shape information and the depth information of the adjusting column comprises: Roughly adjusting the shape information and the depth information of the adjustment column to generate plasma in the plasma source resonance cavity; After plasma is generated in the plasma source resonance cavity, the shape information and the depth information of the adjustment column are fine-tuned.

4. The plasma source resonant cavity adjustment method according to claim 3, characterized in that: The step of generating an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type comprises: Selecting three smallest groups of data from the multiple groups of reflected power in turn as target data; The shape information, the depth information and the task type corresponding to the target data are used to generate the associated data group.

5. A plasma source resonant cavity adjustment method according to claim 4, characterized in that: The step of adjusting the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group comprises: Selecting the shape information and the depth information corresponding to the first smallest target data from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirement is not met, the shape information and the depth information corresponding to the second smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirement is not met, the shape information and the depth information corresponding to the third smallest target data are selected from the associated data group to adjust the adjustment column in the plasma source resonance cavity; Determining whether the ionization effect in the plasma source resonant cavity meets the requirements; If the requirements are not met, the scheme with the best ionization effect is selected from the three groups of schemes to adjust the adjustment column.

6. The plasma source resonant cavity adjustment method according to claim 1, characterized in that: The method further includes: When it is detected that there is no corresponding associated data group for a new task type, a new associated data group is generated according to the shape information and depth information corresponding to the minimum reflected power after adjustment test or when it is less than the target value and the corresponding new task type.

7. The plasma source resonant cavity adjustment method according to claim 1, characterized in that: The task type includes work parameter information, and the method further includes: When it is detected that the new task type does not have a corresponding associated data group, searching the associated data group for the associated data group that is closest to the working parameters in the new task type according to the working parameters in the new task type; Recommended adjustment parameters for a new task type are generated according to the closest associated data set, and the recommended adjustment parameters include parameters for adjusting the shape information and the depth information of the adjustment column.

8. A plasma source resonant cavity adjustment device, characterized in that: include: A first acquisition module is used to acquire shape information and depth information of the adjustment column in the plasma source resonance cavity; A first adjustment module, used for adjusting the shape information and the depth information of the adjustment column according to the task type, so as to obtain corresponding reflection power data under different shape information and depth information; A second acquisition module is used to acquire the shape information and the depth information corresponding to when the reflected power is at a minimum value or is less than a target value; A generating module, configured to generate an associated data group according to the shape information and the depth information corresponding to the reflected power when the reflected power is at the minimum value or less than the target value and the task type; The second adjustment module is used to adjust the adjustment column in the plasma source resonance cavity according to the shape information and the depth information in the corresponding associated data group when detecting that a new task type has a corresponding associated data group.

9. A plasma source resonant cavity, comprising a resonant cavity, characterized in that: Also includes: An adjusting device, connected to the resonant cavity, includes one or more adjusting columns, wherein a plurality of shape components are embedded and stacked in the adjusting columns, and the shape of the shape components includes at least one or more of a triangle, a rectangle and a circle; A piezoelectric drive control device is connected to the adjustment column and is used to control the extension position of each shape component in the adjustment column in the resonance cavity.

10. The plasma source resonant cavity according to claim 9, characterized in that: Also includes: A data recording device is used to record and store the adjustment information of the adjustment column by the piezoelectric drive control device.

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