Vapor deposition device

Abstract

The invention discloses an evaporation device. The evaporation device comprises a crucible, a nozzle cover plate and an adjusting plate. The crucible is used for containing an evaporation material; the nozzle cover plate covers the top of the crucible and comprises a plurality of nozzles; the adjusting plate is arranged in the crucible and / or the nozzle cover plate, the adjusting plate is provided with a plurality of areas, each area is provided with a plurality of steam holes, the tapping parameters of at least two areas are different, and the tapping parameters comprise the hole diameter and / or the hole distance of the steam holes. According to the evaporation device disclosed by the invention, the adjusting plate is arranged, and the steam holes in the adjusting plate are subjected to regionalized difference design, so that the consumption rates of materials in different regions in the evaporation source can be regulated and controlled, and the problem that the local thickness of an evaporation film is reduced due to the fact that local materials in the crucible are dried out is solved; the thickness uniformity of the evaporation material on the substrate is improved, and the requirement for mass production is met.

Description

Technical Field

[0001] The present invention relates to the technical field of display device preparation, and in particular to an evaporation device. Background Art

[0002] During the mass production of OLED (Organic Light-Emitting Diode), a large amount of evaporation material is often added to the crucible of the evaporation source, which is then evaporated and deposited onto the substrate through subsequent heating. However, during the long evaporation process, the material is prone to local drying, resulting in a decrease in the local thickness of the evaporated film. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention is to propose a vapor deposition device, which is helpful to improve the problem of local thickness reduction of the vapor deposition film caused by local material drying in the crucible by setting an adjustment plate and designing the steam holes on the adjustment plate in a regionalized manner, thereby improving the thickness uniformity of the vapor deposition material on the substrate.

[0004] According to an embodiment of the present invention, the evaporation device includes: a crucible, the crucible is used to hold the evaporation material; a nozzle cover plate, the nozzle cover plate is sealed on the top of the crucible and includes a plurality of nozzles; an adjustment plate, the adjustment plate is arranged in the crucible and / or the nozzle cover plate, the adjustment plate has a plurality of areas, each of the areas has a plurality of steam holes, and at least two of the areas have different opening parameters, and the opening parameters include the aperture and / or hole spacing of the steam holes.

[0005] According to the evaporation device of the present invention, an adjustment plate is provided and the steam holes on the adjustment plate are designed with regional differences. Thus, the hole opening parameters of each area on the adjustment plate can be specifically set according to specific conditions such as the burn-out situation and the setting position of the adjustment plate, so as to regulate the material consumption rate in different areas of the crucible, which is beneficial to improving the problem of local thickness reduction of the evaporated film caused by local material burn-out in the crucible, improving the thickness uniformity of the evaporated material on the substrate, and meeting mass production needs.

[0006] In some embodiments, the adjustment plate has a first area and a second area, the aperture of the steam holes in the first area is larger than the aperture of the steam holes in the second area; and / or the hole spacing of the steam holes in the first area is smaller than the hole spacing of the steam holes in the second area.

[0007] In some embodiments, a plurality of partitions are provided in the crucible and are spaced apart along a first direction to divide the space in the crucible into a plurality of sub-cavities arranged along the first direction. The adjustment plate is arranged higher than the partitions, and a first steam flow space is formed between the bottom surface of the adjustment plate and the upper end of the partition.

[0008] In some embodiments, a plurality of partitions are provided in the crucible and are spaced apart along a first direction to divide the space in the crucible into a plurality of sub-cavities arranged along the first direction. The adjustment plate is arranged higher than the partitions, and a first steam flow space is formed between the bottom surface of the adjustment plate and the upper end of the partition.

[0009] In some embodiments, the crucible is heated by a heating device surrounding the crucible, there are two first regions, and the two first regions are disposed at both ends of all the second regions in the first direction.

[0010] In some embodiments, the distance between the two steam holes in the first region that are farthest apart along the first direction is a first length value, the distance between the two steam holes in the second region that are farthest apart along the first direction is a second length value, and the length of the adjustment plate along the first direction is a third length value, wherein the first length value is 0.23 to 0.27 times the second length value, and / or the first length value is 0.15 to 0.25 times the third length value.

[0011] In some embodiments, the crucible is provided with a plurality of partitions spaced apart along a first direction to divide the space in the crucible into a plurality of sub-cavities arranged along the first direction, the adjustment plate includes a sub-adjustment plate respectively arranged in each of the sub-cavities, the sub-adjustment plate is flush with or lower than the upper end of the partition so as to be located in the upper area of ​​the sub-cavity, and a second steam flow space is formed between the top surface of the adjustment plate and the nozzle cover plate.

[0012] In some embodiments, the crucible is heated by a heating device surrounding the crucible, the sub-adjustment plate set only in the first area is a first sub-adjustment plate, the sub-adjustment plate set only in the second area is a second sub-adjustment plate, there are two second sub-adjustment plates, and the two second sub-adjustment plates are arranged at both ends of all the first sub-adjustment plates in the first direction.

[0013] In some embodiments, the plurality of steam holes in the first region are arranged at intervals along the first direction; and / or the plurality of steam holes in the second region are arranged at intervals along the first direction.

[0014] In some embodiments, the adjustment plate includes: the adjustment plate includes: a plate body, the plate body having a plurality of first holes; and an adjustment member, the adjustment member having a second hole, at least one of the first holes is covered by the adjustment member, and the covered single first hole is correspondingly connected to the single second hole, and the aperture of the second hole is less than or equal to the aperture of the first hole.

[0015] In some embodiments, the adjusting member includes at least one cover plate, and each of the cover plates is provided with at least one second hole.

[0016] In some embodiments, there are multiple cover plates, and the second holes on at least two of the cover plates have different apertures.

[0017] In some embodiments, one second hole is disposed on each of the cover plates, the total number of the cover plates is the same as the total number of the first holes and are disposed in one-to-one correspondence, and an adjustable gap is provided between at least two adjacent cover plates.

[0018] In some embodiments, the adjusting member includes at least one ring assembly, a single ring assembly is arranged corresponding to a single first hole, the ring assembly includes a plurality of rings with different diameters, the plurality of rings are arranged in sequence, and the ring hole of the innermost ring constitutes the second hole.

[0019] In some embodiments, there are multiple ring assemblies, and the specifications of the rings contained in each ring assembly are consistent. The number of rings selected by at least two ring assemblies set on the plate body is different, and the innermost rings used by at least two ring assemblies are different.

[0020] In some embodiments, the total number of the collar assemblies is the same as the total number of the first holes and are arranged in one-to-one correspondence, and an adjustable gap is provided between at least two adjacent collar assemblies. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 is a front view of a vapor deposition device according to an embodiment of the present invention;

[0022] Figure 2 yes Figure 1 A schematic diagram of a three-dimensional angle of the evaporation device shown in ;

[0023] Figure 3 yes Figure 1 A schematic diagram of the adjustment plate shown in ;

[0024] Figure 4 is a horizontal cross-sectional view of a vapor deposition device according to an embodiment of the present invention;

[0025] Figure 5 is a simulation diagram of a vapor deposition device according to a comparative example of the present invention;

[0026] Figure 6 is a simulation diagram of a vapor deposition device according to an embodiment of the present invention;

[0027] Figure 7 It is a line graph of the thickness of the evaporation film before and after evaporation of an evaporation device according to a comparative example of the present invention;

[0028] Figure 8 is a line graph of the thickness of evaporation films before and after evaporation by an evaporation device according to an embodiment of the present invention;

[0029] Fig. 9 is a front view of a vapor deposition device according to another embodiment of the present invention;

[0030] Fig.10 yes Fig. 9 A schematic diagram of a three-dimensional angle of the evaporation device shown in ;

[0031] Fig.11 is a perspective view of an adjustment plate according to an embodiment of the present invention;

[0032] Fig.12 yes Fig.11 A partial exploded view of the adjustment plate shown in FIG.

[0033] Fig.13 is a top view of an adjustment plate according to an embodiment of the present invention;

[0034] Fig.14 is a top view of an adjustment plate according to another embodiment of the present invention;

[0035] Fig.15 is a perspective view of an adjustment plate according to an embodiment of the present invention;

[0036] Fig.16 yes Fig.15 A partial exploded view of the adjustment plate shown in .

[0037] Reference numerals:

[0038] Evaporation device 100; first region R1; second region R2; first direction F1;

[0039] First steam flow space Z1; second steam flow space Z2;

[0040] Crucible 1; partition 11; flow channel 111; sub-chamber 10;

[0041] Nozzle cover plate 2; nozzle 21; adjustment plate 3; steam hole 31;

[0042] Sub-adjustment plate 32; first sub-adjustment plate 321; second sub-adjustment plate 322;

[0043] Plate body 33; first hole 331; adjustment member 34; cover plate 341; second hole 343;

[0044] Collar assembly 342; collar 3421; heating device 4. DETAILED DESCRIPTION

[0045] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0046] The disclosure below provides many different embodiments or examples to implement different structures of the present invention. In order to simplify the disclosure of the present invention, the parts and settings of specific examples are described below. Of course, they are only examples, and the purpose is not to limit the present invention. In addition, the present invention can repeat reference numbers and / or letters in different examples. This repetition is for the purpose of simplicity and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the present invention provides various specific processes and examples of materials, but those of ordinary skill in the art can be aware of the applicability of other processes and / or the use of other materials.

[0047] During the mass production of OLED (Organic Light-Emitting Diode), it is often necessary to add a large amount of evaporation material to the crucible of the evaporation source, evaporate it through subsequent heating and evaporate it onto the substrate. This process generally takes more than 200 hours. In order to make the evaporation time meet the needs of mass production and ensure that the thickness of the evaporation material on the substrate remains stable, it is necessary to control the evaporation of materials at different positions in the crucible. The mass production process in the related art is adjusted by regional temperature control. However, this method does not have a significant effect on the control of material evaporation. During the long evaporation process, the material is prone to local drying, which causes the local thickness of the evaporation film to decrease.

[0048] In order to solve at least one of the above-mentioned technical problems, the embodiment of the present application proposes a vapor deposition device 100, by setting an adjustment plate 3 and designing the steam holes 31 on the adjustment plate 3 in a regionalized and differentiated manner, so that the opening parameters of each area on the adjustment plate 3 can be specifically set according to the specific conditions such as the burn-out situation and the setting position of the adjustment plate 3, so as to regulate the material consumption rate in different areas of the crucible 1, which is beneficial to improving the problem of local thickness reduction of the vapor deposition film caused by local material burn-out in the crucible 1, improving the thickness uniformity of the vapor deposition material on the substrate, and meeting mass production needs.

[0049] Hereinafter, a vapor deposition device 100 according to an embodiment of the present application will be described with reference to the accompanying drawings.

[0050] Reference Figure 1 and Figure 2The evaporation device 100 includes a crucible 1, a nozzle cover plate 2 and an adjustment plate 3; the crucible 1 is used to contain the evaporation material; the nozzle cover plate 2 is sealed on the top of the crucible 1 and includes a plurality of nozzles 21; the adjustment plate 3 is arranged in a chamber defined by the crucible 1 and the nozzle cover plate 2, and the adjustment plate 3 has a plurality of areas, each area has a plurality of steam holes 31, and the opening parameters of at least two areas are different, and the opening parameters include the aperture and / or hole spacing of the steam hole 31.

[0051] According to the evaporation device 100 of the embodiment of the present application, by setting the adjustment plate 3 and designing the steam holes 31 on the adjustment plate 3 in a regionalized and differentiated manner, the opening parameters of each area on the adjustment plate 3 can be specifically set according to the specific conditions such as the burn-out situation and the setting position of the adjustment plate 3, so as to regulate the material consumption rate in different areas of the crucible 1, which is beneficial to improving the problem of local thickness reduction of the evaporated film caused by local material burn-out in the crucible 1, improving the thickness uniformity of the evaporated material on the substrate, and meeting mass production needs.

[0052] In the embodiments of the present application, refer to Figure 1 and Figure 2 The crucible 1 is used to hold the evaporation material and is usually made of high-temperature resistant and corrosion-resistant materials to ensure stability during long-term high-temperature evaporation; the nozzle cover plate 2 is sealed on the top of the crucible 1, including a plurality of nozzles 21, and the nozzles 21 are used to adjust the flow direction and speed of the steam, thereby guiding the evaporation material to flow to the target substrate; the number of nozzles 21 is not limited to the number shown in the figure, and similarly, the shape of the nozzles 21 is not limited to the cylindrical shape shown in the figure; the adjustment plate 3 is used to adjust the flow and distribution of the steam, and is arranged in a chamber jointly defined by the crucible 1 and the nozzle cover plate 2, such as being arranged in the crucible 1 and / or the nozzle cover plate 2, the number of the adjustment plates 3 can be one or more, the shape and thickness of the adjustment plates 3 are not limited to the shape and thickness shown in the figure, and the design should be based on the function of adjusting the flow and distribution of the steam.

[0053] In the embodiment of the present application, the adjustment plate 3 has multiple areas, and the parameters of the steam holes 31 in each area are designed differently to achieve corresponding control of the consumption rate of materials in different areas of the crucible 1; the steam holes 31 are channels for steam to enter and exit on the adjustment plate 3, and the number of steam holes 31 is not limited to the number shown in the figure. Similarly, the shape of the steam holes 31 is not limited to the circle shown in the figure, and can be polygonal, irregular, or other shapes that can achieve its steam inlet and outlet channel function; the distribution of the steam holes 31 is not limited to the linear arrangement shown in the figure, and can be a matrix arrangement, a radial arrangement, etc., or can also be a disordered arrangement; the aperture of the steam hole 31 refers to the equivalent diameter, and the equivalent diameter refers to the diameter of a circular tube that is equivalent to the hydraulic characteristics of a non-circular tube; the hole spacing of the steam holes 31 is the distance between the centers of two steam holes 31.

[0054] In some embodiments, reference Figure 3 The adjustment plate 3 has a first region R1 and a second region R2, the aperture D1 of the steam holes 31 in the first region R1 is larger than the aperture D2 of the steam holes 31 in the second region R2; and / or, the hole spacing H1 of the steam holes 31 in the first region R1 is smaller than the hole spacing H2 of the steam holes 31 in the second region R2.

[0055] There are three situations described above: the aperture of the steam holes 31 in the first region R1 is larger than the aperture of the steam holes 31 in the second region R2; or the hole spacing of the steam holes 31 in the first region R1 is smaller than the hole spacing of the steam holes 31 in the second region R2; or the aperture of the steam holes 31 in the first region R1 is larger than the aperture of the steam holes 31 in the second region R2, and the hole spacing of the steam holes 31 in the first region R1 is smaller than the hole spacing of the steam holes 31 in the second region R2.

[0056] In all three cases, it is relatively easy to make the flow rate of the first region R1 greater than the flow rate of the second region R2, so that the region that needs to adjust the material consumption rate can be set to the first region R1 or the second region R2 according to the specific conditions such as the burning-out condition in the crucible 1 and the setting position of the adjustment plate 3, so that the material consumption rate of each region in the crucible 1 is relatively uniform, thereby effectively improving the problem of the local thickness reduction of the vapor deposition film caused by the local material burning-out in the crucible 1. In addition, by setting the above-mentioned at least two regions, namely the first region R1 and the second region R2, on the adjustment plate 3, and determining and designing the opening parameters of the two regions, the scheme is simple and easy to implement, which is conducive to simplifying the layout design of the steam hole 31.

[0057] In some embodiments, reference Figure 1-Figure 2 A plurality of partitions 11 are provided in the crucible 1 along the first direction F1 to divide the space in the crucible 1 into a plurality of sub-cavities 10 arranged along the first direction F1, that is, the partition 11 is provided between two adjacent sub-cavities 10, the adjusting plate 3 is arranged higher than the partition 11, and a first steam flow space Z1 is formed between the bottom surface of the adjusting plate 3 and the upper end of the partition 11.

[0058] Reference Figure 1-Figure 2When the adjustment plate 3 is higher than the partition 11, a connected steam flow space is formed between the bottom surface of the adjustment plate 3 and the upper end of the partition 11, namely, the first steam flow space Z1. Since the steam can flow freely in this space, the flow distribution of the steam can be optimized by adjusting the configuration of the steam holes 31 on the adjustment plate 3. For example, for the area prone to dry-out (such as the two end areas of the crucible 1 along the first direction F1), the first area R1 is correspondingly set on the adjustment plate 3, and the steam holes 31 are selected with a large aperture and / or a small hole spacing, while in other areas (i.e., areas where dry-out is not likely to occur), the second area R2 is correspondingly set on the adjustment plate 3, and the steam holes 31 are selected with a small aperture and / or a large hole spacing. Such a design can drive the steam entering the first steam flow space Z1 to flow to the first areas R1 at both ends, so that the evaporation material is more concentrated in the first area R1, which is conducive to improving the problem of excessive material consumption rate in the area prone to dry-out, resulting in a decrease in the thickness of the evaporation film.

[0059] In addition, since the adjustment plate 3 is arranged higher than the partition 11, the adjustment plate 3 above each sub-cavity 10 can be a whole piece, so that only one adjustment plate 3 is installed, which is convenient for later repair and maintenance, and improves assembly efficiency. Of course, the present application is not limited to this. For example, in other embodiments of the present application, when the adjustment plate 3 is arranged higher than the partition 11, the adjustment plates 3 above the sub-cavities 10 can also be arranged separately as needed.

[0060] Exemplarily, the first direction F1 may be the length direction of the crucible 1 , and also the length direction of the adjustment plate 3 .

[0061] In the embodiment of the present application, the number of partitions 11 is not limited to the number shown in the figure, and the thickness of the partition 11 is not limited to the thickness shown in the figure. The material of the partition 11 can be a material with good thermal conductivity, so that the temperature of the two adjacent sub-cavities 10 is uniform, the consistency of the material consumption rate of each sub-cavity 10 is improved, and the phenomenon that the material of the individual sub-cavity 10 is preferentially dried is improved. Exemplarily, the partition 11 can be a metal plate such as a copper plate or an aluminum plate. In addition, the shape of the partition 11 is not limited to the flat plate shape shown in the figure, for example, it can also be a curved plate shape, etc., which should be based on the ability to divide the space in the crucible 1 into a plurality of sub-cavities 10. Exemplarily, there is a flow channel 111 connecting two adjacent sub-cavities 10 on or below the partition 11, so that the liquid level of the evaporation material in each sub-cavity 10 remains balanced. Of course, a non-flowing solid evaporation material can also be set in the crucible 1, which is not limited here.

[0062] In some embodiments, reference Figure 4The crucible 1 is heated by the heating device 4 surrounding the crucible 1. At this time, among the multiple sub-cavities 10 spaced apart along the first direction F1 in the crucible 1, the two sub-cavities 10 at the two ends of the first direction F1 have relatively large heating surfaces, receive more heat, consume materials faster, and are easy to dry out the materials first. Figure 1-Figure 3 There are two first regions R1, and the two first regions R1 are arranged at both ends of the second regions R2 in the first direction F1, so that the first regions R1 are respectively distributed at both ends of the second region R2 in the first direction F1. In this way, the steam entering the first steam flow space Z1 can be driven to flow to the first regions R1 at both ends, so that the evaporation material is more concentrated in the first region R1, which is conducive to improving the problem of excessive material consumption rate at the two end regions that are prone to dry-out, resulting in a decrease in the thickness of the evaporation film.

[0063] Exemplarily, the heating device may be a heating wire wound around the side wall of the crucible 1 near the bottom of the crucible 1 .

[0064] For example, in combination Figure 1-Figure 3 , the crucible 1 is divided into five sub-cavities 10 arranged from left to right, which are named as the first sub-cavity, the second sub-cavity, the third sub-cavity, the fourth sub-cavity and the fifth sub-cavity from left to right, wherein the first sub-cavity and the fifth sub-cavity are heated relatively more, and the material consumption rate is relatively fast, and the first area R1 of the adjustment plate 3 is arranged above these two areas, and the second area R2 of the adjustment plate is arranged above the second sub-cavity, the third sub-cavity and the fourth sub-cavity; at this time, the evaporation material flows from the second to the fourth sub-cavities to the first and the fifth sub-cavities, so that the material consumption rates of the first sub-cavity, the second sub-cavity, the third sub-cavity, the fourth sub-cavity and the fifth sub-cavity tend to be consistent, so that the first sub-cavity and the fifth sub-cavity are not easy to be dried out, the problem of the thickness of the evaporation film is reduced, and the uniformity of the thickness of the evaporation film is improved.

[0065] In this way, in view of the situation that the two ends in the long side direction of the above-mentioned crucible are heated more and the material at both ends of the crucible is consumed faster, during the long-term evaporation process in mass production, especially after more than 180 hours, it is very easy for the material at both ends of the crucible to burn out, resulting in a decrease in the thickness of the evaporation film at the evaporation edge; the embodiment of the present application adjusts the opening parameters of different areas of the adjustment plate 3 to achieve the regulation of the evaporation rate of the material in different areas of the crucible 1, thereby controlling the material consumption rate at both ends of the crucible 1, reducing the possibility of the material burning out at both ends of the crucible 1, ensuring the smooth progress of mass production and extending the mass production time as much as possible.

[0066] In some embodiments, reference Figure 3, the distance between the two steam holes 31 farthest from each other along the first direction F1 in the first region R1 is a first length value A1, the distance between the two steam holes 31 farthest from each other along the first direction F1 in the second region R2 is a second length value A2, and the length of the adjustment plate 3 along the first direction F1 is a third length value X, wherein the first length value A1 is 0.23 to 0.27 times of the second length value A2, for example, 0.23 times, 0.24 times, 0.25 times, 0.26 times, or 0.27 times, etc., and / or the first length value A1 is 0.15 to 0.25 times of the third length value X, for example, 0.15 times, 0.18 times, 0.20 times, 0.22 times, or 0.25 times, etc. Exemplarily, the third length value X may be greater than or equal to 0.5 m.

[0067] By limiting the length ratio of the first region R1 and the second region R2, this design can more effectively regulate the material consumption rate of the above-mentioned area prone to burnout, reduce the problem of reduced thickness of the evaporated film, and improve the uniformity of the thickness of the evaporated film. Specifically, for the current 6-generation line substrate size, the size of the adjustment plate 3 used is relatively small, for example, the length of the adjustment plate 3 is usually 1m-1.5m, and the first length value A1 can be used to be 0.23 to 0.27 times the second length value A2 to design the adjustment plate 3; for future high-generation lines, the size of the adjustment plate 3 used is increased, for example, the size of the 8-generation line substrate and the size of the 10-generation line substrate, the length of the adjustment plate 3 is increased to 2m and 3m respectively, at this time, the problem of local material burnout caused by poor uniformity will become more serious, at this time, the first length value A1 can be used to be 0.15 to 0.25 times the third length value X to design the adjustment plate 3. It can be understood that low-generation line and high-generation line are terms commonly used in the field of display panel manufacturing. Low-generation lines are used to produce display panels with smaller sizes, and high-generation lines are used to produce display panels with relatively larger sizes.

[0068] In some embodiments, reference Figure 3 , the plurality of steam holes 31 of the first region R1 are arranged at intervals along the first direction F1; and / or, the plurality of steam holes 31 of the second region R2 are arranged at intervals along the first direction F1.

[0069] There are three situations as above: the multiple steam holes 31 of the first region R1 are arranged at intervals along the first direction F1; the multiple steam holes 31 of the second region R2 are arranged at intervals along the first direction F1; the multiple steam holes 31 of the first region R1 and the multiple steam holes 31 of the second region R2 are both arranged at intervals along the first direction F1.

[0070] Therefore, by arranging the plurality of steam holes 31 on the adjustment plate 3 to be spaced apart along the first direction F1 , the distribution design of the steam holes 31 is simplified, making the production and processing of the adjustment plate 3 more convenient, which is conducive to improving production efficiency.

[0071] In order to demonstrate the improved effect of the evaporation device 100 of the embodiment of the present application, an experimental comparison between the embodiment and the comparative example is conducted. Figure 1-Figure 4 In the adopted embodiment, a plurality of partitions 11 arranged at intervals along a first direction F1 are provided in the crucible 1 to divide the space in the crucible 1 into a plurality of sub-cavities 10 arranged along the first direction F1, that is, the partition 11 is separated between two adjacent sub-cavities 10, the adjusting plate 3 is arranged higher than the partition 11, and a first steam flow space Z1 is formed between the bottom surface of the adjusting plate 3 and the upper end of the partition 11, the crucible 1 is heated by a heating device 4 surrounding the crucible 1, there are two first regions R1, and the two first regions R1 are arranged at both ends of the entire second region R2 in the first direction F1, so that the first regions R1 are respectively distributed at both ends of the second region R2 in the first direction F1. The difference between the adopted comparative example and the embodiment is that the comparative example cancels the adjusting plate.

[0072] Figure 5 This is a simulation diagram of the evaporation of the evaporation device of the comparative example, which only cuts off half of the length of the evaporation device 100 along the first direction F1. Figure 6 1 is a simulation diagram of the evaporation device of the embodiment, which only captures half of the length of the evaporation device 100 along the first direction F1. Figure 5 , the evaporation material in comparative example 5 tends to move from the end (such as the left end) to the middle (the dotted line). This is because the end (such as the left end) is heated more and evaporates faster, so the material number density is large, while the middle is heated less, evaporates slower, and the material number density is small. There is a pressure difference between the middle (the dotted line) and the end (such as the left end); in the embodiment using the adjustment plate 3, the reference Figure 6 , the vapor deposition material tends to move from the middle (dashed line) to the end (such as the left end). This is because the steam holes above the end (such as the left end) have a larger aperture and a smaller hole spacing, and the vapor deposition material can easily pass through the steam holes here, resulting in a low air pressure at the end (such as the left end). The steam holes above the middle (dashed line) have a smaller aperture and a larger hole spacing, and the vapor deposition material cannot easily pass through the steam holes here, while the air pressure in the middle is high, thereby driving the steam to move from the middle (dashed line) to the end (such as the left end), making the vapor deposition material consumption at the end (such as the left end) less than that in the middle, so that it is not easy to dry out, reducing the problem of decreased vapor deposition film thickness, and improving the uniformity of vapor deposition film thickness.

[0073] Figure 7 It is a line graph of the thickness of the evaporation film of the comparative evaporation device in the early and late stages of evaporation. Figure 8It is a line graph of the thickness of the evaporated film in the early and late stages of the evaporation of the evaporation device of the embodiment, wherein the horizontal axis is the detection points respectively set above the multiple sub-cavities, and the vertical axis is the thickness of the evaporated film of the substrate detected at the detection point position; the vertical axis value is a normalized value and does not represent the actual film thickness. The setting position of the detection point can be determined according to the actual situation of the production line, wherein detection points 1 and 5 are detection points in the area prone to dry-out; the early stage refers to the time period when dry-out does not occur, usually 0-180 hours, and the late stage refers to the time period when dry-out occurs, usually after 180 hours. The substrate moves in a direction perpendicular to the first direction F1 (for example, if the first direction F1 is the length direction of the evaporation device, then the substrate moves in the width direction of the evaporation device).

[0074] As can be seen from the figure, the reference Figure 7 When the adjustment plate is not used, the thickness of the evaporated film at the later detection points 1 and 5 decreases significantly, which is due to the drying phenomenon at the end of the length direction of the evaporation source; while the thickness of the evaporated film at the detection points 2, 3, and 4 is basically the same before and after the later stages; Figure 8 When the adjustment plate 3 of this embodiment is used, the thickness of the evaporated film at all detection points before and after is basically the same, which indicates that the drying phenomenon at the end of the length direction of the late evaporation source is improved, the problem of the decrease in the thickness of the evaporated film is reduced, and the uniformity of the thickness of the evaporated film is improved.

[0075] Based on the above comparison, in the comparative example, the evaporation condition of the evaporation material in the crucible cannot be adjusted. When long-term evaporation for more than 200 hours of mass production is carried out, in order to extend the mass production time, the evaporation material will be added to the highest point of the partition plate in the crucible to ensure that the crucible is full of material and start evaporation. However, when the mass production is carried out for more than 180 hours, the material in the crucible will be partially burned out. At this time, there is no material at the two ends of the long side of the crucible, while there is still 10-20% of material remaining in the middle. Although mass production can continue in this case, even if the temperature at both ends of the evaporation source is increased by 40-50°C, the thickness of the evaporated film at both ends of the substrate will still decrease, resulting in substandard product performance.

[0076] In order to solve the problem of material drying out encountered in the above mass production, the above embodiment adopts an adjustment plate 3. The openings of the adjustment plate 3 are enlarged at the two ends relative to the middle, and the spacing between the openings is reduced, so that the openings are concentrated at the two ends and sparse in the middle, but the overall opening rate of the adjustment plate 3 must be controlled to meet the requirements of evaporation (for example, when adjusting the opening parameters, in order to control the overall opening rate of the adjustment plate 3, some basic holes with equal apertures can be designed on the adjustment plate 3 to meet the steam outflow requirements required for evaporation. After that, the aperture of the basic holes is increased at the two ends, and the aperture of the basic holes is reduced in the middle, so that the total increased opening area at the two ends is equal to the total reduced opening area in the middle, that is, the overall opening rate of the adjustment plate remains unchanged before and after the change, so as to meet the steam outflow requirements required for evaporation).

[0077] Therefore, by using different opening positions and aperture size distributions, the material consumption at both ends during evaporation can be controlled to decrease, and at the same time, the material after vaporization tends to be discharged preferentially from the openings at both ends that are larger and denser, further ensuring that the material will not be burned out at both ends of the evaporation source, ensuring the smooth progress of mass production and extending the mass production time as much as possible. That is, through the embodiments of the present invention, the flexible and differentiated design of the openings at different positions of the adjustment plate in the evaporation source is used to control the flow of gas materials inside the evaporation source, avoiding the problem of reduced evaporation film thickness caused by local material drying.

[0078] When a plurality of partitions 11 are arranged in the crucible 1 at intervals along the first direction F1 to divide the space in the crucible 1 into a plurality of sub-cavities 10 arranged along the first direction F1, the adjustment plate 3 may also be arranged not higher than the partitions 11. Figure 9-10 The adjustment plate 3 may include a sub-adjustment plate 32 respectively arranged in each sub-cavity 10, the sub-adjustment plate 32 is flush with or lower than the upper end of the partition 11 so as to be located in the upper area of ​​the partition 11 (for example, within a range of 5 mm from the upper end of the partition 11), and a second steam flow space Z2 is formed between the top surface of the adjustment plate 3 and the nozzle cover plate 2.

[0079] In this embodiment, by separately setting a sub-adjustment plate 32 above each sub-cavity 10, each sub-adjustment plate 32 can set the opening parameters separately as needed, so that the application range becomes wider, the assembly is more flexible, and the flow regulation is more precise.

[0080] Reference Figure 9-10 When the adjustment plate 3 is lower than the upper end of the partition 11, for the areas prone to dry-out (such as the two end areas of the crucible 1 along the first direction F1), the second area R2 is correspondingly set on the adjustment plate 3, and the steam holes 31 are selected with a small aperture and / or a large hole spacing, so that the steam outflow rate of these areas is slowed down, thereby reducing the risk of dry-out; and in other areas (i.e., areas where dry-out is not likely to occur), the first area R1 is correspondingly set on the adjustment plate 3, and the steam holes 31 are selected with a large aperture and / or a small hole spacing, so that the steam outflow rate of these areas is relatively large, and the steam is supplied toward the top of the second area R2 in the second steam flow space Z2, so that the evaporation process proceeds smoothly and the uniformity of the coating thickness is improved.

[0081] In some embodiments, reference Figure 9-10 , when the crucible 1 is heated by a heating device surrounding the crucible 1 (combined with Figure 4), the sub-adjustment plates 32 can be of two types, wherein the sub-adjustment plates 32 only provided in the first region R1 are the first sub-adjustment plates 321, and the sub-adjustment plates 32 only provided in the second region R2 are the second sub-adjustment plates 322, and there are two second sub-adjustment plates 322, and the two second sub-adjustment plates 322 are provided at both ends of all the first sub-adjustment plates 321 in the first direction F1, that is, the second sub-adjustment plates 322 are respectively distributed at both ends of all the first sub-adjustment plates 321 in the first direction F1. Thus, the steam outflow rate at the two ends that are prone to dry burning can be controlled to slow down, thereby improving the problem of easy dry burning in this area, and the steam outflowing from the remaining areas can be driven to be replenished toward the upper ends of the two ends, thereby making the thickness of the evaporated film uniform.

[0082] For example, in combination Fig. 9 and Fig.10 , the crucible 1 is divided into five sub-chambers 10 arranged from left to right, which are named as the first sub-chamber, the second sub-chamber, the third sub-chamber, the fourth sub-chamber and the fifth sub-chamber from left to right, wherein the first sub-chamber and the fifth sub-chamber are heated relatively more and the material consumption rate is relatively fast, and a second sub-adjustment plate 322 is arranged above these two areas; a first sub-adjustment plate 321 is arranged above the second to fourth sub-chambers; the steam flow rate entering the second steam flow space Z2 through the steam hole 31 on the second sub-adjustment plate 322 is small, while the steam flow rate entering the second steam flow space Z2 through the steam hole 31 on the first sub-adjustment plate 321 is large, so that the material consumption rate of the first sub-chamber and the fifth sub-chamber is smaller than the material consumption rate of the second to fourth sub-chambers, so that the first sub-chamber and the fifth sub-chamber are not prone to dry-out, and the steam in the second steam flow space Z2 is easily replenished toward the second sub-adjustment plate 322, reducing the problem of decreased thickness of the evaporated film and improving the uniformity of the thickness of the evaporated film.

[0083] In some embodiments, reference Fig. 9 and Fig.10 When the adjustment plate 3 includes a first sub-adjustment plate 321 and a second sub-adjustment plate 322, the plurality of steam holes 31 in the first region R1 may be arranged at intervals along the first direction F1; and / or the plurality of steam holes 31 in the second region R2 may be arranged at intervals along the first direction F1.

[0084] There are three situations as above: the multiple steam holes 31 of the first region R1 are arranged at intervals along the first direction F1; the multiple steam holes 31 of the second region R2 are arranged at intervals along the first direction F1; the multiple steam holes 31 of the first region R1 and the multiple steam holes 31 of the second region R2 are both arranged at intervals along the first direction F1.

[0085] Therefore, by arranging the plurality of steam holes 31 on the adjustment plate 3 to be spaced apart along the first direction F1 , the distribution design of the steam holes 31 is simplified, making the production and processing of the adjustment plate 3 more convenient, which is conducive to improving production efficiency.

[0086] In some embodiments, reference Fig.11 and Fig.12 The adjustment plate 3 includes: a plate body 33 and an adjustment member 34, the plate body 33 has a plurality of first holes 331; the adjustment member 34 has a second hole 343, at least one first hole 331 is covered by the adjustment member 34, and the covered single first hole 331 is correspondingly connected to the single second hole 343, and the aperture of the second hole 343 is less than or equal to the aperture of the first hole 331.

[0087] The regulating member 34 is a component that can be installed on the plate body 33 to adjust the steam flow. By way of example, the installation method is not limited and can be a fixed connection such as snap connection, screw connection, bonding, etc., or a movable connection such as a slide connection, a magnetic connection, etc.

[0088] At least one first hole 331 is covered by the adjusting member 34 means that the position and size of the adjusting member 34 are designed to cover one or more first holes 331 on the plate body 33; the first hole 331 on the covered plate body 33, when in use, and the channel formed together with the second hole 343 connected thereto serves as the steam hole 31. At this time, the aperture of the second hole 343 is the aperture of the steam hole 31, and the uncovered first hole 331 can be directly used as the steam hole 31. At this time, the aperture of the first hole 331 is the aperture of the steam hole 31, and the number of uncovered first holes 331 can be zero or more.

[0089] The corresponding connection should be understood as steam can enter the second hole 343 through the first hole 331. Exemplarily, the second hole 343 can completely fall within the contour range of the first hole 331, or a part of the second hole 343 can fall within the contour range of the first hole 331. The shapes of the first hole 331 and the second hole 343 are not limited to the circular shape shown in the figure, and can also be elliptical, rectangular or polygonal, etc.

[0090] By arranging the adjusting member 34 on the plate body 33, the aperture size of the steam hole 31 can be conveniently adjusted, or by adjusting the installation position of the adjusting member 34, the center position of the steam hole 31 can be adjusted, thereby adjusting the hole spacing to achieve the required steam distribution and flow rate adjustment; since the adjusting member 34 can be designed and manufactured independently of the plate body 33, the production and processing is more convenient, and the adjusting member 34 can be replaced or adjusted according to different application requirements and usage scenarios to adapt to different steam flow rates, flow directions and distribution requirements, thereby reducing the material consumption in areas prone to dry-out to reduce the risk of dry-out.

[0091] Therefore, by setting the adjustment part 34, local block design can be carried out to realize free adjustment of the size and position of the opening of the adjustment plate 3, which is convenient for the adjustment and production of the adjustment plate 3 and can save the cost of use. When the mass production demand changes, the spare parts procurement cost and the time cost of the production cycle can be saved to a great extent.

[0092] In some embodiments, reference Fig.11 and Fig.12 The adjusting member 34 includes at least one cover plate 341 , and each cover plate 341 is provided with at least one second hole 343 .

[0093] As a part of the regulating member 34, the cover plate 341 can be installed, removed or adjusted in position to adapt to the steam flow, flow direction and distribution requirements of different areas. The cover plate 341 is easy to process and can reduce the difficulty of assembly and processing.

[0094] The shape of the cover plate 341 is not limited to the rectangular shape shown in the figure, and may also be other shapes such as a circle, a polygon, etc.

[0095] Exemplarily, there is only one cover plate 341, and the cover plate 341 is set at the position where the hole needs to be shrunk or the hole spacing needs to be adjusted, so that the second hole 343 on the cover plate 341 can be used to change the aperture or hole spacing of the steam hole 31. By replacing the cover plate 341 with different apertures, hole shapes or numbers of holes, the evaporation process can be adjusted more flexibly, and since there is only one cover plate 341, it is convenient to install and maintain during production; exemplarily, there are multiple cover plates 341. In this case, the cover plates 341 can be set separately at the positions where the aperture or hole spacing needs to be adjusted as needed, which can achieve more flexible adjustment, thereby meeting various complex evaporation needs.

[0096] In some embodiments, reference Fig.13 and Fig.14 There are multiple cover plates 341, and the apertures of the second holes 343 on at least two cover plates 341 are different.

[0097] The design of multiple cover plates 341 provides greater flexibility. The size and shape of the second hole 343 on each cover plate 341 can be processed according to specific evaporation requirements. By combining different cover plates 341, it is possible to more accurately control the consumption of evaporation materials in each area, reduce the possibility of a decrease in the thickness of the evaporation film due to local burning in the later stage of evaporation, and improve the uniformity of the thickness of the evaporation film.

[0098] In some embodiments, reference Fig.13 A second hole 343 is provided on each cover plate 341 , the total number of the cover plates 341 is the same as the total number of the first holes 331 and are provided in one-to-one correspondence, and an adjustable gap is provided between at least two adjacent cover plates 341 .

[0099] Since each first hole 331 has a corresponding cover plate 341 and each cover plate 341 is provided with a second hole 343, the channel formed by the one-to-one correspondence between the first hole 331 and the second hole 343 serves as the steam hole 31, thereby realizing precise adjustment of the flow of each steam channel by selecting cover plates 341 with different apertures.

[0100] The adjustable gap means that the gap size between two adjacent cover plates 341 can be adjusted within a certain range. Due to the existence of the adjustable gap, the relative position between the cover plates 341 can be adjusted according to actual needs during the production process, thereby changing the hole spacing between adjacent steam holes 31. Exemplarily, when the relative position between the cover plates 341 is adjusted, the second hole 343 can still completely fall within the contour range of the first hole 331, so that the shape and area of ​​the steam hole 31 remain unchanged. At this time, only the hole spacing between adjacent steam holes 31 can be changed; or, for example, when the relative position between the cover plates 341 is adjusted, the overlap between the second hole 343 and the first hole 331 changes, so that the shape and area of ​​the steam hole 31 change, and the aperture of the steam hole 31 also changes; this design increases the controllability and flexibility of the evaporation process. By combining different cover plates 341, it is possible to achieve more accurate control of the consumption of evaporation materials in each area, reducing the possibility of a decrease in the thickness of the evaporation film due to local drying in the later stage of evaporation.

[0101] Of course, the present application is not limited thereto. Fig.14 , a plurality of second holes 343 may also be provided on at least one cover plate 341 so that one cover plate 341 can cover a plurality of first holes 331 at the same time, thereby reducing the number of cover plates 341 , simplifying assembly, and reducing costs.

[0102] The form of the adjusting member 34 is not limited to the cover plate 341. For example, in some embodiments, Fig.15 and Fig.16 The adjusting member 34 includes at least one collar assembly 342. A single collar assembly 342 is arranged corresponding to a single first hole 331. The collar assembly 342 includes a plurality of collars 3421 with different diameters. The plurality of collars 3421 are arranged in sequence. The ring hole of the innermost collar 3421 constitutes the second hole 343.

[0103] The collar assembly 342 refers to an assembly composed of multiple collars 3421 with different diameters. These collars 3421 are nested together in order of diameter from large to small or from small to large to form a structure that can adjust the size of the central aperture. When multiple collars 3421 are nested together, the central hole of the innermost collar 3421 constitutes the "second hole 343" of the entire collar assembly 342. By setting collars 3421 with different numbers of circles, the aperture of the second hole 343 defined by the collar assembly 342 is different. Among them, the shape of the collar 3421 is not limited to the circular ring shown in the figure. For example, it can also be other closed ring shapes such as rectangle and polygon.

[0104] By applying the collar assembly 342, the aperture size and hole spacing can be adjusted as needed during production to achieve the required steam distribution and flow regulation; since the collar assembly 342 can be designed and manufactured independently of the plate body 33, production and processing are more convenient, and the collar assembly 342 can be replaced or adjusted according to different application requirements and usage scenarios to adapt to different steam flow rates, flow directions and distribution requirements, thereby reducing the material consumption in areas prone to dry-out to reduce the risk of dry-out.

[0105] In some embodiments, reference Figure 15-16 There are multiple ring assemblies 342, and the specifications of the rings 3421 included in each ring assembly 342 are consistent. The number of rings 3421 selected by at least two ring assemblies 342 arranged on the plate body 33 is different, so that the innermost rings 3421 used by at least two ring assemblies 342 are different, so that the apertures of the second holes 343 defined by the at least two ring assemblies 342 are different.

[0106] The number of turns of the selected ring 3421 is different between at least two ring assemblies 342 arranged on the plate body 33, which means that although the specifications of the rings 3421 inside each ring assembly 342 are consistent, the diameter of the innermost ring 3421 (that is, the ring 3421 constituting the second hole 343) can be adjusted between different ring assemblies 342 by changing the number of nested rings 3421. By selecting ring assemblies 342 with different numbers of turns and / or different shapes, the user can adjust the diameter and shape of the steam hole 31, thereby optimizing the flow and distribution of the evaporation material. At the same time, since the specifications of the ring 3421 of each ring assembly 342 are consistent, this also simplifies the process of replacing and adjusting the ring 3421, thereby improving the ease of use and maintainability of the evaporation device 100.

[0107] Exemplarily, the aperture of the outermost ring 3421 is larger than the aperture of the first hole 331, so that the outermost ring 3421 can be used to achieve positioning and fixation with the plate body 33, and the aperture of the inner ring 3421 adjacent to the outermost ring can be smaller than the aperture of the first hole 331, so that the total number of rings 3421 in the ring assembly 342 can be saved, thereby reducing costs.

[0108] Exemplarily, when the specifications of the rings 3421 included in each ring assembly 342 are consistent, the outermost ring 3421 of each ring assembly 342 can be selected for use, so that the outer diameter of each ring assembly 342 is consistent. In this way, the number of circles of the ring 3421 used can be reduced, and the innermost ring 3421 used in the ring assembly 342 can be different.

[0109] In some embodiments, reference Figure 15-16 The total number of the collar assemblies 342 is the same as the total number of the first holes 331 and are arranged in one-to-one correspondence, and there is an adjustable gap between at least two adjacent collar assemblies 342.

[0110] The innermost ring 3421 of the ring assembly 342 constitutes the second hole 343. The total number of the ring assemblies 342 is the same as the total number of the first holes 331. The channel formed by the one-to-one correspondence between the first holes 331 and the second holes 343 serves as the steam hole 31. This design allows the aperture of each steam hole 31 to be adjusted by the corresponding ring assembly 342, thereby meeting the requirements for adjusting the flow and distribution of the evaporation material during the evaporation process.

[0111] Since there is an adjustable gap between at least two adjacent collar assemblies 342, the relative position between the collar assemblies 342 can be adjusted according to actual needs during the production process, thereby changing the hole spacing between adjacent steam holes 31. Exemplarily, when the relative position between the collar assemblies 342 is adjusted, the second hole 343 can still completely fall within the contour range of the first hole 331, so that the shape and area of ​​the steam hole 31 remain unchanged, and the hole spacing between adjacent steam holes 31 is changed; or, exemplarily, when the relative position between the collar assemblies 342 is adjusted, the overlap between the second hole 343 and the first hole 331 changes, so that the shape and area of ​​the steam hole 31 change, and the aperture of the steam hole 31 also changes at this time; this design increases the controllability and flexibility of the evaporation process. By combining different collar assemblies 342, it is possible to achieve more accurate control of the consumption of evaporation materials in each area, reduce the possibility of a decrease in the thickness of the evaporation film due to local drying in the late stage of evaporation, and improve the uniformity of the thickness of the evaporation film; the design of the adjustable gap is also convenient for the maintenance and replacement of the collar assemblies 342.

[0112] In the embodiment of the present application, the connection method of two adjacent rings 3421 in the ring assembly 342 is not limited. For example, they can have overlapping ears and can be fixed by overlapping. For example, they can be fixed by interference fit, adhesive fit, etc.

[0113] Exemplarily, when the collar 3421 is in an elongated strip shape and the first holes 311 are a plurality of circular holes, one collar assembly 342 may be provided to be opposite to the plurality of first holes 311 at the same time.

[0114] Other components of the evaporation device 100 according to the embodiment of the present invention, such as the crucible 1 and the nozzle cover plate 2 , and operations thereof are known to those skilled in the art and will not be described in detail herein.

[0115] In the description of the present invention, it should be understood that the terms "center", "length", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "top", "bottom", "inside", etc., indicating the orientation or position relationship are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0116] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0117] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0118] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0119] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A vapor deposition device, characterized in that: include: A crucible, wherein the crucible is used to contain the evaporation material; A nozzle cover plate, the nozzle cover plate is sealed on the top of the crucible and includes a plurality of nozzles; An adjustment plate, wherein the adjustment plate is arranged in a chamber defined by the crucible and the nozzle cover plate, wherein the adjustment plate has a plurality of regions, each of the regions has a plurality of steam holes, and at least two of the regions have different opening parameters, wherein the opening parameters include the pore diameter and / or hole spacing of the steam holes.

2. The evaporation device according to claim 1, characterized in that: The adjustment plate has a first area and a second area, the aperture of the steam holes in the first area is larger than the aperture of the steam holes in the second area; and / or the hole spacing of the steam holes in the first area is smaller than the hole spacing of the steam holes in the second area.

3. The evaporation device according to claim 2, characterized in that: The crucible is provided with a plurality of partitions spaced apart along a first direction to divide the space in the crucible into a plurality of sub-cavities arranged along the first direction; the adjustment plate is arranged higher than the partitions, and a first steam flow space is formed between the bottom surface of the adjustment plate and the upper end of the partition.

4. The evaporation device according to claim 3, characterized in that: The crucible is heated by a heating device surrounding the crucible. There are two first regions, and the two first regions are arranged at both ends of all the second regions in the first direction.

5. The evaporation device according to claim 4, characterized in that: The distance between the two steam holes in the first area that are farthest from each other along the first direction is a first length value, the distance between the two steam holes in the second area that are farthest from each other along the first direction is a second length value, and the length of the adjustment plate along the first direction is a third length value, wherein the first length value is 0.23 to 0.27 times the second length value, and / or the first length value is 0.15 to 0.25 times the third length value.

6. The evaporation device according to claim 2, characterized in that: The crucible is provided with a plurality of partitions spaced apart along a first direction to divide the space in the crucible into a plurality of sub-cavities arranged along the first direction, the adjustment plate comprises a sub-adjustment plate respectively arranged in each of the sub-cavities, the sub-adjustment plate is flush with or lower than the upper end of the partition so as to be located in the upper area of ​​the sub-cavity, and a second steam flow space is formed between the top surface of the adjustment plate and the nozzle cover plate.

7. The evaporation device according to claim 6, characterized in that: The crucible is heated by a heating device surrounding the crucible, the sub-adjustment plate set only in the first area is a first sub-adjustment plate, the sub-adjustment plate set only in the second area is a second sub-adjustment plate, there are two second sub-adjustment plates, and the two second sub-adjustment plates are set at both ends of all the first sub-adjustment plates in the first direction.

8. The evaporation device according to any one of claims 3 to 7, characterized in that: The plurality of steam holes in the first region are arranged at intervals along the first direction; and / or the plurality of steam holes in the second region are arranged at intervals along the first direction.

9. The evaporation device according to claim 1, characterized in that: The adjustment plate comprises: a plate body having a plurality of first holes; and An adjusting member having a second hole, at least one of the first holes is covered by the adjusting member, and the covered single first hole is correspondingly connected to the single second hole, and the aperture of the second hole is smaller than or equal to the aperture of the first hole.

10. The evaporation device according to claim 9, characterized in that: The adjusting member comprises at least one cover plate, and each of the cover plates is provided with at least one second hole.

11. The evaporation device according to claim 10, characterized in that: There are multiple cover plates, and the second holes on at least two of the cover plates have different apertures.

12. The evaporation device according to claim 11, characterized in that: One second hole is arranged on each of the cover plates, the total number of the cover plates is the same as the total number of the first holes and are arranged in one-to-one correspondence, and an adjustable gap is provided between at least two adjacent cover plates.

13. The evaporation device according to claim 9, characterized in that: The adjusting member comprises at least one collar assembly, a single collar assembly is arranged corresponding to a single first hole, the collar assembly comprises a plurality of collars with different diameters, the plurality of collars are arranged in sequence, and the ring hole of the innermost collar constitutes the second hole.

14. The evaporation device according to claim 13, characterized in that: There are multiple ring assemblies, and the specifications of the rings contained in each ring assembly are consistent. The number of rings selected by at least two ring assemblies arranged on the plate body is different, and the innermost rings used by at least two ring assemblies are different.

15. The evaporation device according to claim 14, characterized in that: The total number of the collar components is the same as the total number of the first holes and are arranged in one-to-one correspondence, and there is an adjustable gap between at least two adjacent collar components.

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