Gas treatment method and device

Abstract

Aspects of the invention relate to a gas treatment apparatus (1) for treating a process gas. The gas treatment apparatus (1) comprises a primary treatment unit (2) and a secondary treatment unit (3), the primary and secondary treatment units (2, 3) being configured to treat a process gas. The primary treatment unit (2) comprises a primary process gas inlet (10) for receiving a process gas, first and second primary adsorbers (12, 13) for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers (12, 13). The secondary treatment unit (3) comprises a secondary process gas inlet (30) for receiving the process gas, at least one secondary adsorber (32, 33) for treating the process gas, and at least one secondary process gas outlet (31) for discharging the treated process gas from the at least one secondary adsorber (32, 33) to the primary treatment unit (2). The primary processing unit (2) is selectively configured in a first operating mode and a second operating mode. When operating in a first mode of operation, the primary process gas inlet (10) is connected to the first primary adsorber (12) to supply process gas to the first primary adsorber (12) for treatment; the second primary adsorber (13) is connected to at least one secondary process gas outlet (31) for receiving the treated process gas from the secondary treatment unit (3) for regenerating the second primary adsorber (13). When operating in a second mode of operation, the primary process gas inlet (10) is connected to the second primary adsorber (13) to supply process gas to the second primary adsorber (13) for treatment; the first primary adsorber (12) is connected to at least one secondary process gas outlet (31) for receiving the treated process gas from the secondary treatment unit (3) for regenerating the first primary adsorber (12). Aspects of the invention also relate to a method of controlling a gas treatment apparatus (1) to treat a process gas; and a liquid air energy storage device.

Description

Technical Field

[0001] The present invention relates to a gas processing method and a gas processing device. Aspects of the present invention relate to a gas processing device, a method for processing process gas, a control unit and a liquid air energy storage device. Background Art

[0002] Air Purification Units (APUs) are used to remove pollutants and unwanted compounds (hereafter referred to as "pollutants") from an air stream, thereby producing "cleaned" air for the process. These typically operate using an adsorption process, whereby the pollutants (which may be gases, water molecules, hydrocarbon particles, or any other unwanted substance) are adsorbed onto the surface of an adsorbent material. The adsorbent material is carefully selected to preferentially adsorb the pollutants that the process designer wishes to remove. There are two types of adsorption: physical adsorption and chemical adsorption.

[0003] APUs are well known in the field of air liquefaction. They are used to produce a clean, dry stream of air to be liquefied, particularly to avoid contamination of the process when contaminants freeze, and to ensure a pure liquid air product. Typically, the APU of an air liquefier is designed to remove carbon dioxide, moisture and hydrocarbons. The APU usually consists of a vessel containing a bed of adsorbent material particles through which the process fluid flows. Since the adsorption capacity of the adsorbent material is limited, the APU operates in two main stages: adsorption and regeneration (also known as desorption). Adsorption is an exothermic process that releases heat. Desorption requires heating. The two main process parameters that affect adsorption are pressure and temperature, which can be manipulated to change the equilibrium between the fluid and the adsorbent. In physical adsorption processes, adsorption increases at higher pressures and decreases at higher temperatures. In chemical adsorption processes, the relationship with temperature is often more complex. For simplicity, the following description focuses on physical adsorption, but the principles of the present invention can also be applied to chemical adsorption processes. Likewise, the following description focuses on the use of APUs for air liquefaction; however, those skilled in the art will recognize that the principles of the present invention are applicable to any similar application.

[0004] During the adsorption process cycle, pressure and temperature are controlled so that the adsorbent material adsorbs during the adsorption phase and desorbs during the regeneration phase. In the pressure swing adsorption process known in the art, the pressure is controlled so that it is high during the adsorption phase and low during the regeneration phase. In the temperature swing adsorption process known in the art, the temperature is controlled so that it is low during the adsorption process and high during the regeneration process. In the combined cycle, during the adsorption phase, the pressure of the process air stream is high and the temperature is low, so that the pollutants are adsorbed onto the surface of the adsorbent material. During the regeneration phase, a regeneration gas stream (which can be air or other gas) with a lower pressure and higher temperature flows through the adsorption bed. As a result, the balance between the gas stream and the adsorbent material changes, so that the pollutants are desorbed from the adsorbent material into the gas stream. The regeneration gas stream is then usually discharged to the atmosphere to remove the pollutants from the system. The regeneration phase is usually followed by a cooling phase, in which a cooler gas stream is used to cool the adsorption bed to a lower temperature before restarting the adsorption phase. The lower the temperature of the adsorption bed, the more effective the adsorption. Since both the adsorption phase and the regeneration phase are necessary, in order to achieve a continuous flow of purified air to the process, the APU in the air separation unit is mainly composed of two containers, one of which adsorbs and the other regenerates and then cools. Once the effective capacity of the adsorption vessel is reached (saturation), a valve system is used to switch the flow path so that the regenerated vessel becomes the adsorption vessel and the "full" vessel begins regeneration. In order for the regeneration phase to continue, a supply of regeneration gas is required. Insufficient or limited supply of regeneration gas may require interruption of the process until the regeneration phase is complete.

[0005] It is an object of the present invention to address one or more disadvantages associated with the prior art. Summary of the invention

[0006] Aspects and embodiments of the present invention provide a gas processing device, a method for processing a process gas, a control unit and a liquid air energy storage device as described in the appended claims.

[0007] According to one aspect of the present invention, a gas treatment device for treating a process gas is provided, the gas treatment device comprising a primary treatment unit and a secondary treatment unit, the primary and secondary treatment units being configured to treat the process gas. The primary treatment unit comprises a primary process gas inlet for receiving the process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers. The secondary treatment unit comprises a secondary process gas inlet for receiving the process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary treatment unit.

[0008] The process gas supplied to the primary treatment unit can be treated by one of the first and second primary adsorbers in the first and second operating modes; the other of the first and second primary adsorbers can be regenerated. Regeneration of the first or second primary adsorber can be performed by supplying treated process gas from the secondary treatment unit.

[0009] In at least some embodiments, the primary processing unit is selectively configurable in a first operating mode and / or a second operating mode. In at least some embodiments, the primary processing unit can continuously process the process gas when operating in the first and second operating modes.

[0010] When the primary processing unit is configured to operate in the first operating mode, the process gas supplied to the primary processing unit may be processed by the first primary adsorber. The first primary adsorber may be activated in the first operating mode.

[0011] When the primary processing unit is configured to operate in the second operating mode, the process gas may be treated by the second primary adsorber.The second primary adsorber may be activated in the second operating mode.

[0012] When operating in a first operating mode, the primary process gas inlet can be connected to the first primary adsorber to supply process gas to the first primary adsorber for treatment. When the primary treatment unit is operating in the first operating mode, the first primary adsorber can be configured to treat process gas. When the primary treatment unit is operating in the first operating mode, the second primary adsorber can be regenerated. The second primary adsorber can be connected to at least one secondary process gas outlet to receive treated process gas from the secondary treatment unit for regenerating the second primary adsorber. The second primary adsorber can be regenerated during part or all of the first operating mode. In one variation, the second primary adsorber can be regenerated independently of the operating mode of the primary treatment unit. For example, the second primary adsorber can be regenerated when the first primary adsorber is not operating to treat process gas supplied from the primary process gas inlet.

[0013] When operating in the second operating mode, the primary process gas inlet can be connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment. When the primary treatment unit is operating in the second operating mode, the second primary adsorber can be configured to treat process gas. When the primary treatment unit is operating in the second operating mode, the first primary adsorber can be regenerated. The first primary adsorber can be connected to at least one secondary process gas outlet to receive treated process gas from the secondary treatment unit for regenerating the first primary adsorber. The first primary adsorber can be regenerated during part or all of the second operating mode. In one variation, the first primary adsorber and / or the second primary adsorber can be regenerated independently of the operating mode of the primary treatment unit. For example, when the primary treatment unit is not operating to treat process gas supplied from the primary process gas inlet, the first primary adsorber and / or the second primary adsorber can be regenerated.

[0014] The primary treatment unit may include a plurality of primary process gas outlets. The primary treatment unit may include a first primary process gas outlet for discharging treated process gas from the first primary adsorber. The primary treatment unit may include a second primary process gas outlet for discharging treated process gas from the second primary adsorber. Alternatively, one or more primary process gas outlets may be adapted to discharge treated process gas from the first and second primary adsorbers.

[0015] The secondary treatment unit may include a plurality of secondary process gas outlets. The secondary treatment unit may include a first secondary process gas outlet for supplying treated process gas to the first primary adsorber. The secondary treatment unit may include a second secondary process gas outlet for supplying treated process gas to the second primary adsorber. Alternatively, one or more secondary process gas outlets may be adapted to supply treated process gas to the first and second primary adsorbers.

[0016] In at least some embodiments, the gas treatment device can purify the process gas. More specifically, the gas treatment device can remove contaminants from the process gas.

[0017] In use, the primary treatment unit may be operated to remove contaminants from the process gas. In at least some embodiments, the primary treatment unit may provide a primary purification device. In at least some embodiments, the primary treatment unit may include a primary air purification device.

[0018] In use, the secondary treatment unit may be operated to remove contaminants from the process gas. In at least some embodiments, the secondary treatment unit may provide a secondary purification device. In at least some embodiments, the secondary treatment unit may include a secondary air purification device.

[0019] At least in some embodiments, the regeneration of the primary treatment unit can be carried out by supplying a treated process gas received specifically (i.e., separately) from the secondary treatment unit. This can reduce or eliminate the need for the primary treatment unit to supply gas for regenerating the first and second primary adsorbers. A primary compressor can be provided for supplying untreated process gas to the first and second primary adsorbers. The primary compressor can be incorporated into the primary treatment unit, or can be separated from the primary treatment unit. Since the regeneration gas flow of the primary treatment unit can be supplied by the secondary treatment unit, the primary compressor does not need to generate a regeneration gas flow for the first and second primary adsorbers. Typically, the regeneration gas flow will be derived from the feed gas flow from the primary compressor, which will reduce the available gas flow for liquefaction in the downstream system. By obtaining the regeneration gas flow from the secondary treatment unit, the discharge pressure of the primary compressor can be determined according to the compression required for the process gas fed to the primary treatment unit. This can contribute to the optimization of the operation of the primary compressor, and at least in some embodiments, can allow the primary compressor to operate more efficiently. This can also reduce or avoid the need for process gas pressure regulation, which may cause energy losses.

[0020] The primary processing unit and the secondary processing unit may be arranged in parallel with each other.

[0021] The gas treatment device can be configured to connect the first primary adsorber to the primary process gas inlet and at least one primary process gas outlet fluid when operating in the first operating mode. In use, untreated (feed) process gas is supplied to the first primary adsorber. The first primary adsorber is configured to treat the process gas by adsorbing one or more pollutants present therein. The treated process gas can be output from the first primary adsorber to at least one primary process gas outlet. The gas treatment device can be configured to connect the second primary adsorber to the secondary treatment unit fluid when operating in the first operating mode. In use, untreated (feed) process gas is supplied to the secondary treatment unit. At least one secondary adsorber is configured to treat the process gas by adsorbing one or more pollutants present therein. The treated process gas is output from the secondary treatment unit to regenerate the primary treatment unit. The treated process gas is supplied to the second primary adsorber to regenerate the second primary adsorber. At least in some embodiments, the regeneration of the second primary adsorber can be carried out while the first primary adsorber treats the process gas.

[0022] The device is configured to connect the second primary adsorber to the primary process gas inlet and at least one primary process gas outlet fluid when operating in the second operating mode. In use, untreated (feed) process gas is supplied to the second primary adsorber. The second primary adsorber is configured to treat the process gas by adsorbing one or more pollutants present therein. The treated process gas can be output from the second primary adsorber to at least one primary process gas outlet. The device is configured to connect the first primary adsorber to the secondary treatment unit fluid in the second operating mode. In use, untreated (feed) process gas is supplied to the secondary treatment unit. Untreated (feed) process gas is supplied to the secondary treatment unit to adsorb one or more pollutants. The treated process gas is output from the secondary treatment unit to the primary treatment unit. The treated process gas is supplied to the first primary adsorber to regenerate the first primary adsorber. At least in some embodiments, the regeneration of the first primary adsorber can be carried out while the second primary adsorber treats the process gas.

[0023] When operating in the first operating mode, a portion of the treated process gas from the first primary adsorber may be supplied to re-pressurize the second primary adsorber after regeneration of the second primary adsorber.

[0024] When operating in the second operating mode, a portion of the treated process gas from the second primary adsorber is supplied to repressurize the first primary adsorber after regeneration of the first primary adsorber.

[0025] When operating in the first operating mode, the second primary adsorber may be depressurized prior to regeneration of the second primary adsorber.

[0026] When operating in the second operating mode, the first primary adsorber may be depressurized prior to regeneration of the first primary adsorber.

[0027] The gas treatment device may include a primary regeneration heater. The primary regeneration heater may be configured to heat the treated process gas from the secondary treatment unit before introducing it into the primary treatment unit.

[0028] The gas processing apparatus may optionally be configurable to regenerate the secondary processing unit.

[0029] The at least one secondary adsorber may include first and second secondary adsorbers for treating process gas. In use, one of the first and second secondary adsorbers may be operatively selected to treat process gas; the other of the first and second secondary adsorbers may be regenerated. A portion of the treated process gas from the selected one of the first and second secondary adsorbers may be output to regenerate the other of the first and second secondary adsorbers.

[0030] The regeneration of the secondary treatment unit can be performed independently of the operating mode of the primary treatment unit. The at least one secondary adsorber may include a first secondary adsorber and a second secondary adsorber. In use, one of the first and second secondary adsorbers can be operatively selected to treat the process gas supplied to the secondary treatment unit. The treated process gas can be output from the secondary treatment unit to the primary treatment unit to regenerate at least one of the first and second primary adsorbers. The other of the first and second secondary adsorbers can be regenerated. The regeneration of the first and second secondary adsorbers can be performed independently of the operation of the primary treatment unit. For example, the first and second secondary adsorbers can be cycled through one or more treatment (feed) operations and one or more regeneration operations independently of the operating mode of the primary treatment unit.

[0031] Regeneration of the secondary processing unit can be performed when the primary processing unit is online (i.e., when process gas is supplied to the primary processing unit for processing) or when the primary processing unit is offline (i.e., when process gas is not supplied to the primary processing unit for processing).

[0032] Alternatively, regeneration of the secondary processing unit may be dependent upon operation of the primary processing unit.The gas processing apparatus may be configured to regenerate the secondary processing unit when the primary processing apparatus is operating in the first operating mode or the second operating mode.

[0033] The gas treatment device may include a secondary regeneration heater. The secondary regeneration heater may be configured to heat the treated process gas for regenerating the other of the first and second secondary adsorbers.

[0034] The gas treatment device may include a primary compressor for compressing process gas supplied to a primary process gas inlet of the primary treatment unit. Alternatively or additionally, the gas treatment device may include a secondary compressor for compressing process gas supplied to a secondary process gas inlet of the secondary treatment unit.

[0035] The gas treatment device may include a primary outlet valve system. The primary outlet valve system may include at least one outlet valve for controlling the supply of treated process gas from the primary treatment unit. The primary outlet valve system may be selectively configured to connect the first primary adsorber and / or the second primary adsorber to at least one primary process gas outlet.

[0036] The primary outlet valve system can be selectively configured to connect the secondary treatment unit to one of the first and second primary adsorbers for regeneration. The primary outlet valve system can be configured to connect the first primary adsorber to at least one primary process gas outlet when operating in a first operating mode. The primary outlet valve system can be configured to connect the second primary adsorber to at least one primary process gas outlet when operating in a second operating mode.

[0037] The primary outlet valve system may be configured to connect the secondary treatment unit with the second primary adsorber when operating in the first operating mode. The primary outlet valve system may be configured to connect the secondary treatment unit with the first primary adsorber when operating in the second operating mode.

[0038] The gas treatment device may include a secondary outlet valve system. The secondary outlet valve system may include at least one outlet valve for controlling the supply of treated process gas from the secondary treatment unit. The secondary outlet valve system may be selectively configured to connect at least one secondary adsorber to at least one secondary process gas outlet.

[0039] The gas treatment device may include a primary inlet valve system. The primary inlet valve system may include at least one inlet valve for controlling the supply of untreated process gas to the primary treatment unit. The primary inlet valve system may be selectively configured to connect the primary process gas inlet to the first primary adsorber and / or the second primary adsorber.

[0040] The primary inlet valve system can be selectively configured to connect the primary process gas inlet to one of the first and second primary adsorbers. The primary inlet valve system can be selectively configured to exhaust process gas from one of the first and second primary adsorbers for depressurizing the first and second primary adsorbers.

[0041] The primary inlet valve system may be configured to connect the first primary adsorber to the primary process gas inlet when operating in the first operating mode. The primary outlet valve system may be configured to vent the second primary adsorber when operating in the first operating mode.

[0042] The primary inlet valve system may be configured to connect the second primary adsorber to the primary process gas inlet when operating in the second operating mode. The primary outlet valve system may be configured to vent the first primary adsorber when operating in the second operating mode.

[0043] The gas treatment device may include a secondary inlet valve system. The secondary inlet valve system may include at least one inlet valve for controlling the supply of untreated process gas to the secondary treatment unit. The secondary inlet valve system may be selectively configured to connect the secondary process gas inlet to the first secondary adsorber and / or the second secondary adsorber.

[0044] The secondary inlet valve system can be selectively configured to connect the secondary process gas inlet to one of the first and second secondary adsorbers. The secondary inlet valve system can be selectively configured to vent process gas from one of the first and second secondary adsorbers. The process gas can be vented to depressurize the first and second primary adsorbers.

[0045] The primary and secondary processing units may be configured to remove carbon dioxide (CO2) and water (H2O) from the process gas.

[0046] The process gas supplied to the gas treatment device is typically untreated (feed) process gas. The process gas may be air. For example, the air may be obtained from the atmosphere.

[0047] The primary processing unit may provide a primary air handling unit. At least in some embodiments, the primary air handling unit may be a primary air purification unit (PAPU).

[0048] The secondary processing unit may provide a secondary air handling unit. At least in some embodiments, the secondary air handling unit may be a secondary air purification unit (SAPU).

[0049] According to another aspect of the present invention, there is provided a method for controlling a gas processing device to process a process gas, the gas processing device comprising:

[0050] a primary processing unit comprising a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and

[0051] A secondary processing unit includes a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit.

[0052] In at least some embodiments, the method may include selectively operating the primary processing unit in a first operating mode and a second operating mode.

[0053] When operating in the first operating mode, the primary process gas inlet can be connected to the first primary adsorber to supply untreated process gas to the first primary adsorber for treatment. The second primary adsorber can be connected to at least one secondary process gas outlet to receive treated process gas from the secondary treatment unit for regenerating the second primary adsorber.

[0054] When operating in the second operating mode, the primary process gas inlet can be connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment. The first primary adsorber can be connected to at least one secondary process gas outlet to receive treated process gas from the secondary treatment unit for regenerating the first primary adsorber.

[0055] At least one secondary adsorber may include a first secondary adsorber and a second secondary adsorber. In use, one of the first and second secondary adsorbers may be operatively selected to treat the process gas supplied to the secondary treatment unit. The treated process gas may be output from the secondary treatment unit to the primary treatment unit to regenerate at least one of the first and second primary adsorbers. The other of the first and second secondary adsorbers may be regenerated. The regeneration of the first and second secondary adsorbers may be performed independently of the operation of the primary treatment unit. For example, the first and second secondary adsorbers may be cycled through one or more treatment (feed) operations and one or more regeneration operations independently of the operating mode of the primary treatment unit.

[0056] According to one aspect of the present invention, a gas processing device for processing a process gas is provided, the gas processing device comprising a primary processing unit and a secondary processing unit, the primary processing unit and the secondary processing unit are configured to process the process gas, wherein:

[0057] The primary processing unit includes a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and

[0058] the secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit;

[0059] wherein, in use, the primary process gas inlet is connected to the first primary adsorber to supply process gas to the first primary adsorber for treatment in a first operating mode; the primary process gas inlet is connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment in a second operating mode; and

[0060] Wherein, in use, the secondary treatment unit is selectively connected to at least one of the first and second primary adsorbers to supply treated process gas for regenerating at least one of the first and second primary adsorbers.

[0061] The gas treatment device may be selectively configured to operate the primary treatment unit in a first operating mode or a second operating mode. Depending on the selected operating mode, the first or second primary adsorber may be operated to process the process gas supplied from the primary process gas inlet.

[0062] The secondary treatment unit may be selectively connected to at least one of the first and second primary adsorbers. At least one of the first and second primary adsorbers may be regenerated by supplying treated process gas from the secondary treatment unit.

[0063] The gas treatment device may be selectively configured to regenerate the secondary treatment unit. The regeneration of the secondary treatment unit may be performed independently of the operating mode of the primary treatment unit.

[0064] At least one secondary adsorber may include a first secondary adsorber and a second secondary adsorber. In use, one of the first and second secondary adsorbers may be operatively selected to treat the process gas supplied to the secondary treatment unit. The treated process gas may be output from the secondary treatment unit to the primary treatment unit to regenerate at least one of the first and second primary adsorbers. The other of the first and second secondary adsorbers may be regenerated. The regeneration of the first and second secondary adsorbers may be performed independently of the operation of the primary treatment unit. For example, the first and second secondary adsorbers may be cycled through one or more treatment (feed) operations and one or more regeneration operations independently of the operating mode of the primary treatment unit.

[0065] According to another aspect of the present invention, there is provided a gas processing device for processing a process gas, the gas processing device comprising a primary processing unit and a secondary processing unit, the primary processing unit and the secondary processing unit being configured to process the process gas, wherein:

[0066] The primary processing unit includes a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers;

[0067] The secondary processing unit includes a secondary process gas inlet for receiving the process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit.

[0068] In at least some embodiments, the primary processing unit may be selectively configurable into a first operating mode and a second operating mode.

[0069] When operating in the first operating mode, the first primary adsorber may be in fluid communication with the primary process gas inlet and the at least one primary process gas outlet.The second primary adsorber may be in fluid communication with the secondary treatment unit.

[0070] When operating in the second operating mode, the second primary adsorber may be in fluid communication with the primary process gas inlet and the at least one primary process gas outlet.The first primary adsorber may be in fluid communication with the secondary treatment unit.

[0071] According to one aspect of the present invention, there is provided a method for controlling a gas processing device to process a process gas, the gas processing device comprising:

[0072] a primary processing unit comprising a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and

[0073] a secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit;

[0074] The method comprises:

[0075] In a first operating mode, connecting the primary process gas inlet to the first primary adsorber to supply untreated process gas to the first primary adsorber for treatment;

[0076] In a second operation mode, connecting the primary process gas inlet to the second primary adsorber to supply the process gas to the second primary adsorber for treatment; and

[0077] A secondary treatment unit is connected to at least one of the first and second primary adsorbers to supply treated process gas for regenerating at least one of the first and second primary adsorbers.

[0078] The method may include selectively operating the primary processing unit in a first operating mode or a second operating mode. Depending on the selected operating mode, the first or second primary adsorber may be operated to process the process gas supplied from the primary process gas inlet.

[0079] The method may include selectively connecting a secondary treatment unit to at least one of the first and second primary adsorbers. At least one of the first and second primary adsorbers may be regenerated by supplying treated process gas from the secondary treatment unit.

[0080] At least one secondary adsorber may include a first secondary adsorber and a second secondary adsorber. The method may include selecting one of the first and second secondary adsorbers to treat the process gas supplied to the secondary treatment unit. The treated process gas can be output from the secondary treatment unit to the primary treatment unit to regenerate at least one of the first and second primary adsorbers. The other of the first and second secondary adsorbers can be regenerated. The regeneration of the first and second secondary adsorbers can be performed independently of the operation of the primary treatment unit. For example, the first and second secondary adsorbers can be cycled through one or more treatment (feed) operations and one or more regeneration operations independently of the operating mode of the primary treatment unit.

[0081] According to another aspect of the present invention, an electronic control unit is provided, which is configured to control a gas processing device to perform the method described herein. The electronic control unit includes at least one electronic processor and at least one storage device. A set of computing instructions is stored on the storage device. When executed by at least one electronic processor, the computing instructions cause the at least one electronic processor to perform the method described herein.

[0082] According to another aspect of the present invention, a liquid air energy storage device is provided, comprising the gas processing device described herein.

[0083] Unless otherwise stated (implicitly, explicitly or due to incompatibility), the components mentioned herein that are connected to each other or fluidly connected to each other should be understood to refer to components that are fluidly connected to each other, so that in use, the fluid is transported between these components. For example, the fluid may include one or more of the following: untreated (feed) process gas, treated process gas and regeneration gas. For example, the process gas inlet is connected or fluidly connected to the adsorber (in a primary or secondary treatment unit) and refers to the process gas inlet being connected to the adsorber fluid so that the process gas can be delivered to the adsorber. For another example, the adsorber (in a primary or secondary treatment unit) is connected or fluidly connected to the process gas outlet and refers to the adsorber being connected to the process gas outlet fluid so that the treated process gas can be delivered to the process gas outlet. These examples are non-limiting, and other examples of components that are fluidly connected to each other are also within the scope of the present application.

[0084] The valves described herein can be selectively operated to establish or inhibit a fluid connection. Alternatively or additionally, the valve can provide variable or proportional control of a fluid. For example, the valve can include a variable valve or a proportional valve to control the supply of fluid within a gas processing device.

[0085] Any control unit or controller described herein may suitably include a computing device having one or more electronic processors. The system may include a single control unit or electronic controller, or different functions of the controller may be implemented or accommodated in different control units or controllers. The term "controller" or "control unit" used herein will be understood to include a single control unit or controller and multiple control units or controllers that operate together to provide any of the control functions. In order to configure the controller or control unit, a set of suitable instructions may be provided that, when executed, enables the control unit or computing device to implement the control technology specified herein. The set of instructions may be suitably built into the one or more electronic processors. Alternatively, the set of instructions may be provided in software stored on one or more memories associated with the controller to be executed on the computing device. The control unit or controller may be implemented in software running on one or more processors. One or more other control units or controllers may be implemented in software running on one or more processors, optionally the same as one or more processors of the first controller. Other suitable arrangements may also be used.

[0086] It is expressly stated that within the scope of the present application, the various aspects, embodiments, examples and alternatives set out in the preceding paragraphs, claims and / or the following description and drawings, in particular the individual features thereof, may be independent or in any combination. That is, all embodiments and / or features of any embodiment may be combined in any manner and / or combination, unless such features are incompatible. The applicant reserves the right to change any originally filed claim or any new claim filed accordingly, including the right to amend any originally filed claim to rely on and / or incorporate any features of any other claim, even though not originally proposed in this manner. BRIEF DESCRIPTION OF THE DRAWINGS

[0087] One or more embodiments of the present invention will now be described, by way of example only, with reference to the accompanying drawings, in which:

[0088] Figure 1 The gas processing device having a primary processing unit and a secondary processing unit according to an embodiment of the present invention is shown;

[0089] Figure 2 Shows the control Figure 1 A schematic diagram of a control unit of the gas processing device shown;

[0090] Figure 3A Shows Figure 1 A schematic diagram of a first or second stage adsorber of the gas treatment device shown;

[0091] Figure 3B Shows Figure 1Schematic diagram of alternative configurations of first or second stage adsorbers of a gas treatment plant;

[0092] Figure 4 shows a schematic diagram of a primary cooler arranged to cool air supplied from a primary compressor;

[0093] Figure 5 showing a primary processing unit operating in a second operating mode, wherein the second primary adsorption bed processes untreated (feed) process gas supplied from the primary process gas inlet;

[0094] Figure 6 A primary processing unit is shown operating in a first operating mode wherein a first primary adsorption bed treats untreated (feed) process gas supplied from a primary process gas inlet while a second primary adsorber is depressurized;

[0095] Figure 7 shows a primary processing unit operating in a first operating mode while a second primary adsorber is being regenerated;

[0096] Figure 8 A primary processing unit is shown operating in a first operating mode while a second primary adsorber is repressurized;

[0097] Fig. 9 showing a first profile of simulated temperature within one of the first and second primary adsorption beds during regeneration;

[0098] Fig.10 A schematic diagram of a second secondary adsorber of a secondary treatment unit is shown, which operates to treat process gas for regenerating a primary treatment unit;

[0099] Fig.11 shows a schematic diagram of a second secondary adsorber supplying treated gas to regenerate a first secondary adsorber of a secondary treatment unit;

[0100] Fig.12 shows a schematic diagram of repressurizing a first secondary adsorber by supplying treated process gas from a second secondary adsorber;

[0101] Fig.13 A schematic diagram of a first secondary adsorber of a secondary treatment unit is shown, which operates to treat process gas for regenerating a primary treatment unit;

[0102] Fig.14 shows a schematic diagram of a first secondary adsorber supplying treated gas to regenerate a second secondary adsorber of a secondary treatment unit; and

[0103] Fig.15A schematic diagram of repressurizing the second secondary adsorber by supplying treated process gas from the first secondary adsorber is shown. DETAILED DESCRIPTION

[0104] All numerical values ​​of physical quantities (such as pressure, temperature, mass flow rate, speed, etc.) described herein are exemplary and are intended to help understand the present invention. It will be understood by those skilled in the art that the numerical values ​​of these physical quantities may have a wide range according to the specific scale or implementation of the present invention and the requirements of the user, and unless otherwise specified, the present invention is not limited to these described numerical values.

[0105] With reference to the accompanying drawings, a gas processing device 1 for processing process gas according to an embodiment of the present invention is described herein. The gas processing device 1 is configured to be used in a liquid air energy storage device.

[0106] As described herein, the gas treatment device 1 is configured to treat the process gas to remove contaminants (usually by adsorbing the contaminants). In the present embodiment, the process gas is ambient air compressed and supplied to the gas treatment device 1 at a pressure greater than atmospheric pressure. The gas treatment device 1 is configured to remove carbon dioxide (CO2) and water (H2O) from the air. The process gas supplied to the gas treatment device 1 is referred to herein as untreated (feed) process gas. The process gas discharged from the gas treatment device 1 is referred to herein as treated process gas. The untreated (feed) process gas may be referred to as wet process gas; the treated process gas may be referred to as dry process gas. It should be understood that the process gas may undergo other treatment processes before and / or after being supplied to the gas treatment device 1. It should be understood that the gas treatment device 1 and the treatment method described herein can be used to treat process gases other than air.

[0107] like Figure 1As shown, the gas treatment device 1 includes a primary treatment unit 2 and a secondary treatment unit 3. The primary treatment unit 2 is configured to operate as a primary air purification unit (PAPU); the secondary air treatment unit 3 is configured to operate as a secondary air purification unit (SAPU). The primary treatment unit 2 is configured to receive untreated (feed) process gas. The primary treatment unit 2 serves as a primary air purification unit; the secondary treatment unit 3 serves as a secondary air purification unit. The primary treatment unit 2 removes carbon dioxide (CO2) and water (H2O) from the untreated (feed) process gas and discharges the treated process gas. The secondary treatment unit 3 is configured to supply regeneration gas for regenerating the primary treatment unit 2. The primary treatment unit 2 is configured to receive untreated (feed) process gas. The untreated (feed) gas is treated by the secondary treatment unit 3 to remove pollutants. In this embodiment, the regeneration gas is air that has been treated to remove carbon dioxide (CO2) and water (H2O). In this embodiment, both the primary treatment unit 2 and the secondary treatment unit 3 are configured to treat the same process gas. The primary processing unit 2 and the secondary processing unit 3 may be configured to receive process gas from a common source, such as from the same compressor. In the present embodiment, the primary processing unit 2 and the secondary processing unit 3 are configured to receive untreated (feed) process gas from different sources. This enables independent control of the supply of untreated (feed) process gas to the primary processing unit 2 and the secondary processing unit 3, for example, the untreated (feed) process gas can be supplied at different pressures.

[0108] The electronic control unit 5 is configured to control the operation of the gas processing device 1. As described herein, the primary processing unit 2 of the gas processing device 1 is selectively operable in first and second operating modes. The electronic control unit 5 selectively configures the primary processing unit 2 to operate in the first and second operating modes. Figure 2 As shown, the electronic control unit 5 includes at least one electronic processor 6 and a system memory 7. The at least one electronic processor 6 has at least one input 8 and at least one output 9. The at least one electronic processor 6 is configured to output a control signal SOUT-n to control the operation of the gas processing device 1. The control unit 5 may be a dedicated controller, or may be a general-purpose computing device that executes an application to control the operation of the gas processing device 1. A set of computing instructions is stored on the system memory 7. When executed by the at least one electronic processor 6, the computing instructions cause the at least one electronic processor 6 to perform the method described herein.

[0109] The regeneration gas supply conduit 4 is configured to supply the regeneration gas from the secondary treatment unit 3 to the primary treatment unit 2. The primary treatment unit 2 includes a primary process gas inlet 10 for receiving untreated (feed) process gas, at least one primary process gas outlet 11 for discharging treated process gas, a first primary adsorber 12 and a second primary adsorber 13. The first and second primary adsorbers 12, 13 are configured to treat the process gas. The first and second primary adsorbers 12, 13 are arranged parallel to each other. The first primary adsorber 12 includes a first primary adsorption vessel 14-1 including a first primary adsorption bed 15-1. The second primary adsorber 13 includes a second primary adsorption vessel 14-2 including a second primary adsorption bed 15-2. In the present embodiment, the first and second primary adsorbers 12, 13 have similar configurations. Reference will be made herein to Figure 3A and 3B The composition of the first and second stage adsorbers 12, 13 will be described in more detail.

[0110] like Figure 1 As shown, the primary treatment unit 2 includes a primary inlet valve system 16 selectively configured to connect the primary process gas inlet 10 with the first and second primary adsorbers 12, 13; and a primary outlet valve system 19 selectively configured to connect the first and second primary adsorbers 12, 13 with the primary process gas outlet 11. In a first operating mode, the primary inlet valve system 16 is configured to connect the primary process gas inlet 10 with the first primary adsorber 12; and connect the first primary adsorber 12 with the primary process gas outlet 11. In a second operating mode, the primary inlet valve system 16 is configured to connect the primary process gas inlet 10 with the second primary adsorber 13; and connect the second primary adsorber 13 with the primary process gas outlet 11. The primary inlet valve system 16 includes a plurality of primary inlet control valves 20-n; and the primary outlet valve system 19 includes a plurality of primary outlet control valves 23-n.

[0111] The primary inlet control valve 20-n is configured to control the supply of untreated (feed) process gas from the primary process gas inlet 10 to the first and second primary adsorbers 12, 13. Each of the primary inlet control valves 20-n is independently controllable by the control unit 5. The primary inlet control valves 20-n each include an actuator, such as a solenoid, which is operable according to a valve control signal. In the present embodiment, the primary inlet control valve 20-n is a two-way valve, but other types of valves may also be used. For example, the primary inlet control valve 20-n may be a three-way valve. In the present embodiment, the primary inlet valve system 16 includes an array of 6 primary inlet control valves 20-n arranged in pairs in the first, second and third inlet branches 21-1, 21-2, 21-3. The primary inlet valve system 16 may include any other arrangement of the primary inlet control valves 20-n, which is configured to control the supply of untreated (feed) process gas from the primary process gas inlet 10 to the first and / or second primary adsorbers 12, 13. The primary process gas inlet 10 is connected to the first inlet branch 21-1 between the first and second primary inlet control valves 20-1, 20-2. The first and second primary inlet control valves 20-1, 20-2 are selectively opened and closed to connect the primary process gas inlet 10 to one (or both) of the first and second primary adsorbers 12, 13. The primary process gas exhaust port 22 is connected to the second inlet branch 21-2 between the third and fourth primary inlet control valves 20-3, 20-4. The primary process gas exhaust port 22 is also connected to the third inlet branch 21-3 between the fifth and sixth primary inlet control valves 20-5, 20-6. The first and second primary adsorbers 12, 13 can be controllably exhausted through the primary process gas exhaust port 22. The primary inlet valve system 16 can include any other arrangement of the primary inlet control valves 20-n, which is configured to controllably exhaust the first and second primary adsorbers 12, 13 through the primary process gas exhaust port 22. Different configurations of the primary inlet control valves 20-n are contemplated. For example, the fifth and sixth primary inlet control valves 20 - 5 , 20 - 6 may be omitted. The third and fourth primary inlet control valves 20 - 3 , 20 - 4 may be configured to depressurize the first and second primary adsorbers 12 , 13 .

[0112] The primary inlet control valves 20-n each have a valve flow coefficient (Cv), which represents the flow rate relative to the pressure drop across the valve under fully open operating conditions. In this embodiment, the primary inlet control valves 20-n have different valve flow coefficients (Cv). The primary inlet control valves 20-n can be configured to implement different flow rates for different operating processes. In this embodiment, the valve flow coefficients (Cv) of the third and fourth primary inlet control valves 20-3, 20-4 are smaller than the valve flow coefficients (Cv) of the fifth and sixth primary inlet control valves 20-5, 20-6. As described herein, the third and fourth primary inlet control valves 20-3, 20-4 are opened to depressurize the first and second primary adsorption vessels 14-1, 14-2, respectively; the fifth and sixth primary inlet control valves 20-5, 20-6 are opened to purge (regenerate) the first and second primary adsorption beds 15-1, 15-2, respectively. The smaller valve flow coefficients (Cv) of the third and fourth primary inlet control valves 20-3, 20-4 maintain a low gas flow rate for depressurization. This may help avoid high gas flow rates which would result in large downward forces on the first and second primary adsorbent beds 15-1, 15-2, which could damage the support grids used to support the adsorbent beds 15-1, 15-2. Prior to commencing regeneration, the first and second primary adsorbent beds 15-1, 15-2 are preferably near atmospheric pressure. Otherwise, opening the purge (regeneration) stage valve would result in very large temporary gas flows due to the increased gas flow.

[0113] Alternatively, one or more of the primary inlet control valves 20-n may include a variable control valve. The third and fourth primary inlet control valves 20-3, 20-4 may each include a variable flow control valve, which is operable to regulate or adjust the flow. The third and fourth primary inlet control valves 20-3, 20-4 may be configured to provide a first flow for decompression; and to provide a second flow for purging (regeneration). The first flow may be less than the second flow. Alternatively or additionally, the third and fourth primary inlet control valves 20-3, 20-4 may be pulsed open and closed (pulse width modulation) to regulate the flow.

[0114] The fifth and sixth primary inlet control valves 20-5, 20-6 may optionally be omitted.

[0115] The primary outlet control valve 23-n is configured to control the supply of the treated process gas from the first and / or second primary adsorber 12, 13 to the other primary adsorber and / or the primary process gas outlet 11. Each valve in the primary outlet control valve 23-n is independently controllable by the control unit 5. The primary outlet control valves 23-n each include an actuator, such as a solenoid, which is operable according to a valve control signal. In the present embodiment, the primary outlet control valve 23-n is a two-way valve, but other types of valves may also be used. For example, the primary outlet control valve 23-n may be a three-way valve. In the present embodiment, the primary outlet valve system 19 includes an array of five primary outlet control valves 23-n arranged in the first, second and third outlet branches 24-1, 24-2, 24-3. The primary outlet valve system 19 may include any other arrangement of the primary outlet control valves 23-n, which is configured to control the supply of the treated process gas from the first and / or second primary adsorber 12, 13 to the other primary adsorber and / or the primary process gas outlet 11. The primary process gas outlet 11 is connected to the first outlet branch 24-1 between the first and second primary outlet control valves 23-1, 23-2. The first and second primary outlet control valves 23-1, 23-2 are opened and closed to make one (or both) of the first and second primary adsorbers 12, 13 fluidly connected to the primary process gas outlet 11. The regeneration gas supply pipeline 4 is connected to the second outlet branch 24-2 between the third and fourth primary outlet control valves 23-3, 23-4. The third and fourth primary outlet control valves 23-3, 23-4 are selectively opened and closed to make the regeneration gas supply pipeline 4 fluidly connected to one (or both) of the first and second primary adsorbers 12, 13. The third and fourth primary outlet control valves 23-3, 23-4 can both be closed to prevent the treated process gas from being supplied from the regeneration gas supply pipeline 4 to the first and second primary adsorbers 12, 13. As described herein, the third and fourth primary outlet control valves 23-3, 23-4 are actuated to control the regeneration of the first and second primary adsorbers 12, 13. The third outlet branch 24-3 forms a repressurization conduit for selectively repressurizing the first and second primary adsorbers 12, 13. The fifth primary outlet control valve 23-5 is selectively disposed in the third outlet branch 24-3 to establish fluid communication between the first and second primary adsorbers 12, 13. The fifth primary outlet control valve 23-5 is operated to control one of the first and second primary adsorbers 12, 13 to be repressurized from the other of the first and second primary adsorbers 12, 13. The primary outlet valve system 19 may also include any other arrangement of the primary outlet control valve 23-n, which is configured to fluidly connect the regeneration gas supply conduit 4 to one (or both) of the first and second primary adsorbers 12, 13, and to establish fluid communication between the first and second primary adsorbers 12 and 13.

[0116] A primary regeneration heater 25 is provided in the regeneration gas supply pipeline 4 to heat the regeneration gas supplied to the primary treatment unit 2. In the present embodiment, the primary regeneration heater 25 is provided to heat the regeneration gas supplied from the secondary treatment unit 3. A first heater controller 26 is provided to control the operation of the primary regeneration heater 25. The first heater controller 26 includes at least one electronic processor having at least one electrical input for receiving first and second primary temperature signals from respective first and second primary temperature sensors 27, 28. The first heater controller 26 may be a separate controller or may be incorporated into the control unit 5. The first primary temperature sensor 27 is configured to measure the first operating temperature T1 of the first primary adsorber 12; the second primary temperature sensor 28 is configured to measure the second operating temperature T2 of the second primary adsorber 13. A primary regeneration control valve 29 is provided in the regeneration gas supply pipeline 4 to control the supply of the treated process gas from the secondary treatment unit 3. The primary regeneration control valve 29 is a two-way valve that can be selectively opened and closed. In the present embodiment, the primary regeneration control valve 29 is a pneumatic valve.

[0117] The secondary treatment unit 3 comprises a secondary process gas inlet 30 for receiving untreated (feed) process gas, at least one secondary process gas outlet 31 for discharging treated process gas, a first secondary adsorber 32 and a second secondary adsorber 33. The first and second secondary adsorbers 32, 33 are configured to treat the process gas. Figure 1 As shown, the first and second secondary adsorbers 32, 33 are arranged in parallel. The first secondary adsorber 32 includes a first secondary adsorber vessel 34-1 including a first adsorption bed 35-1. The second secondary adsorber 33 includes a second secondary adsorber vessel 34-2 including a second adsorption bed 35-2. In the present embodiment, the first and second secondary adsorbers 32, 33 have similar configurations. The first and second secondary adsorbers 32, 33 have substantially the same configuration as the first and second primary adsorbers 12, 13 described herein. Optionally, the volume of the first and second secondary adsorbers 32, 33 may be smaller than the volume of the first and second primary adsorbers 12, 13.

[0118] The secondary treatment unit 3 includes a secondary inlet valve system 36 selectively configured to connect the secondary process gas inlet 30 with the first and second secondary adsorbers 32, 33; and a secondary outlet valve system 39 selectively configured to connect the first and second secondary adsorbers 32, 33 with the secondary process gas outlet 31. The secondary inlet valve system 36 includes a plurality of secondary inlet control valves 40-n; and the secondary outlet valve system 39 includes a plurality of secondary outlet control valves 43-n.

[0119] The secondary inlet control valve 40-n is configured to control the supply of untreated (feed) process gas from the secondary process gas inlet 30 to the first and second secondary adsorbers 32, 33. Each of the secondary inlet control valves 40-n is independently controllable by the control unit 5. The secondary inlet control valves 40-n each include an actuator, such as a solenoid, which is operable according to a valve control signal. In the present embodiment, the secondary inlet control valve 40-n is a two-way valve, but other types of valves may also be used. For example, the secondary inlet control valve 40-n may be a three-way valve. In the present embodiment, the secondary inlet valve system 36 includes an array of 6 secondary inlet control valves 40-n arranged in pairs in the first, second and third inlet branches 41-1, 41-2, 41-3. The secondary inlet valve system 36 may include any other arrangement of the secondary inlet control valves 40-n configured to control the supply of untreated (feed) process gas from the secondary process gas inlet 30 to the first and second secondary adsorbers 32, 33. The secondary process gas inlet 30 is connected to the first inlet branch 41-1 between the first and second secondary inlet control valves 40-1, 40-2. The first and second secondary inlet control valves 40-1, 40-2 are selectively opened and closed to connect the secondary process gas inlet 30 to one (or both) of the first and second secondary adsorbers 32, 33. The secondary process gas exhaust port 42 is connected to the second inlet branch 41-2 between the third and fourth secondary inlet control valves 40-3, 40-4. The secondary process gas exhaust port 42 is also connected to the third inlet branch 41-3 between the fifth and sixth secondary inlet control valves 40-5, 40-6. The first and second secondary adsorbers 32, 33 can be controllably exhausted through the secondary process gas exhaust port 42. The secondary inlet valve system 36 may include any other arrangement of the secondary inlet control valves 40-n configured to controllably exhaust the first and second secondary adsorbers 32, 33 through the secondary process gas exhaust port 42.

[0120] The secondary outlet control valve 43-n is configured to control the supply of treated process gas from the first and / or second secondary adsorber 32, 33 to another secondary adsorber or the secondary process gas outlet 31. The secondary process gas outlet 31 is connected to the regeneration gas supply pipeline 4 and is operable in use to supply the treated process gas from the secondary treatment unit 3 to the primary treatment unit 2 to regenerate the first and second primary adsorbers 12, 13. Each of the secondary outlet control valves 43-n is independently controllable by the control unit 5. The secondary outlet control valves 43-n each include an actuator, such as a solenoid, which is operable according to a valve control signal. In the present embodiment, the secondary outlet control valve 43-n is a two-way valve, but other types of valves may also be used. For example, the secondary outlet control valve 43-n may be a three-way valve. In the present embodiment, the secondary outlet valve system 39 includes an array of 5 secondary outlet control valves 43-n arranged in the first, second and third outlet branches 44-1, 44-2, 44-2, 44-3. The secondary outlet valve system 39 may include any other arrangement of secondary outlet control valves 43-n configured to control the supply of treated process gas from the first and / or second secondary adsorbers 32, 33 to another secondary adsorber or the secondary process gas outlet 31. The secondary process gas outlet 31 is connected to a first outlet branch 44-1 between the first and second secondary outlet control valves 43-1, 43-2. ​​The first and second secondary outlet control valves 43-1, 43-2 are selectively opened and closed to fluidly connect one (or both) of the first and second secondary adsorbers 32, 33 to the secondary process gas outlet 31. Both the first and second secondary outlet control valves 43-1, 43-2 can be closed to prevent the treated process gas from being supplied to the primary processing unit 2.

[0121] The heater supply conduit 37 is configured to supply the treated process gas from one (or both) of the first and second secondary adsorbers 32, 33 to the secondary regeneration heater 45. The heater supply conduit 37 forms a loop between the secondary process gas outlet 31 and the second outlet branch 44-2 of the secondary outlet valve system 39. The first end of the heater supply conduit 37 is connected to the second outlet branch 44-2 between the third and fourth secondary outlet control valves 43-3, 43-4; the second end of the heater supply conduit 37 is connected to the secondary process gas outlet 3144-2. A secondary regeneration control valve 49 is provided in the heater supply conduit 37 to control the supply of the treated process gas to the secondary regeneration heater 45. The supply of the treated process gas to the secondary regeneration heater 45 is controllable to facilitate the regeneration of the first and second secondary adsorbers 32, 33. Alternatively, the second end of the heater supply conduit 37 may be connected to other outlet branches (not shown) having similar configurations to the first outlet branch 44-1 or the second outlet branch 44-2, and the second end of the heater supply conduit 37 may be connected between two other outlet control valves, similar to the configuration in which the first end of the heater supply conduit 37 is connected to the second outlet branch 44-2. A fifth secondary outlet control valve 43-5 is selectively disposed in the third outlet branch 44-3 to establish fluid communication between the first and second secondary adsorbers 32, 33. The fifth secondary outlet control valve 43-5 is operated to control one of the first and second secondary adsorbers 32, 33 to be repressurized from the other of the first and second secondary adsorbers 32, 33. The secondary outlet valve system 39 may include any other arrangement of secondary outlet control valves 43-n configured to supply the treated process gas to the secondary regeneration heater 45 and to establish fluid communication between the first and second secondary adsorbers 32, 33.

[0122] The second heater controller 46 is configured to control the operation of the secondary regeneration heater 45. The second heater controller 46 may be integrated into the control unit 5, or may be a separate controller. The second heater controller 46 includes at least one electronic processor having at least one electrical input for receiving first and second secondary temperature signals from respective first and second secondary temperature sensors 47, 48. The first secondary temperature sensor 47 is configured to measure the first operating temperature T1 of the first secondary adsorber 32; the second secondary temperature sensor 48 is configured to measure the second operating temperature T2 of the second secondary adsorber 33.

[0123] The untreated (feed) process gas to the primary treatment unit 2 is supplied from the primary compressor 52, and after cooling to the summer peak temperature of 33.4°C, the delivery pressure is above the ambient pressure, preferably 15 bar. The regeneration of the primary treatment unit 2 is carried out using a low-energy temperature change method, and the pressure of the regeneration gas is reduced from the secondary treatment unit 3 operating at a feed pressure of 3 bar to just above the ambient pressure. The secondary treatment unit 3 is supplied with ambient air compressed by a dedicated secondary compressor 53. The air to the primary treatment unit 2 and the secondary treatment unit 3 is independently cooled to 5°C by a refrigeration cycle to reduce the water content. Energy-saving heat exchangers are used to reduce power consumption. The primary treatment unit 2 and the secondary treatment unit 3 are set to reduce the carbon dioxide (CO2) and water (H2O) content of the process gas. In this embodiment, the primary treatment unit 2 and the secondary treatment unit 3 sufficiently reduce the carbon dioxide (CO2) and water (H2O) content of the process gas to reduce or prevent freezing at low temperatures, such as in the cold end of the process implemented by the energy storage device.

[0124] The primary compressor 52 includes a primary aftercooler 54. The process gas is discharged from the primary aftercooler 54 and introduced into a primary cooler 55 (eg, Figure 4). The process gas is preferably saturated air and is first cooled in the economizer heat exchanger 56. This reduces the temperature of the process gas to about 17°C and causes some water vapor to condense. The process gas is then further cooled by the refrigerant in the refrigeration heat exchanger 57 to a temperature of about 5°C. The condensed water is separated using a lossless water separator / drain 58, where it can be discharged from the gas treatment unit 1 as waste, or recycled to another system co-located with the gas treatment unit 1. The cooled process gas is reheated by passing it back through the opposite side of the economizer heat exchanger 56. This reheats the process gas, which is then passed to the primary treatment unit 2. The economizer heat exchanger 56 and the refrigeration heat exchanger 57 condense most of the water from the air and are at a reduced temperature compared to that discharged from the primary aftercooler 54. The hot end temperature difference ΔT of the economizer heat exchanger 56 can be typically about 10°C. For example, the peak (summer) temperature of 33.4°C from the primary compressor 52 aftercooler results in a feed temperature of 23.4°C to the adsorption vessel 14-1. Therefore, the temperature of 23.4°C is the design temperature for the adsorption process performed by the primary treatment unit 2. If the efficiency of the economizer heat exchanger 56 is higher than expected and the temperature difference ΔT is less than 10°C, the refrigeration load will be saved. However, this may result in a higher temperature of the process gas supplied to the primary treatment unit 2. In this case, some of the process gas leaving the water separator / drain pipe 58 is bypassed around the economizer heat exchanger 56 to achieve the target process gas temperature of the primary treatment unit 2 (approximately 23.4°C in this embodiment). The bypass valve 66 is configured to controllably bypass the economizer heat exchanger 56. The temperature of the process gas leaving the economizer heat exchanger 56 can be measured by a temperature sensor 67 that communicates with a bypass controller 65, and the bypass controller 65 is configured to open and close the bypass valve 66. If the process gas temperature exceeds the target process gas temperature (e.g., 23.4°C), the bypass valve 66 can be opened by the bypass controller 65. If the process gas temperature is below the target operating temperature, the bypass valve 66 can be closed (or maintained in a closed state). Instead, the more efficient performance of the economizer heat exchanger 56 can be used to reduce the heat load on the refrigeration heat exchanger 57. The refrigeration circuit 59 of the refrigeration heat exchanger 57 is as follows: Figure 4 The refrigeration heat exchanger 57 is connected to the refrigerant liquid / vapor separation tank 60 , the refrigerant compressor 61 , the refrigerant bypass valve 62 , the air-cooled refrigerant condenser 63 and the expansion valve 64 .

[0125] If the temperature of the process gas supplied from the primary aftercooler 54 exceeds the target supply temperature (33.4°C in this embodiment), the bypass valve 66 is opened to maintain the process gas temperature to the primary processing unit 2 at the target operating temperature of 23.4°C. However, this may result in a temperature difference ΔT on the hot end of the economizer heat exchanger 56 greater than 10°C. This may result in an increased load on the refrigeration circuit 59. If the refrigeration load is limited, the available cooling can be used to condense water instead of cooling the temperature of the process gas to the target operating temperature for supply to the primary processing unit 2. If the refrigeration load is too high, this will be manifested as an increase in the air temperature after the water separator / drain pipe 58. The temperature of the process gas leaving the water separator / drain pipe 58 can be measured by a temperature sensor 68 that communicates with the bypass controller 65. The determination of the temperature increase can be used to manipulate the bypass controller 65 to close the bypass valve 66. A temperature set point for the bypass controller 65 can be defined, for example 7°C. If the temperature exceeds the temperature set point, the bypass controller 65 is configured to close the bypass valve 66.

[0126] The refrigeration circuit 59 evaporates the refrigerant in the refrigeration heat exchanger 57 to cool the process gas. The gaseous refrigerant is then compressed by the refrigerant compressor 61 before being cooled and condensed by the ambient air. The temperature of the refrigerant is then further reduced by isenthalpic flash expansion of the expansion valve 64 before being sent back to the refrigeration heat exchanger 57. The refrigerant bypass valve 62 is used to prevent overcooling by the refrigeration unit at low loads and to prevent possible freezing of water in the process gas in the refrigeration heat exchanger 57. In the event of a rapid drop in the process gas flow from the primary compressor 52, the refrigeration unit is feed-forward controlled to prevent overcooling and freezing of the water in the refrigeration heat exchanger 57.

[0127] The process gas from the primary cooler 55 is then sent to the primary treatment unit 2. As described above, the primary treatment unit 2 is a two-bed, low thermal energy adsorption process for removing water (H2O). Figure 1 As shown, the primary treatment unit 2 comprises first and second primary adsorbers 12, 13. In this embodiment, the primary treatment unit 2 is configured to reduce the water (H2O) content of the process gas to a dew point below -100°C and a time average carbon dioxide (CO2) of less than 0.1 ppb.

[0128] The first and second primary adsorbers 12, 13 of the primary treatment unit 2 have similar configurations. For simplicity, the configuration of the first primary adsorber 12 is described herein. It should be understood that the second primary adsorber 13 has substantially the same configuration. The process gas feed from the primary cooler 55 passes through one of the first and second primary adsorbers 12, 13, while the other of the first and second primary adsorbers 12 and 13 is regenerated. The first primary adsorber 12 includes a first primary adsorption bed 15-1 disposed in a first primary adsorption vessel 14-1. The second primary adsorber 13 includes a second primary adsorption bed 15-2 disposed in a second primary adsorption vessel 14-2. The first and second adsorption beds 15-1, 15-2 are primarily designed to remove water (H2O) and carbon dioxide (CO2) from the process gas. In practice, the first and second primary adsorbers 12, 13 may also at least partially remove other components, including one or more of the following Nox, Sox, HCl, C4+ hydrocarbons, and acetylene (C2H2). The packed bed layer and two in-bed sensors in the container 70 are exemplified as follows: Figure 3A and 3B The upward flow direction of the process gas through the first primary adsorber 12 during the process is shown by the continuous arrows; the downward flow direction of the regeneration gas through the first primary adsorber 12 is shown by the dashed arrows.

[0129] exist Figure 3A In the standard / default design shown, the first primary adsorption bed 15-1 includes at least one adsorbent layer. In this embodiment, the at least one adsorbent layer includes a first adsorbent layer 73 and a second adsorbent layer 74. The first adsorbent layer 73 includes beads of adsorbent material. The primary adsorption bed 15-1 may include other layers (not shown) of other materials such as ceramic beads. Ceramic beads may be disposed at the bottom of the first primary adsorption bed 15-1 to remove water droplets that may be present in the incoming air flow, preventing them from contacting the adsorbent and damaging the active material. Water droplets should not be present in normal operation because the upstream primary cooler 55 reduces the relative humidity of the air to significantly below 100%. However, if the gas treatment unit 1 is started under cold ambient conditions (e.g., below 5°C), water will condense out in the upstream piping before the operating temperature is reached, causing the water droplets to be transferred to the first primary adsorption bed 15-1.

[0130] In this embodiment, the first adsorbent layer 73 preferably comprises activated alumina. The main purpose of activated alumina is to remove water (H2O) from the process gas, typically down to a maximum dew point of -40°C. Activated alumina can also remove a portion of carbon dioxide (CO2) from the process gas, especially if an alkaline treatment is performed with potassium carbonate (K2CO3) or sodium carbonate (Na2CO3). Carbon dioxide (CO2) reacts with alkaline compounds in the presence of water (H2O) to convert carbonates into bicarbonates. The equation for the chemical reaction is as follows:

[0131]

[0132] This chemical reaction is reversible by applying heat during the regeneration process, allowing carbon dioxide (CO2) to separate from the alumina.

[0133] The drier process gas leaving the activated alumina layer in the first primary adsorption bed 15-1 passes through the second adsorbent layer 74. In the present embodiment, the second adsorbent layer 74 comprises a molecular sieve, such as a 13X molecular sieve, or consists of it. The molecular sieve will remove residual water, typically to a level below the dew point of -100°C. The size of the molecular sieve is preferably to remove carbon dioxide (CO2) to a time average breakthrough of 100 ppb (0.1 ppm), with a peak concentration not exceeding 1 ppm. Carbon dioxide (CO2) leaves the molecular sieve exponentially over time.

[0134] One or more temperature sensors 77A may be provided in each of the first and second primary adsorption beds 15-1, 15-2. Each temperature sensor may output a temperature signal to the electronic control unit 5 to facilitate control of the regeneration process. The one or more temperature sensors 77A may be located in any one of the at least one adsorbent layer. Figure 3A In the illustrated embodiment, a first temperature sensor 77A is located within the first adsorbent layer 73 to measure the operating temperature of the process gas. In this embodiment, the first temperature sensor 77A is a thermocouple. By measuring the operating temperature in the first adsorbent layer 73, the implementation of a low energy regeneration cycle is facilitated. The first temperature sensor 77A may be spaced from the bottom of the first adsorbent layer 73, for example, placed about 100 mm above the bottom of the alumina layer. The first temperature sensor 77A is preferably inserted radially from the side wall of the container 14-1, for example, about 300 mm from the side wall. The first temperature sensor 77A is configured to enable in-bed measurement of the operating temperature of the first primary adsorbent bed 15-1. Alternatively or additionally, a temperature sensor may be provided at the top of the first primary adsorbent bed 15-1 to measure the temperature of the regeneration gas as it enters the adsorbent, rather than just after the primary regeneration heater 25. This helps determine the amount of heat loss between the heater and the adsorbent bed. Figure 3BIn the illustrated embodiment, the second temperature sensor 77B is disposed at the interface between the first and second adsorbent layers 73, 74. In the present embodiment, the second temperature sensor 77B is radially inserted from the side wall of the container 14-1, for example, about 300 mm from the side wall. In the present embodiment, the second temperature sensor 77B is a thermocouple. The second temperature sensor 77B is capable of determining the amount of heat used to remove carbon dioxide (CO2) and the remaining amount of heat for desorbing water (H2O) from the activated alumina. The third temperature sensor 77C is disposed in the second adsorbent layer 74. In the illustrated arrangement, the third temperature sensor 77C is disposed on top of the second adsorbent layer 74.

[0135] Each of the first and second primary adsorbers 12, 13 may optionally include at least one carbon dioxide (CO2) sensor 77D; and / or at least one water (moisture) H2O sensor 77D. The carbon dioxide (CO2) sensor and / or the water (H2O) sensor 77D may be disposed in the first adsorbent layer 73. Alternatively or additionally, the carbon dioxide (CO2) sensor and / or the water (H2O) sensor 77D may be disposed in the second adsorbent layer 74. In use, the sensor 77D may monitor the water (H2O) and / or carbon dioxide (CO2) content in the process gas within the first primary adsorbent bed 15-1. One or more sensors 77D may be placed in the second adsorbent layer 74 below the top of the second adsorbent layer 74, for example, 100 mm below the top of the second adsorbent layer. The one or more sensors 77D may be configured to monitor carbon dioxide (CO2) in the second adsorbent layer 74, for example, to determine how close carbon dioxide (CO2) is to penetrating the first primary adsorbent bed 15-1 before it actually occurs. One of the sensors 77D may sample the process gas near the sidewall to check for carbon dioxide (CO2) being directed along the side of the vessel, and another sensor may be located at a position spaced apart from the sidewall, for example 300 mm inside the sidewall, to measure the bulk of the process gas. A similar set of sensors 77D may be provided in the first adsorbent layer 73, for example 100 mm below the top of the first adsorbent layer 73, to allow monitoring of water (H2O) and / or carbon dioxide (CO2) passing through the first adsorbent layer 73. Alternatively or additionally, a carbon dioxide (CO2) sensor 77D and / or at least one water (moisture) H2O sensor 77D may be provided at the interface between the first and second adsorbent layers 73, 74. In this embodiment, the configuration of the sensors 77D is at least substantially the same in the first and second primary adsorbers 12, 13. It should be understood that the configuration of the sensors 77D may be different in the first and second primary adsorbers 12, 13.

[0136] Each of the first and second primary adsorbers 12, 13 is sized for a feed time of 6 hours, followed by regeneration to remove adsorbed water (H2O) and carbon dioxide (CO2). The first and second primary adsorbers 12, 13 can be sized for different feed times, which can be longer or shorter than 6 hours. It should be understood that feed times less than or greater than 6 hours can be implemented. Regeneration is achieved by opening and closing the primary inlet control valve 20-n in the primary inlet valve system 16 and opening and closing the primary outlet control valve 23-n in the primary outlet valve system 19. As described herein, the first and second primary adsorption beds 12, 13 undergo multiple operating steps. In this embodiment, the operating steps include: feeding, depressurizing, heating, cooling, and re-pressurizing. A heating process is performed to regenerate the first primary adsorption bed 15-1. These processes are implemented by the first and second primary adsorption beds 12, 13. In order to enable continuous operation of the gas processing device 1, the first and second primary adsorption beds 12, 13 are operated in different cycles. Specifically, when one of the first and second primary adsorption beds 12, 13 is operated during the feed process, the other of the first and second primary adsorption beds 12, 13 is regenerated. The different operating cycles of the first and second primary adsorption beds 12, 13 are referred to herein as first and second operating modes.

[0137] The gas treatment unit 1 operates in first and second operation modes. The gas treatment unit 1 cycles between the first and second operation modes. In particular, one of the first and second primary adsorption beds 15-1, 15-2 is configured to treat process gas while the other of the first and second primary adsorption beds 15-1, 15-2 is regenerated.

[0138] When operating in the first operation mode, the first primary adsorption bed 15-1 operates in a feed process and is supplied with untreated (feed) process gas from the primary process gas inlet 10. The first primary adsorption bed 15-1 discharges the treated process gas to the primary process gas outlet 11. In the first operation mode, the second primary adsorption bed 15-2 is connected to the secondary process gas outlet 31 to receive the treated process gas from the secondary treatment unit 3. The process gas from the secondary treatment unit 3 is supplied to the primary treatment unit 2 to regenerate the second primary adsorber 15-2. The process gas supplied from the secondary treatment unit 3 may be optionally heated by the primary regeneration heater 25.

[0139] When operating in the second operation mode, the second primary adsorption bed 15-2 is operated in the feed process and is supplied with untreated (feed) process gas from the primary process gas inlet 10. The second primary adsorption bed 15-2 discharges the treated process gas to the primary process gas outlet 11. In the second operation mode, the first primary adsorption bed 15-1 is connected to the secondary process gas outlet 31 to receive the treated process gas from the secondary treatment unit 3. The process gas from the secondary treatment unit 3 is supplied to the primary treatment unit 2 to regenerate the first primary adsorber 15-1. The process gas supplied from the secondary treatment unit 3 may be optionally heated by the primary regeneration heater 25.

[0140] In order to realize the cycle process through the first and second primary adsorbers 12, 13, the total time of all other operating steps is preferably the same as or shorter than the feed time for treating the process gas. In this embodiment, the following operating time is defined for each operating step:

[0141] Feeding: 360 minutes

[0142] Decompression: 30 minutes

[0143] Heating: 40 minutes

[0144] Cooling: 260 minutes

[0145] Re-pressurization: 30 minutes

[0146] The above operating times are provided as examples only. It should be understood that different operating times may be applied to one or more operating processes. For example, different operating times may be implemented for first and second stage adsorbers 12, 13 having different capacities.

[0147] The various operating steps will now be described with respect to the first primary adsorption bed 12. It should be understood that similar operating steps are performed with the second primary adsorption bed 13.

[0148] During the feeding step, the process gas is passed upwardly through the first primary adsorption bed 15-1 to remove unwanted contaminants. The treated process gas is then sent to the downstream process unit. In the first operating mode, the feeding step is performed by the first primary adsorption bed 15-1. In the second operating mode, the feeding step is performed by the second primary adsorption bed 15-2.

[0149] exist Figure 5 In the configuration of the gas treatment plant 1 shown, the second primary adsorber 13 performs a feed step to treat the process gas. The flow of the process gas during this step is as follows: Figure 5 The gas processing device 1 is configured to control the primary inlet control valve 20-n and the primary outlet control valve 23-n to control the flow of the process gas. Figure 5In the arrangement shown, the second primary inlet control valve 20-2 and the second primary outlet control valve 23-2 are open; the fourth and sixth primary inlet control valves 20-4, 20-6 and the fourth primary outlet control valve 23-4 are closed. As described herein, the fifth primary outlet control valve 23-5 can be selectively opened to supply treated process gas to the first primary adsorber 12, thereby repressurizing the first primary adsorber 12. The primary process gas inlet 10 is connected to the second primary adsorber 13. In particular, the primary inlet valve system 16 is configured to supply untreated (feed) process gas to the second primary adsorber 13. The second primary adsorber 13 is in fluid communication with the primary process gas inlet 10. In use, untreated (feed) process gas is supplied from the primary process gas inlet 10 and passes through the second primary adsorption bed 15-2 to remove water (H2O) and carbon dioxide (CO2). The treated process gas is discharged from the second primary adsorber 13 to the primary process gas outlet 11. The second primary adsorber 13 is in fluid communication with the primary process gas outlet 11.

[0150] The primary outlet valve system 19 can be selectively configured to connect the second primary adsorber 13 to the primary process gas outlet 11. The flow of the treated process gas from the second primary adsorber 13 to the first primary adsorber 12 is Figure 5 denoted by a thick dashed (broken) line. For example, the treated process gas may be at least partially supplied to the first primary adsorber 12 to repressurize the first primary adsorber vessel 14-1 (e.g., after regeneration of the first primary adsorber bed 15-1). The first primary adsorber 12 is fluidly connected to the second primary adsorber 13. The primary inlet valve system 16 is configured to close the inlet of the second primary adsorber 13. The primary outlet valve system 19 opens the fifth primary outlet control valve 23-5 to enable the third branch 24-3 to be used as a repressurization conduit. A portion of the treated process gas discharged from the second primary adsorber 13 is introduced into the first primary adsorber 12. The treated process gas at least partially repressurizes the first primary adsorber 14-1. The fifth primary outlet control valve 23-5 may be configured to control the proportion of the treated process gas discharged from the first primary adsorber 12 to each of the primary process gas outlet 11 and the second primary adsorber 12. The fifth primary outlet control valve 23-5 may be a variable flow control valve or a proportional control valve to control the supply of the treated process gas. The treated process gas supplied to the first primary adsorber 12 may be controlled independently of the operation of the second primary adsorber 13 to treat the process gas.

[0151] Alternatively or additionally, the first primary adsorber vessel 14-1 may be at least partially re-pressurized using regeneration gas from the secondary treatment unit 3. The outlet of the first primary adsorber 12 may be closed, and regeneration gas from the secondary treatment unit 3 may be at least partially supplied to re-pressurize the first primary adsorber vessel 14-1. In the present embodiment, the outlet of the first primary adsorber 13 may be closed by closing the first, third and fifth primary inlet control valves 20-1, 20-3, 20-5. Other valve configurations may be used to close the outlet of the first primary adsorber 12. Alternatively or additionally, the primary compressor 52 may supply untreated (feed) process gas to re-pressurize the first primary adsorber vessel 34-1.

[0152] The carbon dioxide (CO2) analyzer 78 monitors the concentration of carbon dioxide (CO2) in the primary process gas outlet 11. The carbon dioxide (CO2) analyzer 78 is configured to detect whether the carbon dioxide (CO2) content of the processed process gas is greater than a predetermined carbon dioxide (CO2) threshold. The preferred carbon dioxide (CO2) threshold in this embodiment is limited to 1ppm to prevent freezing in downstream equipment. The carbon dioxide (CO2) analyzer 78 can be optionally configured to alarm if the detected carbon dioxide (CO2) is 0.2ppm and / or 0.5ppm. Standard air separation unit (ASU) CO2 analyzers are usually calibrated for operation in the ppm range, with a detection limit close to 0.2ppm. The carbon dioxide (CO2) analyzer 78 can be optionally configured to measure carbon dioxide (CO2) in the oxygen O2 tank, where carbon dioxide (CO2) is concentrated to a level that is more easily detected by a ppm analyzer. In this embodiment, the carbon dioxide (CO2) analyzer 78 is a ppb analyzer for accurately measuring the concentration of interest. The carbon dioxide (CO2) analyzer 78 may optionally be placed in a temperature controlled cabinet to reduce variations due to ambient temperature variations. The nitrogen (N2) zero point gas used for the carbon dioxide (CO2) analyzer 78 should contain carbon dioxide (CO2) as close to zero as possible. A similar carbon dioxide (CO2) analyzer 79 may be used to monitor the concentration of carbon dioxide (CO2) in the secondary process gas outlet 31.

[0153] A water (H2O) analyzer may optionally be provided in the primary process gas outlet 11. However, if carbon dioxide (CO2) has been removed, the treated process gas is typically too dry for a dew point reading to be meaningful. Therefore, it is not necessary to provide a water (H2O) analyzer.

[0154] In one variation, the feed process can continue until carbon dioxide (CO2) breakthrough is detected. However, accurate monitoring is preferred to avoid feeding water (H2O) into the second adsorbent layer 74 (comprising molecular sieves) before CO2 breakthrough. This helps avoid removing water (H2O) from the second adsorbent layer 74, which may be difficult.

[0155] The primary treatment unit 2 is switched from the second operation mode to the first operation mode. The first primary adsorber 12 performs a feed step to treat the process gas, wherein the untreated (feed) process gas is supplied to the first primary adsorption bed 15-1. The flow of the process gas during this step is as follows: Figure 6 The gas processing device 1 is configured to control the primary inlet control valve 20-n and the primary outlet control valve 23-n to control the flow of the process gas. Figure 6 In the arrangement shown, the first primary inlet control valve 20-1 and the first primary outlet control valve 23-1 are open; the third and fifth primary inlet control valves 20-3, 20-5 and the third primary outlet control valve 23-3 are closed. As described herein, the fifth primary outlet control valve 23-5 can be opened to selectively supply treated process gas to the second primary adsorber 13. Figure 6 As shown, the primary process gas inlet 10 is connected to the first primary adsorber 12. The primary inlet valve system 16 is configured to supply untreated (feed) process gas to the first primary adsorber 12. The first primary adsorber 12 is in fluid communication with the primary process gas inlet 10. In use, the untreated (feed) process gas is supplied from the primary process gas inlet 10 and is treated by the first primary adsorption bed 15-1 to remove water (H2O) and carbon dioxide (CO2). The treated process gas is discharged from the first primary adsorber 12 to the primary process gas outlet 11.

[0156] When the first primary adsorption bed 15-1 is activated to treat the process gas, the second primary adsorption bed 15-2 is regenerated. The second primary adsorber 13 is first depressurized in a depressurization step, preferably to atmospheric pressure. The flow of the process gas during this step is as follows: Figure 6 As shown by the thick solid line in . In this embodiment, the decompression is performed within 30 minutes and the gas is discharged to the atmosphere. The third and fourth primary inlet control valves 20-3, 20-4 are controlled to connect the second primary adsorber 13 to the primary process gas discharge port 22. The discharged gas may have slightly less O2 compared to air because the second primary adsorption bed 15-2 preferentially adsorbs a small amount of N2 released during the decompression step. Alternatively, the discharged gas can be captured and stored or used by another system in the same location as the gas processing unit 1.

[0157] like Figure 7As shown, the second primary adsorbent bed 15-2 is then regenerated in a regeneration step. The flow of process gas during this step is as follows: Figure 7 The gas processing device 1 is configured to control the primary inlet control valve 20-n and the primary outlet control valve 23-n to control the flow of the process gas. Figure 7 In the arrangement shown, the sixth primary inlet control valve 20-6 and the fourth primary outlet control valve 23-4 are open; the second and fourth primary inlet control valves 20-2, 20-4 and the second and fifth primary outlet control valves 23-2, 23-5 are closed. Regeneration gas is supplied to the second primary adsorption bed 15-2 from the secondary treatment unit 3. The regeneration gas in this embodiment is a treated process gas. As described herein, the treated process gas includes air that has been treated to remove water (H2O) and carbon dioxide (CO2). The third and fourth primary outlet control valves 23-3, 23-4 are configured to connect the regeneration gas supply conduit 4 to the second primary adsorber 13 fluid. The second primary adsorber 13 remains in fluid communication with the primary process gas discharge port 22. The regeneration gas is a process gas that has been treated by the secondary treatment unit 3. The regeneration gas is substantially free of carbon dioxide (CO2) and water (H2O). The regeneration gas passes through the primary regeneration heater 25 and is heated to a predetermined target temperature. In this embodiment, the target temperature is 230°C, although this is set by the specific design of the system and may vary depending on the system design. The heating of the regeneration gas is performed in the heating step. The heated regeneration gas flows through the depressurized first primary adsorption bed 15-1, desorbs water (H2O) and carbon dioxide (CO2) from the second primary adsorption bed 15-2, and is discharged through the primary process gas discharge port 22. The primary process gas discharge port 22 is preferably far away from the inlet of the primary compressor 52 and the secondary compressor 53, because carbon dioxide (CO2) is concentrated in the discharged regeneration gas and it is not desirable to send it back to the gas processing device 1. Alternatively, the discharged gas can be captured and stored or used by another system located at the same location as the gas processing device 1. Figure 7 As shown, the gas treatment device 1 is configured so that the first primary adsorber 12 is operable to treat the untreated (feed) process gas supplied to the primary process gas inlet 10, while the second primary adsorber 13 is regenerated. The treated process gas from the first primary adsorber 12 is discharged from the first primary adsorber 12 to the primary process gas outlet 11.

[0158] The temperature at the outlet of the primary regeneration heater 25 is monitored and the electrical heat input is varied to maintain a target temperature of 230°C. Temperature measurements are taken on the heater housing to ensure that local overheating does not occur. The flow rate of the treated process gas from the secondary treatment unit 3 may be monitored and the power to the primary regeneration heater 25 reduced or inhibited if the flow rate is below a lower flow rate threshold.

[0159] The regeneration of the first and second primary adsorbent beds 15-1, 15-2 in this embodiment is performed in a co-current direction because the heating causes an increase in the concentration of water (H2O) in the regeneration gas. The water (H2O) can condense by cooling at the outlet vessel head. By regenerating in a co-current direction, this condensed water is pushed toward the primary process gas discharge port 22. In a counter-current arrangement, the condensed water may fall back onto the adsorbent, which may cause material degradation problems due to contact with liquid water. Using co-current regeneration can reduce or ameliorate these problems.

[0160] After approximately 40 minutes, the primary regeneration heater 25 is turned off. However, the regeneration gas continues to be supplied to the second primary adsorption bed 15-2 through the primary regeneration heater 25. This allows the waste heat in the primary regeneration heater 25 and the pipeline to be pushed into the first primary adsorber 12. After the primary regeneration heater 25 cools down, the supply of regeneration gas continues to push heat downward through the second primary adsorption bed 15-2 and continues to remove water (H2O) and carbon dioxide (CO2). About 260 minutes after the primary regeneration heater 25 is turned off, the supply of regeneration gas from the secondary treatment unit 3 is stopped. This signal indicates the end of the cooling step.

[0161] The regeneration of each of the first and second primary adsorption beds 15-1, 15-2 may be performed independently of the operation of the other of the first and second primary adsorption beds 15-1, 15-2. In at least some embodiments, the regeneration of the first primary adsorption bed 15-1 may be performed while the second primary adsorption bed 15-2 is operating to process (untreated) process gas supplied from the primary process gas inlet 10. Likewise, the regeneration of the second primary adsorption bed 15-2 may be performed while the first primary adsorption bed 15-1 is operating to process (untreated) process gas supplied from the primary process gas inlet 10.

[0162] like Figure 8 As shown, the second primary adsorption vessel 14-2 is then re-pressurized in a re-pressurization step. The flow of process gas during this step is as follows: Figure 8 The gas processing device 1 is configured to control the primary inlet control valve 20-n and the primary outlet control valve 23-n to control the flow of the process gas. Figure 8In the arrangement shown, the first primary inlet control valve 20-1 and the first and fifth primary outlet control valves 23-1, 23-5 are open. The second, third, fourth, fifth and sixth primary inlet control valves 20-2, 20-3, 20-4, 20-5, 20-6 and the second, third and fourth primary outlet control valves 23-2, 23-3, 23-4 are closed. Repressurization of the second primary adsorption vessel 14-2 can be performed, for example, over a period of about 30 minutes. Repressurization in this embodiment includes supplying a portion of the treated process gas discharged from the first primary adsorber 12 to the second primary adsorber 13. In particular, a portion of the treated process gas discharged from the first primary adsorption vessel 14-1 is supplied to the second primary adsorption vessel 14-2. The fifth primary outlet control valve 23-5 is opened to supply a portion of the treated process gas from the first primary adsorption vessel 14-1 to the second primary adsorption vessel 14-2. The fifth primary inlet control valve 23-5 can be configured to control the proportion of the treated process gas discharged from the first primary adsorber 12 to each of the primary process gas outlet 11 and the second primary adsorber 12. The fifth primary outlet control valve 23-5 can be a variable flow control valve or a proportional control valve to control the supply of treated process gas. Alternatively, a restrictor can be provided to control the supply of treated process gas. In this embodiment, the first primary adsorption vessel 14-1 is re-pressurized from the top by downward flow. In a variation, re-pressurization can be performed from the bottom by upward flow.

[0163] Alternatively or additionally, the second primary adsorber 14-2 may be at least partially re-pressurized using regeneration gas from the secondary treatment unit 3. The outlet of the second primary adsorber 13 may be closed, and regeneration gas from the secondary treatment unit 3 may be at least partially supplied to re-pressurize the second primary adsorber 14-2. Alternatively or additionally, the primary compressor 52 may supply untreated (feed) process gas to re-pressurize the second primary adsorber 34-2. In the present embodiment, the outlet of the second primary adsorber 13 may be closed by closing the second, fourth and sixth primary inlet control valves 20-2, 20-4, 20-6. Other valve configurations may be used to close the outlet of the second primary adsorber 13. Alternatively or additionally, the primary compressor 52 may supply untreated (feed) process gas to re-pressurize the second primary adsorber 34-2.

[0164] After the pressure in the container 14-1 is at least substantially equal to the pressure in the primary process gas inlet 10 supplied from the primary compressor 52, the primary treatment unit 2 can be switched from the first operating mode to the second operating mode. The first and second primary adsorbers 12, 13 are switched so that the process gas is treated by the second primary adsorber 13. Then, the first primary adsorber 12 can be regenerated. In this example, the previously fed first primary adsorber 12 is regenerated starting from a reduced pressure. The fed second primary adsorption bed 15-2 is roughly balanced in pressure with the process gas supplied to the primary process gas inlet 10. If the pressure is not balanced, the process gas will suddenly rush in when the primary inlet valve system 16 is reconfigured to supply process gas from the primary compressor 52. This sudden change may cause the adsorbent to "rush" into the air. This may cause wear and dust formation, resulting in higher pressure drop and loss of adsorber performance. Before opening the primary inlet valve system 16, the controller can check whether the pressure difference between the two beds is small enough. The pressure differential check is performed on the feed inlet ends of the first and second primary adsorption vessels 14-1, 14-2 because this is where the pressure differential is greatest.

[0165] The primary inlet control valves 20-n in this embodiment are three-rod valves that cannot open if a large pressure differential exists across them. If a large pressure differential still exists between the feed process gas and the re-pressurized first primary adsorption bed 15-1, this physically prevents the valve from opening. Additional bypass valves may be provided to pressurize the first primary adsorption bed 15-1 at startup. Other types of valves may be used for the primary inlet control valves 20-n.

[0166] The second primary adsorption bed 15-2 is balanced at the process gas supply end. Due to the gas flow through the first primary adsorption bed 15-1, there is a pressure drop on the first primary adsorption bed 15-1 during feeding, and the pressure drop on the second primary adsorption bed 15-2 during re-pressurization is essentially zero. Therefore, although the product (output) end pressures of the first and second primary adsorption beds 15-1 and 15-2 are equal at the end of re-pressurization, the pressures at the feed (input) end will not be equal. If the pressure drop on the first primary adsorption bed 15-2 during feeding is too large (for example> 200 mbar), the feed inlet pressure will be higher than the pressure of the re-pressurized adsorption bed. This may mean that the pressure drop on the primary inlet control valve 20-n at the feed end of the second primary adsorption bed 15-2 is too large. This may prevent the three-rod valve from opening. The pressure drop on the adsorption bed remains less than the pressure difference threshold, which defines the upper limit value at which the three-rod valve can be opened. In operation, the bypass valve around the three-rod valve on the feed side can be manually opened to reduce the pressure difference and allow the three-rod valve to open.

[0167] Closing of the valve on the current feed first primary adsorption bed 15-1 will not be initiated until it is determined that the valve on the feed second primary adsorption bed 15-2 is fully open. This is to prevent a lack of continuity of flow from the primary compressor 52 through the process.

[0168] The total heating and cooling time during the above-mentioned regeneration step is preferably specified as 5 hours, but the heating time can vary in operation. The cooling time can be appropriately changed to maintain a total regeneration time of 5 hours. The heating time is preferably specified so that a peak temperature of 70°C is reached at the first temperature sensor 77A in the bed during the regeneration step. The heating time is calculated based on the amount of water (H2O) and carbon dioxide (CO2) entering the container 14-1 during the feed step and a feedback loop related to the peak temperature at this location on the previous regeneration cycle. If the concentrations of water (H2O) and carbon dioxide (CO2) in the feed do not change much, measuring the cumulative amount of process gas supplied to the first primary adsorption bed 15-1 during the feed step before regeneration can fully indicate the amount of contaminants in the container 14-1. The heating time is calculated as follows:

[0169] Heating time = f (previous peak temperature in the bed) × feed time × feed flow rate

[0170] The f factor is the output of a proportional-integral controller which monitors the previous peak bed temperature of the vessel 14-1 and has a set value of 70°C.

[0171] A first curve 100 of simulated temperature within the first primary adsorption bed 15-1 during regeneration is as follows: Fig. 9As shown. The first curve 105 represents the temperature at the top of the first primary adsorption bed 15-1 measured by the temperature sensor 77C (after heat loss from the heater to the pipeline). The second curve 110 represents the temperature at the interface between the first and second adsorbent layers 73, 74 measured by the temperature sensor 77B. The third curve 115 represents the in-bed temperature in the first adsorbent layer 73 (measured by the first temperature sensor 77A at 100 mm from the bottom of the first adsorbent layer 73). The fourth curve 120 represents the outlet temperature of the first primary adsorption bed 15-1. The heat pulse passes through the first primary adsorption bed 15-1, and its temperature decreases as energy is consumed by desorption of carbon dioxide (CO2) and water (H2O). At the outlet / bottom of the first primary adsorption bed 15-1, the maximum temperature reaches 45°C, indicating that a large part of the heat provided by the primary regeneration heater 25 is used for regeneration of the adsorbent in the first primary adsorption bed 15-1, and almost none of it is discharged and wasted. It should be understood that this form of operation of the first adsorbent bed 15-1 means that during regeneration, not all of the water (H2O) is removed from the adsorber agent (activated alumina) in a manner similar to a pressure swing adsorption process. However, by maintaining the same peak temperature at the temperature location within the bed at each regeneration, long-term accumulation of water in the first primary adsorbent bed 15-1 can be reduced and a steady state can be achieved.

[0172] By selecting different in-bed peak temperature set points, the amount of water remaining on the first primary adsorbent bed 15-1 at the end of each cycle can be varied. Higher values ​​will result in more energy input to the system and less water on the first primary adsorbent bed 15-1 at the end of regeneration. Lower values ​​will result in less energy input and more water on the bed.

[0173] As described herein, the repressurization of the first primary adsorption bed 15-1 uses a portion of the treated process gas discharged from the second primary adsorption bed 15-2 during the feed step, such as Figure 5As shown, this means that the flow through the primary process gas outlet 11 to the process cold end temporarily decreases. When the flow through the fifth primary outlet control valve 23-5 is blocked, the gas flow rate of the repressurized first primary adsorption bed 15-1 is the highest at the beginning of repressurization. For example, a flow rate of about 1700 Nm3 / h is equivalent to about 2.4% of the process gas flow rate. During the duration of the repressurization step (about 30 minutes in this embodiment), the cumulative loss of the treated process gas is about 1.8%, which is equivalent to a loss of 0.15% compared to the amount of treated process gas produced during the entire cycle. In addition to consuming the treated process gas, the repressurization step also causes a significant increase in the temperature of the second adsorbent layer 74 (which can be composed of molecular sieves). This is due to the adsorption of N2 and O2 during the repressurization step, releasing heat into the bed. A parallel step can be optionally used, in which both the first and second adsorption beds 15-1, 15-2 are put into feed for a period of time to reduce the temperature changes in the combined treated process gas. For example, the parallel feed step can be carried out for 40 minutes to reduce temperature changes. A possible disadvantage of adding parallel steps is that it may reduce the time available for heating and cooling, which may require higher regeneration flows and therefore a larger secondary treatment unit 3. The gas treatment plant 1 in this embodiment is operated without a parallel feed step for the first and second adsorption beds 15-1, 15-2.

[0174] In the repressurization step, nitrogen N2 in the repressurized gas is adsorbed in preference to oxygen O2. This means that in the subsequent feed step, the treated process gas contains a higher concentration of oxygen O2 than air. The oxygen O2 and nitrogen N2 concentrations stabilize over a period of time, e.g. 20 minutes, during which the molecular sieve cools down after repressurization. This results in some additional nitrogen N2 in the feed gas being adsorbed, so that during this period, the concentration of oxygen O2 in the treated process gas is slightly higher than that of the untreated process gas.

[0175] Each thermal regeneration of the adsorbent causes some of the activated alumina in the first adsorbent layer 73 to transform from its base state of alumina to aluminum hydroxide. The chemical equation is as follows:

[0176]

[0177] The reaction favors the formation of aluminum hydroxide at low temperatures, but is kinetically limited. Only during the regeneration step, when the temperature of the first primary adsorption bed 15-1 is raised to well above the feed temperature of the process gas, does the reaction rate become appreciable. The water absorption capacity of aluminum hydroxide is zero, thus resulting in a degradation of performance. It is possible to convert aluminum hydroxide back to alumina, but this requires temperatures of 400°C to 600°C, far higher than can be practically achieved in the field. Therefore, the conversion to aluminum hydroxide should be considered irreversible, and if the process is run long enough, all the active alumina will eventually be lost in this way.

[0178] The design of the first and second adsorbent beds 15-1, 15-2 relies on placing large amounts of additional activated alumina into the first adsorbent layer 73 without taking into account the "aging" of the material over time. This reduces the number of material changes required, but it should be anticipated that reloading of the adsorbent will be required at some point in the life of the process.

[0179] Depending on the cycle design of the regeneration process, the degradation rate of activated alumina can be reduced by operating at low regeneration temperatures in the alumina layer under thermal drive. Operating at higher regeneration temperatures or longer heating times will accelerate the aging of the adsorbent and should be avoided unless it is to eliminate excessive CO2 breakthrough.

[0180] If used only to remove carbon dioxide (CO2) without exposure to water, the second adsorbent layer 74 containing the molecular sieve will not generally age over time. Nitrogen (N2), oxygen (O2) and carbon dioxide (CO2) are unlikely to damage the structure of the molecular sieve, even under heating. If water from the first adsorbent layer 73 begins to penetrate in large quantities, the performance of the molecular sieve will deteriorate. Water (H2O) is preferentially adsorbed, which means that the molecular sieve has a lower ability to adsorb CO2, reducing the amount that can be absorbed from the feed gas and shortening the breakthrough time.

[0181] During each regeneration cycle, thermal regeneration removes water from the molecular sieve of the second adsorbent layer 74, but if the amount of water is large, using a low energy cycle means that many regeneration cycles are required to remove all the water. Operating with extended heating times can help in this regard and eventually restore the full capacity of the molecular sieve to remove carbon dioxide.

[0182] The gas treatment device 1 can be configured to operate continuously. During the feeding step, one of the first and second adsorption beds 15-1, 15-2 is supplied with untreated (feed) process gas for 6 hours; the other of the first and second adsorption beds 15-1, 15-2 is regenerated. After every 6 hours, the first and second adsorption beds 15-1, 15-2 are switched and the process starts again.

[0183] The gas treatment device 1 can be configured for intermittent operation. The primary treatment unit 2 and / or the secondary treatment unit 3 can be operated intermittently. At least in some embodiments, the primary treatment unit 2 or the secondary treatment unit 3 can be operated independently of each other. When the primary treatment unit 2 is not in operation (e.g., offline), the secondary treatment unit 3 can continue to operate, such as supplying regeneration gas to regenerate the first primary adsorption bed 15-1 and / or the second primary adsorption bed 15-2, independent of whether the other adsorption bed undergoes a feeding, repressurization or decompression step. When one of the first and second adsorption beds 15-1, 15-2 is at operating pressure, the adsorption process can be stopped. Mass transfer can be performed through the adsorption bed by diffusion of water (H2O) and carbon dioxide (CO2). If the adsorption bed is kept under pressure, the diffusion of water (H2O) and carbon dioxide (CO2) may be relatively small. After the return pipeline, the total feed time that can be achieved may be close to the 6-hour design time described herein. Therefore, assuming that when the liquid air energy storage device is shut down and returns to the pipeline without causing adsorbent to surge, the feed primary adsorption bed 15-1 will be sealed, and intermittent operation can be carried out with negligible impact on the performance of the feed process.

[0184] For the regeneration step, the heating and cooling steps are preferably continued after they have been initiated. If the regeneration step is paused, the heat pulse within the first primary adsorbent bed 15-1 will disperse, particularly causing water (H2O) to desorb and migrate to where it can be re-adsorbed, and may cause problems. For example, water (H2O) may be adsorbed in the second adsorbent layer 74. Low pressure and high temperature mean that diffusion rates are high, and due to the low adsorbent capacity, there is little to stop the movement of components around the bed. Keeping the activated alumina in contact with water and high temperatures for a long time may also induce hydrothermal aging of the adsorbent.

[0185] Maintaining the first primary adsorbent bed 15-1 during regeneration allows the heat energy to be dissipated through heat losses to the walls of vessel 14-1. Then, when regeneration is restarted, the cold regeneration gas may not be able to achieve the desired removal of carbon dioxide (CO2) and water (H2O), thereby greatly shortening the possible feed time when vessel 14-1 is restarted.

[0186] Since the regeneration gas for the primary treatment unit 2 comes from the independent secondary treatment unit 3, the regeneration step does not have to be stopped when the primary compressor 52 is shut down. Therefore, the regeneration step can be continuously operated even when the main process is stopped. One of the first and second adsorption beds 15-1, 15-2 may well complete regeneration before the other of the first and second adsorption beds 15-1, 15-2 in the feed completes the feeding process. The regenerated bed should preferably be repressurized as soon as possible. The repressurized bed can be used for operation to facilitate the switching of the first and second adsorption beds 15-1, 15-2, for example when carbon dioxide (CO2) diffusion is detected. Preferably, the first and second adsorption beds 15-1, 15-2 are not switched until one of the first and second primary adsorption beds 15-1, 15-2 in the feed has been activated for a cumulative operation of 6 hours, or until CO2 breakthrough occurs. In this way, the activated primary adsorption bed 15-1 is fully utilized before a regeneration cycle is required.

[0187] The regeneration gas for regenerating the first and second adsorption beds 15-1, 15-2 in the primary treatment unit 2 is supplied from the secondary treatment unit 3, which produces a treated process gas that is dry and substantially free of carbon dioxide CO2. In this embodiment, the regeneration gas for regenerating the first and second adsorption beds 15-1, 15-2 is supplied only from the secondary treatment unit 3. In a variation, a portion of the regeneration gas may be supplied from an alternative source. Figure 1 As shown, the secondary treatment unit 3 is supplied with untreated (feed) process gas by a secondary compressor 53. The secondary compressor 53 may include a two-stage compression package unit, using cooling water and ambient air for intercooling and aftercooling. The secondary compressor 53 compresses the ambient air to 3.5 bar at the outlet of the aftercooler 80. Since the regeneration gas flow required for the primary treatment unit 2 is not continuous, the secondary compressor 53 is configured to effectively reduce to zero flow to save electricity. The change in the regeneration gas flow is not only because the primary treatment unit 2 is intermittently operated, but also because the regeneration gas is only supplied intermittently, for example 300 minutes every 360 minutes. The remaining time (60 minutes in this embodiment) is used for decompression and re-pressurization of the first and second adsorption beds 15-1, 15-2 in the primary treatment unit 2.

[0188] The secondary processing unit 3 includes a secondary cooler 81 for receiving untreated (feed) process gas supplied from the secondary compressor 53 to the secondary process gas inlet 30. The secondary cooler 81 can be effectively equivalent to the cooler 55 of the primary processing unit 2 described above. More than one secondary cooler 81 can be provided to provide cooling of the required volume of process gas. Multiple secondary coolers 81 can be operated in parallel. As with the primary cooler 55, the secondary cooler 81 can include a bypass valve (not shown) that is operable to pre-close the refrigeration circuit to prevent freezing of water in the refrigeration heat exchanger. The secondary cooler 81 can have the following exemplary operating parameters:

[0189] Pressure: 3 bar

[0190] Temperature: 26.3℃

[0191] Dew point: 5℃

[0192] CO2: 470ppm

[0193] As described herein, the secondary treatment unit 3 has many of the features of the primary treatment unit 2. The main differences between the secondary treatment unit 3 and the primary treatment unit 2 will now be described.

[0194] Although the primary treatment unit 2 requires a supply of regeneration gas for a 5-hour regeneration, the secondary treatment unit 3 is preferably designed to be consistent with the primary treatment unit 2, with a feed time of up to 6 hours before one of the first and second primary adsorption beds 15-1, 15-2 needs to be regenerated. The preferred cycle time for the secondary treatment unit 3 is as follows:

[0195] Feeding: 360 minutes

[0196] Decompression: 15 minutes

[0197] Heating: 60 minutes

[0198] Cooling time: 270 minutes

[0199] Re-pressurization: 15 minutes

[0200] The above operation time is provided as an example only. It should be understood that one or more operation processes may apply different operation times.

[0201] The depressurization and repressurization times are shorter than for the primary treatment unit 2 because the pressure variations in the secondary treatment unit 3 can be smaller, preferably only varying between 3 bar and atmospheric pressure. The heating time for the secondary treatment unit 3 is longer because the amount of water entering the gas is greater at this feed pressure, even though the dew point is the same.

[0202] The secondary treatment unit 3 is regenerated periodically. In particular, the first and second secondary adsorbers 32, 33 are regenerated periodically. The regeneration of the secondary treatment unit 3 can be performed independently of the operation of the primary treatment unit 2. For example, the secondary treatment unit 3 can be regenerated when the primary treatment unit 2 is online (i.e., in operation) or offline (not in operation). One or both of the first and second secondary adsorption beds 35-1, 35-2 of the secondary treatment unit 3 can be regenerated before the primary treatment unit 2 is online or after it is offline, i.e., before or after the primary treatment unit 2 is configured to treat the (untreated) process gas supplied from the primary gas inlet 10. Alternatively or additionally, the regeneration of the secondary treatment unit 3 can be performed in parallel with the operation of the primary treatment unit 2. One or both of the first and second secondary adsorption beds 35-1, 35-2 of the secondary treatment unit 3 can be regenerated when the primary treatment unit 2 is online, i.e., when one of the first and second primary adsorption beds 15-1, 15-2 of the primary treatment unit 2 is operable to treat the (untreated) process gas supplied from the primary gas inlet 10. When the primary treatment unit 2 is operated in the first operating mode and / or the second operating mode described herein, the first secondary adsorption bed 35-1 and / or the second secondary adsorption bed 35-2 of the secondary treatment unit 3 can be regenerated. As described herein, one of the first and second secondary adsorbers 32, 33 can be regenerated while the other of the first and second secondary adsorbers 32, 33 is operated to treat untreated (feed) process gas supplied from the secondary process gas inlet 30. At least in certain embodiments, this enables the continued supply of treated process gas from the secondary treatment unit 3 while one of the first and second primary adsorption beds 15-1, 15-2 is being regenerated.

[0203] The regeneration of the secondary treatment unit 3 can be performed according to the operation mode of the primary treatment unit 2. When the primary treatment unit 2 is operated in the first operation mode, the first adsorption bed of the first and second secondary adsorption beds 35-1, 35-2 can be regenerated; when the primary treatment unit 2 is operated in the second operation mode, the second adsorption bed of the first and second secondary adsorption beds 35-1, 35-2 can be regenerated. Alternatively, the regeneration of the secondary treatment unit 3 can be performed independently of the operation mode of the primary treatment unit 2. The first and second secondary adsorption beds 35-1, 35-2 can be regenerated regardless of whether the primary treatment unit 2 is operated in the first operation mode or the second operation mode. Thus, the secondary treatment unit 3 can be operated independently of the primary treatment unit 2. At least in some embodiments, this provides greater flexibility for controlling the operation of the gas treatment device 1.

[0204] As with the primary treatment unit 2, the regeneration of the secondary treatment unit 3 uses a portion of the treated process gas from one of the first and second secondary adsorption beds 35-1, 35-2 being fed. Preferably, the regeneration is not stopped once it has begun, even if the regeneration does not require flow to the primary treatment unit 2. This requires feeding the treated process gas through one of the first and second secondary adsorption beds 35-1, 35-2, but only this is sufficient to provide regeneration gas for the secondary treatment unit 3. A variable speed compressor may be provided in the secondary compressor 53. The variable speed compressor may be controlled to vary the flow of untreated (feed) process gas, for example, depending on whether the secondary treatment unit 3 and / or the primary treatment unit 2 is being regenerated. The regenerated secondary adsorption vessels 34-1, 34-2 are repressurized after cooling. The first secondary adsorption vessel 34-1 and / or the second secondary adsorption vessel 34-2 may be at least partially repressurized by supplying a portion of the regeneration gas from the other of the first and second secondary adsorption vessels 34-1, 34-2. Alternatively or additionally, the treated process gas may be supplied from the primary processing unit 2 to re-pressurize the first secondary adsorption vessel 34-1 and / or the second secondary adsorption vessel 34-2. Alternatively or additionally, the secondary compressor 53 may supply untreated (feed) process gas to re-pressurize the first secondary adsorption vessel 34-1 and / or the second secondary adsorption vessel 34-2. This enables one of the first and second primary adsorption beds 15-1, 15-2 in the primary processing unit 2 to be regenerated. Reference will now be made to Figures 10 to 15 The operation of the secondary treatment unit 3 to regenerate the first and second primary adsorption beds 15-1, 15-2 is described.

[0205] like Fig.10 As shown, the second secondary adsorber 33 performs a feed step to treat the untreated (feed) process gas supplied from the secondary process gas inlet 30. The flow of the process gas during this step is as shown in FIG. Fig.10 The gas processing device 1 is configured to control the secondary inlet control valve 40-n and the secondary outlet control valve 43-n to control the flow of the process gas. Fig.10In the arrangement shown, the second secondary inlet control valve 40-2 and the second secondary outlet control valve 43-2 are open; the fourth and sixth secondary inlet control valves 40-4, 40-6 and the fourth secondary outlet control valve 43-4 are closed. The secondary inlet valve system 36 is configured to supply untreated (feed) process gas from the secondary process gas inlet 30 to the second secondary adsorber 33. In use, the untreated (feed) process gas is supplied from the secondary process gas inlet 30 and passes through the second secondary adsorption bed 35-2 to remove water (H2O) and carbon dioxide (CO2). The treated process gas is discharged from the second secondary adsorber 33 to the secondary process gas outlet 31. The second secondary adsorber 33 is in fluid communication with the secondary process gas outlet 31. Different configurations of the secondary inlet control valves 40-n are considered. For example, the fifth and sixth secondary inlet control valves 40-5, 40-6 can be omitted. The third and fourth secondary inlet control valves 40-3, 40-4 can be configured to depressurize the first and second secondary adsorbers 32, 33.

[0206] The secondary inlet control valves 40-n each have a valve flow coefficient (Cv), which represents the flow rate relative to the pressure drop across the valve under fully open operating conditions. In this embodiment, the secondary inlet control valves 40-n have different valve flow coefficients (Cv). The secondary inlet control valves 40-n can be configured to implement different flow rates for different operating processes. In this embodiment, the valve flow coefficients (Cv) of the third and fourth secondary inlet control valves 40-3, 40-4 are smaller than the valve flow coefficients (Cv) of the fifth and sixth secondary inlet control valves 40-5, 40-6. As described herein, the third and fourth secondary inlet control valves 40-3, 40-4 are opened to depressurize the first and second secondary adsorption vessels 34-1, 34-2, respectively; the fifth and sixth secondary inlet control valves 40-5, 40-6 are opened to purge (regenerate) the first and second secondary adsorption beds 35-1, 35-2, respectively. The smaller valve flow coefficients (Cv) of the third and fourth secondary inlet control valves 40-3, 40-4 maintain a low gas flow rate for depressurization. This may help avoid high gas flow rates which may result in large downward forces on the first and second secondary adsorption beds 35-1, 35-2, which may damage the support grids used to support the adsorption beds 35-1, 35-2. Before starting regeneration, the first and second secondary adsorption beds 35-1, 35-2 are preferably near atmospheric pressure. Otherwise, opening the purge (regeneration) step valve may result in very large temporary gas flows due to the increased gas flow.

[0207] Alternatively, one or more of the secondary inlet control valves 40-n may include a variable control valve. The third and fourth secondary inlet control valves 40-3, 40-4 may each include a variable flow control valve, which is operable to regulate or adjust the flow. The third and fourth secondary inlet control valves 40-3, 40-4 may be configured to provide a first flow for decompression; and provide a second flow for purging (regeneration). The first flow may be less than the second flow. Alternatively or additionally, the third and fourth secondary inlet control valves 40-3, 40-4 may be pulsed open and closed (pulse width modulation) to regulate the flow. The fifth and sixth secondary inlet control valves 40-5, 40-6 may be optionally omitted.

[0208] When the second secondary adsorption bed 35-2 is activated to treat the process gas, the first secondary adsorber 32 can be depressurized in a depressurization step, preferably to atmospheric pressure. The flow of the process gas in this step is as follows: Fig.10 The first, fourth, fifth and sixth secondary inlet control valves 40 - 1 , 40 - 4 , 40 - 5 , 40 - 6 are closed; the fifth secondary inlet control valve 40 - 5 is opened to allow the first secondary adsorber 32 to be fluidically connected to the secondary exhaust port 42 .

[0209] like Fig.11 As shown, the second secondary adsorber 33 then performs a regeneration step, wherein a portion of the treated process gas from the second secondary adsorber 33 is supplied to the first secondary adsorber 32 to regenerate the first secondary adsorber bed 35-1, as shown in FIG. Fig.11As shown by the thick solid line in . The first and fourth secondary outlet control valves 43-1, 43-4 are closed; the third secondary outlet control valve 43-4 is opened to connect the first secondary adsorber 32 to the secondary process gas outlet 31. The fifth secondary outlet control valve 43-5 is closed. The first, third, fourth and sixth secondary inlet control valves 40-1, 40-3, 40-4, 40-6 are closed; the third secondary inlet control valve 40-3 is opened to connect the first secondary adsorber 32 to the secondary exhaust port 42 fluid. A portion of the treated process gas from the second secondary adsorber 33 is supplied to the first secondary adsorber 32 via the heater supply conduit 37. The secondary regeneration control valve 49 can be controlled to control the supply of the treated process gas for regeneration. The secondary regeneration heater 45 is controllable to adjust the heating of the treated process gas before introducing it into the first secondary adsorber 32 to regenerate the first secondary adsorption bed 35-1. For example, the second heater controller 46 can control the secondary regeneration heater 45 according to the second operating temperature T2 measured by the second secondary temperature sensor 48. The depressurization of the first secondary adsorber 32 and the supply of the treated process gas are described as steps performed separately to regenerate the first secondary adsorber 32. It should be understood that the depressurization and regeneration can be performed simultaneously. For example, the first secondary adsorber 32 can be fluidly connected to the secondary exhaust port 42 at the same time as or after the supply of the regeneration gas is started. This control strategy can be adopted during the regeneration of other adsorbers described herein, such as during the regeneration of the first and second primary adsorbers 12, 13.

[0210] After the first adsorption bed 35-1 is regenerated, the first secondary adsorption vessel 34-1 is re-pressurized. The first secondary adsorption vessel 34-1 can be re-pressurized by closing the first, third and fifth secondary inlet control valves 40-1, 40-3, 40-5 while continuing to supply the treated process gas through the heater supply line 37. In this embodiment, as shown in FIG. Fig.12 As shown, the fifth secondary outlet control valve 43-5 is used to control the supply of treated process gas from the second secondary adsorber 33 to re-pressurize the first secondary adsorber 34-1. The gas treatment device 1 is configured to control the secondary inlet control valve 40-n and the secondary outlet control valve 43-n to re-pressurize the first secondary adsorber 34-1. The second secondary inlet control valve 40-2 and the second secondary outlet control valve 43-2 are opened. The first, third, fourth, fifth and sixth secondary inlet control valves 40-1, 40-3, 40-4, 40-5, 40-6 and the first, third and fourth secondary outlet control valves 43-1, 43-3, 43-4 are closed. The fifth secondary outlet control valve 43-5 is opened to supply a portion of the treated process gas from the second secondary adsorber 33 to the first secondary adsorber 32, as shown. Fig.12As shown by the thick solid line in . The fifth secondary outlet control valve 43-5 can be selectively opened to supply the treated process gas to the first secondary adsorber 32, thereby re-pressurizing the first secondary adsorber 32. Re-pressurization of the first secondary adsorber 34-2 can be performed, for example, within a period of about 30 minutes. The re-pressurization in this embodiment includes supplying a portion of the treated process gas discharged from the second secondary adsorber 32 to the first secondary adsorber 33. The fifth secondary outlet control valve 43-5 can be a variable flow control valve or a proportional control valve to control the supply of the treated process gas. Alternatively, a flow restrictor can be provided to control the supply of the treated process gas. In this embodiment, the first secondary adsorption vessel 34-1 is re-pressurized from the top by downward flow. In one variation, re-pressurization can be performed from the bottom by upward flow.

[0211] like Fig.13 As shown, the first secondary adsorber 32 performs a feed step to treat the process gas, wherein the untreated (feed) process gas is supplied to the first secondary adsorption bed 35-1. The flow of the process gas during this step is as shown in FIG. Fig.13 The gas processing device 1 is configured to control the secondary inlet control valve 40-n and the secondary outlet control valve 43-n to control the flow of the process gas. Fig.13 In the arrangement shown, the first secondary inlet control valve 40-1 and the first secondary outlet control valve 43-1 are open; the third and fifth secondary inlet control valves 40-3, 40-5 and the third secondary outlet control valve 43-3 are closed. The secondary process gas inlet 30 is configured to supply untreated (feed) process gas to the first secondary adsorber 32. In use, untreated (feed) process gas is supplied from the secondary process gas inlet 30 and treated by the first secondary adsorption bed 35-1 to remove water (H2O) and carbon dioxide (CO2). The treated process gas is discharged from the first secondary adsorber 32 to the secondary process gas outlet 31.

[0212] When the first secondary adsorber 35-1 is activated to treat the process gas, the second secondary adsorber 33 may be depressurized in a depressurization step, preferably to atmospheric pressure. The flow of the process gas during this step is as follows: Fig.13 The second, third, fifth and sixth secondary inlet control valves 40-2, 40-3, 40-5, 40-6 are closed; the sixth secondary inlet control valve 40-6 is opened, so that the second secondary adsorber 33 is fluidically connected to the secondary exhaust port 42, as shown in FIG. Fig.13 The thick solid line shows.

[0213] like Fig.14As shown, the second secondary adsorber 33 then performs a regeneration step, wherein a portion of the treated process gas from the first secondary adsorber 32 is supplied to the second secondary adsorber 33 to regenerate the second secondary adsorber bed 35-2, as shown in FIG. Fig.14 As shown by the thick solid line in . The second and third secondary outlet control valves 43-2, 43-3 are closed; the fourth secondary outlet control valve 43-4 is opened to connect the second secondary adsorber 33 to the secondary process gas outlet 31. The fifth secondary outlet control valve 43-5 is closed. The second, third, fourth and fifth secondary inlet control valves 40-2, 40-3, 40-4, 40-5 are closed; the fourth secondary inlet control valve 40-4 is opened to connect the second secondary adsorber 33 to the secondary exhaust port 42 fluid. A portion of the treated process gas from the first secondary adsorber 32 is supplied to the second secondary adsorber 33 via the heater supply conduit 37. The secondary regeneration control valve 49 can be controlled to control the supply of the treated process gas for regeneration. The secondary regeneration heater 45 is controllable to adjust the heating of the treated process gas before introducing it into the second secondary adsorber 33 to regenerate the second secondary adsorption bed 35-2. For example, the second heater controller 46 can control the secondary regeneration heater 45 according to the first operating temperature T1 measured by the first secondary temperature sensor 47. The depressurization of the second secondary adsorber 33 and the supply of treated process gas are described as regenerating the second secondary adsorber 33 as steps performed separately. It should be understood that the depressurization and regeneration can be performed simultaneously. For example, the second secondary adsorber 33 can be fluidly connected to the secondary exhaust port 42 at the same time as or after the supply of regeneration gas is started. This control strategy can be adopted during the regeneration of other adsorbers described herein, such as during the regeneration of the first and second primary adsorbers 12, 13.

[0214] After the second adsorption bed 35-1 is regenerated, the second secondary adsorption vessel 34-2 is re-pressurized. The second secondary adsorption vessel 34-2 can be re-pressurized by closing the second, fourth and sixth secondary inlet control valves 40-2, 40-4, 40-6 while continuing to supply the treated process gas through the heater supply line 37. In this embodiment, as shown in FIG. Fig.15As shown, the fifth secondary outlet control valve 43-5 is used to control the supply of treated process gas from the first secondary adsorber 32 to re-pressurize the second secondary adsorber vessel 34-2. The gas treatment device 1 is configured to control the secondary inlet control valve 40-n and the secondary outlet control valve 43-n to re-pressurize the second secondary adsorber vessel 34-2. The first secondary inlet control valve 40-1 and the first secondary outlet control valve 43-1 are opened. The second, third, fourth, fifth and sixth secondary inlet control valves 40-2, 40-3, 40-4, 40-5, 40-6 and the second, third and fourth secondary outlet control valves 43-2, 43-3, 43-4 are closed. The fifth secondary outlet control valve 43-5 is opened to supply a portion of the treated process gas from the first secondary adsorber 32 to the second secondary adsorber 33, as shown. Fig.15 As shown by the thick solid line in . The fifth secondary outlet control valve 43-5 can be selectively opened to supply the treated process gas to the second secondary adsorber 33. Repressurization of the second secondary adsorber 34-2 can be performed, for example, in about three to thirty minutes. The repressurization in this embodiment includes supplying a portion of the treated process gas discharged from the first secondary adsorber 32 to the second secondary adsorber 33. The fifth secondary outlet control valve 43-5 can be a variable flow control valve or a proportional control valve to control the supply of the treated process gas. Alternatively, a flow restrictor can be provided to control the supply of the treated process gas. In this embodiment, the first secondary adsorption vessel 34-1 is repressurized from the top by downward flow. In one variation, repressurization can be performed from the bottom by upward flow.

[0215] like Fig.10 and Fig.12 As shown, in this embodiment, the regeneration of the first and second secondary adsorbent beds 35-1, 35-2 is performed in a downstream direction. Water (H2O) can be condensed by cooling on the outlet vessel head. By regenerating in the downstream direction, this condensed water is pushed toward the secondary process gas discharge port 22.

[0216] As far as carbon dioxide CO2 removal is concerned, the design of the secondary treatment unit 3 is consistent with the design of the primary treatment unit 2 in terms of the size of the adsorbent used for a preferred peak breakthrough of 1 ppm and a time average of less than 100 ppb. Alternatively, the primary treatment unit 2 can be described as requiring a carbon dioxide (CO2) partial pressure at the outlet of no more than 1.6 Pa at most and less than 0.16 Pa on average. This means that the amount of CO2 in the regeneration gas (in terms of partial pressure) must also be less than these values. This is equivalent to the CO2 partial pressure leaving the secondary treatment unit 3 before the pressure drops to a near-atmospheric pressure of a maximum of about 5 Pa and an average of 0.5 Pa. At an operating pressure of 3 bar, this is equivalent to a maximum allowable breakthrough of 12 ppm and a time average of 1.2 ppm, i.e., the breakthrough is allowed to be more than an order of magnitude larger than the design of the secondary treatment unit 3.

[0217] Before the first start-up, the required amount of adsorbent is filled into the primary and secondary adsorption vessels 14-1, 14-2, 34-1, 34-2. The filling should be done under dry conditions because water in the ambient air adsorbs onto the material and liquid water destroys its structure.

[0218] The secondary processing unit 3 is started before the primary processing unit 2. The secondary compressor 53 and the secondary cooler 81 are turned on to bring the supply of process gas to the operating pressure and to reduce the temperature of the refrigerant in the secondary cooler 81. The compressed process gas is then bypassed around the feed inlet valve of the selected one of the first and second secondary adsorption beds 35-1, 35-2 to slowly increase the pressure. Once the operating pressure is reached, the inlet feed valve is opened. The treated process gas from the selected one of the first and second secondary adsorption beds 35-1, 35-2 is then used to regenerate the other of the first and second secondary adsorption beds 35-1, 35-2. An extended heating time of 6 hours is recommended, followed by a cooling step. The regenerated secondary adsorption beds 35-1, 35-2 are then repressurized, switched to feed, and the other of the first and second secondary adsorption beds 35-1, 35-2 is regenerated. Again, it is recommended that the heating time should be 6 hours, followed by cooling. This process should be repeated in switching beds until the gas from the product end of the first and second secondary adsorption beds 35-1, 35-2 is suitably dry and free of carbon dioxide (CO2). This may require one or more cycles to achieve since the regeneration air from the first bed may contain water and carbon dioxide (CO2) that should be removed from the system.

[0219] The extended heating time is required to ensure that the adsorbent is as dry as possible because the adsorbent can come from the supplier with up to 1.5 weight percent (wt %) water and will also absorb water from the atmosphere during loading.

[0220] With the secondary treatment unit 3 in normal regeneration mode, the treated process gas from the secondary treatment unit 3 can now be supplied as regeneration gas for regenerating the first and second primary adsorption beds 15-1, 15-2 in the primary treatment unit 2. This is again done by a 6 hour heating step followed by cooling of the first and second primary adsorption beds 15-1, 15-2. Since the gas sent to regenerate the first and second primary adsorption beds 15-1, 15-2 is clean, one regeneration is sufficient.

[0221] Now, the primary compressor 52 is started together with the primary cooler 55. The process gas bypasses around a feed inlet valve to one of the first and second primary adsorption beds 15-1, 15-2 and is re-pressurized. The treated process gas can then be collected from the first adsorption vessel 14-1 and checked for dryness and carbon dioxide (CO2) content. If it is too high, the first primary adsorption bed 15-1 can be depressurized and regenerated again using the regeneration gas supplied from the secondary treatment unit 3. This can be repeated until the required carbon dioxide (CO2) and water (H2O) requirements are met. Once this process is completed for one of the first and second primary adsorption beds 15-1, 15-2, the process can be repeated for the other of the first and second primary adsorption beds 15-1, 15-2.

[0222] It should be understood that various changes and modifications can be made to the present invention without departing from the scope of the present application.

Claims

1. A gas treatment device for treating a process gas, the gas treatment device comprising a primary treatment unit and a secondary treatment unit, the primary and secondary treatment units being configured to treat the process gas, wherein: The primary processing unit includes a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; the secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit; The primary processing unit is selectively configurable into a first operating mode and a second operating mode; When operating in a first operating mode, the primary process gas inlet is connected to the first primary adsorber to supply process gas to the first primary adsorber for treatment; The second primary adsorber is connected to at least one secondary process gas outlet to receive the treated process gas from the secondary treatment unit for regenerating the second primary adsorber; and When operating in the second operating mode, the primary process gas inlet is connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment; The first primary adsorber is connected to at least one secondary process gas outlet to receive the treated process gas from the secondary treatment unit for regenerating the first primary adsorber.

2. The gas treatment plant of claim 1, wherein when operating in the first operating mode, a portion of the treated process gas from the first primary adsorber is supplied to repressurize the second primary adsorber after the second primary adsorber is regenerated.

3. A gas treatment plant according to claim 1 or 2, wherein when operating in the second operating mode, after the first primary adsorber is regenerated, a portion of the treated process gas from the second primary adsorber is supplied to re-pressurize the first primary adsorber.

4. A gas treatment plant according to any one of the preceding claims, wherein when operating in the first operating mode, the second primary adsorber is depressurised prior to regeneration of the second primary adsorber.

5. A gas treatment plant according to any one of the preceding claims, wherein when operating in the second operating mode, the first primary adsorber is depressurised prior to regeneration of the first primary adsorber.

6. A gas treatment plant according to any one of the preceding claims, comprising a primary regeneration heater for heating treated process gas from the secondary treatment unit before it is introduced into the primary treatment unit.

7. A gas processing plant according to any one of the preceding claims, wherein the gas processing plant is selectively configurable to regenerate a secondary processing unit, the regeneration of the secondary processing unit being independent of the operating mode of the primary processing unit.

8. A gas treatment plant according to any one of the preceding claims, wherein the at least one secondary adsorber comprises first and second secondary adsorbers for treating the process gas.

9. A gas treatment plant according to claim 8, wherein in use, one of the first and second secondary adsorbers is operatively selected to treat the process gas and the other of the first and second secondary adsorbers is regenerated.

10. The gas processing apparatus of claim 9, wherein regenerating comprises outputting a portion of the treated process gas from a selected one of the first and second secondary adsorbers to regenerate the other of the first and second secondary adsorbers.

11. The gas treatment plant according to claim 10, comprising a secondary regeneration heater for heating the treated process gas to regenerate the other of the first and second secondary adsorbers.

12. A gas processing device according to any one of the preceding claims, comprising: The primary compressor is used to compress the process gas supplied to the primary process gas inlet of the primary processing unit. A secondary compressor is used to compress the process gas supplied to the secondary process gas inlet of the secondary treatment unit.

13. A gas processing device according to any one of the preceding claims, comprising: a primary outlet valve system selectively configured to connect one of the first and second primary adsorbers to at least one primary process gas outlet; The primary outlet valve system is selectively configured to connect the secondary treatment unit to one of the first and second primary adsorbers for regeneration.

14. A gas processing plant according to any one of the preceding claims, comprising a secondary outlet valve system selectively configured to connect one of the first and second secondary adsorbers to at least one secondary process gas outlet.

15. A gas processing apparatus according to any one of the preceding claims, comprising a primary inlet valve system selectively configured to connect the primary process gas inlet to one of the first and second primary adsorbers; The primary inlet valve system is selectively configured to discharge process gas from one of the first and second primary adsorbers for depressurizing the first and second primary adsorbers.

16. A gas processing apparatus according to any one of the preceding claims, comprising a secondary inlet valve system selectively configured to connect the secondary process gas inlet to one of the first and second secondary adsorbers; The secondary inlet valve system is selectively configured to discharge process gas from one of the first and second secondary adsorbers for depressurizing the first and second primary adsorbers.

17. A gas processing plant according to any one of the preceding claims, wherein the primary treatment unit and the secondary treatment unit are configured to remove carbon dioxide (CO2) and water (H2O) from the process gas.

18. A gas treatment arrangement according to any one of the preceding claims, wherein the process gas is air.

19. A method of controlling a gas processing device to process a process gas, the gas processing device comprising: a primary processing unit comprising a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and a secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit; Wherein the method comprises selectively operating a primary processing unit in a first operating mode and a second operating mode; When operating in a first operating mode, the primary process gas inlet is connected to the first primary adsorber to supply untreated process gas to the first primary adsorber for treatment; The second primary adsorber is connected to at least one secondary process gas outlet to receive the treated process gas from the secondary treatment unit for regenerating the second primary adsorber; and When operating in the second operating mode, the primary process gas inlet is connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment; The first primary adsorber is connected to at least one secondary process gas outlet to receive the treated process gas from the secondary treatment unit for regenerating the first primary adsorber.

20. A gas treatment device for treating a process gas, the gas treatment device comprising a primary treatment unit and a secondary treatment unit, the primary and secondary treatment units being configured to treat the process gas, wherein: The primary processing unit includes a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and the secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit; Wherein, in use, the primary process gas inlet is connected to the first primary adsorber to supply process gas to the first primary adsorber for treatment in a first operating mode; the primary process gas inlet is connected to the second primary adsorber to supply process gas to the second primary adsorber for treatment in a second operating mode; and In use, the secondary treatment unit is selectively connected to at least one of the first and second primary adsorbers to supply treated process gas to regenerate at least one of the first and second primary adsorbers.

21. A method of controlling a gas processing device to process a process gas, the gas processing device comprising: a primary processing unit comprising a primary process gas inlet for receiving a process gas, first and second primary adsorbers for treating the process gas, and at least one primary process gas outlet for discharging the treated process gas from the first and second primary adsorbers; and a secondary processing unit comprising a secondary process gas inlet for receiving a process gas, at least one secondary adsorber for treating the process gas, and at least one secondary process gas outlet for discharging the treated process gas from the at least one secondary adsorber to the primary processing unit; The method comprises: In a first operating mode, connecting the primary process gas inlet to the first primary adsorber to supply untreated process gas to the first primary adsorber for treatment; In a second operation mode, connecting the primary process gas inlet to the second primary adsorber to supply the process gas to the second primary adsorber for treatment; and A secondary treatment unit is connected to at least one of the first and second primary adsorbers to supply treated process gas to regenerate at least one of the first and second primary adsorbers.

22. An electronic control unit configured to control a gas processing device to perform the method of claim 19 or 21.

23. A liquid air energy storage device, comprising the gas processing device according to any one of claims 1 to 18 or 20.

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