Electrodeposition tank device for oxygen diffusion isolation for tellurium electrodeposition

Abstract

The invention discloses an oxygen diffusion isolation electrodeposition tank device for tellurium electrodeposition, which comprises a sealing cover structure covering the top surface of an electrodeposition tank body, and an anode plate and a cathode plate which are arranged in the electrodeposition tank body, an isolation mechanism used for dividing the internal space of the electrodeposition tank body into an anode chamber and a cathode chamber is arranged between the anode plate and the cathode plate, and a collecting assembly used for collecting anode mud in the tellurium electrodeposition process is arranged in the anode chamber; the isolation mechanism comprises two isolation frames which are installed on the inner wall of the electro-deposition tank body and arranged front and back, one-way permeable membrane structures used for isolating oxygen in the anode chamber from diffusing into the cathode chamber are embedded into the two isolation frames from top to bottom in a sliding mode, and blocking plates attached to the top wall of the sealing cover structure are installed at the tops of the isolation frames. Oxygen can be effectively prevented from diffusing into the cathode chamber, meanwhile, the disturbance assembly is used in cooperation to improve the removal efficiency of bubbles in the anode chamber, and generation of anode mud is reduced.

Description

Technical Field

[0001] The invention relates to the technical field of tellurium electrodeposition, in particular to an electrodeposition tank device for tellurium electrodeposition with oxygen diffusion isolation. Background Art

[0002] In a strong alkaline system, tellurium electrowinning refers to the process of depositing tellurium from a tellurium-containing solution onto the electrode surface through an electrolytic process. This process usually occurs in a high pH environment, that is, in a strong alkaline solution. The electrolytic reaction uses electric current to reduce the tellurium ions in the solution to solid tellurium and deposit it on the cathode. During the process, the hydroxide ions on the anode plate release electrons to produce oxygen bubbles. If these bubbles are not discharged in time, they will affect the current distribution, resulting in uneven electrodeposition. At the same time, Te around the anode plate will 4+ Oxidized to Te 6+ , forming a large amount of sodium tellurite precipitation, and part of the Te 4+ , it is impossible to successfully obtain electrons at the cathode to form metallic tellurium, which greatly affects the efficiency and effect of electrolysis. Summary of the invention

[0003] In view of the shortcomings of the prior art, the present invention aims to provide an oxygen diffusion-isolated electrodeposition tank device for tellurium electrowinning, so as to solve the problem that the anode plate Te 4+ Oxidized to Te 6+ , forming a large amount of sodium tellurite precipitation problem.

[0004] To achieve the above-mentioned object, the present invention provides the following technical solutions: an electrodeposition tank device for tellurium electrowinning with oxygen diffusion isolation, comprising a cover structure covering the top surface of the electrodeposition tank body, and an anode plate and a cathode plate arranged inside the electrodeposition tank body, an isolation mechanism for dividing the internal space of the electrodeposition tank body into two tank areas, an anode chamber and a cathode chamber, is arranged between the anode plate and the cathode plate, and a collection component for collecting anode mud during the tellurium electrowinning process is arranged inside the anode chamber; The isolation mechanism includes two isolation frames arranged front and back and installed on the inner wall of the electrodeposition tank body. A single-transmittance membrane structure for isolating the diffusion of oxygen from the anode chamber into the cathode chamber is slidably engaged from top to bottom inside the two isolation frames. A sealing plate that fits with the top wall of the sealing structure is installed on the top of the isolation frame. A disturbance component is installed on the side of the isolation frame close to the anode plate and is used to repeatedly swing back and forth at multiple points inside the anode chamber to accelerate the discharge of bubbles from the electrolytic solution.

[0005] Preferably, the disturbance component includes a positioning sleeve fixedly mounted on one side surface of the isolation frame, a frame frame is rotatably connected inside the positioning sleeve, a plurality of evenly arranged vertical plates are rotatably mounted between the top and bottom of the frame frame, the tops of the plurality of vertical plates are fixedly sleeved with spur gears located at the top of the frame frame, a V-belt meshing with the plurality of spur gears through tooth grooves is provided at the top of the frame frame, and a driving structure for driving the V-belt to rotate and controlling the plurality of vertical plates to swing within a range of 30°-60° forward and backward along the frame frame.

[0006] Preferably, the bottom of the frame structure is at the same height as the horizontal bottom wall of the electrodeposition tank body, and when the driving structure drives a plurality of vertical plates to adjust to a state parallel to the frame structure, two adjacent vertical plates are seamlessly fitted together, and a plurality of vertical plates and the frame structure form a planar structure that covers the opening on one side of the isolation frame close to the anode chamber.

[0007] Preferably, a propulsion assembly is installed on the top of the isolation frame for rotating the planar structure by 20°-35° with the positioning sleeve as the center after the plurality of vertical plates and the frame structure form a planar structure; A linear groove is formed on the top of the isolation frame.

[0008] Preferably, the propulsion assembly includes a connecting piece installed on one side of the top surface of the frame structure, a node rod is arranged on the top of the isolation frame, a central axis rod is rotatably connected between one end of the node rod and the connecting piece, and an electric push rod is installed on the isolation frame, which adjusts the inclination angle of the central axis rod from 5° to 45°-65° when the node rod is driven to advance along the straight groove.

[0009] Preferably, the front and rear walls of the electrodeposition tank are both equipped with arc plates located in the anode chamber, and a plurality of vertical plates and a frame structure form a plane structure. When the positioning sleeve is rotated by no more than 35°, one side of the plane structure seamlessly fits with the surface of the arc plate.

[0010] Preferably, a bevel groove is provided on the bottom wall of the anode chamber in the electrodeposition cell, one side of which is in contact with the side wall, front wall and rear wall of the electrodeposition cell, and the width of the bevel groove is smaller than the distance between the side of the vertical plate close to the anode plate and the inner wall of the anode chamber.

[0011] Preferably, the collecting assembly comprises a collection frame installed on the bottom wall of the inclined groove, the inclination angle of the bottom wall of the collection frame is consistent with the inclination angle of the inclined groove, and the highest point of the bottom wall of the collection frame is at the same height as the plane bottom wall of the electrodeposition tank body.

[0012] Preferably, a dense filter plate is slidably installed on the inner wall of the aggregate frame, a rectangular plate and a guide column are installed on the inner wall of the aggregate frame, a spring structure is installed between the rectangular plate and the dense filter plate, a U-shaped pressure plate is sleeved on the outer surface of the guide column, a rope is installed on the dense filter plate, passing through the spring structure and the rectangular plate from bottom to top and fixedly connected to one side of the U-shaped pressure plate, and a strip structure is installed on the top wall of the covering structure for squeezing the U-shaped pressure plate from top to bottom when the covering structure covers the electrodeposition tank body.

[0013] By means of the above technical solution, the present invention provides an electrodeposition tank device for tellurium electrodeposition with oxygen diffusion isolation, which has at least the following beneficial effects: 1. The present invention utilizes an isolation mechanism with a single-transmittance membrane structure between the anode plate and the cathode plate in the electrodeposition tank to isolate oxygen diffusion, reduce the probability of oxidation reaction, and thus protect Te 4+ Protected from oxidation to form Te 6+ , which improves the stability and efficiency of the reaction, while reducing the ineffective electrolysis caused by the deposition of impurity metals, improving the current efficiency and thus reducing the generation of anode mud.

[0014] 2. The present invention utilizes a plurality of vertical plates to rotate and swing back and forth in the anode chamber at the same speed and direction, mechanically disturbing the electrolytic solution and breaking its static state, thereby effectively reducing the metal ion oversaturation phenomenon in the local area of ​​the anode chamber and the accumulation of bubbles in the electrolytic solution, preventing the excessive deposition of metal ions on the surface of the anode plate, and further reducing the formation of anode mud.

[0015] 3. The present invention can adjust the positioning sleeve, the frame structure and a number of vertical plates matched therewith into a complete planar structure, and this planar structure fits tightly with one side of the isolation frame, and blocks the opening on the side close to the anode plate, which can effectively prevent the electrolyte in the anode chamber and the cathode chamber from intermingling in this channel when the single-permeable membrane structure inside the isolation frame is replaced later.

[0016] 4. After sealing one side opening of one of the isolation frames, the present invention can adjust the seamless plane structure formed by the positioning sleeve, the frame structure and a plurality of vertical plates arranged axially in the front and rear directions to an inclined arrangement, thereby guiding the electrolytic fluid on both sides of the plane structure to flow to the other unsealed isolation frame, thereby effectively avoiding stagnation or uneven flow of the electrolytic fluid on the sealed side, thereby ensuring the balance of the electrolytic fluid inside the electrodeposition tank and the stability of the deposition quality.

[0017] 5. The present invention cooperates with a plurality of vertical plates to swing back and forth, so that the anode mud particles deposited on the bottom wall of the anode chamber are pushed along the flow direction to the inclined grooves with a stronger liquid flow velocity, effectively preventing the anode mud from clogging the drainage system on the electrodeposition tank body. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The drawings described herein are used to provide a further understanding of the present application and constitute a part of the present application. The illustrative embodiments of the present application and their descriptions are used to explain the present application and do not constitute an improper limitation on the present application. In the drawings: Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a schematic diagram of the split structure of the isolation mechanism of the present invention; Figure 3 It is a schematic diagram of the split structure of the disturbance component of the present invention; Figure 4 It is a schematic diagram of the angle range of the vertical plate swing of the present invention; Figure 5 It is a schematic diagram of the structure of the curved plate and the vertical plate of the present invention; Figure 6 For the present invention Figure 5 Schematic diagram of the structure at A in FIG. Figure 7 It is a structural schematic diagram of the collection component of the present invention; Figure 8 It is a schematic structural diagram of the inclined groove of the present invention.

[0019] In the figure: 1. Electrodeposition tank body; 101. Arc plate; 102. Inclined groove; 2. Capping structure; 3. Anode plate; 4. Cathode plate; 5. Isolation mechanism; 501. Isolation frame; 5011. Linear groove; 502. Single-transparent membrane structure; 503. Blocking plate; 504. Disturbance component; 5041. Positioning sleeve; 5042. Frame structure; 5043. Vertical plate; 5044. Spur gear; 5045. V-belt; 5046. Driving structure; 505. Propulsion component; 5051. Connecting piece; 5052. Node rod; 5053. Central axis rod; 5054. Electric push rod; 6. Collecting assembly; 601. Aggregate frame; 602. Dense filter plate; 603. Rectangular plate; 604. Guide column; 605. Spring structure; 606. U-shaped pressure plate; 607. Rope; 608. Layering structure. DETAILED DESCRIPTION

[0020] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. In the description of the present invention, it should be understood that the orientations or positional relationships indicated by the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc. are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention.

[0021] Embodiment 1 Please refer to 1- Figure 8 This embodiment proposes an electrodeposition tank device for tellurium electrolysis with oxygen diffusion isolation, which can effectively isolate oxygen diffusion and reduce anode mud production. In the device, the cover structure 2 covers the top surface of the electrodeposition tank body 1, forming a complete closed cavity with it, preventing external air from interfering with the tellurium electrolysis process, while reducing the evaporation or pollution of the electrolytic solution. The cover structure 2 is provided with two exhaust pipes and a liquid delivery pipe consistent with the prior art, and the exhaust pipe is externally connected to an exhaust system to facilitate the discharge of the generated gas. An anode plate 3 and a cathode plate 4 are arranged inside the electrodeposition tank body 1, and an isolation mechanism 5 for dividing the internal space of the electrodeposition tank body 1 into two tank areas, an anode chamber and a cathode chamber, is arranged between the anode plate 3 and the cathode plate 4. A collecting component 6 for collecting anode mud during the tellurium electrowinning process is arranged inside the anode chamber. The isolation mechanism 5 includes two isolation frames 501 arranged front and back and installed on the inner wall of the electrodeposition tank body 1. A single permeable membrane structure 502 for isolating the diffusion of oxygen from the anode chamber to the cathode chamber is slidably engaged from top to bottom inside the two isolation frames 501. The single permeable membrane structure 502 preferably uses a gas-liquid single permeable membrane, which is intended to utilize its own selective permeability to continuously guide the oxygen bubbles generated in the anode chamber, and at the same time isolate the oxygen from diffusing into the cathode chamber, thereby avoiding the retention and uneven distribution of bubbles near the anode, effectively reducing the risk of anode mud formation, and thus improving the purity and efficiency of the electrowinning process.

[0022] In accordance with the above, a plugging plate 503 is installed on the top of the isolation frame 501, which is in contact with the top wall of the capping structure 2. A disturbance component 504 is installed on the side of the isolation frame 501 close to the anode plate 3, which is used to repeatedly swing back and forth at multiple points inside the anode chamber to accelerate the discharge of bubbles from the electrolytic solution. While the single permeable membrane structure 502 is used to isolate oxygen from diffusing into the cathode chamber, the disturbance component 504 is used to improve the efficiency of bubble discharge in the anode chamber, reduce local supersaturation, and reduce uneven metal deposition, and finally further achieve the purpose of reducing the content of anode mud.

[0023] Specifically, the disturbance component 504 includes a positioning sleeve 5041 fixedly mounted on a side surface of the isolation frame 501, a frame frame 5042 is rotatably connected inside the positioning sleeve 5041, a plurality of uniformly arranged vertical plates 5043 are rotatably mounted between the top and bottom of the frame frame 5042, a spur gear 5044 located at the top of the frame frame 5042 is fixedly sleeved on the top of the plurality of vertical plates 5043, a V-belt 5045 meshed with the plurality of spur gears 5044 through tooth grooves is arranged on the top of the frame frame 5042, and a driving structure 5046 for driving the V-belt 5045 to rotate and control the plurality of vertical plates 5043 to swing in the range of 30°-60° along the frame frame 5042. The driving structure 5046 is composed of a stepping motor and a transmission gear sleeved on the output end of the stepping motor, and the transmission gear is meshed with the inner tooth groove of the V-belt 5045. In actual application, the stepper motor is operated to control the transmission gear to rotate alternately clockwise and counterclockwise repeatedly to a set angle, thereby driving the V-belt 5045 to swing back and forth, so as to simultaneously control multiple sets of spur gears 5044 to maintain repeated back and forth rotation at the same speed and in the same direction, and finally drive a number of vertical plates 5043 to repeatedly rotate and swing back and forth in the anode chamber, thereby disturbing the electrolytic solution in the anode chamber through mechanical movement, breaking the static state of the liquid, reducing the metal ion oversaturation phenomenon in the local area of ​​the anode chamber and the aggregation of bubbles in the electrolytic solution, preventing excessive deposition of metal ions on the surface of the anode plate 3, and reducing the formation of anode mud.

[0024] Embodiment 2 In the previous embodiment, the main function of the single permeable membrane structure 502 is to allow ions to pass through while preventing the mixing of other substances such as gases or impurities. After the single permeable membrane structure 502 is used for a long time, its microporous layer will be contaminated and blocked, resulting in a decrease in the ion conductivity of the membrane and even a decrease in the current efficiency. Therefore, it is sometimes necessary to replace the single permeable membrane structure 502. However, under normal circumstances, when the single permeable membrane structure 502 is replaced, the electrolytic solution in the anode chamber and the cathode chamber separated by the isolation mechanism 5 will cross-contaminate each other, resulting in cross-contamination of the components of the anode liquid and the cathode liquid, destroying their respective chemical balances, and affecting the electrodeposition process. At the same time, the oxygen generated by the reaction between the anode plate 3 and the electrolytic solution will flow to the cathode plate 4. In order to effectively solve this problem, as shown in FIG. Figure 1-Figure 3 and Figure 5 , Figure 6As shown, the bottom of the frame structure 5042 is at the same height as the horizontal bottom wall of the electrodeposition tank body 1. When the driving structure 5046 drives the plurality of vertical plates 5043 to adjust to a state parallel to the frame structure 5042, two adjacent vertical plates 5043 are seamlessly fitted together, and the plurality of vertical plates 5043 and the frame structure 5042 form a planar structure that covers the opening on the side of the isolation frame 501 close to the anode chamber. Still cooperating with the operation driving structure 5046, it drives several vertical plates 5043 to rotate to a set angle and uniformly arrange them front to back, so that the two adjacent vertical plates 5043 in front and back are seamlessly fitted together, and at the same time, the two vertical plates 5043 at the edge are seamlessly fitted together with the frame structure 5042 and the positioning sleeve 5041, and a complete plane structure is formed between the three, and this plane structure is tightly fitted with the outer side of the opening of the isolation frame 501 close to the anode plate 3 to seal the opening, which can effectively prevent the electrolyte in the anode chamber and the cathode chamber from intermingling in this channel when the single-transparent membrane structure 502 inside the isolation frame 501 is replaced later.

[0025] Based on the setting of two isolation frames 501 cooperating with two single-transparent membrane structures 502, one side of one of the isolation frames 501 is opened and closed to facilitate the replacement of the corresponding single-transparent membrane structure 502, while several vertical plates 5043 on one side of the other isolation frame 501 are in an unclosed state, so that both sides of this isolation frame 501 remain unobstructed, thereby reducing the impact on the entire electrodeposition tank body 1.

[0026] Embodiment 3 Following the above-mentioned second embodiment, during the replacement of one of the single-transmissive membrane structures 502, when the plane structure formed by the plurality of vertical plates 5043, the frame structure 5042, and the positioning sleeve 5041 closes the opening of the corresponding isolation frame 501 close to one side of the anode chamber, the electrolytic solution on both sides of the closed opening is prone to stagnation or uneven flow, thereby affecting the deposition quality. In order to effectively avoid this problem, as shown in FIG. Figure 1 , Figure 2 and Figure 5As shown, a propulsion assembly 505 is installed on the top of the isolation frame 501 for rotating the planar structure 20°-35° with the positioning sleeve 5041 as the center after a plurality of vertical plates 5043, the frame structure 5042 and the positioning sleeve 5041 form a planar structure. A linear groove 5011 is provided on the top of the isolation frame 501. The propulsion assembly 505 includes a connecting piece 5051 installed on one side of the top surface of the frame structure 5042. A node rod 5052 is arranged on the top of the isolation frame 501. A central axis rod 5053 is rotatably connected between one end of the node rod 5052 and the connecting piece 5051. An electric push rod 5054 is installed on the isolation frame 501 for adjusting the inclination angle of the central axis rod 5053 from 5° to 45°-65° when the node rod 5052 is driven to advance along the linear groove 5011. In actual application, the electric push rod 5054 in the propulsion assembly 505 is operated to cause it to extend outward accordingly, thereby generating a driving force toward one side for the slightly inclined central axis rod 5053, and this driving force, through the node rod 5052 respectively hinged to the central axis rod 5053 and the connector 5051 at both ends, converts the driving force of this linear motion into torque, causing the plane structure formed by a number of vertical plates 5043, the frame frame 5042, and the positioning sleeve 5041 to rotate a set angle with the positioning sleeve 5041 as the center of the circle, and adjusts this plane structure from a front-to-back axial arrangement to an inclined arrangement. Thereby changing the flow path of the electrolytic solution on both sides of the plane structure, guiding the electrolytic solution on both sides of an isolation frame 501 closed on one side to flow to another isolation frame 501 that is not blocked, thereby effectively avoiding the electrolytic solution from stagnating or flowing unevenly on the blocked side, and ensuring the balance of the electrolytic solution inside the electrodeposition tank 1 and the stability of the deposition quality.

[0027] In addition, when the planar structure is adjusted from the front-to-back axial arrangement to the inclined arrangement, there is no reserved gap between the side and the inner wall of the electrodeposition tank body 1, such as Figure 5 As shown, the front and rear walls of the electrodeposition tank 1 are both provided with arc plates 101 in the anode chamber, and a plurality of vertical plates 5043 and a frame frame 5042 form a plane structure, and when the positioning sleeve 5041 is rotated by no more than 35°, one side of the plane structure is seamlessly fitted with the surface of the arc plate 101. This is intended to close the gap between the plane structure and the inner wall of the electrodeposition tank 1 when the plane structure is arranged obliquely, and to change the flow path of the electrolytic solution on both sides of the plane structure, thereby avoiding the electrolytic solution in the anode chamber and the cathode chamber from flowing into each other under the premise of replacing the single-transmissive membrane structure 502.

[0028] Embodiment 4 During the tellurium electrowinning process, the anode loses electrons, and metal ions enter the electrowinning solution from the anode surface and participate in the deposition reaction. However, the anode material itself may also undergo an oxidation reaction due to the action of the current, generating oxides that adhere to the anode surface and accumulate over time to form anode mud. The anode mud peels off the anode surface and is deposited on the bottom wall of the anode chamber with the flow of bubbles, blocking the drainage system of the electrodeposition tank 1. Therefore, the anode mud needs to be pushed away in a centralized manner. Figure 1 and Figure 8 As shown, the bottom wall of the anode chamber in the electrodeposition tank body 1 is provided with an inclined groove 102, one side of the inclined groove 102 is in contact with the side wall, front wall and rear wall of the electrodeposition tank body 1, and the width of the inclined groove 102 is smaller than the distance between the side of the vertical plate 5043 close to the anode plate 3 and the inner wall of the anode chamber. Following the above-mentioned embodiment 1, the above-mentioned plurality of vertical plates 5043 repeatedly swing back and forth to cause the liquid in the anode chamber to be disturbed, and a periodic and directional liquid flow or turbulence is generated, so that the anode mud particles deposited on the bottom wall of the anode chamber can be pushed to the side with a stronger liquid flow speed along the flow direction. In addition, the inclined groove 102 is set to gradually tilt downward from the side close to the vertical plate 5043 to the other side, so that the anode mud is concentrated on the bottom wall of the inclined groove 102, effectively preventing the anode mud from clogging the drainage system on the electrodeposition tank body 1.

[0029] Embodiment 5 Following the above-mentioned fourth embodiment, when too much anode mud is accumulated in the inclined groove 102, the anode mud on the bottom wall of the anode chamber may affect the fluidity of the electrolytic solution, and the deposited anode mud is difficult to clean. Figure 1 , Figure 7 and Figure 8As shown, this is to facilitate the cleaning of the anode mud accumulated within the range of the inclined groove 102. The collecting assembly 6 includes a collection frame 601 installed on the bottom wall of the inclined groove 102, the inclination angle of the bottom wall of the collection frame 601 is consistent with the inclination angle of the inclined groove 102, and the highest point of the bottom wall of the collection frame 601 is at the same height as the plane bottom wall of the electroplating tank body 1, a dense filter plate 602 is slidably installed on the inner wall of the collection frame 601, a rectangular plate 603 and a guide column 604 are installed on the inner wall of the collection frame 601, a spring structure 605 is installed between the rectangular plate 603 and the dense filter plate 602, a U-shaped pressure plate 606 is sleeved on the outer surface of the guide column 604, a rope 607 is installed on the dense filter plate 602, which passes through the spring structure 605 and the rectangular plate 603 from bottom to top and is fixedly connected to one side of the U-shaped pressure plate 606, and the top wall of the covering structure 2 is installed with a pressure strip structure 608 which squeezes the U-shaped pressure plate 606 from top to bottom when it covers the electroplating tank body 1. As the cover structure 2 covers the electrodeposition tank body 1 from top to bottom, the pressure strip structure 608 will be embedded in the U-shaped pressure plate 606 and exert downward squeezing force on it, causing the U-shaped pressure plate 606 to slide from top to bottom along the outer surface of the guide column 604. During this process, a corresponding pulling force can be exerted on the rope 607, causing the spring structure 605 to contract upward, and at the same time, the dense filter plate 602 moves from bottom to top, so that a larger gap is generated between the bottom of the dense filter plate 602 and the bottom wall of the collection frame 601, so that when the driving structure 5046 controls the plurality of vertical plates 5043 to swing back and forth later, the anode mud deposited on the bottom wall of the anode chamber is pushed to the inclined bottom wall of the collection frame 601.

[0030] And as the entire tellurium electrowinning is finished, when the capping structure 2 is separated from the electrodeposition tank body 1 from bottom to top, the pressure strip structure 608 gradually separates from the U-shaped pressure plate 606, and at this time, the spring structure 605 recovers its original state under its own elasticity and reset function, and drives the dense filter plate 602 to move from top to bottom until the bottom wall of the dense filter plate 602 fits with the bottom wall of the collection frame 601, which can effectively prevent the anode mud collected in the collection frame 601 from running out. Then, the entire collection assembly 6 is lifted from bottom to top, and the collected anode mud can be discharged and cleaned from the inside of the electrodeposition tank body 1.

[0031] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. An oxygen diffusion-insulated electrodeposition tank device for tellurium electrodeposition, comprising a cover structure (2) covering the top surface of an electrodeposition tank body (1), and an anode plate (3) and a cathode plate (4) arranged inside the electrodeposition tank body (1), characterized in that: An isolation mechanism (5) is provided between the anode plate (3) and the cathode plate (4) for dividing the internal space of the electrodeposition tank body (1) into two tank areas, an anode chamber and a cathode chamber, and a collection component (6) for collecting anode mud during the tellurium electrowinning process is provided inside the anode chamber; The isolation mechanism (5) comprises two isolation frames (501) arranged front and back mounted on the inner wall of the electrodeposition tank (1); a single-permeable membrane structure (502) is slidably engaged from top to bottom inside the two isolation frames (501) for isolating the diffusion of oxygen from the anode chamber into the cathode chamber; a sealing plate (503) is mounted on the top of the isolation frame (501) and is in contact with the top wall of the sealing structure (2); and a disturbance component (504) is mounted on one side of the isolation frame (501) close to the anode plate (3) for repeatedly swinging back and forth at multiple points inside the anode chamber to accelerate the discharge of bubbles from the electrolytic solution.

2. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 1, characterized in that: The disturbance component (504) comprises a positioning sleeve (5041) fixedly mounted on a side surface of the isolation frame (501), a frame frame (5042) rotatably connected inside the positioning sleeve (5041), a plurality of evenly arranged vertical plates (5043) rotatably mounted between the top and bottom of the frame frame (5042), a spur gear (5044) located at the top of the frame frame (5042) fixedly sleeved on the top of the plurality of vertical plates (5043), a V-belt (5045) meshing with the plurality of spur gears (5044) via tooth grooves arranged on the top of the frame frame (5042), and a driving structure (5046) for driving the V-belt (5045) to rotate and control the plurality of vertical plates (5043) to swing in a range of 30°-60° front and back along the frame frame (5042).

3. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 2, characterized in that: The bottom of the frame structure (5042) is at the same height as the horizontal bottom wall of the electrodeposition tank body (1); when the driving structure (5046) drives the plurality of vertical plates (5043) to adjust to a state parallel to the frame structure (5042), two adjacent vertical plates (5043) are seamlessly fitted together, and the plurality of vertical plates (5043) and the frame structure (5042) form a planar structure that blocks the opening on one side of the isolation frame (501) close to the anode chamber.

4. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 1, characterized in that: A propulsion assembly (505) is installed on the top of the isolation frame (501) for rotating the planar structure by 20°-35° with the positioning sleeve (5041) as the center after the plurality of vertical plates (5043) and the frame structure (5042) form a planar structure; A linear groove (5011) is provided on the top of the isolation frame (501).

5. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 4, characterized in that: The propulsion assembly (505) comprises a connecting piece (5051) mounted on one side of the top surface of the frame structure (5042); a node rod (5052) is arranged on the top of the isolation frame (501); a central axis rod (5053) is rotatably connected between one end of the node rod (5052) and the connecting piece (5051); and an electric push rod (5054) is mounted on the isolation frame (501) so as to adjust the inclination angle of the central axis rod (5053) from 5° to 45°-65° when the node rod (5052) is driven to propel along the linear groove (5011).

6. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 1 or 5, characterized in that: The front wall and the rear wall of the electrodeposition tank (1) are both provided with an arc-shaped plate (101) located in the anode chamber, and a plurality of vertical plates (5043) and a frame structure (5042) form a plane structure, and when the plane structure is rotated by no more than 35 degrees with the positioning sleeve (5041) as the center, one side of the plane structure is seamlessly fitted with the surface of the arc-shaped plate (101).

7. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 1, characterized in that: The bottom wall of the anode chamber in the electrodeposition tank body (1) is provided with an inclined groove (102), one side of the inclined groove (102) is in contact with the side wall, front wall and rear wall of the electrodeposition tank body (1), and the width of the inclined groove (102) is smaller than the distance between the side of the vertical plate (5043) close to the anode plate (3) and the inner wall of the anode chamber.

8. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 1, characterized in that: The collecting assembly (6) comprises a material collecting frame (601) mounted on the bottom wall of the inclined groove (102); the inclination angle of the bottom wall of the material collecting frame (601) is consistent with the inclination angle of the inclined groove (102); and the highest point of the bottom wall of the material collecting frame (601) is at the same height as the plane bottom wall of the electrodeposition tank body (1).

9. The oxygen diffusion-isolated electrodeposition tank device for tellurium electrodeposition according to claim 8, characterized in that: A dense filter plate (602) is slidably mounted on the inner wall of the aggregate frame (601), a rectangular plate (603) and a guide column (604) are mounted on the inner wall of the aggregate frame (601), a spring structure (605) is mounted between the rectangular plate (603) and the dense filter plate (602), a U-shaped pressing plate (606) is sleeved on the outer surface of the guide column (604), a rope (607) is mounted on the dense filter plate (602) and passes through the spring structure (605) and the rectangular plate (603) in sequence from bottom to top and is fixedly connected to one side of the U-shaped pressing plate (606), and a pressure strip structure (608) is mounted on the top wall of the cover structure (2) for pressing the U-shaped pressing plate (606) from top to bottom when the cover structure (2) covers the electrodeposition tank body (1).

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