Electrowetting display device structure and preparation method thereof

Abstract

The invention discloses an electrowetting display device structure and a method for preparing the electrowetting display device structure, the electrowetting display device structure comprises a first substrate, a second substrate, a sealing frame and a pixel wall, the second substrate and the first substrate are arranged in parallel, a first conductive layer is arranged on one side close to the first substrate, and a second conductive layer is arranged on the other side close to the second substrate. A hydrophobic insulating layer is arranged on the first conductive layer; the sealing frame is arranged between the first substrate and the second substrate, a sealing cavity is formed among the first substrate, the sealing frame and the second substrate, and the sealing cavity is filled with polar liquid; the pixel wall is located in the sealing cavity and arranged on the hydrophobic insulating layer, a pixel grid is defined, the pixel grid is filled with non-polar liquid which is immiscible with the polar liquid, the pixel wall comprises a second conducting layer, and the second conducting layer and the first conducting layer form a positive electrode and a negative electrode respectively. According to the electrowetting display device structure, the response time of the electrowetting display device can be prolonged, and the conductive efficiency of the electrowetting display device can be improved.

Description

Technical Field

[0001] The present invention relates to the technical field of electrowetting display technology, and in particular to an electrowetting display device structure and a preparation method thereof. Background Art

[0002] Electrowetting generally refers to the phenomenon that by applying a voltage between the upper and lower substrates, the surface tension between the liquid and the solid is changed, thereby changing the contact angle between the two, causing the droplet to deform and displace.

[0003] Electrowetting display is a reflective display technology that uses this principle to achieve display.

[0004] The concept of electrowetting display was proposed as early as 1981. The core idea is to use the electrowetting effect to manipulate the movement of liquid in the pixel structure, thereby changing the optical spatial coherence within the pixel structure and achieving an optical display effect of switching between white and transparent.

[0005] In the related art, the electrodes of the electrowetting display device are generally composed of upper and lower substrates, wherein the ITO conductive layer of the lower substrate is etched to produce an electrode structure, while the electrode of the upper substrate can use a whole piece of ITO conductive glass as a common electrode.

[0006] However, electrowetting display devices with this structure usually have slow response time and low conductivity efficiency. Summary of the invention

[0007] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the present invention provides an electrowetting display device structure, which can improve the response time and conductive efficiency of the electrowetting display device.

[0008] The invention also provides a method for preparing the electrowetting display device structure.

[0009] According to the first aspect of the present invention, the electrowetting display device structure of the embodiment includes a first substrate, a second substrate, a sealing frame and a pixel wall, the second substrate is arranged in parallel with the first substrate, and has a first conductive layer on a side close to the first substrate, and a hydrophobic insulating layer is arranged on the first conductive layer; the sealing frame is arranged between the first substrate and the second substrate, and a sealed cavity is formed between the first substrate, the sealing frame and the second substrate, and the sealed cavity is filled with a polar liquid; the pixel wall is located in the sealed cavity, is arranged on the hydrophobic insulating layer, and defines a pixel grid, and the pixel grid is filled with a non-polar liquid that is immiscible with the polar liquid, and the pixel wall includes a second conductive layer, and the second conductive layer and the first conductive layer constitute a positive electrode and a negative electrode respectively.

[0010] According to some embodiments of the present invention, the pixel wall further includes a first insulating layer, the first insulating layer is connected to the hydrophobic insulating layer, and the second conductive layer is disposed on a side of the first insulating layer away from the hydrophobic insulating layer.

[0011] According to some embodiments of the present invention, the first insulating layer is configured as a photoresist, and the second conductive layer is configured as a photoresist containing Ag.

[0012] According to some embodiments of the present invention, the height of the second conductive layer accounts for 10%-50% of the total height of the pixel wall.

[0013] According to some embodiments of the present invention, the second conductive layer is provided with conductive leads, and the conductive leads extend outward to conduct electricity.

[0014] According to some embodiments of the present invention, the second substrate is configured as ITO conductive glass.

[0015] According to some embodiments of the present invention, a side of the first substrate close to the second substrate has a third conductive layer, two hydrophobic insulating layers are provided, and the two hydrophobic insulating layers are respectively provided on the first conductive layer and the third conductive layer, two pixel walls are provided, and the two pixel walls are respectively provided on the sides of the two hydrophobic insulating layers close to each other, a power supply is connected between the first conductive layer and the second conductive layer of the pixel wall on the first substrate, and another power supply is connected between the third conductive layer and the second conductive layer of the pixel wall on the second substrate.

[0016] The electrowetting display device structure according to the embodiment of the present invention has at least the following beneficial effects: 1. The present invention arranges a first conductive layer on the second substrate and a second conductive layer on the pixel wall, and the second conductive layer and the first conductive layer constitute a positive electrode and a negative electrode respectively. It can be understood that the traditional electrowetting display device arranges the two electrodes on the upper and lower substrates respectively, and turns on the electrowetting display device by applying a voltage between the two electrodes on the upper and lower substrates, wherein the polar liquid between the electrode and the hydrophobic insulating layer will be divided into pressures, resulting in a relatively high start-up threshold voltage of the electrowetting display device. The electrowetting display device of the present invention arranges the two electrodes on the second substrate and the pixel wall respectively, reduces the distance between the electrode and the hydrophobic insulating layer, and reduces the distribution of the polar liquid in the electric field between the electrode and the hydrophobic insulating layer, thereby reducing the divided pressure of the polar liquid when a voltage is applied between the two electrodes to turn on the electrowetting display device, reducing the start-up threshold voltage of the electrowetting display device, and thereby improving the response time and conductivity efficiency of the electrowetting display device.

[0017] The method for preparing the electrowetting display device structure according to the second aspect of the present invention is used to manufacture the electrowetting display device structure according to the first aspect of the present invention, comprising the following steps: S10: taking a second substrate having a first conductive layer, spin-coating a hydrophobic insulating layer on a surface of the first conductive layer, and performing a hydrophilic treatment on the hydrophobic insulating layer; S20: sequentially spin-coating a photoresist and a photoresist containing Ag on the hydrophobic insulating layer, and then placing the second substrate on which the photoresist and the photoresist containing Ag are spin-coated under a mask of a specific pattern for exposure to form a pixel wall; S30: filling a non-polar liquid into the pixel grid defined by the pixel wall; S40: placing the second substrate obtained in step S30 on a condensation table for condensation, and then coating the polar liquid condensed in advance on the non-polar liquid; S50: Take the first substrate, attach a sealing frame to the first substrate, then put the sealing frame outside the pixel wall and press it against the second substrate, so that the polar liquid is evenly distributed in the sealing frame, and the excess polar liquid flows out from between the sealing frame and the second substrate, and then press the first substrate, the sealing frame and the second substrate together to seal.

[0018] According to some embodiments of the present invention, after the photoresist and the Ag-containing photoresist are spin-coated in sequence in the S20 step, the second substrate on which the photoresist and the Ag-containing photoresist are spin-coated needs to be placed in an environment of 110 degrees and heated for 120 seconds. After heating, it is allowed to cool, and then placed under a mask template with a specific pattern for exposure.

[0019] According to some embodiments of the present invention, after the second substrate spin-coated with photoresist and Ag-containing photoresist is placed under a mask of a specific pattern for exposure in the S20 step, it needs to be placed in an environment of 110 degrees and baked for 120 seconds. After baking, it is developed and blown dry, and the required pixel wall can be obtained.

[0020] The method for preparing the electrowetting display device structure according to the embodiment of the present invention has at least the following beneficial effects: 1. The present invention forms a pixel wall by sequentially spin-coating a photoresist and a Ag-containing photoresist on a hydrophobic insulating layer, and then placing a second substrate on which the photoresist and the Ag-containing photoresist are spin-coated under a mask of a specific pattern for exposure, so that the Ag-containing photoresist can form a second conductive layer. Thus, a second conductive layer is constructed on the pixel wall, so that the second conductive layer and the first conductive layer constitute a positive electrode and a negative electrode. By applying a voltage between the first conductive layer and the second conductive layer, the electrowetting display device can be turned on. Compared with the conventional technology in which electrodes are arranged on the upper and lower substrates to turn on the electrowetting display device by applying a voltage between the two electrodes of the upper and lower substrates, the electrowetting display device manufactured in the embodiment of the present invention arranges two electrodes on the second substrate and the pixel wall, respectively, reduces the distance between the electrode and the hydrophobic insulating layer, and reduces the distribution of the polar liquid in the electric field between the electrode and the hydrophobic insulating layer. Therefore, when a voltage is applied between the two electrodes to turn on the electrowetting display device, the partial pressure of the polar liquid can be reduced, and the start-up threshold voltage of the electrowetting display device is reduced, thereby improving the response time and conductive efficiency of the electrowetting display device.

[0021] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0023] Figure 1 A schematic structural diagram of an electrowetting display device structure according to an embodiment of the present invention; Figure 2 A top view of the electrowetting display device structure in a closed state according to an embodiment of the present invention; Figure 3 A top view of an electrowetting display device structure in an open state according to an embodiment of the present invention; Figure 4 Schematic diagram of a double-layer device structure of an electrowetting display device structure according to an embodiment of the present invention.

[0024] Figure numerals: 100 - first substrate, 110 - second substrate, 120 - first conductive layer, 130 - hydrophobic insulating layer, 140 - sealing frame, 150 - polar liquid, 160 - pixel wall, 170 - non-polar liquid, 180 - second conductive layer, 190 - first insulating layer, 200 - conductive lead, 210 - third conductive layer. DETAILED DESCRIPTION

[0025] Embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0026] In the description of the present invention, it is necessary to understand that descriptions involving orientation, such as up, down, front, back, left, right, etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0027] In the description of the present invention, "several" means one or more, "more" means more than two, "greater than", "less than", "exceed", etc. are understood to exclude the number itself, and "above", "below", "within", etc. are understood to include the number itself. If there is a description of first and second, this is only for the purpose of distinguishing the technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0028] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installation, connection and connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0029] The structure of an electrowetting display device and a method for manufacturing the same according to an embodiment of the present invention are described below with reference to the accompanying drawings.

[0030] Reference Figure 1 , Figure 2 , Figure 3 and Figure 4 The present invention aims to provide an embodiment of an electrowetting display device structure and a method for preparing the same.

[0031] Example 1 This embodiment provides an electrowetting display device structure, including a first substrate 100 , a second substrate 110 , a sealing frame 140 and a pixel wall 160 .

[0032] As for the second substrate 110 , the second substrate 110 is arranged parallel to the first substrate 100 , and a surface of the second substrate 110 close to the first substrate 100 has a first conductive layer 120 , and a hydrophobic insulating layer 130 is arranged on the first conductive layer 120 .

[0033] Specifically, the hydrophobic insulating layer 130 may be a fluororesin material including Teflon series, Cytop series, Hyflon series, and the like.

[0034] The sealing frame 140 is disposed between the first substrate 100 and the second substrate 110 , and a sealed cavity is formed between the first substrate 100 , the sealing frame 140 and the second substrate 110 , and the sealed cavity is filled with a polar liquid 150 , so that the sealed cavity can prevent leakage of the polar liquid 150 and the non-polar liquid 170 .

[0035] Specifically, the polar liquid 150 may be at least one of water, ethylene glycol, and propylene glycol.

[0036] As for the pixel wall 160, the pixel wall 160 is located in the sealed cavity, the pixel wall 160 is arranged on the hydrophobic insulating layer 130, the pixel wall 160 defines a pixel grid, and the pixel grid is filled with a non-polar liquid 170 that is immiscible with the polar liquid 150. The pixel wall 160 includes a second conductive layer 180, and the second conductive layer 180 and the first conductive layer 120 constitute a positive electrode and a negative electrode respectively.

[0037] It can be understood that the conventional electrowetting display device sets two electrodes on the upper and lower substrates respectively, and turns on the electrowetting display device by applying a voltage between the two electrodes on the upper and lower substrates, wherein the polar liquid 150 between the electrode and the hydrophobic insulating layer 130 will be divided in pressure, resulting in a relatively high start-up threshold voltage of the electrowetting display device. The electrowetting display device of the present invention sets two electrodes on the second substrate 110 and the pixel wall 160 respectively, reduces the distance between the electrode and the hydrophobic insulating layer 130, and reduces the distribution of the polar liquid 150 in the electric field between the electrode and the hydrophobic insulating layer 130. Therefore, when a voltage is applied between the two electrodes to turn on the electrowetting display device, the divided pressure of the polar liquid 150 can be reduced, and the start-up threshold voltage of the electrowetting display device can be reduced, thereby improving the response time and conductivity efficiency of the electrowetting display device.

[0038] Specifically, the non-polar liquid 170 is ink or color ink.

[0039] In some embodiments of the present invention, the pixel wall 160 further includes a first insulating layer 190 , the first insulating layer 190 is connected to the hydrophobic insulating layer 130 , and the second conductive layer 180 is disposed on a side of the first insulating layer 190 away from the hydrophobic insulating layer 130 .

[0040] It should be explained that the function of the first insulating layer 190 is to reduce the risk of breakdown and improve the reliability of the device. After the first conductive layer 120 and the second conductive layer 180 are powered on and started, the electric field of the second conductive layer 180 will act on the hydrophobic insulating layer 130 through the pixel grid, change the hydrophilicity of the hydrophobic insulating layer 130, increase the spread area of ​​the non-polar liquid 170 in the hydrophobic insulating layer 130, and cause the non-polar liquid 170 to squeeze the polar liquid 150 in the pixel grid to shrink. By setting the first insulating layer 190, the first insulating layer 190 is connected to the hydrophobic insulating layer 130, and the second conductive layer 180 is set on the side of the first insulating layer 190 away from the hydrophobic insulating layer 130, thereby setting the first insulating layer 190 between the second conductive layer 180 and the hydrophobic insulating layer 130 to avoid the voltage of the second conductive layer 180 directly acting on the hydrophobic insulating layer 130, reduce the risk of damaging the hydrophobic insulating layer 130, can reduce the risk of breakdown, and improve the reliability of the electrowetting display device.

[0041] In some embodiments of the present invention, the first insulating layer 190 is configured as a photoresist, and the second conductive layer 180 is configured as a photoresist containing Ag.

[0042] It can be understood that by setting the first insulating layer 190 as a photoresist and the second conductive layer 180 as a photoresist containing Ag, the materials of the first insulating layer 190 and the second conductive layer 180 are both photoresists, and further, the first insulating layer 190 and the second conductive layer 180 can be prepared by a spin coating method, and the photoresist and the Ag-containing photoresist can be spin-coated on the hydrophobic insulating layer 130 in sequence, which is convenient for coating the first insulating layer 190 and the second conductive layer 180. After the photoresist and the Ag photoresist are spin-coated, the first insulating layer 190 and the second conductive layer 180 can be exposed simultaneously under a mask template with a specific pattern to form a pixel wall 160, thereby improving the production efficiency of the pixel wall 160.

[0043] In some embodiments of the present invention, the height of the second conductive layer 180 accounts for 10%-50% of the total height of the pixel wall 160 , so that the response time and conductive effect of driving the electrowetting display device can reach the expected values.

[0044] Furthermore, the ratio of the height of the first insulating layer 190 to the height of the second conductive layer 180 is 5:1, so that the response time and the conductive effect of driving the electrowetting display device can more easily reach the expected values.

[0045] In some embodiments of the present invention, the second conductive layer 180 is provided with conductive leads 200, which extend outward to conduct electricity, thereby facilitating connecting the second conductive layer 180 in the sealed cavity to a power source.

[0046] In some embodiments of the present invention, the second substrate 110 is configured as ITO conductive glass, so that the material is easy to obtain and manufacture.

[0047] In a further embodiment of the present invention, a side of the first substrate 100 close to the second substrate 110 has a third conductive layer 210, two hydrophobic insulating layers 130 are provided, and the two hydrophobic insulating layers 130 are respectively provided on the first conductive layer 120 and the third conductive layer 210, two pixel walls 160 are provided, and the two pixel walls 160 are respectively provided on the sides of the two hydrophobic insulating layers 130 close to each other, a power supply is connected between the first conductive layer 120 and the second conductive layer 180 of the pixel wall 160 on the first substrate 100, and another power supply is connected between the third conductive layer 210 and the second conductive layer 180 of the pixel wall 160 on the second substrate 110.

[0048] It can be understood that by setting two hydrophobic insulating layers 130 and two pixel walls 160, the two hydrophobic insulating layers 130 are respectively set on the first conductive layer 120 and the third conductive layer 210, and the two pixel walls 160 are respectively set on the sides of the two hydrophobic insulating layers 130 close to each other, so that the electrowetting display device can form a double-layer junction pixel structure. At the same time, a power supply is connected between the first conductive layer 120 and the second conductive layer 180 of the pixel wall 160 on the first substrate 100, and another power supply is connected between the third conductive layer 210 and the second conductive layer 180 of the pixel wall 160 on the second substrate 110. Thus, the two power supplies can respectively control the pixel structures of the upper and lower layers of the electrowetting display device, thereby realizing the switching of the pixel structures of the upper and lower layers of the electrowetting display device respectively.

[0049] In some embodiments of the present invention, the first substrate 100 is configured as ITO conductive glass, so that the material is easy to obtain and manufacture.

[0050] Example 2 This embodiment provides a method for preparing an electrowetting display device structure, comprising the following steps: S10 : taking the second substrate 110 having the first conductive layer 120 , spin-coating the hydrophobic insulating layer 130 on the surface of the first conductive layer 120 , and performing a hydrophilic treatment on the hydrophobic insulating layer 130 .

[0051] In some embodiments of the present invention, before step S10, two pieces of ITO conductive glass are taken, cleaned, and dried, and the two pieces of ITO glass are used as the first substrate 100 and the second substrate 110 respectively.

[0052] In some embodiments of the present invention, in step S10, after the hydrophobic insulating layer 130 is spin-coated on the surface of the first conductive layer 120, the second substrate 110 is placed on a hot stage and heated at a specific temperature for 90 seconds, and after cooling, it is placed in an etcher for hydrophilic treatment.

[0053] S20 : ​​sequentially spin-coating a photoresist and a photoresist containing Ag on the hydrophobic insulating layer 130 , and then placing the second substrate 110 spin-coated with the photoresist and the photoresist containing Ag under a mask of a specific pattern for exposure to form a pixel wall 160 .

[0054] In some embodiments of the present invention, after the photoresist and the Ag-containing photoresist are spin-coated in sequence in step S20, the second substrate 110 on which the photoresist and the Ag-containing photoresist are spin-coated needs to be placed in an environment of 110 degrees and heated for 120 seconds. After heating, it is allowed to cool, and then placed under a mask template with a specific pattern for exposure.

[0055] In some embodiments of the present invention, after the second substrate 110 spin-coated with photoresist and Ag-containing photoresist is placed under a mask of a specific pattern for exposure in step S20, it needs to be placed in an environment of 110 degrees and baked for 120 seconds. After baking, it is developed and blown dry, and the required pixel wall 160 can be obtained.

[0056] In some embodiments of the present invention, the developing process is specifically rinsing in a developer for 1-2 minutes.

[0057] In some embodiments of the present invention, the second substrate 110 having the obvious pixel wall 160 structure needs to be etched and reflowed at high temperature to restore the hydrophobicity of the surface of the insulating hydrophobic layer.

[0058] S30 : filling the pixel grid defined by the pixel wall 160 with the non-polar liquid 170 .

[0059] In some embodiments of the present invention, the non-polar liquid 170 is specifically ink or color ink.

[0060] In some embodiments of the present invention, the non-polar liquid 170 is filled by inkjet printing, and the ink is printed and filled into the pixel grid surrounded by the pixel wall 160 .

[0061] S40 : placing the second substrate 110 obtained in step S30 on a condensation table for condensation, and then coating the pre-condensed polar liquid 150 on the non-polar liquid 170 .

[0062] In some embodiments of the present invention, the second substrate 110 is placed on a condensation table for 1-2 minutes for condensation.

[0063] S50: Take the first substrate 100, fit the sealing frame 140 on the first substrate 100, then put the sealing frame 140 outside the pixel wall 160 and press it against the second substrate 110, so that the polar liquid 150 is evenly distributed in the sealing frame 140, and the excess polar liquid 150 flows out from between the sealing frame 140 and the second substrate 110, and then press the first substrate 100, the sealing frame 140 and the second substrate 110 together to seal.

[0064] Example 3 This embodiment provides a method for preparing an electrowetting display device structure, which simultaneously constructs a hydrophobic insulating layer 130 and a pixel structure on a first substrate 100 on the basis of Embodiment 2, and specifically includes the following steps before step S50: S11 : taking another piece of ITO conductive glass as the first substrate 100 , spin-coating a hydrophobic insulating layer 130 on the surface of the conductive layer of the ITO conductive glass, and performing a hydrophilic treatment on the hydrophobic insulating layer 130 .

[0065] In some embodiments of the present invention, in step S11, after the hydrophobic insulating layer 130 is spin-coated on the surface of the first conductive layer 120, the first substrate 100 is placed on a hot stage and heated at a specific temperature for 90 seconds. After cooling, it is placed in an etcher for hydrophilic treatment.

[0066] S21 : sequentially spin-coating a photoresist and a photoresist containing Ag on the hydrophobic insulating layer 130 , and then placing the first substrate 100 spin-coated with the photoresist and the photoresist containing Ag under a mask of a specific pattern for exposure to form a pixel wall 160 .

[0067] In some embodiments of the present invention, after the photoresist and the Ag-containing photoresist are spin-coated in sequence in step S21, the first substrate 100 on which the photoresist and the Ag-containing photoresist are spin-coated needs to be placed in an environment of 110 degrees and heated for 120 seconds. After heating, it is allowed to cool down and then placed under a mask template with a specific pattern for exposure.

[0068] In some embodiments of the present invention, after the first substrate 100 spin-coated with photoresist and Ag-containing photoresist is placed under a mask of a specific pattern for exposure in step S21, it needs to be placed in an environment of 110 degrees and baked for 120 seconds. After baking, it is developed and blown dry, and the required pixel wall 160 can be obtained.

[0069] In some embodiments of the present invention, the developing process is specifically rinsing in a developer for 1-2 minutes.

[0070] In some embodiments of the present invention, the first substrate 100 having the obvious pixel wall 160 structure needs to be etched and reflowed at high temperature to restore the hydrophobicity of the surface of the insulating hydrophobic layer.

[0071] S31 : filling the pixel grid defined by the pixel wall 160 with the non-polar liquid 170 .

[0072] In some embodiments of the present invention, the non-polar liquid 170 is specifically ink or color ink.

[0073] In some embodiments of the present invention, the non-polar liquid 170 is filled by inkjet printing, and the ink is printed and filled into the pixel grid surrounded by the pixel wall 160 .

[0074] S41 : placing the first substrate 100 obtained in step S31 on a condensation table for condensation, and then coating the pre-condensed polar liquid 150 on the non-polar liquid 170 .

[0075] In some embodiments of the present invention, the first substrate 100 is placed on a condensation table for 1-2 minutes for condensation.

[0076] Example 4 This embodiment provides a method for preparing an electrowetting display device structure, comprising the following steps: Prepare two pieces of 3cm×3cm ITO conductive glass and clean them.

[0077] One of the substrates is used as the second substrate 110 , and a hydrophobic insulating layer 130 is formed on the second substrate 110 .

[0078] Coat 2-3 ml of Hyflon solution on the first conductive layer 120 of the second substrate 110, and spin coat it at a speed of 320 rpm for 65 seconds. After the spin coating is completed, place it on a flat surface and let it stand for 5-10 minutes. Then, heat it at a high temperature of 85 degrees for 90 seconds. After cooling, the required hydrophobic insulating layer 130 structure is formed.

[0079] The second substrate 110 spin-coated with the hydrophobic insulating layer 130 is placed in the chamber of an etching machine for surface modification. After the surface of the hydrophobic insulating layer 130 becomes hydrophilic, the pixel wall 160 can be further constructed.

[0080] To construct the pixel wall 160, about 5 ml of photoresist is coated on the upper surface of the second substrate 110, and the substrate is placed under a spin coating speed of 1200 rpm for 65 seconds. After the spin coating is completed, about 1 ml of conductive photoresist is then spin coated on the surface, and the coating is carried out at the same rotation speed for 65 seconds. After the spin coating is completed, the substrate is cured, that is, the second substrate 110 is placed at a temperature of 110 degrees and baked for 120 seconds. After cooling to room temperature, the second substrate 110 is placed in a photolithography machine for exposure with a mask of a specific pattern. After the exposure is completed, the lower substrate needs to be placed in a 0.4% KOH solution for development for 90 seconds, and the operation is repeated twice. Then, the substrate is placed in clean water for development for 50 seconds, and then rinsed in a flowing liquid for 50 seconds. Finally, it is blown dry with nitrogen. The clean second substrate 110 is placed under a microscope for observation. At this moment, a stable pixel wall 160 structure can be observed.

[0081] The second substrate 110 with the pixel wall 160 structure is placed in a dust-free oven set at a medium-high temperature of 210° for reflux for 2 hours, and then taken out after cooling.

[0082] The second substrate 110 with the pixel wall 160 structure prepared as above is filled with ink. The filling method here is inkjet printing, and the ink is printed and filled into the pixel grid surrounded by the pixel wall 160.

[0083] Finally, packaging is performed. First, use a rubber-tipped dropper to take part of the polar liquid 150 and place it on a condensation table for condensation treatment. Then, the second substrate 110 filled with non-polar liquid 170 needs to be placed on the condensation table for packaging. The specific operation is to first condense the second substrate 110 for 1-2 minutes to condense the non-polar liquid 170, and then use a rubber-tipped dropper to drip the polar liquid 150.

[0084] The first substrate 100 is attached to the sealing frame 140, and finally the first substrate 100 and the second substrate 110 are tightly attached, so that the pixel structure of the second substrate 110 is placed in the sealing frame 140, and the excess polar liquid 150 is squeezed out by pressing, and the desired electrowetting display device is obtained.

[0085] In some embodiments of the present invention, if a double-layer electrowetting display device is to be prepared, it is necessary to repeat the above-mentioned second basic operations of constructing a hydrophobic insulating layer 130, constructing a pixel wall 160 and filling a non-polar liquid 170 on the first substrate 100 to obtain the same pixel structure on the first substrate 100 as that on the second substrate 110, and the encapsulation is the same as the above-mentioned operation.

[0086] In an embodiment of the present invention, a photoresist and a photoresist containing Ag are sequentially spin-coated on the hydrophobic insulating layer 130, and then the second substrate 110 on which the photoresist and the photoresist containing Ag are spin-coated is placed under a mask of a specific pattern for exposure to form a pixel wall 160, so that the photoresist containing Ag can form a second conductive layer 180, thereby constructing the second conductive layer 180 on the pixel wall 160, so that the second conductive layer 180 and the first conductive layer 120 constitute a positive electrode and a negative electrode, and by applying a voltage between the first conductive layer 120 and the second conductive layer 180, the electrowetting display device can be turned on. Compared with the conventional technology, the electrowetting display device is turned on and off. The lower substrate is provided with electrodes to realize the opening of the electrowetting display device by applying a voltage between the two electrodes of the upper and lower substrates. The electrowetting display device manufactured in the embodiment of the present invention respectively arranges the two electrodes on the second substrate 110 and the pixel wall 160, reduces the distance between the electrode and the hydrophobic insulating layer 130, and reduces the distribution of the polar liquid 150 in the electric field between the electrode and the hydrophobic insulating layer 130. Therefore, when a voltage is applied between the two electrodes to turn on the electrowetting display device, the partial pressure of the polar liquid 150 can be reduced, and the starting threshold voltage of the electrowetting display device can be reduced, thereby improving the response time and the conductive efficiency of the electrowetting display device.

[0087] In the description of this specification, the description with reference to the terms "one embodiment, some embodiments, illustrative embodiments, examples, specific examples or some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0088] The embodiments of the present invention are described in detail above with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge scope of ordinary technicians in the relevant technical field without departing from the purpose of the present invention.

Claims

1. An electrowetting display device structure, characterized in that: include: A first substrate (100); A second substrate (110) is arranged parallel to the first substrate (100), and has a first conductive layer (120) on a surface close to the first substrate (100), wherein a hydrophobic insulating layer (130) is arranged on the first conductive layer (120); a sealing frame (140) disposed between the first substrate (100) and the second substrate (110), wherein a sealed cavity is formed between the first substrate (100), the sealing frame (140) and the second substrate (110), and wherein the sealed cavity is filled with a polar liquid (150); A pixel wall (160) is located in the sealed cavity and is disposed on the hydrophobic insulating layer (130), defining a pixel grid, wherein the pixel grid is filled with a non-polar liquid (170) that is immiscible with the polar liquid (150), and the pixel wall (160) comprises a second conductive layer (180), wherein the second conductive layer (180) and the first conductive layer (120) constitute a positive electrode and a negative electrode, respectively.

2. The electrowetting display device structure according to claim 1, characterized in that: The pixel wall (160) further comprises a first insulating layer (190), the first insulating layer (190) being connected to the hydrophobic insulating layer (130), and the second conductive layer (180) being arranged on a side of the first insulating layer (190) away from the hydrophobic insulating layer (130).

3. The electrowetting display device structure according to claim 2, characterized in that: The first insulating layer (190) is configured as a photoresist, and the second conductive layer (180) is configured as a photoresist containing Ag.

4. The electrowetting display device structure according to claim 2, characterized in that: The height of the second conductive layer (180) accounts for 10%-50% of the total height of the pixel wall (160).

5. The electrowetting display device structure according to claim 1, characterized in that: The second conductive layer (180) is provided with a conductive lead (200), and the conductive lead (200) extends outward to conduct electricity.

6. The electrowetting display device structure according to claim 1, characterized in that: The second substrate (110) is configured as ITO conductive glass.

7. The electrowetting display device structure according to claim 1, characterized in that: The first substrate (100) has a third conductive layer (210) on one side close to the second substrate (110), two hydrophobic insulating layers (130) are provided, and the two hydrophobic insulating layers (130) are respectively provided on the first conductive layer (120) and the third conductive layer (210), two pixel walls (160) are provided, and the two pixel walls (160) are respectively provided on the sides close to each other of the two hydrophobic insulating layers (130), a power source is connected between the first conductive layer (120) and the second conductive layer (180) of the pixel wall (160) on the first substrate (100), and another power source is connected between the third conductive layer (210) and the second conductive layer (180) of the pixel wall (160) on the second substrate (110).

8. A method for preparing an electrowetting display device structure, for preparing the electrowetting display device structure according to any one of claims 1 to 7, characterized in that: The steps include: S10: taking a second substrate (110) having a first conductive layer (120), spin-coating a hydrophobic insulating layer (130) on the surface of the first conductive layer (120), and performing a hydrophilic treatment on the hydrophobic insulating layer (130); S20: sequentially spin-coating a photoresist and a photoresist containing Ag on the hydrophobic insulating layer (130), and then placing the second substrate (110) spin-coated with the photoresist and the photoresist containing Ag under a mask of a specific pattern for exposure to form a pixel wall (160); S30: filling a non-polar liquid (170) into a pixel grid defined by the pixel wall (160); S40: placing the second substrate (110) obtained in step S30 on a condensation table for condensation, and then coating the pre-condensed polar liquid (150) on the non-polar liquid (170); S50: taking a first substrate (100), attaching a sealing frame (140) to the first substrate (100), then fitting the sealing frame (140) outside the pixel wall (160) and pressing it against the second substrate (110), so that the polar liquid (150) is evenly distributed in the sealing frame (140), and excess polar liquid (150) flows out from between the sealing frame (140) and the second substrate (110), and then pressing the first substrate (100), the sealing frame (140) and the second substrate (110) together to seal.

9. The method for preparing an electrowetting display device structure according to claim 8, characterized in that: After the photoresist and the Ag-containing photoresist are sequentially spin-coated in step S20, the second substrate (110) on which the photoresist and the Ag-containing photoresist are spin-coated needs to be placed in an environment of 110 degrees and heated for 120 seconds. After the heating is completed, it is allowed to cool, and then placed under a mask of a specific pattern for exposure.

10. The method for preparing an electrowetting display device structure according to claim 8, characterized in that: In the step S20, after the second substrate (110) on which the photoresist and the Ag-containing photoresist are spin-coated is placed under a mask of a specific pattern for exposure, it needs to be placed in an environment of 110 degrees and baked for 120 seconds. After baking, it is developed and blown dry, and the required pixel wall (160) can be obtained.

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