Slitting machine and system for manufacturing porous imide resin film

Abstract

The invention relates to a slitter and a system for manufacturing a porous imide resin film. The present invention addresses the problem of suppressing the occurrence of wrinkles in a film when the film is conveyed in the direction in which the film extends, and of suppressing adverse effects on the manufacturing quality of the film. [Solution] The slitter is provided with: a cutting unit for cutting a porous imide resin film, which extends in a band shape, into a plurality of strips in the direction in which the porous imide resin film extends; a winding roller for winding at least one of the plurality of porous imide resin films cut by the cutting unit; and a plurality of first guide rollers that are supported so as to be rotatable about the axis and that guide the porous imide-based resin film toward the wind-up roller. At least one of the interval between the outer peripheral surface of the porous imide resin film wound by the winding roller and the outer peripheral surface of the first guide roller adjacent to the winding roller and the interval between the outer peripheral surfaces of two adjacent first guide rollers is within the range of 1-20 mm.

Description

Technical Field

[0001] The present invention relates to a slitting machine and a system for producing a porous imide resin film. Background Art

[0002] A production system for producing a film extending in a strip shape has been proposed (for example, see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent No. 6539655 Summary of the invention

[0006] Problems to be solved by the invention

[0007] In the manufacturing system of Patent Document 1, the manufactured film is sometimes wound up in a roll. In addition, the manufactured film is sometimes cut into a plurality of strips along the extending direction (long side direction) of the film. In such a case, there is the following problem: when the film is conveyed from the upstream side of the conveying direction of the film to the winding part and the cutting part of the film, wrinkles are generated in the film, which has an adverse effect on the manufacturing quality of the film.

[0008] An object of the present invention is to provide a slitter and a system for producing a porous imide resin film, which can suppress the generation of wrinkles in a film when the film is conveyed in the film extending direction and suppress the adverse effect on the production quality of the film.

[0009] Means for solving problems

[0010] In the first embodiment of the present invention, a slitting machine can be provided, which comprises: a cutting portion, which cuts a film extending in a strip shape into a plurality of strips along the extending direction of the film; a winding roller, which winds up at least one of the plurality of films obtained by cutting by the cutting portion; and a plurality of first guide rollers, which are supported in a manner capable of rotating around an axis and guide the film toward the winding roller, and at least one of the interval between the outer peripheral surface of the film wound up by the winding roller and the outer peripheral surface of the first guide roller adjacent to the winding roller, and the interval between the outer peripheral surfaces of two adjacent first guide rollers is in the range of 1 mm to 20 mm.

[0011] In the second embodiment of the present invention, a slitting machine can be provided, which comprises: a cutting section, which cuts a film extending in a strip shape into a plurality of strips along the extending direction of the film; a winding roller, which winds up at least one of the plurality of aforementioned films obtained by cutting by the cutting section; and a plurality of second guide rollers, which are supported in a manner capable of rotating around an axis and guide the film toward the cutting section, the cutting section comprising a lower knife roller that contacts the outer peripheral surface of the film, and an upper knife roller arranged radially outside the lower knife roller, and the film is cut into a plurality of strips by clamping the film by the lower knife roller and the upper knife roller, and at least one of the interval between the outer peripheral surface of the lower knife roller and the outer peripheral surface of the second guide roller adjacent to the lower knife roller and the interval between the outer peripheral surfaces of two adjacent second guide rollers is in the range of 1 mm to 20 mm.

[0012] In the third embodiment of the present invention, a system for manufacturing a porous imide resin film can be provided, which comprises: a first system, wherein the first system applies a coating liquid containing microparticles on a substrate and then dries the coating liquid to form a strip-shaped unfired film; a second system, wherein the second system fires the unfired film formed by the first system and then removes the microparticles to form a strip-shaped porous imide resin film; a third system, wherein the third system performs a chemical etching treatment to dissolve a portion of the porous imide resin film formed by the second system; and a slitting machine involved in the above-mentioned first embodiment or the above-mentioned second embodiment, wherein the slitting machine cuts at least one of the porous imide resin films formed by the second system and the third system into multiple strips.

[0013] Effects of the Invention

[0014] According to the above-mentioned method of the present invention, by making at least one of the interval between the outer peripheral surface of the film wound up by the winding roller and the outer peripheral surface of the first guide roller adjacent to the winding roller, and the interval between the outer peripheral surfaces of the two adjacent first guide rollers within the range of 1mm to 20mm, it is possible to suppress the generation of wrinkles in the film when the film is conveyed along the extension direction of the film, and to suppress the adverse effects on the manufacturing quality of the film. In addition, the same effect can be obtained when the cut film is conveyed to the winding roller. In addition, by making at least one of the interval between the outer peripheral surface of the lower knife roller in the cutting section and the outer peripheral surface of the second guide roller adjacent to the lower knife roller, and the interval between the outer peripheral surfaces of the two adjacent second guide rollers within the range of 1mm to 20mm, it is possible to suppress the generation of wrinkles in the film when the film is conveyed to the cutting section, and to suppress the adverse effects on the manufacturing quality of the film. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] [ Figure 1 ] is a diagram showing an example of a system for manufacturing a porous imide resin film according to an embodiment of the present invention.

[0016] [ Figure 2 ] is a diagram showing a schematic structure of an unfired film forming unit of a manufacturing system.

[0017] [ Figure 3 ] is a diagram showing the schematic structure of the sintering and particle removal unit of the manufacturing system.

[0018] [ Figure 4 ] is a diagram showing the schematic structure of the etching unit of the manufacturing system.

[0019] [ Figure 5 ] is a diagram showing the structure of the slitting machine of the manufacturing system.

[0020] [ Figure 6 ] is a side view showing the structure of the cutting part of the slitting machine.

[0021] [ Figure 7 ] to show Figure 5 An enlarged view of a portion of the slitting machine is shown.

[0022] [ Figure 8 ] is a block diagram showing the functional structure of the control device of the slitting machine.

[0023] [ Fig. 9 ] is a flow chart showing an example of a process for producing a porous imide resin film according to an embodiment of the present invention.

[0024] [ Fig.10 ] is a diagram showing an example of a manufacturing process of a porous imide resin film.

[0025] [ Fig.11 ] is a diagram showing an example of a manufacturing process of a porous imide resin film.

[0026] Description of Reference Numerals

[0027] 2···Unfired film forming unit (first system), 3···Firing·particle removal unit (second system), 4···Etching unit (third system), 5···Slitter, 51d···Unwinding roller driving unit, 51r···Unwinding roller, 52···Cutting unit, 52b···Second guide roller, 52b···Lower knife roller, 52c, 52c1, 52c2, 52c3· ··Upper knife roller, 53d···Winding roller driving unit, 53r···Winding roller, 56a, 56b···First guide roller, 57a, 57b···Second guide roller, 80···Tension sensor, 90···Control device, F, Fp, Fp1, Fp2···Porous imide resin film (film), FA···Unfired film, FB···Fired film, S···Substrate DETAILED DESCRIPTION

[0028] Hereinafter, the embodiments are described with reference to the accompanying drawings. However, the present invention is not limited to the contents described below. In addition, in the accompanying drawings, in order to make the various components of the embodiments easy to understand, a part is enlarged or emphasized, or a part is simplified, and sometimes the actual structure or shape, scale, etc. are different. Hereinafter, the directions in the figure are described using the XYZ coordinate system. In the XYZ coordinate system, the plane parallel to the horizontal plane is referred to as the XY plane. A direction parallel to the XY plane is expressed as the X direction, and a direction orthogonal to the X direction is expressed as the Y direction. In addition, the direction perpendicular to the XY plane is expressed as the Z direction. The X direction, the Y direction, and the Z direction are each described with the direction indicated by the arrow in the figure as the + direction and the direction opposite to the direction indicated by the arrow as the - direction.

[0029] Figure 1 It is a figure which shows an example of the manufacturing system 1 of the porous imide type resin film which concerns on this embodiment. Figure 2 It is a diagram showing a schematic configuration of an unfired film forming unit of the manufacturing system. Figure 3 This is a diagram showing a schematic configuration of a sintering and fine particle removal unit of the manufacturing system. Figure 4 A diagram showing a schematic configuration of an etching unit in a manufacturing system. Figure 5 A diagram showing the configuration of a slitting machine in a manufacturing system. Figure 1 The manufacturing system 1 shown manufactures a porous imide resin film (film) F.

[0030] The manufacturing system 1 includes an unfired film forming unit (first system) 2, a firing and particle removal unit (second system) 3, an etching unit (third system) 4, a slitter 5, and a system control device not shown. In the manufacturing system 1, the porous imide resin film F is manufactured by sequentially passing through the unfired film forming unit 2, the firing and particle removal unit 3, the etching unit 4, and the slitter 5 in the following order.

[0031] Figure 1 , Figure 2 The unfired film forming unit 2 shown forms a strip-shaped unfired film FA by applying a coating liquid containing fine particles on a substrate S and then drying the coating liquid. Figure 1 , Figure 3 The calcination and particle removal unit 3 shown in the figure calcines the uncalcined film FA to remove the particles, thereby forming a belt-shaped porous imide-based resin film F. Figure 1 , Figure 4 The etching unit 4 shown performs a chemical etching process for dissolving a part of the porous imide resin film F. Figure 1 , Figure 5 The slitter 5 shown cuts the porous imide resin film F into strips having a predetermined product width. The system control device comprehensively controls the entire manufacturing system 1 .

[0032] In this embodiment, the unfired film forming unit 2, the firing and particle removal unit 3, the etching unit 4, and the slitter 5 are arranged to be separated from each other. In such a manufacturing system 1, the intermediate product being manufactured is wound into a roll and transported as described in detail later between the unfired film forming unit 2 and the firing and particle removal unit 3, between the firing and particle removal unit 3 and the etching unit 4, and between the etching unit 4 and the slitter 5. It should be noted that the units in which the processes are performed successively in the unfired film forming unit 2, the firing and particle removal unit 3, and the etching unit 4 can also be arranged continuously.

[0033] [Coating liquid]

[0034] Here, before describing each unit of the production system 1 , the porous imide-based resin film F produced by the production system 1 will be described.

[0035] The coating liquid that becomes the raw material of the porous imide resin film F contains a predetermined resin material, microparticles, and a solvent. As the predetermined resin material, for example, polyamic acid, polyimide, polyamide-imide, or polyamide can be cited. As the solvent, an organic solvent that can dissolve these resin materials can be used.

[0036] The coating liquid can be prepared, for example, by mixing a solvent in which microparticles are pre-dispersed with polyamic acid, polyimide, polyamide-imide or polyamide in an arbitrary ratio. In addition, polyamic acid, polyimide, polyamide-imide or polyamide can also be prepared by polymerization in a solvent in which microparticles are pre-dispersed. For example, it can be manufactured in the following manner: tetracarboxylic dianhydride and diamine are polymerized in an organic solvent in which microparticles are pre-dispersed to make polyamic acid, or further imidization is performed to make polyimide.

[0037] The final viscosity of the coating liquid is preferably 100 to 7000 cP, more preferably 300 to 5000 cP, and even more preferably 500 to 3000 cP. When the viscosity of the coating liquid is within this range, uniform film formation can be performed.

[0038] In the above-mentioned coating liquid, when the microparticles and polyamic acid or polyimide are dried to form an unfired film FA, when the material of the microparticles is an inorganic material described later, the microparticles and polyamic acid or polyimide can be mixed in a manner that the ratio of microparticles / polyimide is 1 to 4 (mass ratio). It is further preferably set to 1.2 to 3 (mass ratio). When the material of the microparticles is an organic material described later, the microparticles and polyamic acid or polyimide can be mixed in a manner that the ratio of microparticles / polyimide is 0.5 to 2 (mass ratio). It is further preferably set to 0.6 to 1.5 (mass ratio). In addition, the microparticles and polyamic acid or polyimide can be mixed in a manner that the volume ratio of microparticles / polyimide is 0.6 to 2.7 when the unfired film FA is formed. It is further preferably set to 0.8 to 2 (volume ratio). If the mass ratio or volume ratio of microparticles / polyimide is above the lower limit when making the unfired film FA, a hole with a density suitable for the diaphragm can be obtained, and if it is below the upper limit, problems such as an increase in viscosity and cracks in the film will not occur, and the film can be stably formed. In the case where the resin material is polyamide-imide or polyamide instead of polyamic acid or polyimide, the mass ratio is also the same as above.

[0039] Hereinafter, each resin material will be described in detail.

[0040] <Polyamic acid>

[0041] The polyamic acid used in the present embodiment can be obtained by polymerizing any tetracarboxylic dianhydride and diamine without particular limitation. The amount of tetracarboxylic dianhydride and diamine used is not particularly limited, and it is preferred to use 0.50 to 1.50 mol of diamine, more preferably 0.60 to 1.30 mol of diamine, and particularly preferably 0.70 to 1.20 mol of diamine relative to 1 mol of tetracarboxylic dianhydride.

[0042] Tetracarboxylic dianhydride can be suitably selected from tetracarboxylic dianhydride used as the synthetic raw material of polyamic acid in the past.Tetracarboxylic dianhydride can be aromatic tetracarboxylic dianhydride or aliphatic tetracarboxylic dianhydride, but from the aspect of the heat resistance of the obtained polyimide resin, aromatic tetracarboxylic dianhydride is preferably used.Tetracarboxylic dianhydride can also be used in combination of two or more.

[0043] Preferred specific examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-biphenyltetracarboxylic dianhydride, 2,2,6,6-biphenyltetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 3 ,3',4,4'-benzophenonetetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)ether dianhydride, bis(2,3-dicarboxyphenyl)ether dianhydride, 2,2',3,3'-benzophenonetetracarboxylic dianhydride, 4,4-(p-phenylenedioxy)diphthalic dianhydride, 4,4-(isophenylenedioxy)diphthalic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 1,2,3,4-pyromellitic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, 2,3,6,7-anthracenetetracarboxylic dianhydride, 1,2,7,8-phenanthrenetetracarboxylic dianhydride, 9,9-diphthalic anhydride fluorene, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, etc. Examples of the aliphatic tetracarboxylic dianhydride include ethylenetetracarboxylic dianhydride, butanetetracarboxylic dianhydride, cyclopentanetetracarboxylic dianhydride, cyclohexanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, and 1,2,3,4-cyclohexanetetracarboxylic dianhydride. Among them, 3,3',4,4'-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride are preferred in view of price, availability, etc. In addition, these tetracarboxylic dianhydrides may be used alone or in combination of two or more.

[0044] The diamine can be suitably selected from diamines used as synthetic raw materials for polyamic acid in the past. The diamine can be an aromatic diamine or an aliphatic diamine, but from the aspect of the heat resistance of the obtained polyimide resin, an aromatic diamine is preferred. These diamines can also be used in combination of two or more.

[0045] Examples of the aromatic diamine include diamino compounds to which 1 or 2 to 10 phenyl groups are bonded, specifically phenylenediamine and its derivatives, diaminobiphenyl compounds and their derivatives, diaminodiphenyl compounds and their derivatives, diaminotriphenyl compounds and their derivatives, diaminonaphthalene and its derivatives, aminophenylaminoindanes and their derivatives, diaminotetraphenyl compounds and their derivatives, diaminohexaphenyl compounds and their derivatives, and Cardo-type fluorenediamine derivatives.

[0046] Phenylenediamine includes meta-phenylenediamine, para-phenylenediamine and the like. Phenylenediamine derivatives include diamines to which an alkyl group such as a methyl group or an ethyl group is bonded, for example, 2,4-diaminotoluene, 2,4-triphenylenediamine and the like.

[0047] The diaminobiphenyl compound is a compound in which two aminophenyl groups are bonded to each other via a phenyl group, and examples thereof include 4,4'-diaminobiphenyl and 4,4'-diamino-2,2'-bis(trifluoromethyl)biphenyl.

[0048] The diaminodiphenyl compound is a compound in which two aminophenyl groups are bonded to each other through phenyl groups via other groups. The bond is an ether bond, a sulfonyl bond, a thioether bond, a bond based on an alkylene group or a derivative group thereof, an imino bond, an azo bond, a phosphine oxide bond, an amide bond, a ureylene bond, etc. The alkylene bond is a bond having about 1 to 6 carbon atoms, and its derivative group is a group in which one or more hydrogen atoms of the alkylene group are replaced by halogen atoms or the like.

[0049] Examples of the diaminodiphenyl compound include 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl ketone, 3,4'-diaminodiphenyl ketone, 2,2-bis(p-aminophenyl)propane, 2,2'-bis(p-aminophenyl)hexafluoropropane, 4-methyl-2,4-bis(p-aminophenyl)-1-pentene, 4-methyl-2,4-bis(p-aminophenyl)-1-pentene, and 4-methyl-2,4-bis(p-aminophenyl)-1-pentene. Bis(p-aminophenyl)-2-pentene, iminodiphenylamine, 4-methyl-2,4-bis(p-aminophenyl)pentane, bis(p-aminophenyl)phosphine oxide, 4,4'-diaminoazobenzene, 4,4'-diaminodiphenyl urea, 4,4'-diaminodiphenylamide, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 4,4'-bis(4-aminophenoxy)biphenyl, bis[4-(4-aminophenoxy)phenyl]sulfone, bis[4-(3-aminophenoxy)phenyl]sulfone, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, etc.

[0050] Among them, p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, and 4,4′-diaminodiphenyl ether are preferred in view of price, availability, and the like.

[0051] The diaminotriphenyl compound is a compound in which two aminophenyl groups and one phenylene group are bonded via other groups, and the other groups can be selected from the same groups as the diaminodiphenyl compound. Examples of the diaminotriphenyl compound include 1,3-bis(m-aminophenoxy)benzene, 1,3-bis(p-aminophenoxy)benzene, and 1,4-bis(p-aminophenoxy)benzene.

[0052] Examples of diaminonaphthalene include 1,5-diaminonaphthalene and 2,6-diaminonaphthalene.

[0053] Examples of aminophenylaminoindan include 5- or 6-amino-1-(p-aminophenyl)-1,3,3-trimethylindan.

[0054] Examples of the diaminotetraphenyl compound include 4,4'-bis(p-aminophenoxy)biphenyl, 2,2'-bis[p-(p'-aminophenoxy)phenyl]propane, 2,2'-bis[p-(p'-aminophenoxy)biphenyl]propane, and 2,2'-bis[p-(m-aminophenoxy)phenyl]benzophenone.

[0055] Examples of the Cardo-type fluorene diamine derivative include 9,9-dianiline fluorene and the like.

[0056] The aliphatic diamine may be, for example, a diamine having about 2 to 15 carbon atoms, and specific examples thereof include pentamethylenediamine, hexamethylenediamine, and heptamethylenediamine.

[0057] In addition, the compound in which the hydrogen atom of these diamines is substituted with at least one substituent selected from the group consisting of a halogen atom, a methyl group, a methoxy group, a cyano group, a phenyl group, etc. may be sufficient.

[0058] The method for producing the polyamic acid used in the present embodiment is not particularly limited, and for example, a known method such as a method of reacting an acid and a diamine component in an organic solvent can be employed.

[0059] The reaction of tetracarboxylic dianhydride and diamine is usually carried out in an organic solvent. The organic solvent used in the reaction of tetracarboxylic dianhydride and diamine is not particularly limited as long as it can dissolve tetracarboxylic dianhydride and diamine and does not react with tetracarboxylic dianhydride and diamine. The organic solvent can be used alone or in combination of two or more.

[0060] Examples of the organic solvent used in the reaction of tetracarboxylic dianhydride and diamine include nitrogen-containing polar solvents such as N-methyl-2-pyrrolidone, 1-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, and N,N,N',N'-tetramethylurea; lactone-based polar solvents such as β-propiolactone, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, and ε-caprolactone; dimethyl sulfoxide; acetonitrile; fatty acid esters such as ethyl lactate and butyl lactate; ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dioxane, tetrahydrofuran, methyl cellosolve acetate, and ethyl cellosolve acetate; and phenolic solvents such as cresols. These organic solvents may be used alone or in combination of two or more. The amount of the organic solvent used is not particularly limited, but it is desirable that the content of the generated polyamic acid is 5 to 50% by mass.

[0061] Among these organic solvents, nitrogen-containing polar solvents such as N-methyl-2-pyrrolidone, 1-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, and N,N,N',N'-tetramethylurea are preferred in view of the solubility of the generated polyamic acid.

[0062] The polymerization temperature is usually -10 to 120°C, preferably 5 to 30°C. The polymerization time varies depending on the composition of the raw materials used, but is usually 3 to 24 hours. In addition, the intrinsic viscosity of the organic solvent solution of the polyamic acid obtained under such conditions is preferably in the range of 1000 to 100,000 cP (centipoise), and more preferably in the range of 5000 to 70,000 cP.

[0063] <Polyimide>

[0064] The polyimide used in this embodiment is not limited in structure and molecular weight as long as it is a soluble polyimide that can be dissolved in an organic solvent used in the coating solution, and a known polyimide can be used. For the polyimide, a functional group capable of condensation such as a carboxyl group or a functional group that promotes a crosslinking reaction during calcination can be provided on the side chain.

[0065] In order to prepare a polyimide soluble in an organic solvent, it is effective to use a monomer for introducing a flexible curved structure into the main chain, for example, the following monomers: aliphatic diamines such as ethylenediamine, hexamethylenediamine, 1,4-diaminocyclohexane, 1,3-diaminocyclohexane, and 4,4'-diaminodicyclohexylmethane; aromatic diamines such as 2-methyl-1,4-phenylenediamine, o-tolidine, m-tolidine, 3,3'-dimethoxybenzidine, and 4,4'-diaminobenzanilide; polyoxyalkylene diamines such as polyoxyethylene diamine, polyoxypropylene diamine, and polyoxybutylene diamine; polysiloxane diamine; 2,3,3',4'-oxydiphthalic anhydride, 3,4,3',4'-oxydiphthalic anhydride, 2,2-bis(4-hydroxyphenyl)propane dibenzoate-3,3',4,4'-tetracarboxylic dianhydride, and the like. In addition, the use of monomers having functional groups that improve solubility in organic solvents, such as 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, 2-trifluoromethyl-1,4-phenylenediamine and other fluorodiamines is also effective. In addition, in addition to the monomers used to improve the solubility of the above-mentioned polyimide, the same monomers as those described in the above-mentioned polyamic acid column can also be used in combination within the range that does not inhibit solubility.

[0066] The means for making the polyimide soluble in an organic solvent used in the present embodiment is not particularly limited, for example, known methods such as chemical imidization or heating imidization of polyamic acid and dissolving it in an organic solvent can be adopted. As such polyimide, aliphatic polyimide (all aliphatic polyimide), aromatic polyimide, etc. can be cited, preferably aromatic polyimide.

[0067] <Polyamide-imide>

[0068] The polyamide-imide used in this embodiment is not limited in structure and molecular weight as long as it is a soluble polyamide-imide that can be dissolved in an organic solvent used in the coating solution, and known polyamide-imides can be used. For the polyamide-imide, a functional group capable of condensation such as a carboxyl group or a functional group that promotes a cross-linking reaction during calcination can be provided on the side chain.

[0069] The polyamideimide used in the present embodiment can be used without particular limitation. A polyamideimide obtained by reacting any trimellitic anhydride with diisocyanate, or a polyamideimide obtained by imidizing a precursor polymer obtained by reacting any reactive derivative of trimellitic anhydride with diamine can be used.

[0070] Examples of the above-mentioned optional trimellitic anhydride or a reactive derivative thereof include trimellitic anhydride, trimellitic anhydride halides such as trimellitic anhydride chloride, and trimellitic anhydride esters.

[0071] Examples of the diisocyanate include m-phenylene diisocyanate, p-phenylene diisocyanate, 4,4′-oxybis(phenylisocyanate), 4,4′-diisocyanate diphenylmethane, bis[4-(4-isocyanate phenoxy)phenyl]sulfone, and 2,2′-bis[4-(4-isocyanate phenoxy)phenyl]propane.

[0072] Examples of the diamine include the same diamines as those exemplified in the description of the polyamic acid described above.

[0073] <Polyamide>

[0074] As the polyamide, a polyamide obtained from a dicarboxylic acid and a diamine is preferred, and an aromatic polyamide is particularly preferred.

[0075] Examples of the dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, methylmaleic acid, dimethylmaleic acid, phenylmaleic acid, chloromaleic acid, dichloromaleic acid, fluoromaleic acid, phthalic acid, isophthalic acid, terephthalic acid, and biphenylcarboxylic acid.

[0076] As the diamine, there may be mentioned the same diamines as those exemplified in the description of the polyamic acid.

[0077] <Microparticles>

[0078] Next, the microparticles are described. For example, microparticles having a high sphericity and a small particle size distribution index can be used. Such microparticles have excellent dispersibility in liquid and are in a state of not agglomerating with each other. The particle size (average diameter) of the microparticles can be set to, for example, about 5 to 3000 nm. By using such microparticles as described above, the pore size of the porous imide resin film F obtained by removing the microparticles in a subsequent process can be made uniform. Therefore, the electric field applied to the diaphragm formed by the porous imide resin film F can be made uniform.

[0079] It should be noted that as the material of the microparticles, as long as it is insoluble in the solvent contained in the coating solution and can be removed from the porous imide resin film F in the subsequent process, a known material can be used without particular limitation. For example, among inorganic materials, metal oxides such as silica, titanium oxide, and aluminum oxide (Al2O3) can be cited. In addition, among organic materials, organic polymer microparticles such as high molecular weight olefins (polypropylene, polyethylene, etc.), polystyrene, epoxy resin, cellulose, polyvinyl alcohol, polyvinyl butyral, polyester, polymethyl methacrylate, and polyether can be cited. In addition, as an example of microparticles, colloidal silica, calcium carbonate, etc. such as (monodispersed) spherical silica particles can be cited. In this case, the pore size of the porous imide resin film F can be made more uniform.

[0080] It should be noted that the coating liquid may contain various additives such as a release agent, a dispersant, a condensing agent, an imidizing agent, a surfactant, etc., in addition to the predetermined resin material, fine particles, and a solvent, as required.

[0081] [Unfired film forming unit]

[0082] like Figure 2 As shown, the unfired film forming unit 2 is provided with a substrate supply unit 21, a coating unit 22, a drying unit 23, a separation unit 24, a substrate winding unit 25, and a product winding unit 26 on a floor surface 8. The substrate supply unit 21 unwinds the substrate S extending in a strip shape. Here, as the material of the substrate S, for example, polyethylene terephthalate (PET) can be cited, but it is not limited to this material, and it can also be a metal material such as stainless steel. The substrate S is arranged on a supply roller 21r in a state of a substrate roll Sr wound into a roll shape. The substrate supply unit 21 unwinds the substrate S from the substrate roll Sr.

[0083] The substrate S can be unwound from the substrate roll Sr by winding it up using, for example, a winding roller 25r provided in the substrate winding section 25 described later. The substrate S can be conveyed to the coating section 22, the drying section 23, and the substrate winding section 25 at a predetermined conveying speed via a plurality of intermediate rollers. The coating section 22 applies a coating liquid containing microparticles on the substrate S supplied by the substrate supply section 21. The coating section 22 sprays a pre-prepared coating liquid from, for example, a nozzle onto the substrate S conveyed at a predetermined speed, thereby forming a strip-shaped unfired film FA on the substrate S. Here, there is no limitation on the configuration for applying the coating liquid on the substrate S using the coating section 22, and various known configurations can be adopted.

[0084] The substrate S formed with the unfired film FA by the coating unit 22 is supplied to the drying unit 23. The drying unit 23 removes the solvent contained in the unfired film FA. The drying unit 23 may be, for example, a method of sequentially passing the unfired film FA through a plurality of drying furnaces having different heating temperatures. By passing through the drying unit 23, the solvent is removed from the unfired film FA on the substrate S. The substrate S and the unfired film FA that have passed through the drying unit 23 are conveyed to the separation unit 24. The separation unit 24 separates the substrate S from the unfired film FA. The substrate S separated in the separation unit 24 is conveyed to the substrate winding unit 25. The unfired film FA separated from the substrate S in the separation unit 24 is conveyed to the product winding unit 26.

[0085] The substrate winding section 25 winds up the substrate S onto a core provided on a winding roller 25r. The winding roller 25r is rotationally driven at a predetermined speed by a motor not shown in the figure. In addition, the product winding section 26 winds up the unfired film FA separated from the substrate S onto a core provided on a winding roller 26r. The winding roller 26r is rotationally driven at a predetermined speed by a motor not shown in the figure. By operating as described above, an unfired film roll FAr obtained by winding up the unfired film FA is generated. The generated unfired film roll FAr is transported to the sintering and particle removal unit 3 by, for example, an operator, manual operation using a transport trolley, a manipulator, a bridge crane, etc.

[0086] [Firing and particle removal unit]

[0087] like Figure 3 As shown, the sintering and particle removal unit 3 includes an unwinding section 31, a sintering furnace 33, a first etching section 34, a washing section 35, a drying section 36, and a winding section 37 on a floor surface 8. The unwinding section 31 unwinds the unsintered film FA extending in a strip shape from the unsintered film roll FAr. The unwinding roller 31r of the unwinding section 31 is provided with an unsintered film roll FAr obtained by winding the unsintered film FA into a roll shape. The unwinding section 31 unwinds the unsintered film FA from the unsintered film roll FAr. The unsintered film FA can be unwound from the unsintered film roll FAr by, for example, winding it using a winding roller 37r provided in the winding section 37 described later.

[0088] The unfired film FA is conveyed to the winding section 37 at a predetermined conveying speed through the firing furnace 33, the first etching section 34, the cleaning section 35, and the drying section 36. It should be noted that in the present embodiment, the unfired film FA is conveyed at a predetermined conveying speed by a conveyor, for example, not shown, provided in the first etching section 34 described later, in addition to being conveyed by the winding roller 37r.

[0089] The firing furnace 33 fires the unfired film FA to imidize the resin material in the coating liquid to form a fired film FB containing particles. The firing furnace 33 heats the unfired film FA to, for example, about 120°C to 450°C using an infrared heater or the like while conveying the unfired film FA at a predetermined conveying speed in a chamber. The first etching unit 34 etches the fired film FB to remove the particles contained in the fired film FB to form a porous imide resin film F. The first etching unit 34 removes the particles by, for example, immersing the fired film FB in an etching solution that can dissolve or decompose the particles. As the etching solution, for example, a hydrofluoric acid solution can be used. The first etching unit 34 immerses the fired film FB in an etching tank (not shown) storing the etching solution while conveying it at a predetermined conveying speed. As a result, the particles contained in the fired film FB are dissolved and removed.

[0090] When the particles are removed as described above, cavities are formed in the portions where the particles exist, thereby forming a porous imide resin film F. In addition, the first etching unit 34 may be provided with, for example, a conveyor that supports and conveys the fired film FB from below.

[0091] The washing section 35 washes the porous imide resin film F formed by the first etching section 34 with a washing liquid. The method used for washing the porous imide resin film F in the washing section 35 is not limited to the above method. The drying section 36 dries the washed porous imide resin film F. The drying section 36 heats the porous imide resin film F that has passed through the washing section 35, for example, to volatilize the washing liquid remaining in the porous imide resin film F. Here, at least one of the washing section 35 and the drying section 36 may be provided with a conveyor that supports the porous imide resin film F from below and conveys it.

[0092] The winding section 37 winds up the porous imide resin film F onto a winding core provided on a winding roller 37r. The winding roller 37r is driven to rotate at a predetermined speed by a motor (not shown). The porous resin film roll Fr obtained by winding up the porous imide resin film F is generated by the above-mentioned operation. The generated porous resin film roll Fr is transported to the etching unit 4 by, for example, an operator, manual operation using a transport trolley, a manipulator, a bridge crane, etc.

[0093] [Etching Unit 4]

[0094] like Figure 4 As shown, the etching unit 4 includes an unwinding section 41, a second etching section 42, a washing section 43, a drying section 44, a re-firing furnace 45, an inspection section 46, a measuring section 47, and a winding section 48 on a floor surface 8. The unwinding section 41 unwinds the porous imide resin film F extending in a strip shape from the porous resin film roll Fr. The porous resin film roll Fr obtained by winding the porous imide resin film F into a roll shape is provided on the unwinding roller 41r of the unwinding section 41. The unwinding section 41 unwinds the porous imide resin film F from the porous resin film roll Fr. The porous imide resin film F can be unwound from the porous resin film roll Fr by winding it using, for example, a winding roller 48r provided in the winding section 48 described later.

[0095] The unwound porous imide resin film F is conveyed to the winding section 48 at a predetermined conveying speed through the second etching section 42, the washing section 43, the drying section 44, the re-firing furnace 45, the inspection section 46, and the measuring section 47. It should be noted that in the present embodiment, the porous imide resin film F is conveyed at a predetermined conveying speed by the winding roller 48r.

[0096] The second etching section 42 performs chemical etching on the porous imide resin film F. When the microparticles contained in the porous imide resin film F are removed by the etching process in the first etching section 34, minute burr-like irregularities protruding from the periphery of the hole are formed on the surface of the porous imide resin film F due to the escape of the microparticles. In the second etching section 42, the irregularities on the periphery of the hole are flattened by performing chemical etching.

[0097] As the etching liquid for chemical etching in the second etching section 42, for example, a sodium hydroxide aqueous solution or a TMAH (tetramethylammonium hydroxide) aqueous solution can be used. The second etching section 42 immerses the porous imide resin film F in an etching tank (not shown) storing the etching liquid while conveying it at a predetermined conveying speed. As a result, the concavoconvexity around the hole formed in the porous imide resin film F is dissolved or softened, and the surface of the porous imide resin film F is flattened. It should be noted that a conveyor that supports the porous imide resin film F from the bottom and conveys it can also be provided in the second etching section 42.

[0098] The washing section 43 washes the porous imide resin film F that has passed through the second etching section 42 with a washing liquid. The method used for washing the porous imide resin film F in the washing section 43 is not limited to this configuration. The drying section 44 dries the washed porous imide resin film F using various known methods. The drying section 44 heats the porous imide resin film F that has passed through the washing section 43, for example, to volatilize the washing liquid remaining in the porous imide resin film F. Here, at least one of the washing section 43 and the drying section 44 may include a conveyor that supports the porous imide resin film F from below and conveys it.

[0099] The re-firing furnace 45 re-firings the porous imide resin film F. The resin components and the like that are not imidized in the above-mentioned sintering furnace 33 and remain in the porous imide resin film F are imidized by the re-firing furnace 45. The re-firing furnace 45 heats the porous imide resin film F to, for example, about 300° C. to 400° C. by using an infrared heater or the like while conveying the porous imide resin film F at a predetermined conveying speed in a chamber.

[0100] The inspection unit 46 inspects the quality of the porous imide resin film F that has passed through the re-firing furnace 45. The inspection unit 46, for example, inspects the porous imide resin film F for foreign matter. The inspection unit 46, for example, may also inspect the generation of pinholes in the porous imide resin film F. The inspection unit 46, for example, irradiates light to the porous imide resin film F using an unillustrated lighting device while photographing the porous imide resin film F using an unillustrated camera. The inspection unit 46 performs image analysis on the photographed image (video) to determine whether the generation of foreign matter or pinholes falls within the inspection criteria. It should be noted that the inspection content and inspection method in the inspection unit 46 are not limited to the above-mentioned contents.

[0101] The measuring unit 47 measures the dimensions of the porous imide resin film F. The measuring unit 47 measures, for example, the film thickness of the porous imide resin film F. The measuring unit 47 may also measure other dimensions such as the width of the porous imide resin film F. The measuring unit 47 determines whether the measured dimensions of the porous imide resin film F fall within the dimension standard. The measurement contents and measurement methods in the measuring unit 47 are not limited to the above-mentioned contents. In addition, there are no particular limitations on the inspection of the inspection unit 46, the measurement results of the measuring unit 47, the inspection standards, and the operations outside the measurement standards.

[0102] The winding section 48 winds the porous imide resin film F onto a winding core provided on a winding roller 48r. The winding roller 48r is driven to rotate at a predetermined speed by a motor (not shown). The above operation generates a finished roll Fm obtained by winding the porous imide resin film F. The generated finished roll Fm is transported to the slitting machine 5 by, for example, an operator, manual operation using a transport trolley, a manipulator, a bridge crane, etc.

[0103] [Slitting machine]

[0104] like Figure 5 As shown, the slitter 5 cuts the strip-shaped porous imide resin film F that has passed through the etching unit 4 into a plurality of strips along the extension direction (long side direction) of the porous imide resin film F. The slitter 5 cuts the porous imide resin film F into a plurality of strips of porous imide resin film F having a predetermined width in the X direction. The slitter 5 mainly includes an unwinding section 51, a cutting section 52, a winding section 53, a surplus winding section 54, a first guide roller group 56, and a second guide roller group 57. The unwinding section 51, the cutting section 52, the winding section 53, the surplus winding section 54, the first guide roller group 56, and the second guide roller group 57 are supported by a base 55 provided on the floor surface 8 via a frame not shown.

[0105] The unwinding section 51 unwinds the porous imide resin film F extending in a strip shape from the finished roll Fm. The unwinding section 51 includes an unwinding roller 51r. The finished roll Fm conveyed from the etching unit 4 is supported on the unwinding roller 51r. The unwinding roller 51r is arranged on the frame in a manner that allows it to rotate around an axis extending in the X-axis direction. Here, the unwinding roller 51r may also be arranged in a rotatable manner without the unwinding roller driving section 51d, but in the present embodiment, the unwinding section 51 includes an unwinding roller driving section 51d, and the unwinding roller driving section 51d includes a motor that drives the unwinding roller 51r to rotate.

[0106] Figure 6 FIG. 2 is a side view showing the structure of the cutting part of the slitting machine. Figure 5 , Figure 6 As shown in FIG. 1 , the cutting unit 52 cuts the strip-shaped porous imide resin film F into a plurality of strips along the extending direction of the film. The cutting unit 52 divides the strip-shaped porous imide resin film F into a plurality of strips along the width direction of the porous imide resin film along the X direction. For example, the cutting unit 52 cuts the porous imide resin film F while conveying the strip-shaped porous imide resin film F along the extending direction of the strip-shaped porous imide resin film F. The cutting unit 52 includes a lower knife roll 52b and an upper knife roll 52c.

[0107] The lower knife roller 52b is provided on a frame (not shown) so as to be rotatable about an axis extending in the X-axis direction. The lower knife roller 52b has a roller width greater than the width of the porous imide resin film F before cutting that is delivered from the unwinding section 51. The outer peripheral surface of the lower knife roller 52b contacts the porous imide resin film F from below. Figure 6 As shown in FIG. 1 , a plurality of grooves 52m are formed at predetermined positions in the X direction on the outer peripheral surface of the lower blade roller 52b. In the present embodiment, for example, three grooves 52m are formed. The plurality of grooves 52m are formed along the outer peripheral surface of the lower blade roller 52b at a plurality of positions in the X direction over the entire circumference. The positions of the plurality of grooves 52m in the X direction are set to coincide with the positions at which the porous imide resin film F is to be cut.

[0108] The upper knife roller 52c is arranged on the radially outer side of the lower knife roller 52b. In the present embodiment, the upper knife roller 52c is arranged on the upper side (+Z side) of the lower knife roller 52b. A plurality of upper knife rollers 52c are arranged at intervals in the X direction. The upper knife roller 52c is arranged with the same number of grooves 52m as the lower knife roller 52b. Each upper knife roller 52c is in the shape of a disk and is arranged in a manner that it can rotate around an axis extending in the X-axis direction. A sharp blade portion 52s is continuously formed on the outer peripheral edge of each upper knife roller 52c over the entire circumference. The blade portion 52s of each upper knife roller 52c is inserted into the groove 52m of the lower knife roller 52b.

[0109] like Figure 5As shown in the figure, a plurality of upper blade rollers 52c are supported at the front end of the swing arm 52p in a manner that they can rotate around an axis extending in the X direction. The base end of the swing arm 52p is connected to a swing shaft 52y that is rotationally driven by a motor not shown. The swing arm 52p is configured so that the swing shaft 52y can be rotated by the motor and can be swung around the base end. With this configuration, the plurality of upper blade rollers 52c supported at the front end of the swing arm 52p can advance and retreat relative to the lower blade roller 52b.

[0110] In such a cutting section 52, the porous imide resin film F conveyed from the unwinding section 51 through the second guide roller group 57 described later passes between the lower blade roller 52b and the plurality of upper blade rollers 52c. The porous imide resin film F is conveyed along the extending direction of the porous imide resin film F at a predetermined conveying speed while being sandwiched by the blades 52s of the plurality of upper blade rollers 52c and the grooves 52m of the lower blade roller 52b, thereby being continuously cut along the extending direction of the porous imide resin film F. As a result, the porous imide resin film F is cut into a plurality of strips in the extending direction.

[0111] like Figure 6 As shown, in this embodiment, the upper knife roller 52c includes: an upper knife roller 52c1 disposed at the center of the porous imide resin film F in the width direction; and a pair of upper knife rollers 52c2 and 52c3 spaced apart from the upper knife roller 52c1 on both outer sides in the width direction. The upper knife rollers 52c2 and 52c3 are disposed on the inner side of the porous imide resin film F in the width direction relative to both ends Fe of the porous imide resin film F in the width direction.

[0112] By cutting the porous imide resin film F into a plurality of strips using such upper knife rollers 52c1, 52c2, and 52c3, a porous imide resin film Fp1 and a porous imide resin film Fp2 having a predetermined product width are cut out between the upper knife roller 52c1 and one upper knife roller 52c2, and between the upper knife roller 52c1 and another upper knife roller 52c3. Here, two porous imide resin films Fp1 and Fp2 are obtained as the porous imide resin film Fp having a predetermined product width, but the porous imide resin film Fp having a predetermined product width cut out by the cutting unit 52 may be only one strip or may be two or more strips. In addition, the portion outside the porous imide resin film F relative to one upper knife roller 52c2 and the portion outside the porous imide resin film F relative to another upper knife roller 52c3 are not used as products, but are cut off from the porous imide resin films Fp1 and Fp2 as excess porous imide resin film Fy.

[0113] like Figure 5As shown, the winding section 53 winds up the porous imide resin film Fp having a predetermined product width cut out from the cutting section 52. In the present embodiment, for example, two porous imide resin films Fp1 and Fp2 are cut out from the porous imide resin film F before cutting. Therefore, the winding section 53 includes two sets of a first winding section 53A and a second winding section 53B. Each winding section 53 (53A, 53B) winds up at least one of the plurality of porous imide resin films Fp cut out by the cutting section.

[0114] Each winding section 53 includes a winding roller 53r, a winding roller driving section 53d, a clamping roller 53n, a guide rail 53g, and a sliding member 53s. The winding roller 53r is arranged in a manner that can rotate around an axis extending in the X-axis direction. On the winding roller 53r, a winding core (not shown) for winding up the porous imide resin film Fp (Fp1, Fp2) is arranged. The winding roller driving section 53d includes a motor (not shown) that drives the winding roller 53r to rotate at a specified rotation speed. As a result, the porous imide resin film Fp is wound onto the winding core arranged on the winding roller 53r. By operating as described above, a product roll Fpr obtained by winding up the porous imide resin film Fp is generated.

[0115] The clamping roller 53n is arranged on the +Y direction side relative to the winding roller 53r. The clamping roller 53n is arranged in a manner that can rotate around an axis extending in the X-axis direction. The clamping roller 53n is in contact with the porous imide resin film Fp to be wound up by the winding roller 53r. The clamping roller 53n presses the porous imide resin film Fp to be wound up by the winding roller 53r to the winding roller 53r side. The clamping roller 53n is configured in a manner that the force pressing the porous imide resin film Fp can be adjusted by various known mechanisms such as a cylinder (cylinder) not shown in the figure.

[0116] The guide rail 53g enables the winding roller 53r to move forward and backward relative to the first guide rollers 56a and 56b described later. The guide rail 53g extends in the Y direction. The sliding member 53s is configured to be able to move forward and backward in the Y direction along the guide rail 53g. The winding roller drive unit 53d and the winding roller 53r are provided on the sliding member 53s. With this configuration, the winding roller 53r can move forward and backward in the Y direction along the guide rail 53g together with the sliding member 53s and the winding roller drive unit 53d. The control device 90 described later is used to control the sliding member 53s so that the sliding member 53s gradually moves away from the first guide rollers 56a and 56b as the amount of the porous imide resin film Fp provided on the winding core of the winding roller 53r increases. As a result, the winding start position of the porous imide resin film Fp conveyed from the first guide rollers 56a and 56b to the winding unit 53 becomes constant.

[0117] The excess winding section 54 winds up the excess porous imide resin film Fy cut from the porous imide resin film F before cutting. The excess winding section 54 winds up the excess porous imide resin film Fy onto a winding core provided on a winding roller 54r. In the present embodiment, the excess porous imide resin film Fy is cut from both sides of the porous imide resin film Fp in the width direction when the porous imide resin film Fp is cut by the cutting section 52. Therefore, in the excess winding section 54, two winding cores are provided on the winding roller 54r to wind up the two excess porous imide resin films Fy cut from both sides of the porous imide resin film F in the width direction. In addition, two sets of winding rollers 54r may also be provided.

[0118] The winding roller 54r is driven to rotate at a predetermined speed by a motor (not shown). The operation is performed as described above to generate an extra roll Fyr obtained by winding up the extra porous imide resin film Fy. The product roll Fpr and the extra roll Fyr generated by the slitting machine 5 are carried out from the slitting machine 5 by, for example, an operator, manual operation using a conveying trolley, a manipulator, a bridge crane, etc.

[0119] Figure 7 To show Figure 5 An enlarged view of a portion of the slitting machine is shown. Figure 7 As shown, the second guide roller group 57 guides the porous imide resin film F before cutting toward the lower knife roller 52b of the cutting part 52. In this embodiment, the second guide roller group 57 includes, for example, two second guide rollers 57a and 57b. The second guide rollers 57a and 57b constituting the second guide roller group 57 are not limited to two, but may be one, or may be three or more. The porous imide resin film F unwound from the unwinding part 51 is conveyed to the second guide roller group 57 via the intermediate rollers 58a, 58b, and 58c.

[0120] The intermediate roller 58a guides the porous imide resin film F unwound from the unwinding roller 51r toward the intermediate roller 58b arranged at intervals in the -Y direction and the -Z direction. The intermediate roller 58b guides the porous imide resin film F toward the intermediate roller 58c arranged at intervals in the -Y direction and the +Z direction. The intermediate roller 58c guides the porous imide resin film F toward the second guide roller 57a arranged at intervals in the -Y direction and the +Z direction. The second guide roller 57a guides the porous imide resin film F toward the second guide roller 57b arranged at intervals in the -Y direction. The second guide roller 57b guides the porous imide resin film F toward the lower knife roller 52b arranged at intervals in the -Y direction and the +Z direction.

[0121] Here, at least one of the interval D1 between the outer peripheral surface of the lower blade roller 52b and the outer peripheral surface of the second guide roller 57b adjacent to the lower blade roller 52b, and the interval D2 between the outer peripheral surfaces of the two adjacent second guide rollers 57a and 57b is set within the range of 1 mm to 20 mm. In the present embodiment, the interval D2 between the outer peripheral surfaces of the two second guide rollers 57a and 57b is set within the range of 1 mm to 20 mm. The interval D1 between the outer peripheral surface of the lower blade roller 52b and the outer peripheral surface of the second guide roller 57b adjacent to the lower blade roller 52b may also be set within the range of 1 mm to 20 mm. The more preferred range of the intervals D1 and D2 is 1 mm to 10 mm. The particularly preferred range of the intervals D1 and D2 is 2 mm to 5 mm. If it is such a preferred range, the wrinkles of the porous imide resin film F before entering the lower blade roller 52b can be suppressed. In addition, the dimensional accuracy of the width of the porous imide-based resin film F can be improved.

[0122] The first guide roller group 56 guides the porous imide resin film Fp (Fp1, Fp2) cut by the cutting unit 52 toward the winding roller 53r. The first guide roller group 56 includes two groups, namely, a first guide roller group 56A and a first guide roller group 56B, so as to guide the porous imide resin film Fp to the winding roller 53r of the first winding unit 53A and the winding roller 53r of the second winding unit 53B, respectively.

[0123] In this embodiment, each group of the first guide roller group 56 (56A, 56B) includes, for example, first guide rollers 56a and 56b. The first guide rollers 56a and 56b constituting the first guide roller group 56 are not limited to two, but may be one, or may be three or more. The porous imide resin films Fp1 and Fp2 obtained by cutting by the cutting unit 52 are conveyed to the first guide roller group 56 via the separation roller 59.

[0124] The separation roller 59 separates the porous imide resin film Fp cut into a plurality of strips obtained by cutting by the cutting unit 52 into a porous imide resin film Fp1, a porous imide resin film Fp2, and two extra porous imide resin films Fy. The porous imide resin film Fp1 separated by the separation roller 59 is guided to the first guide roller 56a of the first guide roller group 56A arranged at intervals in the -Y direction and the +Z direction relative to the separation roller 59. The first guide roller 56a of the first guide roller group 56A guides the porous imide resin film Fp1 to the first guide roller 56b arranged at intervals in the -Y direction and the +Z direction. The first guide roller 56b guides the porous imide resin film Fp1 to the first winding unit 53A. The first guide roller 56 b guides the porous imide resin film Fp1 to between the winding roller 53 r and the nip roller 53 n of the first winding unit 53A.

[0125] In addition, the porous imide resin film Fp2 separated by the separation roller 59 is guided to the first guide roller 56a of the first guide roller group 56B which is arranged at intervals in the -Y direction and the -Z direction relative to the separation roller 59. The first guide roller 56b guides the porous imide resin film Fp2 to the second winding section 53B. The first guide roller 56a of the first guide roller group 56B guides the porous imide resin film Fp2 to the first guide roller 56b which is arranged at intervals in the -Y direction and the -Z direction. The first guide roller 56b guides the porous imide resin film Fp2 between the winding roller 53r and the clamping roller 53n of the first winding section 53A.

[0126] Here, at least one of the interval D3 between the outer peripheral surface of the porous imide resin film Fp wound up by the winding roller 53r and the outer peripheral surface of the first guide roller 56b adjacent to the winding roller 53r, and the interval D4 between the outer peripheral surfaces of the two adjacent first guide rollers 56a and 56b is set in the range of 1 mm to 20 mm. In the present embodiment, the interval D3 between the outer peripheral surface of the porous imide resin film Fp wound up by the winding roller 53r and the outer peripheral surface of the first guide roller 56b adjacent to the winding roller 53r, and the interval D4 between the outer peripheral surfaces of the two adjacent first guide rollers 56a and 56b are both set in the range of 1 mm to 20 mm. The more preferred range of the intervals D3 and D4 is 1 mm to 10 mm. The particularly preferred range of the intervals D3 and D4 is 2 mm to 5 mm. Within such a preferred range, wrinkles can be suppressed when the porous imide resin film Fp is wound up by the winding roller 53 r.

[0127] In addition, if Figure 5 As shown, the excess porous imide resin film Fy separated by the separation roller 59 is guided to the winding roller 54r of the excess portion winding section 54 via a plurality of intermediate rollers 58e, 58f, 58g, and 58h arranged at intervals in the -Y direction and the -Z direction relative to the separation roller 59. The first guide rollers 56a and 56b, the second guide rollers 57a and 57b, the intermediate rollers 58a to 58h, and the separation roller 59 are each provided so as to be rotatable around an axis extending in the X-axis direction.

[0128] In the present embodiment, such a slitting machine 5 further includes a tension sensor 80. The tension sensor 80 measures the tension of the porous imide resin film F sent from the unwinding roller 51r to the winding roller 53r. The tension sensor 80 detects, for example, the tension acting on the intermediate roller 58b by the porous imide resin film F. The output (detection value) of the tension detected by the tension sensor 80 is output to the control device 90.

[0129] Figure 8 It is a block diagram showing the functional structure of the control device of the slitting machine. Figure 8 The control device 90 shown controls the operation of each part of the slitting machine 5. The control device 90 includes a tension acquisition unit 91 and a winding control unit 92. The tension acquisition unit 91 acquires the detection result of the tension of the porous imide resin film F from the unwinding roll 51r to the winding roll 53r in the form of output from the tension sensor 80.

[0130] The winding control unit 92 controls the operation of the winding roller drive unit 53d and the unwinding roller drive unit 51d. The winding control unit 92 controls the operation of the winding roller drive unit 53d and the unwinding roller drive unit 51d so that the porous imide resin film F is conveyed at a predetermined conveying speed. In the present embodiment, the control device 90 adjusts the tension applied to the porous imide resin film F from the unwinding roller 51r to the winding roller 53r by controlling the rotation drive of the winding roller 53r by the winding roller drive unit 53d and the rotation drive of the unwinding roller 51r by the unwinding roller drive unit 51d. In this regard, the control device 90 controls the operation of the winding roller drive unit 53d and the unwinding roller drive unit 51d in a manner such that the tension applied to the porous imide resin film F is within a predetermined range according to the output of the tension sensor 80 acquired by the tension acquisition unit 91.

[0131] [Method for producing porous imide resin film]

[0132] Next, a method for producing the porous imide-based resin film F using the production system 1 configured as described above will be described. Fig. 9 This is a diagram showing the flow of a method for producing a porous imide-based resin film F. Fig.10 and Fig.11 1 is a diagram showing an example of a manufacturing process of a porous imide resin film. The manufacturing method of the porous imide resin film F in this embodiment includes the following steps: a first step S1, forming an unfired film FA; a second step S2, forming a porous imide resin film F; a third step S3, performing a chemical etching process; and a fourth step S4, cutting the porous imide resin film F into a plurality of strips.

[0133] In the first step S1 of forming the unfired film FA, Figure 2In the unfired film forming unit 2 shown in FIG. 1 , a strip-shaped unfired film FA is formed. In the unfired film forming unit 2, first, the substrate supply unit 21 unwinds the substrate S extending in a strip shape. The front end of the unwinded substrate S is fixed to the winding core of the winding roller 25r installed in the substrate winding unit 25 via a plurality of intermediate rollers 28. Then, the winding roller 25r is driven to rotate at a predetermined speed by a motor not shown. Thus, the strip-shaped substrate S is sent out from the substrate supply unit 21 along its extending direction.

[0134] In the coating section 22, a coating liquid containing the resin material A1 and the microparticles A2 is coated on the substrate S supplied from the substrate supply section 21. As a result, Fig.10 As shown in (A), a strip-shaped unfired film FA containing a resin material A1 and fine particles A2 is formed on a substrate S. The substrate S on which the unfired film FA is formed by the coating unit 22 is sequentially dried under predetermined drying conditions in a drying furnace of a drying unit 23. By passing through the drying furnace of the drying unit 23, the solvent is removed from the unfired film FA on the substrate S.

[0135] In the separation section 24, the substrate S that has passed through the drying section 23 is separated from the unfired film FA. The substrate S separated in the separation section 24 is wound up by the winding roller 25r of the substrate winding section 25. Fig.10 As shown in (B), the unfired film FA separated from the substrate S in the separation section 24 is wound up by the winding roller 26r of the product winding section 26. As described above, an unfired film roll FAr is generated by winding up the unfired film FA. The generated unfired film roll FAr is taken off from the winding roller 26r and transported to the unwinding section 31 of the sintering and particle removal unit 3.

[0136] In the second step S2 of forming the porous imide resin film F, Figure 3 In the sintering and particle removal unit 3 shown, the unsintered film FA is sintered to remove the particles A2, thereby forming a strip-shaped porous imide resin film F. In the sintering and particle removal unit 3, first, the unwinding section 31 unwinds the unsintered film FA extending in a strip shape from the unsintered film roll FAr. A lead film (not shown) is installed at the front end of the unsintered film FA. Then, the lead film is guided to the winding section 37 through the sintering furnace 33, the first etching section 34, the washing section 35, and the drying section 36. The front end of the lead film is fixed to the winding core of the winding roller 37r installed in the winding section 37. Then, the winding roller 37r is driven to rotate at a predetermined speed by a motor (not shown). Thus, the unsintered film FA is sent out from the winding section 37 along its extension direction.

[0137] In the firing furnace 33, the unfired film FA is fired. Fig.10As shown in (C), a fired film FB containing microparticles A2 is formed inside the imidized or high-temperature treated resin layer A3. In the first etching portion 34, the fired film FB is etched to remove the microparticles A2 contained in the fired film FB, thereby forming a porous imide resin film F. In the first etching portion 34, the fired film FB is immersed in an etching solution that can dissolve or decompose the microparticles A2, thereby removing the microparticles A2. If the microparticles A2 are removed as described above, pores A4 are formed in the portion where the microparticles A2 exist, as shown in FIG. Fig.11 As shown in (A), a porous imide resin film F is formed.

[0138] In the washing section 35, the porous imide resin film F formed by passing through the first etching section 34 is washed with a washing liquid. The drying section 36 dries the washed porous imide resin film F. The winding section 37 winds up the porous imide resin film F that has passed through the drying section 36 onto a winding core provided on a winding roller 37r. By operating as described above, a porous resin film roll Fr obtained by winding up the porous imide resin film F is generated. The generated porous resin film roll Fr is transported to the etching unit 4.

[0139] In the third step S3 of chemical etching, Figure 4 In the etching unit 4 shown, a chemical etching treatment is performed to dissolve a portion of the porous imide resin film F. First, the unwinding section 41 unwinds the porous imide resin film F extending in a strip from the porous resin film roll Fr. The porous imide resin film F is guided to the winding section 48 through the second etching section 42, the washing section 43, the drying section 44, the re-firing furnace 45, the inspection section 46, and the measuring section 47. The front end of the porous imide resin film F is fixed to the core of the winding roller 48r installed in the winding section 48. Then, the winding roller 48r is driven to rotate at a predetermined speed by a motor not shown. Then, the porous imide resin film F is sent out from the winding roller 48r along its extension direction.

[0140] In the second etching section 42, the porous imide resin film F sent out from the unwinding section 31 is chemically etched. By causing the second etching section 42 to perform chemical etching, Fig.11 As shown in (B), when the microparticles A2 included in the porous imide resin film F are removed by etching in the first etching section 34, burr-like irregularities generated around the pores A4 of the porous imide resin film F due to the escape of the microparticles A2 are flattened.

[0141] In the cleaning section 43, the porous imide resin film F that has passed through the second etching section 42 is cleaned with a cleaning liquid. The drying section 44 dries the cleaned porous imide resin film F. In the re-firing furnace 45, the porous imide resin film F that has passed through the drying section 44 is re-firing. The re-firing furnace 45 heats the porous imide resin film F by a heating section (not shown) while conveying the porous imide resin film F at a predetermined conveying speed in a chamber. In the re-firing furnace 45, the porous imide resin film F is heated to, for example, about 300°C to 400°C.

[0142] In the inspection section 46, the quality of the porous imide resin film F that has passed through the re-firing furnace 45 is inspected. The inspection section 46, for example, performs a foreign matter inspection on the porous imide resin film F. Next, in the measuring section 47, the dimensions of the porous imide resin film F are measured. The measuring section 47, for example, measures the film thickness of the porous imide resin film F. The porous imide resin film F that has passed through the measuring section 47 is wound up onto a winding core provided on a winding roller 48r by the winding section 48. The winding roller 48r is driven to rotate at a predetermined speed set in advance by a motor not shown in the figure. By operating as described above, a finished roll Fm obtained by winding the porous imide resin film F is generated. The generated finished roll Fm is transported to the slitting machine 5.

[0143] In the fourth step S4 of cutting the porous imide resin film F into a plurality of strips, Figure 5 The slitting machine 5 shown cuts the porous imide resin film F into a plurality of strips. First, the unwinding section 51 unwinds the porous imide resin film F extending in a strip shape from the finished roll Fm. The unwinded porous imide resin film F is guided to the cutting section 52. In the cutting section 52, the strip-shaped porous imide resin film F is cut into a plurality of strips along the extending direction of the film. In the cutting section 52, the porous imide resin film F is cut by a disc-shaped upper knife roller 52c while the strip-shaped porous imide resin film F is conveyed along its extending direction.

[0144] The porous imide resin film Fp having a predetermined product width cut out from the cutting section 52 is guided to the winding section 53. In the winding section 53, the porous imide resin film Fp is wound on a winding core provided on a winding roller 53r that is driven to rotate at a predetermined rotation speed. In the above-described operation, a product roll Fpr obtained by winding the porous imide resin film Fp is produced.

[0145] In addition, the excess porous imide resin film Fy cut off from the porous imide resin film F before cutting is guided to the excess part winding section 54. The excess porous imide resin film Fy is wound in the excess part winding section 54. The excess roll Fyr obtained by winding the excess porous imide resin film Fy is generated by the above operation. The product roll Fpr and the excess roll Fyr generated by the slitting machine 5 are unloaded from the slitting machine 5 by the above operation.

[0146] As described above, in the slitting machine 5 according to the present embodiment, the interval D3 between the outer peripheral surface of the porous imide resin film Fp wound by the winding roller 53r and the outer peripheral surface of the first guide roller 56b adjacent to the winding roller 53r, and the interval D4 between the outer peripheral surfaces of the two adjacent first guide rollers 56a and 56b are within the range of 1 mm to 20 mm. With this configuration, it is possible to suppress the generation of wrinkles in the porous imide resin film F when the porous imide resin film Fp is conveyed to the winding section 53. Therefore, it is possible to suppress the winding of the porous imide resin film Fp in a state where wrinkles are generated by the winding section 53. As a result, it is possible to suppress the adverse effect on the manufacturing quality of the porous imide resin film Fp.

[0147] In addition, the slitting machine 5 makes at least one of the interval D1 between the outer peripheral surface of the lower blade roller 52b and the outer peripheral surface of the second guide roller 57b adjacent to the lower blade roller 52b, and the interval D2 between the outer peripheral surfaces of the two adjacent second guide rollers 57a and 57b within the range of 1 mm to 20 mm. With this configuration, it is possible to suppress the generation of wrinkles in the porous imide resin film F when the porous imide resin film F before cutting is conveyed to the cutting unit 52. As a result, it is possible to suppress the cutting of the porous imide resin film F in a wrinkled state by the cutting unit 52. As a result, it is possible to suppress the adverse effect on the manufacturing quality of the porous imide resin film F.

[0148] In addition, the winding roller 53r is provided so as to be able to advance and retreat relative to the adjacent first guide rollers 56a and 56b. With this configuration, the winding start position of the porous imide resin film Fp conveyed from the first guide rollers 56a and 56b to the winding section 53 becomes constant on the winding roller 53r. In addition, since the upper blade roller 52c can advance and retreat relative to the lower blade roller 52b, the upper blade roller 52c and the lower blade roller 52b can be easily maintained.

[0149] In addition, by controlling the rotational drive of the winding roller 53r by the winding roller driving unit 53d and the rotational drive of the unwinding roller 51r by the unwinding roller driving unit 51d, the tension applied to the porous imide resin film F from the unwinding roller 51r to the winding roller 53r can be appropriately adjusted. With this configuration, it is possible to suppress the generation of wrinkles in the porous imide resin film F. In addition, by adjusting the tension based on the output of the tension sensor 80, the tension of the porous imide resin film F can be always appropriately adjusted.

[0150] The above describes the implementation mode, but the technical scope of the present invention is not limited to the above-mentioned implementation mode. It is obvious that those skilled in the art can apply various changes or improvements to the above-mentioned implementation mode. In addition, such a method in which changes or improvements are applied is also included in the technical scope of the present invention. In addition, one or more of the elements described in the above-mentioned implementation mode, etc. may sometimes be omitted. In addition, the elements described in the above-mentioned implementation mode, etc. may be appropriately combined. In addition, regarding the execution order of each process shown in the present embodiment, as long as the output of the previous process is not used in the subsequent process, it can be implemented in any order. In addition, regarding the actions in the above-mentioned implementation mode, even if "first", "next", "next" and the like are used for convenience, it is not necessary to implement them in this order.

[0151] For example, in the above-mentioned embodiment, the porous imide resin film F is taken as an example and described, but the present invention is not limited to this configuration. For example, the film may be formed of a material other than the porous imide resin film F.

Claims

1. Slitting machine, which has: a cutting section for cutting the film extending in a strip shape into a plurality of strips along an extending direction of the film; a winding roller for winding at least one of the plurality of films cut by the cutting unit; and a plurality of first guide rollers, the plurality of first guide rollers being supported in a manner rotatable about an axis and guiding the film toward the winding roller, At least one of a distance between an outer peripheral surface of the film wound by the winding roller and an outer peripheral surface of the first guide roller adjacent to the winding roller and a distance between outer peripheral surfaces of two adjacent first guide rollers is within a range of 1 mm to 20 mm.

2. The slitting machine according to claim 1, wherein: The winding roller is provided so as to be able to advance and retreat relative to the adjacent first guide roller.

3. The slitting machine according to claim 1, wherein: The cutting portion comprises: The film contacts the lower knife roll with the outer peripheral surface; and an upper knife roller disposed radially outward of the lower knife roller, The cutting unit cuts the film into a plurality of strips by sandwiching the film between the lower blade roll and the upper blade roll.

4. The slitting machine according to claim 3, comprising a plurality of second guide rollers, wherein the plurality of second guide rollers guide the film toward the lower blade roller. At least one of a distance between an outer peripheral surface of the lower blade roller and an outer peripheral surface of the second guide roller adjacent to the lower blade roller and a distance between outer peripheral surfaces of two adjacent second guide rollers is within a range of 1 mm to 20 mm.

5. Slitting machine, which has: a cutting section for cutting the film extending in a strip shape into a plurality of strips along an extending direction of the film; a winding roller for winding at least one of the plurality of films cut by the cutting unit; and a plurality of second guide rollers, the plurality of second guide rollers being supported in a manner rotatable about an axis and guiding the film toward the cutting portion, The cutting unit includes a lower knife roller that contacts the outer peripheral surface of the film, and an upper knife roller that is arranged radially outside the lower knife roller, and the film is cut into a plurality of strips by clamping the film with the lower knife roller and the upper knife roller. At least one of a distance between an outer peripheral surface of the lower blade roller and an outer peripheral surface of the second guide roller adjacent to the lower blade roller and a distance between outer peripheral surfaces of two adjacent second guide rollers is within a range of 1 mm to 20 mm.

6. The slitting machine according to claim 3 or claim 5, wherein: The upper knife roller can move forward and backward relative to the lower knife roller.

7. The slitting machine according to claim 1 or claim 5, comprising: A winding roller driving unit, the winding roller driving unit drives the winding roller to rotate; An unwinding roller, which extracts the film before cutting; an unwinding roller driving unit, the unwinding roller driving unit driving the unwinding roller to rotate; and A control device, wherein the control device controls the actions of the winding roller drive unit and the unwinding roller drive unit, The control device adjusts the tension applied to the film from the take-up roller to the take-up roller by controlling the rotational drive of the take-up roller by the take-up roller driving unit and the rotational drive of the take-up roller by the take-up roller driving unit.

8. The slitting machine according to claim 7, comprising a tension sensor for measuring the tension of the film from the unwinding roller to the winding roller, The control device controls the operations of the winding roller drive unit and the unwinding roller drive unit based on the output of the tension sensor.

9. A system for producing a porous imide resin film, comprising: A first system, wherein a coating liquid containing microparticles is applied to a substrate and then dried to form a strip-shaped unfired film; A second system, wherein the unfired film formed by the first system is fired and then the fine particles are removed to form a belt-shaped porous imide resin film; a third system that performs a chemical etching process to dissolve a portion of the porous imide-based resin film formed by the second system; and The slitting machine according to claim 1 or claim 5, wherein the slitting machine cuts at least one of the porous imide resin films formed by the second system and the third system into a plurality of strips.

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