High-transparency high-performance four-silver glass and preparation method thereof

Abstract

The invention relates to the technical field of glass films, in particular to high-transmittance and high-performance four-silver glass and a preparation method thereof.The high-transmittance and high-performance four-silver glass comprises a surrounding main layer end bottoming layer, and the inner side of the surrounding main layer end bottoming layer is provided with a heat adsorption composite layer end, a metal protection layer end, a third middle dielectric layer, a second middle dielectric layer and a first middle dielectric layer; the surrounding main layer end base layer is composed of a covering top layer. The distribution spacing of the third intermediate dielectric layer, the second intermediate dielectric layer and the first intermediate dielectric layer is changed by debugging the thickness of the level in the metal protective layer end, so that the front color and the small-angle color cast are kept consistent after the glass is coated while the external reflection color is not greenish; while the same transmission and external reflection parameters as those of a double-silver or three-silver LOW-E coating film are met, a single hollow glass layer formed after the coating film can improve the sun-shading and heat-gaining factor performance, and meanwhile, the structure of the hollow glass does not need to be changed.

Description

Technical Field

[0001] The invention relates to the technical field of glass films, in particular to a high-transmittance and high-performance quadruple-silver glass and a preparation method thereof. Background Art

[0002] At present, the low-emissivity glass in the curtain wall market has gradually shifted from double-silver LOW-E to triple-silver LOW-E. As the construction industry has increasingly higher requirements for energy conservation, in order to meet the requirements of building energy-saving performance, it is necessary to continuously increase the curtain wall glass structure, which has led to the continuous increase in the cost of profiles, especially for some buildings with high transmittance requirements. The more complex the glass structure, the lower the transmittance. Under the influence of the transmittance and external reflection parameters of the existing double-silver LOW-E or triple-silver LOW-E, its shading and heat gain factor performance cannot meet the application environment with high transmittance requirements under a single hollow configuration. Summary of the invention

[0003] In view of the problems in the prior art, the present invention provides a high-transmittance and high-performance quadruple-silver glass and a preparation method thereof.

[0004] The technical solution adopted by the present invention to solve its technical problems is: a high-transmittance and high-performance four-silver glass, including a glass substrate and an enclosed main layer end, the inner side of the enclosed main layer end is provided with a heat adsorption composite layer end, a metal protective layer end, a third intermediate medium layer, a second intermediate medium layer and a first intermediate medium layer, the enclosed main layer end is composed of a base layer and a covering top layer, the heat adsorption composite layer end is composed of a first adsorption layer, a second adsorption layer, a third adsorption layer and a fourth adsorption layer, the metal protective layer end is composed of a first film protective layer, a second film protective layer, a third film protective layer, a fourth film protective layer, a fifth film protective layer, a sixth film protective layer, a seventh film protective layer and an eighth film protective layer, the heat adsorption composite layer end, the metal protective layer end, the third intermediate medium layer, the second intermediate medium layer and the first intermediate medium layer are all composited between the base layer and the covering top layer.

[0005] The order of the thermal adsorption composite layer end, the metal protective layer end, the third intermediate dielectric layer, the second intermediate dielectric layer and the first intermediate dielectric layer when plated is, from bottom to top, the first film protective layer, the first adsorption layer, the second film protective layer, the first intermediate dielectric layer, the third film protective layer, the second adsorption layer, the fourth film protective layer, the second intermediate dielectric layer, the fifth film protective layer, the third adsorption layer, the sixth film protective layer, the third intermediate dielectric layer, the seventh film protective layer, the fourth adsorption layer and the eighth film protective layer.

[0006] Preferably, the base layer is made of a composite of silicon nitride and zinc aluminum oxide, wherein the ratio of silicon nitride to zinc aluminum oxide is 3:7, and the total thickness of the base layer is 24 to 30 nm.

[0007] Preferably, the first coating protective layer is made of a first-side nickel-chromium layer, and the thickness of the first coating protective layer is 0.3 to 1 nm, the second coating protective layer is made of a second-side nickel-chromium layer, and the thickness of the second coating protective layer is 0.3 to 2 nm, the third coating protective layer is made of a third-side nickel-chromium layer, and the thickness of the third coating protective layer is 0.3 to 1 nm, the fourth coating protective layer is a third-side nickel-chromium layer, and the thickness of the fourth coating protective layer is 0.3 to 2 nm, the fifth coating protective layer is a fifth-side nickel-chromium layer, and the thickness of the fifth coating protective layer is 0.3 to 1 nm, the sixth coating protective layer is a sixth-side nickel-chromium layer, and the thickness of the sixth coating protective layer is 0.3 to 2 nm, the seventh coating protective layer is a seventh-side nickel-chromium layer, and the thickness of the seventh coating protective layer is 0.3 to 1 nm, the eighth coating protective layer is an eighth-side nickel-chromium layer, and the thickness of the eighth coating protective layer is 0.3 to 2 nm.

[0008] Preferably, the first adsorption layer is a first-side silver layer, the thickness of the first adsorption layer is 5 to 10 nm, the second adsorption layer is a second-side silver layer, the thickness of the second adsorption layer is 9 to 15 nm, and the third adsorption layer is a third-side silver layer, the thickness of the third adsorption layer is 9 to 15 nm.

[0009] Preferably, the first intermediate dielectric layer is a first surface dielectric layer, and the total thickness of the first intermediate dielectric layer is 60 to 75 nm; the second intermediate dielectric layer is a second surface dielectric layer, and the total thickness of the second intermediate dielectric layer is 65 to 85 nm; the third intermediate dielectric layer is a third surface dielectric layer, and the total thickness of the third intermediate dielectric layer is 70 to 90 nm; the third intermediate dielectric layer, the second intermediate dielectric layer, and the first intermediate dielectric layer are all made of a composite of zinc tin oxide and zinc aluminum oxide, wherein the ratio of zinc tin oxide to zinc aluminum oxide is 6:1.

[0010] Preferably, the top covering layer is made of a composite of zinc oxide aluminum and silicon nitride, wherein the ratio of zinc oxide aluminum to silicon nitride is 5:1, and the total thickness of the top covering layer is 30-45 nm.

[0011] Preferably, in a method for preparing high-transmittance and high-performance quad-silver glass, the bottom layer, the top covering layer, the end of the heat adsorption composite layer, the end of the metal protective layer, the third intermediate dielectric layer, the second intermediate dielectric layer and the first intermediate dielectric layer are all coated on the surface of the glass substrate by a vacuum magnetron sputtering coating machine.

[0012] Compared with the prior art, the beneficial effects of the present invention are as follows: the heat adsorption composite layer end, the metal protective layer end, the third intermediate dielectric layer, the second intermediate dielectric layer and the first intermediate dielectric layer are compounded between the base layer and the covering top layer through vacuum magnetron sputtering coating, and the distribution spacing of the third intermediate dielectric layer, the second intermediate dielectric layer and the first intermediate dielectric layer is changed by adjusting the layer thickness in the metal protective layer end, so that the front color and the small-angle color cast of the glass are kept consistent after coating while ensuring that the external reflected color is not greenish, and while meeting the same transmittance and external reflection parameters as double silver or triple silver LOW-E coating, the single insulating glass layer formed after the coating of the present invention can improve the sunshade and heat gain factor performance, and there is no need to change the structure of the insulating glass itself. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The present invention is further described below in conjunction with the accompanying drawings and embodiments.

[0014] Figure 1 It is a schematic diagram of the hierarchical composition of the present invention.

[0015] In the figure: 1. end of the enclosed main layer; 11. bottom layer; 12. covering top layer; 2. end of the heat adsorption composite layer; 20. end of the metal protective layer; 201. first coating protective layer; 202. second coating protective layer; 203. third coating protective layer; 204. fourth coating protective layer; 205. fifth coating protective layer; 206. sixth coating protective layer; 207. seventh coating protective layer; 208. eighth coating protective layer; 21. first adsorption layer; 22. second adsorption layer; 23. third adsorption layer; 24. fourth adsorption layer; 3. third intermediate medium layer; 4. second intermediate medium layer; 5. first intermediate medium layer. DETAILED DESCRIPTION

[0016] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further explained below in conjunction with specific implementation methods.

[0017] like Figure 1As shown, the high-transmittance and high-performance four-silver glass and its preparation method described in the present invention include a glass substrate and an enclosed main layer end 1, the inner side of the enclosed main layer end 1 is provided with a heat adsorption composite layer end 2, a metal protective layer end 20, a third intermediate medium layer 3, a second intermediate medium layer 4 and a first intermediate medium layer 5, the enclosed main layer end 1 is composed of a base layer 11 and a covering top layer 12, the heat adsorption composite layer end 2 is composed of a first adsorption layer 21, a second adsorption layer 22, a third adsorption layer 23 and a fourth adsorption layer 24, the metal protective layer end 20 is composed of a first coating protective layer 201, a second coating protective layer 202, a third coating protective layer 203, a fourth coating protective layer 204, a fifth coating protective layer 205, a sixth coating protective layer 206, a seventh coating protective layer 207 and an eighth coating protective layer 208. The heat adsorption composite layer end 2, the metal protective layer end 20, the third intermediate medium layer 3, the second intermediate medium layer 4 and the first intermediate medium layer 5 are all composited between the coating layer 11 and the covering top layer 12.

[0018] In this embodiment, the heat adsorption composite layer end 2, the metal protective layer end 20, the third intermediate medium layer 3, the second intermediate medium layer 4 and the first intermediate medium layer 5 form a functional layer covering the glass surface to ensure that the glass transmittance and external reflection parameters do not change, while improving the overall sunshade and heat gain factor performance of the glass. The base layer 11 is plated on the surface of the glass substrate as the base layer, and then according to the drawings in the specification Figure 1 The film layers are plated in sequence from bottom to top until the heat adsorption composite layer end 2, the metal protective layer end 20, the third intermediate dielectric layer 3, the second intermediate dielectric layer 4 and the first intermediate dielectric layer 5 are all plated, and then the covering top layer 12 is plated to the topmost end of the eighth film protective layer 208 in the heat adsorption composite layer end 2 to cover it, so that the base layer 11 and the covering top layer 12 cover the functional layer composed of the heat adsorption composite layer end 2, the metal protective layer end 20, the third intermediate dielectric layer 3, the second intermediate dielectric layer 4 and the first intermediate dielectric layer 5.

[0019] The hierarchical order of the thermal adsorption composite layer end 2, the metal protective layer end 20, the third intermediate dielectric layer 3, the second intermediate dielectric layer 4 and the first intermediate dielectric layer 5 during plating is, from bottom to top, the first film protective layer 201, the first adsorption layer 21, the second film protective layer 202, the first intermediate dielectric layer 5, the third film protective layer 203, the second adsorption layer 22, the fourth film protective layer 204, the second intermediate dielectric layer 4, the fifth film protective layer 205, the third adsorption layer 23, the sixth film protective layer 206, the third intermediate dielectric layer 3, the seventh film protective layer 207, the fourth adsorption layer 24, and the eighth film protective layer 208.

[0020] In an optional implementation of this embodiment, the bottom layer 11 is made of a composite of silicon nitride and zinc aluminum oxide, wherein the ratio of silicon nitride to zinc aluminum oxide is 3:7, and the total thickness of the bottom layer 11 is 24-30 nm. The top cover layer 12 is made of a composite of zinc aluminum oxide and silicon nitride, wherein the ratio of zinc aluminum oxide to silicon nitride is 5:1, and the total thickness of the top cover layer 12 is 30-45 nm.

[0021] In this embodiment, since silicon nitride and zinc aluminum oxide have strong oxidation resistance at high temperatures, a base layer 11 and a covering top layer 12 are provided as exposed isolation surfaces to prevent oxygen from entering the heat adsorption composite layer end 2 and the metal protective layer end 20 to cause oxidation corrosion.

[0022] In an optional implementation manner of this embodiment, the first coating protective layer 201 is made of a first-side nickel-chromium layer, and the thickness of the first coating protective layer 201 is 0.3 to 1 nm, the second coating protective layer 202 is made of a second-side nickel-chromium layer, and the thickness of the second coating protective layer 202 is 0.3 to 2 nm, the third coating protective layer 203 is made of a third-side nickel-chromium layer, and the thickness of the third coating protective layer 203 is 0.3 to 1 nm, the fourth coating protective layer 204 is a third-side nickel-chromium layer, and the fourth coating protective layer 204 is The thickness is 0.3-2nm, the fifth coating protective layer 205 is a fifth-side nickel-chromium layer, the thickness of the fifth coating protective layer 205 is 0.3-1nm, the sixth coating protective layer 206 is a sixth-side nickel-chromium layer, the thickness of the sixth coating protective layer 206 is 0.3-2nm, the seventh coating protective layer 207 is a seventh-side nickel-chromium layer, the thickness of the seventh coating protective layer 207 is 0.3-1nm, the eighth coating protective layer 208 is an eighth-side nickel-chromium layer, the thickness of the eighth coating protective layer 208 is 0.3-2nm. The setting of each level of nickel-chromium layer is intended to protect the stability of the first adsorption layer 21, the second adsorption layer 22 and the third adsorption layer 23, and increase the overall firmness of the film layer.

[0023] In an optional implementation of the present embodiment, the first adsorption layer 21 is a first-side silver layer, and the thickness of the first adsorption layer 21 is 5 to 10 nm, the second adsorption layer 22 is a second-side silver layer, and the thickness of the second adsorption layer 22 is 9 to 15 nm, and the third adsorption layer 23 is a third-side silver layer, and the thickness of the third adsorption layer 23 is 9 to 15 nm.

[0024] In an optional implementation of this embodiment, the first intermediate dielectric layer 5 is a first surface dielectric layer, and the total thickness of the first intermediate dielectric layer 5 is 60-75nm, the second intermediate dielectric layer 4 is a second surface dielectric layer, and the total thickness of the second intermediate dielectric layer 4 is 65-85nm, the third intermediate dielectric layer 3 is a third surface dielectric layer, and the total thickness of the third intermediate dielectric layer 3 is 70-90nm, and the third intermediate dielectric layer 3, the second intermediate dielectric layer 4, and the first intermediate dielectric layer 5 are all made of zinc tin oxide and zinc aluminum oxide, wherein the ratio of zinc tin oxide to zinc aluminum oxide is 6:1. The third intermediate dielectric layer 3, the second intermediate dielectric layer 4, and the first intermediate dielectric layer 5 are intermittently added between the hierarchical structures of the film layer, wherein the plating of zinc tin oxide is intended to make the film layer have good light transmittance in the visible light band, high infrared emissivity, and ultraviolet absorption. The plating of zinc aluminum oxide is intended to improve the corrosion resistance of the film layer when it contacts moisture.

[0025] In this embodiment, the preparation method of the present invention is to coat the bottom layer 11, the top layer 12, the heat adsorption composite layer end 2, the metal protective layer end 20, the third intermediate dielectric layer 3, the second intermediate dielectric layer 4 and the first intermediate dielectric layer 5 on the surface of the glass substrate by a vacuum magnetron sputtering coating machine, wherein the hierarchical order of the present invention is from bottom to top 11, the first coating protective layer 201, the first adsorption layer 21, the second coating protective layer 202, the first intermediate dielectric layer 5, the third coating protective layer 203, the second adsorption layer 22, the fourth coating protective layer 204, the second intermediate dielectric layer 5 The metal protective layer 4, the fifth coating protective layer 205, the third adsorption layer 23, the sixth coating protective layer 206, the third intermediate medium layer 3, the seventh coating protective layer 207, the fourth adsorption layer 24, and the eighth coating protective layer 208, by adjusting the layer thickness in the metal protective layer end to change the distribution spacing of the third intermediate medium layer, the second intermediate medium layer and the first intermediate medium layer, while ensuring that the external reflected color is not green, the front color and the small-angle color cast of the glass after coating are kept consistent, that is, the a value of the final glass front color is between 2.5-3.5, and the a value of the angle is between 2-3.

[0026] The above shows and describes the basic principles, main features and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention. The scope of the present invention is defined by the attached claims and their equivalents.

Claims

1. A high-transmittance and high-performance quadruple silver glass, comprising a glass substrate and a surrounding main layer end (1), characterized in that: The inner side of the enclosed main layer end (1) is provided with a heat adsorption composite layer end (2), a metal protective layer end (20), a third intermediate medium layer (3), a second intermediate medium layer (4) and a first intermediate medium layer (5); the enclosed main layer end (1) is composed of a bottom layer (11) and a covering top layer (12); the heat adsorption composite layer end (2) is composed of a first adsorption layer (21), a second adsorption layer (22), a third adsorption layer (23) and a fourth adsorption layer (24); the metal protective layer end (20) is composed of a first coating protective layer (201), The second coating protective layer (202), the third coating protective layer (203), the fourth coating protective layer (204), the fifth coating protective layer (205), the sixth coating protective layer (206), the seventh coating protective layer (207) and the eighth coating protective layer (208), the heat adsorption composite layer end (2), the metal protective layer end (20), the third intermediate dielectric layer (3), the second intermediate dielectric layer (4) and the first intermediate dielectric layer (5) are all composited between the bottom layer (11) and the top covering layer (12); The order of the thermal adsorption composite layer end (2), the metal protective layer end (20), the third intermediate dielectric layer (3), the second intermediate dielectric layer (4) and the first intermediate dielectric layer (5) during plating is, from bottom to top, the first film protective layer (201), the first adsorption layer (21), the second film protective layer (202), the first intermediate dielectric layer (5), the third film protective layer (203), the second adsorption layer (22), the fourth film protective layer (204), the second intermediate dielectric layer (4), the fifth film protective layer (205), the third adsorption layer (23), the sixth film protective layer (206), the third intermediate dielectric layer (3), the seventh film protective layer (207), the fourth adsorption layer (24) and the eighth film protective layer (208).

2. The high-transmittance and high-performance quadruple silver glass according to claim 1, characterized in that: The base layer (11) is made of a composite of silicon nitride and zinc aluminum oxide, wherein the ratio of silicon nitride to zinc aluminum oxide is 3:7, and the total thickness of the base layer (11) is 24-30 nm.

3. The high-transmittance and high-performance quadruple silver glass according to claim 1, characterized in that: The first coating protective layer (201) is made of a first-side nickel-chromium layer, and the thickness of the first coating protective layer (201) is 0.3-1 nm. The second coating protective layer (202) is made of a second-side nickel-chromium layer, and the thickness of the second coating protective layer (202) is 0.3-2 nm. The third coating protective layer (203) is made of a third-side nickel-chromium layer, and the thickness of the third coating protective layer (203) is 0.3-1 nm. The fourth coating protective layer (204) is a third-side nickel-chromium layer, and the thickness of the fourth coating protective layer (204) is 0.3-2 nm, the fifth coating protective layer (205) is a fifth-side nickel-chromium layer, the thickness of the fifth coating protective layer (205) is 0.3 to 1 nm, the sixth coating protective layer (206) is a sixth-side nickel-chromium layer, the thickness of the sixth coating protective layer (206) is 0.3 to 2 nm, the seventh coating protective layer (207) is a seventh-side nickel-chromium layer, the thickness of the seventh coating protective layer (207) is 0.3 to 1 nm, the eighth coating protective layer (208) is an eighth-side nickel-chromium layer, the thickness of the eighth coating protective layer (208) is 0.3 to 2 nm.

4. The high-transmittance and high-performance quadruple silver glass according to claim 3, characterized in that: The first adsorption layer (21) is a first-side silver layer, and the thickness of the first adsorption layer (21) is 5 to 10 nm. The second adsorption layer (22) is a second-side silver layer, and the thickness of the second adsorption layer (22) is 9 to 15 nm. The third adsorption layer (23) is a third-side silver layer, and the thickness of the third adsorption layer (23) is 9 to 15 nm.

5. The high-transmittance and high-performance quadruple silver glass according to claim 1, characterized in that: The first intermediate dielectric layer (5) is a first surface dielectric layer, and the total thickness of the first intermediate dielectric layer (5) is 60-75 nm; the second intermediate dielectric layer (4) is a second surface dielectric layer, and the total thickness of the second intermediate dielectric layer (4) is 65-85 nm; the third intermediate dielectric layer (3) is a third surface dielectric layer, and the total thickness of the third intermediate dielectric layer (3) is 70-90 nm; the third intermediate dielectric layer (3), the second intermediate dielectric layer (4), and the first intermediate dielectric layer (5) are all made of a composite of zinc tin oxide and zinc aluminum oxide, wherein the ratio of zinc tin oxide to zinc aluminum oxide is 6:

1.

6. The high-transmittance and high-performance quadruple silver glass according to claim 1, characterized in that: The covering top layer (12) is made of a composite of zinc oxide aluminum and silicon nitride, wherein the ratio of zinc oxide aluminum to silicon nitride is 5:1, and the total thickness of the covering top layer (12) is 30-45 nm.

7. The method for preparing high-transmittance and high-performance quadruple silver glass according to claim 1, characterized in that: The bottom layer (11), the top cover layer (12), the heat adsorption composite layer end (2), the metal protection layer end (20), the third intermediate dielectric layer (3), the second intermediate dielectric layer (4) and the first intermediate dielectric layer (5) are all coated on the surface of the glass substrate by a vacuum magnetron sputtering coating machine.

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